JPH1010431A5 - - Google Patents
Info
- Publication number
- JPH1010431A5 JPH1010431A5 JP1996180013A JP18001396A JPH1010431A5 JP H1010431 A5 JPH1010431 A5 JP H1010431A5 JP 1996180013 A JP1996180013 A JP 1996180013A JP 18001396 A JP18001396 A JP 18001396A JP H1010431 A5 JPH1010431 A5 JP H1010431A5
- Authority
- JP
- Japan
- Prior art keywords
- optical system
- lens group
- catadioptric
- imaging optical
- reflecting mirror
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
Claims (9)
前記第1結像光学系S1は凹面反射鏡CMを有し、前記物体面からの光は前記凹面反射鏡CMで反射された後に、前記第1結像光学系S1の光路中に前記中間像を形成し、
前記第1光路偏向部材M1は、前記第1結像光学系S1の光路中に配置された平面反射鏡を有し、
前記第1結像光学系S1の結像倍率をβ1とし、前記第1結像光学系S1の光軸と前記第2結像光学系S2の光軸との交点と前記物体面との間の軸上距離をL1とし、前記物体面と前記凹面反射鏡CMとの間の軸上距離をLMとしたとき、
0.75<|β1|<0.95
0.13<L1/LM<0.35
の条件を満足することを特徴とする反射屈折光学系。a first imaging optical system S1 for forming an intermediate image of an object surface based on light from the object surface; a second imaging optical system S2 for forming a reduced image of the object surface based on light from the intermediate image; and a first optical path deflection member M1 that is disposed near a position where the intermediate image is formed and deflects light that has passed through the first imaging optical system S1 toward the second imaging optical system S2,
the first imaging optical system S1 has a concave reflecting mirror CM, and light from the object surface is reflected by the concave reflecting mirror CM and then forms the intermediate image in an optical path of the first imaging optical system S1;
the first optical path deflection member M1 has a plane reflecting mirror arranged in the optical path of the first imaging optical system S1,
When the imaging magnification of the first imaging optical system S1 is β1, the axial distance between the object surface and the intersection of the optical axis of the first imaging optical system S1 and the optical axis of the second imaging optical system S2 is L1, and the axial distance between the object surface and the concave reflecting mirror CM is LM,
0.75<|β1|<0.95
0.13<L1/LM<0.35
A catadioptric optical system characterized by satisfying the following condition.
前記物体面からの光は、前記第1レンズ群G1および前記第2レンズ群G2を介して前記凹面反射鏡CMで反射された後に、前記第1レンズ群G1と前記第2レンズ群G2との間の光路中に前記中間像を形成することを特徴とする請求項1に記載の反射屈折光学系。The first imaging optical system S1 has, in order from the object side, a first lens group G1, a second lens group G2, and the concave reflecting mirror CM,
2. The catadioptric optical system according to claim 1, wherein light from the object surface is reflected by the concave reflecting mirror CM via the first lens group G1 and the second lens group G2, and then forms the intermediate image in the optical path between the first lens group G1 and the second lens group G2.
前記中間像からの光は、前記第3レンズ群G3、前記第2光路偏向部材M2、および前記第4レンズ群G4を介して、前記物体面の縮小像を形成することを特徴とする請求項2乃至4のいずれか1項に記載の反射屈折光学系。The second imaging optical system S2 has, in order from the object side, a third lens group G3 having a positive refractive power as a whole, a second optical path deflection member M2 for deflecting light that has passed through the third lens group G3, and a fourth lens group G4 having a positive refractive power as a whole,
5. The catadioptric optical system according to claim 2, wherein light from the intermediate image passes through the third lens group G3, the second optical path deflection member M2, and the fourth lens group G4 to form a reduced image of the object plane.
前記第2レンズ群G2中の蛍石からなる正レンズの屈折力の総和をφcとし、前記凹面反射鏡CMの屈折力をφmとしたとき、
0.5<|φc/φm|<1.6
の条件を満足することを特徴とする請求項2乃至6のいずれか1項に記載の反射屈折光学系。the second lens group G2 has at least one positive lens made of fluorite,
When the sum of the refractive powers of the positive lenses made of fluorite in the second lens group G2 is φc and the refractive power of the concave reflecting mirror CM is φm,
0.5<|φc/φm|<1.6
7. The catadioptric optical system according to claim 2, wherein the following condition is satisfied:
前記第1物体上の前記パターンの像を前記第2物体上に投影するために、請求項1乃至7の何れか一項に記載の反射屈折光学系を備えることを特徴とする投影露光装置。8. A projection exposure apparatus comprising a catadioptric system according to claim 1, for projecting an image of the pattern on the first object onto the second object.
請求項1乃至7の何れか一項に記載の反射屈折光学系を用いて、前記第1物体上の前記パターンの像を前記第2物体上に投影することを特徴とする投影露光方法。8. A projection exposure method, comprising: projecting an image of the pattern on the first object onto the second object using a catadioptric optical system according to claim 1.
