JPH10297960A - Low temperature fired porcelain composition and method for producing low temperature fired porcelain - Google Patents
Low temperature fired porcelain composition and method for producing low temperature fired porcelainInfo
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- JPH10297960A JPH10297960A JP9108725A JP10872597A JPH10297960A JP H10297960 A JPH10297960 A JP H10297960A JP 9108725 A JP9108725 A JP 9108725A JP 10872597 A JP10872597 A JP 10872597A JP H10297960 A JPH10297960 A JP H10297960A
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Abstract
(57)【要約】
【課題】800〜1000℃で焼成することが可能であ
り、1GHz以上の高周波領域において、低誘電率、低
誘電正接で熱膨張係数の制御が容易な低温焼成磁器組成
物と低温焼成磁器の製造方法を提供する。
【解決手段】SiO2 を14.9〜95重量%と、Zn
Oを1〜84.9重量%と、B2 O3 を0.1〜15重
量%およびLi2 Oを0.1〜10重量%とからなる
か、またはSiO2 を14.9〜95重量%、ZnOを
1〜84.5重量%、Li2 Oを0.1〜10重量%
と、少なくともSiO2 およびB2 O3 を含有するガラ
ス0.5〜20重量%と、とからなる組成物を成形後、
酸化あるいは非酸化性雰囲気中、800℃〜1000℃
で焼成して、少なくともZnOおよびSiO2 を含む結
晶相およびSiO2 相を主相とし、さらに副相として、
少なくともSiO2 、Li2 OおよびZnOを含む結晶
相を含み、1GHz〜60GHzでの誘電率(εr)が
7以下、誘電損失が30×10-4以下、さらに室温から
400℃における熱膨張係数が2〜17ppm/℃の特
性を有する磁器を得る。
(57) Abstract: A low-temperature fired porcelain composition that can be fired at 800 to 1000 ° C. and has a low dielectric constant, a low dielectric loss tangent, and easy control of a coefficient of thermal expansion in a high-frequency region of 1 GHz or more. And a method for producing low-temperature fired porcelain. SOLUTION: 14.9 to 95% by weight of SiO 2 and Zn
O and a 1 to 84.9% by weight, the B 2 O 3 consisting of 0.1 to 15 wt% and Li 2 O from 0.1 to 10 wt%, or the SiO 2 14.9-95 wt %, the ZnO from 1 to 84.5% by weight, the Li 2 O 0.1 to 10 wt%
And a glass containing at least SiO 2 and B 2 O 3 at 0.5 to 20% by weight.
800 ° C to 1000 ° C in an oxidizing or non-oxidizing atmosphere
And a crystal phase containing at least ZnO and SiO 2 and a SiO 2 phase as a main phase, and further as a sub phase,
It contains a crystal phase containing at least SiO 2 , Li 2 O and ZnO, has a dielectric constant (εr) of 7 or less at 1 GHz to 60 GHz, a dielectric loss of 30 × 10 −4 or less, and a thermal expansion coefficient from room temperature to 400 ° C. A porcelain having characteristics of 2 to 17 ppm / ° C. is obtained.
Description
【0001】[0001]
【発明の属する技術分野】本発明は、多層回路基板にお
ける絶縁基板として有用な低温焼成磁器組成物と、低温
焼成磁器の製造方法に関するものであり、例えば集積回
路(IC)や電子部品を多層に積層し、焼成してなる銅
配線可能な特に高周波用の低誘電率、低誘電損失を備え
た低温焼成磁器組成物および低温焼成磁器の製造方法の
改良に関するものである。BACKGROUND OF THE INVENTION 1. Field of the Invention The present invention relates to a low-temperature fired porcelain composition useful as an insulating substrate in a multilayer circuit board and a method for producing a low-temperature fired porcelain. For example, an integrated circuit (IC) or an electronic component is formed into a multilayer. The present invention relates to a low-temperature fired porcelain composition having a low dielectric constant and a low dielectric loss, particularly for high frequencies, which can be laminated and fired for copper wiring, and to an improvement in a method of manufacturing the low-temperature fired porcelain.
【0002】[0002]
【従来技術】従来より、セラミック配線基板としては、
絶縁基板がアルミナなどのセラミックスからなるアルミ
ナ質配線基板が多用されているが、近年、高度情報化時
代を迎え、半導体素子はより高速化、高集積化、実装の
より高密度化が進み、誘電率の大きなアルミナ基板(3
GHzでの比誘電率は9〜9.5)は高周波回路基板等
には不適切である。つまり、信号を高速で伝搬させるた
めには絶縁基板材料には、より低い誘電率が要求されて
いる。また、マイクロ波、ミリ波対応として低損失化も
要求されている。2. Description of the Related Art Conventionally, as a ceramic wiring board,
Alumina wiring boards made of ceramics such as alumina are widely used as the insulating substrate. High alumina substrate (3
The relative dielectric constant of 9 to 9.5 at GHz is not suitable for a high-frequency circuit board or the like. That is, in order to propagate a signal at a high speed, an insulating substrate material is required to have a lower dielectric constant. In addition, low loss is required for microwave and millimeter wave applications.
【0003】そこで、上述した低誘電率化に対応し得る
セラミック材料としては、例えば、ガラスと無機質フィ
ラーとの混合物を成形、焼成してなる、いわゆるガラス
セラミックスは、誘電率が3〜7程度と低いことから、
高周波用絶縁基板として注目されている。また、このガ
ラスセラミックスは、800〜1000℃の低温で焼成
することができることから、配線用導体として、銅、
金、銀などの低抵抗金属を使用できるという長所を有す
る。Therefore, as a ceramic material that can cope with the above-mentioned low dielectric constant, for example, a so-called glass ceramic formed by molding and firing a mixture of glass and an inorganic filler has a dielectric constant of about 3 to 7. From low
It is attracting attention as a high-frequency insulating substrate. In addition, since this glass ceramic can be fired at a low temperature of 800 to 1000 ° C., copper,
It has the advantage that low resistance metals such as gold and silver can be used.
【0004】一方、多層配線基板に種々の電子部品を実
装したり、入出力端子等を取付けたり、またその多層配
線基板をマザーボードなどのプリント基板に接続する上
で、これら電子部品や入出力端子等、またはプリント基
板との熱膨張率の差により基板に加わる応力から基板が
破壊したり、欠けが生じるのを防止する為に、各材料間
の熱膨張係数が近似していることが望まれる。On the other hand, when mounting various electronic components on a multilayer wiring board, attaching input / output terminals and the like, and connecting the multilayer wiring board to a printed circuit board such as a motherboard, these electronic components and input / output terminals are used. In order to prevent the substrate from being broken or chipped due to the stress applied to the substrate due to the difference in the coefficient of thermal expansion from the printed circuit board or the like, it is desired that the thermal expansion coefficients between the respective materials be similar. .
