JPH0996708A - Infrared reflector - Google Patents
Infrared reflectorInfo
- Publication number
- JPH0996708A JPH0996708A JP25244895A JP25244895A JPH0996708A JP H0996708 A JPH0996708 A JP H0996708A JP 25244895 A JP25244895 A JP 25244895A JP 25244895 A JP25244895 A JP 25244895A JP H0996708 A JPH0996708 A JP H0996708A
- Authority
- JP
- Japan
- Prior art keywords
- glass layer
- thin film
- substrate
- thickness
- base body
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
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- Optical Elements Other Than Lenses (AREA)
Abstract
Description
【０００１】[0001]
【発明の属する技術分野】本発明は赤外線の反射に用い
られる反射鏡に関する。更に詳しくはハロゲンヒータの
ような赤外線ヒータから放射された赤外線を反射するた
めの反射鏡に関するものである。TECHNICAL FIELD The present invention relates to a reflecting mirror used for reflecting infrared rays. More specifically, it relates to a reflector for reflecting infrared rays emitted from an infrared heater such as a halogen heater.
【０００２】[0002]
【従来の技術】従来、太陽エネルギ吸収装置に用いられ
る反射鏡として、アルミニウム、鋼板、ステンレスなど
の金属、合金又はプラスチックなどの適宜な材料で形成
された基板上にアルミニウム、銀などからなる金属反射
膜が被着され、この金属反射膜の表面にＳｉＯ2のよう
なガラス質膜からなる透明性無機質保護膜が形成された
反射鏡が開示されている（特開昭５７−４００３）。こ
の反射鏡によれば、紫外域から可視域及び赤外域まで広
い範囲で高い反射率を有し、反射膜が透明性無機質保護
膜で保護されているため、反射面が平滑で汚損しにく
く、反射率が低下することがなく、またこの保護膜によ
り耐酸性、耐アルカリ性、耐塩性に優れ、長期にわた
り、反射特性を維持できる特長がある。2. Description of the Related Art Conventionally, as a reflecting mirror used in a solar energy absorbing device, a metal reflection made of aluminum, silver, or the like is formed on a substrate formed of an appropriate material such as a metal such as aluminum, a steel plate, or stainless steel, an alloy, or a plastic. film is deposited, a reflecting mirror transparent inorganic protective film made of a glassy layer such as SiO 2 is formed is disclosed in the surface of the metal reflective layer (JP-a 57-4003). According to this reflector, it has a high reflectance in a wide range from the ultraviolet region to the visible region and the infrared region, and since the reflection film is protected by the transparent inorganic protective film, the reflection surface is smooth and hardly stained, The reflectivity is not reduced, and the protective film is excellent in acid resistance, alkali resistance, and salt resistance, and can maintain the reflection characteristics for a long time.
【０００３】[0003]
【発明が解決しようとする課題】しかし、上記反射鏡に
は、反射鏡が赤外線ヒータの放射熱のように１０００℃
以上の高温の熱線を受けてこれを反射すると、基板が金
属の場合には金属粒子が粒成長を起こし、また基板がプ
ラスチックの場合には熱変形を生じ、これにより金属反
射膜が剥離して、それぞれ反射率を低下させる不具合が
あった。本発明の目的は、高い反射率特性と高い耐熱性
を有する赤外線用反射鏡を提供することにある。However, in the above reflecting mirror, the reflecting mirror is 1000 ° C. like the radiant heat of an infrared heater.
When the above high-temperature heat rays are received and reflected, the metal particles cause grain growth when the substrate is a metal, and when the substrate is plastic, thermal deformation occurs, which causes the metal reflection film to peel off. There was a problem that the reflectance was lowered. An object of the present invention is to provide an infrared reflecting mirror having high reflectance characteristics and high heat resistance.
【０００４】[0004]
【課題を解決するための手段】請求項１に係る発明は、
図１の拡大図に示すように基体１１上にガラス層１２が
形成され、このガラス層１２上にＡｕ薄膜１３が形成さ
れた赤外線用反射鏡１０である。基体１１の表面が粗く
ても、ガラス層１２がこれを平滑化し、ガラス層上に形
成されたＡｕ薄膜１３の表面を歪みのない鏡面とし、高
い反射率特性を有するようにする。The invention according to claim 1 is
As shown in the enlarged view of FIG. 1, the infrared reflecting mirror 10 has a glass layer 12 formed on a substrate 11 and an Au thin film 13 formed on the glass layer 12. Even if the surface of the substrate 11 is rough, the glass layer 12 smoothes it so that the surface of the Au thin film 13 formed on the glass layer becomes a mirror surface without distortion and has a high reflectance characteristic.
