JPH10340619A - Low temperature firing gold paste - Google Patents
Low temperature firing gold pasteInfo
- Publication number
- JPH10340619A JPH10340619A JP14738097A JP14738097A JPH10340619A JP H10340619 A JPH10340619 A JP H10340619A JP 14738097 A JP14738097 A JP 14738097A JP 14738097 A JP14738097 A JP 14738097A JP H10340619 A JPH10340619 A JP H10340619A
- Authority
- JP
- Japan
- Prior art keywords
- gold
- gold particles
- glass substrate
- glass frit
- glass
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Withdrawn
Links
Classifications
-
- H—ELECTRICITY
- H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
- H05K—PRINTED CIRCUITS; CASINGS OR CONSTRUCTIONAL DETAILS OF ELECTRIC APPARATUS; MANUFACTURE OF ASSEMBLAGES OF ELECTRICAL COMPONENTS
- H05K1/00—Printed circuits
- H05K1/02—Details
- H05K1/09—Use of materials for the conductive, e.g. metallic pattern
- H05K1/092—Dispersed materials, e.g. conductive pastes or inks
Landscapes
- Conductive Materials (AREA)
Abstract
Description
【0001】[0001]
【産業上の利用分野】この発明は、ガラス基板上等に金
膜導電回路を形成させることができる低温焼成ペースト
に関する。BACKGROUND OF THE INVENTION 1. Field of the Invention The present invention relates to a low-temperature firing paste capable of forming a gold film conductive circuit on a glass substrate or the like.
【0002】[0002]
【従来の技術】一般に、プラズマディスプレイ用マトリ
ックス電極パネルやCCDセンサ、イメージセンサ等の
部品は、無アルカリガラスやその他の各種のガラス基板
上に、蒸着法により電極形成をしていた。この様な蒸着
法においては、真空容器内に電極形成部材を収納して金
膜を蒸着するものであったので、装置が大がかりで高価
なものとなり、部材の出し入れがわずらわしく、真空引
き時間を要するなど作業性が良くないばかりか、部材の
マスキング工程やエッチング工程等を要し、かなりコス
ト高であった。2. Description of the Related Art In general, components such as a matrix electrode panel for a plasma display, a CCD sensor, and an image sensor are formed on a non-alkali glass or other various glass substrates by an evaporation method. In such a vapor deposition method, since the gold film is deposited by housing the electrode forming member in a vacuum vessel, the apparatus becomes large and expensive, and it takes a lot of time to evacuate and take in the member, and it takes time for evacuation. Not only is the workability not good, but also a masking step and an etching step for the members are required, and the cost is considerably high.
【0003】[0003]
【発明が解決しようとする課題】このため、ガラス基板
上に金ペーストを印刷し、焼成することにより、金膜電
極を形成することが望まれた。しかしながら、従来の金
ペーストをガラス基板の耐熱温度以下で焼成しても、ガ
ラス基板との密着が不良であるばかりか、ワイヤボンデ
ィング不着率が高く、導体抵抗値も高くなり、使いもの
にならなかった。Therefore, it has been desired to form a gold film electrode by printing a gold paste on a glass substrate and firing it. However, even if the conventional gold paste is baked at a temperature lower than the heat resistance temperature of the glass substrate, not only the adhesion to the glass substrate is poor, but also the wire-bonding non-adhesion rate is high, the conductor resistance value is high, and it cannot be used. .
【0004】そこでこの発明は、ガラス基板の耐熱温度
以下の温度で焼成しても良好な金膜を形成することがで
きる低温焼成金ペーストを提供することを目的とする。Accordingly, an object of the present invention is to provide a low-temperature fired gold paste capable of forming a good gold film even when fired at a temperature lower than the heat resistance temperature of a glass substrate.
【0005】[0005]
【課題を解決するための手段】この発明の目的は、粒径
1.0μm以下の金粒子と、軟化点450℃以下のガラ
スフリットと、有機ビヒクルとを混練分散せしめてなる
低温焼成金ペーストによって達成される。An object of the present invention is to provide a low-temperature fired gold paste obtained by kneading and dispersing gold particles having a particle size of 1.0 μm or less, a glass frit having a softening point of 450 ° C. or less, and an organic vehicle. Achieved.