Priority Applications (3)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP8180013A JPH1010431A (en) | 1996-06-20 | 1996-06-20 | Catoptric system |
| KR1019970021294A KR980005328A (en) | 1996-06-20 | 1997-05-28 | Refraction optical system |
| DE19726058A DE19726058A1 (en) | 1996-06-20 | 1997-06-19 | Catadioptric system for object image projection ion photolithography |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP8180013A JPH1010431A (en) | 1996-06-20 | 1996-06-20 | Catoptric system |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| JPH1010431A JPH1010431A (en) | 1998-01-16 |
| JPH1010431A5 true JPH1010431A5 (en) | 2004-11-04 |
Family
ID=16075939
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP8180013A Pending JPH1010431A (en) | 1996-06-20 | 1996-06-20 | Catoptric system |
Country Status (3)
| Country | Link |
|---|---|
| JP (1) | JPH1010431A (en) |
| KR (1) | KR980005328A (en) |
| DE (1) | DE19726058A1 (en) |
Families Citing this family (20)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPH09311278A (en) | 1996-05-20 | 1997-12-02 | Nikon Corp | Catadioptric system |
| JP3395801B2 (en) | 1994-04-28 | 2003-04-14 | 株式会社ニコン | Catadioptric projection optical system, scanning projection exposure apparatus, and scanning projection exposure method |
| USRE38438E1 (en) | 1994-08-23 | 2004-02-24 | Nikon Corporation | Catadioptric reduction projection optical system and exposure apparatus having the same |
| JPH08179204A (en) | 1994-11-10 | 1996-07-12 | Nikon Corp | Projection optical system and projection exposure apparatus |
| JP3454390B2 (en) | 1995-01-06 | 2003-10-06 | 株式会社ニコン | Projection optical system, projection exposure apparatus, and projection exposure method |
| US6512631B2 (en) * | 1996-07-22 | 2003-01-28 | Kla-Tencor Corporation | Broad-band deep ultraviolet/vacuum ultraviolet catadioptric imaging system |
| EP1079253A4 (en) * | 1998-04-07 | 2004-09-01 | Nikon Corp | Projection exposure apparatus and method, and reflection refraction optical system |
| EP1293830A1 (en) | 1998-06-08 | 2003-03-19 | Nikon Corporation | Projection exposure apparatus and method |
| DE69933973T2 (en) | 1998-07-29 | 2007-06-28 | Carl Zeiss Smt Ag | CATADIOPRIC OPTICAL SYSTEM AND EQUIPPED EXPOSURE DEVICE |
| US6995930B2 (en) | 1999-12-29 | 2006-02-07 | Carl Zeiss Smt Ag | Catadioptric projection objective with geometric beam splitting |
| TW538256B (en) | 2000-01-14 | 2003-06-21 | Zeiss Stiftung | Microlithographic reduction projection catadioptric objective |
| JP4532647B2 (en) * | 2000-02-23 | 2010-08-25 | キヤノン株式会社 | Exposure equipment |
| US7301605B2 (en) * | 2000-03-03 | 2007-11-27 | Nikon Corporation | Projection exposure apparatus and method, catadioptric optical system and manufacturing method of devices |
| JP2004514943A (en) | 2000-11-28 | 2004-05-20 | カール・ツアイス・エスエムテイ・アーゲー | Catadioptric projection system for 157nm lithography |
| DE10127227A1 (en) | 2001-05-22 | 2002-12-05 | Zeiss Carl | Catadioptric reduction lens |
| US7046459B1 (en) | 2001-12-18 | 2006-05-16 | Carl Zeiss Smt Ag | Catadioptric reductions lens |
| US8208198B2 (en) | 2004-01-14 | 2012-06-26 | Carl Zeiss Smt Gmbh | Catadioptric projection objective |
| US20080151365A1 (en) | 2004-01-14 | 2008-06-26 | Carl Zeiss Smt Ag | Catadioptric projection objective |
| KR101213831B1 (en) | 2004-05-17 | 2012-12-24 | 칼 짜이스 에스엠티 게엠베하 | Catadioptric projection objective with intermediate image |
| DE102005033564A1 (en) * | 2005-07-19 | 2007-02-01 | Carl Zeiss Smt Ag | Projective lens for e.g. optical interferometer, has correction surface compensating non-rotation symmetrical aberration, where plane is pupil plane or pupil near plane of lens, and another plane is field plane or field near plane of lens |
-
1996
- 1996-06-20 JP JP8180013A patent/JPH1010431A/en active Pending
-
1997
- 1997-05-28 KR KR1019970021294A patent/KR980005328A/en not_active Withdrawn
- 1997-06-19 DE DE19726058A patent/DE19726058A1/en not_active Withdrawn
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