JPH101304A - Photoexcited production of four-coordinated BN material - Google Patents
Photoexcited production of four-coordinated BN materialInfo
- Publication number
- JPH101304A JPH101304A JP19131896A JP19131896A JPH101304A JP H101304 A JPH101304 A JP H101304A JP 19131896 A JP19131896 A JP 19131896A JP 19131896 A JP19131896 A JP 19131896A JP H101304 A JPH101304 A JP H101304A
- Authority
- JP
- Japan
- Prior art keywords
- raw material
- phase
- laser beam
- hbn
- group
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
Landscapes
- Physical Or Chemical Processes And Apparatus (AREA)
Abstract
(57)【要約】
【目的】従来の高圧高温条件によらぬ四配位結合窒化ホ
ウ素、即ちcBN、wBN等の製造法を提供する。
【構成】sp2混成結合による窒化ホウ素、hBN等の
無処理あるいはドープ用の処理をした原料にそれの面外
振動モードに共鳴する赤外線の超短パルスの高エネルギ
ー密度の光を照射して四配位結合窒化ホウ素を製造す
る。付随する処理法により半導体素子の構造と機能を作
り込む。
(57) [Summary] [Object] To provide a method for producing four-coordinate bonded boron nitride, that is, cBN, wBN, etc., without using the conventional high pressure and high temperature conditions. The raw material which has been subjected to untreated or doped treatment such as boron nitride or hBN by sp 2 hybrid bonding is irradiated with high energy density light of infrared ultra-short pulse resonating in its out-of-plane vibration mode. Produce coordination bonded boron nitride. The structure and function of the semiconductor device are created by the accompanying processing method.
Description
【0001】[0001]
【発明の属する技術分野】この発明は(イ)照明、表
示、光記録、光診断、光治療等の技術に用いる発光ダイ
オードおよびエレクトロルミネッセンス材料、(ロ)原
子力関連技術に用いる中性子検出用半導体素子材料、
(ハ)自動車、資源探索等の技術における高温用の各種
半導体素子材料等となるBN半導体材料、および金属等
の加工における切削、研削のための超硬質BN材料の製
造法に関するものである。BACKGROUND OF THE INVENTION 1. Field of the Invention The present invention relates to (a) a light-emitting diode and an electroluminescent material used in technologies such as illumination, display, optical recording, optical diagnosis, and phototherapy, and (b) a neutron detecting semiconductor device used in nuclear-related technologies. material,
(C) The present invention relates to a method for producing a BN semiconductor material as a high-temperature various semiconductor element material or the like in technologies such as automobiles and resource search, and a super-hard BN material for cutting and grinding in the processing of metals and the like.
【0002】[0002]
【従来の技術】cBNを代表とするsp3相BNは主と
してダイヤモンドに次ぐ超硬材料として金属等の切削器
具等に用いられている。近年半導体材料として通常の材
料が用られない領域の技術での可能性が示された。超硬
材料は専ら超高圧力技術により、hBN等のsp2相材
料の原料と触媒と呼ばれている種々のフラックス材料を
混合して5万気圧近辺、1700℃近辺で溶解し結晶を
析出させる方法で作られている。近来、主に半導体材料
を目指してダイヤモンドで実証された気相からの蒸着作
製法に倣った方法が試みられているが未だに実現に至っ
ていない。2. Description of the Related Art Sp three- phase BN represented by cBN is mainly used as a super-hard material next to diamond for cutting tools such as metals. In recent years, the possibility of technology in a region where ordinary materials are not used as semiconductor materials has been shown. The superhard material exclusively ultra high pressure technology, around 50,000 atm by mixing the various flux material that has been called the raw material and the catalyst sp 2 phase material, such as hBN, to precipitate the dissolved crystals at around 1700 ° C. Made by the way. In recent years, a method has been attempted in accordance with the method of producing a vapor from a gas phase, which has been demonstrated for diamond, mainly for a semiconductor material, but has not yet been realized.
