JPH10130400A - Production of adhesive film - Google Patents
Production of adhesive filmInfo
- Publication number
- JPH10130400A JPH10130400A JP8287747A JP28774796A JPH10130400A JP H10130400 A JPH10130400 A JP H10130400A JP 8287747 A JP8287747 A JP 8287747A JP 28774796 A JP28774796 A JP 28774796A JP H10130400 A JPH10130400 A JP H10130400A
- Authority
- JP
- Japan
- Prior art keywords
- epoxy resin
- resin
- epoxy
- carboxylic acid
- diisocyanate
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
- 239000002313 adhesive film Substances 0.000 title claims abstract description 17
- 238000004519 manufacturing process Methods 0.000 title claims description 10
- 239000003822 epoxy resin Substances 0.000 claims abstract description 43
- 229920000647 polyepoxide Polymers 0.000 claims abstract description 43
- 239000002253 acid Substances 0.000 claims abstract description 15
- 150000001732 carboxylic acid derivatives Chemical class 0.000 claims abstract description 10
- 229920000515 polycarbonate Polymers 0.000 claims abstract description 10
- 239000004417 polycarbonate Substances 0.000 claims abstract description 10
- 125000005442 diisocyanate group Chemical group 0.000 claims abstract description 8
- 125000001931 aliphatic group Chemical group 0.000 claims abstract description 7
- 150000004985 diamines Chemical class 0.000 claims abstract description 7
- 150000002009 diols Chemical class 0.000 claims abstract description 7
- 125000003700 epoxy group Chemical group 0.000 claims abstract description 7
- 229920006122 polyamide resin Polymers 0.000 claims abstract description 7
- XQUPVDVFXZDTLT-UHFFFAOYSA-N 1-[4-[[4-(2,5-dioxopyrrol-1-yl)phenyl]methyl]phenyl]pyrrole-2,5-dione Chemical compound O=C1C=CC(=O)N1C(C=C1)=CC=C1CC1=CC=C(N2C(C=CC2=O)=O)C=C1 XQUPVDVFXZDTLT-UHFFFAOYSA-N 0.000 claims abstract description 6
- 125000003118 aryl group Chemical group 0.000 claims abstract description 6
- 229920003192 poly(bis maleimide) Polymers 0.000 claims abstract description 6
- 239000004593 Epoxy Substances 0.000 claims abstract description 5
- 229920001515 polyalkylene glycol Polymers 0.000 claims abstract description 5
- 239000011342 resin composition Substances 0.000 claims abstract description 5
- RNFJDJUURJAICM-UHFFFAOYSA-N 2,2,4,4,6,6-hexaphenoxy-1,3,5-triaza-2$l^{5},4$l^{5},6$l^{5}-triphosphacyclohexa-1,3,5-triene Chemical compound N=1P(OC=2C=CC=CC=2)(OC=2C=CC=CC=2)=NP(OC=2C=CC=CC=2)(OC=2C=CC=CC=2)=NP=1(OC=1C=CC=CC=1)OC1=CC=CC=C1 RNFJDJUURJAICM-UHFFFAOYSA-N 0.000 claims abstract description 4
- 125000003178 carboxy group Chemical group [H]OC(*)=O 0.000 claims abstract description 4
- 238000001035 drying Methods 0.000 claims abstract description 4
- 239000003063 flame retardant Substances 0.000 claims abstract description 4
- 239000004952 Polyamide Substances 0.000 claims description 15
- 229920002647 polyamide Polymers 0.000 claims description 15
- 125000002843 carboxylic acid group Chemical group 0.000 claims description 5
- 239000000758 substrate Substances 0.000 claims description 3
- 239000000853 adhesive Substances 0.000 abstract description 13
- 230000001070 adhesive effect Effects 0.000 abstract description 13
- 238000006243 chemical reaction Methods 0.000 abstract description 9
- 239000000203 mixture Substances 0.000 abstract description 7
- 230000007774 longterm Effects 0.000 abstract description 5
- IQPQWNKOIGAROB-UHFFFAOYSA-N isocyanate group Chemical group [N-]=C=O IQPQWNKOIGAROB-UHFFFAOYSA-N 0.000 abstract description 2
- 239000000463 material Substances 0.000 abstract description 2
- -1 polytetramethylene Polymers 0.000 description 13
- ZMXDDKWLCZADIW-UHFFFAOYSA-N N,N-Dimethylformamide Chemical compound CN(C)C=O ZMXDDKWLCZADIW-UHFFFAOYSA-N 0.000 description 12
- LYCAIKOWRPUZTN-UHFFFAOYSA-N Ethylene glycol Chemical compound OCCO LYCAIKOWRPUZTN-UHFFFAOYSA-N 0.000 description 8
- LNEPOXFFQSENCJ-UHFFFAOYSA-N haloperidol Chemical compound C1CC(O)(C=2C=CC(Cl)=CC=2)CCN1CCCC(=O)C1=CC=C(F)C=C1 LNEPOXFFQSENCJ-UHFFFAOYSA-N 0.000 description 8
- 229920001721 polyimide Polymers 0.000 description 8
- 229920005989 resin Polymers 0.000 description 8
- 239000011347 resin Substances 0.000 description 8
- 239000002904 solvent Substances 0.000 description 7
- YEJRWHAVMIAJKC-UHFFFAOYSA-N 4-Butyrolactone Chemical compound O=C1CCCO1 YEJRWHAVMIAJKC-UHFFFAOYSA-N 0.000 description 6
- 238000010438 heat treatment Methods 0.000 description 6
- CXMXRPHRNRROMY-UHFFFAOYSA-N sebacic acid Chemical compound OC(=O)CCCCCCCCC(O)=O CXMXRPHRNRROMY-UHFFFAOYSA-N 0.000 description 6
- RYGMFSIKBFXOCR-UHFFFAOYSA-N Copper Chemical compound [Cu] RYGMFSIKBFXOCR-UHFFFAOYSA-N 0.000 description 5
- PEEHTFAAVSWFBL-UHFFFAOYSA-N Maleimide Chemical compound O=C1NC(=O)C=C1 PEEHTFAAVSWFBL-UHFFFAOYSA-N 0.000 description 5
- 230000000052 comparative effect Effects 0.000 description 5
- 239000000126 substance Substances 0.000 description 5
- IAZDPXIOMUYVGZ-UHFFFAOYSA-N Dimethylsulphoxide Chemical compound CS(C)=O IAZDPXIOMUYVGZ-UHFFFAOYSA-N 0.000 description 4
- WNLRTRBMVRJNCN-UHFFFAOYSA-N adipic acid Chemical compound OC(=O)CCCCC(O)=O WNLRTRBMVRJNCN-UHFFFAOYSA-N 0.000 description 4
- 239000011889 copper foil Substances 0.000 description 4
- WGCNASOHLSPBMP-UHFFFAOYSA-N hydroxyacetaldehyde Natural products OCC=O WGCNASOHLSPBMP-UHFFFAOYSA-N 0.000 description 4
- QQVIHTHCMHWDBS-UHFFFAOYSA-N isophthalic acid Chemical compound OC(=O)C1=CC=CC(C(O)=O)=C1 QQVIHTHCMHWDBS-UHFFFAOYSA-N 0.000 description 4
- 229920001451 polypropylene glycol Polymers 0.000 description 4
- ZWEHNKRNPOVVGH-UHFFFAOYSA-N 2-Butanone Chemical compound CCC(C)=O ZWEHNKRNPOVVGH-UHFFFAOYSA-N 0.000 description 3
- XEKOWRVHYACXOJ-UHFFFAOYSA-N Ethyl acetate Chemical compound CCOC(C)=O XEKOWRVHYACXOJ-UHFFFAOYSA-N 0.000 description 3
- SECXISVLQFMRJM-UHFFFAOYSA-N N-Methylpyrrolidone Chemical compound CN1CCCC1=O SECXISVLQFMRJM-UHFFFAOYSA-N 0.000 description 3
- HEMHJVSKTPXQMS-UHFFFAOYSA-M Sodium hydroxide Chemical compound [OH-].[Na+] HEMHJVSKTPXQMS-UHFFFAOYSA-M 0.000 description 3
- YXFVVABEGXRONW-UHFFFAOYSA-N Toluene Chemical compound CC1=CC=CC=C1 YXFVVABEGXRONW-UHFFFAOYSA-N 0.000 description 3
