JPH1012377A - Method of manufacturing active matrix type organic EL display - Google Patents

Method of manufacturing active matrix type organic EL display

Info

Publication number
JPH1012377A
JPH1012377A JP8158671A JP15867196A JPH1012377A JP H1012377 A JPH1012377 A JP H1012377A JP 8158671 A JP8158671 A JP 8158671A JP 15867196 A JP15867196 A JP 15867196A JP H1012377 A JPH1012377 A JP H1012377A
Authority
JP
Japan
Prior art keywords
light emitting
organic light
emitting layer
organic
display
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP8158671A
Other languages
Japanese (ja)
Other versions
JP3036436B2 (en
Inventor
Tatsuya Shimoda
達也 下田
Satoru Miyashita
悟 宮下
Hiroshi Kiguchi
浩史 木口
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Seiko Epson Corp
Original Assignee
Seiko Epson Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
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Priority to JP8158671A priority Critical patent/JP3036436B2/en
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Application granted granted Critical
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Classifications

    • HELECTRICITY
    • H10SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10KORGANIC ELECTRIC SOLID-STATE DEVICES
    • H10K59/00Integrated devices, or assemblies of multiple devices, comprising at least one organic light-emitting element covered by group H10K50/00
    • H10K59/30Devices specially adapted for multicolour light emission
    • H10K59/35Devices specially adapted for multicolour light emission comprising red-green-blue [RGB] subpixels
    • HELECTRICITY
    • H10SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10KORGANIC ELECTRIC SOLID-STATE DEVICES
    • H10K50/00Organic light-emitting devices
    • H10K50/10OLEDs or polymer light-emitting diodes [PLED]
    • H10K50/17Carrier injection layers
    • HELECTRICITY
    • H10SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10KORGANIC ELECTRIC SOLID-STATE DEVICES
    • H10K85/00Organic materials used in the body or electrodes of devices covered by this subclass
    • H10K85/10Organic polymers or oligomers
    • H10K85/111Organic polymers or oligomers comprising aromatic, heteroaromatic, or aryl chains, e.g. polyaniline, polyphenylene or polyphenylene vinylene
    • H10K85/114Poly-phenylenevinylene; Derivatives thereof
    • HELECTRICITY
    • H10SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10KORGANIC ELECTRIC SOLID-STATE DEVICES
    • H10K2102/00Constructional details relating to the organic devices covered by this subclass
    • H10K2102/301Details of OLEDs
    • H10K2102/302Details of OLEDs of OLED structures
    • H10K2102/3023Direction of light emission
    • H10K2102/3026Top emission
    • HELECTRICITY
    • H10SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10KORGANIC ELECTRIC SOLID-STATE DEVICES
    • H10K59/00Integrated devices, or assemblies of multiple devices, comprising at least one organic light-emitting element covered by group H10K50/00
    • H10K59/10OLED displays
    • H10K59/12Active-matrix OLED [AMOLED] displays
    • H10K59/123Connection of the pixel electrodes to the thin film transistors [TFT]
    • HELECTRICITY
    • H10SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10KORGANIC ELECTRIC SOLID-STATE DEVICES
    • H10K71/00Manufacture or treatment specially adapted for the organic devices covered by this subclass
    • H10K71/10Deposition of organic active material
    • H10K71/12Deposition of organic active material using liquid deposition, e.g. spin coating
    • H10K71/13Deposition of organic active material using liquid deposition, e.g. spin coating using printing techniques, e.g. ink-jet printing or screen printing
    • H10K71/135Deposition of organic active material using liquid deposition, e.g. spin coating using printing techniques, e.g. ink-jet printing or screen printing using ink-jet printing
    • HELECTRICITY
    • H10SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10KORGANIC ELECTRIC SOLID-STATE DEVICES
    • H10K71/00Manufacture or treatment specially adapted for the organic devices covered by this subclass
    • H10K71/40Thermal treatment, e.g. annealing in the presence of a solvent vapour

Landscapes

  • Physics & Mathematics (AREA)
  • Optics & Photonics (AREA)
  • Chemical & Material Sciences (AREA)
  • Engineering & Computer Science (AREA)
  • Materials Engineering (AREA)
  • Ink Jet (AREA)
  • Electroluminescent Light Sources (AREA)

Abstract

(57)【要約】 【解決手段】従来、パターニングができないとされた有
機EL材料をインクジェット方式により形成および配列
することで、赤、緑、青の発光色を備える有機発光層を
画素毎に任意にパターニングすることが可能となった。
これにより、フルカラー表示のアクティブマトリックス
型有機EL表示体を実現した。 【効果】安価で大画面のフルカラー表示体が製造可能と
なり、効果は大である。
(57) Abstract: By forming and arranging an organic EL material which is conventionally considered to be unpatternable by an ink-jet method, an organic light-emitting layer having red, green, and blue luminescent colors can be arbitrarily provided for each pixel. It became possible to pattern.
Thus, an active matrix type organic EL display of full color display was realized. [Effect] An inexpensive and large-screen full-color display can be manufactured, and the effect is great.

Description

【発明の詳細な説明】DETAILED DESCRIPTION OF THE INVENTION

【0001】[0001]

【発明の属する技術分野】本発明は、薄膜トランジスタ
を用いたアクティブマトリックス型のEL表示体のイン
クジェット方式を用いた製造方法に関する。
[0001] 1. Field of the Invention [0002] The present invention relates to a method of manufacturing an active matrix type EL display using thin film transistors using an ink jet system.

【0002】[0002]

【従来の技術】有機EL素子は、蛍光性有機化合物を含
む薄膜を、陰極と陽極とで挟んだ構成を有し、前記薄膜
に電子および正孔(ホール)を注入して再結合させるこ
とにより励起子(エキシトン)を生成させ、このエキシ
トンが失活する際の光の放出(蛍光・燐光)を利用して
発光させる素子である。
2. Description of the Related Art An organic EL device has a structure in which a thin film containing a fluorescent organic compound is sandwiched between a cathode and an anode. Electrons and holes are injected into the thin film and recombined. This is an element that generates excitons and emits light by utilizing light emission (fluorescence / phosphorescence) when the excitons are deactivated.

【0003】この有機EL素子の特徴は、10V以下の
低電圧で100〜100000 cd/m2 程度の高輝度の
面発光が可能であり、また蛍光物質の種類を選択するこ
とにより青色から赤色までの発光が可能なことである。
[0003] The features of this organic EL device are that it can emit a high-intensity surface light of about 100 to 100000 cd / m2 at a low voltage of 10 V or less, and can change the color from blue to red by selecting the type of fluorescent substance. Light emission is possible.

【0004】有機EL素子は、安価な大面積フルカラー
表示素子を実現するものとして注目を集めている(電子
情報通信学会技術報告、第89巻、NO.106、49
ページ、1989年)。報告によると、強い蛍光を発す
る有機色素を発光層に使用し、青、緑、赤色の明るい発
光を得ている。これは、薄膜状で強い蛍光を発し、ピン
ホール欠陥の少ない有機色素を用いたことで、高輝度な
フルカラー表示を実現できたと考えられている。
[0004] Organic EL elements have attracted attention as realizing inexpensive large-area full-color display elements (IEICE Technical Report, Vol. 89, Nos. 106, 49).
1989). According to reports, organic dyes that emit strong fluorescence are used in the light-emitting layer, and bright blue, green, and red light is emitted. It is thought that a high-luminance full-color display could be realized by using an organic dye which emits strong fluorescence in a thin film state and has few pinhole defects.

【0005】更に特開平5−78655号公報には、有
機発光層の成分が有機電荷材料と有機発光材料の混合物
からなる薄膜層を設け、濃度消光を防止して発光材料の
選択幅を広げ、高輝度なフルカラー素子とする旨が提案
されている。
Further, Japanese Patent Application Laid-Open No. 5-78655 discloses a thin film layer in which the components of the organic light emitting layer are composed of a mixture of an organic charge material and an organic light emitting material. It has been proposed to use a high-luminance full-color element.

【0006】しかし、いずれの報告にも、実際のフルカ
ラー表示パネルの構成や製造方法については言及されて
いない。
[0006] However, none of the reports mentions the actual configuration or manufacturing method of a full-color display panel.