【0003】[0003]
【発明が解決しようとする課題】従来の方法によっては
半導体材料を作ることは困難であった。その場合、目的
に応じ純度、組成、構造の制御が必要であり、しばしば
膜状に作る必要がある。しかし前項に記した現行の高圧
高温法では小さな密閉空間での結晶作製であるために半
導体作製上の制御技術の殆どを使うことが出来ない。ま
たフラックスからの自然析出であるために組成制御と純
度向上に制約を受けるほかフラックス成分他の汚染を防
ぐのは困難である。本発明は従来と全く異なる方法で四
配位結合(sp3相)BN材料を作る方法を提供するこ
とにより高純度と組成および構造の高度の制御を必要と
する半導体材料の製造を可能にし、超硬材料についても
新しい応用の可能性を拓く製造法を提供しようとするも
のである。SUMMARY OF THE INVENTION It has been difficult to produce semiconductor materials by conventional methods. In that case, it is necessary to control the purity, composition, and structure according to the purpose, and it is often necessary to form a film. However, in the current high-pressure high-temperature method described in the preceding paragraph, since the crystal is formed in a small enclosed space, most of the control techniques for manufacturing the semiconductor cannot be used. In addition, since it is naturally precipitated from the flux, it is difficult to control the composition and improve the purity, and it is difficult to prevent the contamination of the flux components and the like. The present invention enables the production of semiconductor materials that require high purity and a high degree of control over composition and structure by providing a method of making four-coordinated (sp 3 phase) BN material in a completely different way than before. It also aims to provide a manufacturing method that opens up new application possibilities for cemented carbide materials.
【0004】[0004]
【課題を解決するための手段】sp2相の代表と言える
hBNからsp3相の一つwBNへの転移を例として説
明する。他の場合即ちrBNからcBNへの転換等につ
いても同じ原理を適用出来る。hBN(7)A2uモー
ドはA transition from hBN, which can be said to be a representative of the sp 2 phase, to one wBN of the sp 3 phase will be described as an example. The same principle can be applied to other cases, such as conversion from rBN to cBN. hBN (7) A 2u mode is
【図1】の右に矢印で示す様にC軸、<111>方向に
振動するものである。この振動の矢印が互いに近づくよ
うに結合を形成したものが図の左のwBNである。本発
明はこの振動の振幅を大きく励振することでh相からw
相へ転移させるのである。従来の方法はいわばそれを熱
で行っていたのである。転移を促進するために加圧条件
下で上記の光照射を行うことは有効である。本発明では
原料として、hBN等のsp2相の焼結体等、あるいは
それにドーパントをドープ、混合、蒸着した物を用い
る。ドーピングを行うことによりp、n型半導体、発光
材料等を作製することが出来る。原料あるいは成型した
原料またはドーパントを模様を着けて蒸着した原料に位
置を設定して上記の光照射をすることで面状の構造等を
作製することが出来る。本発明が用いる光吸収は強度の
強いもので原料の表面近傍で吸収されるので膜状の四配
位結合材料を製造することが出来る。FIG. 1 is a diagram that vibrates in the <111> direction on the C axis as indicated by an arrow to the right of FIG. A wBN on the left side of the figure is formed by forming a bond such that the arrows of the vibrations approach each other. The present invention excites the amplitude of this vibration to a large value so that
The transition to the phase. The conventional method, so to speak, did it with heat. It is effective to perform the above light irradiation under a pressurized condition in order to promote the transition. In the present invention, a sp 2 phase sintered body such as hBN or the like, or a material obtained by doping, mixing, and vapor-depositing a dopant is used as a raw material. By doping, a p-type or n-type semiconductor, a light-emitting material, or the like can be manufactured. A planar structure or the like can be manufactured by setting the position of the raw material, the formed raw material, or the raw material obtained by depositing a dopant with a pattern, and irradiating the light. Since the light absorption used in the present invention is strong and is absorbed near the surface of the raw material, a film-shaped four-coordinate bonding material can be produced.