【0006】[0006]
【発明の実施の形態】この発明によれば、従来の様に蒸
着によって金膜電極を形成するのではなく、ガラス基板
上にペーストを施して乾燥後焼成して金膜電極を得る。
金粒子とガラスフリットと有機ビヒクルとの混練分散
は、三本ロールやブレンダー等の機械が用いられる。こ
の発明の様に、金粒子を1.0μm以下とすれば、従来
の金ペーストに常用されている金粒子の約1/2以下の
粒径となるため体積は約1/8以下となり、金粒子個々
の熱容量も格段に小さなものとなり、ガラス基板の耐熱
温度以下の温度で焼成しても、金粒子相互が良好に焼結
し、抵抗値が高くならない。ガラスフリットの軟化点を
450℃とする事により、500℃〜600℃の温度で
焼成すると、ガラス基板と金膜との間にガラスフリット
が良好に定着し、密着強度を高める。又、ガラスが金粒
子間の抵抗体として介在することも無くなる。According to the present invention, a gold film electrode is obtained by applying a paste on a glass substrate, drying and baking, instead of forming a gold film electrode by vapor deposition as in the prior art.
For kneading and dispersing the gold particles, the glass frit and the organic vehicle, a machine such as a three-roll or blender is used. When the gold particles are 1.0 μm or less as in the present invention, the particle size is about 以下 or less of the gold particles commonly used in the conventional gold paste, so that the volume is about 8 or less. The heat capacity of each particle is also extremely small, and even when fired at a temperature equal to or lower than the heat resistance temperature of the glass substrate, the gold particles sinter well and the resistance does not increase. By setting the softening point of the glass frit to 450 ° C. and firing at a temperature of 500 ° C. to 600 ° C., the glass frit is fixed well between the glass substrate and the gold film, and the adhesion strength is increased. Further, the glass does not intervene as a resistor between the gold particles.
【0007】[0007]
【実施例1】金粒子の粒径1.0μmのもの91重量パ
ーセント、組成がPbO−B2O3−SiO2からなる軟
化点450℃以下のガラスフリット3.0重量パーセン
ト、及びエチルセルロースをターピネオールに溶解させ
た有機ビヒクル6.0重量パーセントとを混合し、三本
ロールやブレンダー等を用いて混練分散化させて低温焼
成金ペーストを得た。ここで得た金ペーストを、325
メッシュのスクリーンを介して石灰ガラス基板上に印刷
してから、ピーク温度550℃、ピーク時間10分で焼
成した。この様な工程で得たガラス基板上の金膜は、金
粒子相互間が完全に焼結した鏡面状金膜を形成し、10
μm厚の金膜の導体抵抗値は4.3mΩ/□で、ワイヤ
ボンディング不着率は0パーセントと良好な結果が得ら
れた。Example 1 91% by weight of gold particles having a particle size of 1.0 μm, 3.0% by weight of glass frit having a softening point of 450 ° C. or less composed of PbO—B 2 O 3 —SiO 2 , and terpineol as ethyl cellulose Was mixed with 6.0% by weight of an organic vehicle dissolved in, and kneaded and dispersed using a three-roll mill or a blender to obtain a low-temperature fired gold paste. The gold paste obtained here is 325
After printing on a lime glass substrate through a mesh screen, baking was performed at a peak temperature of 550 ° C. and a peak time of 10 minutes. The gold film on the glass substrate obtained in such a process forms a mirror-like gold film in which the spaces between the gold particles are completely sintered.
The conductor resistance of the μm-thick gold film was 4.3 mΩ / □, and the nonbonding rate of wire bonding was 0%, which was a good result.
【0008】[0008]
【実施例2】粒子径0.6μmの金粒子91重量パーセ
ント、軟化点450℃以下のガラスフリット3.0重量
パーセント、有機ビヒクル6.0重量パーセントを混練
分散化させて低温焼成金ペーストを得た。この金ペース
トを用いて実施例1と同一条件でガラス基板上に金膜を
設けて評価した所、導体抵抗値は10μm厚の金膜で
3.8mΩ/□、ワイヤボンディング不着率は0パーセ
ントであった。この実施例の場合、金粒子径が実施例1
の場合の半分近くであるので、金粒子の体積または熱容
量は約1/8近くとなり、金粒子間の焼結が一段と良好
になり、導体抵抗値の変化にも現れている。Example 2 91% by weight of gold particles having a particle diameter of 0.6 μm, 3.0% by weight of a glass frit having a softening point of 450 ° C. or less, and 6.0% by weight of an organic vehicle were kneaded and dispersed to obtain a low-temperature fired gold paste. Was. When a gold film was provided on a glass substrate using the gold paste under the same conditions as in Example 1, the conductor resistance was 3.8 mΩ / □ for a 10 μm thick gold film, and the wire bonding non-adherence rate was 0%. there were. In the case of this embodiment, the gold particle diameter is smaller than that of the first embodiment.
