JPH10273385A - Apparatus for pulling single crystal - Google Patents

Apparatus for pulling single crystal

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Publication number
JPH10273385A
JPH10273385A JP9139297A JP9139297A JPH10273385A JP H10273385 A JPH10273385 A JP H10273385A JP 9139297 A JP9139297 A JP 9139297A JP 9139297 A JP9139297 A JP 9139297A JP H10273385 A JPH10273385 A JP H10273385A
Authority
JP
Japan
Prior art keywords
crystal
single crystal
pulling
dislocation
free
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP9139297A
Other languages
Japanese (ja)
Inventor
Junichi Matsubara
順一 松原
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Super Silicon Crystal Research Institute Corp
Original Assignee
Super Silicon Crystal Research Institute Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Super Silicon Crystal Research Institute Corp filed Critical Super Silicon Crystal Research Institute Corp
Priority to JP9139297A priority Critical patent/JPH10273385A/en
Publication of JPH10273385A publication Critical patent/JPH10273385A/en
Pending legal-status Critical Current

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  • Crystals, And After-Treatments Of Crystals (AREA)

Abstract

PROBLEM TO BE SOLVED: To provide an apparatus for pulling a single crystal so as to afford an always stable holding state even when the objective cross-sectional shape of the dislocation-free crystal at the holding position is any one. SOLUTION: This apparatus for pulling a single crystal comprises tip members 3 of holding means, occupying regions thereof brought into contact with the surface of the crystal when holding the crystal and provided with each bag 4 made of a metal manifesting the flexibility at the ambient temperature when holding the crystal and plural granular materials 7, enclosed in the bag 4 made of the metal and having the higher melting point than that of the single crystal in the apparatus for pulling the single crystal according to the Czochraslki process in order to hold the dislocation-free crystal part after achieving the dislocation-free state by the Dash neck method with the holding means 1 and grow the single crystal while pulling the single crystal with a driving means.

Description

【発明の詳細な説明】DETAILED DESCRIPTION OF THE INVENTION

【0001】[0001]

【発明の属する技術分野】本発明はシリコン等の単結晶
成長時の引上げに用いるものであり、特に、大口径半導
体単結晶引上炉用の単結晶引上装置に関するものであ
る。
BACKGROUND OF THE INVENTION 1. Field of the Invention The present invention relates to a single crystal pulling apparatus for a large diameter semiconductor single crystal pulling furnace, and more particularly to a single crystal pulling apparatus for a large diameter semiconductor single crystal pulling furnace.

【0002】[0002]

【従来の技術】半導体結晶として用いられる例えばシリ
コン結晶の製造方法一つとして、単結晶を引上げること
によって製造する、所謂CZ(Czochralski:チョクラル
スキー) 法がある。これは、不活性ガスチャンバー炉内
のるつぼ中で塊粒状多結晶シリコンを加熱溶融し、この
溶融シリコンに種単結晶を接触させた後、冷却しつつ、
回転させながらゆっくり種結晶を上昇させ、種結晶下で
いったん結晶を細く絞って(種しぼり)成長させること
により転位を結晶側面に交わらせて無転位領域を形成し
(ダッシュネック法)、さらに無転位単結晶を引き上げ
て成長せしめる方法である。
2. Description of the Related Art As one method of manufacturing a silicon crystal used as a semiconductor crystal, for example, there is a so-called CZ (Czochralski) method of manufacturing by pulling a single crystal. This is to heat and melt the bulk polycrystalline silicon in a crucible in an inert gas chamber furnace, and after contacting the seed single crystal with this molten silicon, while cooling,
The seed crystal is slowly raised while rotating, and once grown under the seed crystal, the crystal is squeezed narrowly (seeding) to cause dislocations to cross the crystal side surface to form a dislocation-free region (dash neck method). This is a method in which dislocation single crystals are pulled up and grown.

【0003】単結晶引上げのためには、従来から単結晶
引上げ装置が用いられている。この装置は、主に、種結
晶の固定取り付け部を下端に備えたワイヤーを、その軸
心方向に自転させながら巻き取る構成を持つものであ
る。
A single crystal pulling apparatus has been used for pulling a single crystal. This device mainly has a configuration in which a wire having a fixed attachment portion for a seed crystal at its lower end is wound while rotating in the axial direction thereof.

【0004】[0004]

【発明が解決しようとする課題】近年、半導体装置の回
路集積量の増大に伴う大型化に応じて、半導体装置製造
の高効率化を図るために、単結晶は、例えば径16イン
チ以上と大径化の傾向にある。従って、引上げ単結晶も
大重量化することになる。しかし、上記の如き引上げ装
置のワイヤによる種結晶部での引上げでは、耐荷重に限
界があり、大重量単結晶を引き上げることはできない。
In recent years, in order to increase the efficiency of semiconductor device manufacturing in accordance with the increase in the size of semiconductor devices due to the increase in the amount of circuit integration, single crystals have a large diameter of, for example, 16 inches or more. The diameter tends to increase. Therefore, the weight of the pulled single crystal is also increased. However, in the pulling of the seed crystal portion by the wire of the pulling device as described above, there is a limit in the load resistance, and it is impossible to pull a heavy single crystal.

