JPH1030997A - Method and apparatus for measuring light absorption distribution - Google Patents
Method and apparatus for measuring light absorption distributionInfo
- Publication number
- JPH1030997A JPH1030997A JP8187381A JP18738196A JPH1030997A JP H1030997 A JPH1030997 A JP H1030997A JP 8187381 A JP8187381 A JP 8187381A JP 18738196 A JP18738196 A JP 18738196A JP H1030997 A JPH1030997 A JP H1030997A
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- Prior art keywords
- sample
- light
- light absorption
- support
- distribution
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- Spectrometry And Color Measurement (AREA)
- Investigating Or Analyzing Materials Using Thermal Means (AREA)
- Investigating Or Analysing Materials By Optical Means (AREA)
Abstract
(57)【要約】
【課題】 光吸収による試料の温度変化を微小な温度測
定手段によって局所的に測定することにより、試料の光
吸収効率や光吸収スペクトルなどの空間分布を、照射光
の波長よりも高い空間分解能で測定できる。
【解決手段】 光源1の光を、分光器2を通して、試料
5を支持する光透過性の薄膜4の裏面から照射する。原
子間力顕微鏡におけるカンチレバー6の探針先端には、
熱電対の接点7を設ける。薄膜4の裏面から照射した光
は、薄膜4を透過して試料5に吸収され、薄膜4表面上
のうち試料5の存在する場所の温度が局所的に上昇す
る。この温度変化を熱電対の接点7を走査して測定し、
薄膜4面上の試料5の有無の分布、すなわち光吸収効率
の分布を測定する。また、分光器2を用いて、試料5へ
の照射光の波長を走査し、波長変化に伴う温度変化から
試料5の吸収スペクトルを測定することができる。
PROBLEM TO BE SOLVED: To locally measure a temperature change of a sample due to light absorption by a minute temperature measuring means, thereby to change a spatial distribution such as a light absorption efficiency and a light absorption spectrum of a sample to a wavelength of irradiation light. Can be measured with higher spatial resolution. SOLUTION: Light from a light source 1 is irradiated through a spectroscope 2 from the back surface of a light-transmitting thin film 4 supporting a sample 5. At the tip of the probe of the cantilever 6 in the atomic force microscope,
A thermocouple contact 7 is provided. The light emitted from the back surface of the thin film 4 passes through the thin film 4 and is absorbed by the sample 5, and the temperature of the surface of the thin film 4 where the sample 5 exists is locally increased. This temperature change is measured by scanning the contact 7 of the thermocouple,
The distribution of the presence or absence of the sample 5 on the surface of the thin film 4, that is, the distribution of the light absorption efficiency is measured. In addition, the spectroscope 2 can be used to scan the wavelength of the irradiation light on the sample 5 and measure the absorption spectrum of the sample 5 from the temperature change accompanying the wavelength change.
Description
【0001】[0001]
【発明の属する技術分野】この発明は、物質の光吸収特
性を測定光の波長よりも高い空間分解能で測定可能な光
吸収分布測定方法及びその装置に関するものである。BACKGROUND OF THE INVENTION 1. Field of the Invention The present invention relates to a method and apparatus for measuring a light absorption distribution capable of measuring the light absorption characteristics of a substance with a spatial resolution higher than the wavelength of measurement light.
【0002】[0002]
【従来の技術】従来、薄膜材料の評価・同定を行うため
に、その光吸収スペクトル、特に赤外線吸収スペクトル
が、しばしば用いられている。また、薄膜材料を評価す
る上において、材料の平均的な性質を計測するだけでな
く、その物性ないし組成の分布を評価できることも望ま
れていた。2. Description of the Related Art Conventionally, in order to evaluate and identify a thin film material, its light absorption spectrum, particularly infrared absorption spectrum, is often used. Further, in evaluating a thin film material, it has been desired to be able to evaluate not only the average property of the material but also the distribution of physical properties or composition thereof.
【0003】従来の光吸収スペクトル装置では、試料に
光を照射し、試料を透過する光の強度を測定することに
よって、試料の光吸収スペクトルを測定していた。[0003] In a conventional light absorption spectrum apparatus, a light absorption spectrum of a sample is measured by irradiating the sample with light and measuring the intensity of light transmitted through the sample.