- WPYMKLBDIGXBTP-UHFFFAOYSA-N benzoic acid Chemical compound OC(=O)C1=CC=CC=C1 WPYMKLBDIGXBTP-UHFFFAOYSA-N 0.000 description 3
- 239000003795 chemical substances by application Substances 0.000 description 3
- 239000011261 inert gas Substances 0.000 description 3
- 238000010992 reflux Methods 0.000 description 3
- 229910000679 solder Inorganic materials 0.000 description 3
- DVKJHBMWWAPEIU-UHFFFAOYSA-N toluene 2,4-diisocyanate Chemical compound CC1=CC=C(N=C=O)C=C1N=C=O DVKJHBMWWAPEIU-UHFFFAOYSA-N 0.000 description 3
- AOBIOSPNXBMOAT-UHFFFAOYSA-N 2-[2-(oxiran-2-ylmethoxy)ethoxymethyl]oxirane Chemical compound C1OC1COCCOCC1CO1 AOBIOSPNXBMOAT-UHFFFAOYSA-N 0.000 description 2
- UPMLOUAZCHDJJD-UHFFFAOYSA-N 4,4'-Diphenylmethane Diisocyanate Chemical compound C1=CC(N=C=O)=CC=C1CC1=CC=C(N=C=O)C=C1 UPMLOUAZCHDJJD-UHFFFAOYSA-N 0.000 description 2
- KMKWGXGSGPYISJ-UHFFFAOYSA-N 4-[4-[2-[4-(4-aminophenoxy)phenyl]propan-2-yl]phenoxy]aniline Chemical compound C=1C=C(OC=2C=CC(N)=CC=2)C=CC=1C(C)(C)C(C=C1)=CC=C1OC1=CC=C(N)C=C1 KMKWGXGSGPYISJ-UHFFFAOYSA-N 0.000 description 2
- CURLTUGMZLYLDI-UHFFFAOYSA-N Carbon dioxide Chemical compound O=C=O CURLTUGMZLYLDI-UHFFFAOYSA-N 0.000 description 2
- UFWIBTONFRDIAS-UHFFFAOYSA-N Naphthalene Chemical compound C1=CC=CC2=CC=CC=C21 UFWIBTONFRDIAS-UHFFFAOYSA-N 0.000 description 2
- 239000004642 Polyimide Substances 0.000 description 2
- KKEYFWRCBNTPAC-UHFFFAOYSA-N Terephthalic acid Chemical compound OC(=O)C1=CC=C(C(O)=O)C=C1 KKEYFWRCBNTPAC-UHFFFAOYSA-N 0.000 description 2
- WYURNTSHIVDZCO-UHFFFAOYSA-N Tetrahydrofuran Chemical compound C1CCOC1 WYURNTSHIVDZCO-UHFFFAOYSA-N 0.000 description 2
- 150000007513 acids Chemical class 0.000 description 2
- 239000001361 adipic acid Substances 0.000 description 2
- 235000011037 adipic acid Nutrition 0.000 description 2
- IISBACLAFKSPIT-UHFFFAOYSA-N bisphenol A Chemical compound C=1C=C(O)C=CC=1C(C)(C)C1=CC=C(O)C=C1 IISBACLAFKSPIT-UHFFFAOYSA-N 0.000 description 2
- PXKLMJQFEQBVLD-UHFFFAOYSA-N bisphenol F Chemical compound C1=CC(O)=CC=C1CC1=CC=C(O)C=C1 PXKLMJQFEQBVLD-UHFFFAOYSA-N 0.000 description 2
- 150000001735 carboxylic acids Chemical class 0.000 description 2
- JHIVVAPYMSGYDF-UHFFFAOYSA-N cyclohexanone Chemical compound O=C1CCCCC1 JHIVVAPYMSGYDF-UHFFFAOYSA-N 0.000 description 2
- 230000006866 deterioration Effects 0.000 description 2
- 238000011156 evaluation Methods 0.000 description 2
- 239000011229 interlayer Substances 0.000 description 2
- BDJRBEYXGGNYIS-UHFFFAOYSA-N nonanedioic acid Chemical compound OC(=O)CCCCCCCC(O)=O BDJRBEYXGGNYIS-UHFFFAOYSA-N 0.000 description 2
- 229920003986 novolac Polymers 0.000 description 2
- XNGIFLGASWRNHJ-UHFFFAOYSA-N phthalic acid Chemical compound OC(=O)C1=CC=CC=C1C(O)=O XNGIFLGASWRNHJ-UHFFFAOYSA-N 0.000 description 2
- 229920003223 poly(pyromellitimide-1,4-diphenyl ether) Polymers 0.000 description 2
- 229920001281 polyalkylene Polymers 0.000 description 2
- 229920000139 polyethylene terephthalate Polymers 0.000 description 2
- 239000005020 polyethylene terephthalate Substances 0.000 description 2
- 239000004814 polyurethane Substances 0.000 description 2
- 229920002635 polyurethane Polymers 0.000 description 2
- 230000003014 reinforcing effect Effects 0.000 description 2
- HXJUTPCZVOIRIF-UHFFFAOYSA-N sulfolane Chemical compound O=S1(=O)CCCC1 HXJUTPCZVOIRIF-UHFFFAOYSA-N 0.000 description 2
- 239000002966 varnish Substances 0.000 description 2
- 239000008096 xylene Substances 0.000 description 2
- GEYOCULIXLDCMW-UHFFFAOYSA-N 1,2-phenylenediamine Chemical compound NC1=CC=CC=C1N GEYOCULIXLDCMW-UHFFFAOYSA-N 0.000 description 1
- OUPZKGBUJRBPGC-UHFFFAOYSA-N 1,3,5-tris(oxiran-2-ylmethyl)-1,3,5-triazinane-2,4,6-trione Chemical compound O=C1N(CC2OC2)C(=O)N(CC2OC2)C(=O)N1CC1CO1 OUPZKGBUJRBPGC-UHFFFAOYSA-N 0.000 description 1
- RTTZISZSHSCFRH-UHFFFAOYSA-N 1,3-bis(isocyanatomethyl)benzene Chemical compound O=C=NCC1=CC=CC(CN=C=O)=C1 RTTZISZSHSCFRH-UHFFFAOYSA-N 0.000 description 1
- WZCQRUWWHSTZEM-UHFFFAOYSA-N 1,3-phenylenediamine Chemical compound NC1=CC=CC(N)=C1 WZCQRUWWHSTZEM-UHFFFAOYSA-N 0.000 description 1
- RYHBNJHYFVUHQT-UHFFFAOYSA-N 1,4-Dioxane Chemical compound C1COCCO1 RYHBNJHYFVUHQT-UHFFFAOYSA-N 0.000 description 1
- ALQLPWJFHRMHIU-UHFFFAOYSA-N 1,4-diisocyanatobenzene Chemical compound O=C=NC1=CC=C(N=C=O)C=C1 ALQLPWJFHRMHIU-UHFFFAOYSA-N 0.000 description 1
- CDMDQYCEEKCBGR-UHFFFAOYSA-N 1,4-diisocyanatocyclohexane Chemical compound O=C=NC1CCC(N=C=O)CC1 CDMDQYCEEKCBGR-UHFFFAOYSA-N 0.000 description 1
- SBJCUZQNHOLYMD-UHFFFAOYSA-N 1,5-Naphthalene diisocyanate Chemical compound C1=CC=C2C(N=C=O)=CC=CC2=C1N=C=O SBJCUZQNHOLYMD-UHFFFAOYSA-N 0.000 description 1
- ATOUXIOKEJWULN-UHFFFAOYSA-N 1,6-diisocyanato-2,2,4-trimethylhexane Chemical compound O=C=NCCC(C)CC(C)(C)CN=C=O ATOUXIOKEJWULN-UHFFFAOYSA-N 0.000 description 1
- RTBFRGCFXZNCOE-UHFFFAOYSA-N 1-methylsulfonylpiperidin-4-one Chemical compound CS(=O)(=O)N1CCC(=O)CC1 RTBFRGCFXZNCOE-UHFFFAOYSA-N 0.000 description 1
- JAHNSTQSQJOJLO-UHFFFAOYSA-N 2-(3-fluorophenyl)-1h-imidazole Chemical compound FC1=CC=CC(C=2NC=CN=2)=C1 JAHNSTQSQJOJLO-UHFFFAOYSA-N 0.000 description 1
- POAOYUHQDCAZBD-UHFFFAOYSA-N 2-butoxyethanol Chemical compound CCCCOCCO POAOYUHQDCAZBD-UHFFFAOYSA-N 0.000 description 1
- ISPYQTSUDJAMAB-UHFFFAOYSA-N 2-chlorophenol Chemical compound OC1=CC=CC=C1Cl ISPYQTSUDJAMAB-UHFFFAOYSA-N 0.000 description 1
- QTWJRLJHJPIABL-UHFFFAOYSA-N 2-methylphenol;3-methylphenol;4-methylphenol Chemical compound CC1=CC=C(O)C=C1.CC1=CC=CC(O)=C1.CC1=CC=CC=C1O QTWJRLJHJPIABL-UHFFFAOYSA-N 0.000 description 1
- XUSNPFGLKGCWGN-UHFFFAOYSA-N 3-[4-(3-aminopropyl)piperazin-1-yl]propan-1-amine Chemical compound NCCCN1CCN(CCCN)CC1 XUSNPFGLKGCWGN-UHFFFAOYSA-N 0.000 description 1
- YBRVSVVVWCFQMG-UHFFFAOYSA-N 4,4'-diaminodiphenylmethane Chemical compound C1=CC(N)=CC=C1CC1=CC=C(N)C=C1 YBRVSVVVWCFQMG-UHFFFAOYSA-N 0.000 description 1
- AJYDKROUZBIMLE-UHFFFAOYSA-N 4-[2-[2-[2-(4-aminophenoxy)phenyl]propan-2-yl]phenoxy]aniline Chemical compound C=1C=CC=C(OC=2C=CC(N)=CC=2)C=1C(C)(C)C1=CC=CC=C1OC1=CC=C(N)C=C1 AJYDKROUZBIMLE-UHFFFAOYSA-N 0.000 description 1