【0007】[0007]

【発明が解決しようとする課題】前述の有機色素を用い
た有機薄膜EL素子は、青、緑、赤の発光を示す。しか
し、よく知られているように、フルカラー表示体を実現
するためには、3原色を発光する有機発光層を画素毎に
配置する必要がある。従来、有機発光層をパターニング
する技術は非常に困難とされていた。原因は、一つは反
射電極材の金属表面が不安定であり、蒸着のパターニン
グ精度が出ないという点である。2つめは、正孔注入層
および有機発光層を形成するポリマーや前駆体がフォト
リソグラフィー等のパターニング工程に対して耐性が無
いという点である。
The organic thin film EL device using the above-mentioned organic dye emits blue, green and red light. However, as is well known, in order to realize a full-color display, it is necessary to arrange an organic light-emitting layer for emitting three primary colors for each pixel. Conventionally, a technique for patterning an organic light emitting layer has been extremely difficult. One of the causes is that the metal surface of the reflective electrode material is unstable, and the patterning accuracy of vapor deposition is not high. Second, polymers and precursors forming the hole injection layer and the organic light emitting layer are not resistant to a patterning step such as photolithography.

【0008】本発明は、上述したような課題を解決する
ものであり、その目的は、有機発光層をインクジェット
方式により画素毎にパターニングしたアクティブマトリ
ックス型EL表示体の製造方法を提供することにある。
An object of the present invention is to solve the above-mentioned problems, and an object of the present invention is to provide a method of manufacturing an active matrix type EL display in which an organic light emitting layer is patterned for each pixel by an ink jet method. .

【0009】[0009]

【課題を解決するための手段】本発明に関わるアクティ
ブマトリックス型有機EL表示体の製造方法は、薄膜ト
ランジスタを有するガラス基板に形成された透明画素電
極上層に正孔注入層が形成され、この上層に少なくとも
各画素毎に赤、緑、青より選択された発光色を有する有
機発光層が形成され、更にこの上層に反射電極が形成さ
れるアクティブマトリックス型有機EL表示体の製造方
法において、前記有機発光層の形成および配列がインク
ジェット方式によりなされることを特徴とし、また、薄
膜トランジスタを有するガラス基板に形成された透明画
素電極上層に少なくとも各画素毎に赤、緑、青より選択
された発光色を有する有機発光層が形成され、更にこの
上層に反射電極が形成されるアクティブマトリックス型
有機EL表示体の製造方法において、前記有機発光層の
形成および配列がインクジェット方式によりなされるこ
とを特徴とする。
According to a method of manufacturing an active matrix type organic EL display device according to the present invention, a hole injection layer is formed on a transparent pixel electrode formed on a glass substrate having a thin film transistor. An organic light emitting layer having an emission color selected from at least red, green, and blue is formed for each pixel, and a reflective electrode is formed on the organic light emitting layer. The layers are formed and arranged by an ink-jet method, and at least each pixel has a light emission color selected from red, green, and blue on an upper layer of a transparent pixel electrode formed on a glass substrate having a thin film transistor. An active matrix organic EL display in which an organic light emitting layer is formed and a reflective electrode is further formed thereon In production method, formation and arrangement of the organic light emitting layer is characterized by being made by an inkjet method.

【0010】更に、薄膜トランジスタを有するガラス基
板に形成された反射画素電極上層に少なくとも各画素毎
に赤、緑、青より選択された発光色を有する有機発光層
が形成され、この上層に正孔注入層が形成され、更にこ
の上層に透明電極が形成されるアクティブマトリックス
型有機EL表示体の製造方法において、前記有機発光層
の形成および配列がインクジェット方式によりなされる
ことを特徴とし、また、薄膜トランジスタを有するガラ
ス基板に形成された反射画素電極上層に少なくとも各画
素毎に赤、緑、青より選択された発光色を有する有機発
光層が形成され、更にこの上層に透明電極が形成される
アクティブマトリックス型有機EL表示体の製造方法に
おいて、前記有機発光層の形成および配列がインクジェ
ット方式によりなされることを特徴とする。
Further, an organic light emitting layer having a luminescent color selected from red, green and blue is formed at least for each pixel on an upper layer of the reflective pixel electrode formed on the glass substrate having the thin film transistor. A method for manufacturing an active matrix type organic EL display, wherein a layer is formed, and a transparent electrode is further formed on the layer, wherein the formation and arrangement of the organic light emitting layer are performed by an ink jet method. An active matrix type in which an organic light emitting layer having a light emission color selected from red, green, and blue is formed at least for each pixel on a reflective pixel electrode upper layer formed on a glass substrate having the transparent electrode formed thereon. In the method of manufacturing an organic EL display, the formation and arrangement of the organic light emitting layer is performed by an inkjet method. Characterized in that it is.

【0011】本発明は、要するに図3に示すように、基
板上に形成された信号線301、ゲート線302、画素
電極303および薄膜トランジスタ304上に、インク
ジェット法により、赤、緑、青色の有機発光材料をパタ
ーニング塗布することで、フルカラー表示を実現するも
のである。
According to the present invention, as shown in FIG. 3, the red, green and blue organic light-emitting devices are formed on a signal line 301, a gate line 302, a pixel electrode 303 and a thin film transistor 304 formed on a substrate by an ink-jet method. Full-color display is realized by patterning and applying a material.

【0012】[0012]

【発明の実施の形態】以下、本発明の好適な実施形態に
ついて図面を参照して説明する。
DETAILED DESCRIPTION OF THE PREFERRED EMBODIMENTS Preferred embodiments of the present invention will be described below with reference to the drawings.

【0013】(実施例1)図1に示すように、ガラス基
板101上に薄膜トランジスタ102を形成してから、
ITO透明画素電極103を形成する。
(Embodiment 1) As shown in FIG. 1, after forming a thin film transistor 102 on a glass substrate 101,
An ITO transparent pixel electrode 103 is formed.

【0014】正孔注入材料としてポリマー前駆体である
ポリテトラヒドロチオフェニルフェニレンをコーティン
グする。加熱により、前駆体はポリフェニレンビニレン
となり、厚さ0.05ミクロンの正孔注入層104が形
成される。
As a hole injection material, polytetrahydrothiophenylphenylene, which is a polymer precursor, is coated. By heating, the precursor becomes polyphenylene vinylene, and the hole injection layer 104 having a thickness of 0.05 μm is formed.

【0015】次に、インクジェットプリント装置105
により赤、緑、青色を発色する発光材料をパターニング
塗布し、厚さ0.05ミクロンの発色層106、10
7、108を形成する。赤色発光材料にはシアノポリフ
ェニレンビニレン、緑色発光材料にはポリフェニレンビ
ニレン、青色発光材料にはポリフェニレンビニレンおよ
びポリアルキルフェニレンを使用する。これらの有機E
L材料はケンブリッジ・ディスプレイ・テクノロジー社
製であり、液状で入手可能である。
Next, the ink jet printing apparatus 105
A luminescent material that emits red, green, and blue light is patterned and applied, and a 0.05 μm thick color-forming layer 106, 10
7 and 108 are formed. Cyanopolyphenylene vinylene is used for the red light emitting material, polyphenylene vinylene is used for the green light emitting material, and polyphenylene vinylene and polyalkylphenylene are used for the blue light emitting material. These organic E
The L material is manufactured by Cambridge Display Technology and is available in liquid form.

【0016】最後に、厚さ0.1〜0.2ミクロンのM
gAg反射電極109を蒸着法により形成する。
Finally, M having a thickness of 0.1 to 0.2 micron
The gAg reflective electrode 109 is formed by an evaporation method.

【0017】これにより、直視型のフルカラー有機EL
表示体が完成する。
Thus, a direct-view type full-color organic EL is provided.
The display is completed.

【0018】(実施例2)図2に示すように、ガラス基
板201上に薄膜トランジスタ202を形成してから、
AlLi反射画素電極203を形成する。
Embodiment 2 As shown in FIG. 2, after forming a thin film transistor 202 on a glass substrate 201,
An AlLi reflective pixel electrode 203 is formed.

【0019】次に、インクジェットプリント装置207
により赤、緑、青色を発色する発光材料をパターニング
塗布し、発色層204、205、206を形成する。赤
色発光材料にはシアノポリフェニレンビニレン、緑色発
光材料にはポリフェニレンビニレン、青色発光材料には
ポリフェニレンビニレンおよびポリアルキルフェニレン
を使用する。これらの有機EL材料はケンブリッジ・デ
ィスプレイ・テクノロジー社製であり、液状で入手可能
である。
Next, the ink jet printing apparatus 207
A luminescent material that emits red, green, and blue light is applied by patterning to form coloring layers 204, 205, and 206. Cyanopolyphenylene vinylene is used for the red light emitting material, polyphenylene vinylene is used for the green light emitting material, and polyphenylene vinylene and polyalkylphenylene are used for the blue light emitting material. These organic EL materials are manufactured by Cambridge Display Technology, and are available in liquid form.

