JPH10272397A - Method and device for immersing coating of cylindrical body - Google Patents
Method and device for immersing coating of cylindrical bodyInfo
- Publication number
- JPH10272397A JPH10272397A JP7874797A JP7874797A JPH10272397A JP H10272397 A JPH10272397 A JP H10272397A JP 7874797 A JP7874797 A JP 7874797A JP 7874797 A JP7874797 A JP 7874797A JP H10272397 A JPH10272397 A JP H10272397A
- Authority
- JP
- Japan
- Prior art keywords
- coating
- substrate
- tank
- coating liquid
- cylindrical substrate
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
- 238000000576 coating method Methods 0.000 title claims abstract description 122
- 239000011248 coating agent Substances 0.000 title claims abstract description 121
- 238000000034 method Methods 0.000 title abstract description 13
- 239000007788 liquid Substances 0.000 claims abstract description 49
- 239000000758 substrate Substances 0.000 claims abstract description 45
- 238000003618 dip coating Methods 0.000 claims description 29
- 230000015572 biosynthetic process Effects 0.000 abstract description 3
- 238000007654 immersion Methods 0.000 abstract description 2
- 108091008695 photoreceptors Proteins 0.000 abstract 1
- 239000011247 coating layer Substances 0.000 description 8
- 239000010410 layer Substances 0.000 description 8
- 229920005989 resin Polymers 0.000 description 6
- 239000011347 resin Substances 0.000 description 6
- 238000010586 diagram Methods 0.000 description 5
- 238000011084 recovery Methods 0.000 description 4
- 238000001035 drying Methods 0.000 description 3
- -1 benzidine compound Chemical class 0.000 description 2
- JHIVVAPYMSGYDF-UHFFFAOYSA-N cyclohexanone Chemical compound O=C1CCCCC1 JHIVVAPYMSGYDF-UHFFFAOYSA-N 0.000 description 2
- 230000002093 peripheral effect Effects 0.000 description 2
- 229920002037 poly(vinyl butyral) polymer Polymers 0.000 description 2
- 229920000515 polycarbonate Polymers 0.000 description 2
- 239000004417 polycarbonate Substances 0.000 description 2
- 239000002904 solvent Substances 0.000 description 2
- 238000003756 stirring Methods 0.000 description 2
- ZWEHNKRNPOVVGH-UHFFFAOYSA-N 2-Butanone Chemical compound CCC(C)=O ZWEHNKRNPOVVGH-UHFFFAOYSA-N 0.000 description 1
- DNTVTBIKSZRANH-UHFFFAOYSA-N 4-(4-aminophenyl)-3-(3-methylphenyl)aniline Chemical compound CC1=CC=CC(C=2C(=CC=C(N)C=2)C=2C=CC(N)=CC=2)=C1 DNTVTBIKSZRANH-UHFFFAOYSA-N 0.000 description 1
- OKTJSMMVPCPJKN-UHFFFAOYSA-N Carbon Chemical compound [C] OKTJSMMVPCPJKN-UHFFFAOYSA-N 0.000 description 1
- 239000004677 Nylon Substances 0.000 description 1
- XAGFODPZIPBFFR-UHFFFAOYSA-N aluminium Chemical compound [Al] XAGFODPZIPBFFR-UHFFFAOYSA-N 0.000 description 1
- 229910052782 aluminium Inorganic materials 0.000 description 1
- 239000011230 binding agent Substances 0.000 description 1
- 229910052799 carbon Inorganic materials 0.000 description 1
- MVPPADPHJFYWMZ-UHFFFAOYSA-N chlorobenzene Chemical compound ClC1=CC=CC=C1 MVPPADPHJFYWMZ-UHFFFAOYSA-N 0.000 description 1
- 238000004140 cleaning Methods 0.000 description 1
- 230000000052 comparative effect Effects 0.000 description 1
- 230000000694 effects Effects 0.000 description 1
- 238000005516 engineering process Methods 0.000 description 1
- 239000007888 film coating Substances 0.000 description 1
- 238000009501 film coating Methods 0.000 description 1
- 239000010419 fine particle Substances 0.000 description 1
- 239000000463 material Substances 0.000 description 1
- PRMHOXAMWFXGCO-UHFFFAOYSA-M molport-000-691-708 Chemical compound N1=C(C2=CC=CC=C2C2=NC=3C4=CC=CC=C4C(=N4)N=3)N2[Ga](Cl)N2C4=C(C=CC=C3)C3=C2N=C2C3=CC=CC=C3C1=N2 PRMHOXAMWFXGCO-UHFFFAOYSA-M 0.000 description 1
- CWQXQMHSOZUFJS-UHFFFAOYSA-N molybdenum disulfide Chemical compound S=[Mo]=S CWQXQMHSOZUFJS-UHFFFAOYSA-N 0.000 description 1
- 229910052982 molybdenum disulfide Inorganic materials 0.000 description 1
- 229920001778 nylon Polymers 0.000 description 1
- 125000002080 perylenyl group Chemical group C1(=CC=C2C=CC=C3C4=CC=CC5=CC=CC(C1=C23)=C45)* 0.000 description 1
- CSHWQDPOILHKBI-UHFFFAOYSA-N peryrene Natural products C1=CC(C2=CC=CC=3C2=C2C=CC=3)=C3C2=CC=CC3=C1 CSHWQDPOILHKBI-UHFFFAOYSA-N 0.000 description 1
- IEQIEDJGQAUEQZ-UHFFFAOYSA-N phthalocyanine Chemical compound N1C(N=C2C3=CC=CC=C3C(N=C3C4=CC=CC=C4C(=N4)N3)=N2)=C(C=CC=C2)C2=C1N=C1C2=CC=CC=C2C4=N1 IEQIEDJGQAUEQZ-UHFFFAOYSA-N 0.000 description 1
- 239000000049 pigment Substances 0.000 description 1
- 229920001230 polyarylate Polymers 0.000 description 1
- 229920000728 polyester Polymers 0.000 description 1
- 230000001737 promoting effect Effects 0.000 description 1
- 239000004576 sand Substances 0.000 description 1
- 230000035945 sensitivity Effects 0.000 description 1
Landscapes
- Photoreceptors In Electrophotography (AREA)
- Application Of Or Painting With Fluid Materials (AREA)
- Coating Apparatus (AREA)
Abstract
Description
【0001】[0001]
【発明の属する技術分野】本発明は、感光ドラム等の円
筒基体への浸漬塗布方法に関し、特に円周方向の膜厚む
らを簡便に大幅減少させることができる浸漬塗布方法に
関する。BACKGROUND OF THE INVENTION 1. Field of the Invention The present invention relates to a dip-coating method for a cylindrical substrate such as a photosensitive drum, and more particularly to a dip-coating method capable of easily and largely reducing circumferential thickness unevenness.