【0005】[0005]
【発明が解決しようとする課題】しかしながら、従来の
ガラスセラミックス材料は、誘電率が低いものの、信号
の周波数が10GHz以上のマイクロ波に対して、その
誘電損失が20×10-4以上と高く、このような高周波
用としては実用化し得るに十分な特性を有していないも
のであった。However, although the conventional glass ceramic material has a low dielectric constant, its dielectric loss is as high as 20 × 10 -4 or more with respect to a microwave having a signal frequency of 10 GHz or more. Such a high-frequency device does not have characteristics sufficient for practical use.
【0006】しかも、従来のガラスセラミックスは、誘
電体特性を決定する成分のみでは、その組成を調整して
も、熱膨張係数を種々調整することが難しく、そのため
に、種々の熱膨張調整剤を必要とし、その結果、誘電特
性を損ねてしまうなどの問題があった。Moreover, in conventional glass ceramics, it is difficult to variously adjust the coefficient of thermal expansion even if the composition is adjusted only with the components that determine the dielectric properties. Required, and as a result, there is a problem that the dielectric properties are impaired.
【0007】従って、本発明は、銅、金、銀等の低抵抗
金属と同時焼成が可能であり、しかも低誘電率および高
周波領域で低誘電正接を有し、直線的な熱膨張挙動を示
し、しかも熱膨張係数が2〜17ppm/℃の間で調整
可能である低温焼成磁器組成物と低温焼成磁器の製造方
法を提供することを目的とするものである。Accordingly, the present invention can be co-fired with a low-resistance metal such as copper, gold, and silver, has a low dielectric constant and a low dielectric loss tangent in a high-frequency range, and exhibits a linear thermal expansion behavior. Further, it is an object of the present invention to provide a low-temperature fired porcelain composition and a method of manufacturing a low-temperature fired porcelain whose thermal expansion coefficient can be adjusted between 2 and 17 ppm / ° C.
【0008】[0008]
【課題を解決するための手段】本発明者は、上記問題点
を鋭意検討した結果、Zn,Siを特定比率で含有する
複合酸化物に対して、Li2 O、B2 O3 、あるいは少
なくともSiO2 とB2 O3 とを含むガラスを添加する
ことにより複合酸化物中のZnOとB2 O3 中のB(ホ
ウ素)成分による液相反応と、さらにLi2 O中のLi
成分による液相反応が加わることにより僅かなB
2 O3 、Li2 Oにより、800〜1000℃以下の温
度で焼成でき、しかもを焼成によって、結晶相として、
少なくともZn、およびSiを含むウイレマイト結晶相
やSiO2 結晶相を析出させることにより、低い比誘電
率と低い誘電正接、さらには2〜17ppm/℃の間で
幅広く熱膨張係数を調整できることを知見し、本発明に
至った。Means for Solving the Problems As a result of diligent studies of the above problems, the present inventors have found that a composite oxide containing Zn and Si at a specific ratio can be used with Li 2 O, B 2 O 3 or at least. By adding a glass containing SiO 2 and B 2 O 3 , a liquid phase reaction due to ZnO in the composite oxide and a B (boron) component in B 2 O 3 , and further a Li in Li 2 O
Slight B due to addition of liquid phase reaction due to components
With 2 O 3 and Li 2 O, it can be fired at a temperature of 800 to 1000 ° C. or less, and by firing, as a crystal phase,
It has been found that by precipitating a willemite crystal phase or a SiO 2 crystal phase containing at least Zn and Si, a low relative dielectric constant and a low dielectric loss tangent, and furthermore, a coefficient of thermal expansion can be widely adjusted between 2 and 17 ppm / ° C. This has led to the present invention.
【0009】即ち、本発明の低温焼成磁器組成物は、S
iO2 を14.9〜95重量%と、ZnOを1〜84.
9重量%と、B2 O3 を0.1〜15重量%およびLi
2 Oを0.1〜10重量%とからなるか、またはSiO
2 を14.9〜95重量%、ZnOを1〜84.5重量
%、Li2 Oを0.1〜10重量%と、少なくともSi
O2 およびB2 O3 を含有するガラス0.5〜20重量
%と、とからなることを特徴とするものである。That is, the low-temperature fired porcelain composition of the present invention comprises S
the iO 2 and 14.9 to 95% by weight, the ZnO 1~84.
9 wt% and the B 2 O 3 0.1 to 15% by weight and Li
0.1 to 10% by weight of 2 O or SiO
2 14.9 to 95 wt%, the ZnO 1 to 84.5% by weight, and 0.1 to 10 wt% of Li 2 O, at least Si
Glass 0.5 to 20 wt% containing O 2 and B 2 O 3, is characterized in that consists of capital.
【0010】また、かかる磁器組成物は、焼成によっ
て、少なくともZnOおよびSiO2を含む結晶相を主
相とし、さらに副相として、少なくともSiO2 、Li
2 OおよびZnOを含む結晶相と、SiO2 結晶相を含
む磁器が得られるもので、1GHz〜60GHzでの誘
電率(εr)が7以下、誘電損失が30×10-4以下、
さらに室温から400℃における熱膨張係数が2〜17
ppm/℃の特性を有することを特徴とする。Further, such a porcelain composition has a crystal phase containing at least ZnO and SiO 2 as a main phase by firing, and at least SiO 2 and Li as sub phases.
A crystal phase containing 2 O and ZnO and a porcelain containing SiO 2 crystal phase can be obtained. The dielectric constant (εr) at 1 GHz to 60 GHz is 7 or less, the dielectric loss is 30 × 10 −4 or less,
Further, the coefficient of thermal expansion from room temperature to 400 ° C. is 2 to 17
It has a characteristic of ppm / ° C.
【0011】さらに、本発明の低温焼成磁器の製造方法
は、上記の各組成物を用いて、所定形状に成形後、酸化
あるいは非酸化性雰囲気中、800℃〜1000℃で焼
成して、磁器を製造することを特徴とするものである。Further, in the method for producing a low-temperature fired porcelain of the present invention, each of the above-mentioned compositions is molded into a predetermined shape and then fired at 800 to 1000 ° C. in an oxidizing or non-oxidizing atmosphere. Is manufactured.
【0012】[0012]
【発明の実施の形態】本発明の低温焼成磁器組成物の第
1の態様によれば、SiO2 を14.9〜95重量%
と、ZnOを1〜84.9重量%と、B2 O3 を0.1
〜15重量%およびLi2 Oを0.1〜10重量%とか
らなるものである。According to a first aspect of the low temperature sintering ceramic composition of the embodiment of the present invention, the SiO 2 14.9-95 wt%
1 to 84.9% by weight of ZnO and 0.1% by weight of B 2 O 3 .
15% by weight and Li 2 O and is made of 0.1 to 10 wt%.
【0013】各成分組成を上記の範囲に限定したのは、
SiO2 が14.9重量%よりも少ないとZnOが過剰
に析出してしまい誘電損失が劣化し、SiO2 が95重
量%よりも多くなると焼結性が劣化し1000℃以下の
低温で緻密化しないためである。SiO2 の望ましい量
は25〜90重量%である。The reason for limiting each component composition to the above range is as follows.
If SiO 2 is less than 14.9% by weight, ZnO is excessively precipitated and dielectric loss is deteriorated. If SiO 2 is more than 95% by weight, sinterability is deteriorated and densification is performed at a low temperature of 1000 ° C. or less. This is because they do not. Desired amount of SiO 2 is 25 to 90 wt%.