【０００５】請求項２又は請求項３に係る発明は、請求
項１に係る発明であって、基体１１がＡｌ2Ｏ3（アルミ
ナ）、ＡｌＮ（窒化アルミニウム）、ＳｉＣ（炭化珪
素）等のセラミックス、又はＷ（タングステン）、Ｍｏ
（モリブデン）、Ｃｕ（銅）等の金属又はその合金から
なることを特徴とする。基体１１をセラミックスや高融
点の金属で構成することにより、高い耐熱性を有するよ
うにする。The invention according to claim 2 or 3 is the invention according to claim 1, wherein the substrate 11 is a ceramic such as Al 2 O 3 (alumina), AlN (aluminum nitride), or SiC (silicon carbide). , Or W (tungsten), Mo
(Molybdenum), Cu (copper), or other metal or an alloy thereof. The base 11 is made of ceramics or a high melting point metal so as to have high heat resistance.
【０００６】請求項４に係る発明は、請求項１ないし３
いずれかに係る発明であって、ガラス層１２が０．１μ
ｍ〜１００μｍの厚さに形成され、Ａｕ薄膜１３が０．
０１μｍ〜１０μｍの厚さに形成されたことを特徴とす
る。ガラス層１２は２μｍ〜４０μｍの厚さに形成され
ることが好ましい。ガラス層１２の厚さが０．１μｍ未
満では基体の表面平滑性が十分でなく、結果として高い
反射率を得ることが困難になり、１００μｍを越えると
基体全体の熱伝導性を極端に低下させる不具合がある。
またＡｕ薄膜１３は赤外線用反射鏡の用途に応じて０．
２μｍ〜４μｍの厚さに形成されることが好ましい。Ａ
ｕ薄膜１３は０．０１μｍ未満の厚さでは十分な反射率
が得られず、厚さが１０μｍを越えると経済的でない。The invention according to claim 4 relates to claims 1 to 3.
It is the invention which concerns on either, The glass layer 12 is 0.1 micrometer.
The Au thin film 13 is formed to have a thickness of 0.1 μm to 100 μm.
It is characterized in that it is formed to a thickness of 01 μm to 10 μm. The glass layer 12 is preferably formed with a thickness of 2 μm to 40 μm. If the thickness of the glass layer 12 is less than 0.1 μm, the surface smoothness of the substrate is not sufficient, and as a result, it becomes difficult to obtain a high reflectance. If it exceeds 100 μm, the thermal conductivity of the entire substrate is extremely reduced. There is a defect.
Further, the Au thin film 13 has a thickness of 0.
It is preferably formed to a thickness of 2 μm to 4 μm. A
If the thickness of the u thin film 13 is less than 0.01 μm, sufficient reflectance cannot be obtained, and if the thickness exceeds 10 μm, it is not economical.
【０００７】[0007]
【発明の実施の形態】本発明の基体１１は図１に示すよ
うに板状の基板でも、図３に示すようにバルク状でもよ
い。また反射面は、図１及び図３に示すように凹面で
も、図示しないが、凸面でも平面でもよい。また本発明
のガラス層１２を構成するガラス成分は、例えばＰｂＯ
−ＳｉＯ2−Ｂ2Ｏ3系にＡｌ2Ｏ3、アルカリ土類金属、
アルカリ金属等が添加された系である。このガラス層１
２は、熱膨張係数が基体の熱膨張係数に近いことが、ガ
ラス層形成時にクラック等の欠陥を生じないため、好ま
しい。例えば基体がＡｌ2Ｏ3からなる場合、ガラス層の
熱膨張係数はこの基体の熱膨張係数に近い６．８±１．
０×１０-6／℃であることが好ましく、またＡｌＮから
なる場合、ガラス層の熱膨張係数はこの基体の熱膨張係
数に近い４．４±１．０×１０-6／℃であることが好ま
しい。。ガラス層１２は、上記ガラス粉末を溶剤と混合
してガラスペーストとし、このガラスペーストを基体の
表面にスクリーン印刷、スプレーコーティング、ディッ
プコーティング、スピンコーティング等の方法により塗
布して乾燥した後、焼成しガラスを軟化させることによ
り形成される。BEST MODE FOR CARRYING OUT THE INVENTION The substrate 11 of the present invention may be a plate-shaped substrate as shown in FIG. 1 or a bulk-shaped substrate as shown in FIG. The reflecting surface may be a concave surface as shown in FIGS. 1 and 3, or may be a convex surface or a flat surface, though not shown. The glass component constituting the glass layer 12 of the present invention is, for example, PbO.
