JPH0983203A - High frequency circuit - Google Patents

High frequency circuit

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Publication number
JPH0983203A
JPH0983203A JP26243495A JP26243495A JPH0983203A JP H0983203 A JPH0983203 A JP H0983203A JP 26243495 A JP26243495 A JP 26243495A JP 26243495 A JP26243495 A JP 26243495A JP H0983203 A JPH0983203 A JP H0983203A
Authority
JP
Japan
Prior art keywords
bias supply
circuit
bias
supply line
line
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP26243495A
Other languages
Japanese (ja)
Other versions
JP2812263B2 (en
Inventor
Kenichi Maruhashi
建一 丸橋
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
NEC Corp
Original Assignee
NEC Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by NEC Corp filed Critical NEC Corp
Priority to JP7262434A priority Critical patent/JP2812263B2/en
Publication of JPH0983203A publication Critical patent/JPH0983203A/en
Application granted granted Critical
Publication of JP2812263B2 publication Critical patent/JP2812263B2/en
Anticipated expiration legal-status Critical
Expired - Fee Related legal-status Critical Current

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  • Amplifiers (AREA)
  • Waveguide Connection Structure (AREA)
  • Waveguides (AREA)
  • Microwave Amplifiers (AREA)

Abstract

PROBLEM TO BE SOLVED: To obtain a bias circuit in a multi-stage circuit to reduce the chip area and to improve the performance resulting from reducing a loss in the circuit. SOLUTION: A pre-stage FET 10 (post-stage FET 11) in the multi-stage circuit is coupled with one-terminal of a bias supply line 3 whose electric length is λ/4 via a matching circuit 8 (9) and a main line 1 (2), the other terminal of the bias supply line 3 is connected to ground via a capacitor 4 in terms of high frequencies, and the bias supply line 3 is structured to be 2-layers as a capacitor structure via a dielectric film. The density of the capacitance in this capacitor structure is increased to make the reactance negligibly small in a line block sufficiently smaller than the electric wavelength λ. In this case, the 2-layered bias supply line 3 has the identical electric characteristic to that of a single-layer bias supply line used for a conventional circuit.

Description

【発明の詳細な説明】Detailed Description of the Invention

【0001】[0001]

【発明の属する技術分野】本発明は、高周波で用いられ
るバイアス供給回路に関する。
BACKGROUND OF THE INVENTION 1. Field of the Invention The present invention relates to a bias supply circuit used at high frequencies.

【0002】[0002]

【従来の技術】マイクロ波・ミリ波帯等の高周波回路に
おいては、集積化による小型化や低コスト化の試みがな
されている。しかしながら、一般に集積回路等で用いる
バイアス供給回路(「バイアス回路」ともいう)は比較
的大きな面積を占めている。
2. Description of the Related Art In high frequency circuits such as microwaves and millimeter waves, attempts have been made to reduce the size and cost by integration. However, a bias supply circuit (also referred to as “bias circuit”) generally used in an integrated circuit or the like occupies a relatively large area.

【0003】マイクロストリップ線路で構成された従来
のバイアス回路の一例を図3に示す。
FIG. 3 shows an example of a conventional bias circuit composed of a microstrip line.

【0004】図3を参照して、バイアス回路は、電気長
がλ/4(λは例えば使用周波数帯域の中心周波数波
長)のマイクロストリップ線路20と、マイクロストリ
ップ線路20の一端に接続されたキャパシタ4と、ロー
パスフィルタ5と、からなる。
Referring to FIG. 3, the bias circuit includes a microstrip line 20 having an electrical length of λ / 4 (λ is, for example, a center frequency wavelength of a used frequency band), and a capacitor connected to one end of the microstrip line 20. 4 and a low-pass filter 5.

【0005】バイアス印加点6には電界効果トランジス
タ(以下「FET」という)10のドレインに対して上
記バイアス回路を介して供給されるバイアス電圧Vdが
印加され、バイアス印加点7にはFET11のゲートに
対して上記バイアス回路を介して供給されるバイアス電
圧Vgが印加される。
A bias voltage Vd supplied to the drain of a field effect transistor (hereinafter referred to as "FET") 10 through the bias circuit is applied to the bias applying point 6, and a gate of the FET 11 is applied to the bias applying point 7. A bias voltage Vg supplied via the bias circuit is applied to the.

