JPH10228073A - Silver halide photographic sensitive material - Google Patents
Silver halide photographic sensitive materialInfo
- Publication number
- JPH10228073A JPH10228073A JP3193797A JP3193797A JPH10228073A JP H10228073 A JPH10228073 A JP H10228073A JP 3193797 A JP3193797 A JP 3193797A JP 3193797 A JP3193797 A JP 3193797A JP H10228073 A JPH10228073 A JP H10228073A
- Authority
- JP
- Japan
- Prior art keywords
- group
- silver halide
- halide emulsion
- layer
- emulsion layer
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
- -1 Silver halide Chemical class 0.000 title claims abstract description 209
- 229910052709 silver Inorganic materials 0.000 title claims abstract description 114
- 239000004332 silver Substances 0.000 title claims abstract description 114
- 239000000463 material Substances 0.000 title claims abstract description 41
- 239000000839 emulsion Substances 0.000 claims abstract description 76
- 125000000217 alkyl group Chemical group 0.000 claims abstract description 26
- 230000001235 sensitizing effect Effects 0.000 claims abstract description 23
- 230000003595 spectral effect Effects 0.000 claims abstract description 17
- 125000004435 hydrogen atom Chemical group [H]* 0.000 claims abstract description 15
- 150000002429 hydrazines Chemical class 0.000 claims abstract description 12
- 125000003178 carboxy group Chemical group [H]OC(*)=O 0.000 claims abstract description 11
- 150000003839 salts Chemical class 0.000 claims abstract description 10
- 150000002500 ions Chemical class 0.000 claims abstract description 8
- 125000004430 oxygen atom Chemical group O* 0.000 claims abstract description 5
- 125000004429 atom Chemical group 0.000 claims abstract description 4
- 230000003472 neutralizing effect Effects 0.000 claims abstract description 4
- 125000000020 sulfo group Chemical group O=S(=O)([*])O[H] 0.000 claims abstract description 4
- 150000001875 compounds Chemical class 0.000 claims description 31
- 125000003118 aryl group Chemical group 0.000 claims description 20
- 239000000084 colloidal system Substances 0.000 claims description 20
- 125000000623 heterocyclic group Chemical group 0.000 claims description 18
- 125000004414 alkyl thio group Chemical group 0.000 claims description 11
- 125000003545 alkoxy group Chemical group 0.000 claims description 10
- 125000004397 aminosulfonyl group Chemical group NS(=O)(=O)* 0.000 claims description 10
- 125000003917 carbamoyl group Chemical group [H]N([H])C(*)=O 0.000 claims description 9
- 229910052723 transition metal Inorganic materials 0.000 claims description 8
- 125000002252 acyl group Chemical group 0.000 claims description 7
- 125000005843 halogen group Chemical group 0.000 claims description 7
- 125000002887 hydroxy group Chemical group [H]O* 0.000 claims description 7
- 125000000472 sulfonyl group Chemical group *S(*)(=O)=O 0.000 claims description 7
- 150000003624 transition metals Chemical class 0.000 claims description 7
- 125000003342 alkenyl group Chemical group 0.000 claims description 6
- 125000004453 alkoxycarbonyl group Chemical group 0.000 claims description 6
- 125000004104 aryloxy group Chemical group 0.000 claims description 6
- 125000004093 cyano group Chemical group *C#N 0.000 claims description 6
- 125000003831 tetrazolyl group Chemical group 0.000 claims description 5
- 125000004442 acylamino group Chemical group 0.000 claims description 4
- 125000000391 vinyl group Chemical group [H]C([*])=C([H])[H] 0.000 claims description 4
- 125000004423 acyloxy group Chemical group 0.000 claims description 3
- 125000001188 haloalkyl group Chemical group 0.000 claims description 3
- 229910052757 nitrogen Inorganic materials 0.000 claims description 3
- IJGRMHOSHXDMSA-UHFFFAOYSA-N nitrogen Substances N#N IJGRMHOSHXDMSA-UHFFFAOYSA-N 0.000 claims description 3
- 230000000737 periodic effect Effects 0.000 claims description 3
- 125000006575 electron-withdrawing group Chemical group 0.000 claims description 2
- 230000035945 sensitivity Effects 0.000 abstract description 19
- 238000011109 contamination Methods 0.000 abstract description 5
- 229910052740 iodine Inorganic materials 0.000 abstract description 4
- 229910052727 yttrium Inorganic materials 0.000 abstract description 2
- 239000003086 colorant Substances 0.000 abstract 1
- 239000010410 layer Substances 0.000 description 96
- 238000000034 method Methods 0.000 description 38
- 239000000975 dye Substances 0.000 description 33
- 239000000243 solution Substances 0.000 description 21
- 239000000460 chlorine Substances 0.000 description 19
- 239000002245 particle Substances 0.000 description 19
- 108010010803 Gelatin Proteins 0.000 description 18
- 239000008273 gelatin Substances 0.000 description 18
- 229920000159 gelatin Polymers 0.000 description 18
- 235000019322 gelatine Nutrition 0.000 description 18
- 235000011852 gelatine desserts Nutrition 0.000 description 18
- 229920001600 hydrophobic polymer Polymers 0.000 description 18
- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Substances O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 description 17
- 239000000203 mixture Substances 0.000 description 16
- 229920000642 polymer Polymers 0.000 description 16
- 238000012545 processing Methods 0.000 description 16
- 206010070834 Sensitisation Diseases 0.000 description 13
- 239000003795 chemical substances by application Substances 0.000 description 13
- 230000008313 sensitization Effects 0.000 description 13
- 239000000126 substance Substances 0.000 description 13
- QTBSBXVTEAMEQO-UHFFFAOYSA-N Acetic acid Chemical compound CC(O)=O QTBSBXVTEAMEQO-UHFFFAOYSA-N 0.000 description 12
- BQCADISMDOOEFD-UHFFFAOYSA-N Silver Chemical compound [Ag] BQCADISMDOOEFD-UHFFFAOYSA-N 0.000 description 12
- 239000002253 acid Substances 0.000 description 12
- IOLCXVTUBQKXJR-UHFFFAOYSA-M potassium bromide Chemical compound [K+].[Br-] IOLCXVTUBQKXJR-UHFFFAOYSA-M 0.000 description 12
- VYPSYNLAJGMNEJ-UHFFFAOYSA-N Silicium dioxide Chemical compound O=[Si]=O VYPSYNLAJGMNEJ-UHFFFAOYSA-N 0.000 description 11
- 239000011230 binding agent Substances 0.000 description 11
- 125000001424 substituent group Chemical group 0.000 description 11
- 239000011248 coating agent Substances 0.000 description 10
- 238000000576 coating method Methods 0.000 description 10
- 230000006911 nucleation Effects 0.000 description 10
- 238000010899 nucleation Methods 0.000 description 10
- 238000002360 preparation method Methods 0.000 description 10
- KWYUFKZDYYNOTN-UHFFFAOYSA-M Potassium hydroxide Chemical compound [OH-].[K+] KWYUFKZDYYNOTN-UHFFFAOYSA-M 0.000 description 9
- 239000000654 additive Substances 0.000 description 9
- KRKNYBCHXYNGOX-UHFFFAOYSA-N citric acid Chemical compound OC(=O)CC(O)(C(O)=O)CC(O)=O KRKNYBCHXYNGOX-UHFFFAOYSA-N 0.000 description 9
- HEMHJVSKTPXQMS-UHFFFAOYSA-M Sodium hydroxide Chemical compound [OH-].[Na+] HEMHJVSKTPXQMS-UHFFFAOYSA-M 0.000 description 8
- 230000000694 effects Effects 0.000 description 8
- SQGYOTSLMSWVJD-UHFFFAOYSA-N silver(1+) nitrate Chemical compound [Ag+].[O-]N(=O)=O SQGYOTSLMSWVJD-UHFFFAOYSA-N 0.000 description 8
- 229910052717 sulfur Inorganic materials 0.000 description 8
- NIXOWILDQLNWCW-UHFFFAOYSA-N 2-Propenoic acid Natural products OC(=O)C=C NIXOWILDQLNWCW-UHFFFAOYSA-N 0.000 description 7
- QAOWNCQODCNURD-UHFFFAOYSA-N Sulfuric acid Chemical compound OS(O)(=O)=O QAOWNCQODCNURD-UHFFFAOYSA-N 0.000 description 7
- 239000008119 colloidal silica Substances 0.000 description 7
- 239000002872 contrast media Substances 0.000 description 7
- 229920001577 copolymer Polymers 0.000 description 7
- 125000001495 ethyl group Chemical group [H]C([H])([H])C([H])([H])* 0.000 description 7
- 238000011156 evaluation Methods 0.000 description 7
- 239000010419 fine particle Substances 0.000 description 7
- 229910052736 halogen Inorganic materials 0.000 description 7
- 125000001997 phenyl group Chemical group [H]C1=C([H])C([H])=C(*)C([H])=C1[H] 0.000 description 7
- SMZOUWXMTYCWNB-UHFFFAOYSA-N 2-(2-methoxy-5-methylphenyl)ethanamine Chemical compound COC1=CC=C(C)C=C1CCN SMZOUWXMTYCWNB-UHFFFAOYSA-N 0.000 description 6
- QIGBRXMKCJKVMJ-UHFFFAOYSA-N Hydroquinone Chemical compound OC1=CC=C(O)C=C1 QIGBRXMKCJKVMJ-UHFFFAOYSA-N 0.000 description 6
- FAPWRFPIFSIZLT-UHFFFAOYSA-M Sodium chloride Chemical compound [Na+].[Cl-] FAPWRFPIFSIZLT-UHFFFAOYSA-M 0.000 description 6
- NINIDFKCEFEMDL-UHFFFAOYSA-N Sulfur Chemical compound [S] NINIDFKCEFEMDL-UHFFFAOYSA-N 0.000 description 6
- 238000011161 development Methods 0.000 description 6
- 230000018109 developmental process Effects 0.000 description 6
- 238000009792 diffusion process Methods 0.000 description 6
- 238000001035 drying Methods 0.000 description 6
- 150000002367 halogens Chemical class 0.000 description 6
- RAXXELZNTBOGNW-UHFFFAOYSA-N imidazole Natural products C1=CNC=N1 RAXXELZNTBOGNW-UHFFFAOYSA-N 0.000 description 6
- 125000002496 methyl group Chemical group [H]C([H])([H])* 0.000 description 6
- 238000002156 mixing Methods 0.000 description 6
- 239000010948 rhodium Substances 0.000 description 6
- 230000000087 stabilizing effect Effects 0.000 description 6
- 239000011593 sulfur Substances 0.000 description 6
- NIXOWILDQLNWCW-UHFFFAOYSA-M Acrylate Chemical compound [O-]C(=O)C=C NIXOWILDQLNWCW-UHFFFAOYSA-M 0.000 description 5
- KCXVZYZYPLLWCC-UHFFFAOYSA-N EDTA Chemical compound OC(=O)CN(CC(O)=O)CCN(CC(O)=O)CC(O)=O KCXVZYZYPLLWCC-UHFFFAOYSA-N 0.000 description 5
- JUJWROOIHBZHMG-UHFFFAOYSA-N Pyridine Chemical compound C1=CC=NC=C1 JUJWROOIHBZHMG-UHFFFAOYSA-N 0.000 description 5
- 125000002777 acetyl group Chemical group [H]C([H])([H])C(*)=O 0.000 description 5
- 125000001931 aliphatic group Chemical group 0.000 description 5
- 239000007864 aqueous solution Substances 0.000 description 5
- 125000004432 carbon atom Chemical group C* 0.000 description 5
- 239000003446 ligand Substances 0.000 description 5
- 239000007788 liquid Substances 0.000 description 5
- 229920001467 poly(styrenesulfonates) Polymers 0.000 description 5
- 239000011241 protective layer Substances 0.000 description 5
- 230000005070 ripening Effects 0.000 description 5
- 239000011734 sodium Substances 0.000 description 5
- 229940006186 sodium polystyrene sulfonate Drugs 0.000 description 5
- 238000001179 sorption measurement Methods 0.000 description 5
- 125000003396 thiol group Chemical group [H]S* 0.000 description 5
- CIWBSHSKHKDKBQ-JLAZNSOCSA-N Ascorbic acid Chemical compound OC[C@H](O)[C@H]1OC(=O)C(O)=C1O CIWBSHSKHKDKBQ-JLAZNSOCSA-N 0.000 description 4
- SXRSQZLOMIGNAQ-UHFFFAOYSA-N Glutaraldehyde Chemical compound O=CCCCC=O SXRSQZLOMIGNAQ-UHFFFAOYSA-N 0.000 description 4
- CERQOIWHTDAKMF-UHFFFAOYSA-N Methacrylic acid Chemical compound CC(=C)C(O)=O CERQOIWHTDAKMF-UHFFFAOYSA-N 0.000 description 4
- PXHVJJICTQNCMI-UHFFFAOYSA-N Nickel Chemical compound [Ni] PXHVJJICTQNCMI-UHFFFAOYSA-N 0.000 description 4
- MUBZPKHOEPUJKR-UHFFFAOYSA-N Oxalic acid Chemical compound OC(=O)C(O)=O MUBZPKHOEPUJKR-UHFFFAOYSA-N 0.000 description 4
- 229910021607 Silver chloride Inorganic materials 0.000 description 4
- 235000011054 acetic acid Nutrition 0.000 description 4
- 125000000304 alkynyl group Chemical group 0.000 description 4
- 125000003277 amino group Chemical group 0.000 description 4
- 150000001450 anions Chemical class 0.000 description 4
- IOJUPLGTWVMSFF-UHFFFAOYSA-N benzothiazole Chemical compound C1=CC=C2SC=NC2=C1 IOJUPLGTWVMSFF-UHFFFAOYSA-N 0.000 description 4
- 239000006185 dispersion Substances 0.000 description 4
- 150000004820 halides Chemical class 0.000 description 4
- 238000010438 heat treatment Methods 0.000 description 4
- 229920001477 hydrophilic polymer Polymers 0.000 description 4
- 150000002484 inorganic compounds Chemical class 0.000 description 4
- 229910010272 inorganic material Inorganic materials 0.000 description 4
- 125000004170 methylsulfonyl group Chemical group [H]C([H])([H])S(*)(=O)=O 0.000 description 4
- 230000008569 process Effects 0.000 description 4
- HKZLPVFGJNLROG-UHFFFAOYSA-M silver monochloride Chemical compound [Cl-].[Ag+] HKZLPVFGJNLROG-UHFFFAOYSA-M 0.000 description 4
- 229910001961 silver nitrate Inorganic materials 0.000 description 4
- GEHJYWRUCIMESM-UHFFFAOYSA-L sodium sulfite Chemical compound [Na+].[Na+].[O-]S([O-])=O GEHJYWRUCIMESM-UHFFFAOYSA-L 0.000 description 4
- 239000002904 solvent Substances 0.000 description 4
- 125000000999 tert-butyl group Chemical group [H]C([H])([H])C(*)(C([H])([H])[H])C([H])([H])[H] 0.000 description 4
- 125000002023 trifluoromethyl group Chemical group FC(F)(F)* 0.000 description 4
- 238000005406 washing Methods 0.000 description 4
- 239000012224 working solution Substances 0.000 description 4
- GGZHVNZHFYCSEV-UHFFFAOYSA-N 1-Phenyl-5-mercaptotetrazole Chemical compound SC1=NN=NN1C1=CC=CC=C1 GGZHVNZHFYCSEV-UHFFFAOYSA-N 0.000 description 3
- XNHFAGRBSMMFKL-UHFFFAOYSA-N 2-sulfanylidene-3,7-dihydropurin-6-one Chemical compound O=C1NC(=S)NC2=C1NC=N2 XNHFAGRBSMMFKL-UHFFFAOYSA-N 0.000 description 3
- ZCYVEMRRCGMTRW-UHFFFAOYSA-N 7553-56-2 Chemical group [I] ZCYVEMRRCGMTRW-UHFFFAOYSA-N 0.000 description 3
- CSCPPACGZOOCGX-UHFFFAOYSA-N Acetone Chemical compound CC(C)=O CSCPPACGZOOCGX-UHFFFAOYSA-N 0.000 description 3
- WEVYAHXRMPXWCK-UHFFFAOYSA-N Acetonitrile Chemical compound CC#N WEVYAHXRMPXWCK-UHFFFAOYSA-N 0.000 description 3
- 229920002126 Acrylic acid copolymer Polymers 0.000 description 3
- BTBUEUYNUDRHOZ-UHFFFAOYSA-N Borate Chemical compound [O-]B([O-])[O-] BTBUEUYNUDRHOZ-UHFFFAOYSA-N 0.000 description 3
- CPELXLSAUQHCOX-UHFFFAOYSA-M Bromide Chemical compound [Br-] CPELXLSAUQHCOX-UHFFFAOYSA-M 0.000 description 3
- WKBOTKDWSSQWDR-UHFFFAOYSA-N Bromine atom Chemical group [Br] WKBOTKDWSSQWDR-UHFFFAOYSA-N 0.000 description 3
- BVKZGUZCCUSVTD-UHFFFAOYSA-L Carbonate Chemical compound [O-]C([O-])=O BVKZGUZCCUSVTD-UHFFFAOYSA-L 0.000 description 3
- VEXZGXHMUGYJMC-UHFFFAOYSA-M Chloride anion Chemical compound [Cl-] VEXZGXHMUGYJMC-UHFFFAOYSA-M 0.000 description 3
- LFQSCWFLJHTTHZ-UHFFFAOYSA-N Ethanol Chemical compound CCO LFQSCWFLJHTTHZ-UHFFFAOYSA-N 0.000 description 3
- LYCAIKOWRPUZTN-UHFFFAOYSA-N Ethylene glycol Chemical compound OCCO LYCAIKOWRPUZTN-UHFFFAOYSA-N 0.000 description 3
- KFZMGEQAYNKOFK-UHFFFAOYSA-N Isopropanol Chemical compound CC(C)O KFZMGEQAYNKOFK-UHFFFAOYSA-N 0.000 description 3
- OKKJLVBELUTLKV-UHFFFAOYSA-N Methanol Chemical compound OC OKKJLVBELUTLKV-UHFFFAOYSA-N 0.000 description 3
- GRYLNZFGIOXLOG-UHFFFAOYSA-N Nitric acid Chemical compound O[N+]([O-])=O GRYLNZFGIOXLOG-UHFFFAOYSA-N 0.000 description 3
- DNIAPMSPPWPWGF-UHFFFAOYSA-N Propylene glycol Chemical compound CC(O)CO DNIAPMSPPWPWGF-UHFFFAOYSA-N 0.000 description 3
- RWRDLPDLKQPQOW-UHFFFAOYSA-N Pyrrolidine Chemical compound C1CCNC1 RWRDLPDLKQPQOW-UHFFFAOYSA-N 0.000 description 3
- 102100040160 Rabankyrin-5 Human genes 0.000 description 3
- 101710086049 Rabankyrin-5 Proteins 0.000 description 3
- BUGBHKTXTAQXES-UHFFFAOYSA-N Selenium Chemical compound [Se] BUGBHKTXTAQXES-UHFFFAOYSA-N 0.000 description 3
- 239000006087 Silane Coupling Agent Substances 0.000 description 3
- QAOWNCQODCNURD-UHFFFAOYSA-L Sulfate Chemical compound [O-]S([O-])(=O)=O QAOWNCQODCNURD-UHFFFAOYSA-L 0.000 description 3
- 230000000996 additive effect Effects 0.000 description 3
- 239000003513 alkali Substances 0.000 description 3
- 125000005110 aryl thio group Chemical group 0.000 description 3
- 235000010323 ascorbic acid Nutrition 0.000 description 3
- KGBXLFKZBHKPEV-UHFFFAOYSA-N boric acid Chemical compound OB(O)O KGBXLFKZBHKPEV-UHFFFAOYSA-N 0.000 description 3
- 239000004327 boric acid Substances 0.000 description 3
- 239000001913 cellulose Substances 0.000 description 3
- 229920002678 cellulose Polymers 0.000 description 3
- 235000010980 cellulose Nutrition 0.000 description 3
- 239000002738 chelating agent Substances 0.000 description 3
- 229910052801 chlorine Inorganic materials 0.000 description 3
- 235000015165 citric acid Nutrition 0.000 description 3
- 125000000113 cyclohexyl group Chemical group [H]C1([H])C([H])([H])C([H])([H])C([H])(*)C([H])([H])C1([H])[H] 0.000 description 3
- 238000011033 desalting Methods 0.000 description 3
- MTHSVFCYNBDYFN-UHFFFAOYSA-N diethylene glycol Chemical compound OCCOCCO MTHSVFCYNBDYFN-UHFFFAOYSA-N 0.000 description 3
- HNPSIPDUKPIQMN-UHFFFAOYSA-N dioxosilane;oxo(oxoalumanyloxy)alumane Chemical compound O=[Si]=O.O=[Al]O[Al]=O HNPSIPDUKPIQMN-UHFFFAOYSA-N 0.000 description 3
- 125000003754 ethoxycarbonyl group Chemical group C(=O)(OCC)* 0.000 description 3
- 229910052731 fluorine Inorganic materials 0.000 description 3
- 125000005842 heteroatom Chemical group 0.000 description 3
- 239000003112 inhibitor Substances 0.000 description 3
