JPH1016277A - Method of forming holes in recording head - Google Patents

Method of forming holes in recording head

Info

Publication number
JPH1016277A
JPH1016277A JP17330996A JP17330996A JPH1016277A JP H1016277 A JPH1016277 A JP H1016277A JP 17330996 A JP17330996 A JP 17330996A JP 17330996 A JP17330996 A JP 17330996A JP H1016277 A JPH1016277 A JP H1016277A
Authority
JP
Japan
Prior art keywords
mask
hole
insulating substrate
recording head
electrode
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP17330996A
Other languages
Japanese (ja)
Inventor
Hideaki Mori
秀明 森
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Brother Industries Ltd
Original Assignee
Brother Industries Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Brother Industries Ltd filed Critical Brother Industries Ltd
Priority to JP17330996A priority Critical patent/JPH1016277A/en
Publication of JPH1016277A publication Critical patent/JPH1016277A/en
Pending legal-status Critical Current

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  • Printers Or Recording Devices Using Electromagnetic And Radiation Means (AREA)

Abstract

PROBLEM TO BE SOLVED: To form a hole on a recording head at a predetermined position without displacement at the time of the hole formation by forming the hole by radiating a laser light beam to an area between an electrode portion and a mask portion adjacent to each other on an insulating substrate from one surface side. SOLUTION: On one side surface of an insulating sheet 110 comprising a 25 to 100μm thickness polyimide resin as an insulating substrate, a 1 to 15μm thickness copper foil is formed uniformly by a deposition method. By an etching method, a mask pattern 120 as a mask portion and a control electrode 130 as an electrode portion, which serves as a laser processing mask pattern and an electrically effective pattern, are formed. A slit mask as an optical path regulating member, formed by forming a rectangular slit opening in an extremely thin stainless steel plate, is superimposed on the mask pattern 120 and the control electrode 130 on the insulating sheet 110 and irradiated with an excimer laser beam. Accordingly, a hole can be formed at a predetermined position without positioning.

Description

【発明の詳細な説明】DETAILED DESCRIPTION OF THE INVENTION

【0001】[0001]

【発明の属する技術分野】本発明は、荷電粒子の流れを
制御して画像の記録を行う記録ヘッドを作製するため
に、レーザー光を用いて、絶縁性基板に対して所定の位
置に前記荷電粒子を通過させる孔を形成する、記録ヘッ
ドの孔形成方法に関するものである。
BACKGROUND OF THE INVENTION 1. Field of the Invention The present invention relates to a recording head for recording an image by controlling the flow of charged particles. The present invention relates to a method for forming a hole in a recording head, which forms a hole through which particles pass.

【0002】[0002]

【従来の技術】従来、主として複写機、プリンター、フ
ァクシミリ等に利用される画像形成装置として、絶縁性
基板上に開口を有する導体箔パターンを形成し、その開
口に孔形成し、導体箔パターンにIC等の駆動素子を接
続して構成された記録ヘッドを用い、駆動素子から導体
箔パターンに電圧を印加することで孔内部に静電界を形
成し、この静電界の向きや大きさを切り換えることで荷
電粒子を選択的に孔を通過させて支持体上に付着させる
方式のものが、例えば、特開平2−297570号、特
開平6−79907号各公報等に開示されている。
2. Description of the Related Art Conventionally, as an image forming apparatus mainly used in copying machines, printers, facsimile machines, etc., a conductive foil pattern having an opening is formed on an insulating substrate, holes are formed in the opening, and a conductive foil pattern is formed. Using a recording head configured by connecting driving elements such as ICs, applying a voltage to the conductive foil pattern from the driving elements to form an electrostatic field inside the hole, and switching the direction and magnitude of this electrostatic field For example, JP-A-2-297570 and JP-A-6-79907 disclose a method in which charged particles are selectively passed through holes and adhered to a support.