【0006】このバイアス回路において、マイクロスト
リップ線路20の一端はキャパシタ4により高周波短絡
(高周波的に接地に短絡)されているため、主線路1、
2側から見たマイクロストリップ線路20側のインピー
ダンスは無限大となっている。したがってバイアス回路
は整合状態に関与しない。
In this bias circuit, one end of the microstrip line 20 is short-circuited at high frequency by the capacitor 4 (short-circuited to ground at high frequency).
The impedance on the side of the microstrip line 20 viewed from the side 2 is infinite. Therefore, the bias circuit does not participate in the matching state.

【0007】また、主線路1と主線路2との間にはDC
カットキャパシタ19が挿入され、前段と後段へのDC
(直流)バイアスを独立に印加することができる。
Further, DC is provided between the main line 1 and the main line 2.
Cut capacitor 19 is inserted, DC to the front and rear stages
(DC) bias can be applied independently.

【0008】[0008]

【発明が解決しようとする課題】上記した従来のバイア
ス回路を実際にレイアウト設計をする際には、電磁干渉
(クロストーク)の問題を避けるために、マイクロスト
リップ線路20は整合回路8及び9や、FET10及び
11等の素子と十分に離間して配設することが必要とさ
れる。従って、個々のバイアス回路が占有する面積は比
較的大きくなる。
When actually designing the layout of the above-mentioned conventional bias circuit, in order to avoid the problem of electromagnetic interference (crosstalk), the microstrip line 20 includes the matching circuits 8 and 9 and the matching circuits 8 and 9. , FETs 10 and 11 and the like are required to be sufficiently separated. Therefore, the area occupied by each bias circuit becomes relatively large.

【0009】さらに、上記従来のバイアス回路は、必要
とするバイアスの数と同じ数だけ設けられており、総チ
ップ面積に占めるバイアス回路の割合は必然的に大きく
ならざるを得ないという問題を有する。
Further, the above-mentioned conventional bias circuits are provided in the same number as the required number of biases, and there is a problem that the ratio of the bias circuits to the total chip area is inevitably large. .

【0010】また、バイアス供給回路の挿入により損失
が導入されるため、性能向上の面からみてもバイアス回
路数の低減が望まれている。
Further, since the loss is introduced by inserting the bias supply circuit, it is desired to reduce the number of bias circuits from the viewpoint of improving the performance.

【0011】従って、本発明は、上記従来技術の問題点
を解消し、多段回路において、チップ面積を削減すると
共に回路内の損失低減を抑止して高周波回路の性能向上
を達成するバイアス回路を提供することを目的とする。
Therefore, the present invention solves the above-mentioned problems of the prior art, and provides a bias circuit in a multi-stage circuit, which reduces the chip area and suppresses the loss in the circuit to improve the performance of the high frequency circuit. The purpose is to do.

【0012】[0012]

【課題を解決するための手段】前記目的を達成するた
め、本発明は、伝送線路を用いて構成されたバイアス供
給回路を複数段有する高周波回路において、該伝送線路
を多層化することにより前段及び次段のバイアスを共通
化して供給することを特徴とする高周波回路を提供す
る。
In order to achieve the above object, the present invention provides a high frequency circuit having a plurality of stages of bias supply circuits formed by using transmission lines, wherein the transmission lines are multi-layered, and Provided is a high-frequency circuit characterized by supplying a common bias to the next stage.

【0013】本発明に係る高周波回路においては、該伝
送線路の一端が高周波短絡されていることを特徴とす
る。
In the high frequency circuit according to the present invention, one end of the transmission line is short-circuited at high frequency.

【0014】また、本発明に係る高周波回路において
は、該伝送線路の電気長がλ/4であることを特徴とす
る。
Further, the high frequency circuit according to the present invention is characterized in that the electric length of the transmission line is λ / 4.

【0015】[0015]

【作用】本発明は、各段の間に設けられたバイアス供給
線路を多層にし、前段及び次段へのバイアスを1つの伝
送線路を介して供給することを特徴としている。
The present invention is characterized in that the bias supply lines provided between the respective stages are multi-layered and the bias to the preceding stage and the next stage is supplied through one transmission line.