【0020】正孔注入材料としてポリマー前駆体である
ポリテトラヒドロチオフェニルフェニレンをキャスト法
により形成する。加熱により、前駆体はポリフェニレン
ビニレンとなり、正孔注入層208が形成される。
A polymer precursor, polytetrahydrothiophenylphenylene, is formed as a hole injection material by a casting method. By heating, the precursor becomes polyphenylene vinylene, and the hole injection layer 208 is formed.

【0021】最後に、ITO透明電極209を蒸着法に
より形成する。
Finally, an ITO transparent electrode 209 is formed by a vapor deposition method.

【0022】これにより、反射型のフルカラー有機EL
表示体が完成する。
Thus, a reflection type full-color organic EL is provided.
The display is completed.

【0023】(実施例3)有機発光層の有機発光材料と
して2,3,6,7-テトラヒドロ-11-オキソ−1H,5H,11H-(1)
ベンゾピラノ[6,7,8-ij]-キノリジン-10-カルボン酸を
用い、有機正孔注入層材料として1,1-ビス-(4-N,N-ジト
リルアミノフェニル)シクロヘキサンを用い、両者を混
合することで緑色の発光材料とする。
Example 3 2,3,6,7-Tetrahydro-11-oxo-1H, 5H, 11H- (1) as an organic light emitting material of an organic light emitting layer
Using benzopyrano [6,7,8-ij] -quinolidine-10-carboxylic acid and 1,1-bis- (4-N, N-ditolylaminophenyl) cyclohexane as an organic hole injection layer material, To form a green light-emitting material.

【0024】同様に、赤色の有機発光材料として、2-1
3',4'-ジヒドロキシフェニル)-3,5,7-トリヒドロキシ-1
-ベンゾピリリウムパークロレートを用いて正孔注入層
材料と混合する。
Similarly, as a red organic light emitting material, 2-1
(3 ', 4'-dihydroxyphenyl) -3,5,7-trihydroxy-1
-Mix with hole injection layer material using benzopyrylium perchlorate.

【0025】更に、青色発光層には有機正孔注入材料と
してトリス(8-ヒドロキシキノリノール)アルミニウムを
用い、有機発光材料として、2,3,6,7-テトラヒドロ-9-
メチル-11-オキソ-1H,5H,11H-(1)ベンゾピラノ[6,7,8-i
j]-キノリジンを混合し、発光材料を作成する。
Further, for the blue light emitting layer, tris (8-hydroxyquinolinol) aluminum is used as an organic hole injecting material, and 2,3,6,7-tetrahydro-9- is used as an organic light emitting material.
Methyl-11-oxo-1H, 5H, 11H- (1) benzopyrano [6,7,8-i
j] -Quinolidine is mixed to produce a luminescent material.

【0026】実施例1または実施例2と同様な工程で、
各々の発光層をインクジェットプリンタ装置により局所
パターニングし、アクティブマトリックス型有機EL表
示体を作成する。
In the same process as in Example 1 or 2,
Each light-emitting layer is locally patterned by an ink-jet printer to form an active matrix type organic EL display.

【0027】なお、本実施例で使用した有機EL材料以
外にも、アロマティックジアミン誘導体(TDP)、オ
キシジアゾールダイマー(OXD)、オキシジアゾール
誘導体(PBD)、ジスチルアリーレン誘導体(DS
A)、キノリノール系金属錯体、ベリリウム−ベンゾキ
ノリノール錯体(Bebq)、トリフェニルアミン誘導
体(MTDATA)、ジスチリル誘導体、ピラゾリンダ
イマー、ルブレン、キナクリドン、トリアゾール誘導
体、ポリフェニレン、ポリアルキルフルオレン、ポリア
ルキルチオフェン、アゾメチン亜鉛錯体、ポリフィリン
亜鉛錯体、ベンゾオキサゾール亜鉛錯体、フェナントロ
リンユウロピウム錯体が使用できるが、これに限られる
物ではない。
Note that, in addition to the organic EL materials used in this example, aromatic diamine derivatives (TDP), oxydiazole dimers (OXD), oxydiazole derivatives (PBD), distyrarylene derivatives (DS)
A), quinolinol-based metal complex, beryllium-benzoquinolinol complex (Bebq), triphenylamine derivative (MTDATA), distyryl derivative, pyrazoline dimer, rubrene, quinacridone, triazole derivative, polyphenylene, polyalkylfluorene, polyalkylthiophene, azomethine A zinc complex, a porphyrin zinc complex, a benzoxazole zinc complex, and a phenanthroline europium complex can be used, but are not limited thereto.

【0028】[0028]

【発明の効果】従来、パターニングができないとされた
有機EL材料をインクジェット方式により形成および配
列することでパターニングが可能となり、フルカラー表
示のアクティブマトリックス型有機EL表示体を実現し
た。これにより、安価で大画面のフルカラー表示体が製
造可能となり、効果は大である。
According to the present invention, patterning is possible by forming and arranging an organic EL material which cannot be patterned by an ink jet method, thereby realizing an active matrix type organic EL display of full color display. As a result, an inexpensive large-screen full-color display can be manufactured, and the effect is great.

【図面の簡単な説明】[Brief description of the drawings]

【図1】本発明の第1の実施形態におけるアクティブマ
トリックス型有機EL表示体の工程を示す図である。
FIG. 1 is a view showing a process of an active matrix type organic EL display according to a first embodiment of the present invention.

【図2】本発明の第2の実施形態におけるアクティブマ
トリックス型有機EL表示体の工程を示す図である。
FIG. 2 is a view showing a process of an active matrix type organic EL display according to a second embodiment of the present invention.

【図3】本発明の薄膜トランジスタ上にインクジェット
法により形成された発色層を示す図である。
FIG. 3 is a diagram showing a color forming layer formed on a thin film transistor of the present invention by an ink-jet method.

【符号の説明】[Explanation of symbols]

101 ガラス基板 102 薄膜トランジスタ 103 透明画素電極 104 正孔注入層 105 インクジェットプリンタヘッド 106 有機発光層(第1色) 107 有機発光層(第2色) 108 有機発光層(第3色) 109 反射電極 201 ガラス基板 202 薄膜トランジスタ 203 反射画素電極 204 有機発光層(第1色) 205 有機発光層(第2色) 206 有機発光層(第3色) 207 インクジェットプリンタヘッド 208 正孔注入層 209 透明電極 301 信号線 302 ゲート線 303 画素電極 304 薄膜トランジスタ 305 有機発光層(第1色) 306 有機発光層(第2色) 307 有機発光層(第3色) DESCRIPTION OF SYMBOLS 101 Glass substrate 102 Thin film transistor 103 Transparent pixel electrode 104 Hole injection layer 105 Inkjet printer head 106 Organic light emitting layer (1st color) 107 Organic light emitting layer (2nd color) 108 Organic light emitting layer (3rd color) 109 Reflective electrode 201 Glass Substrate 202 Thin film transistor 203 Reflective pixel electrode 204 Organic light emitting layer (first color) 205 Organic light emitting layer (second color) 206 Organic light emitting layer (third color) 207 Inkjet printer head 208 Hole injection layer 209 Transparent electrode 301 Signal line 302 Gate line 303 Pixel electrode 304 Thin film transistor 305 Organic light emitting layer (first color) 306 Organic light emitting layer (second color) 307 Organic light emitting layer (third color)

Claims (4)