【0003】前記のような孔を形成する方法としては、
レーザー光による加工法がよく用いられており、例え
ば、エキシマレーザーを用いて図4に示すような孔44
0の列を、絶縁性基板としての絶縁シート410に形成
する場合、絶縁シート410上に、図5に示したよう
な、マスク開口540を有するコンタクトマスク510
を載せて、このマスク開口540に対応する位置の絶縁
シート410に孔加工を行うコンタクトマスク法や、レ
ーザー光路中に図5のものと同形状のマスクを挿入し、
予め照射レーザー光自体を、形成すべき孔の配列に相当
する形に成形し、コンタクトマスクなしで孔形成を行
う、いわゆるマスクイメージング法等が用いられてき
た。
[0003] As a method of forming the above-mentioned hole,
A processing method using a laser beam is often used. For example, a hole 44 shown in FIG.
When the row of 0s is formed on the insulating sheet 410 as an insulating substrate, a contact mask 510 having a mask opening 540 as shown in FIG.
And a mask having the same shape as that shown in FIG. 5 is inserted into the laser beam path, or a contact mask method for forming a hole in the insulating sheet 410 at a position corresponding to the mask opening 540.
A so-called mask imaging method or the like has been used in which the irradiation laser light itself is previously formed into a shape corresponding to the arrangement of holes to be formed, and holes are formed without a contact mask.

【0004】[0004]

【発明が解決しようとする課題】しかしながら、例えば
帯電防止加工や保護コート等の前処理を孔加工に先立っ
て行う際、加熱処理を伴うことが多く、これによって絶
縁基板が熱変形し、図5に示すコンタクトマスク510
のマスク開口540が、図4に示す絶縁シート410の
孔440の位置から大きくずれる問題が生じた。
However, when pre-processing such as antistatic processing or protective coating is performed prior to drilling, for example, heat treatment is often involved, which causes thermal deformation of the insulating substrate, resulting in thermal deformation of the insulating substrate. Contact mask 510 shown in FIG.
Has a problem that the mask opening 540 of FIG.

【0005】その結果、マスク開口540が制御電極4
30と重なった所では、そのマスク開口540の一部が
制御電極430により更に遮蔽されることになり、実質
的なマスク開口面積が小さくなるので、そこで形成され
た孔440は所望の大きさよりも小さくなり、荷電粒子
の流量が下がるために記録濃度が薄くなる。
As a result, the mask opening 540 is moved to the control electrode 4
In the area where the mask opening 30 overlaps, a part of the mask opening 540 is further shielded by the control electrode 430, and the area of the mask opening is substantially reduced, so that the hole 440 formed there is smaller than the desired size. The recording density decreases because the flow rate of charged particles decreases.

【0006】また、マスク開口540と制御電極430
とが重ならず互いに離れた所では、そこで形成された孔
440は制御電極430から離れ、制御電極430に電
圧を印加したときの孔440内に形成する静電界の強度
が弱くなるため、画像記録のコントラストが悪くなると
いう問題が生じた。
The mask opening 540 and the control electrode 430
In a place apart from each other without overlapping, the hole 440 formed there is separated from the control electrode 430, and the strength of the electrostatic field formed in the hole 440 when a voltage is applied to the control electrode 430 becomes weaker. There is a problem that the contrast of recording deteriorates.

【0007】また、前記のような加熱を含む前処理を行
わない場合に於いても、絶縁基板へのレーザー光照射に
よる孔加工時に発生する熱によって、絶縁基板とコンタ
クトマスクの双方に変形が生じ、両者の熱膨張率の差に
よって、やはり前記のような位置ズレが生じており、画
像記録特性に大きな影響を及ぼしていた。
[0007] Even when the pretreatment including heating as described above is not performed, deformation occurs in both the insulating substrate and the contact mask due to the heat generated when the insulating substrate is drilled by laser light irradiation. Due to the difference between the coefficients of thermal expansion of the two, the above-described positional deviation has also occurred, which has had a great effect on the image recording characteristics.