【0005】そこで、種結晶下の単結晶上部に拡径した
後に縮径することによって頭部を形成し、この頭部のく
びれ部分を係合挟持する複数のキャッチャーアームを等
角度間隔で周状に持つ昇降軸を備えた装置が考えられて
いる。これは、複数のキャッチャーアームが互いに閉じ
て挟持することによって単結晶上部のくびれ部が把持さ
れるものである。
Therefore, the head is formed by expanding the diameter above the single crystal below the seed crystal and then reducing the diameter, and forming a plurality of catcher arms for engaging and clamping the narrow portion of the head at equal angular intervals. A device having an elevating shaft has been considered. In this method, a plurality of catcher arms are closed and clamped to each other to grip a constricted portion at the upper portion of the single crystal.

【0006】このようなキャッチャーアームによるくび
れ部の挟持は、通常、以下のような操作で行なわれる。
即ち、キャチャーアームの単結晶頭部に対する相対位置
関係を一定に保ちながら、所定の上昇速度による単結晶
のワイヤ引上げを維持しつつ、キャッチャーアームを、
その先端が予め挟持すべく定められたくびれ部上の接触
位置より下方位置に対向するような相対位置関係におい
て閉じ、閉状態となった後にキャッチャーアームの上昇
速度を単結晶の上昇速度より早めることによってキャッ
チャーアーム先端でくびれ部を前記所定の接触位置でキ
ャッチさせ、係合・挟持状態を得る。
[0006] The pinching of the constricted portion by the catcher arm is usually performed by the following operation.
That is, while maintaining the relative position of the catcher arm relative to the single crystal head constant, while maintaining the pulling of the single crystal wire at a predetermined rising speed, the catcher arm is
Close in a relative positional relationship such that the tip faces a lower position than the contact position on the constricted portion predetermined to be clamped in advance, and after the closed state, raise the catcher arm's rising speed faster than the rising speed of the single crystal. As a result, the constricted portion is caught at the predetermined contact position at the tip of the catcher arm, and an engaged / nipped state is obtained.

【0007】しかしながら、このようなキャッチャーア
ームによる単結晶くびれ部の把持においては、ほぼ等間
隔で隆起した晶癖線が現出するなど、くびれ部の断面形
状が単結晶毎に千差万別であって、各キャッチャーアー
ム先端のくびれ部分に対する当初の当接状態が不均一で
ある場合が多い。
However, when the constricted portion of a single crystal is gripped by such a catcher arm, the cross-sectional shape of the constricted portion varies from one single crystal to another, for example, a crystal habit line protruding at substantially equal intervals appears. In many cases, the initial contact state of the distal end of each catcher arm with the constricted portion is not uniform.

【0008】例えば、くびれ部のキャッチの際、複数の
キャッチャーアームのうちのいくつかが晶癖線の隆起部
にあたった状態で挟持され、他のキャッチャーアームの
先端がくびれ部から浮いた状態になるなど、不安定な挟
持状態ため、くびれ部のキャッチの際やその後の引上げ
操作が進行するなかで、各キャッチャーアームの間でく
びれ部がガタついたり、晶癖線の隆起部上にあったキャ
ッチャーアームの先端位置がこの隆起部から低い平坦部
へずれ落ちることもある。
For example, when catching a constricted portion, some of the plurality of catcher arms are clamped in a state where they hit the protruding portion of the crystal habit line, and the ends of the other catcher arms float from the constricted portion. Due to the unstable pinching state, the constriction was loose between the catcher arms during the catching of the constriction and during the subsequent pulling operation, and it was on the ridge of the crystal habit line. The tip position of the catcher arm may shift from the raised portion to a lower flat portion.

【0009】このようなキャッチ時や、引上げ作業中に
生じる、晶癖線の隆起等のくびれ部の断面形状が軸対象
でないことに起因するガタツキおよびずり落ちによる単
結晶全体へのショックは、単結晶の成長に悪影響を及ぼ
し、良好な大口径単結晶製造が妨げられてしまう。
A shock to the entire single crystal due to rattling or slipping due to the non-axiality of the cross-sectional shape of the constricted portion such as the bulge of the habit line generated during the catching or pulling operation is a problem. It adversely affects the growth of the crystal and hinders the production of a good large-diameter single crystal.

【0010】本発明は、上記問題点に鑑み、無転位結晶
の目的とする把持位置の断面形状がどのような形状であ
っても常に安定な挟持状態が得られるような単結晶引上
装置の提供を目的とする。
[0010] In view of the above problems, the present invention provides a single crystal pulling apparatus capable of always obtaining a stable holding state regardless of the cross-sectional shape of a target gripping position of a dislocation-free crystal. For the purpose of providing.