【0004】[0004]
【発明が解決しようとする課題】ところで、上記従来の
光吸収スペクトル装置を用いて、試料の光吸収スペクト
ル特性の分布を測定する際には、レンズ等の光学系を使
用して照射光を絞り込むことによって行っていた。従っ
て、測定の空間分解能は、光学系によって絞り込まれる
照射光の大きさに依存し、このため、空間分解能はたか
だか照射光の波長の半分程度までしか実現できなかっ
た。By the way, when measuring the distribution of the light absorption spectrum characteristics of a sample using the above-mentioned conventional light absorption spectrum apparatus, the irradiation light is narrowed down using an optical system such as a lens. Was going by. Therefore, the spatial resolution of the measurement depends on the size of the irradiation light narrowed down by the optical system, and therefore, the spatial resolution can be realized only up to about half the wavelength of the irradiation light.
【0005】本発明は、光吸収による試料の温度変化を
微小な温度測定手段によって局所的に測定することによ
り、試料の光吸収効率や光吸収スペクトルなどの空間分
布を、照射光の波長よりも高い空間分解能で測定できる
光吸収分布測定方法及びその装置を提供することを目的
とする。According to the present invention, the spatial distribution such as the light absorption efficiency and the light absorption spectrum of the sample is made smaller than the wavelength of the irradiation light by locally measuring the temperature change of the sample due to light absorption by a minute temperature measuring means. It is an object of the present invention to provide a method and apparatus for measuring a light absorption distribution that can be measured with high spatial resolution.
【0006】[0006]
【課題を解決するための手段】本発明に係る光吸収分布
測定方法は、支持体に設置された試料に光を一様に照射
し、この光を照射した領域内の光吸収による試料の局所
的な温度変化を温度測定手段により順次測定して、試料
の光吸収の空間分布を測定するようにしたものである。The light absorption distribution measuring method according to the present invention uniformly irradiates a sample placed on a support with light, and locally absorbs the sample due to light absorption in the irradiated region. The temperature distribution is sequentially measured by a temperature measuring means to measure the spatial distribution of light absorption of the sample.
【0007】光吸収性の試料に光を照射すると、試料は
光を吸収しそのほとんどは熱に変わり、試料の温度は上
昇する。この光吸収熱による試料の温度変化を、温度測
定手段を用いて局所的に次々に測定する。この温度測定
により、試料の光吸収効率などの空間分布がわかる。こ
のように、本発明では、照射光を光学系で細く絞るので
はなく、照射光はある程度の広がりをもたせて当て、照
射した領域の各部分を温度測定手段により局所的に次々
に測定している。このため、測定の空間分解能は、照射
光の波長にはよらず、温度測定手段が有する、より高い
空間分解能で測定できることとなる。When a light-absorbing sample is irradiated with light, the sample absorbs light, most of which is converted to heat, and the temperature of the sample rises. The temperature change of the sample due to the heat of light absorption is locally measured one after another using a temperature measuring means. By this temperature measurement, the spatial distribution such as the light absorption efficiency of the sample can be determined. As described above, in the present invention, the irradiation light is not narrowed down by the optical system, but the irradiation light is applied with a certain spread, and each portion of the irradiation area is locally measured one after another by the temperature measuring means. I have. For this reason, the spatial resolution of the measurement can be measured with a higher spatial resolution provided by the temperature measuring means, regardless of the wavelength of the irradiation light.
【0008】上記において、試料への照射光が温度測定
手段によって遮蔽されるのを避けるために、試料に対し
温度測定手段とは反対の側、または試料及び温度測定手
段の側方側ないし斜め側から光を照射するようにする
と、正確な測定が行える。あるいは、支持体を照射光を
透過させる透明材質で形成し、この支持体上に試料を設
置し、支持体を透過させて試料に光を照射すると共に、
試料に対し支持体とは反対の側から温度測定手段により
測定を行うようにしてもよい。In the above, in order to prevent the irradiation light on the sample from being blocked by the temperature measuring means, the side opposite to the temperature measuring means with respect to the sample, or the side or oblique side of the sample and the temperature measuring means. When the light is irradiated from above, accurate measurement can be performed. Alternatively, the support is formed of a transparent material that allows irradiation light to pass therethrough, a sample is placed on the support, and the sample is irradiated with light while transmitting the support,
The measurement may be performed on the sample from the side opposite to the support by the temperature measuring means.