【0008】本発明は、上述した問題点を解決するため
になされたものであり、孔加工時に位置ズレ無く、所定
の位置に孔形成が可能な、マスクパターンを用いたレー
ザー加工による記録ヘッドの孔形成方法を提供すること
を目的としている。
SUMMARY OF THE INVENTION The present invention has been made to solve the above-mentioned problems, and it is an object of the present invention to provide a recording head formed by laser processing using a mask pattern, capable of forming holes at predetermined positions without misalignment during hole processing. It is intended to provide a method for forming holes.

【0009】[0009]

【課題を解決するための手段】この目的を達成するため
に、本発明の請求項1に記載の記録ヘッドの孔形成方法
は、絶縁性基板の一方の面上に、少なくとも金属箔から
構成され、荷電粒子の流れを制御するための複数の電極
部を所定の間隔で少なくとも一列に配列形成するととも
に、隣りあう2つの前記電極部の間に、少なくとも金属
箔からなるマスク部を、前記電極部とは直結しないよう
に配置し、前記絶縁性基板の隣りあう前記電極部と前記
マスク部との間の領域に、前記一方の面側からレーザー
光を照射して孔形成を行うことを特徴としている。
In order to achieve this object, a method of forming a hole in a recording head according to the first aspect of the present invention comprises forming at least one metal foil on one surface of an insulating substrate. A plurality of electrode units for controlling the flow of charged particles are arranged at least in a row at a predetermined interval, and a mask unit made of at least a metal foil is provided between two adjacent electrode units. It is arranged so as not to be directly connected, and a region between the electrode portion and the mask portion adjacent to the insulating substrate is irradiated with laser light from the one surface side to form holes. I have.

【0010】請求項2に記載の記録ヘッドの孔形成方法
は、前記マスク部を、レーザー光照射後に前記絶縁性基
板上より剥離することを特徴としている。すなわち、前
記絶縁性基板の一方の面上に前記電極部と前記マスク部
とを形成した後、前記一方の面側からレーザー光を照射
して孔形成を行い、その後、前記マスク部を前記絶縁性
基板上より剥離する。
According to a second aspect of the present invention, in the method of forming a hole in a recording head, the mask portion is peeled off from the insulating substrate after irradiating a laser beam. That is, after forming the electrode portion and the mask portion on one surface of the insulating substrate, a hole is formed by irradiating a laser beam from the one surface side, and then the mask portion is insulated. Peels off from the conductive substrate.

【0011】請求項3に記載の記録ヘッドの孔形成方法
は、前記絶縁性基板上の前記電極部及び前記マスク部に
到達する手前のレーザー光路中に、スリット状の開口を
有する光路規制部材を配置し、前記絶縁性基板の隣りあ
う前記電極部と前記マスク部との間の領域に、前記光路
規制部材の開口を通してレーザー光を照射することを特
徴としている。すなわち、前記絶縁性基板の一方の面上
に前記電極部と前記マスク部とを形成し、さらに、前記
絶縁性基板上の前記電極部及び前記マスク部に到達する
手前のレーザー光路中に、スリット状の開口を有する光
路規制部材を配置し、前記絶縁性基板の隣りあう前記電
極部と前記マスク部との間の領域に、前記光路規制部材
の開口を通してレーザー光を、前記一方の面側から照射
して孔形成を行う。
According to a third aspect of the present invention, in the method of forming a hole in a recording head, an optical path regulating member having a slit-shaped opening is provided in a laser optical path on the insulating substrate before reaching the electrode section and the mask section. It is characterized in that a laser beam is applied to an area between the electrode section and the mask section adjacent to the insulating substrate through the opening of the optical path regulating member. That is, the electrode portion and the mask portion are formed on one surface of the insulating substrate, and further, a slit is formed in a laser light path before reaching the electrode portion and the mask portion on the insulating substrate. Arrange an optical path regulating member having an opening of a shape, in a region between the electrode portion and the mask portion adjacent to the insulating substrate, a laser beam through the opening of the optical path regulating member, from the one surface side Irradiate to form holes.