【0011】[0011]

【課題を解決するための手段】上記目的を達成するた
め、請求項1に記載の発明に係る単結晶引上装置では、
ダッシュネック法により無転位化を達成した後の無転位
結晶部分を把持して結晶成長を続けるチョクラルスキー
法による単結晶引上装置であって、無転位結晶を把持す
る把持手段と、前記結晶を把持した状態の把持手段を引
上げ方向へ移動させる駆動手段と、を備え、前記把持手
段は、前記結晶を把持する際に該結晶の表面と当接する
領域を占める先端部材を有し、この先端部材は、前記結
晶を把持する時の周辺温度において可撓性を示す金属製
袋と、この金属製袋内に内包された前記単結晶より融点
の高い複数の粒状物質とを備えたものである。
In order to achieve the above object, a single crystal pulling apparatus according to the first aspect of the present invention comprises:
A single crystal pulling apparatus by the Czochralski method of holding a dislocation-free crystal portion after achieving dislocation-free by the dash neck method and continuing the crystal growth, and holding means for holding a dislocation-free crystal, and the crystal Driving means for moving the gripping means in a state in which the crystal is gripped in the pulling direction, the gripping means having a tip member occupying an area in contact with the surface of the crystal when the crystal is gripped, The member is provided with a metal bag showing flexibility at an ambient temperature when the crystal is gripped, and a plurality of granular substances having a higher melting point than the single crystal contained in the metal bag. .

【0012】また、請求項2に記載の発明に係る単結晶
引装置では、請求項1に記載の単結晶引上装置におい
て、前記単結晶がSiであるとき、前記粒状物質はSi
Cであり、前記金属製袋はステンレス製であるものであ
る。
[0012] In the single crystal pulling apparatus according to the second aspect of the present invention, in the single crystal pulling apparatus according to the first aspect, when the single crystal is Si, the granular material is Si.
C, and the metal bag is made of stainless steel.

【0013】本発明は、ダッシュネック法により無転位
化を達成した後の無転位結晶を把持手段で把持し、この
結晶把持状態の把持手段を駆動手段で引上げながら単結
晶をを成長させる単結晶引上装置である。なお、ここで
いうダッシュネック法による無転位化とは、ダッシュ(D
ash)による無転位成長法に基づくものであり、種単結晶
を溶融シリコンに接触させた後、種結晶から結晶をいっ
たん細く絞って(種しぼり)成長させることにより転位
を結晶側面に交わらせて無転位領域を形成するものであ
る。
According to the present invention, there is provided a single crystal in which a dislocation-free crystal after achieving dislocation-free by the dash neck method is gripped by gripping means, and a single crystal is grown while pulling up the gripping means in this crystal gripping state by driving means. It is a lifting device. Note that dislocation-free by the dash neck method here means dash (D
ash), which is based on a dislocation-free growth method. After a seed single crystal is brought into contact with molten silicon, the crystal is squeezed from the seed crystal once to narrow (seed squeezing) and grow so that dislocations cross the side of the crystal. This forms a dislocation-free region.

【0014】さらに本発明の把持手段は、結晶を把持す
る際に結晶表面と当接する領域に、結晶を把持する時の
周辺温度において可撓性を示す金属製袋と、この金属製
袋内に内包された前記単結晶より融点の高い複数の粒状
物質とを備えた先端部材を有するものである。
Further, the gripping means of the present invention comprises: a metal bag which is flexible at a peripheral temperature when the crystal is gripped; A tip member including a plurality of granular substances having a melting point higher than that of the single crystal included therein.

【0015】このような本発明の構成においては、把持
手段によって結晶を把持しようとする時点では、先端部
材の金属製袋は可撓性を持ち、一方袋に内包されている
複数の粒状物質は周辺温度に影響なく、袋内において相
互に独立した流動性を持っている。従って、把持手段の
先端部材が単結晶をキャッチし把持した際には、この先
端部材が結晶に当接し、荷重作用は、金属袋を介して当
接側の粒状物質からその隣接する周囲の粒状物質へ順次
伝達・拡散される。
In such a configuration of the present invention, at the time when the crystal is to be gripped by the gripping means, the metal bag of the distal end member has flexibility, and the plurality of granular substances contained in the bag are formed of It has fluidity independent of each other in the bag, regardless of the ambient temperature. Therefore, when the tip member of the gripping means catches and holds the single crystal, the tip member abuts on the crystal, and the load acts from the granular material on the abutting side through the metal bag to the surrounding granular material. It is sequentially transmitted and diffused to the substance.

【0016】この荷重作用の伝達・拡散に従って、各粒
状物質は周縁方向へ移動するが、結晶表面と把持手段と
の間での把持圧と袋の周縁方向からの規制に対して粒状
物質全体の反作用がつりあった時点で移動が停止する。
このとき、先端部材の結晶との接触部は、その結晶表面
形状に応じた形状に変形した当接面が形成される。
According to the transmission / diffusion of the load action, each granular material moves in the peripheral direction. However, the gripping pressure between the crystal surface and the gripping means and the regulation from the peripheral direction of the bag cause the entire granular material to move. The movement stops when the reaction is balanced.
At this time, the contact portion of the tip member with the crystal has a contact surface deformed into a shape corresponding to the crystal surface shape.