【0002】[0002]
【従来の技術】従来、円筒基体の表面に感光性塗布液等
を塗布して感光ドラムを製造することは広く行われてい
る。その塗布方法としては、例えば特開昭59−906
67号公報に記載されているように、塗布液を塗布槽上
部からオーバーフローさせて循環させながら基体を浸漬
塗布する方法が一般的である。感光ドラムには、帯電、
露光、現像、転写、および残留トナーのクリーニング等
のプロセスが加えられるが、その特性は膜厚に依存して
おり、帯電性や感度等の重要な特性が膜厚に敏感に影響
される。特にカラー画像出力装置ではハーフトーン濃度
の均一性が非常に重視され、カラー画像出力装置に使用
する感光ドラムには感光層の膜厚の均一性が従来以上に
厳格に要求される。2. Description of the Related Art Conventionally, a photosensitive drum has been widely manufactured by applying a photosensitive coating solution or the like to the surface of a cylindrical substrate. The coating method is described, for example, in JP-A-59-906.
As described in Japanese Patent Publication No. 67, a method of dip coating a substrate while overflowing and circulating a coating solution from the upper portion of a coating tank is generally used. The photosensitive drum is charged,
Processes such as exposure, development, transfer, and cleaning of residual toner are added, but their characteristics depend on the film thickness, and important characteristics such as chargeability and sensitivity are sensitively affected by the film thickness. In particular, in a color image output apparatus, the uniformity of halftone density is very important, and in a photosensitive drum used in the color image output apparatus, the uniformity of the thickness of a photosensitive layer is more strictly required than before.
【0003】ところが、感光ドラムが浸漬塗布方法によ
って製造された場合、円筒基体の軸方向や円周方向に膜
厚むらを生じやすいという欠点がある。軸方向の膜厚む
らとしては、塗膜の上端部分のいわゆる端部だれが代表
的なものである。これに対する対策としては、例えば特
開昭59−73074号公報等に記載されているよう
に、被膜に空気流を当てて乾燥を促進したり、特開昭5
9−127049号公報等に記載されているように、被
膜近傍の溶剤蒸気を吸引して乾燥を促進する方法が知ら
れている。However, when the photosensitive drum is manufactured by the dip coating method, there is a disadvantage that the film thickness tends to be uneven in the axial direction or circumferential direction of the cylindrical substrate. As the film thickness unevenness in the axial direction, a so-called edge portion at the upper end portion of the coating film is typical. As countermeasures against this, for example, as described in JP-A-59-73074, an air stream is applied to the coating to promote drying,
As described in JP-A-9-127049 and the like, a method for promoting drying by sucking a solvent vapor near a coating film is known.
【0004】一方、円周方向の膜厚むらは、塗布液のオ
ーバーフロー量が円周方向で不均一になったり、オーバ
ーフロー流の流路に偏りが生じることによって引き起こ
される。それを防止する技術に関して、特公平3−22
226号公報に記載されているように、塗布槽中に設け
たらせん状の羽根を回転させて塗布液を旋回させて均質
化する方法が知られている。図5はその場合を説明する
図であって、下部にシール部材21を設けて円筒基体7
とにより塗布液を保持させた塗布槽20の中に、らせん
状の羽根22が回転可能に設けられている。らせん状の
羽根22の上端には歯車24が取り付けられており、駆
動機構23を駆動させることにより、傘歯車25、26
および歯車27を介して回転するようになっている。し
かしながら、この公報に記載の場合、らせん状の羽根を
回転させる駆動機構および歯車機構が必要であり、塗布
装置の構造が複雑になるという短所があった。また、上
記公報に記載の場合、らせん状の羽根は、その上端が塗
布槽の上縁からはみ出ているので、これを浸漬塗布装置
に適用するとオーバーフローが均一にならないこと、お
よび羽根を無理なく回転させるためには塗布槽と羽根お
よび羽根と基体との間隔を十分にあけることが必要とな
り、十分な旋回流は起きないこと等の問題が生じる。On the other hand, film thickness unevenness in the circumferential direction is caused by an uneven amount of overflow of the coating liquid in the circumferential direction or an uneven flow path of the overflow flow. Regarding technology to prevent this, Japanese Patent Publication No. 3-22
As described in Japanese Patent Publication No. 226, there is known a method of rotating a spiral blade provided in a coating tank to swirl the coating liquid to homogenize the coating liquid. FIG. 5 is a view for explaining such a case. In FIG.