【0016】多層化されたバイアス供給回路は、各層の
導体層(金属配線)とその間に挿入される誘電膜と共に
平板キャパシタを構成する。このキャパシタの容量密度
が十分高い(例えば金属配線の線幅の拡大、金属配線間
の距離の縮小、あるいは誘電率の大な誘電膜の使用等)
と、電気波長λと比較して十分小さな線路区間(バイア
ス供給線路上の線路区間)でみたキャパシタ構造のリア
クタンスは無視できる程に小さくなる。
The multi-layered bias supply circuit constitutes a plate capacitor together with the conductor layers (metal wirings) of the respective layers and the dielectric film inserted therebetween. The capacitance density of this capacitor is sufficiently high (for example, the line width of metal wiring is expanded, the distance between metal wiring is reduced, or the use of a dielectric film with a large dielectric constant).
Then, the reactance of the capacitor structure in a sufficiently small line section (line section on the bias supply line) is negligibly small compared to the electrical wavelength λ.

【0017】この場合、多層バイアス供給線路の各金属
配線層は高周波的に同一電位とされ、多層バイアス供給
線路は通常(単層)の伝送線路とみなすことができる。
したがって、高周波設計では、多層バイアス供給線路
は、従来通りの伝送線路として取り扱うことができ、か
つ、複数のDCバイアスを供給することが可能となる。
In this case, the metal wiring layers of the multilayer bias supply line are set to the same potential in terms of high frequency, and the multilayer bias supply line can be regarded as a normal (single layer) transmission line.
Therefore, in the high frequency design, the multilayer bias supply line can be treated as a conventional transmission line, and a plurality of DC biases can be supplied.

【0018】[0018]

【発明の実施の形態】以下に本発明の実施の形態を図面
を参照にして詳細に説明する。
BEST MODE FOR CARRYING OUT THE INVENTION Embodiments of the present invention will be described in detail below with reference to the drawings.

【0019】図1に、本発明の一実施形態に係るバイア
ス回路の構成を示す。
FIG. 1 shows the configuration of a bias circuit according to an embodiment of the present invention.

【0020】図1を参照して、前段のFET10及び後
段のFET11は、整合回路8と主線路1、及び整合回
路9と主線路2を介してバイアス供給線路3の一端とそ
れぞれ接続されている。
Referring to FIG. 1, the FET 10 at the front stage and the FET 11 at the rear stage are connected to one end of the bias supply line 3 through the matching circuit 8 and the main line 1 and the matching circuit 9 and the main line 2, respectively. .

【0021】バイアス供給線路3の他端はそれぞれキャ
パシタ4、4′を介して高周波短絡(高周波的に接地に
短絡)されている。
The other end of the bias supply line 3 is short-circuited at high frequency (short-circuited to ground at high frequency) via the capacitors 4 and 4 ', respectively.

【0022】本発明の一実施形態をさらに詳細に説明す
るために、バイアス供給線路3の平面構造を図2(a)
に示す。
In order to explain one embodiment of the present invention in more detail, the plane structure of the bias supply line 3 is shown in FIG.
Shown in

【0023】図2(a)を参照して、主線路1及び主線
路2に一端がそれぞれ接続された第1の配線金属12及
び第2の配線金属13は多層構造とされる。第2の配線
金属13は第1層の第1の配線金属12の上層にてこれ
にオーバラップするように形成されている。そして、第
1の配線金属12及び第2の配線金属13は、主線路1
及び主線路2に接続する側と相対する側においてそれぞ
れキャパシタ4、4′の一側端子に接続され、キャパシ
タ4、4′の他側端子は接地に接続されている。
Referring to FIG. 2A, the first wiring metal 12 and the second wiring metal 13 whose one ends are respectively connected to the main line 1 and the main line 2 have a multilayer structure. The second wiring metal 13 is formed in the upper layer of the first wiring metal 12 of the first layer so as to overlap therewith. The first wiring metal 12 and the second wiring metal 13 are connected to the main line 1
And the side opposite to the side connected to the main line 2 is connected to one terminal of the capacitors 4 and 4 ', respectively, and the other terminals of the capacitors 4 and 4'are connected to the ground.

【0024】図2(b)は、図2(a)に平面図を示し
たバイアス供給線路のA−B線に沿った断面を示す。
FIG. 2B shows a cross section taken along line AB of the bias supply line whose plan view is shown in FIG.

