JPH10172886A - Substrate processing equipment - Google Patents

Abstract

(57) [Problem] To provide a substrate processing apparatus capable of easily cleaning a mounting table and preventing contamination of a substrate due to adhesion of particles. SOLUTION: This substrate processing apparatus is a decompression drying apparatus, and supports a substrate 11 by placing a head on a mounting table 15, a lid 16, and a lower surface of the substrate 11 while being mounted on the mounting table 15. The supporting member 17 is fixed on the mounting table 15 by magnetic attraction acting between the four supporting members 17 and the magnets provided in the supporting member 17 and installed at a plurality of locations on the lower surface side of the mounting table 15. And a magnet 21 to be used. The magnets 21 are fixed in advance at positions corresponding to a plurality of types of substrates 11 having different sizes, and the size of the substrate 11 to be processed is set so that the installation position of the support member 17 abuts on the peripheral region of the substrate 11. It can be changed according to. The mounting surface 23 of the mounting table 15 on which the support member 17 is mounted is flat, and has a configuration in which particles hardly accumulate.

Description

DETAILED DESCRIPTION OF THE INVENTION

[0001]

BACKGROUND OF THE INVENTION 1. Field of the Invention The present invention relates to a glass substrate for a liquid crystal display panel, a semiconductor wafer, and a substrate for a mask for manufacturing a semiconductor, which are supported by a supporting member abutting on the lower surface thereof. Heating, cooling, H
The present invention relates to a substrate processing apparatus that performs a predetermined process such as an MDS process.

[0002]

2. Description of the Related Art As one of conventional substrate processing apparatuses, Japanese Patent Application Laid-Open No. Hei 6-333811 discloses a heat treatment apparatus for performing a heat treatment or a cooling treatment on a substrate.

[0003] As shown in FIG. 15, this device includes a mounting table 1 mounted on a heat source functioning as a heating source or a cooling source, and a plurality of holes 3 provided on the upper surface of the mounting table 1. A support member 7 that is detachable and has a head protruding from the upper surface of the mounting table 1 and abutting against the lower surface of the substrate 5 to support the substrate 5 substantially horizontally when mounted in the holes 3; Is installed in the mounting table 1 along at least a part of the support member 7, and by a magnetic force acting between the support member 7 and each of the holes 3,
It has a retaining member 9 that attracts the support member 7.

[0004] Such a supporting member 7 is formed on the upper surface of the substrate 5, for example, outside the central region of the substrate on which the resist film and the elements are formed in order to suppress the adverse effect on the resist film and the elements. Contacting the peripheral area of the substrate 5
Has come to support.

[0005]

However, in the above-described substrate processing apparatus, in order to process a plurality of types of substrates 5 having different sizes, the supporting members 7 are arranged so as to abut the peripheral regions of the respective types of substrates 5. If the configuration in which the installation position of the support member 7 can be changed is adopted, the support members 7 are provided at a plurality of locations on the upper surface of the mounting table 1 corresponding to the size of each type of substrate 5 to be processed.
It is necessary to provide more holes 3 than the total number.

As described above, when the holes 3 are provided in a plurality of positions of the mounting table 1 more than the total number of the supporting members 7, when the substrate 5 is supported by the supporting members 7, the supporting members 7 are mounted on the mounting table 1. The holes 3 that are not made are generated, making it difficult to clean the mounting table 1, and particles easily accumulate in the holes 3 where the support members 7 are not mounted, and the particles accumulated in the holes 3 adhere to the substrate 5. This causes a problem that the substrate 5 is contaminated.

In view of the above problems, it is an object of the present invention to provide a substrate processing apparatus which can easily clean a mounting table and can prevent contamination of a substrate due to adhesion of particles.

[0008]

A technical means for achieving the above object is to provide a substrate processing apparatus for performing a predetermined process on a substrate while supporting the substrate substantially horizontally, a head contacting a lower surface of the substrate. Having a portion, the arrangement position is changeable, a plurality of support members at least partially composed of a magnetic material, and has an upward flat mounting surface on which the support member is mounted, at least the support member A mounting table whose opposing portion is made of a ferromagnetic material.

