JPH10214783A5 - - Google Patents

Info

Publication number
JPH10214783A5
JPH10214783A5 JP1997343740A JP34374097A JPH10214783A5 JP H10214783 A5 JPH10214783 A5 JP H10214783A5 JP 1997343740 A JP1997343740 A JP 1997343740A JP 34374097 A JP34374097 A JP 34374097A JP H10214783 A5 JPH10214783 A5 JP H10214783A5
Authority
JP
Japan
Prior art keywords
stage
substrate
projection
sensitive substrate
positional relationship
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP1997343740A
Other languages
English (en)
Japanese (ja)
Other versions
JPH10214783A (ja
JP4029183B2 (ja
Filing date
Publication date
Application filed filed Critical
Priority to JP34374097A priority Critical patent/JP4029183B2/ja
Priority claimed from JP34374097A external-priority patent/JP4029183B2/ja
Publication of JPH10214783A publication Critical patent/JPH10214783A/ja
Publication of JPH10214783A5 publication Critical patent/JPH10214783A5/ja
Application granted granted Critical
Publication of JP4029183B2 publication Critical patent/JP4029183B2/ja
Anticipated expiration legal-status Critical
Expired - Lifetime legal-status Critical Current

Links

JP34374097A 1996-11-28 1997-11-28 投影露光装置及び投影露光方法 Expired - Lifetime JP4029183B2 (ja)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP34374097A JP4029183B2 (ja) 1996-11-28 1997-11-28 投影露光装置及び投影露光方法

Applications Claiming Priority (3)

Application Number Priority Date Filing Date Title
JP33284396 1996-11-28
JP8-332843 1996-11-28
JP34374097A JP4029183B2 (ja) 1996-11-28 1997-11-28 投影露光装置及び投影露光方法

Publications (3)

Publication Number Publication Date
JPH10214783A JPH10214783A (ja) 1998-08-11
JPH10214783A5 true JPH10214783A5 (fr) 2005-08-11
JP4029183B2 JP4029183B2 (ja) 2008-01-09

Family

ID=26574314

Family Applications (1)

Application Number Title Priority Date Filing Date
JP34374097A Expired - Lifetime JP4029183B2 (ja) 1996-11-28 1997-11-28 投影露光装置及び投影露光方法

Country Status (1)

Country Link
JP (1) JP4029183B2 (fr)

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US8902401B2 (en) 2006-05-09 2014-12-02 Carl Zeiss Smt Gmbh Optical imaging device with thermal attenuation