- ULKLGIFJWFIQFF-UHFFFAOYSA-N 5K8XI641G3 Chemical compound CCC1=NC=C(C)N1 ULKLGIFJWFIQFF-UHFFFAOYSA-N 0.000 description 1
- 239000004925 Acrylic resin Substances 0.000 description 1
- 229920000178 Acrylic resin Polymers 0.000 description 1
- 239000005711 Benzoic acid Substances 0.000 description 1
- MQJKPEGWNLWLTK-UHFFFAOYSA-N Dapsone Chemical compound C1=CC(N)=CC=C1S(=O)(=O)C1=CC=C(N)C=C1 MQJKPEGWNLWLTK-UHFFFAOYSA-N 0.000 description 1
- 239000005057 Hexamethylene diisocyanate Substances 0.000 description 1
- 239000005058 Isophorone diisocyanate Substances 0.000 description 1
- NTIZESTWPVYFNL-UHFFFAOYSA-N Methyl isobutyl ketone Chemical compound CC(C)CC(C)=O NTIZESTWPVYFNL-UHFFFAOYSA-N 0.000 description 1
- UIHCLUNTQKBZGK-UHFFFAOYSA-N Methyl isobutyl ketone Natural products CCC(C)C(C)=O UIHCLUNTQKBZGK-UHFFFAOYSA-N 0.000 description 1
- FXHOOIRPVKKKFG-UHFFFAOYSA-N N,N-Dimethylacetamide Chemical compound CN(C)C(C)=O FXHOOIRPVKKKFG-UHFFFAOYSA-N 0.000 description 1
- UQBRAHLFLCMLBA-UHFFFAOYSA-N N=C=O.N=C=O.CC1=CC=CC(C)=C1 Chemical class N=C=O.N=C=O.CC1=CC=CC(C)=C1 UQBRAHLFLCMLBA-UHFFFAOYSA-N 0.000 description 1
- CTQNGGLPUBDAKN-UHFFFAOYSA-N O-Xylene Chemical compound CC1=CC=CC=C1C CTQNGGLPUBDAKN-UHFFFAOYSA-N 0.000 description 1
- ISWSIDIOOBJBQZ-UHFFFAOYSA-N Phenol Chemical compound OC1=CC=CC=C1 ISWSIDIOOBJBQZ-UHFFFAOYSA-N 0.000 description 1
- 239000002202 Polyethylene glycol Substances 0.000 description 1
- KDYFGRWQOYBRFD-UHFFFAOYSA-N Succinic acid Natural products OC(=O)CCC(O)=O KDYFGRWQOYBRFD-UHFFFAOYSA-N 0.000 description 1
- 238000010521 absorption reaction Methods 0.000 description 1
- GTDPSWPPOUPBNX-UHFFFAOYSA-N ac1mqpva Chemical compound CC12C(=O)OC(=O)C1(C)C1(C)C2(C)C(=O)OC1=O GTDPSWPPOUPBNX-UHFFFAOYSA-N 0.000 description 1
- 239000003522 acrylic cement Substances 0.000 description 1
- 150000007933 aliphatic carboxylic acids Chemical class 0.000 description 1
- 239000004844 aliphatic epoxy resin Substances 0.000 description 1
- 125000003368 amide group Chemical group 0.000 description 1
- 150000001408 amides Chemical class 0.000 description 1
- JFCQEDHGNNZCLN-UHFFFAOYSA-N anhydrous glutaric acid Natural products OC(=O)CCCC(O)=O JFCQEDHGNNZCLN-UHFFFAOYSA-N 0.000 description 1
- 239000007864 aqueous solution Substances 0.000 description 1
- 150000004984 aromatic diamines Chemical class 0.000 description 1
- 235000010233 benzoic acid Nutrition 0.000 description 1
- 230000001588 bifunctional effect Effects 0.000 description 1
- KIKYOFDZBWIHTF-UHFFFAOYSA-N bis(oxiran-2-ylmethyl) cyclohex-3-ene-1,2-dicarboxylate Chemical compound C1CC=CC(C(=O)OCC2OC2)C1C(=O)OCC1CO1 KIKYOFDZBWIHTF-UHFFFAOYSA-N 0.000 description 1
- KDYFGRWQOYBRFD-NUQCWPJISA-N butanedioic acid Chemical compound O[14C](=O)CC[14C](O)=O KDYFGRWQOYBRFD-NUQCWPJISA-N 0.000 description 1
- 239000001569 carbon dioxide Substances 0.000 description 1
- 229910002092 carbon dioxide Inorganic materials 0.000 description 1
- 239000011248 coating agent Substances 0.000 description 1
- 238000000576 coating method Methods 0.000 description 1
- 150000001875 compounds Chemical class 0.000 description 1
- 238000006482 condensation reaction Methods 0.000 description 1
- 229910052802 copper Inorganic materials 0.000 description 1
- 239000010949 copper Substances 0.000 description 1
- 239000007822 coupling agent Substances 0.000 description 1
- 229930003836 cresol Natural products 0.000 description 1
- QGBSISYHAICWAH-UHFFFAOYSA-N dicyandiamide Chemical compound NC(N)=NC#N QGBSISYHAICWAH-UHFFFAOYSA-N 0.000 description 1
- SBZXBUIDTXKZTM-UHFFFAOYSA-N diglyme Chemical compound COCCOCCOC SBZXBUIDTXKZTM-UHFFFAOYSA-N 0.000 description 1
- 239000000539 dimer Substances 0.000 description 1
- 238000002845 discoloration Methods 0.000 description 1
- 238000004090 dissolution Methods 0.000 description 1
- 230000000694 effects Effects 0.000 description 1
- 239000012776 electronic material Substances 0.000 description 1
- 150000002170 ethers Chemical class 0.000 description 1
- 239000000945 filler Substances 0.000 description 1
- 239000011888 foil Substances 0.000 description 1
- 125000000524 functional group Chemical group 0.000 description 1
- ANSXAPJVJOKRDJ-UHFFFAOYSA-N furo[3,4-f][2]benzofuran-1,3,5,7-tetrone Chemical compound C1=C2C(=O)OC(=O)C2=CC2=C1C(=O)OC2=O ANSXAPJVJOKRDJ-UHFFFAOYSA-N 0.000 description 1
- 230000009477 glass transition Effects 0.000 description 1
- 125000000623 heterocyclic group Chemical group 0.000 description 1
- RRAMGCGOFNQTLD-UHFFFAOYSA-N hexamethylene diisocyanate Chemical compound O=C=NCCCCCCN=C=O RRAMGCGOFNQTLD-UHFFFAOYSA-N 0.000 description 1
- 150000002460 imidazoles Chemical class 0.000 description 1
- NIMLQBUJDJZYEJ-UHFFFAOYSA-N isophorone diisocyanate Chemical compound CC1(C)CC(N=C=O)CC(C)(CN=C=O)C1 NIMLQBUJDJZYEJ-UHFFFAOYSA-N 0.000 description 1
- 150000002596 lactones Chemical class 0.000 description 1
- 229940018564 m-phenylenediamine Drugs 0.000 description 1
- FPYJFEHAWHCUMM-UHFFFAOYSA-N maleic anhydride Chemical compound O=C1OC(=O)C=C1 FPYJFEHAWHCUMM-UHFFFAOYSA-N 0.000 description 1
- 239000002184 metal Substances 0.000 description 1
- 229910052751 metal Inorganic materials 0.000 description 1
- 238000000034 method Methods 0.000 description 1
- AYLRODJJLADBOB-QMMMGPOBSA-N methyl (2s)-2,6-diisocyanatohexanoate Chemical compound COC(=O)[C@@H](N=C=O)CCCCN=C=O AYLRODJJLADBOB-QMMMGPOBSA-N 0.000 description 1
- LVHBHZANLOWSRM-UHFFFAOYSA-N methylenebutanedioic acid Natural products OC(=O)CC(=C)C(O)=O LVHBHZANLOWSRM-UHFFFAOYSA-N 0.000 description 1
- 238000002156 mixing Methods 0.000 description 1
- KYTZHLUVELPASH-UHFFFAOYSA-N naphthalene-1,2-dicarboxylic acid Chemical compound C1=CC=CC2=C(C(O)=O)C(C(=O)O)=CC=C21 KYTZHLUVELPASH-UHFFFAOYSA-N 0.000 description 1
- 125000001971 neopentyl group Chemical group [H]C([*])([H])C(C([H])([H])[H])(C([H])([H])[H])C([H])([H])[H] 0.000 description 1
- 150000007524 organic acids Chemical class 0.000 description 1
- 235000005985 organic acids Nutrition 0.000 description 1
- 229920001568 phenolic resin Polymers 0.000 description 1