【0025】図2(b)を参照して、第1の配線金属1
2及び第2の配線金属13は、誘電膜18を挟んでなる
キャパシタ構造をとっている。
Referring to FIG. 2B, the first wiring metal 1
The second wiring metal 13 and the second wiring metal 13 have a capacitor structure with a dielectric film 18 sandwiched therebetween.

【0026】線路長さ当たりの容量が十分大きい場合、
電気波長λ(λは例えば使用周波数帯域の中心周数数の
波長)と比較して十分小さな線路区間でみた該キャパシ
タ構造における高周波のリアクタンスは無視できるほど
低くなる。この場合、バイアス供給線路3を構成する多
層線路は、高周波的に、単層線路と同等の電気特性を有
するものとみなすことができる。
When the capacitance per line length is sufficiently large,
The reactance of high frequency in the capacitor structure in a sufficiently small line section compared to the electrical wavelength λ (where λ is the wavelength of the central frequency of the used frequency band) becomes negligibly low. In this case, the multilayer line forming the bias supply line 3 can be regarded as having the same electrical characteristics as the single-layer line in terms of high frequency.

【0027】したがって、バイアス供給線路3の電気長
をλ/4とすれば、主線路1及び主線路2側からみたバ
イアス供給線路のインピーダンスは無限大となり、整合
インピーダンスに関与しない。
Therefore, if the electrical length of the bias supply line 3 is λ / 4, the impedance of the bias supply line as viewed from the main line 1 and the main line 2 side becomes infinite and does not contribute to the matching impedance.

【0028】さらに、多層線路は、DCカットキャパシ
タも内包しており、このため、前段と後段へのDC(直
流)バイアスを独立に印加することができる。すなわ
ち、第1の配線金属12と第2の配線金属13及びその
間に介装された誘電膜18(図2(b)参照)とからな
るキャパシタ構造が、図3に示したDCカットキャパシ
タ19として機能し、図1に示すように、本実施形態に
おいても、バイアス印加点6からは、前段のFET10
のドレインに対し、ローパスフィルタ5、バイアス供給
線路3、主線路1、及び整合回路8を介してバイアス電
圧Vdが印加され、バイアス印加点7からは、FET1
1のゲートに対し、ローパスフィルタ5′、バイアス供
給線路3、主線路2、及び整合回路9を介してバイアス
電圧Vgがバイアス電圧Vdとは独立に印加することが
できる。
Further, the multi-layer line also includes a DC cut capacitor, so that a DC (direct current) bias can be independently applied to the front stage and the rear stage. That is, the capacitor structure composed of the first wiring metal 12, the second wiring metal 13, and the dielectric film 18 (see FIG. 2B) interposed therebetween is the DC cut capacitor 19 shown in FIG. As shown in FIG. 1, in the present embodiment as well, from the bias application point 6 to the FET 10 in the previous stage.
A bias voltage Vd is applied to the drain of the FET via the low-pass filter 5, the bias supply line 3, the main line 1, and the matching circuit 8.
The bias voltage Vg can be applied to the gate of 1 independently of the bias voltage Vd through the low-pass filter 5 ′, the bias supply line 3, the main line 2, and the matching circuit 9.

【0029】1段当たり2つのバイアス印加が必要なN
段回路(Nは所定の正整数)においては、前記従来例で
は、2Nの数に等しいバイアス供給線路を設けることが
必要とされたが、本実施形態においては、バイアス供給
線路の数はN+1とすることができる。
N for which two biases need to be applied per stage
In the stage circuit (N is a predetermined positive integer), it is necessary to provide the bias supply lines equal in number to 2N in the conventional example, but in the present embodiment, the number of bias supply lines is N + 1. can do.

【0030】したがって、本実施形態は、バイアス供給
線路が占有する面積の総和を前記従来例よりも格段に削
減することができる。このため、本実施形態に係るバイ
アス回路は、例えばマイクロ波集積回路(MIC)等に
好適とされる。
Therefore, in this embodiment, the total area occupied by the bias supply lines can be significantly reduced as compared with the conventional example. Therefore, the bias circuit according to this embodiment is suitable for, for example, a microwave integrated circuit (MIC).