Further, in a substrate processing apparatus for performing a predetermined process on a substrate while supporting the substrate substantially horizontally, the substrate processing apparatus has a head abutting on the lower surface of the substrate, and the arrangement position can be changed. A plurality of support members made of a magnetic material, a mounting table having an upward flat mounting surface on which the support member is mounted, and a support member provided on the lower surface side of the mounting table and supporting members via the mounting table. Due to the magnetic attraction generated between them,
And a magnet member for fixing the support member to the mounting table.

Further, in a substrate processing apparatus for performing a predetermined process on a substrate while supporting the substrate substantially horizontally, the substrate processing apparatus has a head abutting on a lower surface of the substrate, and an arrangement position thereof can be changed. A plurality of support members made of a magnet material, a mounting table having an upward flat mounting surface on which the support member is mounted, and a support member provided on the lower surface side of the mounting table through the mounting table. And a magnet member for fixing the support member to the mounting table by a magnetic attraction force generated therebetween.

[0011] Further, it is characterized by further comprising moving means for moving the magnet member in a substantially horizontal direction and moving the support member along the mounting surface.

[0012]

FIG. 1 is a sectional view of a substrate processing apparatus according to a first embodiment of the present invention. This substrate processing apparatus is a reduced-pressure drying apparatus for drying a predetermined processing solution such as a resist solution applied to the upper surface of a rectangular substrate 11 under reduced pressure, and includes a mounting table 15 installed on an apparatus body 13 and a mounting table 15. Mounting table 15
And a plurality of, here four, heads 39 (FIG. 2) abutting on the lower surface of the substrate 11 to support the substrate 11 while being mounted on the mounting table 15. The support member 17 is installed at a plurality of locations on the lower surface side of the mounting table 15 by a magnetic attraction force generated between the support member 17 and a magnet 19 (FIG. 2) provided in the support member 17.
And a magnet 21 fixed thereon.

An area on the upper surface of the mounting table 15 where the support member 17 is mounted is a flat mounting surface 23. Further, an O-ring 25 is provided on an outer peripheral portion of the upper surface of the mounting table 15 in contact with the lid 17.

In the apparatus main body 13, a mounting table 15 and a lid 16 are provided.
And a vacuum pump 27 for exhausting the atmosphere in the closed space formed by the above and bringing the inside of the closed space into a reduced pressure state, and supplying a gas into the closed closed space to release the reduced pressure state in the closed space. Gas supply means 29 is provided. The vacuum pump 27 and the gas supply means 29 are connected to a pipe 33 via a switching valve 31, and the pipe 33 is connected to a through hole 35 provided in the mounting table 15 so as to communicate with the inside of the sealed space and the outside. It is connected to the.

As shown in FIG. 2, each support member 19 includes an outer layer 37 made of a resin having a generally bell-shaped outer shape, and a magnet 19 embedded in the outer layer 37. And a head 39 that contacts the lower surface of the substrate 11
Has a dome shape so that the contact area with the substrate 11 is small, and the bottom surface of the mounting table 15 in contact with the mounting surface 23 is flat.

As shown in FIG. 2, the mounting portion of the magnet 21 to the mounting table 15 has a mounting recess formed on the lower surface of the mounting table 15 made of metal such as aluminum. 41 is provided, and the magnet 21 is fitted into the mounting recess 41. Mounting recess 41
A thread groove is formed on the lower inner peripheral surface of the magnet 2.
The screw 43 is screwed into the mounting recess 41 in a state where 1 is fitted in the mounting recess 41, and the magnet 21 is positioned and fixed to the upper end in the mounting recess 41. Thus, the mounting table 1
5, a mounting recess 41 is provided on the lower surface, and the magnet 21 is fixed to the upper end of the mounting recess 41.
The distance between the supporting member 17 and the magnet 21 placed thereon is reduced, and as a result, the magnet 19 and the magnet 2 of the holding member 17 are reduced.
The magnetic force acting between the support member 17 and the support member 17 is increased, and the support member 17 can be firmly fixed on the mounting surface 23.