【特許請求の範囲】[Claims] 【請求項1】 薄膜トランジスタを有するガラス基板に
形成された透明画素電極上層に正孔注入層が形成され、
この上層に少なくとも各画素毎に赤、緑、青より選択さ
れた発光色を有する有機発光層が形成され、更にこの上
層に反射電極が形成されるアクティブマトリックス型有
機EL表示体の製造方法において、前記有機発光層の形
成および配列がインクジェット方式によりなされること
を特徴とするアクティブマトリックス型有機EL表示体
の製造方法。
A hole injection layer formed on a transparent pixel electrode formed on a glass substrate having a thin film transistor;
An organic light emitting layer having an emission color selected from at least red, green, and blue for each pixel is formed in the upper layer, and a reflective electrode is formed in the upper layer. A method of manufacturing an active matrix type organic EL display, wherein the formation and arrangement of the organic light emitting layer are performed by an ink jet method.
【請求項2】 薄膜トランジスタを有するガラス基板に
形成された透明画素電極上層に少なくとも各画素毎に
赤、緑、青より選択された発光色を有する有機発光層が
形成され、更にこの上層に反射電極が形成されるアクテ
ィブマトリックス型有機EL表示体の製造方法におい
て、前記有機発光層の形成および配列がインクジェット
方式によりなされることを特徴とするアクティブマトリ
ックス型有機EL表示体の製造方法。
2. An organic light emitting layer having an emission color selected from red, green, and blue is formed at least for each pixel on an upper layer of a transparent pixel electrode formed on a glass substrate having a thin film transistor. Wherein the organic light emitting layer is formed and arranged by an ink-jet method.
【請求項3】 薄膜トランジスタを有するガラス基板に
形成された反射画素電極上層に少なくとも各画素毎に
赤、緑、青より選択された発光色を有する有機発光層が
形成され、この上層に正孔注入層が形成され、更にこの
上層に透明電極が形成されるアクティブマトリックス型
有機EL表示体の製造方法において、前記有機発光層の
形成および配列がインクジェット方式によりなされるこ
とを特徴とするアクティブマトリックス型有機EL表示
体の製造方法。
3. An organic light emitting layer having a light emission color selected from red, green and blue is formed at least for each pixel on an upper layer of a reflective pixel electrode formed on a glass substrate having a thin film transistor, and holes are injected into the upper layer. A method of manufacturing an active matrix type organic EL display device, wherein a layer is formed and a transparent electrode is further formed on the layer, wherein the formation and arrangement of the organic light emitting layer is performed by an ink jet method. Manufacturing method of EL display.
【請求項4】 薄膜トランジスタを有するガラス基板に
形成された反射画素電極上層に少なくとも各画素毎に
赤、緑、青より選択された発光色を有する有機発光層が
形成され、更にこの上層に透明電極が形成されるアクテ
ィブマトリックス型有機EL表示体の製造方法におい
て、前記有機発光層の形成および配列がインクジェット
方式によりなされることを特徴とするアクティブマトリ
ックス型有機EL表示体の製造方法。
4. An organic light emitting layer having an emission color selected from red, green and blue is formed at least for each pixel on an upper layer of a reflection pixel electrode formed on a glass substrate having a thin film transistor, and a transparent electrode is further formed on this upper layer. Wherein the organic light emitting layer is formed and arranged by an ink-jet method.
JP8158671A 1996-06-19 1996-06-19 Method of manufacturing active matrix type organic EL display Expired - Lifetime JP3036436B2 (en)

Priority Applications (1)

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JP8158671A JP3036436B2 (en) 1996-06-19 1996-06-19 Method of manufacturing active matrix type organic EL display

Applications Claiming Priority (1)

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JP8158671A JP3036436B2 (en) 1996-06-19 1996-06-19 Method of manufacturing active matrix type organic EL display

Related Child Applications (1)

Application Number Title Priority Date Filing Date
JP11323845A Division JP2000123975A (en) 1999-11-15 1999-11-15 Active matrix type organic EL display

Publications (2)

Publication Number Publication Date
JPH1012377A true JPH1012377A (en) 1998-01-16
JP3036436B2 JP3036436B2 (en) 2000-04-24