A spiral blade 22 is rotatably provided in the coating tank 20 holding the coating liquid. A gear 24 is attached to the upper end of the spiral blade 22, and by driving a drive mechanism 23, bevel gears 25, 26
And a gear 27. However, in the case of this publication, a driving mechanism and a gear mechanism for rotating the spiral blade are required, and there is a disadvantage that the structure of the coating apparatus is complicated. Further, in the case of the above publication, the spiral blade has an upper end protruding from the upper edge of the coating tank, so that when the spiral blade is applied to a dip coating apparatus, the overflow is not uniform, and the blade is easily rotated. In order to achieve this, it is necessary to provide a sufficient distance between the coating tank and the blade and between the blade and the substrate, which causes a problem that a sufficient swirling flow does not occur.
【0005】そのほか、特開昭64−75064号およ
び特開平3−20748号公報に記載のように、塗布槽
下部に円周流発生手段を設けて塗布液を撹拌する方法、
特開平2−9472号および特開平3−27048号公
報に記載のように、塗布液を旋回させながら塗布槽下部
から供給する方法が知られているが、これらの方法では
塗布液の旋回は塗布槽下部では発生するものの、塗布槽
上部のオーバーフロー部分では旋回効果が弱くなるとい
う問題があった。塗布液を旋回させるかわりに、特開平
1−171672号公報に記載のように、回転駆動部を
有する基体支持具により基体を回転させながら引き上げ
る方法も知られているが、やはり塗布装置が複雑になる
という問題があった。In addition, as described in JP-A-64-75064 and JP-A-3-20748, a method of stirring a coating liquid by providing a circumferential flow generating means below a coating tank,
As described in JP-A-2-9472 and JP-A-3-27048, there is known a method in which a coating solution is supplied from the lower portion of a coating tank while being swirled. Although it occurs in the lower part of the tank, there is a problem that the swirling effect is weakened in the overflow part in the upper part of the coating tank. Instead of swirling the coating solution, there is also known a method of pulling up while rotating the substrate by a substrate support having a rotation drive unit as described in JP-A-1-171672, but the coating device is also complicated. There was a problem of becoming.
【0006】[0006]
【発明が解決しようとする課題】本発明は、従来の技術
における上記の問題を解決することを目的としてなされ
たものである。すなわち、本発明の目的は、塗布層の円
周方向の膜厚むらを解消し、膜厚均一性を向上させるこ
とができる円筒基体の浸漬塗布方法を提供することにあ
る。本発明の他の目的は、円周方向の膜厚むらを解消
し、膜厚均一性を向上することができる簡単な構造の浸
漬塗布装置を提供することにある。SUMMARY OF THE INVENTION The present invention has been made to solve the above problems in the prior art. That is, an object of the present invention is to provide a dip coating method for a cylindrical substrate, which can eliminate unevenness in the thickness of a coating layer in the circumferential direction and improve the uniformity of the thickness. Another object of the present invention is to provide a dip coating apparatus having a simple structure capable of eliminating unevenness in circumferential thickness and improving uniformity of thickness.
【0007】[0007]
【課題を解決するための手段】本発明の円筒基体の浸漬
塗布方法は、下部から塗布液が供給され、上部からオー
バーフローしている塗布槽に円筒基体を浸漬し、次いで
引き上げることにより円筒基体に塗布液の塗布を行う方
法であって、内壁にらせん状のリブを有する塗布槽を使
用し、基体と塗布槽内壁との間の塗布液に旋回流を起こ
させながら基体を引き上げることを特徴とする。その
際、塗布層に気流を当てながら基体を引き上げることも
有効である。本発明の浸漬塗布方法は、特に感光ドラム
および現像スリーブ等、円周方向の膜厚むらの発生が問
題となる用途に用いる円筒基体の浸漬塗布に有効に適用
できる。According to the dip coating method for a cylindrical substrate of the present invention, the cylindrical substrate is immersed in a coating tank which is supplied with a coating liquid from the lower part and overflows from the upper part, and then is lifted up. A method for applying a coating liquid, wherein a coating tank having a spiral rib on an inner wall is used, and the substrate is pulled up while causing a swirling flow in the coating liquid between the substrate and the inner wall of the coating tank. I do. At that time, it is also effective to lift the substrate while applying an air current to the coating layer. The dip coating method of the present invention can be effectively applied particularly to dip coating of a cylindrical substrate used for applications in which the occurrence of uneven film thickness in the circumferential direction becomes a problem, such as a photosensitive drum and a developing sleeve.
