JPH10326552A - Surface treatment film for high withstand voltage, and relay iron core provided with this film - Google Patents

Abstract

PROBLEM TO BE SOLVED: To improve the withstand voltage of a surface treatment film, and to provide a relay having a high withstand voltage by providing a bedding layer, which is formed by plating a base material and is mainly composed of nickel, and an oxidized coating layer, which is formed by oxidizing the surface of the bedding layer. SOLUTION: A surface treatment film for high withstand voltage is formed of a bedding layer 10, which is formed by planting a relay iron core base material 9 as a base material, an oxidized coating film 11, which is formed by oxidizing a surface of the bedding layer 10, and a surface layer 12, which is formed by depositing the polyimide resin to the oxidized coating film 11. In this case, the bedding layer 10 is formed with a layer of nickel plate at 0.5 [μm] or more and at 10 [μm] or less in thickness by electrolysis or non-electrolysis. The oxidized coating film layer 11 is formed by oxidizing the surface of the bedding layer 10 at 300 deg.C-500 deg.C in the air. Since the withstand voltage is improved by the oxide film layer 11, a surface treatment film having a high withstand voltage is obtained.

Description

DETAILED DESCRIPTION OF THE INVENTION

[0001]

BACKGROUND OF THE INVENTION 1. Field of the Invention The present invention relates to a withstand voltage surface treatment film and a relay core provided with a withstand voltage surface treatment film.

[0002]

2. Description of the Related Art A prior art relay core provided with a withstand voltage surface treatment film will be described with reference to FIGS. FIG. 3 is a side view of a main part showing the configuration of the relay. FIG. 4 is a sectional view of the relay iron core.

The relay shown in FIG. 3 includes a coil 1, a relay core 2, an armature 3, and a permanent magnet 4.

[0004] The relay iron core 2 is made of a magnetic metal material such as an electromagnetic soft iron having a substantially U-shape, and has magnetic pole surfaces 2 a, 2 a facing the armature 3 on both end surfaces. Coil 1
Is wound around the relay iron core 2.

The armature 3 is made of electromagnetic soft iron like the relay iron core 2, and has a substantially flat central lower surface provided with a ridge 3a serving as a swing fulcrum.

The permanent magnet 4 has a substantially mountain shape, a recess 4a for swinging and supporting the armature 3 is provided at a central projection, and both ends are in contact with both ends of the relay iron core 2. I have.

In the relay configured as described above, when the coil 1 is excited, the armature 3
The arm 3 swings around the fulcrum, and a movable contact (not shown) provided integrally with the armature 3 via the insulator opens and closes with respect to the fixed contact.

By the way, this relay iron core 2 is
A withstand voltage surface treatment film is provided to maintain insulation from This withstand voltage surface treatment film is formed as follows.

First, the relay iron core substrate 5 is annealed, and a nickel-plated base layer 6 is formed on the surface of the relay iron core substrate 5 as shown in FIG. The reason why the underlayer 6 is formed is to improve the corrosion resistance.

Next, a polyimide resin is deposited on the surface of the underlayer 6 by vapor deposition to form a surface layer 7.

The relay iron core base material 1 of the relay iron core A thus formed is a coil 1 for driving the relay iron core A.
Insulation between them is made by the surface layer 3, and the heat resistance as a relay is also high.

[0012]

However, in the above-mentioned relay iron core shown in FIG. 4, for example, the nickel plating base layer 6 is 3 [μm], and the polyimide resin surface layer 7 is When it is 10 [μm], the withstand voltage is 1
It was 100 [V].

By the way, as a current requirement, a relay having a high withstand voltage is desired, and 1100 [V] may not satisfy the requirement.

SUMMARY OF THE INVENTION The present invention has been made to solve the above-mentioned problems, and an object of the present invention is to provide a withstand voltage surface treatment film capable of achieving a high withstand voltage and a high withstand voltage relay. An object of the present invention is to provide a relay core that can be used.

[0015]

SUMMARY OF THE INVENTION In order to solve the above-mentioned problems, the present invention is directed to an invention as set forth in claim 1, wherein an underlayer mainly composed of nickel formed by plating a base material. And an oxide film layer formed by performing an oxidation treatment on the surface of the underlayer.