-SiO 2 -B 2 O 3 based on Al 2 O 3, alkaline earth metal,
It is a system to which an alkali metal or the like is added. This glass layer 1
No. 2 preferably has a coefficient of thermal expansion close to that of the substrate, since defects such as cracks do not occur when the glass layer is formed. For example, when the substrate is made of Al 2 O 3 , the coefficient of thermal expansion of the glass layer is close to that of the substrate of 6.8 ± 1.
0 × 10 −6 / ° C. is preferable, and in the case of AlN, the thermal expansion coefficient of the glass layer is 4.4 ± 1.0 × 10 −6 / ° C. close to the thermal expansion coefficient of this substrate. Is preferred. . The glass layer 12 is formed by mixing the above glass powder with a solvent to form a glass paste, coating the glass paste on the surface of a substrate by a method such as screen printing, spray coating, dip coating, spin coating, etc., drying, and then firing. It is formed by softening the glass.
【０００８】更に本発明のＡｕ薄膜１３は、スパッタリ
ング法、蒸着法等によりガラス層１２上に形成される。
この場合ガラス層に直接Ａｕ薄膜を形成するとＡｕ薄膜
の密着性に劣るため、ガラス層上に活性な金属であるＴ
ｉ薄膜を形成し、更にＴｉとＡｕの反応を抑制するため
のＷ薄膜をＴｉ薄膜上に形成した上でＡｕ薄膜を形成す
ることが好ましい。蒸着法では例えば純度９９．９％の
Ａｕを蒸着源とし、真空度２×１０-4Ｐａの条件で所定
時間蒸着を行うことによりＡｕ薄膜が形成される。また
いずれの方法でＡｕ薄膜を形成するにしても、Ａｕ薄膜
１３の上に更にＡｕめっきを施せば、反射率特性がより
向上し好ましい。Further, the Au thin film 13 of the present invention is formed on the glass layer 12 by a sputtering method, a vapor deposition method or the like.
In this case, if the Au thin film is directly formed on the glass layer, the adhesion of the Au thin film is deteriorated.
It is preferable to form the i thin film, further form the W thin film for suppressing the reaction between Ti and Au on the Ti thin film, and then form the Au thin film. In the vapor deposition method, for example, Au having a purity of 99.9% is used as a vapor deposition source, and vapor deposition is performed for a predetermined time under a condition of a vacuum degree of 2 × 10 −4 Pa to form an Au thin film. Whatever method is used to form the Au thin film, it is preferable to further apply Au plating on the Au thin film 13 because the reflectance characteristic is further improved.
【０００９】[0009]
【実施例】次に本発明の実施例を説明する。 ＜実施例１〜６＞図１及び図２に示すように、赤外線用
反射鏡１０の基板１１は厚さが１０ｍｍであって、この
基板１１の凹面は２次曲面に形成された。基板１１の材
質は表１に示される。この基板１１の凹面上のガラス層
１２は、凹面全体に軟化点が７５０℃のＰｂＯ−ＳｉＯ
2−Ｂ2Ｏ3系ガラス粒子を含むペーストをスプレーコー
ティング法により塗布し、このペーストを塗布した基板
を１５０℃で１０分間乾燥した後、大気中で１０００℃
で１時間焼成することにより約４μｍの厚さで形成され
た。この基板１１のガラス層１２上に厚さ１μｍのＡｕ
薄膜１３を含む薄膜を次の条件で高周波スパッタリング
法により形成した。即ち、それぞれ純度９９．９％、直
径１００ｍｍ×厚さ３ｍｍの形状のＴｉターゲット、Ｗ
ターゲット及びＡｕターゲットを用い、出力３００Ｗ、
基板回転数１０ｒｐｍの条件で所定時間スパッタリング
を行って、基板表面に厚さ０．１μｍのＴｉ薄膜、厚さ
０．１μｍのＷ薄膜及び厚さ１μｍのＡｕ薄膜をこの順
に形成した。赤外線用反射鏡１０の２次曲線の焦点近傍
には定格電圧２００Ｖ、消費電力１０００Ｗのハロゲン
ヒータ１４を設置した。Next, embodiments of the present invention will be described. <Examples 1 to 6> As shown in FIGS. 1 and 2, the substrate 11 of the infrared reflecting mirror 10 had a thickness of 10 mm, and the concave surface of the substrate 11 was formed into a quadric surface. The material of the substrate 11 is shown in Table 1. The glass layer 12 on the concave surface of the substrate 11 is made of PbO-SiO having a softening point of 750 ° C. on the entire concave surface.