【0014】また、ZnOが1重量%よりも少ないと十
分な液相が生成せず、1000℃以下の低温で緻密化し
ないためであり、84.9重量%よりも多いとZnOが
過剰に析出してしまい誘電損失が劣化してしまうためで
ある。ZnOの望ましい量は10〜60重量%である。On the other hand, if the content of ZnO is less than 1% by weight, a sufficient liquid phase is not formed, and densification is not performed at a low temperature of 1000 ° C. or less. If the content is more than 84.9% by weight, ZnO is excessively precipitated. This causes the dielectric loss to deteriorate. The preferred amount of ZnO is 10-60% by weight.
【0015】さらに、Li2 Oが0.1重量%よりも少
ないと、SiO2 量が多い場合において、主相となるS
iO2 相が容易にクリストバライトに相変態してしま
い、200℃付近に変曲点をもつ熱膨張挙動を示してし
まうためであり、10重量%よりも多いと誘電損失が劣
化してしまうためである。Li2 Oの望ましい範囲は、
1〜5重量%である。Further, when the content of Li 2 O is less than 0.1% by weight, when the amount of SiO 2 is large, the main phase S
This is because the iO 2 phase easily transforms into cristobalite and exhibits a thermal expansion behavior having an inflection point near 200 ° C., and if it exceeds 10% by weight, the dielectric loss is deteriorated. is there. A desirable range of Li 2 O is
1 to 5% by weight.
【0016】さらに、B2 O3 量が0.1重量%より少
ないと、800〜1000℃の温度で磁器が十分に緻密
化することができず、15重量%より多いと、過剰な液
相が生成し1〜60GHzの高周波領域における誘電正
接が30×10-4を越えるためである。B2 O3 の望ま
しい範囲は、1〜5重量%である。If the amount of B 2 O 3 is less than 0.1% by weight, the porcelain cannot be sufficiently densified at a temperature of 800 to 1000 ° C. Is generated and the dielectric loss tangent in the high frequency range of 1 to 60 GHz exceeds 30 × 10 −4 . Preferred range of B 2 O 3 is 1 to 5 wt%.
【0017】また、本発明の第2の態様によれば、Si
O2 を14.9〜95重量%、ZnOを1〜84.5重
量%、Li2 Oを0.1〜10重量%と、少なくともS
iO2 およびB2 O3 を含有するガラス0.5〜20重
量%とからなる。According to a second aspect of the present invention, the Si
14.9 to 95% by weight of O 2, 1 to 84.5% by weight of ZnO, 0.1 to 10% by weight of Li 2 O, and at least S
iO 2 and B 2 O 3 glass 0.5 to 20% by weight containing consists.
【0018】この組成物において、SiO2 、ZnO、
Li2 O量の限定理由は第1の態様と同様な理由によ
る。少なくともSiO2 およびB2 O3 を含有するガラ
スについて、上記ガラス量が0.5重量%より少ない
と、800〜1000℃の温度で磁器が十分に緻密化す
ることができず、20重量%より多いと、過剰な液相が
生成し1〜60GHzの高周波領域における誘電正接が
30×10-4を越えて高くなるためである。少なくとも
SiO2 とB2 O3 を含有するガラスの望ましい範囲
は、1〜10重量%である。In this composition, SiO 2 , ZnO,
The reason for limiting the amount of Li 2 O is the same as in the first embodiment. If the glass content of the glass containing at least SiO 2 and B 2 O 3 is less than 0.5% by weight, the porcelain cannot be sufficiently densified at a temperature of 800 to 1000 ° C. If the amount is too large, an excessive liquid phase is generated, and the dielectric loss tangent in the high frequency range of 1 to 60 GHz is higher than 30 × 10 −4 . A desirable range of the glass containing at least SiO 2 and B 2 O 3 is 1 to 10% by weight.
【0019】なお、上記の少なくともSiO2 、B2 O
3 を含むガラスとしては、一般にホウケイ酸系ガラス、
ホウケイ酸亜鉛系ガラス、ホウケイ酸鉛系ガラスなどが
好適に用いられるが、特にSiO2 を5〜80重量%、
B2 O3 を4〜50重量%の割合でそれぞれ含み、他の
成分としてAl2 O3 を30重量%以下、アルカリ金属
酸化物を20重量%以下の割合で含むものが好適に使用
され、これらの酸化物成分を所定割合で配合したものを
溶融、冷却し、ガラス化したものが使用される。It should be noted that at least the above-mentioned SiO 2 , B 2 O
As glass containing 3 , generally, borosilicate glass,
Zinc borosilicate glass, although borosilicate lead glass is preferably used, in particular a SiO 2 5 to 80 wt%,
Wherein each B 2 O 3 in a proportion of 4-50 wt%, the Al 2 O 3 30 wt% or less as another component, are preferably used those containing alkali metal oxides in a proportion of 20 wt% or less, A mixture of these oxide components in a predetermined ratio is melted, cooled, and vitrified.
【0020】また、上記第1および第2の態様の磁器組
成物は、いずれも800〜1000℃の温度範囲での焼
成によって相対密度95%以上まで緻密化することがで
き、これによって形成される磁器は、図1(a)(b)
の磁器組織の概略図に示すように、結晶相として、少な
くともZnOおよびSiO2 を含む結晶相(W)または
SiO2 (クオーツ)結晶相(Q)を主相とし、さらに
副相として、少なくともSiO2 、Li2 OおよびZn
Oを含む結晶相(L)含み、さらに、さらには、これに
わずかにSiO2 またはZnO、B2 O3 を含む非晶質
が析出する場合もある。Further, the porcelain compositions of the first and second embodiments can be densified to a relative density of 95% or more by firing in a temperature range of 800 to 1000 ° C., and thus formed. The porcelain is shown in FIGS.
As shown in the schematic diagram of the porcelain structure of the above, as a crystal phase, a crystal phase (W) containing at least ZnO and SiO 2 or a SiO 2 (quartz) crystal phase (Q) is used as a main phase, and at least SiO 2 is used as a sub phase. 2 , Li 2 O and Zn
In some cases, an amorphous phase containing SiO 2, ZnO, or B 2 O 3 may be precipitated, including a crystalline phase (L) containing O.
【0021】なお、少なくともZnOおよびSiO2 を
含む結晶相としては、ウイレマイト(Zn2 SiO
4 型)結晶相である。また、少なくともSiO2 、Li
2 OおよびZnOを含む結晶相は、Zn2 SiO4 型結
晶のSiサイトにZnおよびLiが固溶した、Zn
2 (Znx Liy Siz )O4 (x+y+z=1)の結
晶相および/またはLi2 ZnSiO4 型結晶である。
さらに、SiO2 相としては、クオーツ相を含み、さら
には、少量のクリストバライト相、トリジマイト相など
の結晶相が析出する場合もある。The crystal phase containing at least ZnO and SiO 2 is willemite (Zn 2 SiO 2).