Therefore, the volume or heat capacity of the gold particles is about 1/8, the sintering between the gold particles is further improved, and the change in the conductor resistance value also appears.
【0009】[0009]
【実施例3】粒子径0.2μmの金粒子91重量パーセ
ントと、軟化点450℃以下のガラスフリット3.0重
量パーセントと、有機ビヒクル6.0重量パーセントと
を混練分散化させて得た低温焼成金ペーストをガラス基
板上に550℃の温度で焼成固着させて評価した所、導
体抵抗値は10μm厚の金膜で3.2mΩ/□、ワイヤ
ボンディング不着率は0パーセントと良好な結果を得
た。Example 3 Low temperature obtained by kneading and dispersing 91% by weight of gold particles having a particle diameter of 0.2 μm, 3.0% by weight of a glass frit having a softening point of 450 ° C. or lower, and 6.0% by weight of an organic vehicle. When the baked gold paste was baked and fixed at a temperature of 550 ° C. on a glass substrate and evaluated, the conductor resistance value was 3.2 mΩ / □ for a 10 μm thick gold film, and the wire bonding non-adhesion rate was 0%. Was.
【0010】[0010]
【比較例1】粒子径2.0μmの金粒子91重量パーセ
ントと、軟化点450℃以下のガラスフリット3.0重
量パーセントと、有機ビヒクル6.0重量パーセントと
を混練した金ペーストを、325メッシュのスクリーン
を介してガラス基板上に印刷して550℃で焼成したも
のを評価した所、鏡面状の金膜は得られず、導体抵抗値
も10μm厚で8.0mΩ/□と高く、ワイヤボンディ
ング不着率も100パーセントで、使いものにならない
事が判明した。Comparative Example 1 A gold paste obtained by kneading 91% by weight of gold particles having a particle diameter of 2.0 μm, 3.0% by weight of a glass frit having a softening point of 450 ° C. or lower, and 6.0% by weight of an organic vehicle was mixed with 325 mesh. When printed on a glass substrate through a screen and fired at 550 ° C., a mirror-like gold film was not obtained, and the conductor resistance was as high as 8.0 mΩ / □ at a thickness of 10 μm. The non-delivery rate was 100%, which proved unusable.
【0011】[0011]
【比較例2】粒子径1.4μmの金粒子91重量パーセ
ントと、軟化点450℃以下のガラスフリット3.0重
量パーセントと、有機ビヒクル6.0重量パーセントと
を混練した金ペーストを、同様に325メッシのスクリ
ーンを介してガラス基板上に印刷してから、550℃で
焼成した。これを評価した所、導体抵抗値は10μm厚
で5.4mΩ/□、ワイヤボンディング不着率は45パ
ーセントであり、実用できるものは得られなかった。Comparative Example 2 A gold paste obtained by kneading 91% by weight of gold particles having a particle diameter of 1.4 μm, 3.0% by weight of a glass frit having a softening point of 450 ° C. or lower, and 6.0% by weight of an organic vehicle was similarly prepared. After printing on a glass substrate through a 325 Messi screen, it was baked at 550 ° C. When this was evaluated, the conductor resistance value was 5.4 mΩ / □ at a thickness of 10 μm, and the wire bonding non-adhesion rate was 45%, so that a practically usable one was not obtained.