Families Citing this family (201)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US6897963B1 (en) * 1997-12-18 2005-05-24 Nikon Corporation Stage device and exposure apparatus
JP4134406B2 (ja) 1998-12-04 2008-08-20 株式会社ニコン 平面モータ装置及び露光装置
WO2001023933A1 (fr) 1999-09-29 2001-04-05 Nikon Corporation Systeme optique de projection
WO2001023935A1 (fr) 1999-09-29 2001-04-05 Nikon Corporation Procede et dispositif d'exposition par projection, et systeme optique de projection
JP2001160530A (ja) 1999-12-01 2001-06-12 Nikon Corp ステージ装置及び露光装置
US7301605B2 (en) 2000-03-03 2007-11-27 Nikon Corporation Projection exposure apparatus and method, catadioptric optical system and manufacturing method of devices
JP2002323652A (ja) 2001-02-23 2002-11-08 Nikon Corp 投影光学系，該投影光学系を備えた投影露光装置および投影露光方法
JP2002287023A (ja) 2001-03-27 2002-10-03 Nikon Corp 投影光学系、該投影光学系を備えた投影露光装置及び投影露光方法
US6788385B2 (en) * 2001-06-21 2004-09-07 Nikon Corporation Stage device, exposure apparatus and method
SG121822A1 (en) 2002-11-12 2006-05-26 Asml Netherlands Bv Lithographic apparatus and device manufacturing method
JP4179283B2 (ja) 2002-12-10 2008-11-12 株式会社ニコン 光学素子及びその光学素子を用いた投影露光装置
CN1723541B (zh) 2002-12-10 2010-06-02 株式会社尼康 曝光装置和器件制造方法
JP4525062B2 (ja) * 2002-12-10 2010-08-18 株式会社ニコン 露光装置及びデバイス製造方法、露光システム
SG171468A1 (en) * 2002-12-10 2011-06-29 Nikon Corp Exposure apparatus and method for producing device
KR101506408B1 (ko) 2003-02-26 2015-03-26 가부시키가이샤 니콘 노광 장치, 노광 방법 및 디바이스 제조 방법
KR20170018113A (ko) 2003-04-09 2017-02-15 가부시키가이샤 니콘 노광 방법 및 장치, 그리고 디바이스 제조 방법
EP3062152B1 (fr) 2003-04-10 2017-12-20 Nikon Corporation Système environnemental comprenant une zone de transport pour un appareil de lithographie par immersion
KR20180089562A (ko) 2003-04-10 2018-08-08 가부시키가이샤 니콘 액침 리소그래피 장치용 진공 배출을 포함하는 환경 시스템
KR101324818B1 (ko) 2003-04-11 2013-11-01 가부시키가이샤 니콘 액침 리소그래피에 의한 광학기기의 세정방법
JP4315198B2 (ja) 2003-04-11 2009-08-19 株式会社ニコン 液浸液体を光学アセンブリ下に維持するリソグラフィ装置及び液浸液体維持方法並びにそれらを用いるデバイス製造方法
US7348575B2 (en) 2003-05-06 2008-03-25 Nikon Corporation Projection optical system, exposure apparatus, and exposure method
EP2722703A3 (fr) 2003-05-06 2014-07-23 Nikon Corporation Système de projection optique, système et procédé d'exposition
TWI511181B (zh) 2003-05-23 2015-12-01 尼康股份有限公司 Exposure method and exposure apparatus, and device manufacturing method
TWI518742B (zh) 2003-05-23 2016-01-21 尼康股份有限公司 A method of manufacturing an exposure apparatus and an element
KR20180122033A (ko) 2003-05-28 2018-11-09 가부시키가이샤 니콘 노광 방법, 노광 장치, 및 디바이스 제조 방법
TWI409853B (zh) 2003-06-13 2013-09-21 尼康股份有限公司 An exposure method, a substrate stage, an exposure apparatus, and an element manufacturing method
DE602004024782D1 (de) 2003-06-19 2010-02-04 Nippon Kogaku Kk Belichtungseinrichtung und bauelementeherstellungsverfahren
WO2005006417A1 (fr) 2003-07-09 2005-01-20 Nikon Corporation Dispositif d'exposition et procede de fabrication
WO2005006415A1 (fr) 2003-07-09 2005-01-20 Nikon Corporation Appareil d'exposition et procede de fabrication
KR101641011B1 (ko) 2003-07-28 2016-07-19 가부시키가이샤 니콘 노광 장치 및 디바이스 제조 방법, 그리고 노광 장치의 제어 방법
EP1503244A1 (fr) 2003-07-28 2005-02-02 ASML Netherlands B.V. Appareil de projection lithographique et méthode de fabrication d'un dispositif
KR101769722B1 (ko) 2003-08-21 2017-08-18 가부시키가이샤 니콘 노광 장치, 노광 방법 및 디바이스 제조 방법
EP1670038B1 (fr) 2003-08-26 2012-06-06 Nikon Corporation Element optique et appareil d'exposition
KR101419192B1 (ko) 2003-08-29 2014-07-15 가부시키가이샤 니콘 노광 장치 및 디바이스 제조 방법
US6954256B2 (en) 2003-08-29 2005-10-11 Asml Netherlands B.V. Gradient immersion lithography
TWI443711B (zh) 2003-08-29 2014-07-01 尼康股份有限公司 A liquid recovery device, an exposure device, an exposure method, and an element manufacturing method
US8208198B2 (en) 2004-01-14 2012-06-26 Carl Zeiss Smt Gmbh Catadioptric projection objective
EP3007207B1 (fr) 2003-09-26 2017-03-08 Nikon Corporation Appareil d'exposition par projection, procédés de maintenance et de nettoyage d'un appareil d'exposition par projection et procédé de fabrication d'un dispositif
KR101743378B1 (ko) 2003-09-29 2017-06-15 가부시키가이샤 니콘 노광장치, 노광방법 및 디바이스 제조방법