【0009】また、上記において、試料に照射される光
の波長を走査することにより、試料の吸収スペクトルの
空間分布を測定することもできる。In the above, the spatial distribution of the absorption spectrum of the sample can be measured by scanning the wavelength of the light irradiated on the sample.
【0010】本発明の光吸収分布測定装置は、試料を支
持する光透過性の支持体と、この支持体の裏面より一様
に光を照射する照射手段と、試料の局所的な温度変化の
空間分布を測定する温度測定手段とを備えたものであ
る。A light absorption distribution measuring apparatus according to the present invention comprises a light-transmitting support for supporting a sample, an irradiation means for uniformly irradiating light from the back surface of the support, and a device for measuring a local temperature change of the sample. Temperature measuring means for measuring the spatial distribution.
【0011】照射手段からの照射光は、支持体の裏面に
当たり、支持体を透過して試料に照射される。この照射
光を吸収して温度上昇した試料の局所的な温度変化は温
度測定手段によって計測される。The irradiation light from the irradiation means strikes the back surface of the support, passes through the support and irradiates the sample. The local temperature change of the sample whose temperature has increased by absorbing the irradiation light is measured by the temperature measuring means.
【0012】上記において、温度測定手段としては、熱
電対、サーミスター、白金抵抗温度計などが挙げられる
が、微小な温度センサーないし熱センサーとしては熱電
対が適している。熱電対は、その接点部分を微小な板バ
ネ上に取り付け、その板バネの撓みが一定になるように
制御しながら、熱電対の接点部を試料の表面に接触また
は近接させつつ走査する制御手段を設けるのがよい。こ
の際、原子間力顕微鏡の技術を適用するのが望ましい。
なお、熱電対の接点部を振動させながら走査するように
してもよい。In the above description, a thermocouple, a thermistor, a platinum resistance thermometer and the like can be mentioned as the temperature measuring means. A thermocouple is suitable as a minute temperature sensor or a heat sensor. The thermocouple is a control means for mounting the contact portion on a minute leaf spring and controlling the deflection of the leaf spring to be constant while scanning the contact portion of the thermocouple while contacting or approaching the surface of the sample. Should be provided. At this time, it is desirable to apply the technique of the atomic force microscope.
The scanning may be performed while vibrating the contact portion of the thermocouple.
【0013】前記照射手段は、一様な光強度を有し且つ
ある程度広がりのある照射光を照射できるものがよい。
また、照射手段に、試料への照射光の波長を走査するた
めの分光手段を設ければ、試料の吸収スペクトルを測定
できる。The irradiating means preferably has a uniform light intensity and can irradiate irradiating light having a certain spread.
Further, if the irradiating means is provided with a spectroscopic means for scanning the wavelength of the irradiation light on the sample, the absorption spectrum of the sample can be measured.
【0014】また、前記支持体は、メッシュ状にした
り、あるいは膜厚10μm以下の薄膜とするのが好まし
い。試料はその表面を通じての放射以外は熱的に孤立さ
れているのが望ましく、支持体をメッシュ状や薄膜状と
すると、試料の熱が支持体を通じて逃げにくくなり、光
吸収による試料の温度変化を正確に測定できる。また、
支持体の材質としては、シリコン、シリコン化合物(窒
化シリコン、酸化シリコン、炭化シリコンもしくはそれ
らの複合化合物など)、もしくはゲルマニウムなどが赤
外透過性を有し、また作製上などからも好ましい。これ
は、赤外吸収では、物質の構造などによる特有の吸収ス
ペクトルが現れやすく、試料の物性・組成評価や不純物
分析などに適しているからである。Further, it is preferable that the support is in the form of a mesh or a thin film having a thickness of 10 μm or less. It is desirable that the sample be thermally isolated except for radiation through its surface.If the support is made into a mesh or thin film, it becomes difficult for the heat of the sample to escape through the support, and changes in the temperature of the sample due to light absorption will occur. Can be measured accurately. Also,
As a material of the support, silicon, a silicon compound (such as silicon nitride, silicon oxide, silicon carbide, or a composite compound thereof), or germanium has infrared transmittance, and is preferable from the viewpoint of production and the like. This is because infrared absorption tends to produce a specific absorption spectrum due to the structure of the substance, and is suitable for evaluating the physical properties and composition of a sample and analyzing impurities.