【0012】上記の比較例1と比較例2より明白な通
り、ガラスフリットとして軟化点450℃以下のものを
用いても、粒子径1.0μmを超える金粒子を用いた場
合には、金粒子同志の焼結が部分的にかつ弱くしか行わ
れず、ピンホールの多い粗雑な焼結膜となり焼結膜の導
体抵抗値が高く、導体電極としては用いる事が不能であ
ることがわかる。また、これとは逆に、金粒子の粒子径
を1.0μm以下のものとしても、ガラスフリットの軟
化点を450℃を超えるものとした場合には、金粒子の
焼結膜が得られるものの、ガラス基板との密着強度が小
さいか、或いはガラスフリットが金粒子間に介在したま
ま融解しないために、導体抵抗値が高いものとなってし
まう為、使用に耐えないものとなる。この様に、この発
明によれば、粒径1.0μm以下の金粒子と軟化点45
0℃以下のガラスフリットとを含有させた金ペーストと
する事により、500℃から600℃程度の低い焼成温
度でも良好な特性の金焼成膜を得ることができるものと
なる。As is apparent from Comparative Examples 1 and 2, even when a glass frit having a softening point of 450 ° C. or lower is used, when a gold particle having a particle diameter of more than 1.0 μm is used, the gold particle is reduced. It can be seen that the sintering of each other is only partially and weakly performed, resulting in a rough sintered film having many pinholes, a high conductor resistance value of the sintered film, and it cannot be used as a conductor electrode. Conversely, if the softening point of the glass frit exceeds 450 ° C. even when the particle size of the gold particles is 1.0 μm or less, a sintered film of gold particles can be obtained, Since the adhesion strength to the glass substrate is small, or the glass frit is not melted while being interposed between the gold particles, the conductor resistance becomes high, so that it cannot be used. As described above, according to the present invention, gold particles having a particle size of 1.0 μm or less and a softening point of
By using a gold paste containing a glass frit of 0 ° C. or less, a gold fired film having good characteristics can be obtained even at a firing temperature as low as about 500 ° C. to 600 ° C.
【0013】[0013]
【発明の効果】以上の通りこの発明によれば、ガラス基
板の耐熱温度以下の温度での焼成でも良好な特性の焼結
金膜が得られるため、蒸着法の様な精密で高価な装置を
用いる必要が無く、部品を細かく分割処理して組み立て
る必要も無くなり、ガラス基板上に電極や導体回路或い
は専用LSI等を一体形成させる事が可能となり、部品
の小型化と価格低下をもたらす効果が得られる。As described above, according to the present invention, a sintered gold film having good characteristics can be obtained even when the glass substrate is fired at a temperature lower than the allowable temperature limit. There is no need to use it, and it is not necessary to divide and assemble parts in a fine manner. This makes it possible to integrally form electrodes, conductive circuits, or dedicated LSIs on a glass substrate, which has the effect of reducing the size and cost of parts. Can be
Claims (1)
450℃以下のガラスフリットと、有機ビヒクルとを混
練分散せしめてなる低温焼成金ペースト。1. A low-temperature fired gold paste obtained by kneading and dispersing gold particles having a particle size of 1.0 μm or less, a glass frit having a softening point of 450 ° C. or less, and an organic vehicle.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP14738097A JPH10340619A (en) | 1997-06-05 | 1997-06-05 | Low temperature firing gold paste |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP14738097A JPH10340619A (en) | 1997-06-05 | 1997-06-05 | Low temperature firing gold paste |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| JPH10340619A true JPH10340619A (en) | 1998-12-22 |
Family
ID=15428943
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP14738097A Withdrawn JPH10340619A (en) | 1997-06-05 | 1997-06-05 | Low temperature firing gold paste |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JPH10340619A (en) |
Cited By (3)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US6544145B2 (en) | 2000-08-11 | 2003-04-08 | Hakusan Corporation | Movable artificial wall and free-climbing apparatus |
| JP2007145947A (en) * | 2005-11-25 | 2007-06-14 | Mitsuboshi Belting Ltd | Electroconductive ink composition and its manufacturing method |
| WO2008038534A1 (en) | 2006-09-26 | 2008-04-03 | Dowa Electronics Materials Co., Ltd. | Silver microparticle powder and method for production thereof |
-
1997
- 1997-06-05 JP JP14738097A patent/JPH10340619A/en not_active Withdrawn
Cited By (3)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US6544145B2 (en) | 2000-08-11 | 2003-04-08 | Hakusan Corporation | Movable artificial wall and free-climbing apparatus |
| JP2007145947A (en) * | 2005-11-25 | 2007-06-14 | Mitsuboshi Belting Ltd | Electroconductive ink composition and its manufacturing method |
| WO2008038534A1 (en) | 2006-09-26 | 2008-04-03 | Dowa Electronics Materials Co., Ltd. | Silver microparticle powder and method for production thereof |
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Legal Events
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Free format text: JAPANESE INTERMEDIATE CODE: A131 Effective date: 20050705 |
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