WO2005031824A1 (fr) 2003-09-29 2005-04-07 Nikon Corporation Dispositif de projection, procede correspondant, et procede de fabrication du dispositif
TWI553701B (zh) 2003-10-09 2016-10-11 尼康股份有限公司 Exposure apparatus and exposure method, component manufacturing method
KR20130061770A (ko) 2003-10-22 2013-06-11 가부시키가이샤 니콘 노광 장치, 노광 방법, 디바이스의 제조 방법
EP1679738A4 (fr) 2003-10-28 2008-08-06 Nikon Corp Appareil d'exposition, procede d'exposition et procede pour produire le dispositif
TWI569308B (zh) 2003-10-28 2017-02-01 尼康股份有限公司 照明光學裝置、曝光裝置、曝光方法以及元件製造 方法
JP4513747B2 (ja) 2003-10-31 2010-07-28 株式会社ニコン 露光装置及びデバイス製造方法
TWI512335B (zh) 2003-11-20 2015-12-11 尼康股份有限公司 光束變換元件、光學照明裝置、曝光裝置、以及曝光方法
TWI605315B (zh) 2003-12-03 2017-11-11 尼康股份有限公司 Exposure device, exposure method, and device manufacturing method
US7466489B2 (en) 2003-12-15 2008-12-16 Susanne Beder Projection objective having a high aperture and a planar end surface
KR101941351B1 (ko) 2003-12-15 2019-01-22 가부시키가이샤 니콘 스테이지 장치, 노광 장치, 및 노광 방법
JP5102492B2 (ja) 2003-12-19 2012-12-19 カール・ツァイス・エスエムティー・ゲーエムベーハー 結晶素子を有するマイクロリソグラフィー投影用対物レンズ
DE602004027162D1 (de) 2004-01-05 2010-06-24 Nippon Kogaku Kk Belichtungsvorrichtung, belichtungsverfahren und bauelementeherstellungsverfahren
JP5420821B2 (ja) 2004-01-14 2014-02-19 カール・ツァイス・エスエムティー・ゲーエムベーハー 反射屈折投影対物レンズ
US20080151365A1 (en) 2004-01-14 2008-06-26 Carl Zeiss Smt Ag Catadioptric projection objective
US7463422B2 (en) 2004-01-14 2008-12-09 Carl Zeiss Smt Ag Projection exposure apparatus
WO2005069355A1 (fr) 2004-01-15 2005-07-28 Nikon Corporation Dispositif d'exposition et son procede de fabrication
WO2005071491A2 (fr) 2004-01-20 2005-08-04 Carl Zeiss Smt Ag Appareil microlithographique d'insolation par projection et dispositif de mesure pour objectif de projection
WO2005071717A1 (fr) 2004-01-26 2005-08-04 Nikon Corporation Appareil d'exposition et procede de production de dispositifs
TWI395068B (zh) 2004-01-27 2013-05-01 尼康股份有限公司 光學系統、曝光裝置以及曝光方法
US7589822B2 (en) 2004-02-02 2009-09-15 Nikon Corporation Stage drive method and stage unit, exposure apparatus, and device manufacturing method
KR101276392B1 (ko) 2004-02-03 2013-06-19 가부시키가이샤 니콘 노광 장치 및 디바이스 제조 방법
KR101554772B1 (ko) 2004-02-04 2015-09-22 가부시키가이샤 니콘 노광 장치, 노광 방법 및 디바이스 제조 방법
TWI505329B (zh) 2004-02-06 2015-10-21 尼康股份有限公司 光學照明裝置、曝光裝置、曝光方法以及元件製造方法
EP1724815B1 (fr) 2004-02-10 2012-06-13 Nikon Corporation Aligneur, procede de fabrication de dispositif, procede de maintenance et procede d alignement
KR101106497B1 (ko) 2004-02-20 2012-01-20 가부시키가이샤 니콘 노광 장치, 공급 방법 및 회수 방법, 노광 방법, 및디바이스 제조 방법
DE102004013886A1 (de) 2004-03-16 2005-10-06 Carl Zeiss Smt Ag Verfahren zur Mehrfachbelichtung, Mikrolithografie-Projektionsbelichtungsanlage und Projektionssystem
KR101504445B1 (ko) 2004-03-25 2015-03-19 가부시키가이샤 니콘 노광 장치 및 디바이스 제조 방법
TW200605191A (en) * 2004-03-30 2006-02-01 Nikon Corp Exposure apparatus, exposure method, device manufacturing method, and surface shape detecting device
US7034917B2 (en) 2004-04-01 2006-04-25 Asml Netherlands B.V. Lithographic apparatus, device manufacturing method and device manufactured thereby
KR101258033B1 (ko) 2004-04-19 2013-04-24 가부시키가이샤 니콘 노광 장치 및 디바이스 제조 방법
KR101213831B1 (ko) 2004-05-17 2012-12-24 칼 짜이스 에스엠티 게엠베하 중간이미지를 갖는 카타디옵트릭 투사 대물렌즈
US7486381B2 (en) 2004-05-21 2009-02-03 Asml Netherlands B.V. Lithographic apparatus and device manufacturing method
US7796274B2 (en) 2004-06-04 2010-09-14 Carl Zeiss Smt Ag System for measuring the image quality of an optical imaging system
CN103558737A (zh) 2004-06-09 2014-02-05 尼康股份有限公司 基板保持装置、具备其之曝光装置、方法
KR101162128B1 (ko) 2004-06-09 2012-07-03 가부시키가이샤 니콘 노광 장치 및 디바이스 제조 방법
US8508713B2 (en) 2004-06-10 2013-08-13 Nikon Corporation Exposure apparatus, exposure method, and method for producing device
EP2624282B1 (fr) 2004-06-10 2017-02-08 Nikon Corporation Appareil et procédé d'exposition par immersion, et procédés de production d'un dispositif
US8373843B2 (en) 2004-06-10 2013-02-12 Nikon Corporation Exposure apparatus, exposure method, and method for producing device
EP3067749B1 (fr) 2004-06-10 2017-10-18 Nikon Corporation Appareil d'exposition, procédé d'exposition et procédé de production de dispositif