【0017】従って、先端部材による接触は、対向する
結晶表面がどのような形状をしていてもそれに応じた形
状に変化した当接面による面接触となるため、従来のよ
うなキャッチャーアーム先端による点接触の場合に比べ
て格段に安定した把持状態となり、単結晶引上げが良好
に遂行される。
Therefore, the contact by the tip member is a surface contact by the contact surface changed into a shape corresponding to the shape of the opposing crystal surface regardless of the shape thereof, so that the conventional catcher arm tip is used. The gripping state is much more stable than in the case of point contact, and the single crystal is pulled well.

【0018】なお、単結晶引上げが進行するに従って引
上げ重量は増大していくが、それに従って先端部材のつ
ぶれが進行し過ぎないように、荷重作用がある重圧以
上、例えば単結晶把持の際の単結晶重量の2倍程度相当
以降では、それ以上先端部材に変形が生じないような強
度となるように、金属袋の厚みおよび粒状物質の粒径、
粒子の充填量などの設計を適宜選択する。
The pulling weight increases as the pulling of the single crystal progresses. However, in order to prevent the tip member from crushing too much, the load exerts a pressure equal to or higher than a certain pressure, for example, when the single crystal is gripped. After about twice the weight of the crystal, the thickness of the metal bag and the particle size of the particulate matter are adjusted so that the tip member does not deform any more.
The design such as the filling amount of the particles is appropriately selected.

【0019】先端部材の金属製袋としては、結晶を把持
する時の周辺温度において可撓性を示す金属からなるも
のであれば良く、一方、袋内に内包される粒状物質とし
ては、単結晶より高い融点、即ちくびれ部の挟持開始時
の周辺温度付近では影響を受けず溶融しないものであれ
ば良い。
As the metal bag of the tip member, any material may be used as long as it is made of a metal exhibiting flexibility at the ambient temperature when the crystal is gripped. On the other hand, the granular material contained in the bag is a single crystal. It is sufficient that the material does not melt without being affected by a higher melting point, that is, around the peripheral temperature at the start of pinching of the constricted portion.

【0020】たとえば、単結晶としてSiを引き上げる
際に、結晶を把持する時の周辺温度が800℃付近であ
れば、先端部材は、請求項2に記載したように、ステン
レス製袋にSiより融点の高いSiC製の粒状物質を多
数内包させてなるものが挙げられる。
For example, when pulling up Si as a single crystal, if the ambient temperature at the time of gripping the crystal is around 800 ° C., the tip member may have a melting point higher than that of Si in the stainless steel bag. And a large number of SiC granular substances having a high content.

【0021】なお、本発明における先端部材の被覆金属
の厚みは、結晶を把持する際には可撓性を示すことが必
要であると共に、その際の荷重作用で破れて中の物質が
露出することがないように充分な厚みに設定する必要が
ある。
The thickness of the coating metal of the tip member in the present invention is required to be flexible when gripping the crystal, and the thickness of the coating metal is broken by a load action to expose the substance therein. It is necessary to set the thickness to be sufficient to prevent the occurrence.

【0022】また、本発明の把持手段としては、例え
ば、基本的に従来のような複数のキャッチャーアームか
らなる構成が利用できる。各キャッチャーアームの下端
に本発明の先端部材を備えれば良い。この場合、既存の
キャチャーアームの下端部に適当な取付け手段を講じて
先端部材を取り付けることによっても構成することがで
きるので、装置設計は簡便である。先端部材のキャッチ
ャーアーム下端部への取り付けは、金属製袋を下端部に
溶接固定しても、また何等かの取り付け手段を用いて脱
着可能で交換できる構成としても良い。
Further, as the gripping means of the present invention, for example, a configuration basically including a plurality of catcher arms as in the related art can be used. What is necessary is just to provide the tip member of this invention in the lower end of each catcher arm. In this case, the device can be designed by attaching the tip member to the lower end of the existing catcher arm by using an appropriate attachment means, so that the device design is simple. The distal end member may be attached to the lower end of the catcher arm by welding and fixing the metal bag to the lower end, or may be configured to be detachable and replaceable by using any attaching means.

【0023】また、本発明の把持手段による把持位置
は、無転位化達成後に成長する単結晶のいずれの位置で
あったも良いが、例えばキャッチャーアームの配列な
ど、把持手段の設計は把持する単結晶の径に対応して決
定されるため、予め所望の単結晶把持位置とその径を設
定する。もちろん、従来と同様に、無転位化達成後に単
結晶の拡径と縮径によって頭部を形成し、頭部下のくび
れ部を挟持する設計としてもよい。
The gripping position of the gripping means of the present invention may be any position of the single crystal which grows after the dislocation-free state is achieved. Since it is determined according to the diameter of the crystal, a desired single crystal holding position and its diameter are set in advance. Of course, similarly to the conventional case, the head may be formed by expanding and reducing the diameter of the single crystal after achieving the dislocation-free state, and the constricted portion under the head may be sandwiched.

【0024】[0024]

【発明の実施の形態】以下に、本発明の実施の形態の一
例として、先端部材に、ステンレス袋にSiC粒子を充
填して封止したものを用い、且つ把持手段として複数の
キャッチャーアームを持つ構成の単結晶引上装置を図1
に示す。本実施形態においては、種結晶下の無転位達成
後に単結晶頭部を形成し、頭部下のくびれ部を把持する
場合を例として示す。
BEST MODE FOR CARRYING OUT THE INVENTION As an example of an embodiment of the present invention, a stainless steel bag filled with SiC particles and sealed is used as a tip member, and a plurality of catcher arms are provided as gripping means. Fig. 1 shows a single crystal pulling device
Shown in In the present embodiment, a case will be described as an example where a single crystal head is formed after dislocation-free under a seed crystal is achieved and a constricted portion under the head is gripped.

