JPH10321920A - Thermoelectric transducer - Google Patents

Thermoelectric transducer

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Publication number
JPH10321920A
JPH10321920A JP9127167A JP12716797A JPH10321920A JP H10321920 A JPH10321920 A JP H10321920A JP 9127167 A JP9127167 A JP 9127167A JP 12716797 A JP12716797 A JP 12716797A JP H10321920 A JPH10321920 A JP H10321920A
Authority
JP
Japan
Prior art keywords
heat
electrode
notch
side edge
thermoelectric conversion
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP9127167A
Other languages
Japanese (ja)
Other versions
JP3920403B2 (en
Inventor
Mitsutoshi Ogasawara
光敏 小笠原
Hideo Watanabe
日出男 渡辺
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
ECO TOUENTEIIONE KK
Original Assignee
ECO TOUENTEIIONE KK
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by ECO TOUENTEIIONE KK filed Critical ECO TOUENTEIIONE KK
Priority to JP12716797A priority Critical patent/JP3920403B2/en
Publication of JPH10321920A publication Critical patent/JPH10321920A/en
Application granted granted Critical
Publication of JP3920403B2 publication Critical patent/JP3920403B2/en
Anticipated expiration legal-status Critical
Expired - Lifetime legal-status Critical Current

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Abstract

PROBLEM TO BE SOLVED: To provide a thermoelectric transducer which can absorb the difference in the coefficients of thermal expansion for a semiconductor layer and an electrode, and ensure bonding strength. SOLUTION: A thermoelectric transducer has at least numerous semiconductor layers 35, 36 and numerous electrodes 34, 37 for electrically connecting the respective semiconductor layers 35, 36. The electrodes 34, 37 have semiconductor bonding regions 40 in the vicinity of both end portions. Between the semiconductor bonding regions 40, a first notched part 50a which stretches from one side edges of the electrodes 34, 37 towards the other side edges, and a second notched part 50b, which stretches from the other side edges of the electrodes 34, 37 towards the one side edges and are formed at a position shifted from the first notched part 50a, are arranged. A current flowing part 51 which is narrow is formed between the first notched part 50a and the second notched part 50b.

Description

【発明の詳細な説明】DETAILED DESCRIPTION OF THE INVENTION

【0001】[0001]

【発明の属する技術分野】本発明は、電子冷却装置ある
いは発電装置などとして用いる熱電変換装置に係り、特
に熱サイクルを繰り返しても性能劣化が少ない、動作信
頼性に優れ、耐用寿命の長い熱電変換装置に関する。
BACKGROUND OF THE INVENTION 1. Field of the Invention The present invention relates to a thermoelectric conversion device used as an electronic cooling device or a power generation device, and more particularly, to a thermoelectric conversion device which has little performance deterioration even after repeated thermal cycles, has excellent operation reliability, and has a long service life. Related to the device.

【0002】[0002]

【従来の技術】図9は、従来の熱変換装置の断面図であ
る。図中、符号100はセラミック製の吸熱側基板、1
01は同じくセラミック製の放熱側基板、102は銅製
の吸熱側電極、103は同じく銅製の放熱側電極、10
4はN型半導体層、105はP型半導体層である。
2. Description of the Related Art FIG. 9 is a sectional view of a conventional heat converter. In the drawing, reference numeral 100 denotes a heat absorbing side substrate made of ceramic, 1
Reference numeral 01 denotes a heat dissipation side substrate also made of ceramic, 102 denotes a heat absorption side electrode made of copper, 103 denotes a heat dissipation side electrode also made of copper, 10
4 is an N-type semiconductor layer and 105 is a P-type semiconductor layer.

【0003】図に示すように、N型半導体層104並び
にP型半導体層105が半田層(図示せず)を介して吸
熱側電極102並びに放熱側電極103と一体に接合さ
れている。
As shown in FIG. 1, an N-type semiconductor layer 104 and a P-type semiconductor layer 105 are integrally joined to a heat-absorbing electrode 102 and a heat-radiating electrode 103 via a solder layer (not shown).

【0004】[0004]

【発明が解決しようとする課題】ところで、半導体層と
電極は熱膨張係数が大きく異なるため、使用を繰り返し
ているうちに、熱膨張係数の差により、接合面の水平方
向(図11の両矢印A方向)にずれ(応力)を生じ、接
合強度(密着性)が低下し、甚だしいときには接合の一
部が剥がれることがある。このように半導体層と電極の
接合部の一部が剥がれると、接合部の熱抵抗が高くな
り、熱電変換特性が極端に低下するという問題がある。
Incidentally, since the semiconductor layer and the electrode have greatly different coefficients of thermal expansion, during repeated use, the difference in the coefficient of thermal expansion causes the difference in the coefficient of thermal expansion in the horizontal direction of the bonding surface (double arrow in FIG. 11). (A direction), a shift (stress) occurs, the bonding strength (adhesion) decreases, and in extreme cases, a part of the bonding may peel off. When a part of the junction between the semiconductor layer and the electrode is peeled off as described above, there is a problem that the thermal resistance of the junction increases and the thermoelectric conversion characteristics are extremely reduced.