As shown in FIG. 3, the magnets 21 attached to the mounting table 15 in this manner are provided at a plurality of positions, here eight positions, on the lower surface of the mounting table 17 facing the mounting surface 23. . Of the eight magnets 21, four inner magnets 21a are installed in the peripheral area of the small substrate 11a, here at positions corresponding to the four corners, and the remaining outer four magnets 21b are: It is installed in a peripheral area of the large-sized substrate 11b, here, at positions corresponding to the four corners. The portion of the mounting surface 23 facing each magnet 21 is marked with a paint or the like so that the installation position of the support member 27 can be easily visually recognized. Here, two sets of magnets 21 for the inside and outside are installed corresponding to the two types of substrates 11a and 11b, but the number of installation locations of the magnets 21 is further increased and three or more types of substrate sizes can be accommodated. You may do so.

The positions of the four support members 17 are changed in accordance with the size of the substrate 11, and when supporting the small substrate 11a, as shown in FIG. It is installed at a position facing the inner magnet 21a on the mounting surface 23 and, when supporting the large substrate 11a, faces the outer magnet 21b on the mounting surface 23 as shown in FIG. Position, and each support member 17 is large and small substrate 1
It comes into contact with the lower surface of the peripheral area of 1a, 1b.

Since the support member 17 is fixed on the mounting surface 23 by the magnetic attraction force acting between the magnet 19 and the magnet 21 of the support member 17 via the mounting table 15, the support member 1
When the installation position of 7 is changed, the installation position can be easily moved by removing it from the mounting surface 23.

As described above, according to the present embodiment, the substrate 1
1 can be easily changed according to the size of the substrate 11, and the supporting member 21
Since the mounting surface 23 of the mounting table 15 where the is mounted is flat, particles hardly accumulate on the mounting table 15, the cleaning of the mounting table 15 is easy, and the mounting The particles accumulated in the holes do not adhere to the substrate 11, so that contamination of the substrate 11 by the particles can be prevented.

Further, in the conventional configuration in which a mounting hole for a supporting member is provided on the upper surface of the mounting table 15 and the supporting member is inserted and mounted in the hole, since the hole is provided, the substrate 11 on which the substrate 11 is installed is provided. Although there is a problem that the configuration in the closed space becomes complicated and the time required for decompression increases, in the present embodiment, since the mounting surface 23 of the mounting table 15 is flat, it is possible to reduce the time required for decompression. it can.

In this embodiment, a part of the support member 17 is made of a magnetic material. However, the entire support member 17 may be made of a magnetic material.

FIG. 6 is a partial sectional view showing the structure of the mounting table 15a and the support member 17 provided in the substrate processing apparatus according to the second embodiment of the present invention. The substrate processing apparatus of the present embodiment is a reduced-pressure drying apparatus similar to the substrate processing apparatus of the above-described first embodiment. The mounting table 15a is formed of a ferromagnetic material such as iron, and the magnet 21 and the magnet 21 are mounted on the mounting table 15a. The configuration is the same as that of the substrate processing apparatus of the first embodiment except that the configuration for attaching to the first embodiment is omitted, and the corresponding parts are denoted by the same reference numerals and description thereof is omitted.

The support member 1 on the mounting surface 23 of the mounting table 15a
A mark similar to that of the first embodiment is attached to a portion where the support member 7 is installed so that the installation position of the support member 17 according to the size of the substrate 11 can be easily visually recognized. When the support member 17 is placed on the mounting surface 23 of the mounting table 15a, the support member 17 is placed on the mounting surface 23 by the magnetic attraction force acting between the magnet 19 of the support member 17 and the mounting table 15a. Is to be fixed.