【0025】まず、予め、厚さ0.5mm〜5mm,容
積1ml〜20ml程度で、ネジ蓋6の螺合によって袋
が密封され得る粒子注入口5を持つステンレス袋4をス
テンレスパイプ等を利用して成形しておく。
First, a stainless steel bag 4 having a particle injection port 5 having a thickness of about 0.5 mm to 5 mm and a volume of about 1 ml to 20 ml and having a bag that can be hermetically sealed by screwing a screw cap 6 is used. And mold it.

【0026】このステンレス袋4を後述のキャッチャー
アーム1下端部2の把持状態にてくびれ部に対向する部
位に、一部領域を溶接することによって固定した後、注
入口5から粒径数μm〜数mmのSiC粒子7を充填
し、ネジ蓋6で密閉する。以上の操作によって先端部材
3のキャッチャーアーム1下端部2への取り付けが完了
したものとする。
The stainless steel bag 4 is fixed to a portion facing the constricted portion by welding the lower end portion 2 of the catcher arm 1 to be described later by welding a part of the region, and then a particle size of several μm A few mm of SiC particles 7 are filled and sealed with a screw cap 6. Assume that the attachment of the distal end member 3 to the lower end 2 of the catcher arm 1 has been completed by the above operation.

【0027】もちろん、先端部材3の取り付けは、本実
施形態のように、キャッチャーアーム1下端部2にステ
ンレス袋4を溶接・固定するものに限らず、適当な取り
付け手段を用いて着脱可能な構成としても良い。また、
粒子7充填後のステンレス袋4の密封は、上記ネジ式に
限らず、端結晶の挟持引上げ作業中にわたって粒子7が
ステンレス袋4からこぼれ出ない方法であれば、どのよ
うな密封方法でも良い。
Of course, the attachment of the tip member 3 is not limited to the method of welding and fixing the stainless steel bag 4 to the lower end portion 2 of the catcher arm 1 as in this embodiment, but can be attached and detached using appropriate attachment means. It is good. Also,
The sealing of the stainless steel bag 4 after filling the particles 7 is not limited to the above-mentioned screw type, and any sealing method may be used as long as the particles 7 do not spill out of the stainless steel bag 4 during the work of pinching and pulling the end crystals.

【0028】本引上装置は、図1に示すように、るつぼ
20中溶融シリコンに、種結晶14を接触させた後、ワ
イヤ11を不図示の巻上装置で引上げながら予め定めら
れた回転速度でワイヤ11を軸心回りに自転させながら
ゆっくり種結晶14を上昇させることによって、種結晶
14下に単結晶を成長せしめるチョクラルスキー法によ
る半導体単結晶引上炉用のものである。本装置は、種結
晶14の下部に成長する単結晶に拡径部と縮径部とから
なる頭部15のくびれ部16を形成させた後、このくび
れ部16を3つ以上のキャッチャーアーム下端部でラジ
アル方向から挟持して、結晶引上げを進める構成となっ
ている。
As shown in FIG. 1, after the seed crystal 14 is brought into contact with the molten silicon in the crucible 20, the pulling device pulls up the wire 11 with a hoisting device (not shown) and sets a predetermined rotation speed. This is for a semiconductor single crystal pulling furnace by the Czochralski method in which a single crystal is grown under the seed crystal 14 by slowly raising the seed crystal 14 while rotating the wire 11 around the axis. This apparatus forms a constricted portion 16 of a head portion 15 composed of an enlarged diameter portion and a reduced diameter portion on a single crystal grown below a seed crystal 14, and then connects the constricted portion 16 to the lower end of three or more catcher arms. The portion is held in the radial direction to advance the crystal pulling.

【0029】本引上装置では、3つ以上のキャッチャー
アーム1がその上端部で、互いに等角度間隔で配置され
るように吊持部(把持手段)13に開閉可能に枢支され
ており、キャッチャーアーム1には、上記のごとくそれ
ぞれ下端部2にステンレス袋4内にSiC粒子7が充填
されてなる先端部材3が取り付けられいる。吊持部13
における各上端部の枢支部を中心とした回動制御によっ
て、各キャッチャーアーム1の開閉が行なわれる。
In this lifting device, three or more catcher arms 1 are pivotally supported at their upper ends by a suspending portion (gripping means) 13 so as to be arranged at equal angular intervals from each other. As described above, the tip end members 3 each having the stainless steel bag 4 filled with the SiC particles 7 are attached to the catcher arm 1 at the lower end portion 2 as described above. Hanging part 13
The opening and closing of each of the catcher arms 1 is performed by the rotation control of the upper end portion about the pivot portion at.

