JPH10273384A - Apparatus for pulling single crystal - Google Patents
Apparatus for pulling single crystalInfo
- Publication number
- JPH10273384A JPH10273384A JP9139197A JP9139197A JPH10273384A JP H10273384 A JPH10273384 A JP H10273384A JP 9139197 A JP9139197 A JP 9139197A JP 9139197 A JP9139197 A JP 9139197A JP H10273384 A JPH10273384 A JP H10273384A
- Authority
- JP
- Japan
- Prior art keywords
- crystal
- single crystal
- pulling
- dislocation
- holding
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
- 239000013078 crystal Substances 0.000 title claims abstract description 141
- 229910052751 metal Inorganic materials 0.000 claims abstract description 23
- 239000002184 metal Substances 0.000 claims abstract description 23
- 238000000034 method Methods 0.000 claims abstract description 14
- 238000002844 melting Methods 0.000 claims abstract description 8
- 230000008018 melting Effects 0.000 claims abstract description 8
- 229910001220 stainless steel Inorganic materials 0.000 claims description 21
- 239000010935 stainless steel Substances 0.000 claims description 21
- 229910052782 aluminium Inorganic materials 0.000 claims description 15
- XAGFODPZIPBFFR-UHFFFAOYSA-N aluminium Chemical compound [Al] XAGFODPZIPBFFR-UHFFFAOYSA-N 0.000 claims description 15
- 230000001747 exhibiting effect Effects 0.000 claims description 3
- 238000002231 Czochralski process Methods 0.000 abstract 1
- 239000004065 semiconductor Substances 0.000 description 7
- XUIMIQQOPSSXEZ-UHFFFAOYSA-N Silicon Chemical compound [Si] XUIMIQQOPSSXEZ-UHFFFAOYSA-N 0.000 description 6
- 238000004519 manufacturing process Methods 0.000 description 6
- 230000000630 rising effect Effects 0.000 description 6
- 229910052710 silicon Inorganic materials 0.000 description 6
- 239000010703 silicon Substances 0.000 description 6
- 239000011248 coating agent Substances 0.000 description 5
- 238000000576 coating method Methods 0.000 description 5
- 230000001174 ascending effect Effects 0.000 description 4
- 238000004033 diameter control Methods 0.000 description 3
- 230000007423 decrease Effects 0.000 description 2
- 238000010586 diagram Methods 0.000 description 2
- 239000007788 liquid Substances 0.000 description 2
- 230000035939 shock Effects 0.000 description 2
- 239000000725 suspension Substances 0.000 description 2
- OKTJSMMVPCPJKN-UHFFFAOYSA-N Carbon Chemical compound [C] OKTJSMMVPCPJKN-UHFFFAOYSA-N 0.000 description 1
- 230000002411 adverse Effects 0.000 description 1
- 238000005452 bending Methods 0.000 description 1
- 229910052799 carbon Inorganic materials 0.000 description 1
- 238000001816 cooling Methods 0.000 description 1
- 230000000694 effects Effects 0.000 description 1
- -1 for example Substances 0.000 description 1
- 238000010438 heat treatment Methods 0.000 description 1
- 239000011261 inert gas Substances 0.000 description 1
- 238000003780 insertion Methods 0.000 description 1
- 230000037431 insertion Effects 0.000 description 1
- 230000002452 interceptive effect Effects 0.000 description 1
- 238000010899 nucleation Methods 0.000 description 1
- 230000002093 peripheral effect Effects 0.000 description 1
- 229910021420 polycrystalline silicon Inorganic materials 0.000 description 1
- 238000001028 reflection method Methods 0.000 description 1
- 238000007789 sealing Methods 0.000 description 1
- 239000007787 solid Substances 0.000 description 1
- 238000003466 welding Methods 0.000 description 1
Landscapes
- Crystals, And After-Treatments Of Crystals (AREA)
- Liquid Deposition Of Substances Of Which Semiconductor Devices Are Composed (AREA)
Abstract
Description
【0001】[0001]
【発明の属する技術分野】本発明はシリコン等の単結晶
成長時の引上げに用いるものであり、特に、大口径半導
体単結晶引上炉用の引上装置に関するものである。BACKGROUND OF THE INVENTION 1. Field of the Invention The present invention relates to a pulling apparatus used for pulling a single crystal of silicon or the like during growth, and more particularly to a pulling apparatus for a large diameter semiconductor single crystal pulling furnace.
【0002】[0002]
【従来の技術】半導体結晶として用いられる例えばシリ
コン結晶の製造方法一つとして、単結晶を引上げること
によって製造する、所謂CZ(Czochralski:チョクラル
スキー) 法がある。これは、不活性ガスチャンバー炉内
のるつぼ中で塊粒状多結晶シリコンを加熱溶融し、この
溶融シリコンに種単結晶を接触させた後、冷却しつつ、
回転させながらゆっくり種結晶を上昇させ、種結晶下で
いったん結晶を細く絞って(種しぼり)成長させること
により転位を結晶側面に交わらせて無転位領域を形成し
(ダッシュネック法)、さらに無転位単結晶を引き上げ
て成長せしめる方法である。2. Description of the Related Art As one method of manufacturing a silicon crystal used as a semiconductor crystal, for example, there is a so-called CZ (Czochralski) method of manufacturing by pulling a single crystal. This is to heat and melt the bulk polycrystalline silicon in a crucible in an inert gas chamber furnace, and after contacting the seed single crystal with this molten silicon, while cooling,
The seed crystal is slowly raised while rotating, and once grown under the seed crystal, the crystal is squeezed narrowly (seeding) to cause dislocations to cross the crystal side surface to form a dislocation-free region (dash neck method). This is a method in which dislocation single crystals are pulled up and grown.