Type 4 ) crystalline phase. Further, at least SiO 2 , Li
The crystal phase containing 2 O and ZnO is Zn, in which Zn and Li form a solid solution at the Si site of the Zn 2 SiO 4 type crystal.
2 (Znx Liy Siz) O 4 (x + y + z = 1) crystal phase and / or Li 2 ZnSiO 4 type crystal.
Further, the SiO 2 phase includes a quartz phase, and a small amount of a crystal phase such as a cristobalite phase and a tridymite phase may be precipitated in some cases.
【0022】このように本発明によれば、磁器中に、少
なくともZnとSiを含む結晶相や、SiO2 系結晶相
等を析出させることができる結果、比誘電率を7以下の
低誘電率を有するとともに、マイクロ波、ミリ波などの
高周波帯域、具体的には1GHz〜60GHzの範囲に
おいて、誘電損失が30×10-4以下の低損失特性を有
するものである。しかも、この磁器は、組成物の組成を
前述の範囲で制御することにより、上記誘電体特性を維
持しながら、結晶相の比率などの変動によって、室温か
ら400℃の温度範囲の熱膨張係数を2〜17ppm/
℃の範囲で制御することが可能であり、しかも直線的な
熱膨張挙動を示すものである。As described above, according to the present invention, a crystal phase containing at least Zn and Si, a SiO 2 -based crystal phase, and the like can be precipitated in a porcelain. As a result, a low dielectric constant of 7 or less is obtained. In addition, it has a low loss characteristic of a dielectric loss of 30 × 10 −4 or less in a high frequency band such as a microwave and a millimeter wave, specifically, in a range of 1 GHz to 60 GHz. Moreover, by controlling the composition of the composition in the above-described range, the porcelain has a coefficient of thermal expansion in a temperature range from room temperature to 400 ° C. due to fluctuations in the ratio of crystal phases while maintaining the above-mentioned dielectric properties. 2 to 17 ppm /
It can be controlled in the range of ° C. and shows a linear thermal expansion behavior.
【0023】また、本発明の低温焼成磁器の製造方法に
よれば、上記の組成物を得るにあたり、原料粉末として
は、Zn2 SiO4 で表されるウイレマイト化合物と、
結晶質または非晶質からなるSiO2 が好適に用いられ
る。Further, according to the method for producing a low-temperature fired porcelain of the present invention, in obtaining the above-mentioned composition, a raw material powder represented by Zn 2 SiO 4
Crystalline or amorphous SiO 2 is preferably used.
【0024】また、B2 O3 源としては、B2 O3 、焼
結過程でB2 O3 を形成し得るB2S3 、H2 BO
3 や、ZnO・2B2 O3 、4ZnO・3B2 O3 など
のほう酸亜鉛などの化合物の群から選ばれる少なくとも
1種が用いられる。The source of B 2 O 3 is B 2 O 3 , and B 2 S 3 and H 2 BO which can form B 2 O 3 in the sintering process.
3 and at least one is used from the group of compounds such as zinc borate, such as ZnO · 2B 2 O 3, 4ZnO · 3B 2 O 3.
【0025】さらに、Li2 O源として、Li2 O、焼
結過程でL 2 Oを形成し得るLi2 CO3 、LiOH
・H2 O、Li2 S等、あるいはLi2 SiO3 、Li
4 SiO4 、Li2 Si2 O5 、Li2 Si3 O7 、L
i6 Si2 O7 、Li8 SiO6 などのSiO2 および
Li2 Oを含む化合物、Li2 ZnSiO4 、Zn
2(ZnxLiySiz)O4 (x+y+z=1)など
のSiO2 、Li2 OおよびZnOを含む化合物の群か
ら選ばれる少なくとも1種が用いられる。Furthermore, Li 2 O as source, Li 2 O, during sintering L 2 O capable of forming Li 2 CO 3, LiOH
・ H 2 O, Li 2 S, etc., or Li 2 SiO 3 , Li
4 SiO 4 , Li 2 Si 2 O 5 , Li 2 Si 3 O 7 , L
Compounds containing SiO 2 and Li 2 O, such as i 6 Si 2 O 7 and Li 8 SiO 6 , Li 2 ZnSiO 4 , Zn
At least one selected from the group of compounds containing SiO 2 , Li 2 O, and ZnO, such as 2 (ZnxLiySiz) O 4 (x + y + z = 1), is used.
【0026】またさらに、少なくともSiO2 およびB
2 O3 を含有するガラスとしては、前述したような、ホ
ウケイ酸系ガラス、ホウケイ酸亜鉛系ガラス、ホウケイ
酸鉛系ガラスなどが好適に用いられる。Still further, at least SiO 2 and B
As the glass containing 2 O 3 , borosilicate-based glass, zinc borosilicate-based glass, lead borosilicate-based glass, and the like are preferably used as described above.
【0027】これらの原料を用いて、前記第1の態様ま
たは第2の態様の組成物に調合し、、混合する。そし
て、その混合粉末に適宜バインダ−を添加した後、例え
ば、金型プレス、冷間静水圧プレス、押し出し成形、ド
クターブレード法、圧延法等により任意の形状に成形
後、酸化雰囲気中または、N2 ,Ar等の非酸化性雰囲
気中において800℃〜1000℃、特に900〜10
00℃の温度で0.1〜5時間焼成することにより相対
密度95%以上に緻密化することができる。Using these raw materials, the composition of the first embodiment or the second embodiment is prepared and mixed. Then, after appropriately adding a binder to the mixed powder, for example, after being formed into an arbitrary shape by a die press, a cold isostatic press, an extrusion molding, a doctor blade method, a rolling method, or the like, in an oxidizing atmosphere or N 2 2 , 800 ° C. to 1000 ° C., particularly 900 to 10 ° C. in a non-oxidizing atmosphere such as Ar
By baking at a temperature of 00 ° C. for 0.1 to 5 hours, it is possible to densify to a relative density of 95% or more.
【0028】この時の焼成温度が800℃より低いと、
磁器が十分に緻密化せず、1000℃を越えると緻密化
は可能であるが、銅、銀などの導体と同時焼成ができな
くなる。因みに、同時焼成時に、導体として銅を用いる
場合には非酸化性雰囲気とし、銀を用いる場合には非酸
化性または酸化性雰囲気で焼成することが必要である。
銅導体を用いることが出来なくなるためである。If the firing temperature at this time is lower than 800 ° C.,
The porcelain is not sufficiently densified. If the temperature exceeds 1000 ° C., densification is possible, but simultaneous sintering with a conductor such as copper or silver cannot be performed. Incidentally, at the time of simultaneous firing, it is necessary to fire in a non-oxidizing atmosphere when copper is used as the conductor and in a non-oxidizing or oxidizing atmosphere when using silver as the conductor.
This is because a copper conductor cannot be used.