- XMBWDFGMSWQBCA-UHFFFAOYSA-M iodide Chemical compound [I-] XMBWDFGMSWQBCA-UHFFFAOYSA-M 0.000 description 3
- 125000005647 linker group Chemical group 0.000 description 3
- 238000005259 measurement Methods 0.000 description 3
- 125000001160 methoxycarbonyl group Chemical group [H]C([H])([H])OC(*)=O 0.000 description 3
- 150000007522 mineralic acids Chemical class 0.000 description 3
- 239000000178 monomer Substances 0.000 description 3
- 229910017604 nitric acid Inorganic materials 0.000 description 3
- QJGQUHMNIGDVPM-UHFFFAOYSA-N nitrogen group Chemical group [N] QJGQUHMNIGDVPM-UHFFFAOYSA-N 0.000 description 3
- 239000003960 organic solvent Substances 0.000 description 3
- JOXIMZWYDAKGHI-UHFFFAOYSA-N p-toluenesulfonic acid Substances CC1=CC=C(S(O)(=O)=O)C=C1 JOXIMZWYDAKGHI-UHFFFAOYSA-N 0.000 description 3
- 239000006179 pH buffering agent Substances 0.000 description 3
- 229920003229 poly(methyl methacrylate) Polymers 0.000 description 3
- 239000004848 polyfunctional curative Substances 0.000 description 3
- 239000004926 polymethyl methacrylate Substances 0.000 description 3
- NLKNQRATVPKPDG-UHFFFAOYSA-M potassium iodide Chemical compound [K+].[I-] NLKNQRATVPKPDG-UHFFFAOYSA-M 0.000 description 3
- 239000001397 quillaja saponaria molina bark Substances 0.000 description 3
- 229930182490 saponin Natural products 0.000 description 3
- 150000007949 saponins Chemical class 0.000 description 3
- 229910052711 selenium Inorganic materials 0.000 description 3
- 239000011669 selenium Substances 0.000 description 3
- 239000011780 sodium chloride Substances 0.000 description 3
- 125000004434 sulfur atom Chemical group 0.000 description 3
- 238000012360 testing method Methods 0.000 description 3
- UMGDCJDMYOKAJW-UHFFFAOYSA-N thiourea Chemical compound NC(N)=S UMGDCJDMYOKAJW-UHFFFAOYSA-N 0.000 description 3
- 238000012546 transfer Methods 0.000 description 3
- WFKWXMTUELFFGS-UHFFFAOYSA-N tungsten Chemical compound [W] WFKWXMTUELFFGS-UHFFFAOYSA-N 0.000 description 3
- 229910052721 tungsten Inorganic materials 0.000 description 3
- 239000010937 tungsten Substances 0.000 description 3
- 239000002699 waste material Substances 0.000 description 3
- 239000010457 zeolite Substances 0.000 description 3
- YXIWHUQXZSMYRE-UHFFFAOYSA-N 1,3-benzothiazole-2-thiol Chemical compound C1=CC=C2SC(S)=NC2=C1 YXIWHUQXZSMYRE-UHFFFAOYSA-N 0.000 description 2
- AGBXYHCHUYARJY-UHFFFAOYSA-N 2-phenylethenesulfonic acid Chemical compound OS(=O)(=O)C=CC1=CC=CC=C1 AGBXYHCHUYARJY-UHFFFAOYSA-N 0.000 description 2
- DSVIHYOAKPVFEH-UHFFFAOYSA-N 4-(hydroxymethyl)-4-methyl-1-phenylpyrazolidin-3-one Chemical compound N1C(=O)C(C)(CO)CN1C1=CC=CC=C1 DSVIHYOAKPVFEH-UHFFFAOYSA-N 0.000 description 2
- PLIKAWJENQZMHA-UHFFFAOYSA-N 4-aminophenol Chemical compound NC1=CC=C(O)C=C1 PLIKAWJENQZMHA-UHFFFAOYSA-N 0.000 description 2
- 125000004800 4-bromophenyl group Chemical group [H]C1=C([H])C(*)=C([H])C([H])=C1Br 0.000 description 2
- LSNNMFCWUKXFEE-UHFFFAOYSA-M Bisulfite Chemical compound OS([O-])=O LSNNMFCWUKXFEE-UHFFFAOYSA-M 0.000 description 2
- OKTJSMMVPCPJKN-UHFFFAOYSA-N Carbon Chemical compound [C] OKTJSMMVPCPJKN-UHFFFAOYSA-N 0.000 description 2
- ZAMOUSCENKQFHK-UHFFFAOYSA-N Chlorine atom Chemical compound [Cl] ZAMOUSCENKQFHK-UHFFFAOYSA-N 0.000 description 2
- RYGMFSIKBFXOCR-UHFFFAOYSA-N Copper Chemical compound [Cu] RYGMFSIKBFXOCR-UHFFFAOYSA-N 0.000 description 2
- PXGOKWXKJXAPGV-UHFFFAOYSA-N Fluorine Chemical compound FF PXGOKWXKJXAPGV-UHFFFAOYSA-N 0.000 description 2
- WSFSSNUMVMOOMR-UHFFFAOYSA-N Formaldehyde Chemical compound O=C WSFSSNUMVMOOMR-UHFFFAOYSA-N 0.000 description 2
- DGAQECJNVWCQMB-PUAWFVPOSA-M Ilexoside XXIX Chemical compound C[C@@H]1CC[C@@]2(CC[C@@]3(C(=CC[C@H]4[C@]3(CC[C@@H]5[C@@]4(CC[C@@H](C5(C)C)OS(=O)(=O)[O-])C)C)[C@@H]2[C@]1(C)O)C)C(=O)O[C@H]6[C@@H]([C@H]([C@@H]([C@H](O6)CO)O)O)O.[Na+] DGAQECJNVWCQMB-PUAWFVPOSA-M 0.000 description 2
- YNAVUWVOSKDBBP-UHFFFAOYSA-N Morpholine Chemical compound C1COCCN1 YNAVUWVOSKDBBP-UHFFFAOYSA-N 0.000 description 2
- NHNBFGGVMKEFGY-UHFFFAOYSA-N Nitrate Chemical compound [O-][N+]([O-])=O NHNBFGGVMKEFGY-UHFFFAOYSA-N 0.000 description 2
- 229910019142 PO4 Inorganic materials 0.000 description 2
- ISWSIDIOOBJBQZ-UHFFFAOYSA-N Phenol Chemical compound OC1=CC=CC=C1 ISWSIDIOOBJBQZ-UHFFFAOYSA-N 0.000 description 2
- 239000004698 Polyethylene Substances 0.000 description 2
- 229920000388 Polyphosphate Polymers 0.000 description 2
- 239000004793 Polystyrene Substances 0.000 description 2
- 239000004372 Polyvinyl alcohol Substances 0.000 description 2
- OFOBLEOULBTSOW-UHFFFAOYSA-N Propanedioic acid Natural products OC(=O)CC(O)=O OFOBLEOULBTSOW-UHFFFAOYSA-N 0.000 description 2
- KYQCOXFCLRTKLS-UHFFFAOYSA-N Pyrazine Chemical compound C1=CN=CC=N1 KYQCOXFCLRTKLS-UHFFFAOYSA-N 0.000 description 2
- SMWDFEZZVXVKRB-UHFFFAOYSA-N Quinoline Chemical compound N1=CC=CC2=CC=CC=C21 SMWDFEZZVXVKRB-UHFFFAOYSA-N 0.000 description 2
- 229920002125 Sokalan® Polymers 0.000 description 2
- PPBRXRYQALVLMV-UHFFFAOYSA-N Styrene Chemical compound C=CC1=CC=CC=C1 PPBRXRYQALVLMV-UHFFFAOYSA-N 0.000 description 2
- LSNNMFCWUKXFEE-UHFFFAOYSA-N Sulfurous acid Chemical compound OS(O)=O LSNNMFCWUKXFEE-UHFFFAOYSA-N 0.000 description 2
- WYURNTSHIVDZCO-UHFFFAOYSA-N Tetrahydrofuran Chemical compound C1CCOC1 WYURNTSHIVDZCO-UHFFFAOYSA-N 0.000 description 2
- FZWLAAWBMGSTSO-UHFFFAOYSA-N Thiazole Chemical compound C1=CSC=N1 FZWLAAWBMGSTSO-UHFFFAOYSA-N 0.000 description 2
- ZMZDMBWJUHKJPS-UHFFFAOYSA-M Thiocyanate anion Chemical compound [S-]C#N ZMZDMBWJUHKJPS-UHFFFAOYSA-M 0.000 description 2
- 241001061127 Thione Species 0.000 description 2
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- 235000010378 sodium ascorbate Nutrition 0.000 description 1
- PPASLZSBLFJQEF-RKJRWTFHSA-M sodium ascorbate Substances [Na+].OC[C@@H](O)[C@H]1OC(=O)C(O)=C1[O-] PPASLZSBLFJQEF-RKJRWTFHSA-M 0.000 description 1
- 229960005055 sodium ascorbate Drugs 0.000 description 1
- 229910001415 sodium ion Inorganic materials 0.000 description 1
- 159000000000 sodium salts Chemical class 0.000 description 1
- 239000004328 sodium tetraborate Substances 0.000 description 1
- 235000010339 sodium tetraborate Nutrition 0.000 description 1
- VGTPCRGMBIAPIM-UHFFFAOYSA-M sodium thiocyanate Chemical compound [Na+].[S-]C#N VGTPCRGMBIAPIM-UHFFFAOYSA-M 0.000 description 1
- AKHNMLFCWUSKQB-UHFFFAOYSA-L sodium thiosulfate Chemical compound [Na+].[Na+].[O-]S([O-])(=O)=S AKHNMLFCWUSKQB-UHFFFAOYSA-L 0.000 description 1
- 235000019345 sodium thiosulphate Nutrition 0.000 description 1
- PPASLZSBLFJQEF-RXSVEWSESA-M sodium-L-ascorbate Chemical compound [Na+].OC[C@H](O)[C@H]1OC(=O)C(O)=C1[O-] PPASLZSBLFJQEF-RXSVEWSESA-M 0.000 description 1
- 239000007962 solid dispersion Substances 0.000 description 1
- 235000019698 starch Nutrition 0.000 description 1
- 229940032147 starch Drugs 0.000 description 1
- 239000008107 starch Substances 0.000 description 1
- 238000005556 structure-activity relationship Methods 0.000 description 1
- 229920003048 styrene butadiene rubber Polymers 0.000 description 1
- 125000005017 substituted alkenyl group Chemical group 0.000 description 1
- 125000003107 substituted aryl group Chemical group 0.000 description 1
- 238000006467 substitution reaction Methods 0.000 description 1
- 239000005720 sucrose Substances 0.000 description 1
- 229960004793 sucrose Drugs 0.000 description 1
- QFARLUFBHFUZOK-UHFFFAOYSA-N sulfamoyl hydrogen sulfate Chemical compound NS(=O)(=O)OS(O)(=O)=O QFARLUFBHFUZOK-UHFFFAOYSA-N 0.000 description 1
- LSNNMFCWUKXFEE-UHFFFAOYSA-L sulfite Chemical class [O-]S([O-])=O LSNNMFCWUKXFEE-UHFFFAOYSA-L 0.000 description 1
- 125000004964 sulfoalkyl group Chemical group 0.000 description 1
- 150000003467 sulfuric acid derivatives Chemical class 0.000 description 1
- 229920001059 synthetic polymer Polymers 0.000 description 1
- 229910052715 tantalum Inorganic materials 0.000 description 1
- GUVRBAGPIYLISA-UHFFFAOYSA-N tantalum atom Chemical compound [Ta] GUVRBAGPIYLISA-UHFFFAOYSA-N 0.000 description 1
- 239000011975 tartaric acid Substances 0.000 description 1
- 235000002906 tartaric acid Nutrition 0.000 description 1
- 229910052714 tellurium Inorganic materials 0.000 description 1
- PORWMNRCUJJQNO-UHFFFAOYSA-N tellurium atom Chemical compound [Te] PORWMNRCUJJQNO-UHFFFAOYSA-N 0.000 description 1
- BFKJFAAPBSQJPD-UHFFFAOYSA-N tetrafluoroethene Chemical group FC(F)=C(F)F BFKJFAAPBSQJPD-UHFFFAOYSA-N 0.000 description 1
- 150000003536 tetrazoles Chemical class 0.000 description 1
- 229920002803 thermoplastic polyurethane Polymers 0.000 description 1
- 150000003557 thiazoles Chemical class 0.000 description 1
- 239000002562 thickening agent Substances 0.000 description 1
- 150000003567 thiocyanates Chemical class 0.000 description 1
- 229930192474 thiophene Natural products 0.000 description 1
- 150000003585 thioureas Chemical class 0.000 description 1
- XOLBLPGZBRYERU-UHFFFAOYSA-N tin dioxide Chemical compound O=[Sn]=O XOLBLPGZBRYERU-UHFFFAOYSA-N 0.000 description 1
- 229910001887 tin oxide Inorganic materials 0.000 description 1
- 239000010936 titanium Substances 0.000 description 1
- 229910052719 titanium Inorganic materials 0.000 description 1
- 125000005147 toluenesulfonyl group Chemical group C=1(C(=CC=CC1)S(=O)(=O)*)C 0.000 description 1
- VZCYOOQTPOCHFL-UHFFFAOYSA-N trans-butenedioic acid Natural products OC(=O)C=CC(O)=O VZCYOOQTPOCHFL-UHFFFAOYSA-N 0.000 description 1
- ILJSQTXMGCGYMG-UHFFFAOYSA-N triacetic acid Chemical compound CC(=O)CC(=O)CC(O)=O ILJSQTXMGCGYMG-UHFFFAOYSA-N 0.000 description 1
- NKLYMYLJOXIVFB-UHFFFAOYSA-N triethoxymethylsilane Chemical compound CCOC([SiH3])(OCC)OCC NKLYMYLJOXIVFB-UHFFFAOYSA-N 0.000 description 1
- ZMANZCXQSJIPKH-UHFFFAOYSA-O triethylammonium ion Chemical compound CC[NH+](CC)CC ZMANZCXQSJIPKH-UHFFFAOYSA-O 0.000 description 1
- 125000004044 trifluoroacetyl group Chemical group FC(C(=O)*)(F)F 0.000 description 1
- 125000001889 triflyl group Chemical group FC(F)(F)S(*)(=O)=O 0.000 description 1
- 125000004417 unsaturated alkyl group Chemical group 0.000 description 1
- 229920001567 vinyl ester resin Polymers 0.000 description 1
- 229920002554 vinyl polymer Polymers 0.000 description 1
- 229920003176 water-insoluble polymer Polymers 0.000 description 1
- 239000000230 xanthan gum Substances 0.000 description 1
- 235000010493 xanthan gum Nutrition 0.000 description 1
- 229920001285 xanthan gum Polymers 0.000 description 1
- 229940082509 xanthan gum Drugs 0.000 description 1
- VWQVUPCCIRVNHF-UHFFFAOYSA-N yttrium atom Chemical compound [Y] VWQVUPCCIRVNHF-UHFFFAOYSA-N 0.000 description 1
- 229910052725 zinc Inorganic materials 0.000 description 1
- 239000011701 zinc Substances 0.000 description 1
- UGZADUVQMDAIAO-UHFFFAOYSA-L zinc hydroxide Chemical compound [OH-].[OH-].[Zn+2] UGZADUVQMDAIAO-UHFFFAOYSA-L 0.000 description 1
- 229940007718 zinc hydroxide Drugs 0.000 description 1
- 229910021511 zinc hydroxide Inorganic materials 0.000 description 1
- UHVMMEOXYDMDKI-JKYCWFKZSA-L zinc;1-(5-cyanopyridin-2-yl)-3-[(1s,2s)-2-(6-fluoro-2-hydroxy-3-propanoylphenyl)cyclopropyl]urea;diacetate Chemical compound [Zn+2].CC([O-])=O.CC([O-])=O.CCC(=O)C1=CC=C(F)C([C@H]2[C@H](C2)NC(=O)NC=2N=CC(=CC=2)C#N)=C1O UHVMMEOXYDMDKI-JKYCWFKZSA-L 0.000 description 1
Abstract
Description
【0001】[0001]
【発明の属する技術分野】本発明はハロゲン化銀写真感
光材料に関し、詳しくは製版印刷用ハロゲン化銀写真感
光材料に関する。The present invention relates to a silver halide photographic light-sensitive material, and more particularly to a silver halide photographic light-sensitive material for plate making printing.
【0002】[0002]
【従来の技術】製版印刷用ハロゲン化銀写真感光材料に
於いては、網点及び線画画像を記録するために、硬調な
銀画像が要求されている。2. Description of the Related Art In a silver halide photographic light-sensitive material for plate-making printing, a high-contrast silver image is required to record a dot image and a line image.
【0003】そのためハロゲン化銀乳剤への硬調化剤と
して、各種の化合物が開示されており、例えば、B.
I.O.S Final Report No.252
(PB20,090),FIAT Final Rep
rt No.360(PB26,996)で知られるR
hを始めとして特開平2−20852号に記載のRu、
Os等の6〜10族の遷移金属錯塩などが古くから知ら
れている。Various compounds have been disclosed as a high contrast agent for silver halide emulsions.
I. O. S Final Report No. 252
(PB20,090), FIAT Final Rep
rt No. R known as 360 (PB26,996)
h, Ru described in JP-A-2-20852,
Transition metal complex salts of groups 6 to 10 such as Os have been known for a long time.
【0004】近年、製版印刷用感光材料の硬調化剤とし
ては、特開昭53−16623号、米国特許4,26
9,929号で知られるヒドラジン誘導体や、特開平1
−217337号、同5−53231号、同6−161
009号などに記載の5〜6員の含窒素ヘテロ環からな
る造核剤型硬調化剤、或いは特開昭57−132137
号、同58−173737号、同61−270745号
などに記載されているテトラゾリウム塩を用いる方法な
どが知られている。In recent years, as a high contrast agent for a photosensitive material for plate making printing, JP-A-53-16623, US Pat.
No. 9,929, the hydrazine derivative disclosed in
-217337, 5-53231 and 6-161
No. 009, etc., a nucleating agent type toning agent comprising a 5- to 6-membered nitrogen-containing heterocycle, or JP-A-57-132137.
And methods using a tetrazolium salt described in JP-A Nos. 58-173737 and 61-270745.
【0005】一方、ハロゲン化銀乳剤の高感度化のため
に、各種の分光増感色素が広く知られており、特に緑色
光に高感度を与える増感色素として例えばEP−050
6584号、特開平5−88293号、同5−9397
5号に記載の特定のベンゾイミダゾロカルボシアニンを
用いる技術が開示されている。On the other hand, various spectral sensitizing dyes are widely known for increasing the sensitivity of silver halide emulsions. In particular, as a sensitizing dye which imparts high sensitivity to green light, for example, EP-050
6584, JP-A-5-88293, 5-9397
No. 5 discloses a technique using a specific benzimidazolocarbocyanine.
【0006】しかしながら、該増感色素を前記の硬調化
剤と組み合わせて製版印刷用ハロゲン化銀写真感光材料
を調製した場合、感光材料の経時による感度変動と黒ポ
ツと言われる斑点状カブリが多発する問題点を有してい
た。更に処理後のフィルムに色素による残色汚染が多
く、かつ暗室内に於けるセーフライト耐性が優れないな
どの欠点があった。However, when a silver halide photographic light-sensitive material for plate-making printing is prepared by combining the sensitizing dye with the above-mentioned high contrast agent, sensitivity fluctuations over time of the light-sensitive material and spot fog called black spots occur frequently. Had problems. Further, the processed film has many drawbacks such as a large amount of residual color contamination due to dyes and poor safelight resistance in a dark room.
【0007】フィルムの残色汚染は、単に商品価値を低
下するだけでなく、実技上からもクリアーな銀画像を必
要とし、更なる改良が望まれていた。[0007] The residual color contamination of the film not only lowers the commercial value, but also requires a clear silver image from a practical point of view, and further improvement has been desired.
【0008】[0008]
【発明が解決しようとする課題】従って本発明の目的
は、製版印刷用ハロゲン化銀写真感光材料として、感光
材料の経時による感度変動と黒ポツの発生及び残色汚染
がなく、かつセーフライト耐性が優れたハロゲン化銀写
真感光材料の提供にある。SUMMARY OF THE INVENTION Accordingly, an object of the present invention is to provide a silver halide photographic light-sensitive material for plate-making printing which is free from fluctuations in sensitivity over time of the light-sensitive material, generation of black spots and residual color contamination, and safelight resistance. In providing an excellent silver halide photographic light-sensitive material.
【0009】[0009]
【発明が解決しようとする課題】本発明の目的は下記に
より解決された。The object of the present invention has been attained by the following.
【0010】 支持体上に、少なくとも1層のハロゲ
ン化銀乳剤層と親水性コロイド層を有するハロゲン化銀
写真感光材料において、該ハロゲン化銀乳剤層中に下記
一般式(1)又は下記一般式(2)で表される分光増感
色素の少なくとも1種を含有し、且つ、該ハロゲン化銀
乳剤層中もしくは該親水性コロイド層中に、ヒドラジン
誘導体及び/又は5〜6員の含窒素複素環化合物から選
ばれる少なくとも1種を含有することを特徴とするハロ
ゲン化銀写真感光材料。In a silver halide photographic material having at least one silver halide emulsion layer and a hydrophilic colloid layer on a support, the silver halide emulsion layer contains the following general formula (1) or the following general formula: A hydrazine derivative and / or a 5- to 6-membered nitrogen-containing complex, which contains at least one spectral sensitizing dye represented by (2) and is contained in the silver halide emulsion layer or the hydrophilic colloid layer. A silver halide photographic light-sensitive material comprising at least one selected from cyclic compounds.
【0011】[0011]
【化3】 Embedded image
【0012】式中、Yは酸素原子又は>N−R基を表
す。R、R1及びR2は各々低級アルキル基を表し、
R1、R2の少なくとも一方はスルホ基又はカルボキシル
基で置換された低級アルキル基を表す。Z1、Z2、
Z3、Z4及びZ5は各々、水素原子あるいは置換しうる
原子または基を表し、Z3とZ4及びZ4とZ5の間で各々
結合して縮合環を形成してもよい。但しZ1、Z2の少な
くとも一方は電子吸引性基を表す。X1は分子内の電荷
を中和するに必要なイオンを表し、色素が分子内塩を形
成するときはn1は0である。In the formula, Y represents an oxygen atom or> NR group. R, R 1 and R 2 each represent a lower alkyl group;
At least one of R 1 and R 2 represents a lower alkyl group substituted with a sulfo group or a carboxyl group. Z 1 , Z 2 ,
Z 3 , Z 4 and Z 5 each represent a hydrogen atom or a substitutable atom or group, and may be respectively bonded between Z 3 and Z 4 and between Z 4 and Z 5 to form a condensed ring. However, at least one of Z 1 and Z 2 represents an electron-withdrawing group. X 1 represents an ion necessary for neutralizing an intramolecular charge, and n1 is 0 when the dye forms an intramolecular salt.
