JPH10140331A - Vapor-deposited film - Google Patents

Abstract

PROBLEM TO BE SOLVED: To prepare a film having metallic gloss excellent in decorativeness without being detected by certain kinds of metal detectors by forming a vapor depositing layer with a specified thickness essentially consisting of Al and oxygen on a substrate film and specifying the surface electric resistance and light reflectance on the side of the vapor depositing layer. SOLUTION: At least one side of a substrate film is provided with a vapor depositing layer (VAO) with 300 to 3000Å thickness essentially consisting of Al and oxygen. The electric resistance of the surface of the vapor depositing layer is regulated to 3.0Ω/square, and the light reflectance at 400mμ wavelength on the side of the vapor depositing layer is regulated to >=80%. The film stock is composed of one or more kinds among polyester contg. >=85wt.% unit of polyethylene terephthalate, polyolefine and polyamide. The ratio of the total of Al to oxygen occupied in the vapor depositing layer is preferably regulated to >=90%. Al and oxygen are properly coexistent and are integrated and arranged as one layer to form the vapor depositing layer. The vapor depositing layer may contain the nitride of Al, the oxide of silicon and the nitride of silicon.

Description

DETAILED DESCRIPTION OF THE INVENTION

[0001]

BACKGROUND OF THE INVENTION 1. Field of the Invention The present invention is used for a packaging material having an aluminum luster excellent in decorativeness, a high gas barrier property and a surface electric resistance of not less than 3.0 Ω / □. The present invention relates to a deposition film having an aluminum deposition layer.

[0002]

2. Description of the Related Art Metal-deposited films are widely used as packaging materials because of their excellent light-reflecting properties, decorative properties, gas-blocking properties, and the like. Among them, economics,
Aluminum deposited films are frequently used for safety and the like. When these metal-deposited films, especially aluminum-deposited films, are used as packaging materials for food, they are detected by a metal detector from the electrical properties of the aluminum-deposited films, or sparks occur when used in a microwave oven. There is a problem that there is. On the other hand, a film in which a metal oxide (aluminum oxide, silicon oxide, etc.) is deposited on a base film, which has been developed as a transparent gas barrier film, has excellent transparency and excellent gas barrier properties. It is widely known that there are many problems that can be caused by heat treatment in a microwave oven, which is a problem of the above-described aluminum vapor-deposited films, but these metal oxide vapor-deposited films are expensive and decorative. Lack of sex,
It is also poor in light reflectivity.

[0003]

SUMMARY OF THE INVENTION The present invention relates to a metal-aluminum-deposited film having excellent light reflectivity, decorativeness, gas-blocking properties, etc., and a specific surface electric resistance. It is to gain.

[0004]

The present invention is directed to a vapor-deposited film having a vapor-deposited layer (VAO) containing aluminum and oxygen as main components on at least one surface of a base film,
The thickness of the vapor-deposited layer is 300 to 3000 °, the surface electric resistance on the vapor-deposited layer side is 3.0 Ω / □ or more, and a wavelength of 40
A vapor-deposited film having a light reflectivity of 0 μm of 80% or more, wherein the base film is made of at least one of polyester, polyolefin, and polyamide having 85% by weight or more of polyethylene terephthalate units. is there.

[0005]

DESCRIPTION OF THE PREFERRED EMBODIMENTS The substrate film in the present invention is:
Polyesters such as polyethylene terephthalate, polybutylene terephthalate, polyethylene naphthalate, and copolymer polyesters containing these units as main components;
Polyamides such as nylon, 6,6-nylon and copolymerized polyamides containing these units as main components, polyolefins such as polyethylene and polypropylene and copolymerized polyolefins containing these units as main components, aromatic polyamides, polyimides and polyvinyls Alcohol-based polymer,
Among these, polyethylene terephthalate, polyesters having 85% by weight or more of polyethylene terephthalate units, polyethylene and polypropylene, copolymerized polyolefins containing these units as main components, 6-nylon and 6,6-nylon And films made of polyamides such as copolymerized polyamides containing these units as main components are more preferable in view of their physical properties and economics. These films may be non-stretched, uniaxially stretched or biaxially stretched by melt-extruding the above-mentioned polymer as a raw material polymer. It may be one obtained by adding and / or coating a colorant such as an absorbent, a pigment, a thermal antioxidant, or a fine particle inorganic filler such as silicon oxide.