【0012】[0012]

【発明の実施の形態】以下、本発明を具体化した実施の
形態を図面を参照して説明する。
Embodiments of the present invention will be described below with reference to the drawings.

【0013】図1及び図2を用いて、本実施の形態の記
録ヘッドの孔形成方法の概略について説明する。
An outline of a method of forming holes in a recording head according to the present embodiment will be described with reference to FIGS.

【0014】絶縁基板としての絶縁シート110は、厚
さ25〜100μmのポリイミド樹脂からなり、その絶
縁シート110の一方の面上には、最初、厚さ1〜15
μmの銅箔が、蒸着、スパッタリング、メッキ、接着等
の方法で一様に形成されており、これから、エッチング
法により、マスク部としてのマスクパターン120と、
レーザー加工用マスクパターンと電気的有効パターンと
を兼ねる電極部としての制御電極130とを形成する。
The insulating sheet 110 serving as an insulating substrate is made of a polyimide resin having a thickness of 25 to 100 μm.
μm copper foil is uniformly formed by a method such as vapor deposition, sputtering, plating, bonding, and the like, and then, by an etching method, a mask pattern 120 as a mask portion;
A control electrode 130 is formed as an electrode part that also serves as a laser processing mask pattern and an electrically effective pattern.

【0015】そして、図2に示すような、極薄のステン
レス板に矩形状のスリット開口240を形成した、光路
規制部材としてのスリットマスク210を、絶縁シート
110上に形成された前記マスクパターン120及び前
記制御電極130の上から重ね、さらにその上から、一
様にエキシマレーザーを照射することによって、図1に
示す孔140を形成することができる。レーザー光につ
いては、前記スリット開口240より十分広い範囲に照
射すればよく、したがって、煩雑な位置合わせが不要で
あり、簡易な手法で所定の位置に孔を形成することがで
きる。
Then, as shown in FIG. 2, a slit mask 210 as an optical path regulating member having a rectangular slit opening 240 formed in an ultra-thin stainless steel plate is connected to the mask pattern 120 formed on the insulating sheet 110. The hole 140 shown in FIG. 1 can be formed by overlapping the control electrode 130 from above and irradiating the excimer laser uniformly from above. The laser beam may be applied to a range sufficiently wider than the slit opening 240, so that complicated alignment is not required, and a hole can be formed at a predetermined position by a simple method.

【0016】また、レーザー光は、前記スリット開口2
40全体を一度に照射できるような広範囲なビーム形状
のものをスキャンなしで照射してもよいし、前記スリッ
ト開口240の矩形状の短辺を一辺とする正方形より大
きな円形、楕円形、矩形等任意の形状のビームを、前記
スリット開口240の矩形状の長辺の方向にスキャンさ
せてもよい。
Further, the laser beam is emitted from the slit opening 2.
A beam having a wide range of beam shapes that can irradiate the whole 40 at one time may be irradiated without scanning, or a circle, an ellipse, a rectangle, etc., larger than a square having a rectangular short side of the slit opening 240 as one side. A beam of any shape may be scanned in the direction of the long side of the rectangular shape of the slit opening 240.

【0017】ところで、前記したエキシマレーザーによ
る孔加工の際、孔140の内壁面には、カーボン等の導
電性付着物が通常付着しており、図1の状態では、その
孔140の内壁面と前記マスクパターン120を介し
て、隣りあった制御電極130は互いに通電可能であ
り、隣りあった制御電極130に異なる電圧を印加する
ことは不可能であるため、このままでは画像記録は不可
能である。したがって、この後、前記マスクパターン1
20を剥離することによって、全ての制御電極130が
互いに絶縁され、画像記録が可能となる。
By the way, at the time of drilling by the above-mentioned excimer laser, conductive deposits such as carbon are usually attached to the inner wall surface of the hole 140, and in the state of FIG. The adjacent control electrodes 130 can be electrically connected to each other via the mask pattern 120, and it is impossible to apply different voltages to the adjacent control electrodes 130. Therefore, it is impossible to record an image as it is. . Therefore, after this, the mask pattern 1
By peeling off 20, all the control electrodes 130 are insulated from each other, and image recording becomes possible.