【0015】[0015]
【発明の実施の形態】以下に、本発明の光吸収分布測定
方法の一実施形態を図1を用いて説明する。図1に示す
ように、光源1の光が、分光器2を通して、試料5を支
持する支持体の裏面から照射されるようになっている。
支持体は、開口ないし窓3aを有する支持枠3と、支持
枠3上に窓3aを覆って設けられた光透過性の薄膜4と
からなり、薄膜4の窓3a上に位置するところに試料5
が設置される。原子間力顕微鏡におけるカンチレバー6
先端部の探針先端には、熱電対の接点7が設けられてい
る。熱電対の接点7は温度計8に接続されている。DETAILED DESCRIPTION OF THE PREFERRED EMBODIMENTS One embodiment of the light absorption distribution measuring method of the present invention will be described below with reference to FIG. As shown in FIG. 1, light from a light source 1 is emitted from a back surface of a support supporting a sample 5 through a spectroscope 2.
The support comprises a support frame 3 having an opening or window 3a and a light-transmitting thin film 4 provided on the support frame 3 so as to cover the window 3a. 5
Is installed. Cantilever 6 in atomic force microscope
A contact 7 of a thermocouple is provided at the tip of the probe at the tip. The thermocouple contact 7 is connected to a thermometer 8.
【0016】薄膜4の裏面から照射された光は、光透過
性の薄膜4を透過し、試料5に吸収され、薄膜4表面上
のうち試料5の存在する場所の温度が局所的に上昇す
る。この温度変化を熱電対の接点7によって測定するこ
とにより、薄膜4面上の試料5の存在する場所と存在し
ない場所の分布、すなわち光吸収効率の分布を測定する
ことができる。また、分光器2の回折格子やプリズム等
の分光手段を用いて、試料5への照射光の波長を走査
し、それに伴う温度変化を測定することによって、粒状
の試料5の一個一個の光吸収スペクトルを測定すること
が可能となる。Light emitted from the back surface of the thin film 4 passes through the light-transmitting thin film 4 and is absorbed by the sample 5, and the temperature of the surface of the thin film 4 where the sample 5 exists is locally increased. . By measuring the temperature change with the junction 7 of the thermocouple, the distribution of the place where the sample 5 exists on the surface of the thin film 4 and the place where the sample 5 does not exist, that is, the distribution of the light absorption efficiency can be measured. Further, the wavelength of the irradiation light to the sample 5 is scanned using a diffraction means such as a diffraction grating or a prism of the spectroscope 2, and a temperature change accompanying the scan is measured. The spectrum can be measured.
【0017】温度変化の測定方法としては、光を照射し
てからある程度の時間が経過し、試料の温度が一定にな
ったときの値を計測しても良いし、光照射を変調させて
その変調周期に追従する成分の振幅を測定しても良い。
また、試料の光吸収熱が熱伝導によって支持体を通じて
周囲へ拡散してしまうと、測定の空間分解能が劣化する
ので、それを防ぐために、試料は上記のような薄膜状あ
るいはメッシュ状の支持体上に設置することが好まし
い。また、上記の支持枠3のようなものだけで試料を支
持するようにしてもよい。なお、計測を真空下で行うこ
とも、対流による熱拡散の低減のためには有効である。As a method of measuring the temperature change, a value obtained when a certain time has passed since the light irradiation and the temperature of the sample becomes constant may be measured, or the light irradiation may be modulated to modulate the value. The amplitude of the component that follows the modulation cycle may be measured.
In addition, if the light absorption heat of the sample is diffused into the surroundings through the support due to heat conduction, the spatial resolution of the measurement will be degraded. To prevent this, the sample should be a thin film or mesh support as described above. It is preferable to set it on. Further, the sample may be supported only by the support frame 3 or the like. Note that performing the measurement in a vacuum is also effective for reducing thermal diffusion due to convection.