【0013】[0013]
【化4】 Embedded image
【0014】式中、R11、R13は各々,低級アルキル基
又はアルケニル基を表す。但しR11、R13の少なくとも
一方はビニル基(−CH=CH2)を表す。R12、R14
は各々低級アルキル基を表し、R12、R14の少なくとも
一方は親水性基で置換された低級アルキル基である。Z
11、Z12、Z13及びZ14は各々同じか、又は異なっても
よく、水素原子、ハロゲン原子、シアノ基、アルキル
基、ハロゲン置換アルコキシ基、アルコキシ基、アリー
ルオキシ基、アシル基、アシルオキシ基、アルキルチオ
基、ハロゲン置換アルキルチオ基、アルコキシカルボニ
ル基、カルバモイル基、スルファモイル基、ヒドロキシ
基、ハロアルキル基、カルボキシル基、スルホニル基、
アシルアミノ基、複素環基又はアリール基を表す。X11
は分子内の電荷を中和するに必要なイオンを表し、色素
が分子内塩を形成するときはn11は0である。In the formula, R 11 and R 13 each represent a lower alkyl group or an alkenyl group. However, at least one of R 11 and R 13 represents a vinyl group (—CH = CH 2 ). R 12 , R 14
Represents a lower alkyl group, and at least one of R 12 and R 14 is a lower alkyl group substituted with a hydrophilic group. Z
11 , Z 12 , Z 13 and Z 14 may be the same or different, and each represents a hydrogen atom, a halogen atom, a cyano group, an alkyl group, a halogen-substituted alkoxy group, an alkoxy group, an aryloxy group, an acyl group, an acyloxy group. An alkylthio group, a halogen-substituted alkylthio group, an alkoxycarbonyl group, a carbamoyl group, a sulfamoyl group, a hydroxy group, a haloalkyl group, a carboxyl group, a sulfonyl group,
Represents an acylamino group, a heterocyclic group or an aryl group. X 11
Represents an ion necessary for neutralizing an intramolecular charge, and n11 is 0 when the dye forms an intramolecular salt.
【0015】 支持体上に、少なくとも1層のハロゲ
ン化銀乳剤層と親水性コロイド層を有するハロゲン化銀
写真感光材料において、該ハロゲン化銀乳剤層中に、上
記一般式(1)又は上記一般式(2)で表される分光増
感色素の少なくとも1種を含有し、且つ、該ハロゲン化
銀乳剤層中もしくは該親水性コロイド層中に、テトラゾ
リウム化合物から選ばれる少なくとも1種を含有するこ
とを特徴とするハロゲン化銀写真感光材料。In a silver halide photographic light-sensitive material having at least one silver halide emulsion layer and a hydrophilic colloid layer on a support, the silver halide emulsion layer may contain the above-mentioned general formula (1) or the above-mentioned general formula (1). It contains at least one kind of spectral sensitizing dye represented by the formula (2) and contains at least one kind selected from tetrazolium compounds in the silver halide emulsion layer or the hydrophilic colloid layer. A silver halide photographic light-sensitive material comprising:
【0016】 上記ハロゲン化銀乳剤層中に、元素周
期表6〜10族の元素から選ばれる少なくとも1種の遷
移金属を含有することを特徴とする項又は項記載の
ハロゲン化銀写真感光材料。Item or The silver halide photographic light-sensitive material according to Item, wherein the silver halide emulsion layer contains at least one transition metal selected from the elements of Groups 6 to 10 of the periodic table.
【0017】以下、本発明を詳述する。Hereinafter, the present invention will be described in detail.
【0018】本発明のハロゲン化銀写真感光材料は、支
持体の一方の面に少なくとも1層の感光性ハロゲン化銀
乳剤層と、少なくとも1層の親水性コロイド層を有し、
もう一方の面に染料を含むバッキング層を有する構成か
ら成る。The silver halide photographic material of the present invention has at least one photosensitive silver halide emulsion layer and at least one hydrophilic colloid layer on one surface of a support,
On the other side, a backing layer containing a dye is provided.
【0019】該感光性ハロゲン化銀乳剤層の少なくとも
1層中には前記一般式(1)又は(2)で表わされる分
光増感色素が含有される。At least one of the light-sensitive silver halide emulsion layers contains the spectral sensitizing dye represented by formula (1) or (2).
【0020】前記一般式(1)及び一般式(2)におい
て、R、R1、R2、R11〜R14で表される低級アルキル
基としては、例えばメチル、エチル、プロピル、イソプ
ロピル、ブチル、シクロペンチル、シクロヘキシル基等
が挙げられる。In the above formulas (1) and (2), the lower alkyl group represented by R, R 1 , R 2 , R 11 -R 14 includes, for example, methyl, ethyl, propyl, isopropyl, butyl , Cyclopentyl, cyclohexyl group and the like.
【0021】又、置換された低級アルキル基としては、
例えばヒドロキシエチル、エトキシカルボニルエチル、
エトキシカルボニルメチル、ベンジル、フェネチル、メ
トキシエチル、シアノメチル、2−シアノエチル、2,
2,2−トリフルオロエチル、2,2,3,3−テトラ
フルオロプロピル、カルボキシメチル、カルボキシエチ
ル、スルホブチル、スルホエチル、スルホプロピル、ス
ルホペンチル、6−スルホ−3−オキサヘキシル、4−
スルホ−3−オキサペンチル、10−スルホ−3,6−
ジオキサデシル、6−スルホ−3−チアヘキシル、o−
スルホベンジル、p−スルホベンジル、p−カルボキシ
ベンジル、メタンスルホニルアミノエチル、メタンスル
ホニルアミノカルボニルメチル、3−オキソブチル、2
−(N−メチルスルファモイル)エチル、2−(トリフ
ルオロアセチルアミノ)エチル基等が挙げられる。The substituted lower alkyl group includes
For example, hydroxyethyl, ethoxycarbonylethyl,
Ethoxycarbonylmethyl, benzyl, phenethyl, methoxyethyl, cyanomethyl, 2-cyanoethyl, 2,
2,2-trifluoroethyl, 2,2,3,3-tetrafluoropropyl, carboxymethyl, carboxyethyl, sulfobutyl, sulfoethyl, sulfopropyl, sulfopentyl, 6-sulfo-3-oxahexyl, 4-
Sulfo-3-oxapentyl, 10-sulfo-3,6-
Dioxadecyl, 6-sulfo-3-thiahexyl, o-
Sulfobenzyl, p-sulfobenzyl, p-carboxybenzyl, methanesulfonylaminoethyl, methanesulfonylaminocarbonylmethyl, 3-oxobutyl,
-(N-methylsulfamoyl) ethyl, 2- (trifluoroacetylamino) ethyl group and the like.
【0022】R11、R13で表されるアルケニル基として
は、例えばビニル基、アリル基、1−プロペニル基等が
挙げられる。Examples of the alkenyl group represented by R 11 and R 13 include a vinyl group, an allyl group and a 1-propenyl group.
【0023】Z1、Z2で表される置換しうる基として
は、置換しうる基のハメットσp値を加算したとき、総
和が2.4を越えない範囲の任意の基が好ましく、ハロ
ゲン原子(例えば、フッソ原子、塩素原子、臭素原子、
沃素原子等)、アリール基(例えばフェニル、4−ブロ
モフェニル基等)、アルキル基(例えば、メチル、エチ
ル、t−ブチル基等の基)、アルコキシ基(例えば、メ
トキシ、エトキシ基等)、アルキルチオ基(例えば、メ
チルチオ、プロピルチオ基等)、トリフルオロメチル
基、シアノ基、カルボキシ基、アルコキシカルボニル基
(例えば、メトキシカルボニル、エトキシカルボニル基
等)、アシル基(例えば、アセチル、プロピオニル基
等)、スルホニル基(例えば、メタンスルホニル、トリ
フルオロメタンスルホニル基等)、カルバモイル基(例
えば、カルバモイル、N,N−ジメチルカルバモイル、
N−モルホリノカルボニル基等)、スルファモイル基
(例えば、スルファモイル、N,N−ジメチルスルファ
モイル基等)、アセチルアミノ基、アセチルオキシ基等
の基が挙げられる。更に好ましくはハロゲン原子、トリ
フルオロメチル基等である。As the substitutable group represented by Z 1 and Z 2 , any group having a total sum not exceeding 2.4 when adding the Hammett σp value of the substitutable group is preferable, and a halogen atom (For example, a fluorine atom, a chlorine atom, a bromine atom,
Iodine atom, etc.), aryl group (eg, phenyl, 4-bromophenyl group, etc.), alkyl group (eg, methyl, ethyl, t-butyl group, etc.), alkoxy group (eg, methoxy, ethoxy group, etc.), alkylthio Group (eg, methylthio, propylthio group, etc.), trifluoromethyl group, cyano group, carboxy group, alkoxycarbonyl group (eg, methoxycarbonyl, ethoxycarbonyl group, etc.), acyl group (eg, acetyl, propionyl group, etc.), sulfonyl Groups (eg, methanesulfonyl, trifluoromethanesulfonyl, etc.), carbamoyl groups (eg, carbamoyl, N, N-dimethylcarbamoyl,
Groups such as an N-morpholinocarbonyl group), a sulfamoyl group (eg, a sulfamoyl, N, N-dimethylsulfamoyl group), an acetylamino group, and an acetyloxy group. More preferred are a halogen atom and a trifluoromethyl group.
【0024】Z3、Z4、Z5は任意の基でよく、例えば
ハロゲン原子(例えば、フッソ、塩素、臭素、沃素原子
等)、アリール基(例えば、フェニル、4−ブロモフェ
ニル基等)、アルキル基(例えば、メチル、エチル、t
−ブチル基等)、アルコキシ基(例えば、メトキシ、プ
ロピルオキシ基等)、アルキルチオ基(例えば、メチル
チオ、エチルチオ基等)、トリフルオロメチル基、シア
ノ基、カルボキシ基、アルコキシカルボニル基(例え
ば、メトキシカルボニル、エトキシカルボニル基等)、
アシル基(例えば、アセチル、ブチリル基等)、スルホ
ニル基(例えば、メタンスルホニル、プロピルスルホニ
ル基等)、カルバモイル基(例えば、カルバモイル、
N,N−ジメチルカルバモイル、N−モルホリノカルボ
ニル基等)、スルファモイル基(例えば、スルファモイ
ル、N,N−ジメチルスルファモイル基等)、ヒドロキ
シ基等が挙げられる。Z 3 , Z 4 and Z 5 may be any groups, for example, a halogen atom (for example, fluorine, chlorine, bromine, iodine atom, etc.), an aryl group (for example, phenyl, 4-bromophenyl group, etc.), Alkyl groups (eg, methyl, ethyl, t
-Butyl group, etc.), alkoxy group (for example, methoxy, propyloxy group, etc.), alkylthio group (for example, methylthio, ethylthio group, etc.), trifluoromethyl group, cyano group, carboxy group, alkoxycarbonyl group (for example, methoxycarbonyl group) , Ethoxycarbonyl group, etc.),
Acyl group (eg, acetyl, butyryl group, etc.), sulfonyl group (eg, methanesulfonyl, propylsulfonyl group, etc.), carbamoyl group (eg, carbamoyl,
N, N-dimethylcarbamoyl, N-morpholinocarbonyl group, etc.), sulfamoyl group (eg, sulfamoyl, N, N-dimethylsulfamoyl group, etc.), and hydroxy group.
【0025】Z3とZ4及びZ4とZ5は、各々、結合して
形成することができる縮合環としては例えば6員の飽和
または不飽和の炭素環基、並びに、5〜6員の複素環基
が挙げられ、アゾール環とともに例えばナフト〔2,1
−d〕アゾール、ナフト〔1,2−d〕アゾール、ナフ
ト〔2,3−d〕アゾール、フラノ〔3,2−e〕ベン
ゾアゾール、チエノ〔3,2−e〕ベンゾアゾール、チ
エノ〔2,3−f〕ベンゾアゾールなどを形成する。Z 3 and Z 4 and Z 4 and Z 5 each represent a condensed ring which can be formed by bonding to each other, for example, a 6-membered saturated or unsaturated carbocyclic group; And a heterocyclic group, for example, naphtho [2,1
-D] azole, naphtho [1,2-d] azole, naphtho [2,3-d] azole, furano [3,2-e] benzoazole, thieno [3,2-e] benzoazole, thieno [2 , 3-f] benzoazole and the like.
【0026】Z11、Z12、Z13及びZ14は各々、同じか
又は異なってもよく、水素原子、ハロゲン原子(例え
ば、フッソ、塩素、臭素、沃素原子等)、シアノ基、ア
ルキル基(例えば、メチル、エチル、t−ブチル基
等)、アルコキシ基(例えば、メトキシ、プロピルオキ
シ基等)、ハロゲン置換アルコキシ基(例えば、トリフ
ルオロメトキシ、テトラフルオロエチルオキシ基等)、
アリールオキシ基(例えば、フェニルオキシ、4−ブロ
モフェニルオキシ基等)、アシル基(例えば、アセチ
ル、プロピオニル基等)、アシルオキシ基(例えば、ア
セチルオキシ基、プロピオニルオキシ基等)、アルキル
チオ基(例えば、メチルチオ、エチルチオ基等)、ハロ
ゲン置換アルキルチオ基(例えば、トリフルオロメチル
チオ、テトラフルオロエチルチオ基等)、アルコキシカ
ルボニル基(例えば、メトキシカルボニル、エトキシカ
ルボニル基等)、カルバモイル基(例えば、カルバモイ
ル、N,N−ジメチルカルバモイル、N−モルホリノカ
ルボニル基等)、スルファモイル基(例えば、スルファ
モイル、N,N−ジメチルスルファモイル基等)、ヒド
ロキシ基、ハロアルキル基(例えば、トリフルオロメチ
ル、ペンタフルオロエチル等)、カルボキシ基、スルホ
ニル基(例えば、メタンスルホニル、エタンスルホニル
基等)、アシルアミノ基(例えば、アセチルアミノ、ブ
チリルアミノ基等)、複素環基(例えば、フラニル、ピ
ロリル基等)又はアリール基(例えば、フェニル、4−
クロロフェニル基等)を表す。Z 11 , Z 12 , Z 13 and Z 14 may be the same or different, and each represents a hydrogen atom, a halogen atom (eg, fluorine, chlorine, bromine, iodine atom, etc.), a cyano group, an alkyl group ( For example, methyl, ethyl, t-butyl group, etc.), alkoxy group (eg, methoxy, propyloxy group, etc.), halogen-substituted alkoxy group (eg, trifluoromethoxy, tetrafluoroethyloxy group, etc.),
Aryloxy group (eg, phenyloxy, 4-bromophenyloxy group, etc.), acyl group (eg, acetyl, propionyl group, etc.), acyloxy group (eg, acetyloxy group, propionyloxy group, etc.), alkylthio group (eg, Methylthio, ethylthio, etc.), halogen-substituted alkylthio (eg, trifluoromethylthio, tetrafluoroethylthio, etc.), alkoxycarbonyl (eg, methoxycarbonyl, ethoxycarbonyl, etc.), carbamoyl (eg, carbamoyl, N, N-dimethylcarbamoyl, N-morpholinocarbonyl group, etc.), sulfamoyl group (eg, sulfamoyl, N, N-dimethylsulfamoyl group, etc.), hydroxy group, haloalkyl group (eg, trifluoromethyl, pentafluoro A carboxy group, a sulfonyl group (eg, methanesulfonyl, ethanesulfonyl group, etc.), an acylamino group (eg, acetylamino, butyrylamino group, etc.), a heterocyclic group (eg, furanyl, pyrrolyl group, etc.) or an aryl group ( For example, phenyl, 4-
Chlorophenyl group etc.).
【0027】X1及びX11で示されるイオンとしては、
例えば塩素イオン、臭素イオン、沃素イオン、チオシア
ン酸イオン、硫酸イオン、過塩素酸イオン、p−トルエ
ンスルホン酸イオン、エチル硫酸イオン、リチウムイオ
ン、ナトリウムイオン、カリウムイオン、マグネシウム
イオン、トリエチルアンモニウムイオン等を挙げること
ができる。The ions represented by X 1 and X 11 include:
For example, chlorine ion, bromine ion, iodine ion, thiocyanate ion, sulfate ion, perchlorate ion, p-toluenesulfonic acid ion, ethyl sulfate ion, lithium ion, sodium ion, potassium ion, magnesium ion, triethylammonium ion, etc. Can be mentioned.
【0028】前記一般式(2)の基で使用されるハメッ
トσp値はHammett等によって安息香酸エチルの
加水分解に及ぼす置換基の電子的効果から求められた置
換基定数であり、ジャーナル・オブ・オーガニック・ケ
ミストリー23巻、420−427(1958)、実験
化学講座14巻(丸善出版社)、フィジカル・オーガニ
ック・ケミストリー(Mc Graw Hill Bo
ok社:1940年)、ドラックデザインVII巻(Ac
ademic Press New York:197
6年)、薬物の構造活性相関(南江堂:1979年)等
に詳しく記載されている。The Hammett σp value used in the group of the general formula (2) is a substituent constant determined by Hammett et al. From the electronic effect of the substituent on the hydrolysis of ethyl benzoate, and is the journal of Organic Chemistry 23, 420-427 (1958), Experimental Chemistry Course 14 (Maruzen Publishing), Physical Organic Chemistry (McGraw Hill Bo)
ok: 1940), Drag Design VII (Ac)
ademic Press New York: 197
6) and the structure-activity relationship of drugs (Nankodo: 1979).
【0029】以下、本発明の上記一般式(1)、(2)
で示される分光増感色素の具体例を示すが、本発明はこ
れらに限定されるものではない。Hereinafter, the general formulas (1) and (2) of the present invention will be described.
Specific examples of the spectral sensitizing dye represented by are shown below, but the present invention is not limited thereto.
【0030】[0030]
【化5】 Embedded image
【0031】[0031]
【化6】 Embedded image
【0032】[0032]
【化7】 Embedded image
【0033】[0033]
【化8】 Embedded image
【0034】[0034]
【化9】 Embedded image
【0035】[0035]
【化10】 Embedded image
【0036】[0036]
【化11】 Embedded image
【0037】[0037]
【化12】 Embedded image
【0038】[0038]
【化13】 Embedded image
【0039】[0039]
【化14】 Embedded image
【0040】[0040]
【化15】 Embedded image
【0041】[0041]
【化16】 Embedded image
【0042】[0042]
【化17】 Embedded image
【0043】[0043]
【化18】 Embedded image
【0044】上記の分光増感色素は例えば英国特許95
5,961号、米国特許2,739,149号、特公昭
43−10251号、同43−10252号、特開平5
−88293号などに記載の方法を参考にして容易に合
成することが出来る。The above-mentioned spectral sensitizing dyes are described, for example, in British Patent No. 95
No. 5,961, U.S. Pat. No. 2,739,149, JP-B-43-10251 and JP-B-43-10252,
The compound can be easily synthesized with reference to the method described in JP-A-88293.
【0045】本発明において、上記増感色素の添加量
は、色素の種類及びハロゲン化銀の構造、組成、熟成条
件、目的、用途などによって一様ではないが、通常はハ
ロゲン化銀1モル当たり10〜1000mgでよく、よ
り好ましくは50〜500mgの範囲でよい。In the present invention, the amount of the sensitizing dye to be added is not uniform depending on the kind of the dye and the structure, composition, ripening condition, purpose and application of the silver halide. The dose may be from 10 to 1000 mg, more preferably from 50 to 500 mg.
【0046】上記増感色素は任意の方法で溶解し、任意
の工程で添加してよい。増感色素の溶剤としては、従来
用いられている水混和性の有機溶剤が使用でき、例えば
アルコール類、ケトン類、ニトリル類、アルコキシアル
コール類等が用いられてきた。具体例として、メタノー
ル、エタノール、n−プロピルアルコール、イソプロピ
ルアルコール、エチレングリコール、プロピレングリコ
ール、1,3−プロパンジオール、アセトン、アセトニ
トリル、2−メトキシエタノール、2−エトキシエタノ
ールなどがある。また増感色素を酸性溶液又は固体微粒
子状の分散物として添加してもよい。The above sensitizing dye may be dissolved by any method and added at any step. As a solvent for the sensitizing dye, a conventionally used water-miscible organic solvent can be used. For example, alcohols, ketones, nitriles, alkoxy alcohols and the like have been used. Specific examples include methanol, ethanol, n-propyl alcohol, isopropyl alcohol, ethylene glycol, propylene glycol, 1,3-propanediol, acetone, acetonitrile, 2-methoxyethanol, and 2-ethoxyethanol. The sensitizing dye may be added as an acidic solution or a solid fine particle dispersion.
【0047】本発明の分光増感色素の添加時期は化学熟
成工程時、特に好ましくは化学熟成開始時に行うことも
でき、また、ハロゲン化銀乳剤の核形成工程時から脱塩
工程終了までに添加することによって、分光増感効率の
優れた高感度ハロゲン化銀乳剤が得られるが、更に脱塩
工程終了後から化学熟成工程を経て塗布工程直前までの
いずれかの時期に前記の工程(核形成工程時から脱塩工
程終了まで)に添加した色素と同一もしくは別種の本発
明に係る分光増感色素を追加して添加しても良い。なお
本発明の上記の分光増感色素は、後述する硬調化剤或い
は硬調効果を高めるための造核促進剤などの添加前もし
くは添加後に用いてもよく、好ましくは硬調化剤或いは
硬調効果を高めるための造核促進剤などの添加前のハロ
ゲン化銀乳剤に添加することである。The spectral sensitizing dye of the present invention can be added during the chemical ripening step, particularly preferably at the start of the chemical ripening, and can be added from the nucleation step of the silver halide emulsion to the end of the desalting step. Thus, a high-sensitivity silver halide emulsion having excellent spectral sensitization efficiency can be obtained. However, the above-mentioned step (nucleation) may be performed at any time after the completion of the desalting step, through the chemical ripening step, and immediately before the coating step. The same or a different kind of spectral sensitizing dye according to the present invention may be additionally added to the dye added from the time of the process to the end of the desalting process). The above-mentioned spectral sensitizing dye of the present invention may be used before or after the addition of a later-described high contrast agent or a nucleation accelerator for enhancing the high contrast effect, and preferably the high contrast agent or the high contrast effect is enhanced. To the silver halide emulsion before the addition of a nucleation accelerator or the like.
【0048】本発明のハロゲン化銀写真感光材料のハロ
ゲン化銀乳剤もしくは親水性コロイド層中にはヒドラジ
ン誘導体及び/又は5〜6員の含窒素複素環化合物から
選ばれる少なくとも1種が含有される。The silver halide emulsion or hydrophilic colloid layer of the silver halide photographic light-sensitive material of the present invention contains at least one selected from hydrazine derivatives and / or 5- to 6-membered nitrogen-containing heterocyclic compounds. .
【0049】本発明において、好ましく用いられヒドラ
ジン誘導体としては下記一般式〔H〕で表される化合物
である。In the present invention, the hydrazine derivative preferably used is a compound represented by the following general formula [H].