US8717533B2 (en) 2004-06-10 2014-05-06 Nikon Corporation Exposure apparatus, exposure method, and method for producing device
JP5119666B2 (ja) 2004-06-21 2013-01-16 株式会社ニコン 露光装置、液体除去方法、及びデバイス製造方法
EP3462241A1 (fr) 2004-06-21 2019-04-03 Nikon Corporation Appareil d'exposition, procédé d'exposition et procédé de production d'un dispositif
US8698998B2 (en) 2004-06-21 2014-04-15 Nikon Corporation Exposure apparatus, method for cleaning member thereof, maintenance method for exposure apparatus, maintenance device, and method for producing device
US7463330B2 (en) 2004-07-07 2008-12-09 Asml Netherlands B.V. Lithographic apparatus and device manufacturing method
US8384874B2 (en) 2004-07-12 2013-02-26 Nikon Corporation Immersion exposure apparatus and device manufacturing method to detect if liquid on base member
JP4677987B2 (ja) 2004-07-21 2011-04-27 株式会社ニコン 露光方法及びデバイス製造方法
US8169591B2 (en) 2004-08-03 2012-05-01 Nikon Corporation Exposure apparatus, exposure method, and method for producing device
US20070252970A1 (en) 2004-09-01 2007-11-01 Nikon Corporation Substrate Holder, Stage Apparatus, and Exposure Apparatus
US7706074B2 (en) 2004-09-13 2010-04-27 Nikon Corporation Projection optical system, method of manufacturing projection optical system, exposure apparatus, and exposure method
TWI610340B (zh) 2004-09-17 2018-01-01 尼康股份有限公司 曝光裝置、曝光方法及元件製造方法
SG155927A1 (en) 2004-09-17 2009-10-29 Nikon Corp Substrate holding device, exposure apparatus, and device manufacturing method
CN101032068B (zh) 2004-10-01 2010-12-22 株式会社尼康 线性电机、载台装置和曝光装置
US7456929B2 (en) 2004-10-15 2008-11-25 Nikon Corporation Exposure apparatus and device manufacturing method
KR101285951B1 (ko) 2004-10-26 2013-07-12 가부시키가이샤 니콘 기판 처리 방법, 노광 장치 및 디바이스 제조 방법
CN101598903A (zh) 2004-11-01 2009-12-09 株式会社尼康 曝光装置及曝光方法
WO2006051909A1 (fr) 2004-11-11 2006-05-18 Nikon Corporation Procede d’exposition, procede de fabrication de dispositif et substrat
EP1826813A4 (fr) 2004-12-01 2009-05-13 Nikon Corp Dispositif a etage et appaeil d'exposition
KR101339887B1 (ko) 2004-12-06 2013-12-10 가부시키가이샤 니콘 메인터넌스 방법, 메인터넌스 기기, 노광 장치, 및디바이스 제조 방법
JP4752473B2 (ja) 2004-12-09 2011-08-17 株式会社ニコン 露光装置、露光方法及びデバイス製造方法
KR101939525B1 (ko) 2004-12-15 2019-01-16 가부시키가이샤 니콘 기판 유지 장치, 노광 장치 및 디바이스 제조방법
US7450217B2 (en) 2005-01-12 2008-11-11 Asml Netherlands B.V. Exposure apparatus, coatings for exposure apparatus, lithographic apparatus, device manufacturing method, and device manufactured thereby
EP3079164A1 (fr) 2005-01-31 2016-10-12 Nikon Corporation Appareil d'exposition et procédé de production d'un dispositif
TWI424260B (zh) 2005-03-18 2014-01-21 尼康股份有限公司 A board member, a substrate holding device, an exposure apparatus and an exposure method, and a device manufacturing method
WO2006101024A1 (fr) 2005-03-18 2006-09-28 Nikon Corporation Procédé d’exposition, appareil d’exposition, procédé de fabrication de dispositif et procédé d’évaluation d’appareil d’exposition
EP3159738B1 (fr) 2005-03-25 2018-12-12 Nikon Corporation Procédé de détermination de la distorsion d'un système optique de projection.
EP1865539A4 (fr) 2005-03-30 2011-09-07 Nikon Corp Procede pour determiner des conditions d'exposition, procede d'exposition, dispositif d'exposition, et appareil de production du dispositif
USRE43576E1 (en) 2005-04-08 2012-08-14 Asml Netherlands B.V. Dual stage lithographic apparatus and device manufacturing method
WO2006112436A1 (fr) 2005-04-18 2006-10-26 Nikon Corporation Dispositif d'exposition, méthode d'exposition et méthode pour la fabrication du dispositif
CN100555568C (zh) 2005-04-28 2009-10-28 株式会社尼康 曝光方法及曝光装置、以及元件制造方法
KR101544336B1 (ko) 2005-05-12 2015-08-12 가부시키가이샤 니콘 투영 광학계, 노광 장치 및 노광 방법
JP4596191B2 (ja) 2005-05-24 2010-12-08 株式会社ニコン 露光方法及び露光装置、並びにデバイス製造方法
US7838858B2 (en) 2005-05-31 2010-11-23 Nikon Corporation Evaluation system and method of a search operation that detects a detection subject on an object
EP1895571A4 (fr) 2005-06-21 2011-04-27 Nikon Corp Appareil et procédé d'exposition, procédé de maintenance et procédé de fabrication de dispositif
US7924416B2 (en) 2005-06-22 2011-04-12 Nikon Corporation Measurement apparatus, exposure apparatus, and device manufacturing method