【0018】また、上記の実施形態では、光吸収性の試
料の有無(存在)の分布を求めたが、試料の光吸収効率
や光吸収スペクトルの面内分布も測定することができ
る。また、上記測定から、試料の熱伝導特性なども求め
ることが可能である。In the above embodiment, the distribution of the presence or absence (presence) of the light-absorbing sample was determined. However, the light absorption efficiency and the in-plane distribution of the light absorption spectrum of the sample can also be measured. Further, from the above measurement, it is also possible to obtain the heat conduction characteristics of the sample.
【0019】[0019]
【実施例】次に、図2により本発明を具体化した実施例
を説明する。図2に示すように、シリコン製の支持枠9
に張りつけられた窒化シリコン(膜厚0.2μm)の支
持体10の表面に、試料として、フォトリソグラフィ技
術によってグラファイト・スパッタ膜の細線11(線幅
0.5μm、膜厚0.2μm、間隔2μm)を作製し
た。光源には、波長1064nmのNd-YAGレーザ
ー12を用い、チョッパー13(変調周波数100H
z)を通して強度変調された光を、支持体10の裏面か
ら照射した(照射光強度はおよそ100J/m2)。な
お、17はレーザー12からの光をチョッパー13に集
光するコンデンサーであり、18はチョッパー13から
の発散光を平行光にするコリメーターである。Next, an embodiment of the present invention will be described with reference to FIG. As shown in FIG. 2, a support frame 9 made of silicon is used.
A fine line 11 of a graphite sputtered film (line width 0.5 μm, film thickness 0.2 μm, interval 2 μm) was formed on a surface of a support 10 of silicon nitride (film thickness 0.2 μm) adhered to ) Was prepared. As a light source, an Nd-YAG laser 12 having a wavelength of 1064 nm is used, and a chopper 13 (modulation frequency 100H) is used.
The light whose intensity was modulated through z) was irradiated from the back surface of the support 10 (irradiation light intensity was about 100 J / m 2 ). Reference numeral 17 denotes a condenser for condensing light from the laser 12 on the chopper 13, and reference numeral 18 denotes a collimator for converting divergent light from the chopper 13 into parallel light.
【0020】まず、原子間力顕微鏡に取りつけた、熱電
対プローブ14を支持体10の表面に1nNの力で接触
させ、支持体の表面凹凸像を得た。この像では、グラフ
ァイト膜の細線11が凸に、細線11が無く窒化シリコ
ンの支持体10が露出している部分が凹として観察され
た。First, a thermocouple probe 14 attached to an atomic force microscope was brought into contact with the surface of the support 10 with a force of 1 nN to obtain a surface unevenness image of the support. In this image, the fine lines 11 of the graphite film were observed to be convex, and the portions where the thin line 11 was not present and the silicon nitride support 10 was exposed were observed to be concave.
【0021】その後、支持体10の裏面から強度変調さ
れたレーザー光を照射した。そして、プローブ14を凸
部および凹部に移動させ、プローブ14先端にその接点
が設けられた熱電対に発生する熱起電力をプリアンプ1
5で増幅し、その100kHz変調成分をロックインア
ンプ16で測定した。凸部ではおよそ0.2mVの熱起
電力が観測されたが、凹部で観察された熱起電力は0.
1mVであった。この凹部で観察された熱起電力は、支
持体10を透過した照射光によって直接熱電対が加熱さ
れたことによる温度変化を示しており、凸部の細線11
の光吸収による温度変化への寄与分は、この値を凸部で
の熱起電力より差し引いた値となる。Thereafter, the back surface of the support 10 was irradiated with intensity-modulated laser light. Then, the probe 14 is moved to the convex portion and the concave portion, and the thermoelectromotive force generated in the thermocouple provided with the contact at the tip of the probe 14 is applied to the preamplifier 1.
5 and the 100 kHz modulated component was measured by the lock-in amplifier 16. Although a thermoelectromotive force of about 0.2 mV was observed at the convex portion, the thermoelectromotive force observed at the concave portion was 0.1 mV.
It was 1 mV. The thermoelectromotive force observed in the concave portion indicates a temperature change due to the direct heating of the thermocouple by the irradiation light transmitted through the support 10, and the thin line 11 of the convex portion
Is a value obtained by subtracting this value from the thermoelectromotive force at the convex portion.