- 239000005011 phenolic resin Substances 0.000 description 1
- 239000000049 pigment Substances 0.000 description 1
- 229920000768 polyamine Polymers 0.000 description 1
- 229920006267 polyester film Polymers 0.000 description 1
- 229920001223 polyethylene glycol Polymers 0.000 description 1
- 229920000642 polymer Polymers 0.000 description 1
- 150000003335 secondary amines Chemical class 0.000 description 1
- 239000004065 semiconductor Substances 0.000 description 1
- 238000005476 soldering Methods 0.000 description 1
- 239000007787 solid Substances 0.000 description 1
- 239000000243 solution Substances 0.000 description 1
- 150000003457 sulfones Chemical class 0.000 description 1
- 150000003512 tertiary amines Chemical class 0.000 description 1
- YLQBMQCUIZJEEH-UHFFFAOYSA-N tetrahydrofuran Natural products C=1C=COC=1 YLQBMQCUIZJEEH-UHFFFAOYSA-N 0.000 description 1
- RUELTTOHQODFPA-UHFFFAOYSA-N toluene 2,6-diisocyanate Chemical compound CC1=C(N=C=O)C=CC=C1N=C=O RUELTTOHQODFPA-UHFFFAOYSA-N 0.000 description 1
- SRPWOOOHEPICQU-UHFFFAOYSA-N trimellitic anhydride Chemical compound OC(=O)C1=CC=C2C(=O)OC(=O)C2=C1 SRPWOOOHEPICQU-UHFFFAOYSA-N 0.000 description 1
Classifications
-
- H—ELECTRICITY
- H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
- H05K—PRINTED CIRCUITS; CASINGS OR CONSTRUCTIONAL DETAILS OF ELECTRIC APPARATUS; MANUFACTURE OF ASSEMBLAGES OF ELECTRICAL COMPONENTS
- H05K3/00—Apparatus or processes for manufacturing printed circuits
- H05K3/38—Improvement of the adhesion between the insulating substrate and the metal
- H05K3/386—Improvement of the adhesion between the insulating substrate and the metal by the use of an organic polymeric bonding layer, e.g. adhesive
Landscapes
- Coating Of Shaped Articles Made Of Macromolecular Substances (AREA)
- Manufacture Of Macromolecular Shaped Articles (AREA)
- Adhesives Or Adhesive Processes (AREA)
Abstract
Description
【0001】[0001]
【発明の属する技術分野】本発明は、多層FPC、リジ
ットフレックス配線板(FRC)の層間接着剤あるいは
FPCと補強板との接着剤等に用いる接着フィルムの製
造方法に関する。BACKGROUND OF THE INVENTION 1. Field of the Invention The present invention relates to a method for producing an adhesive film used as an interlayer adhesive for a multilayer FPC, a rigid flex wiring board (FRC) or an adhesive between an FPC and a reinforcing plate.
【0002】[0002]
【従来の技術】電子機器の薄型化、小型化の傾向から、
屈曲性に富み、薄型化の容易なFPC分野が毎年その市
場を拡大している。特に最近では、高密度化が要求され
ることから高多層化も進んでいる。更に機器の小型化で
は、リジット配線板とフレキシブル配線板を複合化した
リジットフレックス配線板も携帯電話を始めOA機器分
野等に使われ始めている。また、フレキシブル配線板の
端子を固定するために補強板を用いている。これらの配
線板に用いられている接着フィルムとしては、アクリル
系の接着剤が一般に使用されている。しかし、アクリル
樹脂が低Tg(ガラス転移温度)であるため、はんだ接
合時には配線板が波打つなどの欠点がある。また、多層
FPCやFRCの層間接着剤に用いた場合には、スミア
が発生しやすいなどの欠点がある。2. Description of the Related Art Due to the trend toward thinner and smaller electronic devices,
The FPC field, which is flexible and easy to thin, is expanding its market every year. In particular, in recent years, high-density has been required, and thus, multi-layering has been advanced. Furthermore, with the miniaturization of equipment, rigid-flex wiring boards in which a rigid wiring board and a flexible wiring board are combined have begun to be used in the field of OA equipment including mobile phones. Further, a reinforcing plate is used to fix the terminals of the flexible wiring board. As an adhesive film used for these wiring boards, an acrylic adhesive is generally used. However, since the acrylic resin has a low Tg (glass transition temperature), there is a disadvantage that the wiring board is wavy at the time of soldering. In addition, when used as an interlayer adhesive for a multilayer FPC or FRC, there is a disadvantage that smear is easily generated.
【0003】[0003]
【発明が解決しようとする課題】そこで、最近では、こ
れらの欠点を解消すべく、ポリイミド系の接着フィルム
が市販されるようになってきた。しかし、ポリイミド系
の接着フィルムは価格が高く、また、ロールラミネータ
で貼り合わせができないなどの欠点があり、まだまだ広
範囲に使われていない状況である。また、高Tgで、し
かも安価な接着フィルムとしては、特開平5−5144
7号で提案されているように、安価な多価カルボン酸、
ジイソシアネート、エポキシ樹脂からなるアミド基含有
エポキシ樹脂がある。更に、特願平7−101800号
で提案しているように該樹脂にポリアルキレン鎖、ある
いはポリカーボネート鎖などの柔軟成分を導入すること
により、高い接着性が得られることが知られている。し
かし、これらの柔軟成分(ソフトセグメント)を導入し
た結果、熱劣化が起こり易くなり、長期の接着性保持が
問題になっている。Therefore, in recent years, polyimide-based adhesive films have come to be marketed in order to solve these disadvantages. However, polyimide-based adhesive films are expensive and have drawbacks such as being unable to be bonded with a roll laminator, and are not yet widely used. In addition, as an inexpensive adhesive film having a high Tg, Japanese Patent Application Laid-Open
As proposed in No. 7, inexpensive polycarboxylic acids,
There is an amide group-containing epoxy resin composed of diisocyanate and epoxy resin. Furthermore, it is known that high adhesiveness can be obtained by introducing a flexible component such as a polyalkylene chain or a polycarbonate chain into the resin as proposed in Japanese Patent Application No. 7-101800. However, as a result of introducing these soft components (soft segments), thermal deterioration is apt to occur, and there is a problem in maintaining long-term adhesiveness.
【0004】[0004]
【課題を解決するための手段】本発明は、これらの問題
を解決するものであり、多価カルボン酸、ジイソシアネ
ート、エポキシ樹脂からなり、また、ポリアルキレン
鎖、またはポリカーボネート鎖をポリアミド骨格に導入
することにより、高い接着性が得られるこれらの柔軟成
分(ソフトセグメント)を導入した安価な変性ポリアミ
ドエポキシ樹脂に難燃剤とビスマレイミドとジアミンを
反応させたマレイミドオリゴマーを添加した樹脂組成物
を使用するものである。その目的とするところは、接着
性を保持したまま耐熱性を改良し、長期間の高温暴露に
対して接着性の維持に効果がある接着剤組成物から製造
した接着フィルムを提供するものである。The present invention solves these problems, and comprises a polycarboxylic acid, a diisocyanate, and an epoxy resin, and a polyalkylene chain or a polycarbonate chain is introduced into a polyamide skeleton. A resin composition obtained by adding a flame-retardant, a maleimide oligomer obtained by reacting a bismaleimide and a diamine, to an inexpensive modified polyamide epoxy resin into which these flexible components (soft segments) are introduced, whereby high adhesiveness is obtained. It is. It is an object of the present invention to provide an adhesive film produced from an adhesive composition having improved heat resistance while maintaining adhesiveness, and having an effect of maintaining adhesiveness for a long-term high-temperature exposure. .