[0006] The thickness of the substrate film of the present invention is not particularly limited, but is preferably in the range of 1 to 300 µm, and more preferably in the range of 6 to 150 µm from the viewpoint of mechanical properties and handling. Also, these base films are
A known treatment such as a lubricant layer and a colored layer may be provided on the side opposite to the side on which the vapor deposition layer (VAO) is provided. In the present invention, for example, one or more of a protective layer such as a scratch-resistant layer and a colored layer may be disposed on the vapor deposited layer (VAO).

The vapor deposited layer (VAO) mainly composed of aluminum and oxygen provided on at least one side of the base film of the present invention has a thickness of 300 to 3000 ° and a surface electric resistance of 3.0Ω / □. As described above, the vapor deposition layer provided with the vapor deposition layer has a light reflectance of 80% or more at a wavelength of 400 μm on the vapor deposition layer side of the vapor deposition layer. A vapor deposition layer (VAO) containing aluminum and oxygen as main components indicates that the total of aluminum and oxygen is 85% by weight or more of the vapor deposition layer, and other components are contained in an amount that does not impair the object of the present invention. It may be included. The ratio of the total of aluminum and oxygen to the deposited layer is preferably 90% by weight.
More preferably, it is 95% by weight or more. In the present invention, aluminum and aluminum oxide are not arranged in two layers, but are properly mixed and integrated so as to exert the effects of the present invention, and are arranged as a single layer. The layer containing aluminum and oxygen as main components, which are mixed and integrated into one layer to form a vapor deposition layer, is formed by, for example, an ESCA analysis on the outermost layer of the layer, the inner layer, and the interface with the base film. This is confirmed by the detection of both Al and Al ^{x +} (X is a number from 1 to 3) in the layer.

The vapor deposition layer (VAO) contains both aluminum and various aluminum oxides as main components, and within the above range, other components such as aluminum nitride silicon oxide and silicon nitride. It may contain a nitride or the like. The thickness of the vapor deposition layer (VAO) is 300-3000Å.
, Preferably 350 to 1500 °, and particularly preferably 400 to 1200 °. If the angle is less than 300 °, it is difficult to achieve a light reflectance of 400% or more at a wavelength of 400 μm of 80% or more, resulting in poor barrier properties. On the other hand, if it exceeds 3,000 °, problems such as a decrease in adhesion and cracks during handling are liable to occur, and the occurrence of curl occurs.

It is indispensable that the surface electric resistance, which is a characteristic of the vapor deposition film of the present invention, is 3.0 Ω / □ or more, because it is not detected by the above-mentioned metal detector. It is used as a transfer material, and has a drawback such that an unexpected trouble occurs when it passes through a metal detector when transferred to a packaging material. The surface electric resistance is preferably 4Ω / □ or more. The value of the surface electric resistance is not particularly limited as an upper limit, but does not reach the value of aluminum oxide. Another characteristic of the vapor-deposited film of the present invention, that the light reflectance at a wavelength of 400 μm is 80% or more, is that the film is preferably used for a packaging material, a transfer material, etc., because of its decorativeness due to metallic luster and the like. This is an essential requirement in terms of light transmittance and the like. The light reflectance is preferably at least 82%, more preferably at least 85%. These characteristics of light reflectivity also indicate that, when turned over, the light transmittance is 20% or less, preferably 18% or less, and more preferably 15% or less.