【0030】この吊持部13は、ワイヤ11を同軸状に
内包しており、ワイヤ11の種結晶14引上げに機械的
に干渉することなく不図示の駆動装置(駆動手段)によ
って軸方向に移動されるものである。この吊持部13の
駆動装置による軸方向移動に伴って、各キャッチャーア
ーム1が一斉に結晶引上げ方向に移動される。
The suspending portion 13 includes the wire 11 coaxially and moves in the axial direction by a driving device (driving means) (not shown) without mechanically interfering with the pulling of the seed crystal 14 of the wire 11. Is what is done. Along with the axial movement of the suspension unit 13 by the driving device, the catcher arms 1 are simultaneously moved in the crystal pulling direction.

【0031】以上の如き構成をもつ引上装置の、大口径
半導体単結晶引上炉における単結晶引上げ動作を以下に
示す。まず、初期配置として、各キャッチャーアーム1
を開状態にした吊持部13を駆動装置によって上軸方向
に位置させておく。この初期配置において、巻上装置を
制御して、るつぼ20中の溶融シリコン(溶融液回転速
度0.1〜15rpm)に、ワイヤ11下端のカーボン
製シードチャック12に保持された種結晶14を接触さ
せる。
The single crystal pulling operation in the large diameter semiconductor single crystal pulling furnace of the pulling apparatus having the above-described configuration will be described below. First, as an initial arrangement, each catcher arm 1
Is held in the open state by the driving device. In this initial arrangement, the hoisting device is controlled to bring the seed crystal 14 held by the carbon seed chuck 12 at the lower end of the wire 11 into contact with the molten silicon (melt rotation speed 0.1 to 15 rpm) in the crucible 20. Let it.

【0032】その後、所定の回転速度約10rpmで引
上げワイヤ11を軸心方向に自転させつつ、同時に巻上
装置を制御して種結晶14が所定の上昇速度約3.0m
m/minで上昇するようにワイヤ11を引上げる。こ
の上昇によって種結晶14下端に直径約5mm程度の無
転位単結晶を成長せしめる。
Thereafter, while the pulling wire 11 is rotated in the axial direction at a predetermined rotational speed of about 10 rpm, the hoisting device is simultaneously controlled to raise the seed crystal 14 to a predetermined ascending speed of about 3.0 m.
The wire 11 is pulled up so as to rise at m / min. By this rise, a dislocation-free single crystal having a diameter of about 5 mm grows at the lower end of the seed crystal 14.

【0033】次いで、巻上装置を制御して上昇速度を約
0.5mm/minと低下させることによって単結晶直
径を増大させる。直径が約50mm程度にまで増大した
後、上昇速度を約1.0mm/minとし、単結晶を縮
径させる。以上の操作によって単結晶頭部15が形成さ
れる。単結晶が直径約30mmまで減少した後、さらに
巻上装置を制御して上昇速度を約0.5mm/minと
低下させて単結晶直径を製品直径(400mm)まで増
大させる。この拡径が進むと、頭部15下にくびれ部1
6が形成される。実際には、このような単結晶直径の制
御は、例えば光反射方式等を利用して経時的に単結晶の
直径を計測し、そのデータに基づいて各駆動装置相互の
駆動を制御することによって上昇及び回転速度の調整を
行なうプログラム、所謂、自動直径制御システムを用い
てコンピュータ等によって行なわれる。
Next, the diameter of the single crystal is increased by controlling the hoisting device to reduce the ascending speed to about 0.5 mm / min. After the diameter is increased to about 50 mm, the rate of rise is set to about 1.0 mm / min, and the diameter of the single crystal is reduced. The single crystal head 15 is formed by the above operation. After the single crystal has been reduced to a diameter of about 30 mm, the hoisting device is further controlled to reduce the ascending speed to about 0.5 mm / min to increase the single crystal diameter to the product diameter (400 mm). As the diameter increases, the constriction 1
6 are formed. In practice, such single crystal diameter control is performed by, for example, measuring the diameter of the single crystal with the lapse of time using a light reflection method or the like, and controlling the driving of each driving device based on the data. It is performed by a computer or the like using a program for adjusting the ascending and rotating speeds, that is, a so-called automatic diameter control system.

【0034】くびれ部16が形成された後、上記直径制
御システムによって所定の上昇速度を維持させながら単
結晶引上げが継続するように各駆動系を制御しつつ、吊
持部13を駆動させて各キャッチャーアーム1を閉状態
へ移行させる。このとき、各キャッチャーアーム1の単
結晶に対する相対位置は、閉状態なった際のキャッチャ
ーアーム下端部2(及び先端部材3)の単結晶に対向す
る位置が、くびれ部分16の各キャッチャーアーム下端
部2によって挟持されるべく定められた接触位置よりも
下方位置とする。従って、各キャッチャーアーム下端部
2の先端部材3どうしの相対間隔はくびれ部16の前記
所定の接触位置における直径に相当し、対向するくびれ
部16表面に対して僅かな間隙を持つ。
After the constricted portion 16 is formed, the hanging portion 13 is driven by controlling the driving systems so that the single crystal pulling is continued while maintaining the predetermined rising speed by the diameter control system. Move the catcher arm 1 to the closed state. At this time, the relative position of each catcher arm 1 with respect to the single crystal is such that the position of the lower end 2 of the catcher arm (and the tip member 3) facing the single crystal in the closed state is the lower end of each catcher arm of the constricted portion 16. 2 is a position below a contact position determined to be sandwiched. Accordingly, the relative distance between the distal end members 3 of the lower ends 2 of the catcher arms corresponds to the diameter of the constricted portion 16 at the predetermined contact position, and has a slight gap with respect to the surface of the opposing constricted portion 16.