【0005】本発明は、上記従来技術の欠点を解消し、
半導体層と電極の熱膨張係数の違いを吸収し、接合強度
を常に保持することにより、熱サイクルを繰り返しても
性能劣化が少ない、動作信頼性に優れ、耐用寿命の長い
熱電変換装置を提供することを目的とする。
The present invention solves the above-mentioned disadvantages of the prior art,
By providing a thermoelectric conversion device that absorbs the difference between the thermal expansion coefficients of the semiconductor layer and the electrode and maintains the bonding strength at all times, there is little performance degradation even after repeated thermal cycling, excellent operation reliability, and long service life. The purpose is to:

【0006】[0006]

【課題を解決するための手段】前記目的を達成するた
め、本発明は、多数の半導体層と、各半導体層を電気的
に接続するための多数の電極とを有し、前記半導体層の
少なくとも一方がスケルトンタイプの熱電変換装置にお
いて、前記多数の電極のうちの少なくとも一部が、両端
部付近に半導体接合領域を有し、その半導体接合領域の
間に、電極の一方の側端縁から他方の側端縁に向けて延
びた第1の切欠部と、電極の他方の側端縁から一方の側
端縁に向けて延びかつ前記第1の切欠部よりずれた位置
に形成された第2の切欠部とを設け、その第1の切欠部
と第2の切欠部の間に幅狭の通電部が形成されているこ
とを特徴とする。
In order to achieve the above object, the present invention comprises a number of semiconductor layers and a number of electrodes for electrically connecting the respective semiconductor layers, wherein at least one of the aforementioned semiconductor layers is provided. In one thermoelectric conversion device of the skeleton type, at least a part of the plurality of electrodes has a semiconductor junction region near both ends, and between the semiconductor junction regions, from one side edge of the electrode to the other. A first notch extending toward the side edge of the electrode, and a second notch extending from the other side edge of the electrode toward one side edge and formed at a position offset from the first notch. And a narrow conducting portion is formed between the first notch and the second notch.

【0007】[0007]

【発明の実施の形態】次に本発明の実施の形態を図とと
もに説明する。図1ないし図4は第1の実施の形態を説
明するための図で、図1は例えば電子冷蔵庫などの電子
冷却装置として用いる熱電変換装置の断面図、図2はそ
の熱電変換装置に使用される第1放熱側枠体の底面図、
図3はリード線の取り出し構造を示す一部拡大断面図、
図4は素子ブロックの要部拡大断面図である。
Next, an embodiment of the present invention will be described with reference to the drawings. 1 to 4 are views for explaining the first embodiment. FIG. 1 is a cross-sectional view of a thermoelectric converter used as an electronic cooling device such as an electronic refrigerator, and FIG. 2 is used for the thermoelectric converter. Bottom view of the first heat dissipation side frame
FIG. 3 is a partially enlarged cross-sectional view showing a lead wire take-out structure,
FIG. 4 is an enlarged sectional view of a main part of the element block.

【0008】図1に示すように熱電変換装置は、例えば
冷蔵庫の庫内などの被冷却側に配置される箱状の吸熱部
材1と、吸熱側熱交換基体2と、熱電変換素子群3と、
放熱側熱交換基体4と、第1放熱側枠体6−1と、第2
放熱側枠体6−2と、分散部材7とから主に構成されて
いる。
As shown in FIG. 1, the thermoelectric converter comprises a box-shaped heat absorbing member 1 disposed on the side to be cooled, for example, inside a refrigerator, a heat absorbing side heat exchange base 2, a thermoelectric conversion element group 3, ,
A heat-dissipation-side heat exchange base 4, a first heat-dissipation-side frame 6-1;
It is mainly composed of the heat radiation side frame 6-2 and the dispersion member 7.

【0009】前記吸熱部材1は広い面積を有するフィン
ベースからなり多数の吸熱フィン(図示せず)を付設
し、必要に応じて近傍にファンを設けることができる。
吸熱部材1は吸熱フィンと一体でもよいし、また吸熱フ
ィンがない場合もある。
The heat absorbing member 1 is composed of a fin base having a large area, and is provided with a large number of heat absorbing fins (not shown). A fan can be provided in the vicinity as needed.
The heat absorbing member 1 may be integral with the heat absorbing fin, or may not have the heat absorbing fin.

【0010】前記吸熱側熱交換基体2と放熱側熱交換基
体4は共にアルミニウムなどの熱伝導性の良好な金属か
らなり、熱電変換素子群3と接する側の表面にアルマイ
トなどの電気絶縁膜33(図4参照)が形成されてい
る。陽極酸化法によりアルマイトの絶縁膜33を形成す
る場合、その絶縁膜33に封孔処理しない方が、後述す
る薄膜38を介しての熱電変換素子群3との接合性が良
好である。絶縁膜33は、この他に溶射などで形成する
ことも可能である。図1に示すように吸熱側熱交換基体
2は、良好な冷却状態を確保するため肉厚のブロック体
から構成されている。
The heat-absorbing heat-exchange substrate 2 and the heat-dissipating heat-exchange substrate 4 are both made of a metal having good thermal conductivity, such as aluminum. (See FIG. 4). When the alumite insulating film 33 is formed by the anodizing method, the sealing property with the thermoelectric conversion element group 3 via the thin film 38 described later is better if the insulating film 33 is not sealed. The insulating film 33 can also be formed by thermal spraying or the like. As shown in FIG. 1, the heat-absorbing-side heat exchange base 2 is formed of a thick block body to ensure a good cooling state.

【0011】前記熱電変換素子群3は、図4に示すよう
に吸熱側電極34と、放熱側電極37と、両電極34,
37間に多数配置されたP型半導体層35とN型半導体
層36とから主に構成されている。P型半導体層35と
N型半導体層36は構造的ならびに熱的に並列に配置さ
れているが、電気的には前記電極34,37を介して直
列に接続されている。
As shown in FIG. 4, the thermoelectric conversion element group 3 includes a heat absorbing side electrode 34, a heat radiating side electrode 37, both electrodes 34,
It is mainly composed of a large number of P-type semiconductor layers 35 and N-type semiconductor layers 36 arranged between 37. The P-type semiconductor layer 35 and the N-type semiconductor layer 36 are structurally and thermally arranged in parallel, but are electrically connected in series via the electrodes 34 and 37.

