JPH10115914A5 - - Google Patents

Info

Publication number
JPH10115914A5
JPH10115914A5 JP1997258736A JP25873697A JPH10115914A5 JP H10115914 A5 JPH10115914 A5 JP H10115914A5 JP 1997258736 A JP1997258736 A JP 1997258736A JP 25873697 A JP25873697 A JP 25873697A JP H10115914 A5 JPH10115914 A5 JP H10115914A5
Authority
JP
Japan
Prior art keywords
group
composition
carbon atoms
polymeric binder
photosensitive composition
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP1997258736A
Other languages
English (en)
Japanese (ja)
Other versions
JP4060411B2 (ja
JPH10115914A (ja
Filing date
Publication date
Priority claimed from US08/719,100 external-priority patent/US5705309A/en
Application filed filed Critical
Publication of JPH10115914A publication Critical patent/JPH10115914A/ja
Publication of JPH10115914A5 publication Critical patent/JPH10115914A5/ja
Application granted granted Critical
Publication of JP4060411B2 publication Critical patent/JP4060411B2/ja
Anticipated expiration legal-status Critical
Expired - Fee Related legal-status Critical Current

Links

JP25873697A 1996-09-24 1997-09-24 感光性組成物及びそれを含む感光性要素並びにネガ像形成方法 Expired - Fee Related JP4060411B2 (ja)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
US08/719100 1996-09-24
US08/719,100 US5705309A (en) 1996-09-24 1996-09-24 Photosensitive composition and element containing polyazide and an infrared absorber in a photocrosslinkable binder

Publications (3)

Publication Number Publication Date
JPH10115914A JPH10115914A (ja) 1998-05-06
JPH10115914A5 true JPH10115914A5 (2) 2005-06-09
JP4060411B2 JP4060411B2 (ja) 2008-03-12

Family

ID=24888754

Family Applications (1)

Application Number Title Priority Date Filing Date
JP25873697A Expired - Fee Related JP4060411B2 (ja) 1996-09-24 1997-09-24 感光性組成物及びそれを含む感光性要素並びにネガ像形成方法

Country Status (3)

Country Link
US (1) US5705309A (2)
JP (1) JP4060411B2 (2)
DE (1) DE19738134A1 (2)