According to the second aspect of the present invention, there is provided a base layer formed by plating a base material, an oxide layer formed by oxidizing the surface of the base layer, and an oxide layer formed by oxidizing the surface of the base layer. And a surface layer formed by vapor deposition of a polyimide resin.

According to a third aspect of the present invention, the oxide film layer is formed by performing an oxidation treatment in air at a temperature of 300 ° C. or more and 500 ° C. or less.

The invention according to claim 4 is characterized in that the phosphoric acid layer has a phosphoric acid-treated base material and a surface layer formed by depositing a polyimide resin on the phosphoric acid layer. Things.

According to the invention as set forth in claim 5, an underlayer formed by plating a relay iron core as a base material,
And a voltage-resistant surface treatment film having an oxide film layer formed by performing an oxidation treatment on the surface of the underlayer.

In the invention according to claim 6, an underlayer formed by plating a relay iron core as a base material,
A voltage-resistant surface treatment film having an oxide film layer formed by performing an oxidation treatment on the surface of the underlayer, and a surface layer formed by depositing a polyimide resin on the oxide film layer. .

According to a seventh aspect of the present invention, the oxide film layer is formed by performing an oxidation treatment in air at a temperature of 300 ° C. or more and 500 ° C. or less.

The invention according to claim 8 is characterized in that the substrate has a phosphoric acid layer subjected to a phosphoric acid treatment.

According to a ninth aspect of the present invention, there is provided a withstand voltage surface treatment film comprising: a phosphoric acid layer on a base material subjected to a phosphoric acid treatment; and a surface layer formed by depositing a polyimide resin on the phosphoric acid layer. It is characterized by having.

In the invention according to claim 10, the phosphoric acid layer has a thickness of 1 μm or more and 4 μm or less,
The surface layer has a thickness of 4 μm or more and 6 μm or less.

[0025]

DESCRIPTION OF THE PREFERRED EMBODIMENTS A first embodiment of a withstand voltage surface treatment film and a relay core having a withstand voltage surface treatment film according to the present invention are shown in FIG. 1 and a second embodiment is shown in FIG. Will be explained.

[First Embodiment] FIG. 1 is a sectional view of a relay core.

The relay iron core 8 shown in FIG. 1 has a base layer 1 formed by plating a relay iron core base material 9 as a base material.
0, an oxide film layer 11 formed by performing an oxidation treatment on the surface of the underlayer, and a surface layer 12 formed by depositing a polyimide resin on the oxide film layer. .

More specifically, the base layer 10 is formed by plating nickel by electrolysis or electroless 0.5 [μm] to 10 [μm].
m]. The underlayer 10 is not limited to a layer containing nickel as a main component, but may be a metal plating.

The oxide film layer 11 has a thickness of 300 in air.
The surface of the underlayer 10 is formed by performing an oxidation treatment at a temperature of not less than 500 ° C. and not more than 500 ° C. It is necessary to carry out the process at a temperature of 300 ° C. or more and 500 ° C. or less. If the temperature is lower than 300 ° C., the oxide film may not be formed stably.
This is because the electromagnetic soft iron may diffuse.

The surface layer 12 has a thickness of 5 μm or more and 24 μm or more.
m], and is formed by evaporating a polyimide resin by a vacuum evaporation method or the like. The polyimide resin may be either a condensation type or an addition type as long as it has an imide bond in the molecular skeleton. 24 surface layers
[Μm] or less is due to the surface layer 1 which is a non-magnetic material.
This is because, if the thickness of the second layer exceeds 24 [μm], the passage of magnetic flux is hindered, which may adversely affect the relay operating voltage and the open circuit voltage.

In this relay iron core 8, the thickness of the nickel plating is 3 [μm] and the oxidation treatment in the air is 30 [mu] m.
Performing at 0 ° C. for 1 hour to form an oxide film layer 11 and a surface layer 1
When the withstand voltage was measured for a sample having a thickness of 10 [μm], the withstand voltage was 2,070 [V], which was larger than the withstand voltage of the conventional technology.