A paste containing 2 -B 2 O 3 based glass particles was applied by spray coating, after the substrate coated with the paste was dried for 10 minutes at 0.99 ° C., 1000 ° C. in air
It was formed in a thickness of about 4 μm by firing for 1 hour. Au having a thickness of 1 μm is formed on the glass layer 12 of the substrate 11.
A thin film including the thin film 13 was formed by the high frequency sputtering method under the following conditions. That is, each has a purity of 99.9%, a Ti target having a diameter of 100 mm and a thickness of 3 mm, and W.
Output power of 300 W using target and Au target,
Sputtering was performed for a predetermined time at a substrate rotation speed of 10 rpm to form a Ti thin film having a thickness of 0.1 μm, a W thin film having a thickness of 0.1 μm, and an Au thin film having a thickness of 1 μm in this order on the substrate surface. A halogen heater 14 having a rated voltage of 200 V and a power consumption of 1000 W was installed near the focus of the quadratic curve of the infrared reflecting mirror 10.
【００１０】＜比較例１〜６＞比較のため、ガラス層を
形成しない以外は実施例１〜６と同様にして比較例１〜
６の赤外線用反射鏡を作製した。<Comparative Examples 1 to 6> For comparison, Comparative Examples 1 to 6 are the same as Examples 1 to 6 except that the glass layer is not formed.
The infrared reflecting mirror 6 was manufactured.
【００１１】＜比較試験と評価＞実施例１〜６及び比較
例１〜６の赤外線用反射鏡について、それぞれ赤外線の
反射率と耐熱性を比較試験した。その結果を表１に示
す。反射率は基板上のＡｕ薄膜に対して波長２．５μｍ
の赤外線を照射したときの赤外線の全反射率を測定する
ことにより求め、また耐熱性はＡｕ薄膜を形成した基板
を大気中、５００℃で１００時間、エージング処理した
後のＡｕ薄膜の外観変化の有無を目視により判断した。<Comparative Test and Evaluation> The infrared reflecting mirrors of Examples 1 to 6 and Comparative Examples 1 to 6 were subjected to a comparative test of infrared reflectance and heat resistance. Table 1 shows the results. The reflectance is 2.5 μm for Au thin film on the substrate.
The heat resistance is determined by measuring the total reflectance of infrared rays when irradiated with infrared rays, and the heat resistance of the Au thin films after the aging treatment of the substrate on which the Au thin film is formed at 500 ° C. for 100 hours is performed. The presence or absence was visually judged.
【００１２】[0012]
【表１】 [Table 1]
【００１３】表１から明らかなように、ガラス層のない
比較例１〜６では反射率が５０％以下であったのに対し
て、ガラス層を有する実施例１〜６では９５％以上の高
い反射率を示した。また金属の基板を用いた比較例４〜
６では高熱処理でＡｕ薄膜が変色したのに対して、実施
例１〜６ではＡｕ薄膜に変化がなく、高い耐熱性を示す
ことが判った。As is clear from Table 1, in Comparative Examples 1 to 6 having no glass layer, the reflectance was 50% or less, while in Examples 1 to 6 having the glass layer, the reflectance was as high as 95% or more. The reflectance was shown. Comparative Example 4 using a metal substrate
It was found that in Example 6, the Au thin film was discolored by high heat treatment, whereas in Examples 1 to 6, there was no change in the Au thin film and high heat resistance was exhibited.