【0008】本発明の浸漬塗布装置は、円筒基体を上下
方向に移動して塗布槽内に挿入可能に支持する支持部
材、下部に塗布液供給口を有し、上部にオーバーフロー
する塗布液を回収するための受け器を有する塗布槽、お
よび回収した塗布液を循環させるための循環手段を備え
たものであって、その塗布槽が内壁にらせん状のリブを
有することを特徴とする。The dip coating apparatus of the present invention has a support member for vertically moving a cylindrical substrate and supporting it so that it can be inserted into a coating tank, a coating liquid supply port at a lower part, and a coating liquid overflowing at an upper part is collected. And a circulating means for circulating the recovered coating liquid, wherein the coating tank has a spiral rib on the inner wall.
【0009】[0009]
【発明の実施の形態】図4は、本発明の浸漬塗布装置の
一例の概略構成図であって、浸漬塗布装置は、内壁にら
せん状のリブが設けられた塗布槽1と、案内管11、塗
布液回収タンク12、ポンプ13および配管14よりな
る塗布液循環手段と、被塗布物である円筒基体7を上下
に移動可能に支持する支持部材とより構成される。塗布
槽1は、後記するように内壁にらせん状のリブが設けら
れており、その下部には、塗布液6を供給するための供
給口が設けられ、配管14により、ポンプ13を介して
塗布液回収タンク12と連通している。また、塗布槽の
上部外周面には、オーバーフローする塗布液を保持する
ための受け器3が形成されている。受け器3には、案内
管11に連結した排出口が設けられ、回収された塗布液
が案内管を通って塗布液回収タンクに回収されるように
なっている。一方、円筒基体7は、支持部材8に支持さ
れ、モーター15とボールねじ16により上下に移動す
るように構成されている。FIG. 4 is a schematic diagram showing an example of a dip coating apparatus according to the present invention. The dip coating apparatus comprises a coating tank 1 having an inner wall provided with spiral ribs, and a guide tube 11. A coating liquid circulating means including a coating liquid recovery tank 12, a pump 13, and a pipe 14, and a support member for vertically supporting the cylindrical substrate 7, which is an object to be coated. The coating tank 1 is provided with a spiral rib on its inner wall as described later, and a supply port for supplying the coating liquid 6 is provided below the rib. It communicates with the liquid recovery tank 12. A receiver 3 for holding the overflowing coating liquid is formed on the upper outer peripheral surface of the coating tank. The receiver 3 is provided with a discharge port connected to the guide tube 11 so that the recovered coating liquid passes through the guide tube and is recovered in the coating liquid recovery tank. On the other hand, the cylindrical base 7 is supported by a support member 8 and is configured to move up and down by a motor 15 and a ball screw 16.
【0010】図1は、本発明において使用される塗布槽
の一例の概略図であって、塗布槽1は、下部に塗布液を
供給するための供給口2が設けられ、上部外周面には、
オーバーフローする塗布液を保持するための受け器3が
設けられている。また、塗布槽の内壁には、らせん状の
リブ4が設けられている。この塗布槽において、塗布液
は塗布槽下部の供給口から供給され、上縁からオーバー
フローし、受け器3で回収され、排出口5から排出さ
れ、循環される。FIG. 1 is a schematic view of an example of a coating tank used in the present invention. The coating tank 1 is provided with a supply port 2 for supplying a coating liquid at a lower part, and is provided at an upper outer peripheral surface. ,
A receiver 3 for holding the overflowing coating liquid is provided. A spiral rib 4 is provided on the inner wall of the coating tank. In this coating tank, the coating liquid is supplied from a supply port at the lower part of the coating tank, overflows from the upper edge, is collected by the receiver 3, is discharged from the discharge port 5, and is circulated.
【0011】塗布槽の内径は、基体外径より20〜10
0mm大きいものであればよい。塗布槽の内壁に設けら
れるらせん状のリブ4としては、板状のものが2以上の
複数条あればよく、その傾きは任意に設定できる。リブ
の設定位置に関しては、リブ上端が塗布槽の上縁から1
0〜20mm下に位置するように形成するのが好まし
い。リブの上端が塗布槽の上縁からはみ出ていると、そ
の部分で塗布液のオーバーフローが遮られ、また、塗布
槽の上縁の直下に位置していると、塗布液の流れに乱れ
が生じるからである。また、リブ下端の位置は任意であ
る。The inner diameter of the coating tank is 20 to 10 times smaller than the outer diameter of the substrate.
What is necessary is just to be 0 mm larger. As the spiral rib 4 provided on the inner wall of the coating tank, two or more plate-shaped ribs may be used, and the inclination thereof can be arbitrarily set. Regarding the setting position of the rib, the upper end of the rib is 1
It is preferable to form it so as to be located at 0 to 20 mm below. If the upper end of the rib protrudes from the upper edge of the coating tank, the overflow of the coating liquid is blocked at that portion, and if the rib is located immediately below the upper edge of the coating tank, the flow of the coating liquid is disturbed. Because. The position of the rib lower end is arbitrary.