【0003】単結晶引上げのためには、従来から単結晶
引上げ装置が用いられている。この装置は、主に、種結
晶の固定取り付け部を下端に備えたワイヤーを、その軸
心方向に自転させながら巻き取る構成を持つものであ
る。A single crystal pulling apparatus has been used for pulling a single crystal. This device mainly has a configuration in which a wire having a fixed attachment portion for a seed crystal at its lower end is wound while rotating in the axial direction thereof.
【0004】[0004]
【発明が解決しようとする課題】近年、半導体装置の回
路集積量の増大に伴う大型化に応じて、半導体装置製造
の高効率化を図るために、単結晶は大径化の傾向にあ
る。従って、引上げ単結晶も大重量化することになる。
しかし、上記の如き引上げ装置のワイヤによる種結晶部
での引上げでは、耐荷重に限界があり、大重量単結晶を
引き上げることはできない。In recent years, as the size of a semiconductor device increases with an increase in the amount of integrated circuits, the diameter of a single crystal tends to increase in order to increase the efficiency of manufacturing the semiconductor device. Therefore, the weight of the pulled single crystal is also increased.
However, in the pulling of the seed crystal portion by the wire of the pulling device as described above, there is a limit in the load resistance, and it is impossible to pull a heavy single crystal.
【0005】そこで、種結晶下の単結晶上部に拡径した
後に縮径することによって頭部を形成し、この頭部下の
くびれ部分を係合挟持する複数のキャッチャーアームを
等角度間隔で周状に持つ昇降軸を備えた装置が考えられ
ている。これは、複数のキャッチャーアームが互いに閉
じて挟持することによって単結晶上部のくびれ部が把持
されるものである。Therefore, a head is formed by expanding the diameter above the single crystal below the seed crystal and then reducing the diameter, and a plurality of catcher arms for engaging and holding the constricted portion under the head are formed at equal angular intervals. A device having a lifting shaft having a shape has been considered. In this method, a plurality of catcher arms are closed and clamped to each other to grip a constricted portion at the upper portion of the single crystal.
【0006】このようなキャッチャーアームによるくび
れ部の把持は、通常、以下のような操作で行なわれる。
即ち、キャチャーアームの単結晶頭部に対する相対位置
関係を一定に保ちながら、所定の上昇速度による単結晶
のワイヤ引上げを維持しつつ、キャッチャーアームを、
その先端が予め挟持すべく定められたくびれ部上の接触
位置より下方位置に対向するような相対位置関係におい
て閉じ、閉状態となった後にキャッチャーアームの上昇
速度を単結晶の上昇速度より早めることによってキャッ
チャーアーム先端でくびれ部を前記所定の接触位置でキ
ャッチさせ、係合・挟持状態を得る。The grasping of the constricted portion by such a catcher arm is usually performed by the following operation.
That is, while maintaining the relative position of the catcher arm relative to the single crystal head constant, while maintaining the pulling of the single crystal wire at a predetermined rising speed, the catcher arm is
Close in a relative positional relationship such that the tip faces a lower position than the contact position on the constricted portion predetermined to be clamped in advance, and after the closed state, raise the catcher arm's rising speed faster than the rising speed of the single crystal. As a result, the constricted portion is caught at the predetermined contact position at the tip of the catcher arm, and an engaged / nipped state is obtained.
【0007】しかしながら、このようなキャッチャーア
ームによる単結晶くびれ部の把持においては、ほぼ等間
隔で隆起した晶癖線が現出するなどくびれ部の断面形状
が単結晶毎に千差万別であって、各アーム先端の点接触
によるものとなってしまうため、各キャッチャーアーム
先端のくびれ部分に対する当初の当接状態が不均一であ
る場合が多い。However, in the gripping of the constricted portion of the single crystal by such a catcher arm, the cross-sectional shape of the constricted portion varies widely for each single crystal, for example, crystal habit lines protruding at substantially equal intervals appear. Therefore, the initial contact state of each catcher arm tip with respect to the constricted portion is often non-uniform because of the point contact of each arm tip.
【0008】例えば、くびれ部のキャッチの際、複数の
キャッチャーアームのうちのいくつかが晶癖線の隆起部
にあたった状態で挟持され、他のキャッチャーアームの
先端がくびれ部から浮いた状態になるなど、不安定な挟
持状態ため、くびれ部のキャッチの際やその後の引上げ
操作が進行するなかで、各キャッチャーアームの間でく
びれ部がガタついたり、晶癖線の隆起部上にあったキャ
ッチャーアームの先端位置がこの隆起部から低い平坦部
へずれ落ちることもある。For example, when catching a constricted portion, some of the plurality of catcher arms are clamped in a state where they hit the protruding portion of the crystal habit line, and the ends of the other catcher arms float from the constricted portion. Due to the unstable pinching state, the constriction was loose between the catcher arms during the catching of the constriction and during the subsequent pulling operation, and it was on the ridge of the crystal habit line. The tip position of the catcher arm may shift from the raised portion to a lower flat portion.