US8693006B2 (en) 2005-06-28 2014-04-08 Nikon Corporation Reflector, optical element, interferometer system, stage device, exposure apparatus, and device fabricating method
WO2007004552A1 (fr) 2005-06-30 2007-01-11 Nikon Corporation Appareil et procédé d'exposition, procédé d'entretien de l'appareil d'exposition, et procédé de fabrication de dispositif
WO2007007746A1 (fr) 2005-07-11 2007-01-18 Nikon Corporation Appareil d’exposition et procédé de fabrication du dispositif
TWI430039B (zh) 2005-08-23 2014-03-11 尼康股份有限公司 An exposure apparatus and an exposure method, and an element manufacturing method
US8111374B2 (en) 2005-09-09 2012-02-07 Nikon Corporation Analysis method, exposure method, and device manufacturing method
WO2007029829A1 (fr) 2005-09-09 2007-03-15 Nikon Corporation Appareil et procédé d’exposition, et procédé de production de dispositif
WO2007034838A1 (fr) 2005-09-21 2007-03-29 Nikon Corporation Dispositif d’exposition, procédé d’exposition et procédé de fabrication du dispositif
US8681314B2 (en) 2005-10-24 2014-03-25 Nikon Corporation Stage device and coordinate correction method for the same, exposure apparatus, and device manufacturing method
WO2007052659A1 (fr) 2005-11-01 2007-05-10 Nikon Corporation Appareil d’exposition, procédé d’exposition, et procédé de fabrication de l’appareil
WO2007055199A1 (fr) 2005-11-09 2007-05-18 Nikon Corporation Appareil et procede d'exposition, et procede de fabrication de dispositif
KR20080066836A (ko) 2005-11-09 2008-07-16 가부시키가이샤 니콘 노광 장치, 노광 방법 및 디바이스 제조 방법
JPWO2007055373A1 (ja) 2005-11-14 2009-04-30 株式会社ニコン 液体回収部材、露光装置、露光方法、及びデバイス製造方法
EP1956431A4 (fr) 2005-11-15 2009-06-24 Nikon Corp Appareil d'exposition, procede d' exposition et procede de fabrication de dispositif
JP2007165869A (ja) 2005-11-21 2007-06-28 Nikon Corp 露光方法及びそれを用いたデバイス製造方法、露光装置、並びに基板処理方法及び装置
US7803516B2 (en) 2005-11-21 2010-09-28 Nikon Corporation Exposure method, device manufacturing method using the same, exposure apparatus, and substrate processing method and apparatus
US8125610B2 (en) 2005-12-02 2012-02-28 ASML Metherlands B.V. Method for preventing or reducing contamination of an immersion type projection apparatus and an immersion type lithographic apparatus
JP2007318069A (ja) * 2005-12-06 2007-12-06 Nikon Corp 露光装置及び露光方法、並びにデバイス製造方法、投影光学系
JP5194799B2 (ja) 2005-12-06 2013-05-08 株式会社ニコン 露光方法、露光装置、及びデバイス製造方法
US7782442B2 (en) 2005-12-06 2010-08-24 Nikon Corporation Exposure apparatus, exposure method, projection optical system and device producing method
EP1970944A4 (fr) 2005-12-06 2010-04-28 Nikon Corp Appareil et procede d'exposition, systeme optique de projection et procede de fabrication de dispositif
WO2007066758A1 (fr) 2005-12-08 2007-06-14 Nikon Corporation Dispositif de support de substrat, dispositif d’exposition, procédé d’exposition et procédé de fabrication du dispositif
US7932994B2 (en) 2005-12-28 2011-04-26 Nikon Corporation Exposure apparatus, exposure method, and method for producing device
US8411271B2 (en) 2005-12-28 2013-04-02 Nikon Corporation Pattern forming method, pattern forming apparatus, and device manufacturing method
US8953148B2 (en) 2005-12-28 2015-02-10 Nikon Corporation Exposure apparatus and making method thereof
CN102681368B (zh) 2005-12-28 2015-09-30 株式会社尼康 图案形成方法及图案形成装置、以及元件制造方法
SG10201510758QA (en) 2006-01-19 2016-01-28 Nikon Corp Movable Body Drive Method, Movable Body Drive System, Pattern Formation Method, Pattern Forming Apparatus, Exposure Method, Exposure Apparatus, and Device Manufacturing Method
WO2007094431A1 (fr) 2006-02-16 2007-08-23 Nikon Corporation Appareil d'exposition, procédé d'exposition et procédé de fabrication de dispositif
WO2007094407A1 (fr) 2006-02-16 2007-08-23 Nikon Corporation Appareil d'exposition, procédé d'exposition, et procédé de fabrication du dispositif
KR20080102192A (ko) 2006-02-16 2008-11-24 가부시키가이샤 니콘 노광 장치, 노광 방법 및 디바이스 제조 방법
EP1990828A4 (fr) 2006-02-16 2010-09-15 Nikon Corp Appareil d'exposition, procédé d'exposition, et procédé de fabrication du dispositif
US8134681B2 (en) 2006-02-17 2012-03-13 Nikon Corporation Adjustment method, substrate processing method, substrate processing apparatus, exposure apparatus, inspection apparatus, measurement and/or inspection system, processing apparatus, computer system, program and information recording medium