【0031】さらに、本実施形態においては、バイアス
供給線路数が少ないため、バイアス供給線路の挿入に伴
う損失(信号伝送上の挿入損)が低減され、高周波回路
全体の特性を向上することを可能としている。
Further, in this embodiment, since the number of bias supply lines is small, the loss (insertion loss in signal transmission) due to the insertion of the bias supply lines is reduced, and the characteristics of the entire high frequency circuit can be improved. I am trying.

【0032】なお、本発明の実施の形態として、上記の
如く、2層のバイアス供給線路について説明したが、本
発明は、上記形態に限定されるものでなく、前段又は後
段の回路が並列に分岐され、複数のバイアスを必要とす
る場合であれば、さらに多層のバイアス供給線路を用い
ることもできる。
As described above, the two-layer bias supply line has been described as the embodiment of the present invention. However, the present invention is not limited to the above-mentioned embodiment, and the circuits of the front stage or the rear stage are connected in parallel. If the branch is required and a plurality of biases are required, a multilayered bias supply line can be used.

【0033】また、バイアス供給線路の電気長は、上記
実施の形態で説明した、長さλ/4のみに限定されるも
のでなくない。さらに、本発明は、伝送線路の種類もマ
イクロストリップ線路に限定されるものでなく、例えば
コプレーナー線路等各種平面型導波路に対して適用可能
である。
The electrical length of the bias supply line is not limited to the length λ / 4 described in the above embodiment. Furthermore, the present invention is not limited to the microstrip line as the type of transmission line, and can be applied to various planar waveguides such as a coplanar line.

【0034】そして、本発明の実施形態では、回路中の
基本能動素子として電界効果トランジスタ(FET)を
用いて説明したが、本発明は特にトランジスタの種類を
限定するものではない。さらにトランジスタ以外であっ
ても、バイアスを必要とするものであれば本発明の原理
に従う構成のバイアス回路を適用することができる。
Although the field-effect transistor (FET) is used as the basic active element in the circuit in the embodiment of the present invention, the present invention is not particularly limited to the type of transistor. Further, a bias circuit having a configuration according to the principle of the present invention can be applied to a device other than a transistor as long as a bias is required.

【0035】[0035]

【発明の効果】以上説明したように、本発明によれば、
比較的大きな面積を占有するバイアス供給線路を共通化
したことにより、チップ全体の面積を大幅に縮減するこ
とを可能とし集積化に好適とされる。また、本発明によ
れば、バイアス供給線路の数を低減することができるた
め、線路による損失を低減することが可能となる。
As described above, according to the present invention,
By sharing the bias supply line that occupies a relatively large area, it is possible to significantly reduce the area of the entire chip, which is suitable for integration. Further, according to the present invention, since the number of bias supply lines can be reduced, it is possible to reduce the loss due to the lines.

【図面の簡単な説明】[Brief description of drawings]

【図1】本発明の一実施形態に係るバイアス回路の構成
を説明するための図である。
FIG. 1 is a diagram illustrating a configuration of a bias circuit according to an embodiment of the present invention.

【図2】本発明の一実施形態に係るバイアス供給線路の
構造を説明するための図である。 (a)バイアス供給線路の平面図である。 (b)バイアス供給線路の図2(a)のA−B線の断面
図である。
FIG. 2 is a diagram for explaining a structure of a bias supply line according to an embodiment of the present invention. (A) It is a top view of a bias supply line. FIG. 3B is a cross-sectional view of the bias supply line taken along the line AB of FIG.

【図3】従来のバイアス回路を説明するための図であ
る。
FIG. 3 is a diagram for explaining a conventional bias circuit.

【符号の説明】[Explanation of symbols]

1、2 主線路 3 多層バイアス供給線路 4 キャパシタ 5 ローパスフィルタ 6、7 バイアス印加点 8、9 整合回路 10、11 FET 12 第1の配線金属 13 第2の配線金属 14 バイアス供給線路結合点 15 高周波短絡点 16 バイアホール 17 基板 18 誘電膜 19 DCカットキャパシタ 20 バイアス供給線路 1, 2 Main line 3 Multilayer bias supply line 4 Capacitor 5 Low-pass filter 6, 7 Bias application point 8, 9 Matching circuit 10, 11 FET 12 First wiring metal 13 Second wiring metal 14 Bias supply line coupling point 15 High frequency Short circuit point 16 Via hole 17 Substrate 18 Dielectric film 19 DC cut capacitor 20 Bias supply line