【0009】このようなキャッチ時や、引上げ作業中に
生じる晶癖線の隆起等、くびれ部の断面形状が軸対象で
ないことに起因するガタツキおよびずり落ちによる単結
晶全体へのショックは、単結晶の成長に悪影響を及ぼ
し、良好な大口径単結晶製造が妨げられてしまう。[0009] Shock to the entire single crystal due to rattling and slipping due to the non-symmetrical cross-sectional shape of the constricted portion, such as the bulging of the habit line generated during the catching or pulling operation, is caused by the single crystal. This adversely affects the growth of GaN and hinders the production of good large-diameter single crystals.
【0010】本発明は、上記問題点に鑑み、無転位結晶
の目的とする把持位置の断面形状がどのような形状であ
っても常に安定な把持状態が得られるような単結晶引上
装置の提供を目的とする。In view of the above problems, the present invention provides a single crystal pulling apparatus which can always obtain a stable gripping state regardless of the cross-sectional shape of a target gripping position of a dislocation-free crystal. For the purpose of providing.
【0011】[0011]
【課題を解決するための手段】上記目的を達成するた
め、請求項1に記載の発明に係る単結晶引上装置では、
ダッシュネック法により無転位化を達成した後の無転位
結晶部分を把持して結晶成長を続けるチョクラルスキー
法による単結晶引上装置であって、無転位結晶を把持す
る把持手段と、前記結晶を把持した状態の把持手段を引
上げ方向へ移動させる駆動手段と、を備え、前記把持手
段は、前記結晶を把持する際に該結晶の表面と当接する
領域を占める先端部材を有し、この先端部材は、前記結
晶を把持する時の周辺温度付近より低い融点を持つ金属
と、該金属を被覆する前記温度において可撓性を示す金
属層とを備えたものである。In order to achieve the above object, a single crystal pulling apparatus according to the first aspect of the present invention comprises:
A single crystal pulling apparatus by the Czochralski method of holding a dislocation-free crystal portion after achieving dislocation-free by a dash neck method and continuing crystal growth, a holding means for holding a dislocation-free crystal, and the crystal Driving means for moving the gripping means in a state in which the crystal is gripped in the pulling direction, the gripping means having a tip member occupying an area in contact with the surface of the crystal when the crystal is gripped, The member is provided with a metal having a melting point lower than the vicinity temperature at the time of holding the crystal, and a metal layer covering the metal and exhibiting flexibility at the temperature.
【0012】また、請求項2に記載の発明に係る単結晶
引上装置では、請求項1に記載の単結晶引上装置におい
て、前記先端部材は、アルミニウムと、これを覆うステ
ンレス層とからなるものである。In the single crystal pulling apparatus according to the second aspect of the present invention, in the single crystal pulling apparatus according to the first aspect, the tip member includes aluminum and a stainless steel layer covering the aluminum. Things.
【0013】本発明は、ダッシュネック法により無転位
化を達成した後の無転位結晶を把持手段で把持し、この
結晶把持状態の把持手段を駆動手段で引上げながら単結
晶をを成長させる単結晶引上装置である。なお、ここで
いうダッシュネック法による無転位化とは、ダッシュ(D
ash)による無転位成長法に基づくものであり、種単結晶
を溶融シリコンに接触させた後、種結晶から結晶をいっ
たん細く絞って(種しぼり)成長させることにより転位
を結晶側面に交わらせて無転位領域を形成するものであ
る。According to the present invention, there is provided a single crystal in which a dislocation-free crystal after achieving dislocation-free by the dash neck method is gripped by gripping means, and a single crystal is grown while pulling up the gripping means in this crystal gripping state by driving means. It is a lifting device. Note that dislocation-free by the dash neck method here means dash (D
ash), which is based on a dislocation-free growth method. After a seed single crystal is brought into contact with molten silicon, the crystal is squeezed from the seed crystal once to narrow (seed squeezing) and grow so that dislocations cross the side of the crystal. This forms a dislocation-free region.
【0014】さらに、本発明の把持手段は、結晶を把持
する際に結晶表面と当接する領域に、結晶を把持する時
の周辺温度付近より低い融点を持つ金属とこの金属を被
覆する前記周辺温度において可撓性を示す金属層とを備
えた先端部材を有するものである。Further, the gripping means according to the present invention may further comprise: a metal having a melting point lower than a peripheral temperature at the time of gripping the crystal in a region contacting the crystal surface when gripping the crystal; And a metal layer exhibiting flexibility.
【0015】このような本発明の構成においては、把持
手段によって結晶を把持しようとする時点では、先端部
材の被覆金属層は可撓性を持つと同時に被覆金属層内の
金属は半融の無定形状態にある。従って、把持手段の先
端部材が単結晶をキャッチし把持した際には、この先端
部材が結晶に当接してクッションのようにショックを吸
収すると共に、把持手段の把持圧によって結晶との接触
部はその表面の形状に応じた形状に変形して当接面を形
成する。In such a configuration of the present invention, at the time when the crystal is to be gripped by the gripping means, the coating metal layer of the tip member is flexible and the metal in the coating metal layer is semi-solid. It is in a fixed state. Therefore, when the tip member of the holding means catches and holds the single crystal, the tip member comes into contact with the crystal to absorb a shock like a cushion, and the contact portion with the crystal is held by the holding pressure of the holding means. The contact surface is formed by deforming to a shape corresponding to the shape of the surface.