KR101333872B1 (ko) 2006-02-21 2013-11-27 가부시키가이샤 니콘 패턴 형성 장치 및 패턴 형성 방법, 이동체 구동 시스템 및 이동체 구동 방법, 노광 장치 및 노광 방법, 그리고 디바이스 제조 방법
EP2003681B1 (fr) 2006-02-21 2014-11-12 Nikon Corporation Procédé et dispositif de mesure, procédé et dispositif de formation de motifs, et procédé de fabrication des dispositifs
CN101385122B (zh) 2006-02-21 2010-12-08 株式会社尼康 图案形成装置、标记检测装置、曝光装置、图案形成方法、曝光方法及组件制造方法
JP5077770B2 (ja) 2006-03-07 2012-11-21 株式会社ニコン デバイス製造方法、デバイス製造システム及び測定検査装置
WO2007105645A1 (fr) 2006-03-13 2007-09-20 Nikon Corporation Appareil d'exposition, procede de maintenance, procede d'exposition et procede de fabrication du dispositif
US20070242254A1 (en) 2006-03-17 2007-10-18 Nikon Corporation Exposure apparatus and device manufacturing method
US8982322B2 (en) 2006-03-17 2015-03-17 Nikon Corporation Exposure apparatus and device manufacturing method
US20080013062A1 (en) 2006-03-23 2008-01-17 Nikon Corporation Exposure apparatus, exposure method, and device manufacturing method
EP2006899A4 (fr) 2006-04-05 2011-12-28 Nikon Corp Appareil d'etage, appareil d'exposition, procede de commande d'etage, procede d'exposition et procede de fabrication de dispositif
KR101486086B1 (ko) 2006-05-10 2015-01-23 가부시키가이샤 니콘 노광 장치 및 디바이스 제조 방법
JP5217239B2 (ja) 2006-05-18 2013-06-19 株式会社ニコン 露光方法及び装置、メンテナンス方法、並びにデバイス製造方法
US7728462B2 (en) 2006-05-18 2010-06-01 Nikon Corporation Monolithic stage devices providing motion in six degrees of freedom
CN102109773A (zh) 2006-05-22 2011-06-29 株式会社尼康 曝光方法、曝光装置以及维修方法
CN102156389A (zh) 2006-05-23 2011-08-17 株式会社尼康 维修方法、曝光方法及装置、以及组件制造方法
KR20090023545A (ko) 2006-05-31 2009-03-05 가부시키가이샤 니콘 노광 장치 및 노광 방법
TW200816271A (en) 2006-06-09 2008-04-01 Nikon Corp Pattern formation method, pattern formation device, exposure method, exposure device, and device manufacturing method
SG172681A1 (en) 2006-06-09 2011-07-28 Nikon Corp Movable-body apparatus, exposure apparatus, exposure method, and device manufacturing method
EP2043134A4 (fr) 2006-06-30 2012-01-25 Nikon Corp Procédé de maintenance, procédé d'exposition et procédé de fabrication d'appareil et de dispositif
US20080073563A1 (en) 2006-07-01 2008-03-27 Nikon Corporation Exposure apparatus that includes a phase change circulation system for movers
JP5339056B2 (ja) 2006-07-14 2013-11-13 株式会社ニコン 露光装置及びデバイス製造方法
US8570484B2 (en) 2006-08-30 2013-10-29 Nikon Corporation Immersion exposure apparatus, device manufacturing method, cleaning method, and cleaning member to remove foreign substance using liquid
KR101763546B1 (ko) 2006-08-31 2017-07-31 가부시키가이샤 니콘 이동체 구동 방법 및 이동체 구동 시스템, 패턴 형성 방법 및 장치, 노광 방법 및 장치, 그리고 디바이스 제조 방법
KR101565275B1 (ko) 2006-08-31 2015-11-02 가부시키가이샤 니콘 이동체 구동 방법 및 이동체 구동 시스템, 패턴 형성 방법 및 장치, 노광 방법 및 장치, 그리고 디바이스 제조 방법
JPWO2008026732A1 (ja) 2006-08-31 2010-01-21 株式会社ニコン 移動体駆動システム及び移動体駆動方法、パターン形成装置及び方法、露光装置及び方法、デバイス製造方法、並びに決定方法
WO2008029757A1 (fr) 2006-09-01 2008-03-13 Nikon Corporation Procédé de commande d'objet mobile, système de commande d'objet mobile, procédé et appareil de formation de motif, procédé et appareil d'exposition, procédé de fabrication de dispositif et procédé d'étalonnage
SG174740A1 (en) 2006-09-01 2011-10-28 Nikon Corp Movable body drive method and movable body drive system, pattern formation method and apparatus, exposure method and apparatus, and device manufacturing method
JP5029611B2 (ja) 2006-09-08 2012-09-19 株式会社ニコン クリーニング用部材、クリーニング方法、露光装置、並びにデバイス製造方法
KR101419195B1 (ko) 2006-09-08 2014-07-15 가부시키가이샤 니콘 마스크, 노광 장치 및 디바이스 제조 방법
US7872730B2 (en) 2006-09-15 2011-01-18 Nikon Corporation Immersion exposure apparatus and immersion exposure method, and device manufacturing method
KR101419196B1 (ko) 2006-09-29 2014-07-15 가부시키가이샤 니콘 노광 장치 및 노광 방법, 그리고 디바이스 제조 방법
WO2008056735A1 (fr) 2006-11-09 2008-05-15 Nikon Corporation Unité de support, système de détection de position et système d'exposition, procédé de déplacement, procédé de détection de position, procédé d'exposition, procédé d'ajustement du système de détection, et procédé de prod
JP5055971B2 (ja) 2006-11-16 2012-10-24 株式会社ニコン 表面処理方法及び表面処理装置、露光方法及び露光装置、並びにデバイス製造方法