【0005】上記目的を達成するために、本発明に係る
ボンディングシートの製造方法は、(A)多価カルボン
酸成分としてポリアルキレングリコールの両末端カルボ
ン酸またはポリカーボネートジオールの両末端カルボン
酸、10〜70重量部、他の脂肪族または芳香族多価カ
ルボン酸90〜30重量部、(B)ジイソシアネートを
−COOH/−NCO>1の条件で反応させて得られる
カルボン酸末端ポリアミド樹脂に、エポキシ樹脂をエポ
キシ基/カルボン酸基>1の条件で反応させて得られる
エポキシ当量1000〜40000の変性ポリアミドエ
ポキシ樹脂に難燃剤、ビスマレイミドとジアミンを反応
させたオリゴマーを添加した樹脂組成物を基材上に塗
布、乾燥して製造することを特徴とする。In order to achieve the above object, the method for producing a bonding sheet according to the present invention comprises: (A) a polycarboxylic acid component having a carboxylic acid at both terminals of a polyalkylene glycol or a carboxylic acid at both terminals of a polycarbonate diol; 70 parts by weight, 90 to 30 parts by weight of another aliphatic or aromatic polycarboxylic acid, (B) a carboxylic acid-terminated polyamide resin obtained by reacting diisocyanate under the condition of -COOH / -NCO> 1, and an epoxy resin A resin composition obtained by adding a flame retardant, an oligomer obtained by reacting a bismaleimide and a diamine to a modified polyamide epoxy resin having an epoxy equivalent of 1,000 to 40,000, obtained by reacting a resin under the condition of epoxy group / carboxylic acid group> 1 And dried and manufactured.
【0006】本発明におけるポリアミド樹脂とは、多価
カルボン酸とジイソシアネートから炭酸ガスが脱離する
縮合反応により合成できる。The polyamide resin of the present invention can be synthesized by a condensation reaction in which carbon dioxide is eliminated from a polycarboxylic acid and a diisocyanate.
【0007】本発明に使用する(A)成分としてのポリ
アルキレングリコールの両末端カルボン酸には、ポリテ
トラメチレングリコール、ポリプロピレングリコール、
ポリエチレングリコールなどと下記に挙げるカルボン酸
との反応で得られる多価カルボン酸が挙げられる。ポリ
カーボネートジオール両末端カルボン酸は、直鎖状脂肪
族ポリカーボネートジオールと下記に挙げるカルボン酸
との反応で得られる多価カルボン酸である。直鎖状脂肪
族ポリカーボネートは、具体的にはプラクセルCDシリ
ーズ(ダイセル化学工業株式会社製商品名)、ニッポラ
ン980、981(日本ポリウレタン工業株式会社製商
品名)などが上げられる。これらは接着性の点からポリ
アミド樹脂中の10重量%以上、耐熱性の点から70重
量%以下で使用される。更に接着性、耐吸湿性の点から
ポリテトラメチレングリコールが好ましく、その分子量
は、200〜3000が好ましい。The polyalkylene glycol used as the component (A) in the present invention includes polytetramethylene glycol, polypropylene glycol,
Examples include polyvalent carboxylic acids obtained by reacting polyethylene glycol and the like with the carboxylic acids listed below. The carboxylic acid at both ends of the polycarbonate diol is a polyvalent carboxylic acid obtained by reacting a linear aliphatic polycarbonate diol with a carboxylic acid described below. Specific examples of the linear aliphatic polycarbonate include Plaxel CD series (trade name, manufactured by Daicel Chemical Industries, Ltd.) and Nipporan 980 and 981 (trade names, manufactured by Nippon Polyurethane Industry Co., Ltd.). These are used in an amount of at least 10% by weight in the polyamide resin from the viewpoint of adhesiveness and at most 70% by weight from the viewpoint of heat resistance. Furthermore, polytetramethylene glycol is preferable from the viewpoint of adhesion and moisture absorption resistance, and the molecular weight is preferably 200 to 3000.
【0008】本発明に使用する他の脂肪族または芳香族
多価カルボン酸としては、コハク酸、グルタル酸、イタ
コン酸、アジピン酸、アゼライン酸、セバシン酸、デカ
ン二酸、ドデカン二酸、ダイマー酸等の脂肪族ジカルボ
ン酸、イソフタル酸、テレフタル酸、フタル酸、ナフタ
レンジカルボン酸、オキシジン安息香酸などの芳香族ジ
カルボン酸、無水トリメリット酸、無水ピロメリット
酸、ジフェニルスルホンテトラカルボン酸二無水物など
の芳香族カルボン酸無水物などが挙げられる。これら
は、単独または2種類以上を組み合わせて90〜30重
量部使用される。[0008] Other aliphatic or aromatic polycarboxylic acids used in the present invention include succinic acid, glutaric acid, itaconic acid, adipic acid, azelaic acid, sebacic acid, decandioic acid, dodecandioic acid and dimer acid. Such as aliphatic dicarboxylic acids, isophthalic acid, terephthalic acid, phthalic acid, naphthalenedicarboxylic acid, aromatic dicarboxylic acids such as oxidine benzoic acid, trimellitic anhydride, pyromellitic anhydride, diphenylsulfonetetracarboxylic dianhydride, etc. And aromatic carboxylic anhydrides. These are used alone or in combination of two or more kinds in an amount of 90 to 30 parts by weight.
【0009】本発明に使用する(B)成分としてのジイ
ソシアネートとしては、4,4’−ジフェニルメタンジ
イソシアネート、2,4−トリレンジイソシアネート、
2,6−トリレンジイソシアネート、1,5−ナフタレ
ンジイソシアネート、3,3’−ジメチル−4,4’−
ジフェニルメタンジイソシアネート、p−フェニレンジ
イソシアネート、m−キシレンジイソシアネート、m−
テトラメチルキシレンジイソシアネート等の芳香族ジイ
ソシアネート、ヘキサメチレンジイソシアネート、2,
2,4−トリメチルヘキサメチレンジイソシアネート、
イソホロンジイソシアネート、4,4’−ジシクロヘキ
シルメタンジイソシアネート、トランスシクロヘキサン
−1,4−ジイソシアネート、水添m−キシレンジイソ
シアネート、リジンジイソシアネートなどの脂肪族ジイ
ソシアネートなどが挙げられる。これらのうちでは耐熱
性の点から芳香族ジイソシアネートが好ましく、4,
4’−ジフェニルメタンジイソシアネート、トリレンジ
イソシアネートが特に好ましい。これらは単独で使用し
てもよいが、結晶性が高くなるので2種類以上を組み合
わせて使用することが好ましい。(B)成分は(A)成
分に対してカルボン酸基(−COOH)/イソシアネー
ト基(−NCO)>1で、カルボン酸過剰にして、ポリ
マーの末端がカルボキシル基になるようにして使用す
る。The diisocyanate (B) used in the present invention includes 4,4'-diphenylmethane diisocyanate, 2,4-tolylene diisocyanate,
2,6-tolylene diisocyanate, 1,5-naphthalenediisocyanate, 3,3'-dimethyl-4,4'-
Diphenylmethane diisocyanate, p-phenylene diisocyanate, m-xylene diisocyanate, m-
Aromatic diisocyanate such as tetramethyl xylene diisocyanate, hexamethylene diisocyanate, 2,
2,4-trimethylhexamethylene diisocyanate,
Examples include aliphatic diisocyanates such as isophorone diisocyanate, 4,4'-dicyclohexylmethane diisocyanate, transcyclohexane-1,4-diisocyanate, hydrogenated m-xylene diisocyanate, and lysine diisocyanate. Among these, aromatic diisocyanates are preferred from the viewpoint of heat resistance.
4'-diphenylmethane diisocyanate and tolylene diisocyanate are particularly preferred. These may be used alone, but it is preferable to use two or more kinds in combination because the crystallinity is increased. The component (B) is used such that the carboxylic acid group (—COOH) / isocyanate group (—NCO)> 1 with respect to the component (A), the carboxylic acid is excessive, and the terminal of the polymer is a carboxyl group.
【0010】上記の反応は、γ−ブチロラクトン等のラ
クトン類、N−メチルピロリドン(NMP)、ジメチル
アセトアミド、ジメチルホルムアミド(DMF)等のア
ミド系溶媒、テトラメチレンスルホン(スルホラン)、
ジメチルスルホオキシド(DMSO)などのスルホン
類、ジエチレングリコールジメチルエーテルなどのエー
テル類を溶媒に使用して50℃〜250℃で反応させ
る。反応収率、溶解性及び後工程での揮散性を考慮する
とγ−ブチロラクトンを溶媒の主成分にするのが良い。In the above reaction, lactones such as γ-butyrolactone, amide solvents such as N-methylpyrrolidone (NMP), dimethylacetamide and dimethylformamide (DMF), tetramethylene sulfone (sulfolane),
The reaction is carried out at 50 ° C. to 250 ° C. using sulfones such as dimethyl sulfoxide (DMSO) and ethers such as diethylene glycol dimethyl ether as a solvent. Considering the reaction yield, solubility and volatility in the subsequent step, it is preferable to use γ-butyrolactone as the main component of the solvent.