【0018】前記マスクパターン120を剥離可能にす
る方法としては、例えば、エッチング処理の時間や処理
液の濃度を上げたときに微細パターンが剥離しやすくな
る性質を利用して、制御電極130より十分細いパター
ンで前記マスクパターン120を形成すれば、容易に剥
離可能なマスクパターン120を形成することができ
る。
As a method of allowing the mask pattern 120 to be peeled off, for example, by utilizing the property that the fine pattern is easily peeled off when the etching time or the concentration of the processing solution is increased, the mask pattern 120 can be peeled off more than the control electrode 130. If the mask pattern 120 is formed with a thin pattern, the mask pattern 120 that can be easily peeled can be formed.

【0019】また、例えば、前記マスクパターン120
及び前記制御電極130を銅ペーストのスクリーン印刷
で前記絶縁シート110上に形成し、孔形成後、前記制
御電極130のみに電流を流しながら金メッキを施し、
その後前記銅ペーストの溶剤で前記マスクパターン12
0を洗い流す、等の方法も利用できる。なお、銅ペース
トの代わりに銀ペーストを利用してもよい。
Further, for example, the mask pattern 120
And, the control electrode 130 is formed on the insulating sheet 110 by screen printing of copper paste, and after forming the holes, gold plating is performed while applying current only to the control electrode 130,
Thereafter, the mask pattern 12 is formed with a solvent of the copper paste.
A method such as washing away 0 can be used. Note that a silver paste may be used instead of the copper paste.

【0020】このようにして、図4に示したような、制
御電極430の両側に同じ大きさの孔440の列を有す
る記録ヘッド4を作製することができる。
In this manner, the recording head 4 having the same size rows of holes 440 on both sides of the control electrode 430 as shown in FIG. 4 can be manufactured.

【0021】ここで、図4に示した記録ヘッド4を用い
た画像記録の概略について説明する。
Here, an outline of image recording using the recording head 4 shown in FIG. 4 will be described.

【0022】制御電極430に電圧を印加すると、孔4
40内に静電界が生じ、この静電界の向きや大きさによ
って、帯電したトナーやイオン等の荷電粒子の、孔44
0の通過を制御し、画像記録媒体等の表面の所定の位置
に荷電粒子を飛翔させることによって画像記録を行う。
When a voltage is applied to the control electrode 430, the holes 4
An electrostatic field is generated in the hole 40, and depending on the direction and magnitude of the electrostatic field, holes 44 of charged particles such as charged toner and ions are formed.
0 is controlled, and charged particles are caused to fly to predetermined positions on the surface of an image recording medium or the like, thereby performing image recording.

【0023】このとき、図4に示したような記録ヘッド
4に於いては、一つの孔440に対応する制御電極43
0は一つのみであるため、隣りあう制御電極430間の
電界の干渉によるクロストークが少なく、高解像度の画
像記録が可能となる。
At this time, in the recording head 4 as shown in FIG. 4, the control electrode 43 corresponding to one hole 440
Since there is only one 0, there is little crosstalk due to electric field interference between the adjacent control electrodes 430, and high-resolution image recording becomes possible.

【0024】なお、本発明は、以上に記述した実施の形
態に限定されるものではなく、その要旨を逸脱しない範
囲に於いて、種々の変更を加えることが可能である。
The present invention is not limited to the embodiment described above, and various changes can be made without departing from the gist of the present invention.