【0050】[0050]
【化19】 Embedded image
【0051】一般式〔H〕において、A0は脂肪族基、
芳香族基又は複素環基、A0で表される脂肪族基は好ま
しくは炭素数1〜30のものであり、特に炭素数1〜2
0の直鎖、分岐又は環状のアルキル基が好ましく、具体
例としては例えばメチル基、エチル基、t−ブチル基、
オクチル基、シクロヘキシル基、ベンジル基等が挙げら
れ、これらはさらに適当な置換基(例えばアリール、ア
ルコキシ、アリールオキシ、アルキルチオ、アリールチ
オ、スルホキシ、スルホンアミド、スルファモイル、ア
シルアミノ、ウレイド基等)で置換されていてもよい。In the general formula [H], A 0 is an aliphatic group,
The aromatic group or the heterocyclic group, the aliphatic group represented by A 0 preferably has 1 to 30 carbon atoms, particularly 1 to 2 carbon atoms.
A linear, branched or cyclic alkyl group of 0 is preferable, and specific examples include, for example, a methyl group, an ethyl group, a t-butyl group,
Octyl, cyclohexyl, benzyl and the like, which are further substituted with a suitable substituent (for example, aryl, alkoxy, aryloxy, alkylthio, arylthio, sulfoxy, sulfonamide, sulfamoyl, acylamino, ureido, etc.). You may.
【0052】一般式〔H〕において、A0で表される芳
香族基は、単環又は縮合環のアリール基が好ましく、例
えばベンゼン環又はナフタレン環などが挙げられ、A0
で表される複素環基としては、単環又は縮合環で窒素、
硫黄、酸素原子から選ばれる少なくとも一つのヘテロ原
子を含む複素環が好ましく、例えばピロリジン、イミダ
ゾール、テトラヒドロフラン、モルホリン、ピリジン、
ピリミジン、キノリン、チアゾール、ベンゾチアゾー
ル、チオフェン、フラン環などが挙げられ、A0として
特に好ましいものはアリール基及び複素環基であり、A
0の芳香族基及び複素環基は置換基を有していてもよ
く、特に好ましい基としては、pKa7以上11以下の
酸性基を有する置換基で具体的にはスルホンアミド基、
ヒドロキシル基、メルカプト基などが挙げられる。[0052] In formula (H), the aromatic group represented by A 0 is an aryl group preferably a monocyclic or condensed, such as a benzene ring or a naphthalene ring can be mentioned, A 0
As the heterocyclic group represented by, nitrogen in a single ring or a condensed ring,
Sulfur, a heterocyclic ring containing at least one hetero atom selected from oxygen atoms is preferable, for example, pyrrolidine, imidazole, tetrahydrofuran, morpholine, pyridine,
Pyrimidine, quinoline, thiazole, benzothiazole, thiophene, furan ring and the like. Particularly preferred as A 0 are an aryl group and a heterocyclic group,
The aromatic group and the heterocyclic group of 0 may have a substituent. As a particularly preferable group, a substituent having an acidic group having a pKa of 7 or more, specifically, a sulfonamide group,
Examples include a hydroxyl group and a mercapto group.
【0053】また、一般式〔H〕において、A0は耐拡
散基又はハロゲン化銀吸着基を少なくとも一つ含むこと
が好ましい、耐拡散基としてはカプラーなどの不動性写
真用添加剤にて常用されるバラスト基が好ましく、バラ
スト基としては炭素数8以上の写真的に不活性である例
えばアルキル基、アルケニル基、アルキニル基、アルコ
キシ基、フェニル基、フェノキシ基、アルキルフェノキ
シ基などが挙げられる。In the general formula [H], A 0 preferably contains at least one diffusion-resistant group or a silver halide-adsorbing group. The diffusion-resistant group is commonly used in immobile photographic additives such as couplers. The ballast group is preferably a ballast group. Examples of the ballast group include a photographically inert group having 8 or more carbon atoms, such as an alkyl group, an alkenyl group, an alkynyl group, an alkoxy group, a phenyl group, a phenoxy group, and an alkylphenoxy group.
【0054】一般式〔H〕において、ハロゲン化銀吸着
促進基としてはチオ尿素、チオウレタン基、メルカプト
基、チオエーテル基、チオン基、複素環基、チオアミド
複素環基、メルカプト複素環基、或いは特開昭64−9
0439号に記載の吸着基などが挙げられる。In the general formula [H], examples of the silver halide adsorption promoting group include thiourea, thiourethane group, mercapto group, thioether group, thione group, heterocyclic group, thioamide heterocyclic group, mercapto heterocyclic group, 64-9
No. 0439, for example.
【0055】一般式〔H〕において、B0はブロッキン
グ基を表し、好ましくは−G0−D0基であり、G0は−
CO−基、−COCO−基、−CS−基、−C(=NG
1D1)−基、−SO−基、−SO2−基または−P
(O)(G1D1)−基を表す、好ましいG0としては−
CO−基、−COCO−基で特に好ましくは−COCO
−基が挙げられ、G1は単なる結合手、−O−基、−S
−基または−N(D1)−基を表し、D1は脂肪族基、芳
香族基、複素環基または水素原子を表し、分子内に複数
のD1が存在する場合、それらは同じであっても異なっ
てもよい。In the general formula [H], B 0 represents a blocking group, preferably a -G 0 -D 0 group, and G 0 represents-
CO- group, -COCO- group, -CS- group, -C (= NG
1 D 1) - group, -SO- group, -SO 2 - group or -P
(O) A preferred (G 0 ) representing a (G 1 D 1 ) — group is
A CO- group and a -COCO- group are particularly preferably -COCO.
G 1 is a mere bond, an —O— group, —S
Or a —N (D 1 ) — group, wherein D 1 represents an aliphatic group, an aromatic group, a heterocyclic group or a hydrogen atom, and when a plurality of D 1 are present in a molecule, they are the same. May or may not be.
【0056】一般式〔H〕において、D0は水素原子、
脂肪族基、芳香族基、複素環基、アミノ基、アルコキシ
基、アリールオキシ基、アルキルチオ基、アリールチオ
基を表し、好ましいD0としては水素原子、アルコキシ
基、アミノ基などが挙げられ、A1、A2はともに水素原
子、又は一方が水素原子で他方はアシル基(アセチル、
トリフルオロアセチル、ベンゾイル等)、スルホニル基
(メタンスルホニル、トルエンスルホニル等)、又はオ
キザリル基(エトキザリル等)を表す。In the general formula [H], D 0 is a hydrogen atom,
Aliphatic group, an aromatic group, a heterocyclic group, an amino group, an alkoxy group, an aryloxy group, an alkylthio group, an arylthio group, preferably a hydrogen atom as a D 0, an alkoxy group, an amino group, and the like, A 1 , A 2 are both hydrogen atoms, or one is a hydrogen atom and the other is an acyl group (acetyl,
Trifluoroacetyl, benzoyl, etc.), a sulfonyl group (methanesulfonyl, toluenesulfonyl, etc.), or an oxalyl group (ethoxalyl, etc.).
【0057】上記一般式〔H〕で表される化合物のなか
で、更に好ましい化合物としては下記一般式〔H−2〕
で表される化合物が挙げられる。Among the compounds represented by the above general formula [H], more preferred compounds are those represented by the following general formula [H-2]
The compound represented by these is mentioned.
【0058】一般式〔H−2〕 R0−SO2NH−Ar−NHNH−G0−D0 式中、R0は置換又は無置換のアルキル基、アリール
基、複素環基を表し、Arは置換又は無置換の2価のア
リーレン基、複素環基を表し、G0、D0は一般式〔H〕
と同義である。以下、一般式〔H〕で表される化合物の
具体例を下記に示すが、本発明はこれらに限定されるも
のではない。Formula [H-2] R 0 -SO 2 NH-Ar-NHNH-G 0 -D 0 In the formula, R 0 represents a substituted or unsubstituted alkyl group, aryl group or heterocyclic group; Represents a substituted or unsubstituted divalent arylene group or heterocyclic group, and G 0 and D 0 are represented by the general formula [H]
Is synonymous with Hereinafter, specific examples of the compound represented by the general formula [H] are shown below, but the present invention is not limited thereto.
【0059】[0059]
【化20】 Embedded image
【0060】[0060]
【化21】 Embedded image
【0061】[0061]
【化22】 Embedded image
【0062】[0062]
【化23】 Embedded image
【0063】[0063]
【化24】 Embedded image
【0064】その他の好ましいヒドラジン誘導体の具体
例としては、米国特許5,229,248号の第4〜第
60カラムに記載されている(1)〜(252)であ
る。Specific examples of other preferred hydrazine derivatives are (1) to (252) described in columns 4 to 60 of US Pat. No. 5,229,248.
【0065】本発明に係るヒドラジン誘導体は、公知の
方法により合成することができ、例えば米国特許5,2
29,248号に記載されたような方法により合成する
ことができる。The hydrazine derivative according to the present invention can be synthesized by a known method. For example, US Pat.
It can be synthesized by a method as described in JP-A-29,248.
【0066】次に本発明に好ましく用いることができる
5〜6員の含窒素複素環化合物としては、下記一般式
〔Pa〕、〔Pb〕又は〔Pc〕で表すことができる。Next, the 5- or 6-membered nitrogen-containing heterocyclic compound which can be preferably used in the present invention can be represented by the following general formula [Pa], [Pb] or [Pc].
【0067】[0067]
【化25】 Embedded image
【0068】一般式〔Pa〕、〔Pb〕又は〔Pc〕に
おいて、A1、A2、A3、A4又はA5は、5〜6員の含
窒素複素環を完成させるための非金属原子群を表し、該
ヘテロ環には酸素原子、窒素原子、硫黄原子を含んでい
てもよく、該ヘテロ環はベンゼン環と縮合してもかまわ
ない。A1、A2、A3、A4又はA5で構成される5〜6
員の含窒素複素環は置換基を有してもよく、置換基とし
てはアルキル基、アリール基、アラルキル基、アルケニ
ル基、アルキニル基、ハロゲン原子、アシル基、アルコ
キシカルボニル基、アリールオキシカルボニル基、スル
ホ基、カルボキシ基、ヒドロキシ基、アルコキシ基、ア
リールオキシ基、アミド基、スルファモイル基、カルバ
モイル基、ウレイド基、アミノ基、スルホンアミド基、
スルホニル基、シアノ基、ニトロ基、メルカプト基、ア
ルキルチオ基、アリールチオ基を表す。A1、A2、
A3、A4又はA5で構成される5〜6員の含窒素複素環
としては例えば、ピリジン、イミダゾール、チアゾー
ル、オキサゾール、ピラジン、ピリミジン環などを挙げ
ることができ、好ましくはピリジン環である。In the general formulas [Pa], [Pb] or [Pc], A 1 , A 2 , A 3 , A 4 or A 5 is a nonmetal for completing a 5- to 6-membered nitrogen-containing heterocyclic ring. Represents a group of atoms, and the hetero ring may contain an oxygen atom, a nitrogen atom and a sulfur atom, and the hetero ring may be condensed with a benzene ring. 5 to 6 composed of A 1 , A 2 , A 3 , A 4 or A 5
The membered nitrogen-containing heterocycle may have a substituent, and the substituent may be an alkyl group, an aryl group, an aralkyl group, an alkenyl group, an alkynyl group, a halogen atom, an acyl group, an alkoxycarbonyl group, an aryloxycarbonyl group, Sulfo group, carboxy group, hydroxy group, alkoxy group, aryloxy group, amide group, sulfamoyl group, carbamoyl group, ureido group, amino group, sulfonamide group,
It represents a sulfonyl group, a cyano group, a nitro group, a mercapto group, an alkylthio group, or an arylthio group. A 1 , A 2 ,
Examples of the 5- to 6-membered nitrogen-containing heterocyclic ring composed of A 3 , A 4 or A 5 include pyridine, imidazole, thiazole, oxazole, pyrazine, pyrimidine ring and the like, and preferably a pyridine ring. .
【0069】一般式〔Pa〕、〔Pb〕において、Bp
は2価の連結基を表し、2価の連結基とはアルキレン、
アリーレン、アルケニレン、−SO2−、−SO−、−
O−、−S−、−CO−、−N(R6)−、(R6はアル
キル基、アリール基、水素原子を表す)を単独又は組合
せて構成されるものを表す。好ましい例としては、Bp
はアルキレン基、アルケニレン基、アルキレンオキシ基
を挙げることができる。In the general formulas [Pa] and [Pb], Bp
Represents a divalent linking group, a divalent linking group is an alkylene,
Arylene, alkenylene, -SO 2 -, - SO - , -
O -, - S -, - CO -, - N (R 6) -, represents what is configured alone or in combination (R 6 represents an alkyl group, an aryl group, a hydrogen atom). A preferred example is Bp
Represents an alkylene group, alkenylene group, or alkyleneoxy group.
【0070】一般式〔Pa〕、〔Pb〕又は〔Pc〕に
おいて、R1、R2又はR5は、炭素数1以上20以下の
飽和および不飽和のアルキル基を表し、R1、R2は同一
でも異なっていてもよく、置換基としてはA1、A2、A
3、A4又はA5の置換基として挙げた基と同一のものを
あげることができる。In the general formulas [Pa], [Pb] or [Pc], R 1 , R 2 or R 5 represents a saturated or unsaturated alkyl group having 1 to 20 carbon atoms, and R 1 , R 2 May be the same or different and the substituents are A 1 , A 2 , A
3, A 4 or can be given the same as groups given as the substituent of A 5.
【0071】好ましい例としてはR1、R2又はR5はそ
れぞれ炭素数4〜10のアルキル基を表し、更に好まし
い例として置換或いは無置換のアリール基、置換アルキ
ル基を表す。Preferred examples of R 1 , R 2 and R 5 each represent an alkyl group having 4 to 10 carbon atoms, and more preferred examples include a substituted or unsubstituted aryl group and a substituted alkyl group.
【0072】一般式〔Pa〕、〔Pb〕又は〔Pc〕に
おいて、Xp -及びXは分子全体の電荷を均衡させるに必
要な対イオンを表し、例えば塩素イオン、臭素イオン、
ヨウ素イオン、硝酸イオン、硫酸イオン、p−トルエン
スルホナート、オキザレートを表し、np及びnp -は分
子全体の電荷を均衡させるに必要な対イオンの数を表
し、分子内塩の場合にはnp及びnp -は0である。下記
に一般式〔Pa〕、〔Pb〕又は〔Pc〕で表される具
体的化合物例を示す。In the general formulas [Pa], [Pb] or [Pc], X p - and X each represent a counter ion necessary for balancing the charge of the whole molecule, for example, chloride ion, bromide ion,
Represents iodine ion, nitrate ion, sulfate ion, p-toluenesulfonate, oxalate, n p and n p − represent the number of counter ions required to balance the charge of the whole molecule, and in the case of an inner salt, n p and n p - are zero. Specific examples of the compound represented by the formula [Pa], [Pb] or [Pc] are shown below.
【0073】[0073]
【化26】 Embedded image
【0074】[0074]
【化27】 Embedded image
【0075】[0075]
【化28】 Embedded image
【0076】[0076]
【化29】 Embedded image
【0077】[0077]
【化30】 Embedded image
【0078】本発明においてヒドラジン誘導体及び5〜
6員の含窒素複素環化合物は、ハロゲン化銀乳剤層側の
親水性コロイド層(ハロゲン化銀乳剤層を含む)に含有
させる。好ましくはハロゲン化銀乳剤層及び/又はハロ
ゲン化銀乳剤層に隣接する親水性コロイド層に含有させ
る。In the present invention, the hydrazine derivative and 5-
The 6-membered nitrogen-containing heterocyclic compound is contained in the hydrophilic colloid layer (including the silver halide emulsion layer) on the side of the silver halide emulsion layer. Preferably, it is contained in a silver halide emulsion layer and / or a hydrophilic colloid layer adjacent to the silver halide emulsion layer.
【0079】添加量は、硬調化させる量(硬調化量)で
あればよく、ハロゲン化銀粒子の粒径、ハロゲン組成、
化学増感の程度、抑制剤の種類などにより最適量は異な
るが、一般的にはハロゲン化銀1モル当たり10-6〜1
0-1モルの範囲でよく、好ましくは10-5〜10-2モル
の範囲である。The amount of addition may be any amount that makes the contrast high (the amount of the contrast enhancement).
Although the optimum amount varies depending on the degree of chemical sensitization and the type of the inhibitor, it is generally 10 -6 to 1 per mol of silver halide.
It may be in the range of 0 -1 mol, preferably in the range of 10 -5 to 10 -2 mol.
【0080】本発明のハロゲン化銀写真感光材料のハロ
ゲン化銀乳剤層もしくは親水性コロイド層中には、テト
ラゾリウム化合物が用いられる。In the silver halide emulsion layer or the hydrophilic colloid layer of the silver halide photographic material of the present invention, a tetrazolium compound is used.
【0081】本発明に用いられる好ましいテトラゾリウ
ム化合物としては、下記一般式〔T〕で表わすことがで
きる。The preferred tetrazolium compound used in the present invention can be represented by the following general formula [T].
【0082】[0082]
【化31】 Embedded image
【0083】式中、R1、R2、R3は水素原子もしくは
電子吸引性度を示すハメットのシグマ値(σp)が負の
ものが好ましい。In the formula, R 1 , R 2 , and R 3 are preferably a hydrogen atom or a compound having a negative Hammett sigma value (σp) indicating electron-withdrawing degree.
【0084】フェニル置換におけるハメットのシグマ値
は多くの文献、例えばジャーナル・オブ・メディカルケ
ミストリー(Journal of Medical
Chemistry)第20巻、304頁(1977
年)記載のC.ハンシュ(C.Hansch)等の報文
等に見ることができ、特に好ましい負のシグマ値を有す
る基としては、例えばメチル基(σp=−0.17以下
いずれもσp値)エチル基(−0.15)、シクロプロ
ピル基(−0.21)、n−プロピル基(−0.1
3)、isoプロピル基(−0.15)、シクロブチル
基(−0.15)、n−ブチル基(−0.16)、is
o−ブチル基(−0.20)、n−ペンチル基(−0.
15)、シクロヘキシル基(−0.22)、アミノ基
(−0.66)、アセチルアミノ基(−0.15)、ヒ
ドロキシル基(−0.37)、メトキシ基(−0.2
7)、エトキシ基(−0.24)、プロポキシ基(−
0.25)、ブトキシ基(−0.32)、ペントキシ基
(−0.34)等が挙げられ、これらはいずれも本発明
の一般式〔T〕の化合物の置換基として有用である。The Hammett's sigma value for phenyl substitution is described in many literatures, for example, Journal of Medical Chemistry.
Chemistry) Vol. 20, p. 304 (1977)
Year). As a group having a particularly preferable negative sigma value, for example, a methyl group (σp = −0.17 or less, all σp values) and an ethyl group (−0) can be seen in reports by C. Hansch et al. .15), cyclopropyl group (-0.21), n-propyl group (-0.1
3), isopropyl group (-0.15), cyclobutyl group (-0.15), n-butyl group (-0.16), is
o-butyl group (-0.20), n-pentyl group (-0.
15), cyclohexyl group (-0.22), amino group (-0.66), acetylamino group (-0.15), hydroxyl group (-0.37), methoxy group (-0.22)
7), an ethoxy group (-0.24), a propoxy group (-
0.25), butoxy group (-0.32), pentoxy group (-0.34) and the like, all of which are useful as substituents of the compound of the general formula [T] of the present invention.
【0085】nは、1あるいは2を表し、XT n-で示さ
れるアニオンとしては、例えば塩化物イオン、臭化物イ
オン、ヨウ化物イオン等のハロゲンイオン、硝酸、硫
酸、過塩素酸等の無機酸の酸根、スルホン酸、カルボン
酸等の有機酸の酸根、アニオン系の活性剤、具体的には
p−トルエンスルホン酸アニオン等の低級アルキルベン
ゼンスルホン酸アニオン、p−ドデシルベンゼンスルホ
ン酸アニオン等の高級アルキルベンゼンスルホン酸アニ
オン、ラウリルスルフェートアニオン等の高級アルキル
硫酸エステルアニオン、テトラフェニルボロン等の硼酸
系アニオン、ジ−2−エチルヘキシルスルホサクシネー
トアニオン等のジアルキルスルホサクシネートアニオ
ン、セチルポリエテノキシサルフェートアニオン等のポ
リエーテルアルコール硫酸エステルアニオン、ステアリ
ン酸アニオン等の高級脂肪族アニオン、ポリアクリル酸
アニオン等のポリマーに酸根のついたもの等を挙げるこ
とができる。N represents 1 or 2, and examples of the anion represented by X T n- include halogen ions such as chloride ion, bromide ion and iodide ion; and inorganic acids such as nitric acid, sulfuric acid and perchloric acid. Acid radicals, organic acid radicals such as sulfonic acid and carboxylic acid, anionic activators, specifically lower alkylbenzenesulfonic acid anions such as p-toluenesulfonic acid anion and higher alkylbenzenes such as p-dodecylbenzenesulfonic acid anion Sulfonate anion, higher alkyl sulfate anion such as lauryl sulfate anion, borate-based anion such as tetraphenylboron, dialkyl sulfosuccinate anion such as di-2-ethylhexyl sulfosuccinate anion, cetyl polyethenoxy sulfate anion and the like Polyether alcohol Ester anion, higher aliphatic acid such as stearic acid anion anion, those with a acid radical in a polymer of polyacrylic acid anion, and the like.
【0086】以下、一般式〔T〕で表される化合物の具
体例を下記に挙げるが、これらに限定されるものではな
い。Hereinafter, specific examples of the compound represented by the general formula [T] are shown below, but it should not be construed that the invention is limited thereto.
【0087】[0087]
【化32】 Embedded image
【0088】上記テトラゾリウム化合物は、例えばケミ
カル・レビュー(ChemicalReviews)第
55巻、335〜483頁に記載の方法にしたがって容
易に合成することができる。The above tetrazolium compound can be easily synthesized, for example, according to the method described in Chemical Reviews, vol. 55, pages 335-483.
【0089】上記のテトラゾリウム化合物は1種もしく
は2種以上を適宜の比率で組み合わせて用いてもよい。The above tetrazolium compounds may be used alone or in combination of two or more at an appropriate ratio.
【0090】本発明に用いられる上記のテトラゾリウム
塩は、ハロゲン化銀乳剤層もしくはそれに隣接し、好ま
しくはハロゲン化銀乳剤層又はその隣接層に用いること
が好ましい。The above-mentioned tetrazolium salt used in the present invention is preferably used in a silver halide emulsion layer or adjacent thereto, preferably in a silver halide emulsion layer or an adjacent layer thereof.