Therefore, also in this embodiment, the support member 2
The mounting position of the mounting table 1 can be easily changed.
Since the mounting surface 23 of 5a is flat, the mounting table 15a can be easily cleaned, contamination of the substrate 11 by particles can be prevented, and the time required for decompression can be shortened. The same effect as that of the first embodiment is obtained, and the magnet 21 and the magnet 21 are mounted on the mounting table 15a.
The configuration can be simplified because there is no need for the configuration for mounting the device.

In the present embodiment, the entire mounting table 15a is made of a ferromagnetic material, but it is sufficient that at least a portion in contact with the support member 17 is made of a ferromagnetic material.

FIG. 7 is a partial sectional view showing the structure of the mounting table 15 and the support member 17a provided in the substrate processing apparatus according to the third embodiment of the present invention. The substrate processing apparatus of the present embodiment is a reduced-pressure drying apparatus similar to the substrate processing apparatus of the above-described first embodiment, except that a ferromagnetic material 51 such as iron is provided in the support member 17a instead of the magnet 19. Thus, the configuration is the same as that of the substrate processing apparatus of the first embodiment, and the corresponding portions are denoted by the same reference characters and description thereof will be omitted.

The support member 17a is fixed on the mounting surface 23 by a magnetic attraction force acting between the magnet 21 provided on the lower surface side of the mounting table 15 and the ferromagnetic material 51 provided in the support member 17a. It has become so.

Therefore, also in this embodiment, the support member 2
The mounting position of the mounting table 1 can be easily changed.
Since the mounting surface 23 of 5a is flat, the mounting table 15a can be easily cleaned, contamination of the substrate 11 by particles can be prevented, and the time required for decompression can be shortened. An effect similar to that of the first embodiment can be obtained.

In this embodiment, a part of the support member 17a is made of a ferromagnetic material. However, the entire support member 17a may be made of a ferromagnetic material.

FIG. 8 is a partial sectional view showing a first modification of the substrate processing apparatus according to the first and third embodiments.
In this modified example, a mounting recess 41a into which the magnet 21 fits exactly is provided on the lower surface of the mounting table 15, and the magnet 21 is fixed in the mounting recess 41a by an adhesive.

FIG. 9 is a partial sectional view showing a second modification of the substrate processing apparatus of the first and third embodiments.
In this modification, the magnet 21 is fixed to the lower surface of the mounting table 15 by the holding metal 53.

FIG. 10 is a right side view showing the configuration around the mounting table 61 provided in the substrate processing apparatus according to the fourth embodiment of the present invention, and FIG. 11 is a sectional view taken along line AA of FIG. The substrate processing apparatus according to the present embodiment is a reduced-pressure drying apparatus similar to the substrate processing apparatus according to the above-described first embodiment, and the magnet 21 is horizontally moved by a moving unit 63 installed on the lower surface side of the mounting table 61. The configuration is the same as that of the substrate processing apparatus of the first embodiment except that the support member 17 is moved along the mounting surface 23. Corresponding portions are denoted by the same reference numerals, and description thereof will be omitted.

The moving means 63 has a magnet 2 at its upper end.
Four brackets 65a, 65b, 6 to which 1 is attached
7a, 67b and the brackets 65a, 65b, 67
a, 67b for moving the pair a, 67b in the front-rear direction, and brackets 65a, 65b, 67
a and 67b together with the first moving parts 69a and 69b.

The left and right first moving parts 69a and 69b are separated from each other in the front-rear direction, and
Are fixed to sliding members 77, 79 slidably mounted on guides 73, 75 mounted on the lower surface of the, and are movable in the left-right direction so as to approach and separate from each other. Here, the right brackets 65a, 67a and the first moving portion 69a and the left brackets 65b, 67b
And the first moving part 69b has a symmetrical structure,
Corresponding parts are denoted by the same reference numerals. Also, here, the right brackets 65a, 67a
Only the first moving part 69a will be described, and description of the left brackets 65b and 67b and the first moving part 69b will be omitted. Note that the bracket 65b does not appear on the drawing.