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US7394196B2 (en) 2005-01-14 2008-07-01 Seiko Epson Corporation Light emitting element, display device and electronic instrument
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WO2008105472A1 (en) * 2007-02-28 2008-09-04 Idemitsu Kosan Co., Ltd. Organic el material-containing solution, method for forming organic el thin film, organic el device comprising organic el thin film, and method for manufacturing organic el display panel
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US7462372B2 (en) 2000-09-08 2008-12-09 Semiconductor Energy Laboratory Co., Ltd. Light emitting device, method of manufacturing the same, and thin film forming apparatus
US7485023B2 (en) 2005-03-31 2009-02-03 Toppan Printing Co., Ltd. Organic electroluminescent device having partition wall and a manufacturing method of the same by relief printing method
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US7595353B2 (en) 2005-09-29 2009-09-29 Chisso Corporation Fluorine-containing photocurable polymer composition
US7642559B2 (en) 1999-06-04 2010-01-05 Semiconductor Energy Laboratory Co., Ltd. Electro-optical device and electronic device
US7686665B2 (en) 2005-09-22 2010-03-30 Toppan Printing Co., Ltd. Manufacturing method of a printed matter and a printed matter
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US7696683B2 (en) 2006-01-19 2010-04-13 Toppan Printing Co., Ltd. Organic electroluminescent element and the manufacturing method
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US7728513B2 (en) 2002-01-25 2010-06-01 Semiconductor Energy Laboratory Co., Ltd. Display device and method for manufacturing thereof
US7737454B2 (en) 2005-02-25 2010-06-15 Seiko Epson Corporation Organic light-emitting element, organic light-emitting device, and electronic apparatus
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US7910287B2 (en) 2007-02-14 2011-03-22 Toppan Printing Co., Ltd. Relief printing plate, and method for manufacturing electronic circuit pattern, organic electroluminescence device and organic electronic device by using the same
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US8040049B2 (en) 2008-09-29 2011-10-18 Toppan Printing Co., Ltd. Organic EL element and method for manufacturing thereof
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* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
EP0880303A4 (en) * 1996-11-25 2000-05-03 Seiko Epson Corp PROCESS FOR PRODUCING ORGANIC EL ELEMENTS, ORGANIC EL ELEMENTS AND ORGANIC EL DISPLAY DEVICE
US6833156B2 (en) 1996-11-25 2004-12-21 Seiko Epson Corporation Method of manufacturing organic EL element, organic EL element, and organic EL display device
EP1211916A1 (en) * 1996-11-25 2002-06-05 Seiko Epson Corporation Method of manufacturing organic EL element, organic EL element, and organic EL display device
EP1376716A3 (en) * 1996-11-25 2004-02-04 Seiko Epson Corporation Method of manufacturing organic EL element, organic EL element, and organic EL display device
US6838192B2 (en) 1996-11-25 2005-01-04 Seiko Epson Corporation Method of manufacturing organic EL element, organic EL element, and organic EL display device
EP1376717A3 (en) * 1996-11-25 2004-02-04 Seiko Epson Corporation Method of manufacturing organic el element, organic el element, and organic el display device
US7880696B2 (en) 1997-02-17 2011-02-01 Seiko Epson Corporation Display apparatus
EP1359789A1 (en) * 1997-02-17 2003-11-05 Seiko Epson Corporation Display apparatus
US6839045B2 (en) 1997-02-17 2005-01-04 Seiko Epson Corporation Display apparatus
US7710364B2 (en) 1997-02-17 2010-05-04 Seiko Epson Corporation Display apparatus
US7221339B2 (en) 1997-02-17 2007-05-22 Seiko Epson Corporation Display apparatus
US7253793B2 (en) 1997-02-17 2007-08-07 Seiko Epson Corporation Electro-luminiscent apparatus
JP2004146388A (en) * 1997-08-21 2004-05-20 Seiko Epson Corp Method of forming organic semiconductor film and method of manufacturing active matrix substrate
JP2004031362A (en) * 1997-09-02 2004-01-29 Seiko Epson Corp Composition for hole injection transport layer, organic EL device, and method for producing the same
JP2004111367A (en) * 1997-09-02 2004-04-08 Seiko Epson Corp Composition for hole injection transport layer, organic EL device, and method for producing the same
WO1999012395A1 (en) * 1997-09-02 1999-03-11 Seiko Epson Corporation Method of producing organic el element and organic el element
JP2004055555A (en) * 1997-09-02 2004-02-19 Seiko Epson Corp Composition for hole injection transport layer, organic EL device, and method for producing the same
JP2000106278A (en) * 1997-09-02 2000-04-11 Seiko Epson Corp Method for manufacturing organic EL element and organic EL element
JP2004031363A (en) * 1997-09-02 2004-01-29 Seiko Epson Corp Composition for hole injection transport layer, organic EL device, and method for producing the same
JP2004031360A (en) * 1997-09-02 2004-01-29 Seiko Epson Corp Composition for hole injection transport layer, organic EL device, and method for producing the same
JP2004031361A (en) * 1997-09-02 2004-01-29 Seiko Epson Corp Composition for hole injection transport layer, organic EL device, and method for producing the same
US6656519B2 (en) 1998-01-22 2003-12-02 Nec Corporation Multicolor organic electroluminescent panel and process for production thereof
EP1051738A4 (en) * 1998-01-30 2001-11-28 Univ Princeton PRODUCTION OF ORGANIC SEMICONDUCTOR ARRANGEMENTS BY INK-JET PRINTING PROCESS
WO1999046961A1 (en) * 1998-03-09 1999-09-16 Seiko Epson Corporation Method of manufacturing organic el display
JPH11260549A (en) * 1998-03-09 1999-09-24 Seiko Epson Corp Manufacturing method of organic EL display device
JP2006086128A (en) * 1998-03-17 2006-03-30 Seiko Epson Corp Manufacturing method of display device
US6563527B1 (en) * 1998-04-13 2003-05-13 Seiko Epson Corporation Information recording method and information reproducing method, recording medium for use in the methods, and information recording apparatus and information reproducing apparatus
US7090890B1 (en) 1998-04-13 2006-08-15 The Trustees Of Princeton University Modification of polymer optoelectronic properties after film formation by impurity addition or removal
KR100669667B1 (en) * 1998-05-29 2007-05-14 삼성에스디아이 주식회사 Manufacturing method of polymer organic electroluminescent device
KR100515822B1 (en) * 1998-05-29 2005-11-25 삼성에스디아이 주식회사 Manufacturing method of polymer organic electroluminescence device
US7116308B1 (en) 1998-06-19 2006-10-03 Cambridge Display Technology Limited Backlit displays
US8529309B2 (en) 1998-06-19 2013-09-10 Cambridge Display Technology Limited Backlit displays including organic light-emissive material
WO1999066483A1 (en) * 1998-06-19 1999-12-23 Cambridge Display Technology Ltd. Backlit displays
US7402091B2 (en) 1998-06-19 2008-07-22 Cambridge Display Technology Ltd. Backlit displays including organic light-emissive material
US6775428B2 (en) 1998-09-04 2004-08-10 Seiko Epson Corporation Device having a light transmission device
US6430325B1 (en) 1998-09-04 2002-08-06 Seiko Epson Corporation Device having a light transmission device
WO2000014813A1 (en) * 1998-09-04 2000-03-16 Seiko Epson Corporation Device with optical communication means
JP2000208254A (en) * 1999-01-11 2000-07-28 Seiko Epson Corp Method for manufacturing organic EL element and organic EL display device
US9620719B2 (en) 1999-03-29 2017-04-11 Seiko Epson Corporation Composition, film manufacturing method, as well as functional device and manufacturing method therefor
US8187669B2 (en) 1999-03-29 2012-05-29 Seiko Epson Corporation Composition, film manufacturing method, as well as functional device and manufacturing method therefor
US8231932B2 (en) 1999-03-29 2012-07-31 Cambridge Display Technology Limited Composition, film manufacturing method, as well as functional device and manufacturing method therefor
JP2000323276A (en) * 1999-05-14 2000-11-24 Seiko Epson Corp Method for manufacturing organic EL device, organic EL device, and ink composition
US9178177B2 (en) 1999-06-04 2015-11-03 Semiconductor Energy Laboratory Co., Ltd. Electro-optical device and electronic device
US7288420B1 (en) 1999-06-04 2007-10-30 Semiconductor Energy Laboratory Co., Ltd. Method for manufacturing an electro-optical device
JP2001052864A (en) * 1999-06-04 2001-02-23 Semiconductor Energy Lab Co Ltd Manufacturing method of electro-optical device
EP2296443A2 (en) 1999-06-04 2011-03-16 Semiconductor Energy Laboratory Co, Ltd. Electro-optical device with an insulating layer
US9123854B2 (en) 1999-06-04 2015-09-01 Semiconductor Energy Laboratory Co., Ltd. Electro-optical device and electronic device
US7642559B2 (en) 1999-06-04 2010-01-05 Semiconductor Energy Laboratory Co., Ltd. Electro-optical device and electronic device
US8987988B2 (en) 1999-06-04 2015-03-24 Semiconductor Energy Laboratory Co., Ltd. Display device
US7147530B2 (en) 1999-06-04 2006-12-12 Semiconductor Energy Laboratory Co., Ltd. Electroluminescence display device and method of manufacturing the same
US9293726B2 (en) 1999-06-04 2016-03-22 Semiconductor Energy Laboratory Co., Ltd. Method for manufacturing an electro-optical device
US9368680B2 (en) 1999-06-04 2016-06-14 Semiconductor Energy Laboratory Co., Ltd. Electro-optical device and electronic device
US8890172B2 (en) 1999-06-04 2014-11-18 Semiconductor Energy Laboratory Co., Ltd. Method for manufacturing an electro-optical device