【0091】添加量はハロゲン化銀粒子の粒径、ハロゲ
ン組成、化学増感の程度、抑制剤の種類などにより最適
量は一様ではないが、一般的にはハロゲン化銀1モル当
たり10-6〜10-1モルの範囲が好ましく、特に10-5
〜10-2モルの範囲が好ましい。[0091] The particle size of the added amount of silver halide grains, the halogen composition, the degree of chemical sensitization, although the optimum amount is not uniform due to the type of inhibitor, generally 1 mol of silver halide per 10 - The range is preferably from 6 to 10 -1 mol, particularly preferably from 10 -5 mol.
10 -2 mol per mol of silver is preferred.
【0092】本発明においてヒドラジン誘導体や5〜6
員の複素環化合物或いはテトラゾリウム化合物の硬調化
を効果的に促進するために、下記一般式〔Na〕又は
〔Nb〕で表される造核促進剤を用いることが好まし
い。In the present invention, the hydrazine derivative or 5-6
It is preferable to use a nucleation accelerator represented by the following general formula [Na] or [Nb] in order to effectively promote intensification of the membered heterocyclic compound or tetrazolium compound.
【0093】[0093]
【化33】 Embedded image
【0094】一般式〔Na〕において、式中、R11、R
12、R13は水素原子、アルキル基、置換アルキル基、ア
ルケニル基、置換アルケニル基、アルキニル基、アリー
ル基、置換アリール基を表す。R11、R12、R13で環を
形成することができる。特に好ましくは脂肪族の3級ア
ミン化合物である。これらの化合物は分子中に耐拡散性
基又はハロゲン化銀吸着基を有するものが好ましい。耐
拡散性を有するためには分子量100以上の化合物が好
ましく、分子量300以上が特に好ましい。又、好まし
い吸着基としては複素環、メルカプト基、チオエーテル
基、チオン基、チオウレア基などが挙げられる。In the general formula [Na], R 11 , R
12 and R 13 represent a hydrogen atom, an alkyl group, a substituted alkyl group, an alkenyl group, a substituted alkenyl group, an alkynyl group, an aryl group, or a substituted aryl group. R 11 , R 12 and R 13 can form a ring. Particularly preferred are aliphatic tertiary amine compounds. These compounds preferably have a diffusion-resistant group or a silver halide adsorption group in the molecule. In order to have diffusion resistance, a compound having a molecular weight of 100 or more is preferable, and a compound having a molecular weight of 300 or more is particularly preferable. Preferred examples of the adsorptive group include a heterocyclic ring, a mercapto group, a thioether group, a thione group, and a thiourea group.
【0095】以下、これら造核促進剤〔Na〕の具体的
化合物例を挙げる。The following are specific examples of these nucleation accelerators [Na].
【0096】[0096]
【化34】 Embedded image
【0097】[0097]
【化35】 Embedded image
【0098】[0098]
【化36】 Embedded image
【0099】前記一般式〔Nb〕においてArは置換又
は無置換の芳香族基又は複素環基を表す。式中、R14は
水素原子、アルキル基、アルキニル基、アリール基を表
すがArとR14は連結基で連結されて環を形成してもよ
い。これらの化合物は分子内に耐拡散性基又はハロゲン
化銀吸着基を有するものが好ましい。好ましい耐拡散性
を持たせるための分子量は120以上が好ましく、特に
好ましくは300以上である。又、好ましいハロゲン化
銀吸着基としては一般式〔H〕で表される化合物のハロ
ゲン化銀吸着基と同義の基が挙げられる。In the general formula [Nb], Ar represents a substituted or unsubstituted aromatic or heterocyclic group. In the formula, R 14 represents a hydrogen atom, an alkyl group, an alkynyl group, or an aryl group, but Ar and R 14 may be linked by a linking group to form a ring. These compounds preferably have a diffusion-resistant group or a silver halide adsorption group in the molecule. The molecular weight for imparting preferable diffusion resistance is preferably 120 or more, and particularly preferably 300 or more. Preferred examples of the silver halide adsorption group include groups having the same meaning as the silver halide adsorption group of the compound represented by the formula [H].
【0100】一般式〔Nb〕の具体的化合物例としては
以下に示すものが挙げられる。Specific examples of the compound represented by the general formula [Nb] include the following.
【0101】[0101]
【化37】 Embedded image
【0102】[0102]
【化38】 Embedded image
【0103】本発明においては分子量が500以下の造
核促進剤を用いた場合、本発明の効果が大きかった。In the present invention, when a nucleation accelerator having a molecular weight of 500 or less was used, the effect of the present invention was great.
【0104】本発明に用いられる上記の造核促進剤は、
ハロゲン化銀乳剤層側の層であればいずれの層に用いて
もよく、好ましくはハロゲン化銀乳剤層又はその隣接層
に用いることが好ましい。添加量はハロゲン化銀粒子の
粒径、ハロゲン組成、化学増感の程度、抑制剤の種類な
どにより最適量は一様ではないが、一般的にはハロゲン
化銀1モル当たり10-6〜10-1モルの範囲が好まし
く、特に10-5〜10-2モルの範囲が好ましい。The nucleation accelerator used in the present invention includes:
Any layer may be used as long as it is a layer on the side of the silver halide emulsion layer, and is preferably used for the silver halide emulsion layer or a layer adjacent thereto. The optimum amount is not uniform depending on the particle size of the silver halide grains, the halogen composition, the degree of chemical sensitization, the type of the inhibitor, and the like, but is generally 10 -6 to 10 per mol of silver halide. A range of -1 mol is preferable, and a range of 10 -5 to 10 -2 mol is particularly preferable.
【0105】本発明のハロゲン化銀写真感光材料のハロ
ゲン化銀乳剤には、遷移金属錯体が含有される。本発明
に好ましく用いられる遷移金属錯体としては、下記一般
式で表される6配位錯体が好ましい。The silver halide emulsion of the silver halide photographic light-sensitive material of the present invention contains a transition metal complex. As the transition metal complex preferably used in the present invention, a six-coordinate complex represented by the following general formula is preferable.
【0106】〔ML6〕m 式中、Mは周期律表の第6〜10族の元素から選ばれる
遷移金属、Lは架橋配位子を表す。mは0、−1、−2
又は−3を表す。Lは全て同じか、又はそれぞれ異なっ
ていてもよい。[ML 6 ] m In the formula, M represents a transition metal selected from elements of Groups 6 to 10 of the periodic table, and L represents a bridging ligand. m is 0, -1, -2
Or -3. All L may be the same or different.
【0107】Lで表される配位子の好ましい具体例とし
ては、ハロゲン化物(弗化物、塩化物、臭化物及び沃化
物)、シアン化物、シアナート、チオシアナート、セレ
ノシアナート、テルロシアナート、ニトロシル、チオニ
トロシル、アジド及びアコの各配位子が挙げられる。ア
コ配位子が存在する場合には、配位子の一つ又は二つを
占めることが好ましい。Preferred specific examples of the ligand represented by L include halides (fluorides, chlorides, bromides and iodides), cyanides, cyanates, thiocyanates, selenocyanates, tellurocyanates, nitrosyls, and the like. And thionitrosyl, azide and aquo ligands. If an aquo ligand is present, it preferably occupies one or two of the ligands.
【0108】Mとして特に好ましい具体例としては、ロ
ジウム(Rh)、ルテニウム(Ru)、レニウム(R
e)、オスミウム(Os)及びイリジウム(Ir)であ
る。Particularly preferred examples of M include rhodium (Rh), ruthenium (Ru), and rhenium (R
e), osmium (Os) and iridium (Ir).
【0109】以下に遷移金属配位錯体の具体例を示す
が、本発明はこれらに限定されるものではない。The following are specific examples of the transition metal coordination complex, but the present invention is not limited to these.
【0110】1:〔RhCl6〕3- 2:〔RuCl6〕3- 3:〔ReCl6〕3- 4:〔RuBr6〕3− 5:〔OsCl6〕3- 6:〔CrCl6〕4- 7:〔Ru(NO)Cl5〕2- 8:〔Ru(H2O)2Br4〕- 9:〔Ru(NO)(H2O)Cl4〕- 10:〔Rh(H2O)Cl5〕2- 11:〔Re(NO)Cl5〕2- 12:〔Re(NO)CN5〕2- 13:〔Re(NO)ClCN4〕2- 14:〔Rh(NO)2Cl4〕- 15:〔Rh(NO)(H2O)Cl4〕- 16:〔Ru(NO)CN5〕2- 17:〔Fe(CN)6〕3- 18:〔Rh(NS)Cl5〕2- 19:〔Os(NO)Cl5〕2- 20:〔Cr(NO)Cl5〕2- 21:〔Re(NO)Cl5〕- 22:〔Os(NS)Cl4(TeCN)〕2- 23:〔Ru(NS)Cl5〕2- 24:〔Re(NS)Cl4(SeCN)〕2- 25:〔Os(NS)Cl4(SCN)4〕2- 26:〔Ir(NO)Cl5〕2- 上記の金属錯体をハロゲン化銀乳剤に含有させるには、
ハロゲン化銀粒子調製時に添加して含有させることがで
きる。添加時期は、ハロゲン化銀粒子全体に均一に分布
するよう添加してもよいし、ハロゲン化銀粒子の内殻部
に存在するよう添加してもよい。[0110] 1: [RhCl 6] 3- 2: [RuCl 6] 3- 3: [ReCl 6] 3- 4: [RuBr 6] 3- 5: [OsCl 6] 3- 6: [CrCl 6] 4 - 7: [Ru (NO) Cl 5] 2- 8: [Ru (H 2 O) 2 Br 4 ] - 9: [Ru (NO) (H 2 O ) Cl 4 ] - 10: [Rh (H 2 O) Cl 5] 2- 11: [Re (NO) Cl 5] 2- 12: [Re (NO) CN 5] 2- 13: [Re (NO) ClCN 4] 2- 14: [Rh (NO) 2 Cl 4] - 15: [Rh (NO) (H 2 O ) Cl 4 ] - 16: [Ru (NO) CN 5] 2- 17: [Fe (CN) 6] 3- 18: [Rh (NS ) Cl 5] 2- 19: [Os (NO) Cl 5] 2- 20: [Cr (NO) Cl 5] 2- 21: [Re (NO) Cl 5] - 22: [Os (NS) Cl 4 (TeCN)] 2- 23 [Ru (NS) Cl 5] 2- 24: [Re (NS) Cl 4 (SeCN ) ] 2- 25: [Os (NS) Cl 4 (SCN ) 4 ] 2- 26: [Ir (NO) Cl 5 2-In order for the above metal complex to be contained in the silver halide emulsion,
It can be added and contained during the preparation of silver halide grains. The timing of addition may be such that it is uniformly distributed throughout the silver halide grains, or it may be such that it is present in the inner shell of the silver halide grains.
【0111】金属錯体の添加量は錯体の形でハロゲン化
銀1モル当たり10-9〜10-3モルでよく、好ましくは
10-8〜10-5モルである。The amount of the metal complex to be added may be 10 -9 to 10 -3 mol, preferably 10 -8 to 10 -5 mol, per mol of silver halide in the form of a complex.
【0112】本発明のハロゲン化銀写真感光材料に用い
られるハロゲン化銀乳剤のハロゲン組成は、特に限定サ
レナイガ塩化銀含有率が60モル%以上の組成からなる
ハロゲン化銀乳剤でハロゲン化銀の平均粒子サイズは
0.6μm以下であることが好ましく、特に0.5〜
0.05μmが好ましい。The halogen composition of the silver halide emulsion used for the silver halide photographic light-sensitive material of the present invention is particularly preferably a silver halide emulsion having a composition having a limited Salenaiga silver chloride content of 60 mol% or more. The particle size is preferably 0.6 μm or less, especially 0.5 to
0.05 μm is preferred.
【0113】ハロゲン化銀粒子の形状には特に制限はな
く平板状、球状、立方体状、14面体状、正八面体状そ
の他いずれの形状でもよい。又、粒子サイズ分布は狭い
方が好ましく、特に平均粒子サイズの±40%の粒子サ
イズ域内に全粒子数の90%、望ましくは95%が入る
ような、いわゆる単分散乳剤が好ましい。The shape of the silver halide grains is not particularly limited, and may be any of tabular, spherical, cubic, tetradecahedral, octahedral, and any other shapes. Further, it is preferable that the particle size distribution is narrower, and in particular, a so-called monodisperse emulsion in which 90%, preferably 95% of the total number of particles falls within a particle size range of ± 40% of the average particle size is preferable.
【0114】平板状粒子としては塩化銀60モル%以上
を有する(100)面を主平面とする平板状粒子を用い
ることができる。As the tabular grains, tabular grains having a (100) plane having 60 mol% or more of silver chloride as a main plane can be used.
【0115】乳剤の調製は片側混合法、同時混合法、そ
れらの組合せなどのいずれを用いてもよい。粒子を銀イ
オン過剰の下において形成させる方法(いわゆる逆混合
法)を用いることもできる。同時混合法の一つの形式と
してハロゲン化銀の生成される液相中のpAgを一定に
保つ方法、即ちいわゆるコントロールド・ダブルジェッ
ト法を用いることができ、この方法によると、結晶形が
規則的で粒子サイズが均一に近いハロゲン化銀乳剤が得
られる。The emulsion may be prepared by any one of a one-side mixing method, a simultaneous mixing method and a combination thereof. A method of forming grains in the presence of excess silver ions (a so-called reverse mixing method) can also be used. As one type of the double jet method, a method of maintaining a constant pAg in a liquid phase in which silver halide is formed, that is, a so-called controlled double jet method can be used. To obtain a silver halide emulsion having a nearly uniform grain size.
【0116】ハロゲン化銀乳剤は化学増感されても、さ
れなくともよい。化学増感の方法としては硫黄増感、セ
レン増感、テルル増感、還元増感及び貴金属増感法が知
られており、これらの何れをも単独で用いても又併用し
てもよい。硫黄増感剤としては、公知の硫黄増感剤が使
用できるが、好ましい硫黄増感剤としては、ゼラチン中
に含まれる硫黄化合物の他、種々の硫黄化合物、例えば
チオ硫酸塩、チオ尿素類、ローダニン類、ポリスルフィ
ド化合物等を用いることができる。セレン増感剤として
は、公知のセレン増感剤を用いることができる。The silver halide emulsion may or may not be chemically sensitized. Known methods of chemical sensitization include sulfur sensitization, selenium sensitization, tellurium sensitization, reduction sensitization and noble metal sensitization, and any of these methods may be used alone or in combination. As the sulfur sensitizer, known sulfur sensitizers can be used. Preferred sulfur sensitizers include, in addition to the sulfur compounds contained in gelatin, various sulfur compounds such as thiosulfates, thioureas, Rhodanins, polysulfide compounds and the like can be used. As the selenium sensitizer, a known selenium sensitizer can be used.
【0117】本発明に係る写真乳剤の結合剤又は保護コ
ロイドとしては、ゼラチンを用いるのが有利であるが、
それ以外の親水性コロイドも用いることができる。例え
ばゼラチン誘導体、ゼラチンと他の高分子とのグラフト
ポリマー、アルブミン、カゼイン等の蛋白質;ヒドロキ
シエチルセルロース、カルボキシメチルセルロース、セ
ルロース硫酸エステル類等の如きセルロース誘導体、ア
ルギン酸ナトリウム、澱粉誘導体などの糖誘導体;ポリ
ビニルアルコール、ポリビニルアルコール部分アセター
ル、ポリ−N−ビニルピロリドン、ポリアクリル酸、ポ
リメタクリル酸、ポリアクリルアミド、ポリビニルイミ
ダゾール、ポリビニルピラゾール等の単一あるいは共重
合体の如き多種の合成親水性高分子物質を用いることが
できる。Gelatin is advantageously used as the binder or protective colloid of the photographic emulsion according to the present invention.
Other hydrophilic colloids can also be used. For example, gelatin derivatives, graft polymers of gelatin and other polymers, proteins such as albumin and casein; cellulose derivatives such as hydroxyethylcellulose, carboxymethylcellulose and cellulose sulfates; sugar derivatives such as sodium alginate and starch derivatives; polyvinyl alcohol Use of various kinds of synthetic hydrophilic high-molecular substances such as mono- or copolymers such as polyvinyl alcohol partial acetal, poly-N-vinylpyrrolidone, polyacrylic acid, polymethacrylic acid, polyacrylamide, polyvinylimidazole and polyvinylpyrazole Can be.
【0118】ゼラチンとしては石灰処理ゼラチンの他、
酸処理ゼラチンを用いてもよく、ゼラチン加水分解物、
ゼラチン酵素分解物も用いることができる。As gelatin, in addition to lime-processed gelatin,
Acid-treated gelatin may be used, gelatin hydrolyzate,
Enzymatic degradation products of gelatin can also be used.
【0119】写真乳剤には寸度安定性の改良などの目的
で水不溶又は難溶性合成ポリマーの分散物を含むことが
できる。例えばアルキル(メタ)アクリレート、アルコ
キシアクリル(メタ)アクリレート、グリシジル(メ
タ)アクリレート、(メタ)アクリルアミド、ビニルエ
ステル(例えば酢酸ビニル)、アクリロニトリル、オレ
フィン、スチレンなどの単独もしくは組合せ、又はこれ
らとアクリル酸、メタクリル酸、α,β−不飽和ジカル
ボン酸、ヒドロキシアルキル(メタ)アクリレート、ス
ルホアルキル(メタ)アクリレート、スチレンスルホン
酸等の組合せを単量体成分とするポリマーを用いること
ができる。The photographic emulsion may contain a dispersion of a water-insoluble or hardly soluble synthetic polymer for the purpose of improving dimensional stability and the like. For example, alkyl (meth) acrylate, alkoxyacryl (meth) acrylate, glycidyl (meth) acrylate, (meth) acrylamide, vinyl ester (eg, vinyl acetate), acrylonitrile, olefin, styrene, etc., alone or in combination, or acrylic acid, A polymer having a combination of methacrylic acid, α, β-unsaturated dicarboxylic acid, hydroxyalkyl (meth) acrylate, sulfoalkyl (meth) acrylate, styrenesulfonic acid or the like as a monomer component can be used.
【0120】本発明の効果を顕著に発現させるための一
つの方法として、少なくとも1層の構成層中に親水性ポ
リマーを含有することが好ましい。好ましい親水性ポリ
マーとしては澱粉、葡萄糖、デキストリン、デキストラ
ン、シクロデキストリン、蔗糖、麦芽糖、キサンタンガ
ム、カラギーナンなどが挙げられる。As one method for remarkably exhibiting the effects of the present invention, it is preferable that at least one constituent layer contains a hydrophilic polymer. Preferred hydrophilic polymers include starch, glucose, dextrin, dextran, cyclodextrin, sucrose, maltose, xanthan gum, carrageenan and the like.
【0121】親水性ポリマーの分子量は600〜100
万まで適宜選択することができる。処理に際して迅速に
処理液に溶出するためには分子量が低い程よいが、低す
ぎるとフィルムの膜強度を劣化させるので400以上は
必要である。親水性ポリマーを使用するとフィルム擦り
傷耐性が劣化するため、無機のコロイダルシリカ、コロ
イダル錫、コロイダル亜鉛、コロイダルチタン、コロイ
ダルイットリウム、コロイダルプラセオジウム、ネオジ
ム、ゼオライト、アパタイトなどを添加することが好ま
しい。ゼオライトとしてはアナルサイト、エリオナイ
ト、モルデナイト、シャバサイト、グメリナイト、レビ
ナイトが、また合成ゼオライトとしてはゼオライトA、
X、Y、Lなどが挙げられる。アパタイトとしてはヒド
ロキシアパタイト、フッソアパタイト、塩素アパタイト
などが挙げられる。The molecular weight of the hydrophilic polymer is from 600 to 100
Up to ten thousand can be appropriately selected. The lower the molecular weight is, the better to elute into the processing solution quickly during the processing, but if it is too low, the film strength of the film is deteriorated. When a hydrophilic polymer is used, the abrasion resistance of the film deteriorates. Therefore, it is preferable to add inorganic colloidal silica, colloidal tin, colloidal zinc, colloidal titanium, colloidal yttrium, colloidal praseodymium, neodymium, zeolite, apatite, and the like. As zeolites, analsite, erionite, mordenite, shabasite, gmelinite, levinite, and as synthetic zeolites, zeolite A,
X, Y, L and the like. Examples of apatite include hydroxyapatite, fluorospatite, and chlorapatite.
【0122】好ましい添加量は親水性バインダー当たり
重量で1%から200%の割合で添加することができ
る。上記の無機化合物はシランカップリング剤で処理す
ることにより乳剤中に添加しても凝集しにくく、塗布液
を安定にすることが出来る。The preferable addition amount is from 1% to 200% by weight per hydrophilic binder. By treating the inorganic compound with a silane coupling agent, the inorganic compound hardly aggregates even when added to the emulsion, and can stabilize the coating solution.
【0123】また、無機化合物によるひび割れを防止す
ることができる。シランカップリング剤としてはトリエ
トキシシラノビニル、トリメトキシシラノビニル、トリ
メトキシプロピルメタアクリレート、トリメトキシシラ
ノプロピルグリシジル、1−メルカプト−3−トリエト
キシシラノプロパン、1−アミノ−3−トリエトキシシ
ラノプロパン、トリエトキシシラノフェニル、トリエト
キシメチルシランなどが挙げられる。シランカップリン
グ剤は上記無機化合物と一緒に高温処理することによ
り、単純混合よりも特性を向上させることができる。混
合比は1:100から100:1の範囲で選択するのが
よい。Further, cracking due to the inorganic compound can be prevented. Examples of silane coupling agents include triethoxysilanovinyl, trimethoxysilanovinyl, trimethoxypropyl methacrylate, trimethoxysilanopropylglycidyl, 1-mercapto-3-triethoxysilanopropane, 1-amino-3-triethoxysilanopropane, Triethoxysilanophenyl, triethoxymethylsilane and the like. By treating the silane coupling agent at a high temperature together with the above-mentioned inorganic compound, the characteristics can be improved as compared with the simple mixing. The mixing ratio is preferably selected in the range of 1: 100 to 100: 1.
【0124】本発明の効果を顕著に発現させるための一
つの方法として、ハロゲン化銀乳剤層を少なくとも2層
有することが好ましい。これらの乳剤層の感度は同じで
も異なっていてもよい。またこれらの乳剤層は互いに隣
接していてもよいし、それぞれの乳剤層の間に1層以上
の中間層を有してもよい。As one method for remarkably exhibiting the effects of the present invention, it is preferable to have at least two silver halide emulsion layers. The sensitivity of these emulsion layers may be the same or different. These emulsion layers may be adjacent to each other, or may have one or more intermediate layers between each emulsion layer.