【0016】従って、先端部材による接触は、対向する
結晶表面がどのような形状をしていてもそれに応じた形
状に変化した当接面による面接触となるため、従来のよ
うなキャッチャーアーム先端による点接触の場合に比べ
て格段に安定した挟持状態となる。[0016] Therefore, the contact by the tip member is a surface contact by the contact surface changed into a shape corresponding to the shape of the opposing crystal surface regardless of the shape of the crystal surface. The holding state becomes much more stable than in the case of point contact.
【0017】さらに、この面接触による把持状態での単
結晶の引上げが進行すると、先端部材の結晶当接部にお
ける周辺温度は、引上げ上昇と共に徐々に低下し、それ
に伴って被覆金属は不撓化し、その中の金属も凝固化し
て先端部材の当接面形状が固定化していくため、引上げ
重量が増大していっても把持強度も増大していくので、
安定した把持状態のままで単結晶引上げが良好に遂行さ
れる。Further, as the pulling of the single crystal in the gripping state by the surface contact progresses, the ambient temperature at the crystal contact portion of the tip member gradually decreases with the pulling, and the coating metal becomes inflexible accordingly. Since the metal in it solidifies and the contact surface shape of the tip member is fixed, even if the pulling weight increases, the grip strength also increases,
The single crystal can be pulled well in a stable holding state.
【0018】被覆金属としては、結晶を把持する時の周
辺温度において可撓性を示すものであれば良く、一方、
被覆される方の金属は、結晶を把持する時の周辺温度付
近より低い融点をもつもの、即ち、被覆金属内では融点
が近いがそれより若干低い温度となるものであれば良
い。The coating metal may be any metal that exhibits flexibility at the ambient temperature when the crystal is gripped.
The metal to be coated only needs to have a melting point lower than the vicinity temperature at the time of holding the crystal, that is, a metal having a melting point close to but slightly lower than that in the coating metal.
【0019】たとえば、結晶を把持する時の把持部周辺
温度が800℃付近であれば、請求項2に記載したよう
に、先端部材は700℃前後に融点を持つアルミニウム
をステンレスで被覆する構成のものが挙げられる。For example, if the temperature around the holding portion when holding the crystal is around 800 ° C., the tip member has a structure in which aluminum having a melting point around 700 ° C. is coated with stainless steel. Things.
【0020】なお、本発明における先端部材の被覆金属
の厚みは、結晶把持の際には可撓性を示すことが必要で
あると共に、その際の荷重作用で破れて中の金属が露出
することがないように充分な厚みに設定する必要があ
る。The thickness of the coated metal of the tip member according to the present invention is required to be flexible at the time of holding the crystal and to be exposed by the load action at that time to expose the metal therein. It is necessary to set it to a sufficient thickness so that there is no gap.
【0021】また、本発明の把持手段としては、例え
ば、基本的に従来のような複数のキャッチャーアームか
らなる構成が利用できる。各キャッチャーアームの下端
に本発明の先端部材を備えれば良い。この場合、既存の
キャチャーアームの下端部に適当な取付け手段を講じて
先端部材を取り付けることによっても構成することがで
きるので、装置設計は簡便である。もちろん、本発明の
先端部材は着脱可能で交換できる構成としても良い。As the gripping means of the present invention, for example, a configuration basically including a plurality of catcher arms as in the related art can be used. What is necessary is just to provide the tip member of this invention in the lower end of each catcher arm. In this case, the device can be designed by attaching the tip member to the lower end of the existing catcher arm by using an appropriate attachment means, so that the device design is simple. Of course, the tip member of the present invention may be configured to be detachable and replaceable.
【0022】また、本発明の把持手段による把持位置
は、無転位化達成後に成長する単結晶のいずれの位置で
あったも良いが、例えばキャッチャーアームの配列な
ど、把持手段の設計は把持する単結晶の径に対応して決
定されるため、予め所望の単結晶把持位置とその径を設
定する。もちろん、従来と同様に、無転位化達成後に単
結晶の拡径と縮径によって頭部を形成し、頭部下のくび
れ部を挟持する設計としてもよい。The holding position of the holding means of the present invention may be any position of the single crystal which grows after the dislocation-free state is achieved. Since it is determined according to the diameter of the crystal, a desired single crystal holding position and its diameter are set in advance. Of course, similarly to the conventional case, the head may be formed by expanding and reducing the diameter of the single crystal after achieving the dislocation-free state, and the constricted portion under the head may be sandwiched.
【0023】[0023]
【発明の実施の形態】以下に、本発明の実施の形態の一
例として、先端部材にアルミニウムをステンレスで被覆
したものを用い、且つ把持手段として複数のキャッチャ
ーアームを持つ構成の単結晶引上装置を図1示す。本実
施形態においては、種結晶下の無転位達成後に単結晶頭
部を形成し、頭部下のくびれ部を把持する場合を例とし
て示す。DETAILED DESCRIPTION OF THE PREFERRED EMBODIMENTS As an example of an embodiment of the present invention, a single crystal pulling apparatus having a structure in which a tip member coated with stainless steel and having a plurality of catcher arms as gripping means will be described below. Is shown in FIG. In the present embodiment, a case will be described as an example where a single crystal head is formed after dislocation-free under a seed crystal is achieved and a constricted portion under the head is gripped.
【0024】まず、本実施形態に用いる先端部材の一製
造工程を以下に説明する。図2に示すように、厚さ0.
