JPH10274845A5 - - Google Patents

Claims (5)

A positive-working photosensitive composition comprising: a resin having a group that is decomposed by the action of an acid and increases the solubility of the resin in an alkaline developer; and a compound represented by the following general formula (I) that generates a sulfonic acid upon exposure to actinic rays or radiation:
In the formula, _R1 to _R3 may be the same or different and represent a hydrogen atom, an alkyl group, a cycloalkyl group, an alkoxy group, a hydroxy group, a halogen atom, or an -S- _R4 group. _R4 represents an alkyl group or an aryl group. ^X- represents an anion of benzenesulfonic acid, naphthalenesulfonic acid, or anthracenesulfonic acid having at least one group selected from the group of alkyl or alkoxy groups having 8 or more carbon atoms, at least two groups selected from the group of alkyl or alkoxy groups having 4 to 7 carbon atoms, or at least three groups selected from the group of alkyl or alkoxy groups having 1 to 3 carbon atoms. l, m, and n may be the same or different and represent integers of 1 to 3. When l, m, and n are each 2 or 3, two of the two to three _R1 to _R3 may be bonded to each other to form a ring consisting of 5 to 8 elements, including a carbocyclic ring, a heterocyclic ring, or an aromatic ring. 2. The positive photosensitive composition according to claim 1, further comprising a low-molecular-weight acid-decomposable dissolution-inhibiting compound having a molecular weight of 3,000 or less, which has an acid-decomposable group and whose solubility in an alkaline developer increases under the action of an acid. 3. The positive photosensitive composition according to claim 1, further comprising a resin that is insoluble in water but soluble in an aqueous alkaline solution. 1. A positive-working photosensitive composition comprising: a compound represented by general formula (I) according to claim 1 which generates a sulfonic acid upon exposure to actinic rays or radiation; a low-molecular-weight acid-decomposable dissolution-inhibiting compound having a molecular weight of 3,000 or less, which has an acid-decomposable group and whose solubility in an alkaline developer increases under the action of acid; and a resin which is insoluble in water but soluble in an alkaline aqueous solution. 5. A method for forming a positive pattern, comprising forming a film from the positive photosensitive composition according to claim 1, exposing the film to light, and developing the film.