EP1058314A3 (en) * 1999-06-04 2005-09-14 Sel Semiconductor Energy Laboratory Co., Ltd. Method for manufacturing an electro-optical device
US7462501B2 (en) 1999-06-04 2008-12-09 Semiconductor Energy Laboratory Co., Ltd. Method for manufacturing an electro-optical device
US8853696B1 (en) 1999-06-04 2014-10-07 Semiconductor Energy Laboratory Co., Ltd. Electro-optical device and electronic device
US7393707B2 (en) 1999-06-04 2008-07-01 Semiconductor Energy Laboratory Co., Ltd. Method for manufacturing an electro-optical device
US6689492B1 (en) 1999-06-04 2004-02-10 Semiconductor Energy Laboratory Co., Ltd. Electro-optical device and electronic device
US6958251B2 (en) 1999-06-28 2005-10-25 Semiconductor Energy Laboratory Co., Ltd. Active matrix display device using a printing method
US7342251B2 (en) 1999-06-28 2008-03-11 Semiconductor Energy Laboratory Co., Ltd. Method of manufacturing an electro-optical device
US6420200B1 (en) 1999-06-28 2002-07-16 Semiconductor Energy Laboratory Co., Ltd. Method of manufacturing an electro-optical device
US6440877B1 (en) 1999-06-28 2002-08-27 Semiconductor Energy Laboratory Co., Ltd. Method of manufacturing an electro-optical device
US6872672B2 (en) 1999-06-28 2005-03-29 Semiconductor Energy Laboratory Co., Ltd. Method of manufacturing an electro-optical device
US7258768B2 (en) 1999-07-23 2007-08-21 Semiconductor Energy Laboratory Co., Ltd. Method of fabricating an EL display device, and apparatus for forming a thin film
EP1071117A3 (en) * 1999-07-23 2006-04-19 Sel Semiconductor Energy Laboratory Co., Ltd. Method of fabricating a display device, and apparatus for forming a thin film
US6720029B2 (en) 1999-08-06 2004-04-13 Sharp Kabushiki Kaisha Coating liquid for forming organic layer in organic LED display and method of manufacturing organic LED display
US7521722B2 (en) 1999-10-12 2009-04-21 Semiconductor Energy Laboratory Co., Ltd. EL display device and a method of manufacturing the same
US7473928B1 (en) 1999-10-12 2009-01-06 Semiconductor Energy Laboratory Co., Ltd. EL display device and a method of manufacturing the same
US8884301B2 (en) 1999-10-12 2014-11-11 Semiconductor Energy Laboratory Co., Ltd. EL display device and a method of manufacturing the same
EP1093167A3 (en) * 1999-10-12 2007-02-21 Sel Semiconductor Energy Laboratory Co., Ltd. Electro-optical device and manufacturing method thereof
JP2008204961A (en) * 1999-10-12 2008-09-04 Semiconductor Energy Lab Co Ltd Method for manufacturing light-emitting device
US7548023B2 (en) 1999-10-12 2009-06-16 Semiconductor Energy Laboratory Co., Ltd. EL display device and a method of manufacturing the same
EP1093167A2 (en) 1999-10-12 2001-04-18 Sel Semiconductor Energy Laboratory Co., Ltd. Electro-optical device and manufacturing method thereof
EP1705692A3 (en) * 1999-10-13 2007-04-04 Semiconductor Energy Laboratory Co., Ltd. Method of manufacturing a semiconductor device
US7494837B2 (en) 1999-10-13 2009-02-24 Semiconductor Energy Laboratory Co., Ltd. Thin film forming apparatus
US7115434B2 (en) 1999-10-13 2006-10-03 Semiconductor Energy Laboratory Co., Ltd. Method for precisely forming light emitting layers in a semiconductor device
US6582504B1 (en) 1999-11-24 2003-06-24 Sharp Kabushiki Kaisha Coating liquid for forming organic EL element
US7279194B2 (en) 2000-02-04 2007-10-09 Semiconductor Energy Laboratory Co., Ltd. Thin film formation apparatus and method of manufacturing self-light-emitting device using thin film formation apparatus
JP2001345176A (en) * 2000-02-28 2001-12-14 Semiconductor Energy Lab Co Ltd Thin film forming apparatus, thin film forming method thereof, and self-luminous device
US6696105B2 (en) 2000-02-28 2004-02-24 Semiconductor Energy Laboratory Co., Ltd. Thin film forming device, thin film forming method, and self-light emitting device
US7564054B2 (en) 2000-03-06 2009-07-21 Semiconductor Energy Laboratory Co., Ltd. Thin film forming device, method of forming a thin film, and self-light-emitting device
US6699739B2 (en) 2000-03-06 2004-03-02 Semiconductor Energy Laboratory Co., Ltd. Thin film forming device, method of forming a thin, and self-light-emitting device
US7022535B2 (en) 2000-03-06 2006-04-04 Semiconductor Energy Laboratory Co., Ltd. Thin film forming device, method of forming a thin film, and self-light-emitting device
US7462384B2 (en) 2000-03-27 2008-12-09 Semiconductor Energy Laboratory Co., Ltd. Self-light emitting device and method of manufacturing the same
US7038836B2 (en) 2000-03-27 2006-05-02 Semiconductor Energy Laboratory Co., Ltd. Self-light emitting device and method of manufacturing the same
US7303274B2 (en) 2000-03-31 2007-12-04 Seiko Epson Corporation Thin film formation method by ink jet method, ink jet apparatus, production method of organic EL device, and organic EL device
US7303781B2 (en) 2000-03-31 2007-12-04 Seiko Epson Corporation Thin film formation method by ink jet method, ink jet apparatus, production method of organic EL device, and organic EL device
US6623097B2 (en) 2000-03-31 2003-09-23 Seiko Epson Corporation Thin film formation method by ink jet method, ink jet apparatus, production method of organic EL device, and organic EL device
US7390693B2 (en) 2000-03-31 2008-06-24 Seiko Epson Corporation Organic EL device and method of manufacturing organic EL device
US6852994B2 (en) 2000-03-31 2005-02-08 Seiko Epson Corporation Organic EL device and method of manufacturing organic EL device
JP2002050484A (en) * 2000-05-22 2002-02-15 Semiconductor Energy Lab Co Ltd Light emitting devices and appliances
JP2017063216A (en) * 2000-06-05 2017-03-30 株式会社半導体エネルギー研究所 Light emitting device
US10777615B2 (en) 2000-06-05 2020-09-15 Semiconductor Energy Laboratory Co., Ltd. Light-emitting device
US10446615B2 (en) 2000-06-05 2019-10-15 Semiconductor Energy Laboratory Co., Ltd. Light-emitting device
US10192934B2 (en) 2000-06-05 2019-01-29 Semiconductor Energy Laboratory Co., Ltd. Light-emitting device having light emission by a singlet exciton and a triplet exciton
JP2018110243A (en) * 2000-06-05 2018-07-12 株式会社半導体エネルギー研究所 Active Matrix Light Emitting Device
JP2018121067A (en) * 2000-06-05 2018-08-02 株式会社半導体エネルギー研究所 Active Matrix Light Emitting Device
US7560860B2 (en) 2000-08-18 2009-07-14 Semiconductor Energy Laboratory Co., Ltd. Light emitting device including multiple light emitting layers
US6822629B2 (en) 2000-08-18 2004-11-23 Semiconductor Energy Laboratory Co., Ltd. Light emitting device
US6905784B2 (en) 2000-08-22 2005-06-14 Semiconductor Energy Laboratory Co., Ltd. Light emitting device
US6538390B2 (en) 2000-09-06 2003-03-25 Sharp Kabushiki Kaisha Organic LED display device of active matrix drive type and fabrication method therefor
US7462372B2 (en) 2000-09-08 2008-12-09 Semiconductor Energy Laboratory Co., Ltd. Light emitting device, method of manufacturing the same, and thin film forming apparatus
US7744949B2 (en) 2000-09-08 2010-06-29 Semiconductor Energy Laboratory Co., Ltd. Light emitting device and method of manufacturing method thereof and thin film forming apparatus
US6893103B2 (en) 2000-10-17 2005-05-17 Seiko Epson Corporation Ink jet recording apparatus and manufacturing method for functional liquid applied substrate
WO2002032582A1 (en) * 2000-10-17 2002-04-25 Seiko Epson Corporation Ink jet recorder and method of manufacturing functional liquid applied substrate
US6924593B2 (en) 2000-11-27 2005-08-02 Seiko Epson Corporation Manufacturing method for organic electroluminescent device including an effectively optical area and an organic electroluminescent layer, organic electroluminescent device, and electronic devices therewith
US7521709B2 (en) 2000-11-27 2009-04-21 Seiko Epson Corporation Organic electroluminescent device, manufacturing method therefor, and electronic devices therewith
US8128448B2 (en) 2000-11-27 2012-03-06 Seiko Epson Corporation Methods of manufacturing an organic electroluminescent device
US8454403B2 (en) 2000-11-27 2013-06-04 Seiko Epson Corporation Methods of manufacturing an organic electroluminescent device
EP2270857A2 (en) 2000-11-27 2011-01-05 Seiko Epson Corporation Organic electroluminescent device, manufacturing method therefor, and electronic devices therewith
US6784459B2 (en) 2000-11-27 2004-08-31 Seiko Epson Corporation Organic electroluminescent device, manufacturing method therefor, and electronic devices therewith
EP1209744A2 (en) 2000-11-27 2002-05-29 Seiko Epson Corporation Organic electroluminescent device, manufacturing method therefor, and electronic devices therewith
US7470976B2 (en) 2000-11-27 2008-12-30 Seiko Epson Corporation Organic electroluminescent device, manufacturing method therefor, and electronic devices therewith
US7990052B2 (en) 2000-11-27 2011-08-02 Seiko Epson Corporation Organic electroluminescent device
US7186581B2 (en) 2000-11-27 2007-03-06 Seiko Epson Corporation Organic electroluminescent device, manufacturing method therefor, and electronic devices therewith
US8698136B2 (en) 2000-11-27 2014-04-15 Seiko Epson Corporation Methods of manufacturing an organic electroluminescent device
EP2760049A1 (en) 2000-11-27 2014-07-30 Seiko Epson Corporation Organic electroluminescent device, manufacturing method therefor, and electronic devices therewith
US7755277B2 (en) 2000-11-27 2010-07-13 Seiko Epson Corporation Organic electroluminescent device, manufacturing method therefor, and electronic devices therewith
