JPH10287969A - 真空成膜装置 - Google Patents
真空成膜装置Info
- Publication number
- JPH10287969A JPH10287969A JP9917197A JP9917197A JPH10287969A JP H10287969 A JPH10287969 A JP H10287969A JP 9917197 A JP9917197 A JP 9917197A JP 9917197 A JP9917197 A JP 9917197A JP H10287969 A JPH10287969 A JP H10287969A
- Authority
- JP
- Japan
- Prior art keywords
- substrate holder
- substrate
- forming apparatus
- film forming
- vacuum chamber
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Withdrawn
Links
Landscapes
- Physical Vapour Deposition (AREA)
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP9917197A JPH10287969A (ja) | 1997-04-16 | 1997-04-16 | 真空成膜装置 |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP9917197A JPH10287969A (ja) | 1997-04-16 | 1997-04-16 | 真空成膜装置 |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| JPH10287969A true JPH10287969A (ja) | 1998-10-27 |
| JPH10287969A5 JPH10287969A5 (2) | 2005-03-03 |
Family
ID=14240214
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP9917197A Withdrawn JPH10287969A (ja) | 1997-04-16 | 1997-04-16 | 真空成膜装置 |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JPH10287969A (2) |
Cited By (3)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP2001305337A (ja) * | 2000-04-27 | 2001-10-31 | Furukawa Electric Co Ltd:The | 光学フィルタおよびその光学フィルタの製造方法 |
| WO2005024090A1 (ja) * | 2003-09-05 | 2005-03-17 | Shinmaywa Industries, Ltd. | 真空成膜方法、装置、及びそれらを用いて製造されたフィルタ |
| JP2007154316A (ja) * | 1999-07-14 | 2007-06-21 | Samsung Sdi Co Ltd | 有機エレクトロルミネッセンス素子及びパネルの製造方法と製造装置 |
-
1997
- 1997-04-16 JP JP9917197A patent/JPH10287969A/ja not_active Withdrawn
Cited By (4)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP2007154316A (ja) * | 1999-07-14 | 2007-06-21 | Samsung Sdi Co Ltd | 有機エレクトロルミネッセンス素子及びパネルの製造方法と製造装置 |
| JP2001305337A (ja) * | 2000-04-27 | 2001-10-31 | Furukawa Electric Co Ltd:The | 光学フィルタおよびその光学フィルタの製造方法 |
| WO2005024090A1 (ja) * | 2003-09-05 | 2005-03-17 | Shinmaywa Industries, Ltd. | 真空成膜方法、装置、及びそれらを用いて製造されたフィルタ |
| KR100782522B1 (ko) | 2003-09-05 | 2007-12-06 | 신메이와 인더스트리즈,리미티드 | 진공 성막 방법 및 장치 |
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Legal Events
| Date | Code | Title | Description |
|---|---|---|---|
| A521 | Written amendment |
Free format text: JAPANESE INTERMEDIATE CODE: A523 Effective date: 20040401 |
|
| A621 | Written request for application examination |
Free format text: JAPANESE INTERMEDIATE CODE: A621 Effective date: 20040401 |
|
| A977 | Report on retrieval |
Effective date: 20061012 Free format text: JAPANESE INTERMEDIATE CODE: A971007 |
|
| A131 | Notification of reasons for refusal |
Effective date: 20070206 Free format text: JAPANESE INTERMEDIATE CODE: A131 |
|
| A761 | Written withdrawal of application |
Effective date: 20070322 Free format text: JAPANESE INTERMEDIATE CODE: A761 |