JPH1010431A5 - - Google Patents

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Publication number
JPH1010431A5
JPH1010431A5 JP1996180013A JP18001396A JPH1010431A5 JP H1010431 A5 JPH1010431 A5 JP H1010431A5 JP 1996180013 A JP1996180013 A JP 1996180013A JP 18001396 A JP18001396 A JP 18001396A JP H1010431 A5 JPH1010431 A5 JP H1010431A5
Authority
JP
Japan
Prior art keywords
optical system
lens group
catadioptric
imaging optical
reflecting mirror
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP1996180013A
Other languages
Japanese (ja)
Other versions
JPH1010431A (en
Filing date
Publication date
Application filed filed Critical
Priority to JP8180013A priority Critical patent/JPH1010431A/en
Priority claimed from JP8180013A external-priority patent/JPH1010431A/en
Priority to KR1019970021294A priority patent/KR980005328A/en
Priority to DE19726058A priority patent/DE19726058A1/en
Publication of JPH1010431A publication Critical patent/JPH1010431A/en
Publication of JPH1010431A5 publication Critical patent/JPH1010431A5/ja
Pending legal-status Critical Current

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Claims (9)

物体面からの光に基づいて前記物体面の中間像を形成するための第1結像光学系S1と、前記中間像からの光に基づいて前記物体面の縮小像を形成するための第2結像光学系S2と、前記中間像が形成される位置の近傍に配置され前記第1結像光学系S1を介した光を前記第2結像光学系S2に向かって偏向するための第1光路偏向部材M1とを備え、
前記第1結像光学系S1は凹面反射鏡CMを有し、前記物体面からの光は前記凹面反射鏡CMで反射された後に、前記第1結像光学系S1の光路中に前記中間像を形成し、
前記第1光路偏向部材M1は、前記第1結像光学系S1の光路中に配置された平面反射鏡を有し、
前記第1結像光学系S1の結像倍率をβ1とし、前記第1結像光学系S1の光軸と前記第2結像光学系S2の光軸との交点と前記物体面との間の軸上距離をL1とし、前記物体面と前記凹面反射鏡CMとの間の軸上距離をLMとしたとき、
0.75<|β1|<0.95
0.13<L1/LM<0.35
の条件を満足することを特徴とする反射屈折光学系。
a first imaging optical system S1 for forming an intermediate image of an object surface based on light from the object surface; a second imaging optical system S2 for forming a reduced image of the object surface based on light from the intermediate image; and a first optical path deflection member M1 that is disposed near a position where the intermediate image is formed and deflects light that has passed through the first imaging optical system S1 toward the second imaging optical system S2,
the first imaging optical system S1 has a concave reflecting mirror CM, and light from the object surface is reflected by the concave reflecting mirror CM and then forms the intermediate image in an optical path of the first imaging optical system S1;
the first optical path deflection member M1 has a plane reflecting mirror arranged in the optical path of the first imaging optical system S1,
When the imaging magnification of the first imaging optical system S1 is β1, the axial distance between the object surface and the intersection of the optical axis of the first imaging optical system S1 and the optical axis of the second imaging optical system S2 is L1, and the axial distance between the object surface and the concave reflecting mirror CM is LM,
0.75<|β1|<0.95
0.13<L1/LM<0.35
A catadioptric optical system characterized by satisfying the following condition.
前記第1結像光学系S1は、物体側から順に、第1レンズ群G1と、第2レンズ群G2と、前記凹面反射鏡CMとを有し、
前記物体面からの光は、前記第1レンズ群G1および前記第2レンズ群G2を介して前記凹面反射鏡CMで反射された後に、前記第1レンズ群G1と前記第2レンズ群G2との間の光路中に前記中間像を形成することを特徴とする請求項1に記載の反射屈折光学系。
The first imaging optical system S1 has, in order from the object side, a first lens group G1, a second lens group G2, and the concave reflecting mirror CM,