【0012】前記第1吸熱側枠体6−1は図1に示され
ているように、放熱側熱交換基体4から吸熱側熱交換基
体2側にかけて配置されている。そして上方ならびに下
方が開口した中空状のもので、基端部6−1aとその基
端部6−1aの内周部から下方に向けて延びた延設部6
−1bとを有し断面形状がほぼ階段状をしている。基端
部6−1aは、例えば接着剤あるいはOリングと接着剤
の併用などにより放熱側熱交換基体4の下面周辺部に液
密に接合されている。
As shown in FIG. 1, the first heat absorbing side frame 6-1 is arranged from the heat radiating side heat exchange base 4 to the heat absorbing side heat exchange base 2 side. The upper and lower portions are hollow, and have a base end 6-1a and an extension 6 extending downward from the inner periphery of the base end 6-1a.
-1b, and the cross-sectional shape is substantially stepped. The base end 6-1a is liquid-tightly joined to a peripheral portion of the lower surface of the heat-radiation-side heat exchange base 4 by using, for example, an adhesive or an O-ring and an adhesive.

【0013】前述のように吸熱側熱交換基体2は肉厚の
ブロック体からなり、従ってその外周部は吸熱側熱交換
基体2−熱電変換素子群3−放熱側熱交換基体4の積層
方向にほぼ沿って延びた延設部2aを構成している。こ
の吸熱側熱交換基体2の延設部2aと第1吸熱側枠体6
−1の延設部6−1bはほぼ平行に対向しており、両者
の間に注入された接着剤14により吸熱側熱交換基体2
と第1吸熱側枠体6−1が一体に接合されている。接着
剤14としては、エポキシ系やアクリル系のような硬化
型接着剤、あるいはホットメルト系のような融着型接着
剤などが適用可能である。
As described above, the heat-absorbing heat-exchange substrate 2 is formed of a thick block body. The extended portion 2a extends substantially along. The extended portion 2a of the heat-absorbing side heat exchange base 2 and the first heat-absorbing side frame 6
-1b are substantially parallel to each other, and the heat-absorbing-side heat exchange base 2 is bonded by the adhesive 14 injected therebetween.
And the first heat absorbing side frame 6-1 are integrally joined. As the adhesive 14, a curable adhesive such as an epoxy-based or acrylic-based adhesive, or a fusion-bonded adhesive such as a hot-melt-based adhesive can be applied.

【0014】前記延設部2aと延設部6−1bの間には
複数本の位置決めピン26が挿通されて、接着剤14が
完全に硬化する前の吸熱側熱交換基体2と第1吸熱側枠
体6−1との相対的に位置ずれを防止している。図2に
示されている6−1dが、延設部6−1bに形成された
ピン挿通孔である。
A plurality of positioning pins 26 are inserted between the extending portion 2a and the extending portion 6-1b, and the heat absorbing side heat exchange base 2 and the first heat absorbing base 2 before the adhesive 14 is completely cured. It prevents relative displacement with the side frame 6-1. 6-1d shown in FIG. 2 is a pin insertion hole formed in the extension 6-1b.

【0015】延設部6−1bの外側には、基端部6−1
a側に延びた補強リブ6−1cが一体に複数個(本実施
の形態では4個)設けられている。図1に示されている
ように第1吸熱側枠体6−1は吸熱側熱交換基体2と放
熱側熱交換基体4を跨ぐように配置されているため、第
1吸熱側枠体6−1を伝わっての熱の戻りがある。この
熱の戻りを可及的に少なくするため、第1吸熱側枠体6
−1は比較的肉薄に成形する方がよいが、肉薄成形だと
第1吸熱側枠体6−1の機械的強度が低下する。そのた
めに本実施の形態では、基端部6−1aと延設部6−1
bの間に複数個の補強リブ6−1cを設けて第1吸熱側
枠体6−1の剛直性を維持している。
A base end 6-1 is provided outside the extension 6-1b.
A plurality (four in the present embodiment) of reinforcing ribs 6-1c extending to the side a are provided integrally. As shown in FIG. 1, the first heat absorbing side frame 6-1 is disposed so as to straddle the heat absorbing side heat exchange base 2 and the heat radiation side heat exchange base 4. There is a return of heat through one. In order to minimize this heat return, the first heat absorbing side frame 6
Although it is better to mold -1 relatively thin, the mechanical strength of the first heat-absorbing side frame 6-1 decreases if the molding is thin. Therefore, in the present embodiment, the base portion 6-1a and the extension portion 6-1 are used.
A plurality of reinforcing ribs 6-1c are provided between b to maintain the rigidity of the first heat absorbing side frame 6-1.

【0016】また、基端部6−1aと延設部6−1bの
間を階段状、すなわち非直線状にすることにより、第1
吸熱側枠体6−1の吸熱側熱交換基体2から放熱側熱交
換基体4までの沿面距離を長く確保して、第1吸熱側枠
体6−1を伝わっての熱の戻りを少くしている。
Further, by forming a step-like shape, that is, a non-linear shape, between the base end portion 6-1a and the extending portion 6-1b, the first
A long creepage distance from the heat-absorbing heat exchanging base 2 to the heat-dissipating heat exchanging base 4 of the heat-absorbing side frame 6-1 is ensured to be long, so that heat returning through the first heat-absorbing side frame 6-1 is reduced. ing.

【0017】図2ならびに図3に示すように、基端部6
−1aの所定位置にはリード線取出溝6−1eが形成さ
れて、熱電変換素子群3の電極34に接続されたリード
線19がこの取出溝6−1eから引き出され、取出溝6
−1eとリード線19の間はシール剤27で気液密にシ
ールされている。
As shown in FIG. 2 and FIG.
-1a is formed at a predetermined position, and a lead wire extraction groove 6-1e is formed, and the lead wire 19 connected to the electrode 34 of the thermoelectric conversion element group 3 is drawn out from the extraction groove 6-1e, and the lead groove 6-1e is formed.
1e and the lead wire 19 are sealed gas-liquid-tight with a sealant 27.