【0125】本発明の効果を更に顕著に発現させるため
には、ハロゲン化銀写真乳剤層の反対側に少なくとも1
層の親水性コロイド層を有し、その外側に少なくとも一
層の疎水性ポリマー層を有することが好ましい。ここで
ハロゲン化銀写真乳剤層の反対側の親水性コロイド層と
は、いわゆるバッキング層を含む。In order for the effects of the present invention to be more remarkably exhibited, at least one silver halide photographic emulsion layer is provided on the side opposite to the silver halide photographic emulsion layer.
It is preferred to have a hydrophilic colloid layer as a layer and to have at least one hydrophobic polymer layer outside the layer. Here, the hydrophilic colloid layer on the opposite side of the silver halide photographic emulsion layer includes a so-called backing layer.
【0126】バッキング層の外側に少なくとも1層の疎
水性ポリマー層を有する構成が好ましい。疎水性ポリマ
ー層とは疎水性ポリマーをバインダーとする層である。
ポリマー層のバインダーの具体例としてはポリエチレ
ン、ポリプロピレン、ポリスチレン、ポリ塩化ビニル、
ポリ塩化ビニリデン、ポリアクリロニトリル、ポリ酢酸
ビニル、ウレタン樹脂、尿素樹脂、メラミン樹脂、フェ
ノール樹脂、エポキシ樹脂、テトラフルオロエチレン、
ポリフッ化ビニリデン等のフッ素系樹脂、ブタジエンゴ
ム、クロロプレンゴム、天然ゴム等のゴム類、ポリメチ
ルメタクリレート、ポリエチルアクリレート等のアクリ
ル酸又はメタクリル酸のエステル、ポリエチレンフタレ
ート等のポリエステル樹脂、ナイロン6、ナイロン66
等のポリアミド樹脂、セルローストリアセテート等のセ
ルロース樹脂、シリコーン樹脂などの水不溶性ポリマー
又は、これらの誘導体を挙げることができる。更にポリ
マー層のバインダーとして、1種類のモノマーから成る
ホモポリマーでも、2種類以上のモノマーから成るコポ
リマーでも良い。特に好ましいバインダーとしては、ア
ルキルアクリレート又はアルキルメタクリレートとアク
リル酸又はメタクリル酸のコポリマー(アクリル酸又は
メタクリル酸は5モル%以下が好ましい)、スチレン−
ブタジエンコポリマー、スチレン−ブタジエン−アクリ
ル酸コポリマー(アクリル酸は5モル%以下が好まし
い)、スチレン−ブタジエン−ジビニルベンゼン−メタ
クリル酸コポリマー(メタクリル酸は5モル%以下が好
ましい)、酢酸ビニル−エチレン−アクリル酸コポリマ
ー(アクリル酸は5モル%以下)、塩化ビニリデン−ア
クリロニトリル−メチルメタクリレート−エチルアクリ
レート−アクリル酸コポリマー(アクリル酸5モル%以
下)、エチルアクリレート−グリシジルメタクリレート
−アクリル酸コポリマー等である。これらは1種類を単
独で用いてもよいし2種以上を併用して用いてもよい。A structure having at least one hydrophobic polymer layer outside the backing layer is preferable. The hydrophobic polymer layer is a layer using a hydrophobic polymer as a binder.
Specific examples of the polymer layer binder include polyethylene, polypropylene, polystyrene, polyvinyl chloride,
Polyvinylidene chloride, polyacrylonitrile, polyvinyl acetate, urethane resin, urea resin, melamine resin, phenol resin, epoxy resin, tetrafluoroethylene,
Fluorinated resins such as polyvinylidene fluoride, rubbers such as butadiene rubber, chloroprene rubber, and natural rubber; acrylic or methacrylic acid esters such as polymethyl methacrylate and polyethyl acrylate; polyester resins such as polyethylene phthalate; nylon 6; nylon 66
And water-insoluble polymers such as silicone resins and derivatives thereof. Further, as a binder for the polymer layer, a homopolymer composed of one kind of monomer or a copolymer composed of two or more kinds of monomers may be used. Particularly preferred binders are copolymers of alkyl acrylate or alkyl methacrylate with acrylic acid or methacrylic acid (acrylic acid or methacrylic acid is preferably at most 5 mol%), styrene-
Butadiene copolymer, styrene-butadiene-acrylic acid copolymer (acrylic acid is preferably 5 mol% or less), styrene-butadiene-divinylbenzene-methacrylic acid copolymer (methacrylic acid is preferably 5 mol% or less), vinyl acetate-ethylene-acryl Acid copolymers (acrylic acid is 5 mol% or less), vinylidene chloride-acrylonitrile-methyl methacrylate-ethyl acrylate-acrylic acid copolymer (acrylic acid 5 mol% or less), and ethyl acrylate-glycidyl methacrylate-acrylic acid copolymer. These may be used alone or in combination of two or more.
【0127】疎水性ポリマー層には必要に応じてマット
剤、界面活性剤、染料、すべり剤、架橋剤、増粘剤、U
V吸収剤、コロイダルシリカ等の無機微粒子などの写真
用添加剤を添加してもよい。これらの添加剤についても
リサーチ・ディスクロージャー誌176巻17646号
(1978年12月)の記載を参考にすることができ
る。If necessary, a matting agent, a surfactant, a dye, a sliding agent, a crosslinking agent, a thickener,
V absorbers and photographic additives such as inorganic fine particles such as colloidal silica may be added. Regarding these additives, the description in Research Disclosure Magazine, Vol. 176, No. 17646 (December, 1978) can be referred to.
【0128】疎水性ポリマー層は1層であっても2層以
上であっても良い。ポリマー層の厚みには特に制限はな
い。しかし疎水性ポリマー層の厚みが小さ過ぎる場合、
疎水性ポリマー層の耐水性が不充分となり、バック層が
処理液に膨潤する様になってしまい不適切である。逆に
疎水性ポリマー層の厚みが大き過ぎる場合、ポリマー層
の水蒸気透過性が不充分となり、バック層の親水性コロ
イド層の吸脱湿が阻害されてカールが不良となってしま
う。勿論疎水性ポリマー層の厚みは用いるバインダーの
物性値にも依存する。従ってポリマー層厚みはこの両者
を考慮して決定する必要がある。疎水性ポリマー層の好
ましい厚みは疎水性ポリマー層のバインダー種にもよる
が、0.05〜10μm、より好ましくは0.1〜5μ
mの範囲である。疎水性ポリマー層が2層以上から成る
場合には、すべての疎水性ポリマー層の厚みの和を該感
光材料の疎水性ポリマー層の厚みとする。The hydrophobic polymer layer may be a single layer or two or more layers. There is no particular limitation on the thickness of the polymer layer. However, if the thickness of the hydrophobic polymer layer is too small,
The water resistance of the hydrophobic polymer layer becomes insufficient, and the back layer swells in the treatment liquid, which is inappropriate. Conversely, if the thickness of the hydrophobic polymer layer is too large, the water vapor permeability of the polymer layer will be insufficient, and the moisture absorption and desorption of the hydrophilic colloid layer of the back layer will be inhibited, resulting in poor curl. Of course, the thickness of the hydrophobic polymer layer also depends on the physical properties of the binder used. Therefore, the thickness of the polymer layer needs to be determined in consideration of both. The preferred thickness of the hydrophobic polymer layer depends on the binder type of the hydrophobic polymer layer, but is preferably 0.05 to 10 μm, more preferably 0.1 to 5 μm.
m. When the hydrophobic polymer layer comprises two or more layers, the sum of the thicknesses of all the hydrophobic polymer layers is defined as the thickness of the hydrophobic polymer layer of the photosensitive material.
【0129】疎水性ポリマー層を塗設する方法に特に制
限はない。バック層を塗布乾燥した後に、バック層上に
ポリマー層を塗布しその後乾燥しても良いし、バック層
と疎水性ポリマー層を同時に塗布し、その後乾燥しても
よい。疎水性ポリマー層はポリマー層のバインダーの溶
媒に溶解して溶剤系で塗布しても良いし、バインダーの
ポリマーの水分散物を用いて、水系で塗布してもよい。There is no particular limitation on the method of applying the hydrophobic polymer layer. After coating and drying the back layer, a polymer layer may be coated on the back layer and then dried, or the back layer and the hydrophobic polymer layer may be simultaneously coated and then dried. The hydrophobic polymer layer may be applied in a solvent system by dissolving in a solvent of a binder of the polymer layer, or may be applied in an aqueous system using an aqueous dispersion of the binder polymer.
【0130】ハロゲン化銀写真感光材料の乳剤層の反対
側の面には、支持体上に接着層/帯電防止層/親水性コ
ロイドを含有するバック層/疎水性ポリマー層を設ける
ことが好ましい。更にその上に保護層を設けてもよい。
接着層としてはコロナ放電した支持体上に塩化ビニリデ
ン共重合体やスチレン−グリシジルアクリレート共重合
体を0.1〜1μmの厚さで塗布した後、インジウムや
リンをドープした平均粒子径0.01〜1μの酸化錫、
5酸化バナジウムの微粒子を含むゼラチン層で塗布して
得ることができる。また、スチレンスルホン酸とマレイ
ン酸共重合体をエポキシ類やアジリジン類やカルボニル
活性型の架橋剤で造膜して設けることができる。これら
帯電防止層の上に染料バック層を設けることができる。
これらの層中には、コロイダルシリカなどの寸法安定の
ための無機充填物や接着防止のシリカやメタクリル酸メ
チルマット剤、搬送性の制御のためのシリコン系滑り剤
あるいは剥離剤などを含有させることができる。On the opposite side of the emulsion layer of the silver halide photographic material, it is preferable to provide an adhesive layer / antistatic layer / back layer containing a hydrophilic colloid / hydrophobic polymer layer on a support. Further, a protective layer may be provided thereon.
As the adhesive layer, a vinylidene chloride copolymer or a styrene-glycidyl acrylate copolymer was applied to a thickness of 0.1 to 1 μm on a corona-discharged support, and then doped with indium or phosphorus to an average particle diameter of 0.01. ~ 1μ tin oxide,
It can be obtained by coating with a gelatin layer containing fine particles of vanadium pentoxide. Further, a styrene sulfonic acid / maleic acid copolymer can be formed by forming a film with an epoxy compound, an aziridine compound, or a carbonyl active crosslinking agent. A dye back layer can be provided on these antistatic layers.
These layers should contain inorganic fillers such as colloidal silica for dimensional stability, silica or methyl methacrylate for preventing adhesion, and silicone-based slipping agents or release agents for controlling transportability. Can be.
【0131】バッキング層には染料を含有してもよく、
バッキング染料としてはベンジリデン染料やオキソノー
ル染料が使用される。これらアルカリ可溶性あるいは分
解性染料を微粒子にして固定しておくこともできる。ハ
レーション防止のための濃度としては、各感光性波長で
0.1〜2.0までの濃度であることが好ましい。The backing layer may contain a dye.
As the backing dye, a benzylidene dye or an oxonol dye is used. These alkali-soluble or decomposable dyes can be fixed as fine particles. The concentration for preventing halation is preferably 0.1 to 2.0 at each photosensitive wavelength.
【0132】本発明に用いられる支持体は透過性、非透
過性どちらのものでもよいが、好ましくは透過性のプラ
スチック支持体がよい。プラスチック支持体にはポリエ
チレン化合物(例えばポリエチレンテレフタレート、ポ
リエチレンナフタレート等)、トリアセテート化合物
(例えばトリアセテートセルロース等)、ポリスチレン
化合物等からなる支持体が用いられる。The support used in the present invention may be either permeable or non-permeable, but is preferably a permeable plastic support. As the plastic support, a support composed of a polyethylene compound (eg, polyethylene terephthalate, polyethylene naphthalate, etc.), a triacetate compound (eg, triacetate cellulose, etc.), a polystyrene compound, or the like is used.
【0133】支持体の厚みとしては好ましくは50〜2
50μm、特に好ましくは70〜200μmである。The thickness of the support is preferably 50 to 2
It is 50 μm, particularly preferably 70 to 200 μm.
【0134】更に支持体の巻き癖、カールを向上せるに
は製膜後熱処理をすることが好ましい。最も好ましいの
は製膜後、乳剤塗布後の間であるが乳剤塗布後であって
もよい。熱処理の条件は45℃以上ガラス転移温度以下
で、1秒から10日の間が好ましい。生産性の点から1
時間以内にすることが好ましい。In order to further improve the curl and curl of the support, it is preferable to perform a heat treatment after the film formation. Most preferably, after film formation and after emulsion coating, it may be after emulsion coating. The condition of the heat treatment is preferably 45 ° C. or higher and the glass transition temperature or lower, and preferably between 1 second and 10 days. 1 in terms of productivity
It is preferable to be within hours.
【0135】本発明に係るハロゲン化銀写真感光材料に
は、下記に記載された化合物をハロゲン化銀写真感光材
料の構成層中に含有させることができる。The silver halide photographic light-sensitive material according to the present invention may contain the following compounds in the constituent layers of the silver halide photographic light-sensitive material.
【0136】(1)染料の固体分散微粒子体 特開平7−5629号公報(3)頁[0017]〜(1
6)頁[0042]記載の化合物 (2)酸基を有する化合物 特開昭62−237445号公報292(8)頁左下欄
11行目〜309(25)頁右下欄3行目記載の化合物 (3)酸性ポリマー 特開平6−186659号公報(10)頁[0036]
〜(17)頁[0062]記載の化合物 (4)強色増感剤 特開平6−347938号公報(3)頁[0011]〜
(16)頁[0066]記載の化合物 (5)レドックス化合物 特開平4−245243号公報235(7)頁〜250
(22)頁記載の化合物。(1) Solid Dispersion Fine Particles of Dye JP-A-7-5629, page (3) [0017] to (1)
6) Compound described on page [0042] (2) Compound having an acid group Compound described in JP-A-62-237445, page 292 (8), lower left column, line 11 to page 309 (25), lower right column, line 3 (3) Acidic polymer JP-A-6-186659, page (10) [0036]
(4) Supersensitizer: JP-A-6-347938, page (3) [0011]-
(16) Compound described in [0066] (5) Redox compound JP-A-4-245243, pages 235 (7) to 250
(22) The compound described on page.
【0137】本発明に係るハロゲン化銀写真感光材料に
は前述の添加剤およびその他の公知の添加剤を用いるこ
とができる。これらについてはリサーチ・ディスクロー
ジャー(RD)No.17643(1978年12
月)、同18716(1979年11月)及び同308
119(1989年12月)に記載された化合物が挙げ
られる。The above-described additives and other known additives can be used in the silver halide photographic light-sensitive material according to the present invention. These are described in Research Disclosure (RD) Nos. 17643 (December 1978
18716 (November 1979) and 308
119 (Dec. 1989).
【0138】本発明に使用する上記の各種添加剤は水或
いは有機溶媒に溶解して使用してもよく、また微粒子結
晶状態に分散して使用してもよい。分散法としては例え
ばボールミル、サンドミル、コロイドミル、超音波分散
機或いは高速インペラー分散機などを用いることができ
る。The above-mentioned various additives used in the present invention may be used by dissolving them in water or an organic solvent, or may be used by dispersing them in a fine crystal state. As the dispersion method, for example, a ball mill, a sand mill, a colloid mill, an ultrasonic disperser or a high-speed impeller disperser can be used.
【0139】本発明では例えば特開昭58−10514
1号記載の機械的に高速撹拌する方法、或いは特開昭4
4−22948号記載の有機溶媒で加熱溶解後、溶媒を
除去して分散する方法、特開昭50−80119号或い
は特開平2−15252号記載の酸又はアルカリに溶解
後、ポリマー中に結晶析出分散する方法などを適用する
ことができる。なお本発明において水に難溶性のヒドラ
ジン誘導体は例えば特開平2−3033号記載の方法を
参考にして溶解することができる。この方法は他の化合
物にも適用することができる。また、カルボキシ基を有
する染料や分光増感色素、添加剤などはカルボキシ基の
キレート能力を生かして微粒子結晶の固定化率を挙げる
方法を適用してもよい。In the present invention, for example, JP-A-58-10514
No. 1, the method of mechanically high-speed stirring, or
A method of dissolving by heating after dissolving with an organic solvent described in JP-A-4-2948, removing the solvent and dispersing; dissolving in an acid or alkali described in JP-A-50-80119 or JP-A-2-15252, and then crystallizing out in a polymer; A dispersing method or the like can be applied. In the present invention, the hydrazine derivative which is hardly soluble in water can be dissolved with reference to, for example, the method described in JP-A-2-3033. This method can be applied to other compounds. In addition, a method in which the dye having a carboxy group, the spectral sensitizing dye, an additive, and the like are used to increase the immobilization rate of fine particle crystals by utilizing the chelating ability of the carboxy group.
【0140】次に本発明のハロゲン化銀写真感光材料の
処理方法では、写真用処理剤として公知のものは何れも
使用することができる。In the method for processing a silver halide photographic light-sensitive material of the present invention, any known photographic processing agents can be used.
【0141】例えば現像主薬としてはハイドロキノン、
クロロハイドロキノン、メチルハイドロキノン、ハイド
ロキノンモノスルホン酸カリウムなどのジヒドロキシベ
ンゼン類、1−フェニル−3−ピラゾリドン、1−フェ
ニル−4−メチル−3−ピラゾリドン、1−フェニル−
4,4−ジメチル−3−ピラゾリドン、1−フェニル−
4−メチル−4−ヒドロキシメチル−3−ピラゾリド
ン、1−フェニル−4,4−ジヒドロキシメチル−3−
ピラゾリドンなどの3−ピラゾリドン類、N−メチル−
p−アミノフェノールなどのアミノフェノール類等ある
いはこれらの混合物、またアスコルビン酸類としてアス
コルビン酸、アスコルビン酸ナトリウム、エルソルビン
酸など、あるいは金属錯塩としてEDTA鉄塩、DTP
A鉄塩、DTPAニッケル塩などを単独又は組み合わせ
て用いることができる。For example, as a developing agent, hydroquinone,
Dihydroxybenzenes such as chlorohydroquinone, methylhydroquinone, potassium hydroquinone monosulfonate, 1-phenyl-3-pyrazolidone, 1-phenyl-4-methyl-3-pyrazolidone, 1-phenyl-
4,4-dimethyl-3-pyrazolidone, 1-phenyl-
4-methyl-4-hydroxymethyl-3-pyrazolidone, 1-phenyl-4,4-dihydroxymethyl-3-
3-pyrazolidones such as pyrazolidone, N-methyl-
Aminophenols such as p-aminophenol and the like or a mixture thereof, ascorbic acids such as ascorbic acid, sodium ascorbate, ersorbic acid, etc., or EDTA iron salt as a metal complex salt, DTP
A iron salt, DTPA nickel salt and the like can be used alone or in combination.
【0142】なかでもアスコルビン酸及びその誘導体と
上記の3−ピラゾリドン類又はジヒドロキシベンゼン類
との組み合わせで使用することが好ましい。Among them, it is preferable to use ascorbic acid and its derivatives in combination with the above-mentioned 3-pyrazolidones or dihydroxybenzenes.
【0143】現像液にはアルカリ剤(水酸化ナトリウ
ム、水酸化カリウム等)及びpH緩衝剤(例えば炭酸
塩、燐酸塩、硼酸塩、硼酸、酢酸、枸櫞酸、アルカノー
ルアミン等)が添加されることが好ましい。pH緩衝剤
としては炭酸塩が好ましく、その添加量は1リットル当
たり0.5モル以上、2.5モル以下が好ましく、更に
好ましくは0.75モル以上、1.5モル以下の範囲で
ある。An alkali agent (eg, sodium hydroxide, potassium hydroxide, etc.) and a pH buffering agent (eg, carbonate, phosphate, borate, boric acid, acetic acid, citric acid, alkanolamine, etc.) are added to the developer. Is preferred. As the pH buffering agent, carbonate is preferable, and the amount of addition is preferably 0.5 mol or more and 2.5 mol or less, more preferably 0.75 mol or more and 1.5 mol or less per liter.
【0144】また必要により溶解助剤(例えばポリエチ
レングリコール類、それらのエステル、アルカノールア
ミン等)、増感剤、界面活性剤、消泡剤、カブリ防止剤
(例えば臭化カリウム、臭化ナトリウムの如きハロゲン
化物、ニトロベンズインダゾール、ニトロベンズイミダ
ゾール、ベンゾトリアゾール、ベンゾチアゾール、テト
ラゾール類、チアゾール類等)、キレート化剤(例えば
エチレンジアミン四酢酸又はそのアルカリ金属塩、ニト
リロ三酢酸塩、ポリ燐酸塩等)、現像促進剤(例えば米
国特許2,304,025号、特公昭47−45541
号に記載の化合物等)、硬膜剤(例えばグルタルアルデ
ヒド又は、その重亜硫酸塩付加物等)、あるいは消泡剤
などを添加することができる。If necessary, dissolution aids (eg, polyethylene glycols, esters thereof, alkanolamines, etc.), sensitizers, surfactants, defoamers, antifoggants (eg, potassium bromide, sodium bromide, etc.) Halides, nitrobenzindazole, nitrobenzimidazole, benzotriazole, benzothiazole, tetrazoles, thiazoles, etc., chelating agents (eg, ethylenediaminetetraacetic acid or its alkali metal salts, nitrilotriacetic acid salts, polyphosphates, etc.), Development accelerators (for example, U.S. Pat. No. 2,304,025, JP-B-47-45541)
And the like, a hardening agent (for example, glutaraldehyde or a bisulfite adduct thereof), or an antifoaming agent.
【0145】本発明のハロゲン化銀写真感光材料は露光
後、上述した公知の素材を含む現像液で処理される。本
発明で使用される現像液は使用時のpHが9.0〜11
に調整された現像液で処理される。特に好ましくはpH
9.5以上、10.6以下の現像液で処理されることで
ある。このpHは通常の現像液pHよりも低く、取り扱
いに際しての安全性、或いは公害性の面からも好まし
い。After exposure, the silver halide photographic light-sensitive material of the present invention is processed with a developer containing the above-mentioned known materials. The developer used in the present invention has a pH of 9.0 to 11 when used.
The developer is processed with the adjusted developer. Particularly preferably pH
9.5 or more and 10.6 or less. This pH is lower than a normal developer pH, and is preferable from the viewpoint of safety during handling or pollution.