5〜5mm,内径10mm,長さ50mm〜100mm
程度の片封じステンレスパイプ5内を用意する(a)。
このステンレスパイプ5の厚みは、丁度、後述のくびれ
部キャッチ時の結晶重量の1〜2倍相当の重圧がパイプ
5側面に係った際に、その側面の撓みが対向する側面に
達する程度のパイプ強度となるような厚みに設定する。First, one manufacturing process of the tip member used in the present embodiment will be described below. As shown in FIG.
5-5mm, inner diameter 10mm, length 50mm-100mm
The inside of the stainless steel pipe 5 having a degree of single sealing is prepared (a).
The thickness of the stainless steel pipe 5 is such that when a heavy pressure equivalent to 1 to 2 times the crystal weight at the time of catching the constricted portion described below is applied to the side of the pipe 5, the bending of the side reaches the opposite side. Set the thickness so that the pipe strength is obtained.
【0025】このステンレスパイプ5の内径とほぼ同じ
直径を持つ長さ30mm〜50mmの棒状のアルミニウ
ム4をステンレスパイプ5内の片封じ側に挿入する
(b)。さらに、ステンレスパイプ5内のアルミニウム
4の後方空間に、この空間を埋めるステンレス棒6を挿
入した後、ステンレスパイプ内の開口端を溶接(溶接部
7)する(c)ことによって先端部材3とする。このよ
うに、アルミニウム4後方にステンレス棒6を挿入した
のは、開口端を溶接する際の加熱の影響をアルミニウム
4に及ぼさないためである。A rod-shaped aluminum 4 having a length substantially equal to the inner diameter of the stainless steel pipe 5 and having a length of 30 mm to 50 mm is inserted into one side of the stainless steel pipe 5 (b). Furthermore, after inserting a stainless steel rod 6 filling this space into the space behind the aluminum 4 in the stainless steel pipe 5, the open end in the stainless steel pipe is welded (welded portion 7) (c) to form the tip member 3. . The reason why the stainless steel rod 6 is inserted behind the aluminum 4 is to prevent the influence of heating when welding the open end on the aluminum 4.
【0026】また、この先端部材3は、取り付けられる
べきキャッチャーアーム下端部との係合方法に応じた形
に成形されるものであるが、このステンレス棒6の部分
を特に係合部分として利用できるので、単にステンレス
パイプ5内にアルミニウム4を封入する場合よりも取扱
いが簡便となる。The tip member 3 is formed in a shape corresponding to the method of engagement with the lower end of the catcher arm to be attached. The stainless steel rod 6 can be used particularly as an engagement portion. Therefore, the handling is simpler than the case where the aluminum 4 is simply sealed in the stainless steel pipe 5.
【0027】本実施形態では、図1(a)および(b)
に示すように、先端部材3を略U字型に成形し、後述す
るキャッチャーアーム1のアーム下方の側面に取付け穴
10を設け、キャッチャーアーム1下端部2の挟持状態
におけるくびれ部との接触部側にアルミニウム4挿入領
域を当接させ、溶接部7側(ステンレス棒6領域)を取
付け穴10に貫通させることによって先端部材3をキャ
ッチャーアーム1に取り付けた。In this embodiment, FIGS. 1A and 1B
As shown in FIG. 5, the tip member 3 is formed into a substantially U-shape, and a mounting hole 10 is provided on a side surface below the arm of the catcher arm 1 to be described later. The distal end member 3 was attached to the catcher arm 1 by bringing the aluminum 4 insertion region into contact with the side and making the welded portion 7 side (stainless steel rod 6 region) penetrate the attachment hole 10.
【0028】本引上装置は、図1に示すように、るつぼ
20中溶融シリコンに、種結晶14を接触させた後、ワ
イヤ11を不図示の巻上装置で引上げながら予め定めら
れた回転速度でワイヤ11を軸心回りに自転させながら
ゆっくり種結晶14を上昇させることによって、種結晶
14下に単結晶を成長せしめるチョクラルスキー法によ
る半導体単結晶引上炉用のものである。本装置は、種結
晶14の下部に成長する単結晶に拡径部と縮径部とから
なる頭部15のくびれ部16を形成させた後、このくび
れ部16を3つ以上のキャッチャーアーム下端部でラジ
アル方向から挟持して、結晶引上げを進める構成となっ
ている。As shown in FIG. 1, after the seed crystal 14 is brought into contact with the molten silicon in the crucible 20, the pulling device pulls up the wire 11 with a hoisting device (not shown) and sets a predetermined rotation speed. This is for a semiconductor single crystal pulling furnace by the Czochralski method in which a single crystal is grown under the seed crystal 14 by slowly raising the seed crystal 14 while rotating the wire 11 around the axis. This apparatus forms a constricted portion 16 of a head portion 15 composed of an enlarged diameter portion and a reduced diameter portion on a single crystal grown below a seed crystal 14, and then connects the constricted portion 16 to the lower end of three or more catcher arms. The portion is held in the radial direction to advance the crystal pulling.
【0029】本引上装置では、上記のごとくそれぞれ下
端部2に先端部材3が取り付けられた3つ以上のキャッ
チャーアーム1がその上端部で、互いに等角度間隔で配
置されるように吊持部(把持手段)13に開閉可能に枢
支されている。この吊持部13における各上端部の枢支
部を中心とした回動制御によって、各キャッチャーアー
ム1の開閉が行なわれる。In the lifting apparatus, as described above, three or more catcher arms 1 each having the tip member 3 attached to the lower end 2 are suspended at the upper end thereof so as to be arranged at equal angular intervals. (Grip means) 13 is pivotally supported to be openable and closable. The opening and closing of each catcher arm 1 is performed by the rotation control of each of the upper ends of the hanging portions 13 around the pivots.