【0022】さらに、原子間力顕微鏡によって支持体1
0の表面をプローブ14によって走査しながら、局所的
な熱起電力の値をプローブ14の位置に対してプロット
し、支持体10表面の熱吸収体(この場合はグラファイ
ト膜の細線11)の空間分布を画像化することができ
た。得られた画像は、線幅0.5μmのグラファイト細
線を明瞭に解像しており、この実施例の光吸収分布測定
装置が1μm以下という高い空間分解能を有しているこ
とが確認できた。Further, the support 1 was examined by an atomic force microscope.
While scanning the surface of the probe with the probe, the value of the local thermoelectromotive force is plotted against the position of the probe, and the space of the heat absorber (the thin line 11 of the graphite film in this case) on the surface of the support 10 is plotted. The distribution could be imaged. The obtained image clearly resolved a fine graphite line having a line width of 0.5 μm, and it was confirmed that the optical absorption distribution measuring apparatus of this example had a high spatial resolution of 1 μm or less.
【0023】[0023]
【発明の効果】以上の説明から明らかなように、本発明
によれば、試料に照射光を一様に当て、照射した領域の
各部分を温度測定手段により局所的に次々に測定するよ
うにしているため、測定の空間分解能は、照射光の波長
によらずに、微小な温度測定手段が有する、より高い空
間分解能で試料の光吸収特性を測定できる。As is apparent from the above description, according to the present invention, the sample is irradiated with irradiation light uniformly, and each part of the irradiation area is locally measured one after another by the temperature measuring means. Therefore, the spatial resolution of the measurement can measure the light absorption characteristics of the sample with higher spatial resolution provided by the minute temperature measuring means regardless of the wavelength of the irradiation light.
【図1】本発明に係る光吸収分布測定方法の一実施形態
を説明する説明図である。FIG. 1 is an explanatory diagram illustrating an embodiment of a light absorption distribution measuring method according to the present invention.
【図2】本発明に係る光吸収分布測定装置の一実施例を
示す構成図である。FIG. 2 is a configuration diagram showing one embodiment of a light absorption distribution measuring device according to the present invention.
1 光源 2 分光器 3 支持枠 3a 窓 4 薄膜 5 試料 6 カンチレバー 7 熱電対の接点 8 温度計 9 支持枠 10 支持体 11 細線 12 Nd−YAGレーザー 13 チョッパー 14 熱電対プローブ 15 プリアンプ 16 ロックインアンプ 17 コンデンサー 18 コリメーター Reference Signs List 1 light source 2 spectroscope 3 support frame 3a window 4 thin film 5 sample 6 cantilever 7 thermocouple contact 8 thermometer 9 support frame 10 support 11 fine wire 12 Nd-YAG laser 13 chopper 14 thermocouple probe 15 preamplifier 16 lock-in amplifier 17 Condenser 18 Collimator
Claims (12)
射し、この光を照射した領域内の光吸収による試料の局
所的な温度変化を温度測定手段により順次測定して、試
料の光吸収の空間分布を測定するようにしたことを特徴
とする光吸収分布測定方法。1. A sample placed on a support is uniformly irradiated with light, and a local temperature change of the sample due to light absorption in a region irradiated with the light is sequentially measured by temperature measuring means. A method for measuring the spatial distribution of light absorption of a light absorption distribution.
によって遮蔽されるのを避けるために、試料に対し温度
測定手段とは反対の側、または試料及び温度測定手段の
側方側から光を照射するようにしたことを特徴とする請
求項1記載の光吸収分布測定方法。2. In order to prevent the irradiation light on the sample from being blocked by the temperature measuring means, light is emitted from the side of the sample opposite to the temperature measuring means or from the side of the sample and the temperature measuring means. The method for measuring a light absorption distribution according to claim 1, wherein the light is irradiated.
明材質で形成し、この支持体上に前記試料を設置し、支
持体を透過させて試料に光を照射すると共に、試料に対
し支持体とは反対の側から前記温度測定手段により測定
を行うようにしたことを特徴とする請求項1記載の光吸
収分布測定方法。3. The support is formed of a transparent material that transmits the irradiation light, the sample is placed on the support, the sample is irradiated with light through the support, and the sample is supported on the sample. 2. The method according to claim 1, wherein the temperature is measured from the side opposite to the body by the temperature measuring means.