【0005】[0005]
【発明の実施の形態】本発明実施の形態について前項と
同じくhBNからwBNの製造を例として説明する。本
発明の振動の励振、転移の過程は以下の様に起こる。光
による励振は量子過程である。A2uモードに共鳴する
波長、1.28×104nmの光を当てると通常振動状
態が1つ励起される。その状態は他の振動モードヘ緩和
しようとするが、すぐ光が来れば更に上の励起状態に上
がる。そうして二つの相の境界にある遷移状態のポテン
シャルの山の頂まで振動量子状態の階段を登らせてそこ
を越えさせる(これは振幅を増大させ結合を形成させる
ことに相当する)には各振動準位からの緩和に打ち勝っ
て、各々が励起状態に有る間に上へ励起しなくてはなら
ない。そのためps(10−12秒)程と見込まれる緩
和時間幅内に十分なエネルギーを持つほぼps以下の時
間幅のパルス状のレーザー光を用いる。各振動状態間の
励起に必要なエネルギーは高い励起状態ほど小さくなる
(振動の非調和性)。パルス光は不確定性原理によるス
ペクトル幅を持つ。上記のA2uモード1.28×10
4nmmの辺では、1ps幅の光パルスは5.2×10
nmのスペクトル幅を持ち、実現可能な短時間幅の限界
のほぼ10fs(10−15s)では5.2×103n
mのスペクトル幅になる。この幅は非調和性による振動
励起光の波長のずれを自ずと補償し、他の振動モードを
励起するほどには広くはない範囲にある。他のモードが
励起されると転移を進行させる振動の選択性を弱め、逆
向させる振動を励起する等で転移の効率を損ねる。遷移
状態の山を越えるに至る振動準位の数をNとするとその
状態の濃度は入射エネルギーのN乗に比例する。以上の
考察から前記のA2uモードの波長を中心とする幅ほぼ
1ps以下、パルス当たりのエネルギーが大きな光を集
光して高いエネルギー密度の照射をすることが望ましい
ことが分かる。wBN(5hBN結晶の密度はそれぞれ
3.49×103kg/m3と2.26×103kg/
m3である。従って、ル・シャトリエ則に照らして加圧
下でh相からw相への転移は促進されるので、目的に合
って可能なら加圧下で照射を実行することが望ましい。
なお常圧の安定相は従来言われていたh相ではなくc
相、敷延してsp3相であるとの説が提出されている
が、本発明はこの問題の解決の如何には因らない。ドー
ピングはドープした原料あるいはドーパントを混合した
原料、原料の試料体にドーパントを蒸着したものに上記
の光処理をすることによって行う。pn接合、点状、線
状の素子構造等の作り込みは光ビームの照射位置の設
定、走査あるい照射時間の設定を試料の処理と組み合わ
せて行う。この試料の処理は原料の成型、形成を目論む
模様にドーパントを蒸着する等によって行う。またこの
試料処理は光照射と前後して、あるいは交互に等、目的
に応じた時系列で行う。本発明の核心である格子振動モ
ードによる光吸収は強くて原料の表面層で吸収される。
更に前記のように転移の光強度依存は極めて強い。従っ
て四配位結合材料は膜状に形成される。BEST MODE FOR CARRYING OUT THE INVENTION Embodiments of the present invention will be described by taking as an example the production of wBN from hBN as in the previous section. The process of exciting and transferring the vibration according to the present invention occurs as follows. Excitation by light is a quantum process. When light having a wavelength of 1.28 × 10 4 nm that resonates with the A 2u mode is applied, one normal vibration state is excited. The state tries to relax to another vibration mode, but if light comes soon, it rises to a higher excited state. To climb the staircase of the vibrational quantum state to the top of the potential of the transition state at the boundary between the two phases and to cross it (this is equivalent to increasing the amplitude and forming a coupling) It must overcome the relaxation from each vibrational level and excite upward while each is in the excited state. Therefore, a pulsed laser beam having a time width of substantially ps or less and having sufficient energy within a relaxation time width expected to be about ps (10 −12 seconds) is used. The energy required for excitation between the vibrational states is smaller for higher excitation states (vibration anharmonicity). The pulsed light has a spectrum width based on the uncertainty principle. Above A 2u mode 1.28 × 10
On the side of 4 nm, a light pulse of 1 ps width is 5.2 × 10
It has a spectral width of nm, and is 5.2 × 10 3 n at a limit of the short-time width that can be realized is approximately 10 fs (10 −15 s).
m spectral width. This width naturally falls within a range that is not large enough to compensate for the wavelength shift of the vibration excitation light due to anharmonicity and to excite other vibration modes. When other modes are excited, the selectivity of the vibration that causes the transition to proceed is reduced, and the efficiency of the transition is impaired by exciting the reverse vibration. Assuming that the number of vibration levels reaching the peak of the transition state is N, the concentration in that state is proportional to the Nth power of the incident energy. From the above considerations, it can be seen that it is desirable to condense light having a width of about 1 ps or less and a large energy per pulse centering on the wavelength of the A2u mode and irradiating with high energy density. The density of wBN (5 hBN crystals is 3.49 × 10 3 kg / m 3 and 2.26 × 10 3 kg / m 3 , respectively)
m is 3. Therefore, the transition from the h-phase to the w-phase is promoted under pressure according to the Le Chatelier rule, and it is desirable to carry out the irradiation under pressure if possible for the purpose.