【0029】本発明の上記方法によれば、ZnおよびS
iからなる複合酸化物と、B2 O3、またはSiO2 、
B2 O3 を含むガラスに、さらにLi2 Oを組み合わせ
ることにより、複合酸化物から生成するZnを主とする
液相とB2 O3 中またはガラス中のB(ホウ素)成分の
より活性な液相反応が生じる。さらにLi2 O中のLi
成分による液相反応加わることにより僅かなB2 O3 、
Li2 Oにより、800〜1000℃以下の温度で焼成
でき、磁器を緻密化することができる。そのために、誘
電正接を増大させる要因となる粒界の非晶質相の量を最
小限に押さえることができる。このため高周波帯域にお
いてより低い誘電正接を得ることができるのである。According to the above method of the present invention, Zn and S
i, a composite oxide comprising B 2 O 3 or SiO 2 ,
By further combining Li 2 O with the glass containing B 2 O 3 , the liquid phase mainly composed of Zn generated from the composite oxide and the more active B (boron) component in B 2 O 3 or in the glass can be obtained. A liquid phase reaction occurs. Further, Li in Li 2 O
A small amount of B 2 O 3 ,
Li 2 O can be fired at a temperature of 800 to 1000 ° C. or less, and the porcelain can be densified. For this reason, the amount of the amorphous phase at the grain boundary, which causes an increase in the dielectric loss tangent, can be minimized. Therefore, a lower dielectric loss tangent can be obtained in a high frequency band.
【0030】また、本発明における磁器組成物は、80
0〜1000℃で焼成可能であることから、特に銅、
金、銀などを配線する配線基板の絶縁基板として用いる
ことができる。かかる磁器組成物を用いて配線基板を作
製する場合には、例えば、上記のようにして調合した混
合粉末を公知のテープ成形法、例えばドクターブレード
法、圧延法等に従い、絶縁層形成用のグリーンシートを
作製した後、そのシートの表面に配線回路層用として、
銅、金および銀のうちの少なくとも1種の金属、特に、
銅粉末を含む導体ペーストを用いて、グリーンシート表
面に配線パターンにスクリーン印刷法、グラビア印刷法
等によって回路パターン状に印刷し、場合によってはシ
ートにスルーホールやビアホール形成後、上記導体ペー
ストを充填する。その後、複数のグリーンシートを積層
圧着した後、上述した条件で焼成することにより、配線
層と絶縁層とを同時に焼成することができる。Further, the porcelain composition according to the present invention comprises:
Since it can be fired at 0 to 1000 ° C., particularly copper,
It can be used as an insulating substrate of a wiring board for wiring gold, silver, and the like. In the case of manufacturing a wiring board using such a porcelain composition, for example, according to a known tape forming method, for example, a doctor blade method, a rolling method, or the like, the mixed powder prepared as described above is used to form an insulating layer forming green. After making the sheet, on the surface of the sheet for the wiring circuit layer,
At least one metal of copper, gold and silver, especially
Using a conductive paste containing copper powder, print the wiring pattern on the surface of the green sheet in a circuit pattern by screen printing, gravure printing, etc. In some cases, fill the above conductive paste after forming through holes and via holes in the sheet I do. After that, a plurality of green sheets are stacked and pressed, and then fired under the above-described conditions, whereby the wiring layer and the insulating layer can be fired simultaneously.
【0031】[0031]
実施例1 平均粒径が1μm以下のZn2 SiO4 、ZnO・2B
2 O3 、4ZnO・3B2 O3 で示される化合物、Si
O2 (アモルファス)、Li2 Oを原料として用い、表
1の組成に従い混合した。そして、この混合物に有機バ
インダー、可塑剤、トルエンを添加し、ドクターブレー
ド法により厚さ300μmのグリーンシートを作製し
た。そして、このグリーンシートを5枚積層し、50℃
の温度で100kg/cm2 の圧力を加えて熱圧着し
た。得られた積層体を水蒸気含有窒素雰囲気中で、70
0℃で脱バインダーした後、乾燥窒素中で表1の条件に
おいて焼成して多層基板用磁器を得た。Example 1 Zn 2 SiO 4 and ZnO · 2B having an average particle size of 1 μm or less
Compound represented by 2 O 3 , 4ZnO · 3B 2 O 3 , Si
O 2 (amorphous) and Li 2 O were used as raw materials and mixed according to the composition shown in Table 1. Then, an organic binder, a plasticizer, and toluene were added to the mixture, and a green sheet having a thickness of 300 μm was prepared by a doctor blade method. Then, five green sheets are laminated, and the temperature is set to 50 ° C.
A pressure of 100 kg / cm 2 was applied at a temperature of, and thermocompression bonding was performed. The obtained laminate is placed in a nitrogen atmosphere containing water vapor at 70
After removing the binder at 0 ° C., it was fired in dry nitrogen under the conditions shown in Table 1 to obtain a porcelain for a multilayer substrate.
【0032】得られた焼結体について誘電率、誘電正接
を以下の方法で評価した。測定は、形状直径1〜5m
m、厚み2〜3mmの試料を切り出し、60GHzにて
ネットワークアナライザー、シンセサイズドスイーパー
を用いて誘電体円柱共振器法により行った。測定では、
NRDガイド(非放射性誘電体線路)で、誘電体共振器
の励起を行い、TE021,TE031モードの共振特
性より誘電率、誘電正接を算出した。測定の結果は表1
に示した。また、X線回折測定から、磁器の構成相を同
定し、試料No.8、15についてX線回折チャートを図
2、図3に示した。さらに、各磁器について、室温から
400℃の温度範囲における熱膨張係数を測定するとと
もに、その温度範囲内で熱膨張曲線における200℃付
近での変曲点を有無を確認した。なお、試料No.19お
よび試料No.9の熱膨張曲線を図4、図5に示した。The dielectric constant and the dielectric loss tangent of the obtained sintered body were evaluated by the following methods. The measurement is 1-5m in shape diameter
A sample having a thickness of m and a thickness of 2 to 3 mm was cut out and subjected to a dielectric cylinder resonator method at 60 GHz using a network analyzer and a synthesized sweeper. In the measurement,
The dielectric resonator was excited by the NRD guide (non-radiative dielectric line), and the dielectric constant and the dielectric loss tangent were calculated from the resonance characteristics of the TE021 and TE031 modes. Table 1 shows the measurement results.
It was shown to. The constituent phases of the porcelain were identified from the X-ray diffraction measurement, and the X-ray diffraction charts of Sample Nos. 8 and 15 are shown in FIGS. Further, for each porcelain, the coefficient of thermal expansion in the temperature range from room temperature to 400 ° C. was measured, and the presence or absence of an inflection point near 200 ° C. in the thermal expansion curve within the temperature range was confirmed. The thermal expansion curves of Sample No. 19 and Sample No. 9 are shown in FIGS.
【0033】また、比較例として、Zn2 SiO4 、S
iO2 に代わり、MgSiO3 、CaSiO3 を用いて
同様に焼結体を作製し評価した(試料No.25、2
6)。As a comparative example, Zn 2 SiO 4 , S
Similarly, sintered bodies were prepared and evaluated using MgSiO 3 and CaSiO 3 instead of iO 2 (Sample Nos. 25 and 2).
6).