【0012】図2は、円筒基体を塗布液に浸漬した状態
を示す塗布槽の断面図である。図中、6は塗布液、7は
円筒基体、8は支持部材であり、他の符号は図1と同一
のものを意味する。浸漬塗布は、円筒基体7を支持部材
8に取り付け、塗布液6に浸漬した後、所定速度で引き
上げることにより行われるが、円筒基体を浸漬しない状
態では、塗布液は塗布槽の中央部を流れていて、特に旋
回することはない。ところが、円筒基体7を浸漬し、引
き上げると、塗布液6は円筒基体と塗布槽内壁との間隙
を流れることになり、そして内壁にはらせん状のリブ4
が存在するので、塗布液はらせん状に旋回しながら流れ
るようになる。したがって、塗布液の旋回を促進するた
めには、リブと円筒基体との間隔は狭い方が好ましく、
通常1〜5mm程度が好適である。浸漬塗布に際して
は、塗布液の供給量が多いほどリブによる塗布液の旋回
が強くなり、塗布液は均質化されるが、塗布液供給量が
多すぎるとオーバーフロー面が波立つので、波立たない
範囲内で供給量を多くするのが好ましい。FIG. 2 is a sectional view of the coating tank showing a state where the cylindrical substrate is immersed in a coating liquid. In the figure, reference numeral 6 denotes a coating solution, 7 denotes a cylindrical base, 8 denotes a support member, and other reference numerals mean the same as those in FIG. The dip coating is performed by attaching the cylindrical substrate 7 to the support member 8 and immersing it in the coating liquid 6 and then pulling it up at a predetermined speed. However, when the cylindrical substrate is not immersed, the coating liquid flows through the center of the coating tank. It does not turn especially. However, when the cylindrical base 7 is immersed and pulled up, the coating liquid 6 flows through the gap between the cylindrical base and the inner wall of the coating tank, and the spiral rib 4
Is present, the coating liquid flows while spiraling. Therefore, in order to promote the rotation of the coating liquid, it is preferable that the interval between the rib and the cylindrical base is small,
Usually, about 1 to 5 mm is preferable. At the time of dip coating, the larger the supply amount of the coating liquid, the stronger the swirling of the coating liquid by the ribs, and the coating liquid is homogenized. However, if the supply amount of the coating liquid is too large, the overflow surface is wavy, so that it is not wavy. It is preferable to increase the supply amount within the range.
【0013】図3は、本発明の他の実施例を示す塗布槽
の説明図である。この実施例においては、リブを塗布槽
の内壁に直接形成する代わりに、内壁にリブ4を取り付
けた環状の旋回流発生治具9を塗布槽1の上部内側に嵌
めることによって、塗布槽内壁にらせん状のリブを設け
ている。この実施例の場合、塗布槽としては、リブを有
しない従来の塗布槽を流用することが可能である。FIG. 3 is an explanatory view of a coating tank showing another embodiment of the present invention. In this embodiment, instead of forming the rib directly on the inner wall of the coating tank, an annular swirling flow generating jig 9 having the rib 4 attached to the inner wall is fitted inside the upper part of the coating tank 1 so that the inner wall of the coating tank is formed. A helical rib is provided. In the case of this embodiment, a conventional coating tank having no rib can be used as the coating tank.
【0014】一般に、円周方向のむらは、膜厚10μm
以上の塗布層で発生しやすいが、そのような塗布層とし
ては、有機感光(OPC)ドラムの電荷輸送層(CT
L)が代表的である。CTLは、ベンジジン化合物また
はヒドラゾン化合物等の電荷輸送材料をポリカーボネー
トやポリアリレート等の成膜性樹脂と共に溶剤に溶解
し、電荷発生層(CGL)の上に形成される。CGLは
フタロシアニンまたはペリレン等の電荷発生顔料をポリ
ビニルブチラールまたはポリエステル等のバインダー樹
脂溶液に分散して塗布液とし、必要に応じて下引き層を
形成した円筒基体上に形成される。CGLの膜厚は一般
的に0.05〜0.5μmであり、塗布液の粘度が低い
ので、よく流動撹拌されて浸漬塗布しても円周方向のむ
らはあまり問題とならないが、CTLは電荷を保持する
ために膜厚が通常10〜35μmと厚く、塗布液の粘度
も高いので撹拌されにくく、むらの発生が問題となる。
本発明の方法によれば、膜厚むらに対する要求値が1μ
m以下の場合でも、その要求値を満たすことが可能であ
る。Generally, circumferential unevenness is 10 μm thick.
Such a coating layer is likely to occur in the above-mentioned coating layer.
L) is representative. The CTL is formed on a charge generation layer (CGL) by dissolving a charge transport material such as a benzidine compound or a hydrazone compound in a solvent together with a film-forming resin such as polycarbonate or polyarylate. CGL is formed by dispersing a charge-generating pigment such as phthalocyanine or perylene in a binder resin solution such as polyvinyl butyral or polyester to form a coating solution and, if necessary, on a cylindrical substrate having an undercoat layer formed thereon. The thickness of the CGL is generally 0.05 to 0.5 μm, and the viscosity of the coating solution is low. Therefore, even if it is well flow-stirred and immersion-coated, the circumferential unevenness does not cause much problem. The thickness of the coating solution is usually as thick as 10 to 35 μm, and the viscosity of the coating solution is high, so that it is difficult to stir, and there is a problem of unevenness.
According to the method of the present invention, the required value for the film thickness unevenness is 1 μm.
Even in the case of m or less, the required value can be satisfied.