The stable phase at normal pressure is not the h phase,
Phase, although the theory of the insole is sp 3 phase cast has been filed, the present invention does not depend on the how to solve this problem. The doping is performed by performing the above-described light treatment on a doped raw material, a raw material in which a dopant is mixed, or a raw material obtained by depositing a dopant on a sample. The formation of a pn junction, point-like or linear element structure, etc. is performed by setting the irradiation position of the light beam and setting the scanning or irradiation time in combination with the processing of the sample. The processing of this sample is performed by vapor-depositing a dopant in a pattern intended for molding and forming the raw material. This sample processing is performed in a time series according to the purpose, such as before or after light irradiation, or alternately. Light absorption by the lattice vibration mode, which is the core of the present invention, is strong and is absorbed by the surface layer of the raw material.
Further, as described above, the light intensity dependence of the transition is extremely strong. Therefore, the four-coordinate bonding material is formed in a film shape.
【0006】[0006]
【実施例1】Embodiment 1
【図2】に基本的な作製装置の例を示す。原料1.とし
て10mm×10mm×2mmのpBN(微小hBNが
焼結している)を用いた。それをx、y二軸に移動する
台8.の上に固定しておく。それを200mmφ×20
0mmの容器2.の中に設置した。容器には中央試料上
部に当たる処に20mmφ×5mm(7)Siの窓を置
いた。容器内部は一気圧の窒素を充填した。レーザー光
源としてはパラメトリック発振方式の波長可変超短パル
スレーザーを用いた。それを1.28×104nmに同
調した。パルス幅100fs、パルスエネルギー0.8
μJ、10Hzで動作させ、凹面鏡4.により試料上に
集光し、パルス当たり約0.1J/cm2のエネルギー
密度を得た。5.は光の偏向子であり台8.と共に構造
の作り込みに用いる。レーザービームを固定して10分
照射を行い、照射部と非照射部のルミネッセンススペク
トルを測定した。非照射部には混入C(pBNにはこの
混入がある)による発光が認められるが照射部ではwB
Nによく見られる400nm辺の構造を持ったスペクト
ルが観測されh相からw相への転移が確認された。FIG. 2 shows an example of a basic manufacturing apparatus. Raw material 1. Used was 10 mm × 10 mm × 2 mm pBN (small hBN was sintered). 7. A table that moves it in two axes x and y Fixed on top. 200mmφ × 20
1. 0 mm container We installed in. A 20 mmφ × 5 mm (7) Si window was placed on the container at a position corresponding to the upper part of the central sample. The inside of the container was filled with one atmosphere of nitrogen. As a laser light source, a parametric oscillation type tunable ultrashort pulse laser was used. It was tuned to 1.28 × 10 4 nm. Pulse width 100fs, pulse energy 0.8
3. Operate at μJ, 10 Hz, concave mirror And focused on the sample, thereby obtaining an energy density of about 0.1 J / cm 2 per pulse. 5. Is a light deflector and the base is 8. Used together with the structure. Irradiation was performed for 10 minutes while fixing the laser beam, and the luminescence spectra of the irradiated part and the non-irradiated part were measured. Light emission due to contamination C (pBN has this contamination) is observed in the non-irradiated portion, but wB
A spectrum having a structure on the 400 nm side often observed in N was observed, and a transition from the h phase to the w phase was confirmed.
【実施例2】pBN試料の半分をアルミ箔で覆ってSi
を蒸着し、続いてその部分を覆ってBeを蒸着、その境
界を中にして5mm角にレーザービームを走査しながら
一時間処理し、表面を軽く研磨して蒸着物を除き、境界
接合部の反対側に電極をつけこの境界部のEBIC(電
子線誘起電流)像を観測し、空間電荷層の存在を確認し
た。これは意図したドープとpn接合形成が成されたこ
とを示す。Example 2 Half of the pBN sample was covered with aluminum foil and Si
, Followed by deposition of Be over the portion, processing for 1 hour while scanning the laser beam in a 5 mm square with the boundary in the middle, lightly polishing the surface to remove the deposit, and removing the boundary joint. An electrode was attached to the opposite side, and an EBIC (electron beam induced current) image of this boundary was observed to confirm the existence of a space charge layer. This indicates that the intended doping and pn junction formation were achieved.