【0035】次に、駆動装置による吊持部13の上軸方
向の移動速度を早めて、閉状態にある各キャッチャーア
ーム1の上軸方向へのるつぼ20内液面に対する移動速
度を単結晶頭部15のるつぼ20内液面に対する上昇速
度より早める。この速度制御によって、閉状態の各キャ
ッチャーアーム下端部2の先端部材3は、単結晶頭部1
5に対して上方向に相対移動し、前記くびれ部16の予
め定められた接触位置に接触する。即ち、各先端部材3
からみると、単結晶頭部15が落下するように下方へ相
対移動し、前記所定の接触位置でくびれ部16をキャッ
チすることとなる。
Next, the moving speed of the hanging portion 13 in the upper axis direction by the driving device is increased, and the moving speed of the catcher arm 1 in the closed state with respect to the liquid level in the crucible 20 in the upper axis direction is changed to the single crystal head. The rising speed of the part 15 with respect to the liquid level in the crucible 20 is increased. By this speed control, the tip member 3 of the lower end portion 2 of each catcher arm in the closed state moves the single crystal head 1
5 and moves in the upward direction, and comes into contact with a predetermined contact position of the constricted portion 16. That is, each tip member 3
When viewed from above, the single crystal head 15 relatively moves downward so as to drop, and catches the constricted portion 16 at the predetermined contact position.

【0036】このとき、先端部材3のステンレス袋4の
くびれ部16側は可撓性を持ち、くびれ部16をキャッ
チした瞬間、荷重作用を受けて撓みながら、この荷重作
用をステンレス袋7内のくびれ部16側に位置するSi
C粒子7へ伝達する。さらにステンレス袋7側のSiC
粒子7に伝達された荷重作用は、それに隣接する周囲の
SiC粒子7へと順次伝達・拡散される。
At this time, the constricted portion 16 side of the stainless steel bag 4 of the tip member 3 has flexibility, and when the constricted portion 16 is caught, it is subjected to a load action and bends. Si located on the constricted part 16 side
The light is transmitted to the C particles 7. Furthermore, SiC on the stainless steel bag 7 side
The load action transmitted to the particles 7 is sequentially transmitted and diffused to the surrounding SiC particles 7 adjacent thereto.

【0037】この荷重作用の伝達・拡散に従って、各S
iC粒子7は周縁方向へ移動するが、くびれ部16とア
ーム下端部2との間での挟持圧とステンレス袋4の周縁
方向からの規制に対して粒子7全体の反作用がつりあっ
た時点で移動が停止する。このとき、先端部材3のくび
れ部16との接触部には、くびれ部表面形状に応じた形
状に変形した当接面が形成される。
According to the transmission and diffusion of the load action, each S
The iC particles 7 move in the peripheral direction, but move when the whole reaction of the particles 7 is suspended against the clamping pressure between the constricted portion 16 and the lower end 2 of the arm and the regulation of the stainless bag 4 from the peripheral direction. Stops. At this time, a contact surface deformed into a shape corresponding to the constricted portion surface shape is formed at a contact portion of the distal end member 3 with the constricted portion 16.

【0038】このようなキャッチャーアーム下端部2の
先端部材3の面接触による安定した把持状態が得られた
時点で、所定の回転および上昇速度での引上げが継続す
るように駆動装置を吊持部13の上軸方向の移動を制御
しつつ、結晶引上げ作業を進める。
When a stable gripping state is obtained by the surface contact of the distal end member 3 of the lower end portion 2 of the catcher arm, the driving device is suspended so that the pulling at a predetermined rotation and a rising speed is continued. The crystal pulling operation is advanced while controlling the movement in the upper axis direction of the crystal 13.

【0039】以上のように、本実施形態の単結晶引上装
置によれば、くびれ部16をキャッチした際に先端部材
3へ係る衝撃は、SiC粒子7への荷重作用の伝達・拡
散によって吸収されると共に、接触部がくびれ部16の
表面形状に応じた面形状に変形し、面接触による挟持状
態が得られるので、くびれ部16がどのような断面形状
をしたものであっても、大口径半導体単結晶引上げにお
いて常に安定した把持状態による良好な引上げ作業を遂
行することができる。
As described above, according to the single crystal pulling apparatus of the present embodiment, when the constricted portion 16 is caught, the impact applied to the tip member 3 is absorbed by the transmission and diffusion of the load action to the SiC particles 7. At the same time, the contact portion is deformed into a surface shape corresponding to the surface shape of the constricted portion 16 and a sandwiched state by surface contact is obtained, so that no matter what cross-sectional shape the constricted portion 16 has, In pulling a semiconductor single crystal having a diameter, a favorable pulling operation can be performed with a stable gripping state at all times.