As described above, since the relay core having the withstand voltage surface treatment film and the withstand voltage surface treatment film is formed, the withstand voltage can be increased, and the surface of the relay iron core can be increased. Even if the polyimide resin of the layer 12 is peeled off, the oxide film layer 11 ensures the withstand voltage between the relay core substrate 9 and a coil (not shown).

[Second Embodiment] FIG. 2 is a sectional view of a relay iron core.

A relay iron core 13 shown in FIG. 2 has a phosphoric acid layer 15 obtained by subjecting a relay iron core base material 14 as a base material to a phosphoric acid treatment.
And a surface layer 16 formed by depositing a polyimide resin on the phosphoric acid layer, and a withstand voltage surface treatment film composed of the same.

More specifically, the phosphoric acid layer 15 is formed by performing a phosphoric acid treatment with iron phosphate, and has a thickness of 1 μm.
m] and 4 [μm] or less. The phosphoric acid treatment is capable of so-called barrel treatment in which a relay iron core as a base material is put in a basket and immersed in iron phosphate, and has an advantage that a large amount of relay iron core can be treated at a time.

The surface layer 16 has a thickness of 1 μm or more and 24 μm or more.
m], and is formed by evaporating a polyimide resin by a vacuum evaporation method or the like. The polyimide resin may be either a condensation type or an addition type as long as it has an imide bond in the molecular skeleton.

The phosphoric acid layer 15 has a thickness of 1 μm or more and 4 μm or more.
And the thickness of the surface layer 16 is 1 μm or more and 20 μm or more.
The reason for this is to keep the thickness of the nonmagnetic layer composed of the phosphoric acid layer 15 and the surface layer 16 at 24 [μm] or less.
The thickness of the non-magnetic layer composed of the phosphoric acid layer 15 and the surface layer 16 is kept at 24 [μm] or less because if the thickness of the non-magnetic layer exceeds 24 [μm], the magnetic flux is reduced. This is because there is a risk that the passage of the relay will be hindered and the relay operating voltage and open circuit voltage will be adversely affected. Also, the phosphoric acid layer 15
[Μm] or more, and the surface layer 16 is 1 [μm] or more because a desired withstand voltage cannot be secured if each is less than 1 [μm].

In this relay iron core 13, the thickness of the phosphoric acid layer 15 of iron phosphate is 2 μm, and the surface layer 12 is 5 μm.
When the withstand voltage was measured for a product having a thickness of [μm], the withstand voltage was 2210 [V], which was larger than the withstand voltage of the conventional technology.

As another example, when the phosphoric acid layer 15 is formed by performing phosphoric acid treatment with manganese phosphate, the thickness of the phosphoric acid layer 15 of manganese phosphate is set to 2 [μm], and the surface layer 12 is formed of 5 μm. When the thickness is [μm], the withstand voltage is 2220 [V], which is larger than the withstand voltage of the conventional technology.

As still another example, when the phosphoric acid layer 15 is formed by performing a phosphoric acid treatment with zinc phosphate, the thickness of the phosphoric acid layer 15 of zinc phosphate is set to 2 [μm], and the surface layer 12 is formed. When the thickness is 5 [μm], the withstand voltage is 2240 [V], which is larger than the withstand voltage of the conventional technology.

As described above, since the relay iron core having the withstand voltage surface treatment film and the withstand voltage surface treatment film is formed, the withstand voltage can be increased, and the surface of the relay iron core can be increased. Even if the polyimide resin of the layer 12 is peeled off, the phosphoric acid layer 15 ensures a withstand voltage between the relay iron core base material 14 and a coil (not shown).

[0042]

According to the first and second aspects of the present invention, the withstand voltage surface treatment film and the relay core having the withstand voltage surface treatment film of the present invention are constructed as described above. The oxide film layer has the effect of increasing the withstand voltage and thus providing a withstand voltage surface treatment film having a high withstand voltage.

According to the third aspect of the present invention, the oxide film layer is formed by performing an oxidation treatment in air at a temperature of 300 ° C. or more and 500 ° C. or less. This has the effect of providing a surface-treated coating.