【0011】本発明に使用するエポキシ樹脂としてはビ
スフェノールA型エポキシ樹脂、ビスフェノールF型エ
ポキシ樹脂、フェノールノボラック型エポキシ樹脂、ク
レゾールノボラック型エポキシ樹脂、ナフタレン型エポ
キシ樹脂等の芳香族系エポキシ樹脂、ネオペンチルグリ
コールジグリシジルエーテル、ポリプロピレングリコー
ルジグリシジルエーテル、テトラヒドロフタル酸ジグリ
シジルエステル等の脂肪族系エポキシ樹脂、トリグリシ
ジルイソシアヌレート等の複素環式エポキシ樹脂等が挙
げられる。これらのうちでは、反応制御の点から2官能
エポキシ樹脂が好ましく、耐熱性の点から芳香族系エポ
キシ樹脂が好ましい。また、難燃性を付与するためには
ブロム化エポキシ樹脂が有用である。これらは単独また
は2種類以上組み合わせて使用される。また、これらの
エポキシ樹脂はカルボン酸末端のポリアミド樹脂に対し
てエポキシ基/カルボン酸基>1の条件で反応させる。
エポキシ基/カルボン酸基が1より小さくては末端エポ
キシ基を持った樹脂が得られない。また、エポキシ基/
カルボン酸基>2になると、エポキシ樹脂が過剰に反応
して、3次元化してゲル化することがある。このように
して得られる変性ポリアミドエポキシ樹脂のエポキシ当
量は、1000〜40000であることが好ましい。1
000より小さくては分子量が低くフィルム成形性に劣
り、40000を越えるとワニスの粘度が高くなり、フ
ィルム製造が困難になる。The epoxy resin used in the present invention includes aromatic epoxy resins such as bisphenol A type epoxy resin, bisphenol F type epoxy resin, phenol novolak type epoxy resin, cresol novolak type epoxy resin, naphthalene type epoxy resin, and neopentyl. Examples thereof include aliphatic epoxy resins such as glycol diglycidyl ether, polypropylene glycol diglycidyl ether, and diglycidyl tetrahydrophthalate, and heterocyclic epoxy resins such as triglycidyl isocyanurate. Of these, bifunctional epoxy resins are preferred from the viewpoint of reaction control, and aromatic epoxy resins are preferred from the viewpoint of heat resistance. A brominated epoxy resin is useful for imparting flame retardancy. These are used alone or in combination of two or more. These epoxy resins are reacted with a carboxylic acid-terminated polyamide resin under the condition of epoxy group / carboxylic group> 1.
If the epoxy group / carboxylic acid group is smaller than 1, a resin having a terminal epoxy group cannot be obtained. In addition, epoxy group /
If the carboxylic acid group is> 2, the epoxy resin may react excessively to form a three-dimensional gel. The modified polyamide epoxy resin thus obtained preferably has an epoxy equivalent of 1,000 to 40,000. 1
If it is less than 000, the molecular weight is low and the film formability is poor, and if it exceeds 40,000, the viscosity of the varnish becomes high, making film production difficult.
【0012】本発明で使用するビスマレイミドとジアミ
ンを反応させたオリゴマーであるマレイミドオリゴマー
としては、4,4’−ジアミノジフェニルメタン、4,
4’−ジアミノジフェニルエーテル、4,4’−ジアミ
ノジフェニルスルホン、m−フェニレンジアミン、p−
フェニレンジアミン、2,2−ビス−〔4−アミノフェ
ノキシフェニル〕プロパン等の芳香族ジアミンとこれら
のジアミンと無水マレイン酸を反応させて得られるマレ
イミド類をジアミン/マレイミド類のモル比0.2から
0.5で反応させて得られる反応性オリゴマーを添加す
る。The maleimide oligomer which is an oligomer obtained by reacting bismaleimide and diamine used in the present invention includes 4,4'-diaminodiphenylmethane,
4'-diaminodiphenyl ether, 4,4'-diaminodiphenylsulfone, m-phenylenediamine, p-
Maleimides obtained by reacting aromatic diamines such as phenylenediamine and 2,2-bis- [4-aminophenoxyphenyl] propane with these diamines and maleic anhydride can be prepared by converting the molar ratio of diamine / maleimide from 0.2. The reactive oligomer obtained by reacting at 0.5 is added.
【0013】本発明で使用する樹脂組成物は、通常、エ
ポキシ樹脂、エポキシ樹脂硬化剤と組み合わせて接着
剤、接着フィルムなどに適用できる。The resin composition used in the present invention can be generally applied to an adhesive or an adhesive film in combination with an epoxy resin or an epoxy resin curing agent.
【0014】エポキシ樹脂は、変性ポリアミドエポキシ
樹脂との混合が可能であれば特に限定されるものではな
く、上記に掲げたエポキシ樹脂などを、官能基数に関係
なく1種類以上組み合わせて使用できる。配合割合とし
ては、変性ポリアミドエポキシ樹脂100重量部に対し
て、エポキシ樹脂5〜150重量部が好ましい。The epoxy resin is not particularly limited as long as it can be mixed with the modified polyamide epoxy resin. One or more of the above-mentioned epoxy resins can be used in combination regardless of the number of functional groups. The mixing ratio is preferably from 5 to 150 parts by weight of the epoxy resin based on 100 parts by weight of the modified polyamide epoxy resin.
【0015】本発明に用いられるエポキシ樹脂硬化剤と
しては、特に限定されるものではなく、例えば、脂肪族
ポリアミン、2級または3級アミン、有機酸、イミダゾ
ール類、ジシアンジアミド、ポリメルカプタン、フェノ
ール樹脂などが挙げられる。これらは接着性、耐熱性そ
の他の特性の観点から、硬化剤の種類により適量使用す
る。The epoxy resin curing agent used in the present invention is not particularly restricted but includes, for example, aliphatic polyamines, secondary or tertiary amines, organic acids, imidazoles, dicyandiamide, polymercaptan, phenolic resins and the like. Is mentioned. These are used in an appropriate amount depending on the type of the curing agent from the viewpoint of adhesiveness, heat resistance and other properties.
【0016】本発明においては、上記各成分の他に必要
に応じて、従来より公知の硬化促進剤、カップリング
剤、充填剤、顔料などを適宜配合しても良い。In the present invention, conventionally known curing accelerators, coupling agents, fillers, pigments, and the like may be appropriately compounded, if necessary, in addition to the above components.
【0017】上記各成分よりなる本発明の樹脂は溶媒に
溶解し接着剤として使用する。また、この樹脂溶液を、
表面が剥離処理された金属箔、ポリエステルフィルム、
ポリイミドフィルム、紙などの基材上に従来公知の方法
でコーティングした後、乾燥させ、基材から剥離するこ
とによって接着フィルムとすることができる。The resin of the present invention comprising the above components is dissolved in a solvent and used as an adhesive. Also, this resin solution is
Metal foil, polyester film with a peeled surface,
An adhesive film can be obtained by coating a substrate such as a polyimide film or paper by a conventionally known method, followed by drying and peeling from the substrate.
【0018】溶媒としては、前記変性ポリアミドエポキ
シ樹脂製造時に用いた溶媒をそのまま使用して良いが、
他にテトラヒドロフラン、ジオキサン、シクロヘキサノ
ン、メチルエチルケトン、メチルイソブチルケトン、ト
ルエン、キシレン、エチルアセテート、ブチルセロソル
ブ、クロロフェノールなどの各種溶媒を用いることがで
きる。As the solvent, the solvent used in the production of the modified polyamide epoxy resin may be used as it is.
In addition, various solvents such as tetrahydrofuran, dioxane, cyclohexanone, methyl ethyl ketone, methyl isobutyl ketone, toluene, xylene, ethyl acetate, butyl cellosolve, and chlorophenol can be used.
【0019】[0019]
【発明の実施の形態】以下、本発明の実施形態を具体的
に説明する。DESCRIPTION OF THE PREFERRED EMBODIMENTS Hereinafter, embodiments of the present invention will be described specifically.