The first moving section 69a is provided with the sliding member 7 described above.
A plate 81 fixed to 7, 79, a driving pulley 85 and a driven pulley 87 for driving the belt 83,
A motor 89 for rotating and driving the drive pulley 85 and a guide 91 extending in the front-rear direction are provided. The motor 89 having the drive pulley 85 fixed to the drive shaft, the driven pulley 87 and the guide 91 are attached to the plate 81. And move integrally in the left-right direction.

FIG. 12 is a sectional view showing a structure of a mounting portion of the bracket 65a, and FIG. 13 is a sectional view showing a structure of a mounting portion of the bracket 67a. Bracket 65a
As shown in FIG. 12, a sliding member 93 attached to a guide 91 slidably in the front-rear direction, a driving pulley 85 and a driven pulley 87 so as to be parallel to the guide 91.
The upper part 83a of the belt 83 wound around
5 fixed. The bracket 67a is shown in FIG.
As shown in FIG. 3, the guide 91 is slidable in the front-back direction.
And a lower portion 83b of the belt 83 are fixed to the sliding member 97 by screws 99.

The brackets 65a and 67a are mounted such that the bracket 65a is positioned in front of the bracket 67a. When the driving pulley is driven to rotate in the direction of arrow B1, the upper portion of the belt 83 83a is driven in the direction of arrow C1, that is, backward, and the lower portion 83b is driven in the direction of arrow C2, that is, forward, so that the brackets 65a and 67a are moved so that the interval between them is reduced. Conversely, when the drive pulley is driven to rotate in the direction of arrow B2, the upper portion 83a of the belt 83 is driven in the direction of arrow C2, and the lower portion 83b is driven in the direction of arrow C1, so that the brackets 65a and 67a Are moved so as to increase the interval.

The second moving section 71 is composed of left and right first moving sections 69.
a, ball screws 101, 103 provided for each 69b
And the screw shafts 105, 10 of the ball screws 101, 103
And a motor 108 for rotatingly driving the motor 7. Each screw shaft 105, 10 of ball screw 101, 103
Numeral 7 is rotatably attached to the lower surface of the mounting table 61 along the left-right direction, and nut bodies 109 and 111 screwed with the screw shafts 105 and 107 are connected to the first moving unit 69.
a, 69b are fixed to each plate 81. Bevel gears 115 and 117 meshing with a bevel gear 113 connected to a drive shaft of the motor 108 are connected to inner ends of the screw shafts 105 and 107 facing each other, respectively.
When the motor 108 is driven to rotate, the screw shafts 105 and 107 having the same direction of the screw groove formed on the outer peripheral portion are driven forward and backward in the opposite directions.

The screw shafts 105 and 107 are driven by the motor 108.
Is rotated, the left and right brackets 65a, 67a and 65b, 67b together with the first moving parts 69a, 69b move toward or away from each other along the left-right direction according to the rotation direction of each screw shaft 105, 107. Moved to

On the other hand, on the mounting surface 23 of the mounting table 61, four support members are provided at respective positions facing the four magnets 21 provided at the upper end portions of the brackets 65a, 65b, 67a, 67b. 17 are placed on each of the support members 1.
7 and the magnet 21 facing the magnet 19, the mounting table 6
1 attract each other by magnetic force. Therefore, the first moving parts 69a and 69b and the second moving part 71 are driven as described above, and the brackets 65a and 65 are driven.
When the magnet 21 is moved back and forth and right and left along with b, 67a and 67b, the support member 17 is moved back and forth and right and left along the mounting surface 23.