US7300686B2 (en) 2000-11-28 2007-11-27 Seiko Epson Corporation Organic electro-luminescent device, manufacturing method for the same, and electronic equipment
US7488506B2 (en) 2000-11-28 2009-02-10 Seiko Epson Corporation Organic electro-luminescent device, manufacturing method for the same, and electronic equipment
US7198814B2 (en) 2001-03-12 2007-04-03 Seiko Epson Corporation Compositions, methods for producing films, functional elements, methods for producing functional elements, method for producing electro-optical devices and methods for producing electronic apparatus
US6787063B2 (en) 2001-03-12 2004-09-07 Seiko Epson Corporation Compositions, methods for producing films, functional elements, methods for producing functional elements, methods for producing electro-optical devices and methods for producing electronic apparatus
KR100635037B1 (en) * 2001-04-12 2006-10-17 삼성에스디아이 주식회사 Organic electroluminescent devices
US6815141B2 (en) 2001-05-18 2004-11-09 Sharp Kabushiki Kaisha Organic Led display panel production method, organic Led display panel produced by the method, and base film and substrate for use in the method
US7567031B2 (en) 2001-06-01 2009-07-28 Semiconductor Energy Laboratory Co., Ltd. Organic light emitting element and light emitting device using the element
US7199515B2 (en) 2001-06-01 2007-04-03 Semiconductor Energy Laboratory Co., Ltd. Organic light emitting element and light emitting device using the element
US8632166B2 (en) 2001-06-15 2014-01-21 Semiconductor Energy Laboratory Co., Ltd. Printing device and method of manufacturing a light emitting device
US7674494B2 (en) 2001-06-15 2010-03-09 Semiconductor Energy Laboratory Co., Ltd. Printing device and method of manufacturing a light emitting device
US7063869B2 (en) 2001-06-15 2006-06-20 Semiconductor Energy Laboratory Co., Ltd. Printing device and method of manufacturing a light emitting device
US7547563B2 (en) 2001-07-06 2009-06-16 Semicondutor Energy Laboratory Co., Ltd. Method of manufacturing a light emitting device
US8425016B2 (en) 2001-07-06 2013-04-23 Semiconductor Energy Laboratory Co., Ltd. Method of manufacturing a light emitting device
US8752940B2 (en) 2001-07-06 2014-06-17 Semiconductor Energy Laboratory Co., Ltd. Method of manufacturing a light emitting device
US7378291B2 (en) 2001-07-06 2008-05-27 Semiconductor Energy Laboratory Co., Ltd. Method of manufacturing a light emitting device
US8197052B2 (en) 2001-07-06 2012-06-12 Semiconductor Energy Laboratory Co., Ltd. Method of manufacturing a light emitting device
US6825867B2 (en) 2001-07-09 2004-11-30 Seiko Epson Corporation Organic electroluminescent array exposure head, method of fabricating the same, and image forming apparatus using the same
US7333167B2 (en) 2001-08-29 2008-02-19 Seiko Epson Corporation Electrooptical device and electronic equipment having resin film in light emitting region and sealing region
US8093656B2 (en) 2001-08-29 2012-01-10 Seiko Epson Corporation Electrooptical device and electronic equipment having resin film in light emitting region and sealing region
EP1986472A2 (en) 2001-09-12 2008-10-29 Seiko Epson Corporation Method for patterning, method for forming film, patterning apparatus, film formation apparatus, electro-optic apparatus and method for manufacturing the same, electronic equipment, and electronic apparatus and method for manufacturing the same
CN100424586C (en) * 2001-09-14 2008-10-08 精工爱普生株式会社 Pattern forming method, electric sensitive element and method for manufacturing color filter
EP2287825A3 (en) * 2001-11-21 2012-08-15 Seiko Epson Corporation Active matrix substrate, electro-optical device, and electronic device
US8294637B2 (en) 2001-11-21 2012-10-23 Seiko Epson Corporation Active matrix substrate, electro-optical device, and electronic device
US8525760B2 (en) 2001-11-21 2013-09-03 Seiko Epson Corporation Active matrix substrate, electro-optical device, and electronic device
US7345141B2 (en) 2001-11-22 2008-03-18 Sharp Kabushiki Kaisha Polymer material having carrier transport property, and organic thin film element, electronic device, and conductor line which use same
US6900597B2 (en) 2001-12-20 2005-05-31 Seiko Epson Corporation Emitter, method of designing brightness of emitter, program for method of designing brightness of emitter, electrooptical device and electric device
US8450925B2 (en) 2002-01-25 2013-05-28 Semiconductor Energy Laboratory Co., Ltd. Display device and method for manufacturing thereof
US7728513B2 (en) 2002-01-25 2010-06-01 Semiconductor Energy Laboratory Co., Ltd. Display device and method for manufacturing thereof
US8004183B2 (en) 2002-01-25 2011-08-23 Semiconductor Energy Laboratory Co., Ltd. Display device and method for manufacturing thereof
US8937429B2 (en) 2002-01-25 2015-01-20 Semiconductor Energy Laboratory Co., Ltd. Display device and method for manufacturing thereof
US8747178B2 (en) 2002-01-25 2014-06-10 Semiconductor Energy Laboratory Co., Ltd. Manufacturing method of light emitting device
US6878470B2 (en) 2002-02-08 2005-04-12 Fuji Photo Film Co., Ltd. Visible image receiving material, conductive pattern material and organic electroluminescence element, using member having surface hydrophilicity
US7081912B2 (en) 2002-03-11 2006-07-25 Seiko Epson Corporation Optical writing head such as organic EL array exposure head, method of manufacturing the same, and image forming apparatus using the same
EP1564007A1 (en) 2002-05-31 2005-08-17 Seiko Epson Corporation Optical head and image forming apparatus employing the same
EP1366920A1 (en) 2002-05-31 2003-12-03 Seiko Epson Corporation Optical head and image forming apparatus employing the same
EP1564008A1 (en) 2002-05-31 2005-08-17 Seiko Epson Corporation Optical head and image forming apparatus employing the same
US8105855B2 (en) 2002-06-19 2012-01-31 Semiconductor Energy Laboratory Co., Ltd. Method of manufacturing light emitting device
US6858464B2 (en) 2002-06-19 2005-02-22 Semiconductor Energy Laboratory Co., Ltd. Method of manufacturing light emitting device
US7163836B2 (en) 2002-06-19 2007-01-16 Semiconductor Energy Laboratory Co., Ltd. Method of manufacturing light emitting device
US8906714B2 (en) 2002-06-19 2014-12-09 Semiconductor Energy Laboratory Co., Ltd. Method of manufacturing light emitting device
US7569405B2 (en) 2002-06-19 2009-08-04 Semiconductor Energy Laboratory Co., Ltd. Method of manufacturing light emitting device
US7204735B2 (en) 2002-07-09 2007-04-17 Semiconductor Energy Laboratory Co., Ltd. Production apparatus and method of producing a light-emitting device by using the same apparatus
US7744438B2 (en) 2002-07-09 2010-06-29 Semiconductor Energy Laboratory Co., Ltd. Production apparatus and method of producing a light-emitting device by using the same apparatus
US8197295B2 (en) 2002-07-09 2012-06-12 Semiconductor Energy Laboratory Co., Ltd. Production apparatus and method of producing a light-emitting device by using the same apparatus
US7922554B2 (en) 2002-07-09 2011-04-12 Semiconductor Energy Laboratory Co., Ltd. Production apparatus and method of producing a light-emitting device by using the same apparatus
US8932666B2 (en) 2002-09-24 2015-01-13 National Institute Of Advanced Industrial Science And Technology Method and apparatus for manufacturing active-matrix organic el display, active matrix organic el display, method for manufacturing liquid crystal array, liquid crystal array, method and apparatus for manufacturing color filter substrate, and color filter substrate
WO2004045252A1 (en) * 2002-11-11 2004-05-27 Semiconductor Energy Laboratory Co., Ltd. Process for fabricating light emitting device
US7722919B2 (en) 2002-11-11 2010-05-25 Semiconductor Energy Laboratory Co., Inc. Manufacturing method of emitting device
JP4588445B2 (en) * 2002-11-11 2010-12-01 株式会社半導体エネルギー研究所 Method for manufacturing light emitting device
JPWO2004045252A1 (en) * 2002-11-11 2006-03-16 株式会社半導体エネルギー研究所 Method for manufacturing light emitting device
US7224115B2 (en) 2002-12-11 2007-05-29 Sony Corporation Display apparatus and method of manufacturing the same
JP2004207217A (en) * 2002-12-11 2004-07-22 Sony Corp Display device and method of manufacturing display device
US7718452B2 (en) 2002-12-11 2010-05-18 Sony Corporation Display apparatus and method of manufacturing the same
US7119826B2 (en) 2002-12-16 2006-10-10 Seiko Epson Corporation Oranic EL array exposure head, imaging system incorporating the same, and array-form exposure head fabrication process
US7252570B2 (en) 2003-01-23 2007-08-07 Seiko Epson Corporation Manufacturing method for organic electroluminescence device, and electronic device therewith
US7345304B2 (en) 2003-01-28 2008-03-18 Seiko Epson Corporation Emitter, manufacturing method and manufacturing apparatus thereof, electro-optical apparatus and electronic apparatus
US8026114B2 (en) 2003-01-28 2011-09-27 Seiko Epson Corporation Emitter, manufacturing method and manufacturing apparatus thereof, electro-optical apparatus and electronic apparatus
KR100622902B1 (en) 2003-01-28 2006-09-18 세이코 엡슨 가부시키가이샤 Light-emitting body, manufacturing method for light-emitting body, manufacturing apparatus for light-emitting body, electrooptical apparatus and electronic apparatus
US7071486B2 (en) 2003-01-28 2006-07-04 Seiko Epson Corporation Emitter, manufacturing method and manufacturing apparatus thereof, electro-optical apparatus and electronic apparatus