【0015】本発明の浸漬塗布方法が好適に使用できる
膜厚10μm以上の他の塗布層としては、例えばカーボ
ン等の導電性微粒子を含有した樹脂層(特開平1−27
6174号公報参照)、二硫化モリブデンを含有した被
膜(特開平3−11380号公報参照)など、円筒基体
表面に被膜を形成した現像用スリーブ(コートスリー
ブ)の被覆層があげられる。これらの被覆層は現像ゴー
ストを防止するために設けられるものであり、膜厚は通
常5〜50μmであるが、10μm以上の場合に本発明
を適用するのが好ましい。As another coating layer having a film thickness of 10 μm or more that can be suitably used in the dip coating method of the present invention, for example, a resin layer containing conductive fine particles such as carbon (Japanese Patent Laid-Open No. 1-27-27)
No. 6174), and a coating layer of a developing sleeve (coat sleeve) in which a film is formed on the surface of a cylindrical substrate, such as a film containing molybdenum disulfide (see Japanese Patent Application Laid-Open No. 3-1380). These coating layers are provided in order to prevent development ghosts and have a film thickness of usually 5 to 50 μm, but it is preferable to apply the present invention when the thickness is 10 μm or more.
【0016】本発明において、塗布層の乾燥を促進して
液だれを低減させるために、気流を当てながら円筒基体
を引き上げることも効果的である。気流を当てる際、円
筒基体の接線方向に円周流として当てる方法をとれば、
基体周方向の膜厚むらを防止することができるという利
点もある。(特開平3−213171号公報、特開平4
−29773号公報参照)In the present invention, it is also effective to raise the cylindrical substrate while applying an air current in order to promote drying of the coating layer and reduce dripping. When applying airflow, if the method of applying as a circumferential flow in the tangential direction of the cylindrical substrate,
There is also an advantage that unevenness in film thickness in the circumferential direction of the substrate can be prevented. (JP-A-3-213171, JP-A-4
-29773)
【0017】[0017]
実施例1 外径30mm、内径28.5mm、長さ258mmのア
ルミニウム円筒基体の表面をホーニング加工によって粗
面化した後、1μm厚のタイプ8ナイロン樹脂の下引き
層を形成した。一方、ポリビニルブチラール樹脂(商品
名:BM−1、積水化学社製)1部(重量部、以下同
じ)をシクロヘキサノン19部に溶解し、クロロガリウ
ムフタロシアニン3部を加えてサンドミルで分散した。
更に2−ブタノン20部を加えて塗布液とし、下引き層
上に浸漬塗布し、100℃で5分間乾燥して、0.1μ
m厚のCGLを形成した。下引き層とCGLは膜厚が薄
いので円周方向のむらが問題となることがないため、通
常の方法で浸漬塗布した。Example 1 The surface of an aluminum cylindrical substrate having an outer diameter of 30 mm, an inner diameter of 28.5 mm, and a length of 258 mm was roughened by honing, and a subbing layer of type 8 nylon resin having a thickness of 1 μm was formed. On the other hand, 1 part (parts by weight, hereinafter the same) of a polyvinyl butyral resin (trade name: BM-1, manufactured by Sekisui Chemical Co., Ltd.) was dissolved in 19 parts of cyclohexanone, and 3 parts of chlorogallium phthalocyanine was added and dispersed by a sand mill.
Further, 20 parts of 2-butanone was added to prepare a coating solution, which was dip-coated on the undercoat layer, dried at 100 ° C. for 5 minutes, and dried at 0.1 ° C.
An m-thick CGL was formed. Since the undercoat layer and the CGL are thin, there is no problem of unevenness in the circumferential direction. Therefore, dip coating was performed by a usual method.
【0018】次いで、N,N′−ジフェニル−N,N′
−(m−トリル)ベンジジン36部とポリカーボネート
Z樹脂64部をモノクロロベンゼン300部に溶解して
CTL形成用塗布液とした。この塗布液を浸漬塗布装置
内で1.5リットル/分の供給量で循環させた。塗布槽
は、高さ350mm、内径60mmの円筒形のもので、
内壁には幅13mmのらせん状のリブを、上縁から20
mmの位置から200mmまでの位置に3本形成した。
CGLまでの各層が形成された円筒基体を支持部材にチ
ャッキングし、塗布液に浸漬し、150mm/分の速度
で引き上げて塗布した。円筒基体とらせん状のリブとの
間隔は2mmであり、塗布液は主にリブとリブとの間を
流れ、旋回流を生じながらオーバーフローしていた。塗
布後、115℃で40分間の乾燥をしてCTLを形成し
た。CTLの膜厚を測定すると、円周方向でほぼ20μ
mとなっており、むらは発生していなかった。この感光
ドラムをカラー複写装置に装着して画像複写試験を行っ
たところ、特にむらが現れることはなく、良好な画質の
画像が得られた。Next, N, N'-diphenyl-N, N '
36 parts of (m-tolyl) benzidine and 64 parts of polycarbonate Z resin were dissolved in 300 parts of monochlorobenzene to prepare a coating liquid for CTL formation. This coating liquid was circulated in the dip coating apparatus at a supply rate of 1.5 liter / min. The coating tank is a cylindrical one with a height of 350 mm and an inner diameter of 60 mm.
Spiral ribs with a width of 13 mm on the inner wall, 20 mm from the upper edge
Three pieces were formed at a position from the position of mm to 200 mm.
The cylindrical substrate on which each layer up to the CGL was formed was chucked to a support member, immersed in a coating solution, and pulled up at a rate of 150 mm / min for coating. The interval between the cylindrical substrate and the spiral rib was 2 mm, and the coating liquid mainly flowed between the ribs and overflowed while generating a swirling flow. After the application, the coating was dried at 115 ° C. for 40 minutes to form CTL. When the thickness of the CTL was measured, it was found to be approximately 20 μm in the circumferential direction.
m, and no unevenness occurred. When the photosensitive drum was mounted on a color copying machine and subjected to an image copying test, no unevenness was observed, and an image of good quality was obtained.