【0025】例えば、前記実施の形態に於いては、スリ
ットマスク210は絶縁シート110上に接触させて用
いたが、特に接触させる必要はなく、間隙を設けてもよ
いし、レーザー光源側に同形状のマスクを挿入し、ビー
ム形状を矩形に成形してから、その矩形状のレーザー光
線を照射しても、同様な加工が可能である。
For example, in the above-described embodiment, the slit mask 210 is used in contact with the insulating sheet 110. However, it is not necessary to make contact with the slit mask 210, a gap may be provided, and the slit mask 210 may be provided on the laser light source side. The same processing can be performed by inserting a mask having a shape, shaping the beam into a rectangular shape, and then irradiating the rectangular laser beam.

【0026】また、前記実施の形態に於いては、マスク
パターンを孔加工後に剥離したが、孔の内壁面にカーボ
ン等の導電性付着物が付着しないような条件、例えば減
圧下や不活性ガス雰囲気中で加工するか、もしくは、溶
剤やウエットブラスト処理等によって付着した導電性付
着物を除去すれば、必ずしも剥離する必要はないが、工
程が複雑化し、製造コストが上昇する。
In the above embodiment, the mask pattern was peeled off after the hole processing, but the condition was such that conductive deposits such as carbon did not adhere to the inner wall surface of the hole, for example, under reduced pressure or inert gas. If processing is performed in an atmosphere, or if conductive deposits adhered by a solvent or wet blasting are removed, it is not always necessary to peel off, but the process becomes complicated and the manufacturing cost increases.

【0027】この場合、図3に示した記録ヘッド3のよ
うに、絶縁シート310上には、マスクパターン320
を必要最小限の大きさに形成すればよい。この場合、マ
スクパターン320を剥離するという工程が省略でき、
生産性が向上する。また、隣りあう孔340の間に、導
電性パターンであるマスクパターン320が存在するの
で、隣りあう制御電極330の間の電界の干渉によるク
ロストークを防止することができ、記録ドットやライン
のエッジが鮮明で解像度の高い画像記録が可能となる。
また、前記マスクパターン320を全て電気的に接続
し、図1に示したような構成にして接地してもよい。
In this case, like the recording head 3 shown in FIG.
May be formed to the minimum necessary size. In this case, the step of removing the mask pattern 320 can be omitted,
Productivity is improved. Further, since the mask pattern 320, which is a conductive pattern, exists between the adjacent holes 340, crosstalk due to electric field interference between the adjacent control electrodes 330 can be prevented, and the edge of the recording dot or line can be prevented. However, clear and high-resolution image recording becomes possible.
Further, all the mask patterns 320 may be electrically connected, and may be grounded in the configuration shown in FIG.

【0028】本発明の要旨は、孔加工時の位置ズレを無
くすために、予め絶縁基板上にマスクパターンを設ける
ことにあるので、絶縁基板上に予めマスクパターンを設
ける方法であれば、前記以外のいずれの方法であっても
大きな効果を奏するものである。
The gist of the present invention resides in that a mask pattern is previously provided on an insulating substrate in order to eliminate a positional deviation at the time of drilling a hole. Either method has a great effect.

【0029】[0029]