【００１４】[0014]
【発明の効果】以上述べたように、本発明の赤外線用反
射鏡では、基体の表面が粗くても、ガラス層がこれを平
滑化し、ガラス層上に形成されたＡｕ薄膜の表面を歪み
のない鏡面とする。また基体をセラミックスや高融点の
金属で構成することにより、高い耐熱性を有する。特に
従来の反射鏡と比較して、反射率特性及び耐熱性に優れ
た効果を奏する。As described above, in the infrared reflecting mirror of the present invention, even if the surface of the substrate is rough, the glass layer smoothes the surface and the surface of the Au thin film formed on the glass layer is distorted. No mirror surface. Further, the substrate is made of ceramics or a metal having a high melting point, so that it has high heat resistance. In particular, the present invention exerts excellent effects on reflectance characteristics and heat resistance as compared with conventional reflecting mirrors.
【図１】本発明の赤外線用反射鏡の断面図。FIG. 1 is a sectional view of an infrared reflecting mirror of the present invention.
【図２】その斜視図。FIG. 2 is a perspective view thereof.
【図３】本発明の別の赤外線用反射鏡の断面図。FIG. 3 is a sectional view of another infrared reflecting mirror of the present invention.
１０ 赤外線用反射鏡 １１ 基板（基体） １２ ガラス層 １３ Ａｕ薄膜 １４ ハロゲンヒータ 10 Infrared Reflector 11 Substrate (Base) 12 Glass Layer 13 Au Thin Film 14 Halogen Heater
───────────────────────────────────────────────────── フロントページの続き (72)発明者 谷口 人文 山口県徳山市御影町１番１号 株式会社ト クヤマ内 ─────────────────────────────────────────────────── ─── Continuation of the front page (72) Inventor Hitomi Taniguchi 1-1, Mikagecho, Tokuyama City, Yamaguchi Prefecture Tokuyama Corporation
Claims (4)
前記ガラス層(12)上にＡｕ薄膜(13)が形成された赤外線
用反射鏡。1. A glass layer (12) is formed on a substrate (11),
An infrared reflecting mirror having an Au thin film (13) formed on the glass layer (12).
のセラミックスからなる請求項１記載の赤外線用反射
鏡。2. The substrate (11) is Al 2 O 3 , AlN or SiC.
The infrared reflecting mirror according to claim 1, which is made of the above ceramics.
合金からなる請求項１記載の赤外線用反射鏡。3. The infrared reflecting mirror according to claim 1, wherein the substrate (11) is made of W, Mo, Cu or an alloy thereof.
の厚さに形成され、Ａｕ薄膜(13)が０．０１μｍ〜１０
μｍの厚さに形成された請求項１ないし３いずれか記載
の赤外線用反射鏡。4. The glass layer (12) has a thickness of 0.1 μm to 100 μm.
Au thin film (13) is formed to a thickness of 0.01 μm to 10 μm.
The infrared reflecting mirror according to claim 1, which is formed to have a thickness of μm.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP25244895A JPH0996708A (en) | 1995-09-29 | 1995-09-29 | Infrared reflector |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP25244895A JPH0996708A (en) | 1995-09-29 | 1995-09-29 | Infrared reflector |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| JPH0996708A true JPH0996708A (en) | 1997-04-08 |
Family
ID=17237526
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP25244895A Withdrawn JPH0996708A (en) | 1995-09-29 | 1995-09-29 | Infrared reflector |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JPH0996708A (en) |
Cited By (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| WO2015033806A1 (en) * | 2013-09-06 | 2015-03-12 | イビデン株式会社 | Reflective mirror |
| WO2016010151A1 (en) * | 2014-07-18 | 2016-01-21 | イビデン株式会社 | Mirror |
-
1995
- 1995-09-29 JP JP25244895A patent/JPH0996708A/en not_active Withdrawn
Cited By (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| WO2015033806A1 (en) * | 2013-09-06 | 2015-03-12 | イビデン株式会社 | Reflective mirror |
| WO2016010151A1 (en) * | 2014-07-18 | 2016-01-21 | イビデン株式会社 | Mirror |
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Legal Events
| Date | Code | Title | Description |
|---|---|---|---|
| A300 | Withdrawal of application because of no request for examination |
Free format text: JAPANESE INTERMEDIATE CODE: A300 Effective date: 20021203 |