The vapor deposition layer (VAO) is produced by, for example, a reactive vapor deposition method using aluminum metal and oxygen gas described in JP-A-49-122498, or using a mixed target of metallic aluminum and aluminum oxide. A sputtering method, an ion plating method using a mixed evaporation source of metallic aluminum and aluminum oxide, and the like can be used, but are not limited thereto. Among the above-mentioned production methods, a reactive vapor deposition method using aluminum metal and oxygen gas is preferable.
No. 8, a vaporized aluminum may be continuously supplied and reacted at a position immediately before vaporized aluminum is vapor-deposited on a substrate film, and oxygen may be vaporized immediately after vapor deposition is completed. It may be oxidized by reacting with the supplied and vapor-deposited aluminum, or may be subjected to oxygen plasma treatment or oxygen ion bombardment treatment immediately before aluminum vapor deposition, or a combination of these methods may be used as appropriate. .

[0011]

EXAMPLE The same semi-continuous evaporator as used in the apparatus described in JP-A-49-122498 was used to obtain a film having a thickness of 12 μm and a width of 6 μm.
Using a 50 mm polyethylene terephthalate film as the base film, while performing ion bombardment treatment using an aluminum electrode with oxygen gas in the upper chamber (above the partition) of the evaporator, and using the evaporator (below the partition). While a small amount of oxygen gas was supplied to the lower chamber, the supply amount of oxygen gas in the lower chamber and the amount of aluminum vapor deposition were changed to obtain a vapor deposition film on which various vapor deposition layers of aluminum and oxygen were formed. Various NO. The characteristics of the vapor-deposited film due to the change in the conditions were as follows. NO. Deposition layer thickness Surface electric resistance (Ω / □) 400 mμ wavelength light reflectance (%) 1 700 4.2 87 2 680 5.0 86 3 600 4.5 89 4 600 5.5 85 5 600 3.2 91 6 500 4.0 88

[0012]

COMPARATIVE EXAMPLE Using the same apparatus as in the example, the amount of aluminum deposited and the amount of oxygen gas in the upper and lower chambers were changed in the same manner as in the example to form a vapor-deposited layer composed of various aluminum and oxygen. A vapor-deposited film was obtained. The results of evaluating the characteristics in the same manner as in the examples are described below. NO. Deposition layer thickness Surface electric resistance (Ω / □) 400 mμ wavelength light reflectance (%) 7 600 1.6 94 8 600 2.0 92 9 600 10 ¹² 7 By ESCA (Shimadzu 850 photoelectron spectroscopy) analysis The composition of the vapor deposition films of various examples and comparative examples was analyzed. The deposition layers (VAO) of various deposition films are Al, A
It was a mixed layer of aluminum and oxygen such as l ³⁺ and Al ²⁺ . Each of the vapor-deposited films of the examples had sufficient metallic luster, that is, a specific wavelength light reflectance of 80% or more, and a surface electric resistance of 3Ω / □ or more, which was not detected by a metal detector. Was. On the other hand, Comparative Examples Nos. 7 and 8 were sufficient in terms of metallic luster but were detected by the metal detector, while No. 9 was not detected by the metal detector. It was cloudy and almost transparent with almost no metallic luster.

[0013]

According to the present invention, aluminum which is not detected by a certain metal detector and has a metallic luster excellent in decorativeness, which is used for packaging materials, transfer materials, gold and silver yarns, and the like. A vapor deposition film is obtained.

Claims (2)

[Claims] 1. A vapor-deposited film having a vapor-deposited layer (VAO) containing aluminum and oxygen as main components on at least one side of a substrate film, wherein the vapor-deposited layer has a thickness of 300 to
3000 °, and the surface electric resistance of the deposited layer side is 3.0
Ω / □ or more, and the light reflectance at a wavelength of 400 μm is 80
% Or more. 2. The vapor-deposited film according to claim 1, wherein the base film is made of at least one of polyester, polyolefin and polyamide having 85% by weight or more of polyethylene terephthalate units.