【0019】比較例1 実施例1において、CTLを塗布する際に、らせん状の
リブを形成していない塗布槽を使用した以外は、全て同
様にしてOPC感光ドラムを作製した。CTL形成後、
その膜厚を測定したところ、円周方向で1.5μmのむ
らが認められた。Comparative Example 1 An OPC photosensitive drum was manufactured in the same manner as in Example 1, except that a coating tank having no spiral rib was used when applying CTL. After CTL formation,
When the film thickness was measured, unevenness of 1.5 μm was recognized in the circumferential direction.
【0020】この感光ドラムをカラー複写装置に装着し
て画像複写試験を行ったところ、CTLの膜厚むらに対
応してハーフトーン画像に微妙な濃度のむらが生じた。
但しこの感光ドラムも、文字画像を主に出力するレーザ
ープリンターに使用した場合はむらが問題となることは
なかった。従来は、OPC感光ドラムをカラー複写装置
に使用する機会が少なかったので、膜厚むらに起因する
濃度のむらが検出されることがなかったものと思われ
る。When the photosensitive drum was mounted on a color copying machine and subjected to an image copying test, a slight density unevenness occurred in the halftone image corresponding to the uneven thickness of the CTL.
However, when this photosensitive drum was used in a laser printer that mainly outputs character images, unevenness did not cause a problem. Conventionally, since the OPC photosensitive drum was rarely used in a color copying apparatus, it is considered that density unevenness due to uneven film thickness was not detected.
【0021】実施例2 図3に示すように、らせん状のリブを形成していない高
さ350mm、内径60mmの円筒形の塗布槽1に、内
壁にリブ4を取り付けた環状の旋回流発生治具9を嵌め
た。旋回流発生治具として、リブが上縁から20mmの
位置から100mmまでの間に12本形成されているも
のを用いた。この塗布槽を使用して実施例1と同様にC
TLを塗布形成したところ、同様に膜厚のむらは発生し
なかった。Embodiment 2 As shown in FIG. 3, an annular swirling flow generating jig having a rib 4 attached to an inner wall thereof is provided in a cylindrical coating tank 1 having a height of 350 mm and an inner diameter of 60 mm without a spiral rib. The tool 9 was fitted. As the swirling flow generating jig, one having twelve ribs formed from a position 20 mm from the upper edge to 100 mm from the upper edge was used. Using this coating tank, C
When TL was applied and formed, no unevenness in film thickness similarly occurred.
【0022】[0022]
【発明の効果】本発明の浸漬塗布方法によれば、内壁に
らせん状のリブを設けた塗布槽を有する簡単な構造の浸
漬塗布装置を用いることにより、円筒基体に厚膜塗布液
の浸漬塗布を行っても、円周方向の膜厚むらの発生を防
止することができ、10μm以上の厚膜を形成する場合
であっても、均一な膜厚の塗膜を形成することができ
る。According to the dip coating method of the present invention, by using a dip coating apparatus having a simple structure having a coating tank provided with helical ribs on the inner wall, dip coating of a thick film coating liquid on a cylindrical substrate is performed. Is performed, it is possible to prevent the occurrence of uneven film thickness in the circumferential direction, and it is possible to form a coating film having a uniform thickness even when a thick film having a thickness of 10 μm or more is formed.
【図1】 本発明の浸漬塗布方法に使用される塗布槽の
概略構成図である。FIG. 1 is a schematic configuration diagram of a coating tank used in a dip coating method of the present invention.
【図2】 本発明において円筒基体が塗布液中に浸漬さ
れた状態の塗布槽を示す断面図である。FIG. 2 is a cross-sectional view showing a coating tank in a state where a cylindrical substrate is immersed in a coating liquid in the present invention.
【図3】 本発明における塗布槽の他の実施例の概略構
成図である。FIG. 3 is a schematic configuration diagram of another embodiment of a coating tank in the present invention.
【図4】 本発明の浸漬塗布装置の一例の概略構成図で
ある。FIG. 4 is a schematic configuration diagram of an example of a dip coating apparatus of the present invention.
【図5】 従来の塗布槽の概略構成図である。FIG. 5 is a schematic configuration diagram of a conventional coating tank.
1…塗布槽、2…供給口、3…受け器、4…リブ、5…
排出口、6…塗布液、7…円筒基体、8…支持部材、9
…旋回流発生治具、11…案内管、12…塗布液回収タ
ンク、13…ポンプ、14…配管、15…モーター、1
6…ボールねじ、、20…塗布槽、21…シール部材、
22…らせん状の羽根、23…駆動機構、24…歯車、
25,26…傘歯車、27…歯車。DESCRIPTION OF SYMBOLS 1 ... Application tank, 2 ... Supply port, 3 ... Receiver, 4 ... Rib, 5 ...
Discharge port, 6: coating liquid, 7: cylindrical substrate, 8: support member, 9
... Swirl flow generating jig, 11 ... Guide tube, 12 ... Coating liquid recovery tank, 13 ... Pump, 14 ... Piping, 15 ... Motor, 1
6 ball screw, 20 coating tank, 21 seal member,
22: spiral blade, 23: drive mechanism, 24: gear,
25, 26: bevel gear, 27: gear.