【0030】この吊持部13は、ワイヤ11を同軸状に
内包しており、ワイヤ11の種結晶14引上げに機械的
に干渉することなく不図示の駆動装置(駆動手段)によ
って軸方向に移動されるものである。この吊持部13の
駆動装置による軸方向移動に伴って、各キャッチャーア
ーム1が一斉に結晶引上げ方向に移動される。The suspending portion 13 includes the wire 11 coaxially and moves in the axial direction by a driving device (driving means) (not shown) without mechanically interfering with the pulling of the seed crystal 14 of the wire 11. Is what is done. Along with the axial movement of the suspension unit 13 by the driving device, the catcher arms 1 are simultaneously moved in the crystal pulling direction.
【0031】以上の如き構成をもつ引上装置の、大口径
半導体単結晶引上炉における単結晶引上げ動作を以下に
示す。まず、初期配置として、各キャッチャーアーム1
を開状態にした吊持部13を駆動装置によって上軸方向
に位置させておく。この初期配置において、巻上装置を
制御して、るつぼ20中の溶融シリコン(溶融液回転速
度0.1〜15rpm)に、ワイヤ11下端のカーボン
製シードチャック12に保持された種結晶14を接触さ
せる。The single crystal pulling operation in the large diameter semiconductor single crystal pulling furnace of the pulling apparatus having the above-described configuration will be described below. First, as an initial arrangement, each catcher arm 1
Is held in the open state by the driving device. In this initial arrangement, the hoisting device is controlled to bring the seed crystal 14 held by the carbon seed chuck 12 at the lower end of the wire 11 into contact with the molten silicon (melt rotation speed 0.1 to 15 rpm) in the crucible 20. Let it.
【0032】その後、所定の回転速度約10rpmで引
上げワイヤ11を軸心方向に自転させつつ、同時に巻上
装置を制御して種結晶14が所定の上昇速度約3.0m
m/minで上昇するようにワイヤ11を引上げる。こ
の上昇によって種結晶14下端に直径約5mm程度の無
転位単結晶を成長せしめる。Thereafter, while the pulling wire 11 is rotated in the axial direction at a predetermined rotational speed of about 10 rpm, the hoisting device is simultaneously controlled to raise the seed crystal 14 to a predetermined ascending speed of about 3.0 m.
The wire 11 is pulled up so as to rise at m / min. By this rise, a dislocation-free single crystal having a diameter of about 5 mm grows at the lower end of the seed crystal 14.
【0033】次いで、巻上装置を制御して上昇速度を約
0.5mm/minと低下させることによって単結晶直
径を増大させる。直径が約50mm程度にまで増大した
後、上昇速度を約1.0mm/minとし、単結晶を縮
径させる。以上の操作によって単結晶頭部15が形成さ
れる。単結晶が直径約30mmまで減少した後、さらに
巻上装置を制御して上昇速度を約0.5mm/minと
低下させて単結晶直径を増大させる。この拡径が進む
と、頭部15下にくびれ部16が形成される。実際に
は、このような単結晶直径の制御は、例えば光反射方式
等を利用して経時的に単結晶の直径を計測し、そのデー
タに基づいて各駆動装置相互の駆動を制御することによ
って上昇及び回転速度の調整を行なうプログラム、所
謂、自動直径制御システムを用いてコンピュータ等によ
って行なわれる。Next, the diameter of the single crystal is increased by controlling the hoisting device to reduce the ascending speed to about 0.5 mm / min. After the diameter is increased to about 50 mm, the rate of rise is set to about 1.0 mm / min, and the diameter of the single crystal is reduced. The single crystal head 15 is formed by the above operation. After the diameter of the single crystal is reduced to about 30 mm, the hoisting device is further controlled to reduce the rising speed to about 0.5 mm / min to increase the diameter of the single crystal. As the diameter increases, a constricted portion 16 is formed below the head 15. In practice, such single crystal diameter control is performed by, for example, measuring the diameter of the single crystal over time using a light reflection method or the like, and controlling the driving of each driving device based on the data. It is performed by a computer or the like using a program for adjusting the ascending and rotating speeds, that is, a so-called automatic diameter control system.
【0034】くびれ部16が形成された後、上記直径制
御システムによって所定の上昇速度を維持させながら単
結晶引上げが継続するように各駆動系を制御しつつ、吊
持部13を駆動させて各キャッチャーアーム1を閉状態
へ移行させる。このとき、各キャッチャーアーム1の単
結晶に対する相対位置は、閉状態なった際のキャッチャ
ーアーム下端部2(及び先端部材3)の単結晶に対向す
る位置が、くびれ部分16の各キャッチャーアーム下端
部2によって挟持されるべく定められた接触位置よりも
下方位置とする。従って、各キャッチャーアーム下端部
2の先端部材3どうしの相対間隔はくびれ部16の前記
所定の接触位置における直径に相当し、対向するくびれ
部16表面に対して僅かな間隙を持つ。After the constricted portion 16 is formed, the hanging portion 13 is driven by controlling the driving systems so that the single crystal pulling is continued while maintaining the predetermined rising speed by the diameter control system. Move the catcher arm 1 to the closed state. At this time, the relative position of each catcher arm 1 with respect to the single crystal is such that the position of the lower end 2 of the catcher arm (and the tip member 3) facing the single crystal in the closed state is the lower end of each catcher arm of the constricted portion 16. 2 is a position below a contact position determined to be sandwiched. Accordingly, the relative distance between the distal end members 3 of the lower ends 2 of the catcher arms corresponds to the diameter of the constricted portion 16 at the predetermined contact position, and has a slight gap with respect to the surface of the opposing constricted portion 16.