【実施例3】ビームを10分固定して照射し[Embodiment 3] Irradiation with the beam fixed for 10 minutes
【図2】の台8.をx方向に30μm移動して同様の照
射を行うと言った過程を5回行った。走査電子顕微鏡の
ルミネッセンス観察により、30μm毎に配列した点状
の発光像を観察し、そのスペクトルが四配位結合BN固
有のものであった。微小な構造のそうしたBNの製造が
可能なことが示された。FIG. Was moved 30 μm in the x direction and the same irradiation was performed five times. By luminescence observation with a scanning electron microscope, point-like emission images arranged every 30 μm were observed, and the spectrum was unique to the four-coordinated BN. It has been shown that such a BN with a small structure can be manufactured.
【0007】[0007]
【発明の効果】四配位結合BNと類似の性質を持つダイ
ヤモンドでは気相法が実現しているためにに半導体材料
化が試みられている。しかし多くの半導体的性能項目に
ついてBNはダイヤモンドより優れていることが分かっ
ているにもかかわらず従来の製造法故にその実現に至っ
ていない。本発明はBNが本来持つ優れた半導体機能の
実現を可能にするものである。超硬材料等でも新しい可
能性を実現させる可能性が拓けたと言える。As described above, a diamond material having properties similar to those of the four-coordinate bond BN has been used as a semiconductor material since the vapor phase method has been realized. However, although it has been found that BN is superior to diamond for many semiconductor performance items, it has not been realized due to the conventional manufacturing method. The present invention enables the realization of excellent semiconductor functions inherent to BN. It can be said that the possibility of realizing new possibilities even with cemented carbide materials has been opened.
【図1】本発明の原理の説明のための図。sp2結合B
Nの代表hBNの結晶構造と格子振動、wBNの結晶構
造、これら二者の化学結合を示す。何れもC軸とそれに
垂直な一群の結合を含む面への投影。大きな丸は紙面に
ある原子、小さな丸は奥にある原子。黒をBとすれば白
はN。丸を結ぶ線は強い共有結合。hBNの面間は弱い
ファン・デル・ワールス結合。矢印はA2uモードの振
動の変位。FIG. 1 is a diagram for explaining the principle of the present invention. sp 2 bond B
The crystal structure and lattice vibration of the representative hBN of N, the crystal structure of wBN, and the chemical bond of these two are shown. Both are projections onto a plane containing the C axis and a group of bonds perpendicular to it. The big circle is the atom on the paper, and the small circle is the atom at the back. If black is B, white is N. The line connecting the circles is a strong covalent bond. Weak van der Waals coupling between hBN planes. Arrows indicate displacement of A2u mode vibration.
1、2、3はhBNの6角、蜂の巣状網面。 1, 2, and 3 are the hexagons of hBN and the honeycomb mesh surface.
【図2】本発明の製造法で用いる装置の模式図。FIG. 2 is a schematic view of an apparatus used in the production method of the present invention.