【0018】前記第2放熱側枠体6−2は放熱側熱交換
基体4の上側に配置され、上方がほぼ塞がれ下方が開口
した中空状のもので、下方開口部がOリング8を介して
放熱側熱交換基体4の上面周辺部に液密に接着されてい
る。第2放熱側枠体6−2のほぼ中央部に給水管部9
が、周縁近くに排水管部10が設けられている。
The second heat-dissipating frame 6-2 is disposed above the heat-dissipating heat-exchanging base 4 and is substantially hollow at the top and open at the bottom. It is liquid-tightly adhered to the peripheral portion of the upper surface of the heat-dissipating-side heat exchange base 4 via the heat sink. A water supply pipe portion 9 is provided substantially at the center of the second heat radiation side frame 6-2.
However, a drain pipe section 10 is provided near the periphery.

【0019】分散部材7は周壁7aと、周壁7aの下端
に連設した底壁7bと、底壁7bから放熱側熱交換基体
4側に延びた多数本のノズル部7eとが設けられ、前記
ノズル部7eに分散孔7dが形成されている。
The dispersing member 7 is provided with a peripheral wall 7a, a bottom wall 7b connected to the lower end of the peripheral wall 7a, and a number of nozzles 7e extending from the bottom wall 7b to the heat exchange base 4 on the heat radiation side. Dispersion holes 7d are formed in the nozzle portion 7e.

【0020】分散部材7を第2放熱側枠体6−2内に固
定することにより、分散部材7の給水管部9側に扁平状
の第1空間11が形成され、分散部材7の放熱側熱交換
基体4側に扁平状の第2空間13が形成されるととも
に、この第2空間13と排水管部10を連通する排水路
12が形成される。
By fixing the dispersion member 7 in the second heat radiation side frame 6-2, a flat first space 11 is formed on the water supply pipe 9 side of the dispersion member 7, and the dispersion member 7 has a heat radiation side. A flat second space 13 is formed on the heat exchange base 4 side, and a drainage channel 12 that connects the second space 13 and the drain pipe portion 10 is formed.

【0021】図1に示すように熱移動媒体である水15
を中央の給水管部9から供給すると第1空間部11で一
斉に拡がり、各ノズル部7e(分散孔7d)から放熱側
熱交換基体4の上面に向けて勢いよく噴射する。放熱側
熱交換基体4に衝突して放熱側熱交換基体4の熱を奪っ
た水15は隙間の狭い第2空間部13で拡散し、排水路
12を経て排水管部10から系外へ排出される。排出さ
れた水15は図示しないラジェタ−または自然放冷で冷
却され、強制循環系統を通り再利用される。
As shown in FIG. 1, water 15 as a heat transfer medium
Is supplied from the central water supply pipe portion 9 and spreads all at once in the first space portion 11, and is jetted from each nozzle portion 7 e (dispersion hole 7 d) toward the upper surface of the heat-dissipation-side heat exchange base 4. The water 15 colliding with the heat-radiation-side heat exchange base 4 and removing the heat of the heat-radiation-side heat exchange base 4 diffuses in the second space 13 having a narrow gap, and is discharged from the drain pipe 10 through the drainage channel 12 to the outside of the system. Is done. The discharged water 15 is cooled by a radiator (not shown) or natural cooling, and is reused through a forced circulation system.

【0022】図1に示した28は断熱材で、第1放熱側
枠体6−1、放熱側熱交換基体4ならびに第2放熱側枠
体6−2の外周部を覆うように設置されている。
A heat insulating material 28 shown in FIG. 1 is installed so as to cover the outer peripheral portions of the first heat radiation side frame 6-1, the heat radiation side heat exchange base 4 and the second heat radiation side frame 6-2. I have.

【0023】この実施の形態においては、第1放熱側枠
体6−1と第2放熱側枠体6−2を別体としたが、第1
放熱側枠体6−1と第2放熱側枠体6−2を一体に形成
したり、あるいは放熱側熱交換基体4と第2放熱側枠体
6−2を一体に形成することも可能である。
In this embodiment, the first radiating side frame 6-1 and the second radiating side frame 6-2 are provided separately.
The heat radiation side frame 6-1 and the second heat radiation side frame 6-2 can be formed integrally, or the heat radiation side heat exchange base 4 and the second heat radiation side frame 6-2 can be formed integrally. is there.

【0024】図4は、熱交換素子群3の要部拡大断面図
である。同図に示すように、吸熱側熱交換基体2の上に
電気絶縁膜33が形成され、その上に薄膜38を介して
または介さずして吸熱側電極34が接合される。さらに
この吸熱側電極34の上にP型半導体層35ならびにN
型半導体層36が接合され、その上に放熱側電極37が
接合される。
FIG. 4 is an enlarged sectional view of a main part of the heat exchange element group 3. As shown in the figure, an electric insulating film 33 is formed on the heat-absorbing heat exchange substrate 2, and a heat-absorbing electrode 34 is bonded thereon with or without a thin film 38. Further, the P-type semiconductor layer 35 and N
The mold semiconductor layer 36 is joined, and the heat radiation side electrode 37 is joined thereon.