【0035】この閉状態となった時点でのキャッチャー
アーム下端部2の周辺温度は800℃付近である。従っ
て、先端部材3では、内部の700℃前後に融点を持つ
アルミニウム4が周辺からのステンレスパイプ5を介し
た伝熱によって半融状態となる。The surrounding temperature of the lower end portion 2 of the catcher arm at the time of the closed state is around 800.degree. Accordingly, in the distal end member 3, the aluminum 4 having a melting point of about 700 ° C. in the inside becomes a semi-molten state due to heat transfer from the periphery through the stainless steel pipe 5.
【0036】次に、駆動装置による吊持部13の上軸方
向の移動速度を早めて、閉状態にある各キャッチャーア
ーム1の上軸方向へのるつぼ20内液面に対する移動速
度を単結晶頭部15のるつぼ20内液面に対する上昇速
度より早める。この速度制御によって、閉状態の各キャ
ッチャーアーム下端部2の先端部材3は、単結晶頭部1
5に対して上方向に相対移動し、前記くびれ部16の予
め定められた接触位置に接触する。即ち、各先端部材3
からみると、単結晶頭部15が落下するように下方へ相
対移動し、前記所定の接触位置でくびれ部16をキャッ
チすることとなる。Next, the moving speed of the hanging portion 13 in the upper axis direction by the driving device is increased, and the moving speed of the catcher arm 1 in the closed state with respect to the liquid surface in the crucible 20 in the upper axis direction is increased. The rising speed of the part 15 with respect to the liquid level in the crucible 20 is increased. By this speed control, the tip member 3 of the lower end portion 2 of each catcher arm in the closed state moves the single crystal head 1
5 and moves in the upward direction, and comes into contact with a predetermined contact position of the constricted portion 16. That is, each tip member 3
When viewed from above, the single crystal head 15 relatively moves downward so as to drop, and catches the constricted portion 16 at the predetermined contact position.
【0037】このとき、先端部材3のステンレス層(ス
テンレスパイプ5壁)は可撓性を持ち、内部のアルミニ
ウム4は半融状態であるので、くびれ部15をキャッチ
した瞬間、この先端部材3は荷重作用を受けて撓み、そ
の衝撃を吸収する。その直後、先端部材3のくびれ部1
6との接触部は、把持圧によってくびれ部16表面の形
状に応じた形に変形し、面接触となって落ち着いて、安
定な把持状態が得られる。At this time, since the stainless steel layer (the wall of the stainless steel pipe 5) of the tip member 3 has flexibility and the aluminum 4 inside is in a semi-molten state, the tip member 3 It bends under the action of a load and absorbs its impact. Immediately thereafter, the constricted portion 1 of the tip member 3
The contact portion with 6 is deformed into a shape according to the shape of the surface of the constricted portion 16 by the gripping pressure, and comes into surface contact, calms down, and a stable gripping state is obtained.
【0038】このような面接触による安定した把持状態
が得られた時点で、所定の回転および上昇速度での引上
げが継続するように駆動装置を吊持部13の上軸方向の
移動を制御し、結晶引上げ作業を進める。引上げ作業が
進むに従って、単結晶の引上げ重量は増大していくが、
同時に各キャッチャーアーム1も上昇して下端部2周辺
の温度も低下していくため、先端部材3のアルミニウム
4は凝固下し、先端部材3のくびれ部16表面に応じた
接触面形状も固定化して先端部材3の接触面における把
持強度も増大していく。When a stable gripping state due to such surface contact is obtained, the driving device controls the movement of the suspension portion 13 in the upper axial direction so that the pulling at a predetermined rotation and ascending speed is continued. The crystal pulling operation is proceeded. As the pulling work progresses, the pulling weight of the single crystal increases,
At the same time, each catcher arm 1 also rises and the temperature around the lower end 2 decreases, so that the aluminum 4 of the tip member 3 solidifies and the shape of the contact surface corresponding to the surface of the constricted portion 16 of the tip member 3 is fixed. Thus, the gripping strength of the contact surface of the tip member 3 also increases.
【0039】以上のように、本引上装置によれば、どの
ような形状のくびれ部であっても、キャッチの際に先端
部材3がキャッチの衝撃を吸収すると共に、接触部がく
びれ部の表面形状に応じた接触面形状となるだけでな
く、単結晶の把持引上げが進行するに従ってこの面接触
による把持もより強力となるため、大口径半導体単結晶
引上げにおいても、常に安定した把持状態による良好な
引上げ作業を遂行することができる。As described above, according to the present lifting device, regardless of the shape of the constricted portion, the tip member 3 absorbs the impact of the catch when catching, and the contact portion has the constricted portion. Not only the contact surface shape according to the surface shape, but also the gripping by this surface contact becomes stronger as the gripping and pulling of the single crystal progresses, so even when pulling a large diameter semiconductor single crystal, a stable gripping state is always maintained Good pulling work can be performed.