【0146】定着液としては一般に用いられる組成のも
のを用いることができ、定着剤としてはチオ硫酸ナトリ
ウム、チオ硫酸カリウム、チオ硫酸アンモニウム等のチ
オ硫酸塩、チオシアン酸ナトリウム、チオシアン酸カリ
ウム、チオシアン酸アンモニウム等のチオシアン酸塩の
他、可溶性安定銀錯塩を生成し得る有機硫黄化合物で定
着剤として知られているものを用いることができる。As the fixing solution, those having a generally used composition can be used. As fixing agents, thiosulfates such as sodium thiosulfate, potassium thiosulfate and ammonium thiosulfate, sodium thiocyanate, potassium thiocyanate and ammonium thiocyanate can be used. In addition to the thiocyanate, an organic sulfur compound capable of forming a soluble stable silver complex and known as a fixing agent can be used.
【0147】定着液には硬膜剤として作用する水溶性ア
ルミニウム塩、例えば塩化アルミニウム、硫酸アルミニ
ウム、カリ明礬、アルデヒド化合物(例えば、グルタル
アルデヒドやグルタルアルデヒドの亜硫酸付加物等)な
どを加えることができる。The fixing solution may contain a water-soluble aluminum salt acting as a hardener, for example, aluminum chloride, aluminum sulfate, potassium alum, an aldehyde compound (for example, glutaraldehyde or a sulfurous acid adduct of glutaraldehyde). .
【0148】さらに所望により、保恒剤(例えば亜硫酸
塩、重亜硫酸塩)、pH緩衡剤(例えば酢酸、クエン
酸)、pH調整剤(例えば硫酸)、硬水軟化能のあるキ
レート剤等の化合物を含むことができる。If desired, compounds such as preservatives (for example, sulfites and bisulfites), pH buffering agents (for example, acetic acid and citric acid), pH adjusters (for example, sulfuric acid), and chelating agents capable of softening water can be used. Can be included.
【0149】定着液のpHは3以上、8未満であること
が好ましい。定着処理後、水洗及び/または安定化浴で
処理される。安定化浴としては画像を安定化させる目的
で、膜pHを調整(処理後の膜面pHを3〜8に)する
ための無機及び有機の酸及びその塩、またはアルカリ剤
及びその塩(例えばほう酸塩、メタほう酸塩、ホウ砂、
リン酸塩、炭酸塩、水酸化カリウム、水酸化ナトリウ
ム、アンモニア水、モノカルボン酸、ジカルボン酸、ポ
リカルボン酸、くえん酸、蓚酸、リンゴ酸、酢酸等を組
み合わせて使用)、アルデヒド類(例えばホルマリン、
グリオキザール、グルタルアルデヒド等)、キレート剤
(例えばエチレンジアミン四酢酸又はそのアルカリ金属
塩、ニトリロ三酢酸塩、ポリ燐酸塩等)、防バイ剤(例
えばフェノール、4−クロロフェノール、クレゾール、
O−フェニルフェノール、クロロフェン、ジクロロフェ
ン、ホルムアルデヒド、P−ヒドロキシ安息香酸エステ
ル、2−(4−チアゾリン)−ベンゾイミダゾール、ベ
ンゾイソチアゾリン−3−オン、ドデシル−ベンジル−
メチルアンモニウム−クロライド、N−(フルオロジク
ロロメチルチオ)フタルイミド、2,4,4′−トリク
ロロ−2′−ハイドロオキシジフェニルエーテル等)、
色調調整剤及び/または残色改良剤(例えばメルカプト
基を置換基として有する含窒素複素環化合物;具体的に
は2−メルカプト−5−スルホン酸ナトリウム−ベンズ
イミダゾール、1−フェニル−5−メルカプトテトラゾ
ール、2−メルカプトベンズチアゾール、2−メルカプ
ト−5−プロピル−1,3,4−トリアゾール、2−メ
ルカプトヒポキサンチン等)を含有させる。その中でも
安定化浴中には防バイ剤が含まれることが好ましい。こ
れらは液状でも固体状で補充されてもよい。The pH of the fixing solution is preferably 3 or more and less than 8. After the fixing treatment, the sheet is washed with water and / or treated in a stabilizing bath. As a stabilizing bath, for the purpose of stabilizing an image, an inorganic or organic acid and a salt thereof, or an alkali agent and a salt thereof (for example, an inorganic or organic acid and a salt thereof) for adjusting the film pH (to adjust the film surface pH after treatment to 3 to 8). Borate, metaborate, borax,
Phosphate, carbonate, potassium hydroxide, sodium hydroxide, aqueous ammonia, monocarboxylic acid, dicarboxylic acid, polycarboxylic acid, citric acid, oxalic acid, malic acid, acetic acid, etc. are used in combination, and aldehydes (for example, formalin) ,
Glioxal, glutaraldehyde, etc.), chelating agents (eg, ethylenediaminetetraacetic acid or its alkali metal salt, nitrilotriacetate, polyphosphate, etc.), and anti-bacterial agents (eg, phenol, 4-chlorophenol, cresol,
O-phenylphenol, chlorophen, dichlorophen, formaldehyde, P-hydroxybenzoate, 2- (4-thiazoline) -benzimidazole, benzoisothiazolin-3-one, dodecyl-benzyl-
Methylammonium chloride, N- (fluorodichloromethylthio) phthalimide, 2,4,4'-trichloro-2'-hydroxydiphenyl ether, etc.),
Color tone adjuster and / or residual color improver (for example, a nitrogen-containing heterocyclic compound having a mercapto group as a substituent; specifically, sodium 2-mercapto-5-sulfonate-benzimidazole, 1-phenyl-5-mercaptotetrazole , 2-mercaptobenzthiazole, 2-mercapto-5-propyl-1,3,4-triazole, 2-mercaptohypoxanthine, etc.). Among them, it is preferable that the stabilizing bath contains an anti-binder. These may be replenished in liquid or solid form.
【0150】処理方法は廃液量の低減の要望から、現像
液補充量は1m2当たり50〜150mlで、より好ま
しくは1m2当たり30〜130mlである。ここでい
う現像液補充量とは、補充される量を示す。具体的には
顆粒現像補充剤を水で溶解した液の容積である。[0150] From demands of the processing method of the amount of waste reduction, the developer replenishing amount in 1 m 2 per 50 to 150, more preferably 30~130ml per 1 m 2. Here, the developer replenishment amount indicates the replenishment amount. Specifically, it is the volume of a solution obtained by dissolving a replenisher for granule development in water.
【0151】現像補充液および定着補充液はそれぞれ自
動現像機のタンク内の現像開始液および定着開始液と同
じ液でも、異なった液でもよい。現像開始液および定着
開始液は、顆粒処理剤から調製されてもよく、液体濃縮
液から調製されたものでもよく、また使用液状態になっ
ている液を使用してもよい。The developing replenisher and the fixing replenisher may be the same or different from the developing starter and the fixing starter in the tank of the automatic developing machine. The development start solution and the fix start solution may be prepared from a granule processing agent, may be prepared from a liquid concentrate, or may be a liquid in use.
【0152】現像、定着、水洗及び/または安定化浴の
温度は10〜45℃の間であることが好ましく、それぞ
れが別々に温度調整されていてもよい。The temperature of the developing, fixing, washing and / or stabilizing baths is preferably in the range of 10 to 45 ° C., and each may be separately adjusted.
【0153】本発明では現像時間短縮の要望から自動現
像機を用いて処理する時にフィルム先端が自動現像機に
挿入されてから乾燥ゾーンから出て来るまでの全処理時
間(Dry to Dry)が10〜60秒で処理され
る。In the present invention, the total processing time (Dry to Dry) from the insertion of the leading end of the film to the automatic developing machine until it comes out of the drying zone is 10 when the processing is performed using the automatic developing machine because of the demand for shortening the developing time. Processed in ~ 60 seconds.
【0154】ここでいう全処理時間とは黒白感光材料を
処理するのに必要な全工程時間を含み、具体的には処理
に必要な現像、定着、水洗、安定化処理、乾燥等の工程
の時間を全て含んだ時間である。全処理時間が10秒未
満では減感、軟調化等で満足な写真性能が得られない。
好ましくは全処理時間(Dry to Dry)が15
〜60秒である。また、100m2以上の大量の感光材
料を安定にランニング処理するためには、現像時間は2
秒以上、22秒以下であることが好ましい。The term "total processing time" as used herein includes the total processing time required for processing the black-and-white photosensitive material, and specifically includes the processing, development, fixing, water washing, stabilizing processing, drying, etc. necessary for the processing. It is a time that includes all the time. If the total processing time is less than 10 seconds, satisfactory photographic performance cannot be obtained due to desensitization and softening.
Preferably, the total processing time (Dry to Dry) is 15
~ 60 seconds. To stably process a large amount of photosensitive material of 100 m 2 or more, the development time is 2 hours.
The time is preferably not less than seconds and not more than 22 seconds.
【0155】本発明の効果を顕著に発現させるために
は、自動現像機には60℃以上の伝熱体(例えば60〜
130℃のヒートローラー等)あるいは150℃以上の
輻射物体(例えばタングステン、炭素、ニクロム、酸化
ジルコニウム・酸化イットリウム・酸化トリウムの混合
物、炭化ケイ素などに直接電流を通して発熱放射させた
り、抵抗発熱体から熱エネルギーを銅、ステンレス、ニ
ッケル、各種セラミックなどの放射体に伝達させて発熱
させたりして赤外線を放出するもの)で乾燥するゾーン
を持つものが好ましく用いられる。In order to remarkably exert the effects of the present invention, a heat transfer material (for example, 60 to 60 ° C.) is required for an automatic developing machine.
130 ° C heat roller, etc.) or 150 ° C or higher radiant object (for example, tungsten, carbon, nichrome, a mixture of zirconium oxide, yttrium oxide, thorium oxide, silicon carbide, etc.) Those that transmit energy to a radiator such as copper, stainless steel, nickel, and various ceramics to generate heat or emit infrared rays) and have a drying zone are preferably used.
【0156】用いられる60℃以上の伝熱体としては、
ヒートローラーが例として挙げられる。ヒートローラー
はアルミ製の中空とされたローラーの外周部がシリコン
ゴム、ポリウレタン、テフロンによって被覆されている
ことが好ましい。このヒートローラーの両端部は、耐熱
性樹脂(例えば商品名ルーロン)の軸受によって乾燥部
の搬送口近傍内側に配設され側壁に回転自在に軸支され
ていることが好ましい。Examples of the heat transfer material having a temperature of 60 ° C. or higher include:
A heat roller is mentioned as an example. The heat roller preferably has an aluminum hollow roller whose outer peripheral portion is covered with silicon rubber, polyurethane, or Teflon. Both ends of the heat roller are preferably disposed inside the vicinity of the transport port of the drying unit by bearings made of a heat-resistant resin (for example, Lulon), and are rotatably supported on the side wall.
【0157】また、ヒートローラーの一方の端部にはギ
アが固着されており、駆動手段及び駆動伝達手段によっ
て搬送方向に回転されることが好ましい。ヒートローラ
ーのローラー内には、ハロゲンヒーターが挿入されてお
り、このハロゲンヒーターは自動現像機に配設された温
度コントローラーに接続されていることが好ましい。It is preferable that a gear is fixed to one end of the heat roller, and the heat roller is rotated in the transport direction by a driving unit and a driving transmission unit. A halogen heater is inserted in the roller of the heat roller, and the halogen heater is preferably connected to a temperature controller provided in the automatic developing machine.
【0158】また、温度コントローラーには、ヒートロ
ーラーの外周面に接触配置されたサーミスタが接続され
ており、温度コントローラーはサーミスタからの検出温
度が60〜150℃、好ましくは70〜130℃となる
ように、ハロゲンヒーターをオンオフ制御するようにな
っていることが好ましい。The temperature controller is connected to a thermistor arranged in contact with the outer peripheral surface of the heat roller. The temperature controller controls the temperature detected by the thermistor to be 60 to 150 ° C., preferably 70 to 130 ° C. In addition, it is preferable that the halogen heater be turned on and off.
【0159】150℃以上の放射温度を発する輻射物体
としては以下の例が挙げられる。(好ましくは250℃
以上が良い)タングステン、炭素、タンタル、ニクロ
ム、酸化ジルコニウム・酸化イットリウム・酸化トリウ
ムの混合物、炭化ケイ素、二ケイ化モリブデン、クロム
酸ランタンに直接電流を通して発熱放射させて放射温度
を制御するか、抵抗発熱体から熱エネルギーを放射体に
伝達させて制御する方法があるが、放射体例として銅、
ステンレス、ニッケル、各種セラミックスなどが挙げら
れる。Examples of radiating objects emitting a radiation temperature of 150 ° C. or higher include the following. (Preferably 250 ° C
Tungsten, carbon, tantalum, nichrome, a mixture of zirconium oxide, yttrium oxide, and thorium oxide, silicon carbide, molybdenum disilicide, lanthanum chromate are directly heated and radiated to control the radiation temperature or resistance. There is a method to control by transmitting heat energy from the heating element to the radiator, but copper,
Examples include stainless steel, nickel, and various ceramics.
【0160】本発明では60℃以上の伝熱体と150℃
以上の反射温度の輻射物体を組み合わせてもよい。又、
従来のような60℃以下の温風を組み合わせてもよい。In the present invention, a heat transfer body at 60 ° C.
Radiating objects having the above reflection temperatures may be combined. or,
You may combine the conventional warm air of 60 degrees C or less.
【0161】また、本発明には下記に記載された方法及
び機構を有する自動現像機を好ましく用いることができ
る。In the present invention, an automatic developing machine having the following method and mechanism can be preferably used.
【0162】(1)脱臭装置:特開昭64−37560
号544(2)頁左上欄〜545(3)頁左上欄 (2)水洗水再生浄化剤及び装置:特開平6−2503
52号(3)頁「0011」〜(8)頁「0058」 (3)廃液処理方法:特開平2−64638号388
(2)頁左下欄〜39(5)頁左下欄 (4)現像浴と定着浴の間のリンス浴:特開平4−31
3749号(18)「0054」〜(21)頁「006
5」 (5)水補充方法:特開平1−281446号250
(2)頁左下欄〜右下欄 (6)外気温度湿度検出して自動現像機の乾燥風を制御
する方法:特開平1−315745号496(2)頁右
下欄〜501(7)頁右下欄および特開平2−1080
51号588(2)頁左下欄〜589(3)頁左下欄 (7)定着廃液の銀回収方法:特開平6−27623号
報(4)頁「0012」〜(7)頁「0071」。(1) Deodorizing device: JP-A-64-37560
No. 544 (2), upper left column to page 545 (3), upper left column (2) Washing water regeneration purifying agent and apparatus: JP-A-6-2503
No. 52, page 3 (0011) to (8), page 0058 (3) Waste liquid treatment method: JP-A-2-64638 388
(2) Bottom left column to 39 (5) Bottom left column (4) Rinse bath between developing bath and fixing bath: JP-A-4-31
No. 3749 (18) “0054” to (21) “006”
5 "(5) Water replenishment method: JP-A-1-281446 250
(2) Lower left column to lower right column of page (6) Method of detecting outside air temperature and humidity to control drying air of automatic developing machine: JP-A-1-315745, page 496 (2) Lower right column to page 501 (7) Lower right column and JP-A-2-1080
No. 51, page 588 (2), lower left column to page 589 (3), lower left column (7) Method for recovering silver of fixing waste liquid: JP-A-6-27623, page (4), "0012" to page (7), "0071".
【0163】[0163]
【実施例】以下、本発明を実施例にて説明する。The present invention will be described below with reference to examples.
【0164】実施例1 (ハロゲン化銀乳剤Aの調製)硝酸銀水溶液A及びNa
Cl、KBrからなる水溶性ハライド溶液Bを銀電位
(EAg)120mV、pH3.0にて35℃でC液中
で同時混合法で7分間添加し0.09μmのAgCl70
Br30の核を形成した。次いでNaClで銀電位を10
0mVとし、再度硝酸銀水溶液D、水溶性ハライド溶液
Eを15分間添加し粒径0.20μm(変動係数15
%)AgCl70モル%Br30モル%のハロゲン化銀
粒子を得た。Example 1 (Preparation of silver halide emulsion A) Aqueous solution of silver nitrate A and Na
Cl, a water-soluble halide solution B, the silver potential consisting of KBr (EAg) 120mV, added AgCl 70 of 0.09 .mu.m 7 minutes in a simultaneous mixing method in C solution at 35 ° C. at pH3.0
A nucleus of Br 30 was formed. Then, the silver potential was increased to 10
0 mV, an aqueous silver nitrate solution D and a water-soluble halide solution E were added again for 15 minutes, and the particle size was 0.20 μm (coefficient of variation 15
%) Silver halide grains of 70 mol% of AgCl and 30 mol% of Br were obtained.
【0165】その後1N−NaOH水溶液でpH5.6
としS−1を銀1モル当たり2×10-4モル添加し50
℃で10分間熟成した。この後フェニルイソシアナート
で処理した変性ゼラチンを添加しpH4.2でフロック
を水洗した。水洗後、銀1モル当たり15gのゼラチン
を添加し、pHを5.7とし55℃で30分間分散し
た。出来上がった乳剤の銀電位は190mV(40℃)
であった。Thereafter, the pH was adjusted to 5.6 with a 1N-NaOH aqueous solution.
S-1 was added at 2 × 10 -4 mol per mol of silver and 50
Aged at 10 ° C for 10 minutes. Thereafter, denatured gelatin treated with phenyl isocyanate was added, and the floc was washed with water at pH 4.2. After washing with water, 15 g of gelatin was added per mole of silver, the pH was adjusted to 5.7, and the mixture was dispersed at 55 ° C. for 30 minutes. The silver potential of the resulting emulsion is 190 mV (40 ° C.)
Met.
【0166】 A: 硝酸銀 16g 硝酸5% 5.3ml イオン交換水 48ml B: NaCl 3.8g KBr 3.5g オセインゼラチン 1.7g イオン交換水 48ml C: NaCl 1.4g オセインゼラチン 7g 硝酸5% 6.5ml イオン交換水 700ml D: 硝酸銀 154g 硝酸 5% 4.5ml イオン交換水 200ml E: NaCl 37g KBr 33g オセインゼラチン 6g イオン交換水 200ml 得られた乳剤に4−ヒドロキシ−6−メチル−1,3,
3a,7−テトラザインデンを銀1モル当たり1.5×
10-3モル、臭化カリウムを8.5×10-4モルを添加
してpH5.6、EAg123mVに調整した。サポニ
ンを加えて遊星ボールミルで平均0.5μmの微粒子状
に分散した硫黄華を、硫黄原子として2×10-5モル及
び、塩化金酸を1.5×10-5モル添加して温度60℃
で80分化学熟成を行った後、4−ヒドロキシ−6−メ
チル−1,3,3a,7−テトラザインデンを銀1モル
当たり2×10-3モル、1−フェニル−5−メルカプト
テトラゾールを3×10-4モル、及び沃化カリウムを
1.5×10-3モル添加したのち40℃に降温した。A: silver nitrate 16 g nitric acid 5% 5.3 ml ion exchange water 48 ml B: NaCl 3.8 g KBr 3.5 g ossein gelatin 1.7 g ion exchange water 48 ml C: NaCl 1.4 g ossein gelatin 7 g nitrate 5% 6.5 ml ion-exchanged water 700 ml D: silver nitrate 154 g nitric acid 5% 4.5 ml ion-exchanged water 200 ml E: NaCl 37 g KBr 33 g ossein gelatin 6 g ion-exchanged water 200 ml 4-hydroxy-6-methyl-1, 3,
3a, 7-tetrazaindene was added in an amount of 1.5 ×
10 -3 mol and 8.5 × 10 -4 mol of potassium bromide were added to adjust the pH to 5.6 and the EAg to 123 mV. Saponin was added thereto, and 2 × 10 −5 mol of sulfur as sulfur atom and 1.5 × 10 −5 mol of chloroauric acid were added as sulfur atoms dispersed in fine particles having an average of 0.5 μm by a planetary ball mill.
After 80 minutes of chemical ripening, 4-hydroxy-6-methyl-1,3,3a, 7-tetrazaindene was added in an amount of 2 × 10 −3 mol per mol of silver and 1-phenyl-5-mercaptotetrazole. After adding 3 × 10 -4 mol and 1.5 × 10 -3 mol of potassium iodide, the temperature was lowered to 40 ° C.
【0167】(感光材料の調製)下引加工した支持体上
に、支持体側から下記処方で構成されるハロゲン化銀乳
剤層、保護層の各層を同時重層塗布し冷却セットした
後、反対側の下引層上には支持体側からバッキング層及
びバッキング保護層を同時重層塗布し、−1℃で冷却セ
ットし、両面を同時に乾燥することで試料No.1〜2
7を得た。(Preparation of photosensitive material) On a subbed support, a silver halide emulsion layer and a protective layer each having the following composition were coated simultaneously from the support side and cooled and set. A backing layer and a backing protective layer were simultaneously coated on the undercoat layer from the support side, cooled and set at -1 ° C, and dried on both sides at the same time. 1-2
7 was obtained.
【0168】 (塗布液の調製) ハロゲン化銀乳剤層 ハロゲン化銀乳剤A Ag量3.3g/m2 分光増感色素(表1に示す) 2×10-4モル/Ag1モル 硬調化剤(表1に示す) 5mg/m2 造核促進剤 Na−12 3mg/m2 ポリマーラテックスL−1(粒径0.25μm) 0.25g/m2 ソジウム−イソ−アミル−n−デシルスルホサクシネート 2mg/m2 ナフタレンスルホン酸ナトリウム 8mg/m2 サポニン 20mg/m2 2−メルカプト−6−ヒドロキシプリン 2mg/m2 2−メルカプトピリジン 1mg/m2 コロイダルシリカ(平均粒径0.05μm) 150mg/m2 アスコルビン酸 20mg/m2 EDTA 25mg/m2 ポリスチレンスルホン酸ナトリウム 15mg/m2 塗布液pHは5.2であった。(Preparation of Coating Solution) Silver halide emulsion layer Silver halide emulsion A Ag amount 3.3 g / m 2 Spectral sensitizing dye (shown in Table 1) 2 × 10 −4 mol / Ag 1 mol Hardening agent ( (Shown in Table 1) 5 mg / m 2 nucleation accelerator Na-12 3 mg / m 2 Polymer latex L-1 (particle size: 0.25 μm) 0.25 g / m 2 sodium-iso-amyl-n-decyl sulfosuccinate 2 mg / m 2 sodium naphthalene sulfonate 8 mg / m 2 saponin 20 mg / m 2 2-mercapto-6-hydroxypurine 2 mg / m 2 2-mercaptopyridine 1 mg / m 2 Colloidal silica (average particle size 0.05 μm) 150 mg / m 2 Ascorbic acid 20 mg / m 2 EDTA 25 mg / m 2 Sodium polystyrene sulfonate 15 mg / m 2 The coating solution had a pH of 5.2.