1.原料 2.容器 3.レーザーとその電源 4.反射鏡 5.光偏向素子(X、Y二方向に偏向) 5’.5.の駆動器 6.窓 7.雰囲気調整装置 8.X,Y二方向微動試料台 8’.8の駆動器 9.全系の制御用コンピュータ 1. Raw materials 2. Container 3. Laser and its power supply Reflecting mirror 5. Light deflecting element (deflects in two directions, X and Y) 5 '. 5. Driver of 6. Window 7. Atmosphere adjustment device 8. X, Y bidirectional fine motion sample stage 8 '. 8. Driver of 8 Control computer for the whole system
Claims (5)
るBN即ちhBN(六方晶BN)、rBN(菱面体晶B
N)、pBN(熱分解BN)、tBN(乱層構造B
N)、a−BN(アモルファスBN)、(これらを以下
sp2相と称する)の何れかの、粉末、焼結体、単結晶
の何れかを原料とし、(ロ)そのsp2混成軌道からな
る結合を含む面に垂直に変位する振動モードに共鳴する
超短パルスレーザー光を高密度に照射することによるs
p3混成軌道による結合からなるcBN(立方晶BN)
あるいはwBN(ウルツ鉱型BN)材料等の四配位結合
BN(以下、sp3相と称する)材料の製造法。1. (a) BN consisting of bonds by sp 2 hybrid orbitals, that is, hBN (hexagonal BN), rBN (rhombohedral B
N), pBN (pyrolysis BN), tBN (turbulent structure B
N), a-BN (amorphous BN), (any of these hereinafter referred to as sp 2 phase), powder, sintered body, one of the single crystal as a raw material, from (b) Part sp 2 hybrid orbital S by irradiating an ultrashort pulse laser beam that resonates with a vibration mode displaced perpendicularly to the plane containing the coupling
p 3 cBN consisting binding by hybrid orbital (cubic BN)
Alternatively, a method for producing a four-coordinate bond BN (hereinafter, referred to as sp 3 phase) material such as a wBN (wurtzite BN) material.
C、Si、等のIV族元素、あるいはO、S等のVI族
元素、その他光学的に活性を有する遷移金属、稀土類元
素等を単独、あるいは組み合わせて、それぞれを10
−(1〜8)のモル比でドープあるいは蒸着または混合
して含むものを原料とする請求項1の製造法。2. A group 11 element such as Be or Mg as a raw material;
Group IV elements such as C and Si, group VI elements such as O and S, other optically active transition metals, rare earth elements, etc., alone or in combination, each having 10
2. The method according to claim 1, wherein a material containing dope, vapor deposition or mixture in a molar ratio of-(1-8) is used as a raw material.
求項1または2による製造法。3. The method according to claim 1, wherein the raw material is pressurized in a pressure vessel.
ザー光の照射の位置を照射面内で制御し、あるいはそう
した面を積み上げる請求項1、2または3による製造
法。4. The method according to claim 1, wherein the irradiation position of the laser beam is controlled within the irradiation surface to form and control the composition and structure, or such surfaces are stacked.
請求項1、2、3、または4による製造法。5. The method according to claim 1, wherein an annealing step is inserted into the laser beam irradiation step.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP19131896A JPH101304A (en) | 1996-06-17 | 1996-06-17 | Photoexcited production of four-coordinated BN material |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP19131896A JPH101304A (en) | 1996-06-17 | 1996-06-17 | Photoexcited production of four-coordinated BN material |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| JPH101304A true JPH101304A (en) | 1998-01-06 |
Family
ID=16272567
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP19131896A Pending JPH101304A (en) | 1996-06-17 | 1996-06-17 | Photoexcited production of four-coordinated BN material |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JPH101304A (en) |
Cited By (6)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| EP1329741A1 (en) * | 2002-01-14 | 2003-07-23 | Advanced Ceramics Corporation | A semiconductor detector for thermal neutrons based on pyrolytic boron nitride |
| WO2005022578A1 (en) * | 2003-08-29 | 2005-03-10 | National Institute For Materials Science | sp3 BONDING BORON NITRIDE THIN FILM HAVING SELF-FORMING SURFACE SHAPE BEING ADVANTAGEOUS IN EXHIBITING PROPERTY OF EMITTING ELECTRIC FIELD ELECTRONS, METHOD FOR PREPARATION THEREOF AND USE THEREOF |
| WO2006085307A1 (en) * | 2005-02-08 | 2006-08-17 | Yissum Research Development Company Of The Hebrew University Of Jerusalem | Solid-state neutron and alpha particles detector and methods for manufacturing and use thereof |
| JP2009256766A (en) * | 2008-03-26 | 2009-11-05 | National Institute For Materials Science | BN THIN FILM HAVING sp3-BONDED BN HIGH DENSITY PHASE, AND METHOD FOR PRODUCING THE SAME |
| CN105127430A (en) * | 2015-08-24 | 2015-12-09 | 珠海市钜鑫科技开发有限公司 | Ultra-hard material containing cubic boron nitride, wurtzite type boron nitride and diamond and preparation method of ultra-hard material |