【0040】なお、本発明の把持手段は、上記実施形態
に示したように、キャッチャーアームからなる構成に限
定されるものではなく、機械的に単結晶を把んで引き上
げることができる機構であると共に、結晶との当接領域
に先端部材を備えることが可能なものであれば広く使用
可能である。
The holding means of the present invention is not limited to the structure including the catcher arm as shown in the above embodiment, but is a mechanism capable of mechanically grasping and pulling a single crystal. As long as the tip member can be provided in the contact region with the crystal, it can be widely used.

【0041】さらに、上記実施形態においては、種結晶
下の無転位化直後に単結晶頭部を形成し、この頭部下の
くびれ部を把持位置としたが、本発明は、これに限ら
ず、さらに単結晶の拡径化が進んだ時点で挟持を行なっ
ても良い。
Further, in the above embodiment, the single crystal head is formed immediately after dislocation-free under the seed crystal, and the constricted portion under this head is used as the gripping position. However, the present invention is not limited to this. Alternatively, the pinching may be performed when the diameter of the single crystal further increases.

【0042】[0042]

【発明の効果】本発明は以上説明したとおり、大口径単
結晶引上げにおいても、無転位結晶の目的とする把持位
置の形状に応じて常に安定した把持状態が得られ、良好
な結晶引上げ作業を遂行することができるという効果が
ある。
As described above, according to the present invention, even in pulling a large-diameter single crystal, a stable gripping state can always be obtained in accordance with the shape of the target gripping position of the dislocation-free crystal. There is an effect that it can be performed.

【図面の簡単な説明】[Brief description of the drawings]

【図1】本発明の一実施の形態による挟持装置を示す説
明図であり、(a)は装置の概略構成図、(b)は
(a)におけるキャッチャーアーム下端部付近の部分拡
大図である。
1A and 1B are explanatory views showing a holding device according to an embodiment of the present invention, wherein FIG. 1A is a schematic configuration diagram of the device, and FIG. 1B is a partially enlarged view of the vicinity of a lower end of a catcher arm in FIG. .

【符号の説明】[Explanation of symbols]

1:キャッチャーアーム 2:(キャッチャーアーム)下端部 3:先端部材 4:ステンレス袋 5:粒子注入口 6:ネジ蓋 7:SiC粒子 11:ワイヤ 12:シードチャック 14:種結晶 15:単結晶頭部 16:くびれ部 1: Catcher arm 2: Lower end of catcher arm 3: Tip member 4: Stainless steel bag 5: Particle inlet 6: Screw cap 7: SiC particle 11: Wire 12: Seed chuck 14: Seed crystal 15: Single crystal head 16: Constriction

Claims (2)

【特許請求の範囲】[Claims] 【請求項1】 ダッシュネック法により無転位化を達成
した後の無転位結晶部分を把持して結晶成長を続けるチ
ョクラルスキー法による単結晶引上装置であって、 無転位結晶を把持する把持手段と、 前記結晶を把持した状態の把持手段を引上げ方向へ移動
させる駆動手段と、を備え、 前記把持手段は、前記結晶を把持する際に該結晶の表面
と当接する領域を占める先端部材を有し、 この先端部材は、前記結晶を把持する時の周辺温度にお
いて可撓性を示す金属製袋と、この金属製袋内に内包さ
れた前記単結晶より融点の高い複数の粒状物質とを備え
たことを特徴とする単結晶引上装置。
An apparatus for pulling a single crystal by the Czochralski method, in which a dislocation-free crystal portion after achieving dislocation-free by a dash neck method and crystal growth is continued, wherein a grip for holding a dislocation-free crystal is provided. Means, and a driving means for moving the gripping means in a state of gripping the crystal in the pulling direction, wherein the gripping means includes a tip member occupying an area in contact with a surface of the crystal when gripping the crystal. The tip member includes a metal bag showing flexibility at an ambient temperature when the crystal is gripped, and a plurality of granular substances having a higher melting point than the single crystal contained in the metal bag. A single crystal pulling apparatus, comprising:
【請求項2】 前記単結晶がSiであるとき、前記粒状
物質はSiCであり、前記金属製袋はステンレス製であ
ることを特徴とする請求項1に記載の単結晶引上装置。
2. The single crystal pulling apparatus according to claim 1, wherein when the single crystal is Si, the granular material is SiC, and the metal bag is made of stainless steel.
JP9139297A 1997-03-27 1997-03-27 Apparatus for pulling single crystal Pending JPH10273385A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP9139297A JPH10273385A (en) 1997-03-27 1997-03-27 Apparatus for pulling single crystal

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP9139297A JPH10273385A (en) 1997-03-27 1997-03-27 Apparatus for pulling single crystal

Publications (1)

Publication Number Publication Date
JPH10273385A true JPH10273385A (en) 1998-10-13

Family

ID=14025121

Family Applications (1)

Application Number Title Priority Date Filing Date
JP9139297A Pending JPH10273385A (en) 1997-03-27 1997-03-27 Apparatus for pulling single crystal

Country Status (1)

Country Link
JP (1) JPH10273385A (en)

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