JPH1055949A5

JPH1055949A5 -

Info

Publication number: JPH1055949A5
Application number: JP1996212434A
Authority: JP
Filing date: 1996-08-12
Publication date: 2004-08-19

Description

【００１４】
さらに上記目的は、上記位置合わせ方法において、第２の「判定基準」と新たな実測値で得られたその他の誤差パラメータとに基づいて、現実に露光すべきショット位置を決定する第７のステップとを備えたことを特徴とする位置合わせ方法によって達成される。
また上記目的は、複数のパターン領域が形成されたＮ枚の基板の各々について、パターン領域の位置に関する設計値と複数の誤差パラメータとに基づいて、パターン領域の各々に対して現実に露光すべきショット位置を決定して位置合わせする位置合わせ方法において、１枚目からｍ（ｍ＜Ｎ）枚目までの各基板に対しては、所定のＭｍａｘ個のパターン領域の位置を計測して得られた第１の実測値に基づいて複数の誤差パラメータを推定し、現実に露光すべきショット位置を決定する第１のステップと、推定された複数の誤差パラメータのうち、１又は２以上の所定の誤差パラメータを選択し、ｍ枚の基板の各々から求められた選択された誤差パラメータの各値をそれぞれ平均化処理して、判定基準項目に格納する第２のステップと、ｍ＋１枚目以降の基板の各々に対しては、計測点数がＭｍｉｎ（＜Ｍｍａｘ）個のパターン領域の位置を計測して得られた第２の実測値に基づいて推定した複数の誤差パラメータのうち選択された誤差パラメータの値が判定基準項目に格納された各値に対して所定の範囲内にあれば、判定基準項目に格納されている誤差パラメータと当該実測値で得られたその他の誤差パラメータとに基づいて、現実に露光すべきショット位置を決定する第３のステップと、第２の実測値に基づいて推定した複数の誤差パラメータのうち選択された誤差パラメータの値が前記所定の範囲内になければ、選択された誤差パラメータの値が所定の範囲内に入るまで計測点数を追加して再計測を行う第４のステップとを備えたことを特徴とする位置合わせ方法によって達成される。 [0014]
Furthermore, the above object is achieved by the above alignment method, characterized by comprising a seventh step of determining the shot position to be actually exposed based on the second "criterion" and other error parameters obtained from the new actual measurement values.
Another object of the present invention is to provide an alignment method for determining and aligning shot positions to be actually exposed for each of N substrates on which a plurality of pattern areas are formed, based on design values relating to the position of the pattern area and a plurality of error parameters, the method comprising the steps of: a first step of estimating a plurality of error parameters based on first actual measurement values obtained by measuring the positions of a predetermined Mmax number of pattern areas for each of the first to m (m<N) substrates, and determining shot positions to be actually exposed; a second step of selecting one or more predetermined error parameters from the estimated plurality of error parameters, averaging the values of the selected error parameters obtained from each of the m substrates, and storing the averaged values in a judgment criterion item; and For each of the subsequent substrates, if the value of an error parameter selected from the plurality of error parameters estimated based on second actual measurement values obtained by measuring the positions of Mmin (<Mmax) pattern areas at the measurement points is within a predetermined range for each value stored in the judgment criterion items, then determining the shot position to actually be exposed based on the error parameter stored in the judgment criterion items and other error parameters obtained from the relevant actual measurement values; and if the value of the error parameter selected from the plurality of error parameters estimated based on the second actual measurement values is not within the predetermined range, then adding measurement points and performing re-measurement until the value of the selected error parameter is within the predetermined range.

Claims

1. A method for aligning N substrates on which a plurality of pattern areas are formed, by determining a shot position to be actually exposed for each of the pattern areas based on a design value relating to the position of the pattern area and a plurality of error parameters, comprising:
a first step of estimating all of the plurality of error parameters based on first actual measurement values obtained by measuring the positions of Mmax pattern areas for each of the first to m (m<N) substrates, and determining shot positions to be actually exposed;
a second step of selecting one or more predetermined error parameters from the estimated plurality of error parameters, averaging the values of the selected error parameters calculated from each of the m substrates, and storing the averaged values in each judgment criterion item in the registered first "judgment criterion";
a third step of determining, for each of the (m+1)th and subsequent substrates, shot positions to be actually exposed based on the error parameters stored in each criterion item in the first "criterion" and other error parameters obtained from the actual measurement values, if the values of the selected error parameters among all of the plurality of error parameters estimated based on second actual measurement values obtained by measuring the positions of pattern areas with a number of measurement points of Mmin (<Mmax) are within a predetermined range for the first "criterion";
and a fourth step of, if the value of the selected error parameter among the plurality of error parameters estimated based on the second actual measurement value is not within the predetermined range, adding measurement points and performing re-measurement until the value of the selected error parameter falls within the predetermined range.

2. The alignment method according to claim 1,
a fifth step of creating and additionally registering a new second "criterion" by updating the values of the error parameters selected for each criterion item of the first "criterion" when the values of the selected error parameters estimated during the fourth step show a tendency different from the first "criterion" and when the change in the values of the selected error parameters decreases and shows a predetermined tendency to converge even when the number of measurement points to be added is increased;
a sixth step of determining a shot position to be actually exposed based on error parameters stored in each judgment criterion item in the second "judgment criterion" and other error parameters obtained from the second actual measurement value measured in the fifth step and actual measurement values based on the added number of measurement points.

3. The alignment method according to claim 2,
and a seventh step of determining a shot position to be actually exposed based on the second "criterion" and other error parameters obtained from new actual measurements.

4. The alignment method according to claim 1,
A registration method characterized in that the value of Mmax is 4 to 10.

5. The alignment method according to claim 1,
The alignment method according to claim 1, wherein the value of Mmin is 3.

6. The alignment method according to claim 1,
the plurality of error parameters are a magnification error M of the substrate, a shift amount S of the substrate, a rotation error Θ of an arrangement coordinate system of the pattern area, and an orthogonality ω of the arrangement of the pattern area;
The alignment method is characterized in that the magnification error M and the orthogonality ω are selected as the judgment criteria.

1. An alignment method for determining and aligning shot positions to be actually exposed for each of N substrates on which a plurality of pattern areas are formed, based on design values related to the positions of the pattern areas and a plurality of error parameters, comprising:
For each of the first to m (m<N) substrates, a predetermined number Mmax of the patterns are a first step of estimating the plurality of error parameters based on first actual measurement values obtained by measuring the position of the shot area and determining the shot position to be actually exposed;
a second step of selecting one or more predetermined error parameters from the estimated plurality of error parameters, averaging the values of the selected error parameters calculated from each of the m substrates, and storing the averaged values in a judgment criterion item;
a third step of determining, for each of the (m+1)th and subsequent substrates, a shot position to be actually exposed based on the error parameters stored in the judgment criterion items and other error parameters obtained from the actual measurement values, if the value of the selected error parameter from among a plurality of error parameters estimated based on second actual measurement values obtained by measuring the positions of Mmin (<Mmax) measurement points of pattern areas is within a predetermined range for each value stored in the judgment criterion items;
and a fourth step of, if the value of the selected error parameter among the plurality of error parameters estimated based on the second actual measurement value is not within the predetermined range, adding measurement points and performing re-measurement until the value of the selected error parameter falls within the predetermined range.