【0025】この放熱側電極37の両側にはP型半導体
層35ならびにN型半導体層36と接合する半導体接合
領域40、40を有し、この領域40、40の間には電
極37の一方の側端縁37aから他方の側端縁37bに
向けて延びた1本の切込み溝状の第1の切欠部50a
と、反対に電極37の他方の側端縁37bから一方の側
端縁37aに向けて延びかつ前記第1の切欠部50aよ
りずれた位置に形成された1本の切込み溝状の第2の切
欠部50bが平行に設けられている。そしてこの第1の
切欠部50aと第2の切欠部50bの間に幅狭の通電部
51が形成されて、吸熱側電極37の平面形状がほぼS
字状をしている。
On both sides of the heat radiation side electrode 37, there are provided semiconductor bonding regions 40, 40 for bonding to the P-type semiconductor layer 35 and the N-type semiconductor layer 36, and one of the electrodes 37 is provided between the regions 40, 40. One notch-shaped first notch 50a extending from the side edge 37a toward the other side edge 37b
Conversely, one cut-groove-shaped second extending from the other side edge 37b of the electrode 37 toward the one side edge 37a and formed at a position shifted from the first notch 50a is formed. Notches 50b are provided in parallel. A narrow conducting portion 51 is formed between the first notch portion 50a and the second notch portion 50b, and the planar shape of the heat absorbing side electrode 37 is substantially S
It is shaped like a letter.

【0026】これら半導体接合領域40,40、切欠部
50a,50bならびに通電部51は、電極37の中心
Oを中心にして左右対称位置に設けられている。そして
電極の37一方の側端縁37aから他方の側端縁37b
までま幅をL1、前記第1の切欠部50aならびに第2
の切欠部50bの長さをL2とした場合、L1<L2の
関係にあり、第1の切欠部50aと第2の切欠部50b
は中心O付近においてオーバーラップしている。
The semiconductor junction regions 40, the notches 50 a, 50 b, and the conducting portion 51 are provided at symmetrical positions about the center O of the electrode 37. The electrode 37 has one side edge 37a to the other side edge 37b.
The width of the first notch 50a and the second
When the length of the notch portion 50b is L2, there is a relationship of L1 <L2, and the first notch portion 50a and the second notch portion 50b
Overlap near the center O.

【0027】このように領域40、40の間に互いに若
干位置をずらせて対向するように第1の切欠部50aと
第2の切欠部50bを設けてS字状にすることにより、
同図に矢印で示す水平方向の応力を効率よく吸収するこ
とができる。
As described above, the first notch 50a and the second notch 50b are provided so as to face each other with the positions slightly shifted between the regions 40, 40, thereby forming an S-shape.
The horizontal stress indicated by the arrow in the figure can be efficiently absorbed.

【0028】図5は、本発明の第2の実施の形態を示す
図である。この実施の形態で前記第1の実施の形態と相
違する点は、電極37の両側にZ字状あるいはU字状
(本実施の形態ではZ字状)に折り曲げた折曲部39を
形成した点である。このような形状にすれば、熱サイク
ルの繰り返しによる垂直方向ならびに水平方向の両方の
応力を有効に吸収して、熱電変換素子群3へのダメージ
を極力回避することができる。
FIG. 5 is a diagram showing a second embodiment of the present invention. This embodiment is different from the first embodiment in that a bent portion 39 is formed on both sides of the electrode 37 in a Z-shape or U-shape (in this embodiment, a Z-shape). Is a point. With such a shape, both the vertical and horizontal stresses due to the repetition of the thermal cycle can be effectively absorbed, and damage to the thermoelectric conversion element group 3 can be avoided as much as possible.

【0029】なお、前記実施の形態では、放熱側電極3
7に第1、第2の切欠部50a、50bを形成したが、
吸熱側電極34にも同様に第1、第2の切欠部50a、
50bを形成することもできる。
In the above embodiment, the radiation side electrode 3
7, the first and second notches 50a and 50b are formed.
Similarly, the first and second cutouts 50a,
50b can also be formed.

【0030】前記実施の形態では電子冷却装置の場合に
ついて説明したが、本発明は発電装置にも適用可能であ
る。図6ないし図9は本発明の第3の実施の形態を説明
するための図であり、図6は発電装置の分解断面図、図
7はその発電装置に用いる素子ブロックの断面図、図8
はその素子ブロックに用いるバリア金属層の断面図、図
9はその発電装置に用いる電極の平面図である。
In the above embodiment, the case of the electronic cooling device has been described, but the present invention is also applicable to a power generation device. 6 to 9 are views for explaining the third embodiment of the present invention. FIG. 6 is an exploded cross-sectional view of the power generator, FIG. 7 is a cross-sectional view of an element block used in the power generator, and FIG.
Is a sectional view of a barrier metal layer used for the element block, and FIG. 9 is a plan view of an electrode used for the power generation device.

【0031】図6において符号60は銅からなる高温側
熱導体で、下面に窒化アルミニウムからなる電気絶縁層
61が形成されている。62は図7に示すようにπ型を
したスケルトンタイプの素子ブロックで、ニッケルメッ
キした銅板からなる高温側電極63と、半田層64a
と、ニッケルや鉄などの表面処理膜を形成したバリア金
属層65aと、Pb−TeからなるP型半導体層66な
らびにN型半導体層62と、ニッケルや鉄などの表面処
理膜を形成したバリア金属層65bとから構成されてい
る。この素子ブロック62を構成する各部材は一体に焼
結されたものである。
In FIG. 6, reference numeral 60 denotes a high-temperature-side heat conductor made of copper, and an electric insulating layer 61 made of aluminum nitride is formed on the lower surface. Numeral 62 denotes a skeleton type skeleton type element block as shown in FIG. 7, which includes a high-temperature side electrode 63 made of a nickel-plated copper plate and a solder layer 64a.
And a barrier metal layer 65a formed with a surface treatment film of nickel or iron, a P-type semiconductor layer 66 and an N-type semiconductor layer 62 made of Pb-Te, and a barrier metal layer formed with a surface treatment film of nickel or iron. And a layer 65b. The members constituting the element block 62 are integrally sintered.