【0020】〔ポリテトラメチレングリコール(PT
G)の両末端カルボン酸化合物(A−1)の製造例〕撹
拌機、還流冷却器、不活性ガス導入口及び温度計を備え
たフラスコに、PTG(平均分子量1000) 100
0g、セバシン酸 405gを仕込み、2時間かけて2
00℃に昇温し、更に3時間反応させた後冷却し、酸価
81.9、分子量1370のPTG両末端カルボン酸
を得た。[Polytetramethylene glycol (PT
Production Example of G) Terminal Carboxylic Acid Compound (A-1)] PTG (average molecular weight: 1000) 100 in a flask equipped with a stirrer, a reflux condenser, an inert gas inlet and a thermometer.
0 g and 405 g of sebacic acid.
The temperature was raised to 00 ° C., and after further reacting for 3 hours, the mixture was cooled to obtain a carboxylic acid at both ends of PTG having an acid value of 81.9 and a molecular weight of 1370.
【0021】以下同様にして、表1に示す配合でポリア
ルキレングルコールまたはポリカーボネートジオールの
両末端カルボン酸化合物である下記のA−2からA−4
を得た。 ポリテトラメチレングリコール(PTG 平均分子量2
000)の両末端カルボン酸化合物(A−2)In the same manner, the following compounds A-2 to A-4, which are carboxylic acid compounds at both ends of polyalkylene glycol or polycarbonate diol, having the composition shown in Table 1 are used.
I got Polytetramethylene glycol (PTG average molecular weight 2
000) carboxylic acid compound at both ends (A-2)
【0022】ポリプロピレングリコール(PPG 平均
分子量950)の両末端カルボン酸化合物(A−3)Carboxylic acid compound at both ends of polypropylene glycol (PPG average molecular weight 950) (A-3)
【0023】ポリカーボネートジオール(プラクセルC
D210、ダイセル化学工業株式会社製商品名、平均分
子量1000)の両末端カルボン酸化合物(A−4)Polycarbonate diol (Placcel C
D210, a product of Daicel Chemical Industries, Ltd., trade name, average molecular weight: 1000) Carboxylic acid compound at both terminals (A-4)
【0024】[0024]
【表1】 [Table 1]
【0025】〔変性ポリアミドエポキシ樹脂(B−1)
の製造例〕撹拌機、還流冷却器、不活性ガス導入口及び
温度計を備えたフラスコに、γ−ブチロラクトン 10
0g、NMP 50gを仕込み、更に上記(A−1)
37.9g、他の脂肪族または芳香族カルボン酸として
アジピン酸 7.9g、セバシン酸 10.9g、イソ
フタル酸 18.0g、ジイソシアネートとして4,
4’−ジフェニルメタンジイソシアネート(MDI)
25.5g、コロネートT80(日本ポリウレタン工業
株式会社製商品名;トリレンジイソシアネートTDI)
17.7gを仕込み、200℃に昇温し、4時間反応
させた後冷却した。加熱残分(樹脂分) 40重量%、
酸価 54.8のポリアミド樹脂を得た。更にエポキシ
樹脂EPOMIK R140(三井石油化学工業株式会
社製商品名) 22.4gを仕込み、150℃で3時間
反応させた後、ジメチルホルムアミド(DMF)を加え
加熱残分35重量%にし、エポキシ当量(固形分換算)
9300の変性ポリアミドエポキシ樹脂を得た。[Modified polyamide epoxy resin (B-1)
Production Example] In a flask equipped with a stirrer, a reflux condenser, an inert gas inlet and a thermometer, γ-butyrolactone 10 was added.
0 g and NMP 50 g, and then the above (A-1)
37.9 g, 7.9 g of adipic acid as another aliphatic or aromatic carboxylic acid, 10.9 g of sebacic acid, 18.0 g of isophthalic acid, 4,4 as a diisocyanate
4'-diphenylmethane diisocyanate (MDI)
25.5 g, Coronate T80 (trade name, manufactured by Nippon Polyurethane Industry Co., Ltd .; tolylene diisocyanate TDI)
17.7 g was charged, the temperature was raised to 200 ° C., and the mixture was reacted for 4 hours and then cooled. Heating residue (resin content) 40% by weight,
A polyamide resin having an acid value of 54.8 was obtained. Further, 22.4 g of an epoxy resin EPOMIK R140 (trade name, manufactured by Mitsui Petrochemical Industry Co., Ltd.) was charged and reacted at 150 ° C. for 3 hours. Dimethylformamide (DMF) was added to make a heating residue of 35% by weight, and an epoxy equivalent ( (Solid content conversion)
9300 modified polyamide epoxy resin was obtained.
【0026】表2に示すように、(B−1)と同様の操
作で、変性ポリアミドエポキシ樹脂(B−2)〜(B−
4)を得た。As shown in Table 2, modified polyamide epoxy resins (B-2) to (B-
4) was obtained.
【0027】[0027]
【表2】 [Table 2]
【0028】〔マレイミドオリゴマー(C−1)の製造
例〕撹拌機、還流冷却器、不活性ガス導入口を備えたフ
ラスコに、2,2−ビス[4−(4−アミノフェノキ
シ)フェニル]プロパン(BAPP)のビスマレイミド
化物 570.4g、2,2−ビス[4−(4−アミノ
フェノキシ)フェニル]プロパン 123.2g、DM
F 463gを仕込み、125℃で0.5時間反応させ
た。反応終了後、冷却して樹脂分60重量%のワニスを
得た。[Production Example of Maleimide Oligomer (C-1)] In a flask equipped with a stirrer, a reflux condenser and an inert gas inlet, 2,2-bis [4- (4-aminophenoxy) phenyl] propane was placed. 570.4 g of bismaleimidated product of (BAPP), 123.2 g of 2,2-bis [4- (4-aminophenoxy) phenyl] propane, DM
463 g of F was charged and reacted at 125 ° C. for 0.5 hour. After the reaction, the mixture was cooled to obtain a varnish having a resin content of 60% by weight.
【0029】表3に示すように、(C−1)の製造例と
同様の操作で、マレイミドオリゴマー(C−2)〜(C
−4)を合成した。As shown in Table 3, the maleimide oligomers (C-2) to (C-2) were prepared in the same manner as in the production example of (C-1).
-4) was synthesized.
【0030】[0030]
【表3】 [Table 3]
【0031】(実施例1) 変性ポリアミドエポキシ樹脂(B−1) 70重量部 BREN105(日本化薬株式会社製商品名、臭素化エポキシ樹脂) 25重量部 ビスマレイミドオリゴマー(C−1) 5重量部 2−エチル−4−メチルイミダゾール 0.5重量部 合 計 100.5重量部(Example 1) 70 parts by weight of modified polyamide epoxy resin (B-1) 25 parts by weight of BREN105 (trade name, manufactured by Nippon Kayaku Co., Ltd.) 5 parts by weight of bismaleimide oligomer (C-1) 0.5 parts by weight of 2-ethyl-4-methylimidazole 100.5 parts by weight in total
【0032】上記配合の接着剤をポリエチレンテレフタ
レート(PET)フィルム上に塗布し、120℃の乾燥
炉(長さ1m)に0.1m/分の速度で連続的に搬送し
て、50μmの膜厚を持つB−ステージの接着フィルム
を作製した。この接着剤フィルムを電解銅箔(35μ
m)の光沢面とポリイミドフィルム(カプトン)の間に
挾み、170℃、30分、4MPaの加圧下で積層し、
銅箔付ポリイミドフィルム(以下、MCFと略記す
る。)を製造した。また、同様に、電解銅箔(35μ
m)の粗化面とポリイミドフィルム(カプトン)の間に
挾み、170℃、30分、4MPaの加圧下で積層し、
銅箔付ポリイミドフィルムを製造した。MCFの各界面
の接着性及び260℃のはんだ浴に浮かべた時にフクレ
が発生するまでの時間を測定した。その結果を表4に示
した。The adhesive having the above composition was applied on a polyethylene terephthalate (PET) film, and was continuously conveyed at a rate of 0.1 m / min to a drying oven (length 1 m) at 120 ° C. To prepare a B-stage adhesive film. This adhesive film is coated with electrolytic copper foil (35μ).
m) sandwiched between a glossy surface and a polyimide film (Kapton), laminated at 170 ° C. for 30 minutes under a pressure of 4 MPa,
A polyimide film with copper foil (hereinafter abbreviated as MCF) was manufactured. Similarly, electrolytic copper foil (35 μm)
m) sandwiched between the roughened surface and the polyimide film (Kapton), and laminated at 170 ° C. for 30 minutes under a pressure of 4 MPa.
A polyimide film with a copper foil was manufactured. The adhesiveness of each interface of the MCF and the time until blistering occurred when floating in a 260 ° C. solder bath were measured. Table 4 shows the results.