Claims (4)
ーバーフローしている塗布槽中の塗布液に円筒基体を浸
漬し、次いで引き上げることにより円筒基体に塗布液を
塗布する浸漬塗布方法において、内壁にらせん状のリブ
を有する塗布槽を使用し、基体と塗布槽内壁との間の塗
布液に旋回流を起こさせながら基体を引き上げることを
特徴とする浸漬塗布方法。1. A dip coating method in which a coating liquid is supplied from a lower part and is immersed in a coating liquid in a coating tank overflowing from an upper part and then pulled up to apply the coating liquid to the cylindrical base. A dip coating method comprising using a coating tank having spiral ribs and raising the base while causing a swirling flow in the coating liquid between the base and the inner wall of the coating tank.
項1記載の浸漬塗布方法。2. The dip coating method according to claim 1, wherein the cylindrical substrate is a substrate for a photosensitive drum.
求項1記載の浸漬塗布方法。3. The dip coating method according to claim 1, wherein the cylindrical substrate is a substrate for a developing sleeve.
に挿入可能に支持する支持部材、下部に塗布液供給口を
有し、上部にオーバーフローする塗布液を回収するため
の受け器を有する塗布槽、および回収した塗布液を循環
させるための循環手段を備えた浸漬塗布装置において、
該塗布槽が内壁にらせん状のリブを有することを特徴と
する浸漬塗布装置。4. A support member for vertically moving a cylindrical substrate and supporting it so as to be insertable into a coating tank, and a receiver having a coating liquid supply port at a lower part and collecting an overflowing coating liquid at an upper part. In a dip coating apparatus having a coating tank having, and a circulating means for circulating the collected coating liquid,
A dip coating apparatus, wherein the coating tank has a spiral rib on an inner wall.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP7874797A JPH10272397A (en) | 1997-03-31 | 1997-03-31 | Method and device for immersing coating of cylindrical body |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP7874797A JPH10272397A (en) | 1997-03-31 | 1997-03-31 | Method and device for immersing coating of cylindrical body |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| JPH10272397A true JPH10272397A (en) | 1998-10-13 |
Family
ID=13670490
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP7874797A Pending JPH10272397A (en) | 1997-03-31 | 1997-03-31 | Method and device for immersing coating of cylindrical body |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JPH10272397A (en) |
-
1997
- 1997-03-31 JP JP7874797A patent/JPH10272397A/en active Pending
Similar Documents
| Publication | Publication Date | Title |
|---|---|---|
| US7129012B2 (en) | Electrophotographic photosensitive member, process cartridge, and electrophotographic apparatus | |
| JP2004246124A (en) | Honing method and method for manufacturing of electrophotographic photoreceptor | |
| JP2004279918A (en) | Electrophotographic photoreceptor coating method and coating apparatus | |
| JPH10254149A (en) | Manufacture of photoreceptor drum | |
| JP3654320B2 (en) | Immersion coating method for cylindrical substrate | |
| JP4342750B2 (en) | A coating apparatus for forming an electrophotographic photoreceptor coating film, a coating method, and a method for producing an electrophotographic photoreceptor. | |
| US7361439B2 (en) | Lathe surface for coating streak suppression | |
| JP4640167B2 (en) | Electrophotographic photosensitive member, manufacturing method and manufacturing apparatus thereof, and image forming apparatus | |
| JP2005208620A (en) | Electrophotographic photosensitive member, process cartridge, and electrophotographic apparatus | |
| EP1586951B1 (en) | Method and device for applying an electrophotographic photoreceptor layer onto a substrate | |
| JP2002174920A (en) | Electrophotographic photoreceptor, process cartridge and electrophotographic apparatus | |
| JP2003202691A (en) | Electrophotographic photoreceptor, method of manufacturing the electrophotographic photoreceptor, process cartridge having the electrophotographic photoreceptor, and electrophotographic apparatus | |
| JPH05281757A (en) | Method for regenerating electrophotographic sensitive body | |
| JP2986004B2 (en) | Electrophotographic photoreceptor manufacturing apparatus and manufacturing method | |
| JPH0651545A (en) | Method for manufacturing organic electrophotographic photoreceptor | |
| JP2013003397A (en) | Coating device, method for manufacturing electrophotographic photoreceptor, electrophotographic photoreceptor, and image forming apparatus | |
| JP2005346048A (en) | Electrophotographic photoreceptor manufacturing apparatus and manufacturing method | |
| JP2002189305A (en) | Electrophotographic photoreceptor manufacturing apparatus and manufacturing method | |
| JP2013246391A (en) | Coated film removal device, method of manufacturing photosensitive drum, photosensitive drum, and image forming device equipped with photosensitive drum | |
| JP2007127922A (en) | Electrophotographic photoreceptor manufacturing apparatus and manufacturing method | |
| JP2000305287A (en) | Apparatus for treating end face of substrate in organic photoreceptor manufacturing apparatus, organic photoreceptor and method for manufacturing the same | |
| JP2005077620A (en) | Method for producing electrophotographic photoreceptor and photoreceptor | |
| JP2007275865A (en) | Coating apparatus and coating method using the same | |
| JP2001100444A (en) | Electrophotographic copying device | |
| JP2005326821A (en) | Electrophotographic photoreceptor coating method and coating apparatus |