【0034】[0034]
【表1】 [Table 1]
【0035】表1の結果から明らかなように、結晶相と
して、ウイレマイト結晶相(Zn2SiO4 )、SiO
2 系結晶相が主として析出した本発明の磁器は、いずれ
も誘電率が7以下、60GHzでの誘電正接が30×1
0-4以下の優れた値を示した。As is clear from the results in Table 1, the crystal phases were willemite crystal phase (Zn 2 SiO 4 ), SiO 2
The porcelain of the present invention in which the second crystal phase is mainly deposited has a dielectric constant of 7 or less and a dielectric loss tangent of 30 × 1 at 60 GHz.
Excellent values of 0 -4 or less were shown.
【0036】これに対して、SiO2 量が95重量%を
越える試料No.1では1600℃まで高めないと緻密化
できず、14.9重量%よりも少ないと誘電特性が大き
く劣化した。B2 O3 量が0.1重量%未満である試料
No.13では、焼成温度を1300℃まで高めないと緻
密化することができず、本発明の目的に適さないもので
あった。一方、B2 O3 量が15重量%を越える試料N
o.16は誘電損失が増大し60GHzにおいて誘電特性
が評価できなかった。Li2 O量が0.1重量%よりも
少ない試料No.9では、クリストバライトが多量に析出
し、その結果、熱膨張曲線に変曲点が生じた。なお、本
発明品の磁器の液相に対して、ICP発光分光分析によ
って分析した結果、いずれも液相中からZn、Bが元素
が検出された。On the other hand, in Sample No. 1 in which the amount of SiO 2 exceeds 95% by weight, densification could not be achieved unless the temperature was raised to 1600 ° C., and when it was less than 14.9% by weight, the dielectric properties were significantly deteriorated. In Sample No. 13 in which the amount of B 2 O 3 was less than 0.1% by weight, densification was not possible unless the firing temperature was increased to 1300 ° C., which was not suitable for the purpose of the present invention. On the other hand, sample N in which the amount of B 2 O 3 exceeds 15% by weight
In No. o.16, the dielectric loss was increased and the dielectric properties could not be evaluated at 60 GHz. In sample No. 9 in which the amount of Li 2 O was less than 0.1% by weight, a large amount of cristobalite was precipitated, and as a result, an inflection point occurred in the thermal expansion curve. In addition, as a result of analyzing the liquid phase of the porcelain of the present invention by ICP emission spectroscopy, elements of Zn and B were detected in the liquid phase in each case.
【0037】ZnO量が84.9重量%を越える試料N
o.24では過剰なZnO相が析出し、このため誘電損失
が増大し60GHzにおいて誘電特性が評価できなかっ
た。Sample N having a ZnO content of more than 84.9% by weight
In the case of o.24, an excessive ZnO phase was precipitated, which increased the dielectric loss, and the dielectric properties could not be evaluated at 60 GHz.
【0038】一方、ZnO量が1重量%未満の試料No.
3では過剰なSiO2 相が析出し、またZn量が不十分
であるため、B2 O3 中のB成分と液相を形成すること
が困難となり、1400℃まで高めないと緻密化できな
かった。On the other hand, the sample No. having a ZnO content of less than 1% by weight.
In No. 3, an excessive SiO 2 phase is precipitated, and the Zn content is insufficient, so that it is difficult to form a liquid phase with the B component in B 2 O 3 , and densification cannot be achieved unless the temperature is raised to 1400 ° C. Was.
【0039】また、比較例として、MgSiO3 やCa
SiO3 を用いた試料No.25、26では、B2 O3 量
を15重量%以上添加しないと緻密化しないため十分な
誘電特性が得られず、本発明の目的に適さないものであ
った。As comparative examples, MgSiO 3 and Ca
In Samples Nos. 25 and 26 using SiO 3 , if the amount of B 2 O 3 was not more than 15% by weight, densification would not be achieved, and sufficient dielectric properties could not be obtained, which was not suitable for the purpose of the present invention. .
【0040】実施例2 表2の組成からなるガラス粉末と平均粒径が1μm以下
のZn2 SiO4 、Li2 O、SiO2 を用いて表3の
組成になるように混合した。そして、この混合物に有機
バインダー、可塑剤、トルエンを添加し、ドクターブレ
ード法により厚さ300μmのグリーンシートを作製し
た。そして、このグリーンシートを5枚積層し、50℃
の温度で100kg/cm2 の圧力を加えて熱圧着し
た。得られた積層体を水蒸気含有/窒素雰囲気中で、7
00℃で脱バインダーした後、乾燥窒素中で表3の条件
において焼成して多層基板用磁器を得た。Example 2 A glass powder having the composition shown in Table 2 was mixed with Zn 2 SiO 4 , Li 2 O and SiO 2 having an average particle diameter of 1 μm or less so as to have the composition shown in Table 3. Then, an organic binder, a plasticizer, and toluene were added to the mixture, and a green sheet having a thickness of 300 μm was prepared by a doctor blade method. Then, five green sheets are laminated, and the temperature is set to 50 ° C.
A pressure of 100 kg / cm 2 was applied at a temperature of, and thermocompression bonding was performed. The obtained laminate is placed in a steam-containing / nitrogen atmosphere at 7
After removing the binder at 00 ° C., it was fired in dry nitrogen under the conditions shown in Table 3 to obtain a porcelain for a multilayer substrate.
【0041】得られた焼結体について実施例1と同様に
して誘電率、誘電正接および結晶相の同定、熱膨張係数
を実施例1と同様な方法で測定評価した。測定の結果は
表3に示した。With respect to the obtained sintered body, the dielectric constant, the dielectric loss tangent, the identification of the crystal phase, and the thermal expansion coefficient were measured and evaluated in the same manner as in Example 1 in the same manner as in Example 1. The results of the measurement are shown in Table 3.
【0042】[0042]
【表2】 [Table 2]
【0043】[0043]
【表3】 [Table 3]
【0044】表2、表3の結果から明らかなように、本
発明の成分組成に制御した試料は、実施例1と同様に、
いずれも1000℃以下で緻密化できるとともに、結晶
相として、ウイレマイト結晶相やSiO2 系結晶が主と
して析出し、いずれも誘電率が7以下、60GHzでの
誘電正接が30×10-4以下の優れた値を示した。しか
も、熱膨張係数が1.5〜17ppm/℃の範囲で制御
可能であり、変曲点も存在しなかった。As is clear from the results in Tables 2 and 3, the samples controlled to the composition of the present invention were prepared in the same manner as in Example 1,
Both can be densified at 1000 ° C. or lower, and willemite crystal phase or SiO 2 -based crystal is mainly precipitated as a crystal phase, and all have an excellent dielectric constant of 7 or less and a dielectric loss tangent at 60 GHz of 30 × 10 -4 or less. Value. Moreover, the coefficient of thermal expansion was controllable in the range of 1.5 to 17 ppm / ° C., and there was no inflection point.