ることにより、試料の吸収スペクトルを測定するように
したことを特徴とする請求項1乃至3のいずれか一項記
載の光吸収分布測定方法。4. The light absorption distribution according to claim 1, wherein an absorption spectrum of the sample is measured by scanning a wavelength of light applied to the sample. Measuring method.
の支持体の裏面より一様に光を照射する照射手段と、試
料の局所的な温度変化の空間分布を測定する温度測定手
段とを備えたことを特徴とする光吸収分布測定装置。5. A light-transmitting support for supporting a sample, irradiation means for uniformly irradiating light from the back surface of the support, and temperature measuring means for measuring a spatial distribution of a local temperature change of the sample. And a light absorption distribution measuring device.
ることを特徴とする請求項5記載の光吸収分布測定装
置。6. The light absorption distribution measuring device according to claim 5, wherein said temperature measuring means uses a thermocouple.
に取り付け、その板バネの撓みが一定になるように制御
しながら、熱電対の接点部を前記試料の表面に接触また
は近接させつつ走査する制御手段を備えていることを特
徴とする請求項6記載の光吸収分布測定装置。7. A contact portion of the thermocouple is mounted on a minute leaf spring, and the contact portion of the thermocouple is brought into contact with or close to the surface of the sample while controlling the deflection of the leaf spring to be constant. 7. The light absorption distribution measuring device according to claim 6, further comprising control means for scanning while scanning.
波長を走査するための分光手段を備えていることを特徴
とする請求項5乃至7のいずれか一項記載の光吸収分布
測定装置。8. The light absorption distribution measurement according to claim 5, wherein the irradiating means includes a spectroscopic means for scanning a wavelength of the irradiating light to the sample. apparatus.
特徴とする請求項5乃至8のいずれか一項記載の光吸収
分布測定装置。9. The light absorption distribution measuring device according to claim 5, wherein the support is in a mesh shape.
膜であることを特徴とする請求項5乃至8のいずれか一
項記載の光吸収分布測定装置。10. The light absorption distribution measuring device according to claim 5, wherein the support is a thin film having a thickness of 10 μm or less.
コン化合物もしくはゲルマニウムであることを特徴とす
る請求項5乃至10のいずれか一項記載の光吸収分布測
定装置。11. The light absorption distribution measuring apparatus according to claim 5, wherein a material of the support is silicon, a silicon compound, or germanium.
ン、酸化シリコン、炭化シリコンもしくはそれらの複合
化合物であることを特徴とする請求項11記載の光吸収
分布測定装置。12. The light absorption distribution measuring apparatus according to claim 11, wherein said silicon compound is silicon nitride, silicon oxide, silicon carbide, or a composite compound thereof.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP8187381A JPH1030997A (en) | 1996-07-17 | 1996-07-17 | Method and apparatus for measuring light absorption distribution |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP8187381A JPH1030997A (en) | 1996-07-17 | 1996-07-17 | Method and apparatus for measuring light absorption distribution |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| JPH1030997A true JPH1030997A (en) | 1998-02-03 |
Family
ID=16205023
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP8187381A Pending JPH1030997A (en) | 1996-07-17 | 1996-07-17 | Method and apparatus for measuring light absorption distribution |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JPH1030997A (en) |
Cited By (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| WO2010103807A1 (en) * | 2009-03-11 | 2010-09-16 | コニカミノルタセンシング株式会社 | Optical characteristic measuring device, optical characteristic measuring method, and dual spectral emissivity factor measuring method |
-
1996
- 1996-07-17 JP JP8187381A patent/JPH1030997A/en active Pending
Cited By (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| WO2010103807A1 (en) * | 2009-03-11 | 2010-09-16 | コニカミノルタセンシング株式会社 | Optical characteristic measuring device, optical characteristic measuring method, and dual spectral emissivity factor measuring method |
| JPWO2010103807A1 (en) * | 2009-03-11 | 2012-09-13 | コニカミノルタオプティクス株式会社 | Optical characteristic measuring apparatus, optical characteristic measuring method, and dual spectral emissivity coefficient measuring method |
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