【0040】なお、上記の実施の形態においては、先端
部材を、ステンレスパイプを用いた棒状のものを略U字
型に成形したものとしたが、本発明はこれに限定される
ものではなく、用いる金属、取り付け方法におうじて適
宜形状を設計すれば良い。In the above-described embodiment, the tip member is formed by forming a rod-like member using a stainless steel pipe into a substantially U-shape. However, the present invention is not limited to this. The shape may be appropriately designed according to the metal used and the mounting method.
【0041】また、本発明の把持手段は、上記実施形態
に示したように、キャッチャーアームからなる構成に限
定されるものではなく、機械的に単結晶を把んで引き上
げることができる機構であると共に、結晶との当接領域
に先端部材を備えることが可能なものであれば広く使用
可能である。Further, the holding means of the present invention is not limited to the structure comprising the catcher arm as shown in the above embodiment, but is a mechanism capable of mechanically grasping and pulling a single crystal. As long as the tip member can be provided in the contact region with the crystal, it can be widely used.
【0042】さらに、上記実施形態においては、種結晶
下の無転位化直後に単結晶頭部を形成し、この頭部下の
くびれ部を把持位置としたが、本発明は、これに限ら
ず、さらに単結晶の拡径化が進んだ時点で挟持を行なっ
ても良い。Further, in the above embodiment, the single crystal head is formed immediately after dislocation-free under the seed crystal, and the constricted portion under this head is used as the gripping position. However, the present invention is not limited to this. Alternatively, the pinching may be performed when the diameter of the single crystal further increases.
【0043】[0043]
【発明の効果】本発明は以上説明したとおり、大口径単
結晶引上げにおいても、無転位結晶の目的とする把持位
置の形状に応じて常に安定した把持状態が得られ、良好
な結晶引上げ作業を遂行することができるという効果が
ある。As described above, according to the present invention, even in pulling a large-diameter single crystal, a stable gripping state can always be obtained in accordance with the shape of the target gripping position of the dislocation-free crystal. There is an effect that it can be performed.
【図1】本発明の一実施の形態による挟持装置を示す説
明図であり、(a)は装置の概略構成図、(b)は
(a)におけるキャッチャーアーム下端部付近の部分拡
大図である。1A and 1B are explanatory views showing a holding device according to an embodiment of the present invention, wherein FIG. 1A is a schematic configuration diagram of the device, and FIG. 1B is a partially enlarged view of the vicinity of a lower end of a catcher arm in FIG. .
【図2】図1の挟持装置に用いた先端部材の製造工程の
一例を示す説明図であり、(a)〜(c)はそれぞれ製
造工程の一過程を示す模式図である。FIGS. 2A to 2C are explanatory diagrams illustrating an example of a manufacturing process of a tip member used in the holding device of FIG. 1; FIGS.
1:キャッチャーアーム 2:(キャッチャーアーム)下端部 3:先端部材 4:アルミニウム 5:ステンレスパイプ 6:ステンレス棒 7:溶接部 10:取付け穴 11:ワイヤ 12:シードチャック 14:種結晶 15:単結晶頭部 16:くびれ部 1: Catcher arm 2: (Catcher arm) lower end 3: Tip member 4: Aluminum 5: Stainless steel pipe 6: Stainless steel rod 7: Welded part 10: Mounting hole 11: Wire 12: Seed chuck 14: Seed crystal 15: Single crystal Head 16: Constricted part
Claims (2)
した後の無転位結晶部位を把持して結晶成長を続けるチ
ョクラルスキー法による単結晶引上装置であって、 無転位結晶を把持する把持手段と、 前記結晶を把持した状態の把持手段を引上げ方向へ移動
させる駆動手段と、を備え、 前記把持手段は、前記結晶を把持する際に該結晶の表面
と当接する領域を占める先端部材を有し、 この先端部材は、前記結晶を把持する時の周辺温度付近
より低い融点を持つ金属と、該金属を被覆する前記温度
において可撓性を示す金属層とを備えたことを特徴とす
る単結晶引上装置。An apparatus for pulling a single crystal by the Czochralski method, in which a dislocation-free crystal portion after achieving a dislocation-free crystal by a dash neck method and crystal growth is continued to hold a dislocation-free crystal portion, is provided. Means, and a driving means for moving the gripping means in a state of gripping the crystal in the pulling direction, wherein the gripping means includes a tip member occupying an area in contact with a surface of the crystal when gripping the crystal. The tip member includes a metal having a melting point lower than the vicinity temperature at the time of gripping the crystal, and a metal layer covering the metal and exhibiting flexibility at the temperature. Single crystal pulling device.
を被覆するステンレス層とを備えたことを特徴とする請
求項1に記載の単結晶引上装置。2. The single crystal pulling apparatus according to claim 1, wherein the tip member includes aluminum and a stainless steel layer covering the aluminum.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP9139197A JPH10273384A (en) | 1997-03-27 | 1997-03-27 | Apparatus for pulling single crystal |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP9139197A JPH10273384A (en) | 1997-03-27 | 1997-03-27 | Apparatus for pulling single crystal |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| JPH10273384A true JPH10273384A (en) | 1998-10-13 |
Family
ID=14025089
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP9139197A Pending JPH10273384A (en) | 1997-03-27 | 1997-03-27 | Apparatus for pulling single crystal |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JPH10273384A (en) |
-
1997
- 1997-03-27 JP JP9139197A patent/JPH10273384A/en active Pending
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