| US9962523B2 (en) | 2008-06-27 | 2018-05-08 | Merit Medical Systems, Inc. | Catheter with radiopaque marker |
-
1996
- 1996-06-17 JP JP19131896A patent/JPH101304A/en active Pending
Cited By (8)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| EP1329741A1 (en) * | 2002-01-14 | 2003-07-23 | Advanced Ceramics Corporation | A semiconductor detector for thermal neutrons based on pyrolytic boron nitride |
| KR20030062213A (en) * | 2002-01-14 | 2003-07-23 | 러셀 라이스트 존 | A semiconductor detector for thermal neutrons based on pyrolytic boron nitride |
| US6624423B2 (en) | 2002-01-14 | 2003-09-23 | General Electric Company | Semiconductor detector for thermal neutrons based on pyrolytic boron nitride |
| WO2005022578A1 (en) * | 2003-08-29 | 2005-03-10 | National Institute For Materials Science | sp3 BONDING BORON NITRIDE THIN FILM HAVING SELF-FORMING SURFACE SHAPE BEING ADVANTAGEOUS IN EXHIBITING PROPERTY OF EMITTING ELECTRIC FIELD ELECTRONS, METHOD FOR PREPARATION THEREOF AND USE THEREOF |
| WO2006085307A1 (en) * | 2005-02-08 | 2006-08-17 | Yissum Research Development Company Of The Hebrew University Of Jerusalem | Solid-state neutron and alpha particles detector and methods for manufacturing and use thereof |
| JP2009256766A (en) * | 2008-03-26 | 2009-11-05 | National Institute For Materials Science | BN THIN FILM HAVING sp3-BONDED BN HIGH DENSITY PHASE, AND METHOD FOR PRODUCING THE SAME |
| US9962523B2 (en) | 2008-06-27 | 2018-05-08 | Merit Medical Systems, Inc. | Catheter with radiopaque marker |
| CN105127430A (en) * | 2015-08-24 | 2015-12-09 | 珠海市钜鑫科技开发有限公司 | Ultra-hard material containing cubic boron nitride, wurtzite type boron nitride and diamond and preparation method of ultra-hard material |
Similar Documents
| Publication | Publication Date | Title |
|---|---|---|
| US9966296B2 (en) | Method of laser separation of the epitaxial film or the epitaxial film layer from the growth substrate of the epitaxial semiconductor structure (variations) | |
| Von Behren et al. | Quantum confinement in nanoscale silicon: The correlation of size with bandgap and luminescence | |
| Kim et al. | 4H-SiC wafer slicing by using femtosecond laser double-pulses | |
| US8617669B1 (en) | Laser formation of graphene | |
| TW503142B (en) | Single crystal cutting method | |
| Zhang et al. | Optical properties of single-crystalline α-Si3N4 nanobelts | |
| Stepikhova et al. | Light emission from Ge (Si)/SOI self-assembled nanoislands embedded in photonic crystal slabs of various periods with and without cavities | |
| US6750393B2 (en) | Back reflector of solar cells | |
| CN112038222A (en) | Method for producing group III nitride semiconductor | |
| US7158546B2 (en) | Composite laser rod, fabricating method thereof, and laser device therewith | |
| CN1244948A (en) | Method and device for activating semiconductor impurities | |
| JPH101304A (en) | Photoexcited production of four-coordinated BN material | |
| JP2023126228A (en) | Method for cutting group III nitride single crystal | |
| Yelisseyev et al. | Effect of antireflection microstructures on the optical properties of GaSe | |
| Nataraj et al. | Direct-bandgap luminescence at room-temperature from highly-strained Germanium nanocrystals | |
| Kanemitsu | Light-emitting silicon materials | |
| Kim et al. | Nano periodic structure formation in 4H–SiC crystal using femtosecond laser double-pulses | |
| JPH06234595A (en) | Diamond thin plate manufacturing method | |
| Shklyaev et al. | Photoluminescence of Ge∕ Si structures grown on oxidized Si surfaces | |
| JP4800729B2 (en) | Substrate processing method and light emitting device manufacturing method | |
| Kanemitsu | Silicon and germanium nanoparticles | |
| JP4105686B2 (en) | Method for producing diamond from graphite by inner shell electronic excitation. | |
| CN107004569A (en) | The use of material in separation method and separation method | |
| Mc Kay | Chemical Mechanical polishing and Direct Bonding of YAG and Y2O3 | |
| JP4934986B2 (en) | Emitter material for thermophotovoltaic power generation |