【0045】実施例3 上記実施例1中のNo.8および15の磁器を用いて、直
径1〜30mm、厚み2〜15mmの円柱サンプル)を
作製した。また比較として汎用品のコージェライト系ガ
ラスセラミックス(硼珪酸ガラス75重量%、Al2 O
3 25重量%)、汎用の低純度アルミナ(Al2 O3 9
5重量%、CaO、MgO5重量%)を用い同様にして
サンプルを作製した。作製したサンプルを1GHz、1
0GHz、20GHz、30GHz、60GHzの高周
波、マイクロ波、ミリ波領域において、誘電体円柱共振
器法により誘電正接を測定した。結果を図6に示した。Example 3 A cylindrical sample having a diameter of 1 to 30 mm and a thickness of 2 to 15 mm was produced using the porcelains of Nos. 8 and 15 in the above Example 1. For comparison, a cordierite glass ceramic (75% by weight of borosilicate glass, Al 2 O
3 25 wt%), low purity alumina universal (Al 2 O 3 9
5% by weight, 5% by weight of CaO and MgO) to prepare a sample in the same manner. The prepared sample was 1 GHz, 1
In a high frequency range of 0 GHz, 20 GHz, 30 GHz, and 60 GHz, a microwave, and a millimeter wave, the dielectric loss tangent was measured by a dielectric cylinder resonator method. The results are shown in FIG.
【0046】汎用品のガラスセラミックスは低周波領域
において誘電正接は7×10-4と低いが、高周波領域に
なるに従い特性が劣化してしまい20GHz以上では2
0×10-4程度になってしまう。また、汎用の低純度ア
ルミナは60GHzで40×10-4程度まで高くなっ
た。一方、本発明品は、60GHzでの高周波領域にお
いても誘電正接は30×10-4以下と低いものであっ
た。なお、誘電率は汎用品ガラスセラミックスは5、低
純度アルミナは9であった。The general-purpose glass ceramic has a low dielectric loss tangent of 7 × 10 −4 in the low frequency region, but its characteristics deteriorate in the high frequency region.
It will be about 0 × 10 -4 . In addition, general-purpose low-purity alumina increased to about 40 × 10 −4 at 60 GHz. On the other hand, the product of the present invention had a low dielectric loss tangent of 30 × 10 −4 or less even in a high frequency region at 60 GHz. The dielectric constant was 5 for general-purpose glass ceramics and 9 for low-purity alumina.
【0047】[0047]
【発明の効果】以上詳述した通り、本発明の低温焼成磁
器組成物は、誘電率が低く、30GHz以上の高周波に
おいても誘電正接が小さいので、高周波用途のマイクロ
波用回路素子等において最適である。さらに、熱膨張係
数を誘電特性を損なうことなく、直線的な熱膨張挙動で
幅広く制御できることから、かかる磁器を用いた配線基
板をマザーボードなどのプリント基板に実装したり、電
子部品や入出力端子を取り付ける際において、熱膨張差
を小さくできることから、信頼性の高い基板を作製する
ことができる。しかも、800〜1000℃で焼成され
るため、Cu、Au、Ag等による配線を同時焼成によ
り形成することができる。As described above in detail, the low-temperature fired porcelain composition of the present invention has a low dielectric constant and a small dielectric loss tangent even at a high frequency of 30 GHz or more. is there. Furthermore, since the coefficient of thermal expansion can be controlled widely by linear thermal expansion behavior without impairing the dielectric properties, wiring boards using such porcelain can be mounted on printed boards such as motherboards, and electronic components and input / output terminals can be used. At the time of mounting, the difference in thermal expansion can be reduced, so that a highly reliable substrate can be manufactured. In addition, since firing is performed at 800 to 1000 ° C., wirings of Cu, Au, Ag, or the like can be formed by simultaneous firing.
【図1】本発明の誘電体磁器の組織の概略図である。FIG. 1 is a schematic view of a structure of a dielectric porcelain of the present invention.
【図2】本発明の誘電体磁器(試料No.8)のX線回折
チャート図である。FIG. 2 is an X-ray diffraction chart of a dielectric ceramic (sample No. 8) of the present invention.
【図3】本発明の誘電体磁器(試料No.15)のX線回
折チャート図である。FIG. 3 is an X-ray diffraction chart of a dielectric porcelain (sample No. 15) of the present invention.
【図4】本発明の誘電体磁器(試料No.19)の熱膨張
曲線を示す図である。FIG. 4 is a view showing a thermal expansion curve of a dielectric ceramic (sample No. 19) of the present invention.
【図5】比較例の誘電体磁器(試料No.9)の熱膨張曲
線を示す図である。FIG. 5 is a view showing a thermal expansion curve of a dielectric ceramic (sample No. 9) of a comparative example.
【図6】本発明品および従来品の誘電正接の測定周波数
との関係を示した図である。FIG. 6 is a diagram showing a relationship between a product of the present invention and a conventional product, with respect to a measured frequency of dielectric loss tangent.
Claims (8)
Oを1〜84.9重量%と、B2 O3 を0.1〜15重
量%およびLi2 Oを0.1〜10重量%とからなるこ
とを特徴とする低温焼成磁器組成物。(1) SiO 2 content of 14.9 to 95% by weight, Zn
O and a 1 to 84.9% by weight, low-temperature fired ceramic composition characterized by comprising a B 2 O 3 and 0.1 to 15 wt% and Li 2 O from 0.1 to 10 wt%.
iO2 を含む結晶相を主相とし、さらに副相として、少
なくともSiO2 、Li2 OおよびZnOを含む結晶相
と、SiO2 結晶相を含む磁器が得られることを特徴と
する請求項1記載の低温焼成磁器組成物。2. The method of claim 2, wherein at least ZnO and S
a crystal phase comprising iO 2 as the main phase, further a subphase, at least a crystalline phase comprising SiO 2, Li 2 O and ZnO, according to claim 1, characterized in that porcelain containing SiO 2 crystal phase is obtained Low temperature firing porcelain composition.
の誘電率(εr)が7以下、誘電損失が30×10-4以
下、さらに室温から400℃における熱膨張係数が1.
5〜17ppm/℃の特性を有することを特徴とする請
求項1記載の低温焼成磁器組成物。3. The fired porcelain has a dielectric constant (εr) of 7 or less at 1 GHz to 60 GHz, a dielectric loss of 30 × 10 −4 or less, and a coefficient of thermal expansion from room temperature to 400 ° C. of 1.
The low-temperature fired porcelain composition according to claim 1, having a characteristic of 5 to 17 ppm / ° C.
を1〜84.5重量%、Li2 Oを0.1〜10重量%
と、少なくともSiO2 およびB2 O3 を含有するガラ
ス0.5〜20重量%と、とからなることを特徴とする
低温焼成磁器組成物。4. An amount of 14.9 to 95% by weight of SiO 2 , ZnO
1 to 84.5% by weight, Li 2 O 0.1 to 10% by weight
When the low-temperature fired ceramic composition comprising: the glass 0.5 to 20 wt% containing at least SiO 2 and B 2 O 3, in that it consists of and.
iO2 を含む結晶相を主相とし、さらに副相として、少
なくともSiO2 、Li2 OおよびZnOを含む結晶相
と、SiO2 結晶相を含む磁器が得られることを特徴と
する請求項4記載の低温焼成磁器組成物。5. At least ZnO and S
a crystal phase comprising iO 2 as the main phase, further a subphase, at least a crystalline phase comprising SiO 2, Li 2 O and ZnO, according to claim 4, characterized in that porcelain containing SiO 2 crystal phase is obtained Low temperature firing porcelain composition.