US7973910B2 (en) 2006-11-17 2011-07-05 Nikon Corporation Stage apparatus and exposure apparatus
US20080156356A1 (en) 2006-12-05 2008-07-03 Nikon Corporation Cleaning liquid, cleaning method, liquid generating apparatus, exposure apparatus, and device fabricating method
US8004651B2 (en) 2007-01-23 2011-08-23 Nikon Corporation Liquid recovery system, immersion exposure apparatus, immersion exposing method, and device fabricating method
TWI454839B (zh) 2007-03-01 2014-10-01 尼康股份有限公司 A film frame apparatus, a mask, an exposure method, and an exposure apparatus, and a method of manufacturing the element
US8134685B2 (en) 2007-03-23 2012-03-13 Nikon Corporation Liquid recovery system, immersion exposure apparatus, immersion exposing method, and device fabricating method
US8300207B2 (en) 2007-05-17 2012-10-30 Nikon Corporation Exposure apparatus, immersion system, exposing method, and device fabricating method
US8098362B2 (en) 2007-05-30 2012-01-17 Nikon Corporation Detection device, movable body apparatus, pattern formation apparatus and pattern formation method, exposure apparatus and exposure method, and device manufacturing method
KR101409149B1 (ko) 2007-07-24 2014-06-17 가부시키가이샤 니콘 이동체 구동 방법 및 이동체 구동 시스템, 패턴 형성 방법 및 장치, 노광 방법 및 장치, 그리고 디바이스 제조 방법
US8194232B2 (en) 2007-07-24 2012-06-05 Nikon Corporation Movable body drive method and movable body drive system, pattern formation method and apparatus, exposure method and apparatus, position control method and position control system, and device manufacturing method
US8547527B2 (en) 2007-07-24 2013-10-01 Nikon Corporation Movable body drive method and movable body drive system, pattern formation method and pattern formation apparatus, and device manufacturing method
KR101546976B1 (ko) 2007-07-24 2015-08-24 가부시키가이샤 니콘 위치 계측 시스템, 노광 장치, 위치 계측 방법, 노광 방법 및 디바이스 제조 방법, 그리고 공구 및 계측 방법
US8237919B2 (en) 2007-08-24 2012-08-07 Nikon Corporation Movable body drive method and movable body drive system, pattern formation method and apparatus, exposure method and apparatus, and device manufacturing method for continuous position measurement of movable body before and after switching between sensor heads
US8218129B2 (en) 2007-08-24 2012-07-10 Nikon Corporation Movable body drive method and movable body drive system, pattern formation method and apparatus, exposure method and apparatus, device manufacturing method, measuring method, and position measurement system
US9304412B2 (en) 2007-08-24 2016-04-05 Nikon Corporation Movable body drive method and movable body drive system, pattern formation method and apparatus, exposure method and apparatus, device manufacturing method, and measuring method
US8023106B2 (en) 2007-08-24 2011-09-20 Nikon Corporation Movable body drive method and movable body drive system, pattern formation method and apparatus, exposure method and apparatus, and device manufacturing method
US8867022B2 (en) 2007-08-24 2014-10-21 Nikon Corporation Movable body drive method and movable body drive system, pattern formation method and apparatus, and device manufacturing method
US8421994B2 (en) 2007-09-27 2013-04-16 Nikon Corporation Exposure apparatus
JP5267029B2 (ja) 2007-10-12 2013-08-21 株式会社ニコン 照明光学装置、露光装置及びデバイスの製造方法
US8379187B2 (en) 2007-10-24 2013-02-19 Nikon Corporation Optical unit, illumination optical apparatus, exposure apparatus, and device manufacturing method
US9116346B2 (en) 2007-11-06 2015-08-25 Nikon Corporation Illumination apparatus, illumination method, exposure apparatus, and device manufacturing method
US20090153824A1 (en) * 2007-12-17 2009-06-18 Kla-Tencor Corporation Multiple chuck scanning stage
US9176393B2 (en) 2008-05-28 2015-11-03 Asml Netherlands B.V. Lithographic apparatus and a method of operating the apparatus
NL2003363A (en) 2008-09-10 2010-03-15 Asml Netherlands Bv Lithographic apparatus, method of manufacturing an article for a lithographic apparatus and device manufacturing method.
US8384875B2 (en) 2008-09-29 2013-02-26 Nikon Corporation Exposure apparatus, exposure method, and method for producing device
US9312159B2 (en) 2009-06-09 2016-04-12 Nikon Corporation Transport apparatus and exposure apparatus