According to the fourth aspect of the present invention, the phosphoric acid layer has a phosphoric acid-treated base material and a surface layer formed by depositing a polyimide resin on the phosphoric acid layer. Has the effect of increasing the withstand voltage and thus providing a withstand voltage surface treatment film having a high withstand voltage.

According to the fifth and sixth aspects of the present invention, since the surface of the underlayer has an oxide film layer formed by performing an oxidation treatment, the oxide film layer increases the withstand voltage. ,
Therefore, there is an effect that a relay iron core capable of forming a relay with a high withstand voltage can be provided.

According to the present invention, the oxide film layer is formed by performing an oxidation treatment in air at a temperature of 300 ° C. or more and 500 ° C. or less. This has the effect of providing a core.

According to the eighth and ninth aspects of the present invention, since the base material has a phosphoric acid-treated phosphoric acid layer,
The phosphoric acid layer has an effect of increasing the withstand voltage, and thus providing a relay iron core capable of forming a high withstand voltage relay.

According to a tenth aspect of the present invention, the phosphoric acid layer has a thickness of 1 μm or more and 4 μm or less,
Since the surface layer has a thickness of 1 [μm] or more and 20 [μm] or less, the non-magnetic layer has a sensing voltage of a relay,
This has the effect of providing a relay iron core that does not adversely affect the open circuit voltage.

[Brief description of the drawings]

FIG. 1 is a sectional view of an example of a relay iron core of the present invention.

FIG. 2 is a sectional view of another example of the relay iron core of the present invention.

FIG. 3 is a main part side view showing a configuration of a relay.

FIG. 4 is a sectional view of a conventional relay iron core.

[Explanation of symbols]

 Reference Signs List 8 relay iron core 9 base material 10 base layer 11 oxide film layer 12 surface layer 14 base material 15 phosphoric acid layer 16 surface layer

Claims (10)

[Claims] 1. A withstand voltage surface treatment film comprising: a base layer formed by plating a substrate; and an oxide film layer formed by oxidizing the surface of the base layer. 2. A base layer formed by plating a substrate, an oxide layer formed by oxidizing the surface of the base layer, and a surface layer formed by depositing a polyimide resin on the oxide layer. And a withstand voltage surface treatment film comprising: 3. The oxide film layer has a thickness of 300 in air.
The withstand voltage surface treatment film according to claim 1 or 2, wherein the film is formed by performing an oxidation treatment at a temperature of not less than 500C and not more than 500C. 4. A phosphoric acid layer obtained by subjecting a base material to a phosphoric acid treatment,
A surface layer formed by depositing a polyimide resin on the phosphoric acid layer,
A withstand voltage surface treatment film characterized by having: 5. A withstand voltage surface treatment film having a base layer formed by plating a relay iron core as a base material and an oxide film layer formed by oxidizing the surface of the base layer. A relay iron core comprising: 6. A base layer formed by plating a relay iron core as a base material, an oxide layer formed by oxidizing the surface of the base layer, and a polyimide resin formed on the oxide layer. A relay core comprising a withstand voltage surface treatment film having a surface layer formed by vapor deposition. 7. The method according to claim 1, wherein the oxide film layer has a thickness of 300
The relay iron core according to claim 5 or 6, wherein the relay iron core is formed by performing an oxidation treatment at a temperature of not less than 500C and not more than 500C. 8. A relay iron core comprising a withstand voltage surface treatment film having a phosphoric acid layer obtained by subjecting a base material to a phosphoric acid treatment. 9. A phosphoric acid layer obtained by subjecting a substrate to a phosphoric acid treatment,
A surface layer formed by depositing a polyimide resin on the phosphoric acid layer,
A relay iron core comprising a withstand voltage surface treatment film having: 10. The phosphoric acid layer has a thickness of 1 μm or more and 4 μm or more.
m] or less, and the surface layer has a thickness of 1 μm or more and 2 μm or less.
9. A thickness of not more than 0 [μm].
Or the relay iron core according to claim 9.