【0032】バリア金属層65は図8に示すように、導
体層66(67)と接する側に周壁突部68と中央突部
69が設けられ、導体層66(67)との接合強度を高
めている。なお、前記中央突部69は必ずしも必要では
ない。
As shown in FIG. 8, the barrier metal layer 65 is provided with a peripheral wall projection 68 and a central projection 69 on the side in contact with the conductor layer 66 (67), thereby increasing the bonding strength with the conductor layer 66 (67). ing. The central projection 69 is not always necessary.

【0033】前記バリア金属層65bと低温側電極70
は、半田層64bによって接合される。71はシリコー
ンゲルからなる薄膜、72はアルミニウムからなる低温
側熱導体で、上面にアルマイトからなる電気絶縁層73
が形成されている。74は薄膜71を介して低温側熱導
体と接合した水冷ベローズで、内側には冷却水75が循
環するシステムになっている。なお、前記電極63とバ
リア金属層65a、ならびにバリア金属層65bと低温
側電極70が金属間結合する場合、半田層64a,64
bは必ずしも必要ではない。
The barrier metal layer 65b and the low-temperature side electrode 70
Are joined by the solder layer 64b. 71 is a thin film made of silicone gel, 72 is a low-temperature side heat conductor made of aluminum, and an electric insulating layer 73 made of alumite is formed on the upper surface.
Are formed. Reference numeral 74 denotes a water-cooled bellows joined to the low-temperature side heat conductor via the thin film 71, and a cooling water 75 is circulated inside the bellows. In the case where the electrode 63 and the barrier metal layer 65a and the barrier metal layer 65b and the low-temperature side electrode 70 are bonded to each other, the solder layers 64a, 64
b is not always necessary.

【0034】図9に示すように電極63(70)の両側
にはP型半導体層66ならびにN型半導体層67と接合
する半導体接合領域76、76が設けられ、この領域7
6、76の間には電極63(70)の一方の側端縁63
a(70a)から他方の側端縁63b(70b)に向け
て延びた1本の切込み溝状の第1の切欠部77aと、電
極63(70)の他方の側端縁63b(70b)から一
方の側端縁63a(70a)に向けて延びかつ前記第1
の切欠部77aよりずれた位置に形成された1本の切込
み溝状の第2の切欠部77bが平行に設けられている。
そしてこの第1の切欠部77aと第2の切欠部77bの
間に幅狭の通電部78が形成されて、電極63(70)
の平面形状がほぼS字状をしている。
As shown in FIG. 9, on both sides of the electrode 63 (70), there are provided semiconductor junction regions 76, 76 for joining with the P-type semiconductor layer 66 and the N-type semiconductor layer 67, respectively.
6, 76, one side edge 63 of the electrode 63 (70)
a (70a) toward the other side edge 63b (70b) from the one notch-shaped first notch 77a and the other side edge 63b (70b) of the electrode 63 (70). Extending toward one side edge 63a (70a), and
A notch-shaped second notch 77b formed at a position shifted from the notch 77a is provided in parallel.
A narrow conducting portion 78 is formed between the first notch 77a and the second notch 77b, and the electrode 63 (70)
Has a substantially S-shaped planar shape.

【0035】これら半導体接合領域76,76、切欠部
77a,77bならびに通電部78は、電極63(7
0)の中心Oを中心にして左右対称位置に設けられてい
る。
The semiconductor junction regions 76, 76, the notches 77a, 77b, and the energizing portion 78 are connected to the electrodes 63 (7
0) are provided at symmetrical positions with respect to the center O.

【0036】図10は、本発明の第4の実施の形態を示
す図である。この実施の形態で前記実施の形態と相違す
る点は、切欠部77aを間にしてその両側に切欠部77
bが形成されている点である。この例の場合も半導体接
合領域76,76、切欠部77a,77bならびに通電
部78は、電極63(70)の中心Oを中心にして左右
対称位置に設けられている。
FIG. 10 is a diagram showing a fourth embodiment of the present invention. This embodiment is different from the above-described embodiment in that notches 77a are provided on both sides of a notch 77a.
b is formed. Also in this example, the semiconductor junction regions 76, 76, the cutout portions 77a, 77b, and the conducting portion 78 are provided at symmetrical positions about the center O of the electrode 63 (70).

【0037】図9ならびに図10においても、L1<L
2の関係にあり、第1の切欠部77aと第2の切欠部7
7bは中心O付近においてオーバーラップしている。
9 and 10, L1 <L
2, the first notch 77a and the second notch 7
7b overlaps near the center O.

【0038】[0038]

【発明の効果】図12は、本発明の実施の形態に係る熱
電変換装置と従来の熱電変換装置の40℃/90℃の温
度サイクル加速試験におけるサイクル数と素子の抵抗変
化率との関係を示す特性図で、図中の曲線Iは本発明の
実施の形態に係る熱電変換装置の特性曲線、曲線IIは従
来の熱電変換装置の特性曲線である。
FIG. 12 is a graph showing the relationship between the number of cycles and the rate of change in resistance of a thermoelectric converter according to an embodiment of the present invention and a conventional thermoelectric converter in a 40 ° C./90° C. temperature cycle acceleration test. In the characteristic diagram shown, a curve I in the figure is a characteristic curve of the thermoelectric converter according to the embodiment of the present invention, and a curve II is a characteristic curve of the conventional thermoelectric converter.

【0039】この図から明らかなように、従来の熱電変
換装置は温度サイクルの繰り返しに伴い、半導体層と電
極の接合部の抵抗変化率が極端に高くなっている。これ
に対して本発明の熱電変換装置は、電極の形状により半
導体層と電極の熱膨張係数の違いを有効に吸収するか
ら、抵抗変化率が少なく、性能的に安定している。
As is clear from this figure, in the conventional thermoelectric converter, the rate of change in resistance at the junction between the semiconductor layer and the electrode becomes extremely high with the repetition of the temperature cycle. On the other hand, the thermoelectric conversion device of the present invention effectively absorbs the difference in the coefficient of thermal expansion between the semiconductor layer and the electrode depending on the shape of the electrode, so that the resistance change rate is small and the performance is stable.