の誘電率(εr)が7以下、誘電損失が30×10-4以
下、さらに室温から400℃における熱膨張係数が1.
5〜17ppm/℃の特性を有することを特徴とする請
求項4記載の低温焼成磁器組成物。6. The fired porcelain has a dielectric constant (εr) of 7 or less at 1 GHz to 60 GHz, a dielectric loss of 30 × 10 −4 or less, and a coefficient of thermal expansion from room temperature to 400 ° C. of 1.
The low-temperature fired porcelain composition according to claim 4, having a characteristic of 5 to 17 ppm / ° C.
イレマイト化合物と、結晶質及び非晶質からなるSiO
2 と、B2 O3 、焼結過程でB2 O3 を形成し得るホウ
素化合物およびほう酸亜鉛化合物の群から選ばれる少な
くとも1種と、Li2 O、焼結過程でLi2 Oを形成し
得るリチウム化合物、少なくともSiO2 、Li2 Oを
含む化合物および少なくともSiO2 、Li2 Oおよび
ZnOを含む化合物の群から選ばれる少なくとも1種と
を用いて、SiO2 を14.9〜95重量%と、ZnO
を1〜84.9重量%と、B2 O3 を0.1〜15重量
%およびLi2 Oを0.1〜10重量%とから組成物を
調合し、所定形状に成形後、酸化あるいは非酸化性雰囲
気中、800℃〜1000℃で焼成することを特徴とす
る低温焼成磁器の製造方法。7. A willemite compound containing at least ZnO and SiO 2 and a crystalline and amorphous SiO 2
And 2, B 2 O 3, and at least one selected from the group consisting of boron compounds and zinc borate compound capable of forming a B 2 O 3 during sintering, Li 2 O, to form a Li 2 O during sintering Using the obtained lithium compound, a compound containing at least SiO 2 , Li 2 O and a compound containing at least SiO 2 , Li 2 O and ZnO, 14.9 to 95% by weight of SiO 2 And ZnO
And 1 to 84.9 wt%, B a 2 O 3 to prepare a composition from 0.1 to 10% by weight 0.1 to 15% by weight and Li 2 O, after molding into a predetermined shape, oxidation or A method for producing a low-temperature fired porcelain, which is fired at 800 to 1000 ° C. in a non-oxidizing atmosphere.
イレマイト化合物と、結晶質及び非晶質からなるSiO
2 と、Li2 O、焼結過程でLi2 Oを形成し得るリチ
ウム化合物、少なくともSiO2 、Li2 Oを含む化合
物および少なくともSiO2 、Li2 OおよびZnOを
含む化合物の群から選ばれる少なくとも1種と、少なく
ともSiO2 およびB2 O3 を含有するガラスを用い
て、SiO2 を14.9〜95重量%、ZnOを1〜8
4.5重量%、Li2 Oを0.1〜10重量%と、少な
くともSiO2 およびB2 O3 を含有するガラス0.5
〜20重量%とから組成物を調合し、所定形状に成形
後、酸化あるいは非酸化性雰囲気中、800℃〜100
0℃で焼成することを特徴とする低温焼成磁器の製造方
法。8. A willemite compound containing at least ZnO and SiO 2 and a crystalline and amorphous SiO 2
At least a 2, Li 2 O, lithium compound capable of forming a Li 2 O in the sintering process, selected from the group consisting of at least SiO 2, Li 2 compounds containing O and at least SiO 2, Li compounds comprising 2 O and ZnO Using one kind and a glass containing at least SiO 2 and B 2 O 3 , 14.9 to 95% by weight of SiO 2 and 1 to 8% of ZnO are used.
4.5% by weight, 0.1 to 10% by weight of Li 2 O, glass 0.5 containing at least SiO 2 and B 2 O 3
From 20 to 20% by weight, and after forming into a predetermined shape, in an oxidizing or non-oxidizing atmosphere, at 800 ° C to 100 ° C.
A method for producing low-temperature fired porcelain, which is fired at 0 ° C.
Priority Applications (2)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP10872597A JP3550270B2 (en) | 1997-04-25 | 1997-04-25 | Low temperature fired porcelain composition and method for producing low temperature fired porcelain |
| US09/064,550 US6121173A (en) | 1997-04-25 | 1998-04-22 | Ceramic sintered body and a process for its production |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP10872597A JP3550270B2 (en) | 1997-04-25 | 1997-04-25 | Low temperature fired porcelain composition and method for producing low temperature fired porcelain |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| JPH10297960A true JPH10297960A (en) | 1998-11-10 |
| JP3550270B2 JP3550270B2 (en) | 2004-08-04 |
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ID=14491976
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| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP10872597A Expired - Fee Related JP3550270B2 (en) | 1997-04-25 | 1997-04-25 | Low temperature fired porcelain composition and method for producing low temperature fired porcelain |
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| Country | Link |
|---|---|
| JP (1) | JP3550270B2 (en) |
Cited By (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP2003002735A (en) * | 2001-06-14 | 2003-01-08 | Ngk Spark Plug Co Ltd | Low temperature fired porcelain composition and method for producing the same |
| WO2005073146A1 (en) * | 2004-01-30 | 2005-08-11 | Murata Manufacturing Co., Ltd. | Composition for ceramic substrate, ceramic substrate, process for producing ceramic substrate and glass composition |
Families Citing this family (4)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US7368408B2 (en) | 2004-03-01 | 2008-05-06 | Murata Manufacturing Co., Ltd. | Glass-ceramic composition, glass-ceramic sintered body, and monolithic ceramic electronic component |
| US7439202B2 (en) | 2004-03-01 | 2008-10-21 | Murata Manufacturing Co., Ltd. | Glass ceramic composition, glass-ceramic sintered body, and monolithic ceramic electronic component |
| JP4371141B2 (en) | 2004-03-01 | 2009-11-25 | 株式会社村田製作所 | Insulator ceramic composition, insulating ceramic sintered body, and multilayer ceramic electronic component |
| US7417001B2 (en) | 2004-03-01 | 2008-08-26 | Murata Manufacturing Co., Ltd | Glass ceramic composition, glass-ceramic sintered body, and monolithic ceramic electronic component |
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|---|---|---|---|---|
| JPS6070735A (en) * | 1983-09-27 | 1985-04-22 | Kyocera Corp | Semiconductor element mounting substrate |
| JPS60227311A (en) * | 1984-04-24 | 1985-11-12 | 太陽誘電株式会社 | Insulating porcelain composition |
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| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP2003002735A (en) * | 2001-06-14 | 2003-01-08 | Ngk Spark Plug Co Ltd | Low temperature fired porcelain composition and method for producing the same |
| WO2005073146A1 (en) * | 2004-01-30 | 2005-08-11 | Murata Manufacturing Co., Ltd. | Composition for ceramic substrate, ceramic substrate, process for producing ceramic substrate and glass composition |
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| Publication number | Publication date |
|---|---|
| JP3550270B2 (en) | 2004-08-04 |
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