2. The catadioptric optical system according to claim 1, wherein light from the object surface is reflected by the concave reflecting mirror CM via the first lens group G1 and the second lens group G2, and then forms the intermediate image in the optical path between the first lens group G1 and the second lens group G2.
前記第2レンズ群G2は、少なくとも2つの互いに異なる負屈折力を有する屈折素子と、少なくとも2つの互いに異なる正屈折力を有する屈折素子とを有することを特徴とする請求項2に記載の反射屈折光学系。3. The catadioptric optical system according to claim 2, wherein the second lens group G2 has at least two refractive elements having mutually different negative refractive powers and at least two refractive elements having mutually different positive refractive powers. 前記第1レンズ群G1は、少なくとも3つの互いに異なる屈折力を有する屈折素子を有することを特徴とする請求項2または3に記載の反射屈折光学系。4. The catadioptric optical system according to claim 2, wherein the first lens group G1 has at least three refractive elements having different refractive powers. 前記第2結像光学系S2は、物体側から順に、全体として正の屈折力を有する第3レンズ群G3と、該第3レンズ群G3を介した光を偏向するための第2光路偏向部材M2と、全体として正の屈折力を有する第4レンズ群G4とを有し、
前記中間像からの光は、前記第3レンズ群G3、前記第2光路偏向部材M2、および前記第4レンズ群G4を介して、前記物体面の縮小像を形成することを特徴とする請求項2乃至4のいずれか1項に記載の反射屈折光学系。
The second imaging optical system S2 has, in order from the object side, a third lens group G3 having a positive refractive power as a whole, a second optical path deflection member M2 for deflecting light that has passed through the third lens group G3, and a fourth lens group G4 having a positive refractive power as a whole,
5. The catadioptric optical system according to claim 2, wherein light from the intermediate image passes through the third lens group G3, the second optical path deflection member M2, and the fourth lens group G4 to form a reduced image of the object plane.
前記反射屈折光学系を構成する屈折素子は、石英および蛍石の少なくともいずれか一方の光学材料から形成されていることを特徴とする請求項1乃至5のいずれか1項に記載の反射屈折光学系。6. The catadioptric system according to claim 1, wherein the refractive elements constituting the catadioptric system are made of at least one optical material selected from the group consisting of quartz and fluorite. 前記第2レンズ群G2は少なくとも1つの蛍石からなる正レンズを有し、
前記第2レンズ群G2中の蛍石からなる正レンズの屈折力の総和をφcとし、前記凹面反射鏡CMの屈折力をφmとしたとき、
0.5<|φc/φm|<1.6
の条件を満足することを特徴とする請求項2乃至6のいずれか1項に記載の反射屈折光学系。
the second lens group G2 has at least one positive lens made of fluorite,
When the sum of the refractive powers of the positive lenses made of fluorite in the second lens group G2 is φc and the refractive power of the concave reflecting mirror CM is φm,
0.5<|φc/φm|<1.6
7. The catadioptric optical system according to claim 2, wherein the following condition is satisfied:
第1面に配置される第1物体上のパターンを第2面に配置される第2物体上に投影する投影露光装置において、1. A projection exposure apparatus for projecting a pattern on a first object disposed on a first surface onto a second object disposed on a second surface,
前記第1物体上の前記パターンの像を前記第2物体上に投影するために、請求項1乃至7の何れか一項に記載の反射屈折光学系を備えることを特徴とする投影露光装置。8. A projection exposure apparatus comprising a catadioptric system according to claim 1, for projecting an image of the pattern on the first object onto the second object.
第1面に配置される第1物体上のパターンを第2面に配置される第2物体上に投影する投影露光方法において、1. A projection exposure method for projecting a pattern on a first object arranged on a first surface onto a second object arranged on a second surface, comprising:
請求項1乃至7の何れか一項に記載の反射屈折光学系を用いて、前記第1物体上の前記パターンの像を前記第2物体上に投影することを特徴とする投影露光方法。8. A projection exposure method, comprising: projecting an image of the pattern on the first object onto the second object using a catadioptric optical system according to claim 1.
JP8180013A 1996-06-20 1996-06-20 Catoptric system Pending JPH1010431A (en)

Priority Applications (3)