【0040】前述のように本発明は、電極が両端部付近
に半導体接合領域を有し、その半導体接合領域の間に、
電極の一方の側端縁から他方の側端縁に向けて延びた第
1の切欠部と、電極の他方の側端縁から一方の側端縁に
向けて延びかつ前記第1の切欠部よりずれた位置に形成
された第2の切欠部とを設け、その第1の切欠部と第2
の切欠部の間に幅狭の通電部が形成されている。
As described above, according to the present invention, the electrode has a semiconductor junction region near both ends, and between the semiconductor junction region,
A first notch extending from one side edge of the electrode toward the other side edge; and a first notch extending from the other side edge of the electrode toward one side edge and extending from the first notch. A second notch formed at a shifted position is provided, and the first notch and the second notch are provided.
Are formed between the notches.

【0041】そのため、半導体層と電極の熱膨張係数の
違いを有効に吸収し、接合強度を保持することにより、
熱サイクルを繰り返しても性能劣化が少ない、動作信頼
性に優れ、耐用寿命の長い熱電変換装置を提供すること
ができる。
Therefore, by effectively absorbing the difference in the thermal expansion coefficient between the semiconductor layer and the electrode and maintaining the bonding strength,
It is possible to provide a thermoelectric conversion device that has little performance deterioration even after repeated heat cycles, has excellent operation reliability, and has a long service life.

【図面の簡単な説明】[Brief description of the drawings]

【図1】本発明の第1の実施の形態に係る熱電変換装置
の断面図である。
FIG. 1 is a sectional view of a thermoelectric conversion device according to a first embodiment of the present invention.

【図2】その熱電変換装置に使用する第1放熱側枠体の
底面図である。
FIG. 2 is a bottom view of a first heat dissipation side frame used in the thermoelectric conversion device.

【図3】その熱電変換装置におけるリード線の取り出し
構造を説明するための一部拡大断面図である。
FIG. 3 is a partially enlarged cross-sectional view for describing a lead wire take-out structure in the thermoelectric conversion device.

【図4】その熱電変換装置における素子ブロックの要部
斜視図である。
FIG. 4 is a perspective view of a main part of an element block in the thermoelectric converter.

【図5】本発明の第2の実施の形態に係る熱電変換装置
に使用する電極の斜視図である。
FIG. 5 is a perspective view of an electrode used in a thermoelectric converter according to a second embodiment of the present invention.

【図6】本発明の第3の実施の形態に係る熱電変換装置
の分解断面図である。
FIG. 6 is an exploded cross-sectional view of a thermoelectric conversion device according to a third embodiment of the present invention.

【図7】その熱電変換装置の素子ブロックの断面図であ
る。
FIG. 7 is a sectional view of an element block of the thermoelectric converter.

【図8】その素子ブロックに用いるバリア金属層の平面
図である。
FIG. 8 is a plan view of a barrier metal layer used for the element block.

【図9】その熱電変換装置に用いる電極の平面図であ
る。
FIG. 9 is a plan view of an electrode used in the thermoelectric conversion device.

【図10】本発明の第4の実施の形態に係る熱電変換装
置に用いる電極の平面図である。
FIG. 10 is a plan view of an electrode used in a thermoelectric conversion device according to a fourth embodiment of the present invention.

【図11】従来の熱電変換装置の断面図である。FIG. 11 is a sectional view of a conventional thermoelectric converter.

【図12】本発明の実施の形態に係る熱電変換装置と従
来の熱電変換装置の温度サイクルの繰り返しに伴う抵抗
変化率の特性図である。
FIG. 12 is a characteristic diagram of a rate of change in resistance of the thermoelectric conversion device according to the embodiment of the present invention and a conventional thermoelectric conversion device with repetition of a temperature cycle.

【符号の説明】[Explanation of symbols]

1 吸熱部材 2 吸熱側熱交換基体 3 熱電変換素子群 4 放熱側熱交換基体 34 吸熱側電極 35 P型半導体層 36 N型半導体層 37 吸熱側電極 37a 一方の側端縁 37b 他方の側端縁 40 半導体接合領域 50a 第1の切欠部 50b 第2の切欠部 51 通電部 60 高温側熱導体 62 素子ブロック 63 高温側電極 63a(70a) 一方の側端縁 63b(70b) 他方の側端縁 66 P型半導体層 67 N型半導体層 70 低温側電極 76 半導体接合領域 77a 第1の切欠部 77b 第2の切欠部 78 通電部 O 電極の中心 L1 電極の幅 L2 第1ならびに第2の切欠部の長さ REFERENCE SIGNS LIST 1 heat absorbing member 2 heat absorbing side heat exchange base 3 thermoelectric conversion element group 4 heat radiation side heat exchange base 34 heat absorbing side electrode 35 P-type semiconductor layer 36 N-type semiconductor layer 37 heat absorbing side electrode 37a one side edge 37b the other side edge Reference Signs List 40 semiconductor bonding region 50a first cutout portion 50b second cutout portion 51 conducting portion 60 high-temperature side heat conductor 62 element block 63 high-temperature side electrode 63a (70a) one side edge 63b (70b) the other side edge 66 P-type semiconductor layer 67 N-type semiconductor layer 70 Low-temperature side electrode 76 Semiconductor junction region 77a First cutout portion 77b Second cutout portion 78 Current-carrying portion O Center of electrode L1 Width of electrode L2 First and second cutout portions length

Claims (4)