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US8902401B2 (en) 2006-05-09 2014-12-02 Carl Zeiss Smt Gmbh Optical imaging device with thermal attenuation

Similar Documents

Publication Publication Date Title
JPH10163099A5 (fr)
JP3203719B2 (ja) 露光装置、その露光装置により製造されるデバイス、露光方法、およびその露光方法を用いたデバイス製造方法
JPH10163097A5 (fr)
JPH10209039A5 (fr)
JP4029182B2 (ja) 露光方法
JP3624065B2 (ja) 基板搬送装置、半導体製造装置および露光装置
JPH09115817A (ja) 露光方法及び装置
JP2002050560A (ja) ステージ装置、計測装置及び計測方法、露光装置及び露光方法
US5440397A (en) Apparatus and method for exposure
JPH10163098A5 (fr)
JPH0864518A (ja) 露光方法
JP4227402B2 (ja) 走査型露光装置
JP2005101455A (ja) 位置決め装置
JPH1050604A (ja) 位置管理方法及び位置合わせ方法
TWI760959B (zh) 對準方法及相關的對準及微影設備
JP2010243413A (ja) 測定装置、露光装置及びデバイスの製造方法
US7782441B2 (en) Alignment method and apparatus of mask pattern
JP3569962B2 (ja) 位置合わせ装置及び位置合わせ方法、それを用いた露光装置及び露光方法
JPH09148236A (ja) 露光装置の基板ステージの移動制御方法及び装置
JP2705778B2 (ja) 投影露光装置
JPH0149007B2 (fr)
JPH10177951A (ja) 露光方法及び露光装置
JP3204253B2 (ja) 露光装置及びその露光装置により製造されたデバイス、並びに露光方法及びその露光方法を用いてデバイスを製造する方法
JP3919689B2 (ja) 露光方法、素子の製造方法および露光装置
JPH10199804A5 (fr)