Claims (5)

【特許請求の範囲】[Claims] 【請求項1】伝送線路を用いて構成されたバイアス供給
回路を複数段有する高周波回路において、前記伝送線路
を多層化することにより前段及び次段のバイアスを共通
化して供給することを特徴とする高周波回路。
1. A high-frequency circuit having a plurality of stages of bias supply circuits configured by using transmission lines, wherein the transmission lines are multi-layered so that the biases of the previous stage and the next stage are shared and supplied. High frequency circuit.
【請求項2】前記伝送線路の一端が高周波短絡されてい
ることを特徴とする請求項1に記載の高周波回路。
2. The high frequency circuit according to claim 1, wherein one end of the transmission line is short-circuited at a high frequency.
【請求項3】前記伝送線路の電気長がλ/4であること
を特徴とする請求項2に記載の高周波回路。
3. The high frequency circuit according to claim 2, wherein the electrical length of the transmission line is λ / 4.
【請求項4】互いに異なる層にそれぞれ配設されてなる
第1及び第2のバイアス供給用伝送線路を少なくとも含
み、前記第1及び第2のバイアス供給用伝送線路が誘電
体を介して少なくとも一部において互いにオーバーラッ
プし、前記第1及び第2のバイアス供給用伝送線路から
対応する段の回路にそれぞれ所定のバイアスを供給する
ように構成されてなるバイアス供給回路を備えたことを
特徴とする高周波回路。
4. A first bias supply transmission line and a second bias supply transmission line, each of which is disposed in a different layer from each other, wherein the first and second bias supply transmission lines are at least one via a dielectric. And a bias supply circuit configured to supply predetermined biases from the first and second transmission lines for bias supply to the circuits of the corresponding stages, respectively. High frequency circuit.
【請求項5】前記第1及び第2のバイアス供給用伝送線
路を少なくとも含むバイアス供給回路が使用周波数帯で
単層のバイアス供給用伝送線路と同等の電気的特性を有
することを特徴とする請求項4記載の高周波回路。
5. A bias supply circuit including at least the first and second bias supply transmission lines has an electric characteristic equivalent to that of a single-layer bias supply transmission line in an operating frequency band. The high frequency circuit according to item 4.
JP7262434A 1995-09-14 1995-09-14 High frequency circuit Expired - Fee Related JP2812263B2 (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP7262434A JP2812263B2 (en) 1995-09-14 1995-09-14 High frequency circuit

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP7262434A JP2812263B2 (en) 1995-09-14 1995-09-14 High frequency circuit

Publications (2)

Publication Number Publication Date
JPH0983203A true JPH0983203A (en) 1997-03-28
JP2812263B2 JP2812263B2 (en) 1998-10-22

Family

ID=17375740

Family Applications (1)

Application Number Title Priority Date Filing Date
JP7262434A Expired - Fee Related JP2812263B2 (en) 1995-09-14 1995-09-14 High frequency circuit

Country Status (1)

Country Link
JP (1) JP2812263B2 (en)

Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US7113002B2 (en) 2003-05-15 2006-09-26 Fujikura Ltd. Transmission cable structure for GHz frequency band signals and connector used for transmission of GHz frequency band signals
US7446567B2 (en) 2003-02-21 2008-11-04 Kanji Otsuka Signal transmission apparatus and interconnection structure

Citations (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH01307301A (en) * 1988-06-06 1989-12-12 Ngk Spark Plug Co Ltd Dielectric filter
JPH0448801A (en) * 1990-06-15 1992-02-18 Mitsubishi Electric Corp High frequency band package

Patent Citations (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH01307301A (en) * 1988-06-06 1989-12-12 Ngk Spark Plug Co Ltd Dielectric filter
JPH0448801A (en) * 1990-06-15 1992-02-18 Mitsubishi Electric Corp High frequency band package

Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US7446567B2 (en) 2003-02-21 2008-11-04 Kanji Otsuka Signal transmission apparatus and interconnection structure
US7113002B2 (en) 2003-05-15 2006-09-26 Fujikura Ltd. Transmission cable structure for GHz frequency band signals and connector used for transmission of GHz frequency band signals

Also Published As

Publication number Publication date
JP2812263B2 (en) 1998-10-22

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