Each motor 89 of the first moving parts 69a, 69b
The motor 108 of the second moving unit 71 is driven in conjunction with each other by a control unit (not shown). In the control unit, a plurality of types of substrate sizes having different sizes are registered in advance, and when the type of the substrate 11 to be processed is input from an input unit (not shown) by an operator, based on the input data. Each motor 89 and the motor 108 are driven by the control unit, and the four support members 17 are moved along the mounting surface 23 such that the distance between the support members 17 in the front-rear direction and the distance in the left-right direction are enlarged and reduced. When the support member 17 is moved to a position where it comes into contact with the four corners of the substrate 11 to be processed, each motor 89 and motor 1
08 is stopped.

The mounting table 61 is formed of a non-magnetic material, here, aluminum so as not to hinder the movement of the support member 17, and the lower surface side of the area where the magnet 21 is moved is
In order to reduce the distance between the magnet 19 and the magnet 21 of the support member 17, a recess 119 is provided.

As described above, according to the present embodiment, the mounting position of the support member 17 can be easily changed, and the mounting surface 23 of the mounting table 61 has a flat structure. Is easy to clean, the contamination of the substrate 11 by particles can be prevented, and the time required for decompression can be shortened. Can be continuously moved back and forth and left and right while being magnetically attracted onto the mounting surface 23, so that the substrate 11 of an arbitrary size can be moved.
Can be handled.

Further, since the support member 17 is moved by the moving means 63 from outside the sealed space formed by the mounting table 61 and the lid 16 via the mounting table 61, there is no need to apply a special seal, and from the outside. No particles enter the enclosed space.

Further, since the supporting member 17 is automatically moved to a predetermined position according to the size of the substrate 11 by the moving means 63, it is not necessary for the operator to move the supporting member 17 bother and the working efficiency is improved. Can be improved.

In each of the above embodiments, the support member 1
The mounting tables 15, 15 a, and 61 abut on the mounting tables 15, 15 a, and 61 directly.
Is coated with a resin or a thin ceramic or the like, and the supporting members 17, 17a are mounted on the mounting tables 15, 1 via this coating layer.
5a, 61 may be placed.

FIG. 14 is a sectional view of a substrate processing apparatus according to a fifth embodiment of the present invention. The substrate processing apparatus according to the present embodiment includes:
The substrate 11 is immersed in a predetermined chemical solution 121 such as a developing solution to perform a chemical solution treatment. The upper surface 1 of a bottom 125 (mounting table) of a chemical solution tank 123 filled with the predetermined chemical solution 121 is provided.
27 (mounting surface), four support members 17 for supporting the substrate 11 are installed.
The four magnets 21 provided on the lower surface side of the substrate 25 are moved back and forth and right and left by a moving means 129 having the same configuration as the moving means 63 provided in the substrate processing apparatus of the fourth embodiment described above. 17 is moved along the upper surface 127.

Portions of the moving means 129 corresponding to the above-described moving means 63 are denoted by the same reference numerals, and description thereof will be omitted.

Also in this embodiment, the installation position of the support member 17 can be easily changed, and the upper surface 127 of the bottom 125 of the chemical solution tank 123 has a flat structure.
Is easy to clean, and can correspond to the substrate 11 of an arbitrary size.
Is moved by the moving means 129 via the chemical solution tank 123 from the outside, so that there is no need to apply a special seal or the like.

Further, since the operator does not need to insert his / her hand into the chemical solution tank 123 filled with the chemical solution 121 to move the support member 17, the workability is good.

In the first, third to fifth embodiments described above, the support members 17, 17a are magnetically attracted and the mounting surface 2
3 (the upper surface 127) as a magnet member
Although 1 was used, an electromagnet may be used.

[0053]

As described above, according to the first to third aspects of the present invention, the installation position of the support member for supporting the substrate can be easily changed according to the size of the substrate, and the support member is installed. Since the mounting surface of the mounting table is flat, particles hardly collect on the mounting table, cleaning of the mounting table is easy, and particles collected in holes on the mounting table It is possible to prevent contamination of the substrate by particles without adhering to the substrate.