【特許請求の範囲】[Claims] 【請求項1】 多数の半導体層と、各半導体層を電気的
に接続するための多数の電極とを有し、前記半導体層の
少なくとも一方がスケルトンタイプの熱電変換装置にお
いて、 前記多数の電極のうちの少なくとも一部が、両端部付近
に半導体接合領域を有し、その半導体接合領域の間に、
電極の一方の側端縁から他方の側端縁に向けて延びた第
1の切欠部と、電極の他方の側端縁から一方の側端縁に
向けて延びかつ前記第1の切欠部よりずれた位置に形成
された第2の切欠部とを設け、 その第1の切欠部と第2の切欠部の間に幅狭の通電部が
形成されていることを特徴とする熱電変換装置。
1. A thermoelectric conversion device having a large number of semiconductor layers and a large number of electrodes for electrically connecting the semiconductor layers, wherein at least one of the semiconductor layers has a skeleton type. At least a part of them has a semiconductor junction region near both ends, and between the semiconductor junction regions,
A first notch extending from one side edge of the electrode toward the other side edge; and a first notch extending from the other side edge of the electrode toward one side edge and extending from the first notch. A thermoelectric conversion device comprising: a second notch formed at a shifted position; and a narrow current-carrying portion formed between the first notch and the second notch.
【請求項2】 請求項1記載において、前記半導体接合
領域、切欠部ならびに通電部がそれぞれ電極の中心から
左右対称位置に設けられていることを特徴とする熱電変
換装置。
2. The thermoelectric conversion device according to claim 1, wherein the semiconductor junction region, the notch portion, and the current-carrying portion are provided at symmetrical positions from the center of the electrode.
【請求項3】 請求項1または2記載において、前記半
導体接合領域と切欠部と通電部により電極の平面形状が
ほぼS字状になっていることを特徴とする熱電変換装
置。
3. The thermoelectric conversion device according to claim 1, wherein a plane shape of the electrode is substantially S-shaped by the semiconductor junction region, the cutout portion, and the conducting portion.
【請求項4】 請求項1ないし3記載のいずれかにおい
て、前記電極の一方の側端縁から他方の側端縁までま幅
をL1、前記第1の切欠部ならびに第2の切欠部の長さ
をL2とした場合、L1<L2の関係にあることを特徴
とする熱電変換装置。
4. The electrode according to claim 1, wherein a width from one side edge to the other side edge of the electrode is L1, a length of the first cutout and a length of the second cutout. A thermoelectric conversion device, wherein L1 <L2, where L2 is the length.
JP12716797A 1997-05-16 1997-05-16 Thermoelectric converter Expired - Lifetime JP3920403B2 (en)

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Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP12716797A JP3920403B2 (en) 1997-05-16 1997-05-16 Thermoelectric converter

Publications (2)

Publication Number Publication Date
JPH10321920A true JPH10321920A (en) 1998-12-04
JP3920403B2 JP3920403B2 (en) 2007-05-30

Family

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Country Status (1)

Country Link
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Cited By (10)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2002139264A (en) * 2000-11-02 2002-05-17 Komatsu Electronics Inc Heat exchanger
GB2416244A (en) * 2004-07-07 2006-01-18 Nat Inst Of Advanced Ind Scien Thermoelectric element and thermoelectric module
JP2007266444A (en) * 2006-03-29 2007-10-11 Okano Electric Wire Co Ltd Thermoelectric conversion module
JP2009206497A (en) * 2008-01-29 2009-09-10 Kyocera Corp Thermoelectric module
WO2011009935A1 (en) * 2009-07-24 2011-01-27 Basf Se Thermoelectric module
JP2018041775A (en) * 2016-09-05 2018-03-15 株式会社テックスイージー Thermoelectric conversion module
CN108649114A (en) * 2018-04-26 2018-10-12 东华大学 A kind of inorganic thermoelectric material base flexibility thermoelectric conversion element
CN108713259A (en) * 2016-03-24 2018-10-26 三菱综合材料株式会社 Thermoelectric conversion module
US10497850B2 (en) 2014-05-01 2019-12-03 Mitsubishi Electric Corporation Thermoelectric converter and manufacturing method for manufacturing thermoelectric converter
JP2022535751A (en) * 2019-06-05 2022-08-10 エルジー イノテック カンパニー リミテッド thermoelectric element

Cited By (12)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2002139264A (en) * 2000-11-02 2002-05-17 Komatsu Electronics Inc Heat exchanger
GB2416244A (en) * 2004-07-07 2006-01-18 Nat Inst Of Advanced Ind Scien Thermoelectric element and thermoelectric module
GB2416244B (en) * 2004-07-07 2008-08-13 Nat Inst Of Advanced Ind Scien Thermoelectric element and thermoelectric module
JP2007266444A (en) * 2006-03-29 2007-10-11 Okano Electric Wire Co Ltd Thermoelectric conversion module
JP2009206497A (en) * 2008-01-29 2009-09-10 Kyocera Corp Thermoelectric module
WO2011009935A1 (en) * 2009-07-24 2011-01-27 Basf Se Thermoelectric module
US10497850B2 (en) 2014-05-01 2019-12-03 Mitsubishi Electric Corporation Thermoelectric converter and manufacturing method for manufacturing thermoelectric converter
CN108713259A (en) * 2016-03-24 2018-10-26 三菱综合材料株式会社 Thermoelectric conversion module
CN108713259B (en) * 2016-03-24 2021-11-23 三菱综合材料株式会社 Thermoelectric conversion module
JP2018041775A (en) * 2016-09-05 2018-03-15 株式会社テックスイージー Thermoelectric conversion module
CN108649114A (en) * 2018-04-26 2018-10-12 东华大学 A kind of inorganic thermoelectric material base flexibility thermoelectric conversion element
JP2022535751A (en) * 2019-06-05 2022-08-10 エルジー イノテック カンパニー リミテッド thermoelectric element

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