US7038362B2 (en) 2003-05-13 2006-05-02 Seiko Epson Corporation Display apparatus and method for displaying information
US7553208B2 (en) 2003-05-30 2009-06-30 Hitachi Displays, Ltd. Manufacturing method of organic electroluminescence display device
US7348207B2 (en) * 2003-10-23 2008-03-25 Seiko Epson Corporation Method of manufacturing organic EL device, organic EL device, and electronic apparatus
US7374264B2 (en) 2004-03-23 2008-05-20 Sharp Kabushiki Kaisha Patterned substrate, and method and apparatus for manufacturing the same
US7782351B2 (en) 2004-08-03 2010-08-24 Seiko Epson Corporation Exposure head
JP2006189853A (en) * 2004-12-29 2006-07-20 Dupont Displays Inc Electronic device and method for forming electronic device
US7394196B2 (en) 2005-01-14 2008-07-01 Seiko Epson Corporation Light emitting element, display device and electronic instrument
US7307297B2 (en) 2005-02-10 2007-12-11 Japan Science And Technology Agency Organic photodiode and method for manufacturing the organic photodiode
US7737454B2 (en) 2005-02-25 2010-06-15 Seiko Epson Corporation Organic light-emitting element, organic light-emitting device, and electronic apparatus
JP2005158757A (en) * 2005-03-07 2005-06-16 Seiko Epson Corp Manufacturing method of organic EL display device
US7485023B2 (en) 2005-03-31 2009-02-03 Toppan Printing Co., Ltd. Organic electroluminescent device having partition wall and a manufacturing method of the same by relief printing method
US7719183B2 (en) 2005-07-01 2010-05-18 Toppan Printing Co., Ltd. Manufacturing method of organic electroluminescent device and an organic electroluminescent device
US7686665B2 (en) 2005-09-22 2010-03-30 Toppan Printing Co., Ltd. Manufacturing method of a printed matter and a printed matter
US7595353B2 (en) 2005-09-29 2009-09-29 Chisso Corporation Fluorine-containing photocurable polymer composition
JP2007106428A (en) * 2005-10-11 2007-04-26 Sharp Corp Ink tank and inkjet coating apparatus
US7766712B2 (en) 2005-10-25 2010-08-03 Sharp Kabushiki Kaisha Method for fabricating organic electroluminescent display and fabrication apparatus used in the method
US7696683B2 (en) 2006-01-19 2010-04-13 Toppan Printing Co., Ltd. Organic electroluminescent element and the manufacturing method
US7546803B2 (en) 2006-01-30 2009-06-16 Toppan Printing Co., Ltd. Letterpress printing machine
US7906901B2 (en) 2006-02-14 2011-03-15 Sharp Kabushiki Kaisha Organic electroluminescent device and organic electroluminescent display device
US7819716B2 (en) 2006-02-15 2010-10-26 Toppan Printing Co., Ltd. Organic electroluminescent element and the manufacturing method
US7880382B2 (en) 2006-03-08 2011-02-01 Toppan Printing Co., Ltd. Organic electroluminescence panel and manufacturing method of the same
US7687390B2 (en) 2006-03-28 2010-03-30 Toppan Printing Co., Ltd. Manufacturing method of a transparent conductive film, a manufacturing method of a transparent electrode of an organic electroluminescence device, an organic electroluminescence device and the manufacturing method
US7791275B2 (en) 2006-03-30 2010-09-07 Toppan Printing Co., Ltd. Organic electroluminescence element and manufacturing method of the same
US7922553B2 (en) 2006-04-05 2011-04-12 Sharp Kabushiki Kaisha Organic electroluminescent display device and production method thereof
EP2567995A2 (en) 2006-12-26 2013-03-13 Asahi Kasei E-materials Corporation Resin composition for printing plate
US7910287B2 (en) 2007-02-14 2011-03-22 Toppan Printing Co., Ltd. Relief printing plate, and method for manufacturing electronic circuit pattern, organic electroluminescence device and organic electronic device by using the same
US7897216B2 (en) 2007-02-21 2011-03-01 Seiko Epson Corporation Method for manufacturing organic device and electronic apparatus
JP5320282B2 (en) * 2007-02-28 2013-10-23 出光興産株式会社 Organic EL material-containing solution, organic EL thin film forming method, organic EL element including organic EL thin film, and organic EL display panel manufacturing method
WO2008105472A1 (en) * 2007-02-28 2008-09-04 Idemitsu Kosan Co., Ltd. Organic el material-containing solution, method for forming organic el thin film, organic el device comprising organic el thin film, and method for manufacturing organic el display panel
US9290691B2 (en) 2007-02-28 2016-03-22 Idemitsu Kosan Co., Ltd. Organic el material-containing solution, method for forming organic el thin film, organic el device comprising organic el thin film, and method for manufacturing organic el display panel
US8414960B2 (en) 2008-03-31 2013-04-09 Panasonic Corporation Ink composition for organic electroluminescent device and production method thereof
US8456080B2 (en) 2008-08-08 2013-06-04 Sony Corporation Display device for detecting misregistration and width variation and method of manufacturing same
CN102144314A (en) * 2008-09-04 2011-08-03 欧司朗光电半导体有限公司 Method for producing an organic radiation-emitting component and organic radiation-emitting component
US8927325B2 (en) 2008-09-04 2015-01-06 Osram Opto Semiconductor Gmbh Method for producing an organic radiation-emitting component and organic radiation-emitting component
US8040049B2 (en) 2008-09-29 2011-10-18 Toppan Printing Co., Ltd. Organic EL element and method for manufacturing thereof
WO2010084897A1 (en) 2009-01-22 2010-07-29 住友化学株式会社 Ink-jet printing ink for organic electroluminescent element, and process for production of organic electroluminescent element
KR20110119716A (en) 2009-01-22 2011-11-02 스미또모 가가꾸 가부시키가이샤 Inkjet Ink for Organic EL Devices and Manufacturing Method of Organic EL Devices
US8932098B2 (en) 2010-09-27 2015-01-13 Toppan Printing Co., Ltd. Relief printing plate and method for producing organic EL device using the same
US12330178B2 (en) 2012-12-27 2025-06-17 Kateeva, Inc. Techniques for arrayed printing of a permanent layer with improved speed and accuracy
US9832428B2 (en) 2012-12-27 2017-11-28 Kateeva, Inc. Fast measurement of droplet parameters in industrial printing system
US9802403B2 (en) 2012-12-27 2017-10-31 Kateeva, Inc. Techniques for print ink droplet measurement and control to deposit fluids within precise tolerances
US12256626B2 (en) 2012-12-27 2025-03-18 Kateeva, Inc. Nozzle-droplet combination techniques to deposit fluids in substrate locations within precise tolerances
US11167303B2 (en) 2012-12-27 2021-11-09 Kateeva, Inc. Techniques for arrayed printing of a permanent layer with improved speed and accuracy
US11673155B2 (en) 2012-12-27 2023-06-13 Kateeva, Inc. Techniques for arrayed printing of a permanent layer with improved speed and accuracy
US11678561B2 (en) 2012-12-27 2023-06-13 Kateeva, Inc. Nozzle-droplet combination techniques to deposit fluids in substrate locations within precise tolerances
US9700908B2 (en) 2012-12-27 2017-07-11 Kateeva, Inc. Techniques for arrayed printing of a permanent layer with improved speed and accuracy
US10784472B2 (en) 2012-12-27 2020-09-22 Kateeva, Inc. Nozzle-droplet combination techniques to deposit fluids in substrate locations within precise tolerances
US10784470B2 (en) 2012-12-27 2020-09-22 Kateeva, Inc. Techniques for print ink droplet measurement and control to deposit fluids within precise tolerances
US10797270B2 (en) 2012-12-27 2020-10-06 Kateeva, Inc. Nozzle-droplet combination techniques to deposit fluids in substrate locations within precise tolerances
US11489146B2 (en) 2012-12-27 2022-11-01 Kateeva, Inc. Techniques for print ink droplet measurement and control to deposit fluids within precise tolerances
US10950826B2 (en) 2012-12-27 2021-03-16 Kateeva, Inc. Techniques for print ink droplet measurement and control to deposit fluids within precise tolerances
US11233226B2 (en) 2012-12-27 2022-01-25 Kateeva, Inc. Nozzle-droplet combination techniques to deposit fluids in substrate locations within precise tolerances
US11141752B2 (en) 2012-12-27 2021-10-12 Kateeva, Inc. Techniques for arrayed printing of a permanent layer with improved speed and accuracy
US9831473B2 (en) 2013-12-12 2017-11-28 Kateeva, Inc. Encapsulation layer thickness regulation in light emitting device
US11088035B2 (en) 2013-12-12 2021-08-10 Kateeva, Inc. Fabrication of thin-film encapsulation layer for light emitting device
US11456220B2 (en) 2013-12-12 2022-09-27 Kateeva, Inc. Techniques for layer fencing to improve edge linearity
US10811324B2 (en) 2013-12-12 2020-10-20 Kateeva, Inc. Fabrication of thin-film encapsulation layer for light emitting device
US11551982B2 (en) 2013-12-12 2023-01-10 Kateeva, Inc. Fabrication of thin-film encapsulation layer for light-emitting device
US10586742B2 (en) 2013-12-12 2020-03-10 Kateeva, Inc. Fabrication of thin-film encapsulation layer for light emitting device
US10522425B2 (en) 2013-12-12 2019-12-31 Kateeva, Inc. Fabrication of thin-film encapsulation layer for light emitting device
US9806298B2 (en) 2013-12-12 2017-10-31 Kateeva, Inc. Techniques for edge management of printed layers in the fabrication of a light emitting device
US9755186B2 (en) 2013-12-12 2017-09-05 Kateeva, Inc. Calibration of layer thickness and ink volume in fabrication of encapsulation layer for light emitting device
US12334402B2 (en) 2013-12-12 2025-06-17 Kateeva, Inc. Fabrication of thin-film encapsulation layer for light-emitting device

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