According to the fourth aspect of the present invention, since the supporting member is moved by the moving means, it is not necessary for the operator to move the supporting member, so that the workability is improved and the supporting member is provided on the lower surface side of the mounting table. Since the supporting member is moved by moving the magnet by the moving means, particles generated by the moving means do not adhere to the substrate and do not contaminate the substrate.

[Brief description of the drawings]

FIG. 1 is a sectional view of a substrate processing apparatus according to a first embodiment of the present invention.

FIG. 2 is a sectional view of a main part of the substrate processing apparatus of FIG.

FIG. 3 is a plan view of a mounting table of the substrate processing apparatus of FIG. 1;

FIG. 4 is a plan view showing an installation position corresponding to a small substrate on a mounting table of a support member provided in the substrate processing apparatus of FIG. 1;

5 is a plan view showing an installation position corresponding to a large substrate on a mounting table of a support member provided in the substrate processing apparatus of FIG. 1;

FIG. 6 is a sectional view of a main part of a substrate processing apparatus according to a second embodiment of the present invention.

FIG. 7 is a sectional view of a main part of a substrate processing apparatus according to a third embodiment of the present invention.

FIG. 8 is a cross-sectional view of a main part showing a first modification of the substrate processing apparatuses of the first and third embodiments.

FIG. 9 is a cross-sectional view of a principal part showing a second modification of the substrate processing apparatuses of the first and third embodiments.

FIG. 10 is a right side view illustrating a configuration of a peripheral portion of a mounting table provided in a substrate processing apparatus according to a fourth embodiment of the present invention.

FIG. 11 is a sectional view taken along line AA of FIG. 10;

FIG. 12 is a cross-sectional view illustrating a configuration of a mounting portion of a bracket provided in the substrate processing apparatus of FIG.

13 is a cross-sectional view illustrating a configuration of a mounting portion of a bracket provided in the substrate processing apparatus of FIG.

FIG. 14 is a sectional view of a substrate processing apparatus according to a fifth embodiment of the present invention.

FIG. 15 is a view showing a conventional substrate processing apparatus.

[Explanation of symbols]

 DESCRIPTION OF SYMBOLS 11 Substrate 15, 15a Mounting table 17, 17a Supporting member 19 Magnet 21 Magnet 23 Mounting surface 51 Ferromagnetic body 61 Mounting table 63 Moving means 123 Chemical tank 129 Moving means

Claims (4)

[Claims] 1. A substrate processing apparatus for performing a predetermined process on a substrate while supporting the substrate substantially horizontally, comprising a head contacting a lower surface of the substrate, wherein an arrangement position is changeable, and at least a part of the substrate is arranged. Has a plurality of support members made of a magnet material, and a mounting table having an upward flat mounting surface on which the support member is mounted, and at least a portion where the support member faces is made of a ferromagnetic material. And a substrate processing apparatus. 2. A substrate processing apparatus for performing predetermined processing on a substrate while supporting the substrate substantially horizontally, comprising a head abutting on a lower surface of the substrate, wherein an arrangement position is changeable, and at least a part of the substrate is arranged. A plurality of support members made of a ferromagnetic material, a mounting table having an upward flat mounting surface on which the support member is mounted, and provided on the lower surface side of the mounting table, via the mounting table And a magnet member for fixing the support member to the mounting table by a magnetic attraction force generated between the support member and the support member. 3. A substrate processing apparatus for performing a predetermined process on a substrate while supporting the substrate substantially horizontally, comprising a head contacting a lower surface of the substrate, wherein an arrangement position is changeable, and at least a part of the substrate is arranged. A plurality of support members made of a magnet material, a mounting table having an upward flat mounting surface on which the support member is mounted, provided on the lower surface side of the mounting table, via the mounting table And a magnet member for fixing the support member to the mounting table by a magnetic attraction force generated between the support member and the support member. 4. The apparatus according to claim 2, further comprising moving means for moving the magnet member in a substantially horizontal direction and moving the support member along the mounting surface.
A substrate processing apparatus according to claim 1.