【発明の効果】以上説明したことから明かなように、本
発明の請求項1に記載の記録ヘッドの孔形成方法は、絶
縁性基板の一方の面上に、少なくとも金属箔から構成さ
れ、荷電粒子の流れを制御するための複数の電極部を所
定の間隔で少なくとも一列に配列形成するとともに、隣
りあう2つの前記電極部の間に、少なくとも金属箔から
なるマスク部を、前記電極部とは直結しないように配置
し、前記絶縁性基板の隣りあう前記電極部と前記マスク
部との間の領域に、前記一方の面側からレーザー光を照
射して孔形成を行うため、被加工物の熱履歴や、マスク
部と絶縁性基板との熱膨張率の相違に拘らず、精度よく
所定の位置に孔形成することが可能となる。また、一つ
の孔に対応する前記電極部は一つのみであるため、隣り
あう電極部間の電界の干渉によるクロストークがなく、
高解像度の画像記録が可能な記録ヘッドを製造すること
ができる。
As is apparent from the above description, the method for forming a hole in a recording head according to the first aspect of the present invention comprises at least one metal foil on one surface of an insulating substrate, and A plurality of electrode portions for controlling the flow of particles are arranged at least in a row at a predetermined interval, and a mask portion made of at least a metal foil is provided between two adjacent electrode portions. It is arranged so as not to be directly connected, and a region between the electrode portion and the mask portion adjacent to the insulating substrate is irradiated with laser light from the one surface side to form holes, thereby forming a hole on the workpiece. Irrespective of the thermal history and the difference in the coefficient of thermal expansion between the mask portion and the insulating substrate, it is possible to accurately form holes at predetermined positions. Also, since there is only one electrode portion corresponding to one hole, there is no crosstalk due to electric field interference between adjacent electrode portions,
A recording head capable of recording a high-resolution image can be manufactured.

【0030】請求項2に記載の記録ヘッドの孔形成方法
は、前記マスク部を、レーザー光照射後に前記絶縁性基
板上より剥離するため、孔の内壁面のカーボン等の導電
性付着物を除去したり、この導電性付着物が付着しない
ような特殊な加工条件で行う必要がなく、極めて単純な
工程で、電極部間相互の絶縁性を確保でき、製造コスト
を低減できる。
According to a second aspect of the present invention, in the method of forming a hole in a recording head, the mask portion is peeled off from the insulating substrate after irradiating a laser beam, so that conductive deposits such as carbon on the inner wall surface of the hole are removed. It is not necessary to perform the process under special processing conditions such that the conductive deposit does not adhere, and the insulation between the electrode portions can be secured by a very simple process, and the manufacturing cost can be reduced.

【0031】請求項3に記載の記録ヘッドの孔形成方法
は、前記絶縁性基板上の前記電極部及び前記マスク部に
到達する手前のレーザー光路中に、スリット状の開口を
有する光路規制部材を配置し、前記絶縁性基板の隣りあ
う前記電極部と前記マスク部との間の領域に、前記光路
規制部材の開口を通してレーザー光を照射するため、煩
雑な位置合わせが不要であり、簡易な手法で所定の位置
に孔を形成することができる。
According to a third aspect of the present invention, in the recording head hole forming method, an optical path regulating member having a slit-shaped opening is provided in the laser optical path on the insulating substrate before reaching the electrode section and the mask section. The laser light is radiated through the opening of the optical path regulating member to a region between the electrode portion and the mask portion which are arranged and adjacent to the insulating substrate, so that complicated positioning is not required, and a simple method. Thus, a hole can be formed at a predetermined position.

【図面の簡単な説明】[Brief description of the drawings]

【図1】本発明の実施形態の記録ヘッドの孔形成過程の
概略を示す図である。
FIG. 1 is a diagram schematically illustrating a process of forming holes in a recording head according to an embodiment of the present invention.

【図2】本発明の実施形態に用いるスリットマスクの概
略を示す図である。
FIG. 2 is a view schematically showing a slit mask used in the embodiment of the present invention.

【図3】本発明の他の実施形態の記録ヘッドの孔形成過
程を示す概略図である。
FIG. 3 is a schematic diagram illustrating a hole forming process of a recording head according to another embodiment of the present invention.

【図4】荷電粒子の流れを制御して画像の記録を行う記
録ヘッドの概略図である。
FIG. 4 is a schematic diagram of a recording head that records an image by controlling the flow of charged particles.

【図5】従来のレーザー孔加工用コンタクトマスクを示
す図である。
FIG. 5 is a view showing a conventional contact mask for laser hole processing.