【0169】 保護層 ゼラチン 0.7g/m2 ソジウム−イソ−アミル−n−デシルスルホサクシネート12mg/m2 球状ポリメチルメタクリレート(平均粒径3.5μm) 25mg/m2 不定形シリカ(平均粒径8μm) 2.5mg/m2 ハイドロキノン 50mg/m2 滑り剤(シリコーンオイル) 4mg/m2 ポリマーラテックスL−2(粒径0.10μm) 0.25g/m2 コロイダルシリカ(平均粒径0.05μm) 150mg/m2 1,3−ビニルスルホニル−2−プロパノール 40mg/m2 硬膜剤Q−1 30mg/m2 ポリスチレンスルホン酸ナトリウム 10mg/m2 殺菌剤Z 0.5mg/m2 バッキング層処方 ゼラチン 0.6g/m2 ソジウム−イソ−アミル−n−デシルスルホサクシネート 5mg/m2 ポリマーラテックスL−3 0.3g/m2 コロイダルシリカ(平均粒径0.05μm) 100mg/m2 ポリスチレンスルホン酸ナトリウム 10mg/m2 染料F−1 45mg/m2 染料F−2 25mg/m2 染料F−3 30mg/m2 1−フェニル−5−メルカプトテトラゾール 10mg/m2 硬膜剤Q−2 100mg/m2 水酸化亜鉛 50mg/m2 EDTA 50mg/m2 バッキング保護層処方 ゼラチン 0.4g/m2 単分散ポリメチルメタクリレート(平均粒径3μm) 50mg/m2 ソジウム−ジ−2−エチルヘキシルスルホサクシネート 10mg/m2 ポリスチレンスルホン酸ナトリウム 10mg/m2 Protective Layer Gelatin 0.7 g / m 2 Sodium-iso-amyl-n-decylsulfosuccinate 12 mg / m 2 Spherical polymethyl methacrylate (average particle size 3.5 μm) 25 mg / m 2 amorphous silica (average particle size) 2.5 mg / m 2 Hydroquinone 50 mg / m 2 Slip agent (silicone oil) 4 mg / m 2 Polymer latex L-2 (particle diameter 0.10 μm) 0.25 g / m 2 colloidal silica (average particle diameter of 0. 05μm) 150mg / m 2 1,3- vinylsulfonyl-2-propanol 40 mg / m 2 hardener Q-1 30mg / m 2 sodium polystyrenesulfonate 10 mg / m 2 fungicide Z 0.5 mg / m 2 backing layer prescription gelatin 0.6 g / m 2 Sodium - iso - amyl -n- decyl sulfosuccinate 5 mg / m 2 Porimarate' Scan L-3 0.3g / m 2 Colloidal silica (average particle size 0.05μm) 100mg / m 2 Sodium polystyrenesulfonate 10 mg / m 2 Dye F-1 45mg / m 2 Dye F-2 25mg / m 2 Dye F -3 30 mg / m 2 1-phenyl-5-mercaptotetrazole 10 mg / m 2 Hardener Q-2 100 mg / m 2 Zinc hydroxide 50 mg / m 2 EDTA 50 mg / m 2 Backing protective layer formulation Gelatin 0.4 g / m 2 monodispersed polymethyl methacrylate (average particle size 3 [mu] m) 50 mg / m 2 sodium - di-2-ethylhexyl sulfosuccinate 10 mg / m 2 sodium polystyrenesulfonate 10 mg / m 2
【0170】[0170]
【化39】 Embedded image
【0171】[0171]
【化40】 Embedded image
【0172】[0172]
【化41】 Embedded image
【0173】 (現像液組成) 使用液1リットル当たり ジエチルトリアミン5酢酸・5ナトリウム塩 1g 亜硫酸ナトリウム 42.5g 亜硫酸カリウム 17.5g 炭酸カリウム 55g ハイドロキノン 20g 1−フェニル−4−メチル−4−ヒドロキシメチル−3−ピラゾリドン 0.85g 臭化カリウム 4g 5−メチルベンゾトリアゾール 0.2g 硼酸 8g ジエチレングリコール 40g 8−メルカプトアデニン 0.07g 使用液pHが10.4になる量のKOHを加えた。(Developer Composition) Per liter of working solution diethyltriamine pentaacetic acid / 5 sodium salt 1 g sodium sulfite 42.5 g potassium sulfite 17.5 g potassium carbonate 55 g hydroquinone 20 g 1-phenyl-4-methyl-4-hydroxymethyl- 3-pyrazolidone 0.85 g potassium bromide 4 g 5-methylbenzotriazole 0.2 g boric acid 8 g diethylene glycol 40 g 8-mercaptoadenine 0.07 g KOH was added in such an amount that the working solution pH became 10.4.
【0174】 (定着液組成) 使用液1リットル当たり チオ硫酸アンモニウム(70%水溶液) 200ml 亜硫酸ナトリウム 22g 硼酸 9.8g 酢酸ナトリウム・3水和物 34g 酢酸(90%水溶液) 14.5g 酒石酸 3.0g 硫酸アルミニウム(27%水溶液) 25ml 硫酸にて使用液のpHが4.9になるように調整した。(Fixing solution composition) Ammonium thiosulfate (70% aqueous solution) per liter of working solution 200 ml Sodium sulfite 22 g Boric acid 9.8 g Sodium acetate trihydrate 34 g Acetic acid (90% aqueous solution) 14.5 g Tartaric acid 3.0 g Sulfuric acid Aluminum (27% aqueous solution) 25 ml sulfuric acid was used to adjust the pH of the working solution to 4.9.
【0175】 (処理条件) (工程) (温度) (時間) 現像 35℃ 30秒 定着 35℃ 20秒 水洗 常温 20秒 スクイズ・乾燥 45℃ 30秒 合計 100秒 (試料の評価) 〈感度の測定〉得られた試料を、ステップウェッジに密
着し、3200°Kのタングステン光で3秒間露光し、
前記組成の現像液及び定着液を用いて自動現像機GR−
27(コニカ(株)製)により前記条件で処理した。得
られた現像済み試料をPDA−65(コニカデジタル濃
度計)で黒化濃度を測定し、試料No.1が黒化濃度
1.0を与える露光量の逆数を100として相対感度で
表した。(Processing Conditions) (Process) (Temperature) (Time) Development 35 ° C. 30 seconds Fixing 35 ° C. 20 seconds Rinse at room temperature 20 seconds Squeeze / Dry 45 ° C. 30 seconds 100 seconds in total (evaluation of sample) <Measurement of sensitivity> The obtained sample was brought into close contact with a step wedge, and exposed to tungsten light of 3200 ° K for 3 seconds,
Automatic developing machine GR- using a developing solution and a fixing solution having the above-mentioned composition.
27 (manufactured by Konica Corporation) under the above conditions. The blackened density of the developed sample thus obtained was measured with a PDA-65 (Konica Digital Densitometer). The reciprocal of the exposure amount at which 1 gives a blackening density of 1.0 is expressed as a relative sensitivity with 100 being the reciprocal.
【0176】〈経時保存性試験〉経時代用テストとして
サンプルを55℃、RH48%の条件下で3日間保存し
感光材料の強制劣化試験を行った。得られた試料を前記
の条件で露光、現像処理し、感度の測定を行い、強制劣
化させなかった試料との感度差によって評価を行った。
感度差が±20以内ならば実用上許容できるレベルであ
る。<Aged Storage Test> The samples were stored for 3 days under the conditions of 55 ° C. and RH 48% as a test for an age, and a forced deterioration test of the photosensitive material was performed. The obtained sample was exposed and developed under the above-mentioned conditions, the sensitivity was measured, and the evaluation was made based on the difference in sensitivity from the sample that was not forcibly deteriorated.
If the sensitivity difference is within ± 20, it is a practically acceptable level.
【0177】また前記強制劣化サンプルの未露光部分を
PDA−65(コニカデジタル濃度計)を用いて黒化濃
度(カブリ)を測定した。カブリ濃度が0.05以下な
らば実用上許容できるレベルである。The blackening density (fog) of the unexposed portion of the forcibly deteriorated sample was measured using a PDA-65 (Konica Digital Densitometer). If the fog density is 0.05 or less, it is a practically acceptable level.
【0178】〈セーフライト耐性〉得られた試料をセー
フライトにてかぶらせ、実用上問題となる濃度のカブリ
が発生するまでの時間の対数と試料の感度の対数との和
を試料No.1が4となるよう相対的に評価した。値が
小さい方が耐セーフライト性が悪いことを表す。<Safelight Resistance> The obtained sample was covered with a safelight, and the sum of the logarithm of the time until the fogging of the density which is practically problematic and the logarithm of the sensitivity of the sample was determined as Sample No. It was relatively evaluated so that 1 became 4. The smaller the value, the lower the safelight resistance.
【0179】〈残色汚染の評価〉未露光フィルムを前記
の条件で現像処理し、5枚重ねたときの残色レベルを目
視により5段階で評価した。ランク5が最良レベルであ
り、ランク3以上が実用上の使用に耐えるレベルであ
る。<Evaluation of Residual Color Contamination> The unexposed film was developed under the above conditions, and the residual color level when five sheets were superimposed was visually evaluated on a scale of five. Rank 5 is the best level, and rank 3 or higher is a level that can withstand practical use.
【0180】〈黒ポツの評価〉未露光の試料を感度の測
定と同じ条件で現像処理を行い、40倍のルーペで観察
し、目視評価した。黒ポツの発生のないものをランク5
とし、実用下限をランク3として5段階評価した。<Evaluation of Black Pot> The unexposed sample was developed under the same conditions as in the measurement of the sensitivity, observed with a magnifier of 40 times, and visually evaluated. Rank 5 without black spots
The practical lower limit was ranked 3 and evaluated on a 5-point scale.
【0181】〈網点品質の評価〉得られた試料をコンタ
クトスクリーンに密着させて、感度の測定と同様に露光
及び処理を行い、得られた現像済み試料を100倍のル
ーペで観察し、網点の質を目視で5段階評価した。ラン
ク5が最良レベル、ランク3が実用下限であり、ランク
2以下は実用上問題とされるレベルである。<Evaluation of dot quality> The obtained sample was brought into close contact with a contact screen, exposed and processed in the same manner as in the measurement of sensitivity, and the obtained developed sample was observed with a 100-power loupe. The quality of the points was evaluated visually on a five-point scale. Rank 5 is the best level, rank 3 is the practical lower limit, and rank 2 and below are practically problematic levels.
【0182】得られた結果を下記の表に示す。The results obtained are shown in the table below.
【0183】[0183]
【表1】 [Table 1]
【0184】[0184]
【表2】 [Table 2]
【0185】表から明かなように、本発明の増感色素及
び硬調化剤を含む試料は高感度で、かつ経時での感度変
動劣化が少なく、実用上問題のないレベルを有してい
た。As is clear from the table, the sample containing the sensitizing dye and the high contrast agent of the present invention had high sensitivity, little fluctuation in sensitivity over time, and had a level that was practically acceptable.
【0186】さらに経時でのカブリ及び黒ポツの発生が
なく、かつ耐セーフライト性能も遜色なく、製版印刷用
としての高品質な網点性能を有していることが分かる。Further, it can be seen that there is no generation of fogging and black spots with the passage of time, and the safelight resistance performance is not inferior, and that it has high quality halftone dot performance for plate making printing.
【0187】実施例2 (ハロゲン化銀乳剤Bの調製)実施例1の乳剤Aにおい
て、添加溶液C及びEを、K2RhCl5(H2O)をそ
れぞれAg1モル当たり2×10-7モル及び1.3×1
0-7モル加えて調製し、その他は、乳剤Aと同様に調製
した。その後、乳剤Aと同様に化学増感を施した。Example 2 (Preparation of Silver Halide Emulsion B) In Emulsion A of Example 1, K 2 RhCl 5 (H 2 O) was added to each of Emulsion A and K 2 RhCl 5 (H 2 O) at 2 × 10 −7 mol per mol of Ag. And 1.3 × 1
It was prepared by adding 0-7 mol, and the other preparations were the same as in emulsion A. Thereafter, chemical sensitization was performed in the same manner as in Emulsion A.
【0188】(ハロゲン化銀乳剤Cの調製)添加溶液C
及びEをK2Ru(NO)Cl5にした他は、乳剤Bと同
様に調製した。その後、乳剤Aと同様に化学増感を施し
た。(Preparation of Silver Halide Emulsion C) Additive Solution C
And E were changed to K 2 Ru (NO) Cl 5 , except that E was prepared in the same manner as Emulsion B. Thereafter, chemical sensitization was performed in the same manner as in Emulsion A.
【0189】(ハロゲン化銀乳剤Dの調製)添加溶液C
及びEをK2Os(NO)Cl5にした他は、乳剤Bと同
様に調製した。その後、乳剤Aと同様に化学増感を施し
た。(Preparation of Silver Halide Emulsion D) Additive Solution C
E and E were changed to K 2 Os (NO) Cl 5 , except that E was changed to Emulsion B. Thereafter, chemical sensitization was performed in the same manner as in Emulsion A.
【0190】(感光材料の調製)ハロゲン化銀乳剤層に
下記処方を用いた他は実施例1と同様にして、試料N
o.28〜37を得た。(Preparation of photosensitive material) Sample N was prepared in the same manner as in Example 1 except that the following formulation was used for the silver halide emulsion layer.
o. 28-37 were obtained.
【0191】 (塗布液の調製) ハロゲン化銀乳剤層 ハロゲン化銀乳剤(表3に示す) Ag量3.3g/m2 分光増感色素(表3に示す) 2×10-4モル/Ag1モル 硬調化剤(表3に示す) 5mg/m2 造核促進剤 Na−12 3mg/m
2 ポリマーラテックス−L−1(粒径0.25μm) 0.25g/m2 ソジウム−イソ−アミル−n−デシルスルホサクシネート 2mg/m2 ナフタレンスルホン酸ナトリウム 8mg/m2 サポニン 20mg/m2 2−メルカプト−6−ヒドロキシプリン 2mg/m2 2−メルカプトピリジン 1mg/m2 コロイダルシリカ(平均粒径0.05μm) 150mg/m2 アスコルビン酸 20mg/m2 EDTA 25mg/m2 ポリスチレンスルホン酸ナトリウム 15mg/m2 塗布液pHは5.2であった。(Preparation of Coating Solution) Silver halide emulsion layer Silver halide emulsion (shown in Table 3) Ag amount 3.3 g / m 2 Spectral sensitizing dye (shown in Table 3) 2 × 10 -4 mol / Ag1 Molar contrast agent (shown in Table 3) 5 mg / m 2 nucleation accelerator Na-12 3 mg / m
2 polymer latex-L-1 (particle size 0.25 μm) 0.25 g / m 2 sodium-iso-amyl-n-decylsulfosuccinate 2 mg / m 2 sodium naphthalenesulfonate 8 mg / m 2 saponin 20 mg / m 2 2 -Mercapto-6-hydroxypurine 2 mg / m 2 2-mercaptopyridine 1 mg / m 2 Colloidal silica (average particle size 0.05 μm) 150 mg / m 2 Ascorbic acid 20 mg / m 2 EDTA 25 mg / m 2 Sodium polystyrene sulfonate 15 mg / The pH of the m 2 coating solution was 5.2.
【0192】[0192]
【化42】 Embedded image
【0193】(試料の評価)実施例1と同様の評価を行
い、下記表3、4を得た。(Evaluation of Sample) The same evaluation as in Example 1 was performed, and the following Tables 3 and 4 were obtained.
【0194】[0194]
【表3】 [Table 3]
【0195】[0195]
【表4】 [Table 4]
【0196】表4からも明かなように、本発明による試
料は感度、残色レベルにおいて優れている。また、遷移
金属を含む乳剤を用いた場合の本発明の試料は、経時保
存性での感度変動が非常に少なく、かつ経時でのカブリ
発生、及び黒ポツの発生が低く抑えられいることが分か
る。さらに本発明によればセーフライト耐性も改良さ
れ、より高感度で網点品質の優れた性能を有していた。As is clear from Table 4, the samples according to the present invention are excellent in sensitivity and residual color level. In addition, it can be seen that the sample of the present invention when using an emulsion containing a transition metal has a very small change in sensitivity in storage stability over time, and the generation of fog and black spots over time is suppressed to a low level. . Further, according to the present invention, the safelight resistance was also improved, and higher sensitivity and excellent dot quality were obtained.
Claims (3)
化銀乳剤層と親水性コロイド層を有するハロゲン化銀写
真感光材料において、該ハロゲン化銀乳剤層中に下記一
般式(1)又は下記一般式(2)で表される分光増感色
素の少なくとも1種を含有し、且つ、該ハロゲン化銀乳
剤層中もしくは該親水性コロイド層中に、ヒドラジン誘
導体及び/又は5〜6員の含窒素複素環化合物から選ば
れる少なくとも1種を含有することを特徴とするハロゲ
ン化銀写真感光材料。 【化1】 式中、Yは酸素原子又は>N−R基を表す。R、R1及
びR2は各々低級アルキル基を表し、R1、R2の少なく
とも一方はスルホ基又はカルボキシル基で置換された低
級アルキル基を表す。Z1、Z2、Z3、Z4及びZ5は各
々、水素原子あるいは置換しうる原子または基を表し、
Z3とZ4及びZ4とZ5の間で各々結合して縮合環を形成
してもよい。但しZ1、Z2の少なくとも一方は電子吸引
性基を表す。X1は分子内の電荷を中和するに必要なイ
オンを表し、色素が分子内塩を形成するときはn1は0
である。 【化2】 式中、R11、R13は各々,低級アルキル基又はアルケニ
ル基を表す。但しR11、R13の少なくとも一方はビニル
基(−CH=CH2)を表す。R12、R14は各々低級ア
ルキル基を表し、R12、R14の少なくとも一方は親水性
基で置換された低級アルキル基である。Z11、Z12、Z
13及びZ14は各々同じか、又は異なってもよく、水素原
子、ハロゲン原子、シアノ基、アルキル基、ハロゲン置
換アルコキシ基、アルコキシ基、アリールオキシ基、ア
シル基、アシルオキシ基、アルキルチオ基、ハロゲン置
換アルキルチオ基、アルコキシカルボニル基、カルバモ
イル基、スルファモイル基、ヒドロキシ基、ハロアルキ
ル基、カルボキシル基、スルホニル基、アシルアミノ
基、複素環基又はアリール基を表す。X11は分子内の電
荷を中和するに必要なイオンを表し、色素が分子内塩を
形成するときはn11は0である。1. A silver halide photographic material having at least one silver halide emulsion layer and a hydrophilic colloid layer on a support, wherein the silver halide emulsion layer has the following general formula (1) or A hydrazine derivative and / or a 5- to 6-membered hydrazine derivative in the silver halide emulsion layer or the hydrophilic colloid layer, containing at least one kind of spectral sensitizing dye represented by the general formula (2); A silver halide photographic material comprising at least one selected from nitrogen heterocyclic compounds. Embedded image In the formula, Y represents an oxygen atom or a> NR group. R, R 1 and R 2 each represent a lower alkyl group, and at least one of R 1 and R 2 represents a lower alkyl group substituted with a sulfo group or a carboxyl group. Z 1 , Z 2 , Z 3 , Z 4 and Z 5 each represent a hydrogen atom or a substitutable atom or group;
Z 3 and Z 4 and Z 4 and Z 5 may be bonded to each other to form a condensed ring. However, at least one of Z 1 and Z 2 represents an electron-withdrawing group. X 1 represents an ion necessary for neutralizing the intramolecular charge, and n1 is 0 when the dye forms an inner salt.
It is. Embedded image In the formula, R 11 and R 13 each represent a lower alkyl group or an alkenyl group. However, at least one of R 11 and R 13 represents a vinyl group (—CH = CH 2 ). R 12 and R 14 each represent a lower alkyl group, and at least one of R 12 and R 14 is a lower alkyl group substituted with a hydrophilic group. Z 11 , Z 12 , Z
13 and Z 14 may be the same or different, and each represents a hydrogen atom, a halogen atom, a cyano group, an alkyl group, a halogen-substituted alkoxy group, an alkoxy group, an aryloxy group, an acyl group, an acyloxy group, an alkylthio group, or a halogen-substituted group. Represents an alkylthio group, an alkoxycarbonyl group, a carbamoyl group, a sulfamoyl group, a hydroxy group, a haloalkyl group, a carboxyl group, a sulfonyl group, an acylamino group, a heterocyclic group or an aryl group. X 11 represents an ion necessary to neutralize the molecular charge, when the dye forms an intramolecular salt n11 is 0.
化銀乳剤層と親水性コロイド層を有するハロゲン化銀写
真感光材料において、該ハロゲン化銀乳剤層中に、上記
一般式(1)又は上記一般式(2)で表される分光増感
色素の少なくとも1種を含有し、且つ、該ハロゲン化銀
乳剤層中もしくは該親水性コロイド層中に、テトラゾリ
ウム化合物から選ばれる少なくとも1種を含有すること
を特徴とするハロゲン化銀写真感光材料。2. A silver halide photographic material having at least one silver halide emulsion layer and a hydrophilic colloid layer on a support, wherein the silver halide emulsion layer contains the compound represented by the above general formula (1) or (2). It contains at least one kind of the spectral sensitizing dye represented by the general formula (2), and contains at least one kind selected from tetrazolium compounds in the silver halide emulsion layer or the hydrophilic colloid layer. A silver halide photographic material.
表6〜10族の元素から選ばれる少なくとも1種の遷移
金属を含有することを特徴とする請求項1又は請求項2
記載のハロゲン化銀写真感光材料。3. The silver halide emulsion layer according to claim 1, wherein the silver halide emulsion layer contains at least one transition metal selected from the elements of Groups 6 to 10 of the periodic table.
The silver halide photographic light-sensitive material as described above.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP3193797A JPH10228073A (en) | 1997-02-17 | 1997-02-17 | Silver halide photographic sensitive material |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP3193797A JPH10228073A (en) | 1997-02-17 | 1997-02-17 | Silver halide photographic sensitive material |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| JPH10228073A true JPH10228073A (en) | 1998-08-25 |
Family
ID=12344897
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP3193797A Pending JPH10228073A (en) | 1997-02-17 | 1997-02-17 | Silver halide photographic sensitive material |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JPH10228073A (en) |
-
1997
- 1997-02-17 JP JP3193797A patent/JPH10228073A/en active Pending
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