Families Citing this family (32)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US6071667A (en) * 1995-04-13 2000-06-06 Hitachi Chemical Co., Ltd. Photosensitive resin composition containing a photosensitive polyamide resin
ES2114521T3 (es) 1996-04-23 2000-01-16 Kodak Polychrome Graphics Co Precursor de la forma para impresion litografica y su utilizacion en la formacion de imagenes por calor.
US6037085A (en) * 1996-06-19 2000-03-14 Printing Development Inc. Photoresists and method for making printing plates
US6489078B1 (en) * 1996-07-19 2002-12-03 Agfa-Gevaert IR radiation-sensitive imaging element and a method for producing lithographic plates therewith
US5849809A (en) * 1996-08-29 1998-12-15 Xerox Corporation Hydroxyalkylated high performance curable polymers
US6117610A (en) * 1997-08-08 2000-09-12 Kodak Polychrome Graphics Llc Infrared-sensitive diazonaphthoquinone imaging composition and element containing non-basic IR absorbing material and methods of use
US6090532A (en) * 1997-03-21 2000-07-18 Kodak Polychrome Graphics Llc Positive-working infrared radiation sensitive composition and printing plate and imaging method
US6063544A (en) * 1997-03-21 2000-05-16 Kodak Polychrome Graphics Llc Positive-working printing plate and method of providing a positive image therefrom using laser imaging
EP0996869A1 (en) 1997-07-05 2000-05-03 Kodak Polychrome Graphics LLC Pattern-forming methods and radiation sensitive materials
US6060217A (en) * 1997-09-02 2000-05-09 Kodak Polychrome Graphics Llc Thermal lithographic printing plates
CN1297430A (zh) * 1999-03-31 2001-05-30 三洋化成工业株式会社 光敏化合物和光敏组合物
US6232031B1 (en) 1999-11-08 2001-05-15 Ano-Coil Corporation Positive-working, infrared-sensitive lithographic printing plate and method of imaging
US6740464B2 (en) * 2000-01-14 2004-05-25 Fuji Photo Film Co., Ltd. Lithographic printing plate precursor
US7709184B2 (en) * 2000-09-06 2010-05-04 Gary Ganghui Teng Method of on-press developing thermosensitive lithographic printing plate
US6482571B1 (en) 2000-09-06 2002-11-19 Gary Ganghui Teng On-press development of thermosensitive lithographic plates
US6576401B2 (en) 2001-09-14 2003-06-10 Gary Ganghui Teng On-press developable thermosensitive lithographic plates utilizing an onium or borate salt initiator
US6541183B2 (en) 2001-06-04 2003-04-01 Gary Ganghui Teng Negative lithographic printing plates having a semisolid radiation-sensitive layer
US6548222B2 (en) 2000-09-06 2003-04-15 Gary Ganghui Teng On-press developable thermosensitive lithographic printing plates
US7089856B2 (en) 2000-09-06 2006-08-15 Gary Ganghui Teng On-press development of thermosensitive lithographic printing member
US6495310B2 (en) 2000-10-30 2002-12-17 Gary Ganghui Teng Lithographic plate having conformal overcoat and photosensitive layer on a rough substrate
JP2002170667A (ja) * 2000-11-30 2002-06-14 Hitachi Ltd 有機エレクトロルミネッセンス素子、その製造方法及び画像表示装置
US6596460B2 (en) 2000-12-29 2003-07-22 Kodak Polychrome Graphics Llc Polyvinyl acetals having azido groups and use thereof in radiation-sensitive compositions
US6410208B1 (en) * 2001-04-18 2002-06-25 Gary Ganghui Teng Lithographic printing plates having a thermo-deactivatable photosensitive layer
FR2831534B1 (fr) * 2001-10-29 2004-01-30 Oreal Composition photoactivable et utilisations
US20040192876A1 (en) * 2002-11-18 2004-09-30 Nigel Hacker Novolac polymer planarization films with high temparature stability
EP1649322A4 (en) * 2003-07-17 2007-09-19 Honeywell Int Inc PLANARIZATION FILMS FOR ADVANCED MICRO-ELECTRONIC APPLICATIONS AND EQUIPMENT AND METHOD FOR THE PRODUCTION THEREOF
US7351773B2 (en) 2003-07-31 2008-04-01 Fujifilm Corporation Polymerizable composition
EP1614541A3 (en) 2004-07-08 2006-06-07 Agfa-Gevaert Method of making a lithographic printing plate.
US20060160016A1 (en) * 2004-10-12 2006-07-20 Presstek, Inc. Inkjet-imageable lithographic printing members and methods of preparing and imaging them
WO2014094080A1 (pt) 2012-12-19 2014-06-26 Ibf Indústria Brasileira De Filmes S/A Composição sensível à radiação em regiões do espectro eletromagnético para fins de impressão, chapa para impressão compreendendo a referida composição, uso da referida composição e processo de revelação de imagem
TWI635359B (zh) * 2017-06-02 2018-09-11 律勝科技股份有限公司 感光性聚醯亞胺樹脂組合物及應用其之覆蓋膜的製造方法
US10676445B1 (en) 2019-06-06 2020-06-09 The United States Of America As Represented By The Secretary Of The Navy Synthesis of aminopyrimidine-based energetic materials

Family Cites Families (10)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS4825050B1 (2) * 1968-11-07 1973-07-26
US4139390A (en) * 1977-02-10 1979-02-13 Eastman Kodak Company Presensitized printing plate having a print-out image
US4622284A (en) * 1984-03-01 1986-11-11 Digital Recording Corporation Process of using metal azide recording media with laser
DE3644162A1 (de) * 1986-12-23 1988-07-07 Hoechst Ag Polyvinylacetal, dieses enthaltendes lichtempfindliches gemisch und daraus hergestelltes aufzeichnungsmaterial
US5254431A (en) * 1988-02-03 1993-10-19 Vickers Plc Radiation-sensitive polymers having sulfonyl urthane side chains and azide containing side chains in a mixture with diazo compounds containing
GB8918161D0 (en) * 1989-08-09 1989-09-20 Du Pont Improvements in or relating to radiation sensitive compounds
JPH0442229A (ja) * 1990-06-08 1992-02-12 Fujitsu Ltd レジスト材料およびパターンの形成方法
US6027849A (en) * 1992-03-23 2000-02-22 Imation Corp. Ablative imageable element
US5278023A (en) * 1992-11-16 1994-01-11 Minnesota Mining And Manufacturing Company Propellant-containing thermal transfer donor elements
EP0654711B1 (en) * 1993-11-22 1999-06-02 Ciba SC Holding AG Compositions for making structured color images and application thereof

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