【符号の説明】[Explanation of symbols]

3、4 記録ヘッド 110、310、410 絶縁シート 120、320 マスクパターン 130、330、430 制御電極 140、340、440 孔 210 スリットマスク 240 スリット開口 3, 4 Recording head 110, 310, 410 Insulating sheet 120, 320 Mask pattern 130, 330, 430 Control electrode 140, 340, 440 hole 210 Slit mask 240 Slit opening

Claims (3)

【特許請求の範囲】[Claims] 【請求項1】 荷電粒子の流れを制御して画像の記録を
行う記録ヘッドを作製するために、絶縁性基板に対して
レーザー光を照射し、所定の位置に前記荷電粒子を通過
させる孔を形成する記録ヘッドの孔形成方法に於いて、 前記絶縁性基板の一方の面上に、少なくとも金属箔から
構成され、前記荷電粒子の流れを制御するための複数の
電極部を所定の間隔で少なくとも一列に配列形成すると
ともに、隣りあう2つの前記電極部の間に、少なくとも
金属箔からなるマスク部を、前記電極部とは直結しない
ように配置し、 前記絶縁性基板の隣りあう前記電極部と前記マスク部と
の間の領域に、前記一方の面側からレーザー光を照射し
て孔形成を行うことを特徴とする記録ヘッドの孔形成方
法。
In order to produce a recording head for recording an image by controlling the flow of charged particles, an insulating substrate is irradiated with laser light, and a hole through which the charged particles pass is provided at a predetermined position. In the method of forming a hole in a recording head to be formed, on one surface of the insulating substrate, at least a plurality of electrode portions for controlling the flow of the charged particles, which are formed of at least a metal foil, are provided at a predetermined interval. While being arranged in a line, a mask portion made of at least a metal foil is arranged between two adjacent electrode portions so as not to be directly connected to the electrode portion, and is arranged adjacent to the electrode portion adjacent to the insulating substrate. A hole forming method for a recording head, wherein a hole is formed by irradiating a laser beam from the one surface side to a region between the mask portion and the mask portion.
【請求項2】 前記マスク部を、レーザー光照射後に前
記絶縁性基板上より剥離することを特徴とする請求項1
に記載の記録ヘッドの孔形成方法。
2. The method according to claim 1, wherein the mask portion is peeled off from the insulating substrate after the laser beam irradiation.
3. The method for forming a hole in a recording head according to item 1.
【請求項3】 前記絶縁性基板上の前記電極部及び前記
マスク部に到達する手前のレーザー光路中に、スリット
状の開口を有する光路規制部材を配置し、 前記絶縁性基板の隣りあう前記電極部と前記マスク部と
の間の領域に、前記光路規制部材の開口を通してレーザ
ー光を照射することを特徴とする請求項1または2に記
載の記録ヘッドの孔形成方法。
3. An optical path regulating member having a slit-shaped opening is disposed in a laser light path on the insulating substrate before reaching the electrode section and the mask section, and the electrode adjacent to the insulating substrate is provided. 3. The method according to claim 1, wherein a laser beam is applied to an area between the portion and the mask portion through an opening of the optical path regulating member. 4.
JP17330996A 1996-07-03 1996-07-03 Method of forming holes in recording head Pending JPH1016277A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP17330996A JPH1016277A (en) 1996-07-03 1996-07-03 Method of forming holes in recording head

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP17330996A JPH1016277A (en) 1996-07-03 1996-07-03 Method of forming holes in recording head

Publications (1)

Publication Number Publication Date
JPH1016277A true JPH1016277A (en) 1998-01-20

Family

ID=15958066

Family Applications (1)

Application Number Title Priority Date Filing Date
JP17330996A Pending JPH1016277A (en) 1996-07-03 1996-07-03 Method of forming holes in recording head

Country Status (1)

Country Link
JP (1) JPH1016277A (en)

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN107546392A (en) * 2017-09-05 2018-01-05 北京嘉倍通科技有限公司 A kind of preparation technology of slim pole plate printing-type microporous substrate

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN107546392A (en) * 2017-09-05 2018-01-05 北京嘉倍通科技有限公司 A kind of preparation technology of slim pole plate printing-type microporous substrate

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