Application Number Priority Date Filing Date Title
JP8180013A JPH1010431A (en) 1996-06-20 1996-06-20 Catoptric system
KR1019970021294A KR980005328A (en) 1996-06-20 1997-05-28 Refraction optical system
DE19726058A DE19726058A1 (en) 1996-06-20 1997-06-19 Catadioptric system for object image projection ion photolithography

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP8180013A JPH1010431A (en) 1996-06-20 1996-06-20 Catoptric system

Publications (2)

Publication Number Publication Date
JPH1010431A JPH1010431A (en) 1998-01-16
JPH1010431A5 true JPH1010431A5 (en) 2004-11-04

Family

ID=16075939

Family Applications (1)

Application Number Title Priority Date Filing Date
JP8180013A Pending JPH1010431A (en) 1996-06-20 1996-06-20 Catoptric system

Country Status (3)

Country Link
JP (1) JPH1010431A (en)
KR (1) KR980005328A (en)
DE (1) DE19726058A1 (en)

Families Citing this family (20)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH09311278A (en) 1996-05-20 1997-12-02 Nikon Corp Catadioptric system
JP3395801B2 (en) 1994-04-28 2003-04-14 株式会社ニコン Catadioptric projection optical system, scanning projection exposure apparatus, and scanning projection exposure method
USRE38438E1 (en) 1994-08-23 2004-02-24 Nikon Corporation Catadioptric reduction projection optical system and exposure apparatus having the same
JPH08179204A (en) 1994-11-10 1996-07-12 Nikon Corp Projection optical system and projection exposure apparatus
JP3454390B2 (en) 1995-01-06 2003-10-06 株式会社ニコン Projection optical system, projection exposure apparatus, and projection exposure method
US6512631B2 (en) * 1996-07-22 2003-01-28 Kla-Tencor Corporation Broad-band deep ultraviolet/vacuum ultraviolet catadioptric imaging system
EP1079253A4 (en) * 1998-04-07 2004-09-01 Nikon Corp Projection exposure apparatus and method, and reflection refraction optical system
EP1293830A1 (en) 1998-06-08 2003-03-19 Nikon Corporation Projection exposure apparatus and method
DE69933973T2 (en) 1998-07-29 2007-06-28 Carl Zeiss Smt Ag CATADIOPRIC OPTICAL SYSTEM AND EQUIPPED EXPOSURE DEVICE
US6995930B2 (en) 1999-12-29 2006-02-07 Carl Zeiss Smt Ag Catadioptric projection objective with geometric beam splitting
TW538256B (en) 2000-01-14 2003-06-21 Zeiss Stiftung Microlithographic reduction projection catadioptric objective
JP4532647B2 (en) * 2000-02-23 2010-08-25 キヤノン株式会社 Exposure equipment
US7301605B2 (en) * 2000-03-03 2007-11-27 Nikon Corporation Projection exposure apparatus and method, catadioptric optical system and manufacturing method of devices
JP2004514943A (en) 2000-11-28 2004-05-20 カール・ツアイス・エスエムテイ・アーゲー Catadioptric projection system for 157nm lithography
DE10127227A1 (en) 2001-05-22 2002-12-05 Zeiss Carl Catadioptric reduction lens
US7046459B1 (en) 2001-12-18 2006-05-16 Carl Zeiss Smt Ag Catadioptric reductions lens
US8208198B2 (en) 2004-01-14 2012-06-26 Carl Zeiss Smt Gmbh Catadioptric projection objective
US20080151365A1 (en) 2004-01-14 2008-06-26 Carl Zeiss Smt Ag Catadioptric projection objective
KR101213831B1 (en) 2004-05-17 2012-12-24 칼 짜이스 에스엠티 게엠베하 Catadioptric projection objective with intermediate image
DE102005033564A1 (en) * 2005-07-19 2007-02-01 Carl Zeiss Smt Ag Projective lens for e.g. optical interferometer, has correction surface compensating non-rotation symmetrical aberration, where plane is pupil plane or pupil near plane of lens, and another plane is field plane or field near plane of lens

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