【0033】(実施例2)(B−1)の代わりに(B−
2)、(C−1)の代わりに(C−2)とした他は実施
例1と同様に配合して同じ条件でMCFを作製し、特性
を評価した。(Embodiment 2) Instead of (B-1), (B-
2), MCF was prepared in the same manner as in Example 1 except that (C-2) was used instead of (C-1), and the characteristics were evaluated.
【0034】(実施例3)(B−1)の代わりに(B−
3)、(C−1)の代わりに(C−3)とした他は実施
例1と同様に配合して同じ条件でMCFを作製し、特性
を評価した。(Embodiment 3) Instead of (B-1), (B-
MCF was prepared under the same conditions as in Example 1 except that (C-3) was used instead of (3) and (C-1), and the characteristics were evaluated.
【0035】(実施例4)(B−1)の代わりに(B−
4)、(C−1)の代わりに(C−4)とした他は実施
例1と同様に配合して同じ条件でMCFを作製し、特性
を評価した。(Embodiment 4) Instead of (B-1), (B-
4), MCF was prepared under the same conditions as in Example 1 except that (C-4) was used instead of (C-1), and the characteristics were evaluated.
【0036】実施例2〜実施例4の評価結果を表4に示
す。Table 4 shows the evaluation results of Examples 2 to 4.
【0037】(比較例1)変性ポリアミドエポキシ樹脂
(B−1)のみでMCFを作製し、特性を評価した。Comparative Example 1 An MCF was prepared using only the modified polyamide epoxy resin (B-1), and the characteristics were evaluated.
【0038】(比較例2)変性ポリアミドエポキシ樹脂
(B−2)のみでMCFを作製し、特性を評価した。比
較例1、2の評価結果を表4に示す。また、表4には、
下記の条件で耐薬品性と加熱処理後の接着強さを測定し
て示した。Comparative Example 2 An MCF was prepared using only the modified polyamide epoxy resin (B-2), and its characteristics were evaluated. Table 4 shows the evaluation results of Comparative Examples 1 and 2. Table 4 shows that
Under the following conditions, chemical resistance and adhesive strength after heat treatment were measured and shown.
【0039】耐薬品性:10重量%NaOH、10重量
%HCI水溶液中に、それぞれ上記で作製した接着フィ
ルムを24時間浸漬後、外観を観察した。溶解、変色、
亀裂などの発生のないものを良好とした。それ以外のも
のを不良とした。Chemical resistance: The adhesive films prepared above were immersed in 10% by weight of NaOH and 10% by weight of HCI aqueous solution for 24 hours, and the appearance was observed. Dissolution, discoloration,
Those having no cracks and the like were evaluated as good. Others were considered bad.
【0040】加熱処理後の接着強さ:得られたMCFを
125℃の高温槽に入れ、500時間後の接着強さを評
価した。製造した接着フィルムは、常態では、比較例
1、2の変性ポリアミドエポキシ樹脂と本発明の実施例
1〜4の耐薬品性、はんだ耐熱性及び接着強さで大きな
違いはないが、125℃で500時間加熱処理した後の
接着強さにおいては、実施例1〜4では接着強さが維持
されるのに対し比較例1、2では大幅に低下する。この
ように本発明は、長期の接着性保時に優れる。Adhesion strength after heat treatment: The obtained MCF was put in a high-temperature bath at 125 ° C., and the adhesion strength after 500 hours was evaluated. The produced adhesive film has no significant difference in chemical resistance, solder heat resistance and adhesive strength between the modified polyamide epoxy resins of Comparative Examples 1 and 2 and Examples 1 to 4 of the present invention under normal conditions. In the adhesive strength after the heat treatment for 500 hours, the adhesive strength was maintained in Examples 1 to 4, whereas the adhesive strength was significantly reduced in Comparative Examples 1 and 2. As described above, the present invention is excellent in maintaining long-term adhesiveness.
【0041】[0041]
【表4】 [Table 4]
【0042】[0042]
【発明の効果】以上説明した通り、本発明によれば、電
子材料、半導体材料などに欠かせない銅とポリイミドフ
ィルム等の樹脂との接着性、はんだ耐熱性などに優れ、
長期間の加熱に対する熱劣化に対して安定した接着性を
示す接着フィルムを提供することができる。As described above, according to the present invention, the adhesiveness between copper and a resin such as a polyimide film, which are indispensable for electronic materials and semiconductor materials, and the heat resistance of solder are excellent.
It is possible to provide an adhesive film showing stable adhesiveness against thermal deterioration due to long-term heating.
───────────────────────────────────────────────────── フロントページの続き (72)発明者 平山 隆雄 茨城県鹿島郡波崎町大字砂山五番壱 日立 化成工業株式会社鹿島工場内 (72)発明者 平倉 裕昭 茨城県鹿島郡波崎町大字砂山五番壱 日立 化成工業株式会社鹿島工場内 ──────────────────────────────────────────────────続 き Continuing on the front page (72) Inventor Takao Hirayama, Oyama Gobanichi, Kajima-gun, Kashima-gun, Ibaraki Prefecture Inside Kashima Plant, Hitachi Chemical Co., Ltd. Banichi Hitachi Chemical Co., Ltd. Kashima Plant
Claims (1)
ルキレングリコールの両末端カルボン酸またはポリカー
ボネートジオールの両末端カルボン酸、10〜70重量
部、他の脂肪族または芳香族多価カルボン酸90〜30
重量部、(B)ジイソシアネートを−COOH/−NC
O>1の条件で反応させて得られるカルボン酸末端ポリ
アミド樹脂に、エポキシ樹脂をエポキシ基/カルボン酸
基>1の条件で反応させて得られるエポキシ当量100
0〜40000の変性ポリアミドエポキシ樹脂に難燃
剤、ビスマレイミドとジアミンを反応させたオリゴマー
を添加した樹脂組成物を基材上に塗布、乾燥して製造す
ることを特徴とする接着フィルムの製造方法。1. A polycarboxylic acid component having 10 to 70 parts by weight of a carboxylic acid at both terminals of a polyalkylene glycol or a carboxylic acid at both terminals of a polycarbonate diol, and 90 to 90 parts by weight of another aliphatic or aromatic polycarboxylic acid. 30
Parts by weight, (B) diisocyanate is -COOH / -NC
O> epoxy equivalent obtained by reacting an epoxy resin with a carboxylic acid-terminated polyamide resin obtained under the condition of O> 1 under the condition of epoxy group / carboxylic acid group> 1.
A method for producing an adhesive film, comprising applying a resin composition obtained by adding a flame retardant, an oligomer obtained by reacting a bismaleimide and a diamine to a modified polyamide epoxy resin having a molecular weight of 0 to 40,000, onto a substrate, and drying.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP8287747A JPH10130400A (en) | 1996-10-30 | 1996-10-30 | Production of adhesive film |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP8287747A JPH10130400A (en) | 1996-10-30 | 1996-10-30 | Production of adhesive film |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| JPH10130400A true JPH10130400A (en) | 1998-05-19 |
Family
ID=17721243
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP8287747A Pending JPH10130400A (en) | 1996-10-30 | 1996-10-30 | Production of adhesive film |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JPH10130400A (en) |
Cited By (4)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP2001200232A (en) * | 2000-01-14 | 2001-07-24 | Hitachi Chem Co Ltd | Adhesive, adhesive film and semiconductor apparatus by use thereof |
| WO2009098141A1 (en) * | 2008-02-05 | 2009-08-13 | Tesa Se | Thermally-activated and –hardenable adhesive foil, especially for adhesion of electronic components and flexible printed circuit paths |
| KR20200071060A (en) | 2017-10-27 | 2020-06-18 | 세키스이가가쿠 고교가부시키가이샤 | Curable resin composition, cured product, adhesive, and adhesive film |
| JP2023096903A (en) * | 2021-12-27 | 2023-07-07 | 株式会社レゾナック | Photoelectric sensor manufacturing method |
-
1996
- 1996-10-30 JP JP8287747A patent/JPH10130400A/en active Pending
Cited By (4)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP2001200232A (en) * | 2000-01-14 | 2001-07-24 | Hitachi Chem Co Ltd | Adhesive, adhesive film and semiconductor apparatus by use thereof |
| WO2009098141A1 (en) * | 2008-02-05 | 2009-08-13 | Tesa Se | Thermally-activated and –hardenable adhesive foil, especially for adhesion of electronic components and flexible printed circuit paths |
| KR20200071060A (en) | 2017-10-27 | 2020-06-18 | 세키스이가가쿠 고교가부시키가이샤 | Curable resin composition, cured product, adhesive, and adhesive film |
| JP2023096903A (en) * | 2021-12-27 | 2023-07-07 | 株式会社レゾナック | Photoelectric sensor manufacturing method |
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