JPH1059720A - Amorphous tin oxide sol and its production - Google Patents

Amorphous tin oxide sol and its production

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Publication number
JPH1059720A
JPH1059720A JP22931996A JP22931996A JPH1059720A JP H1059720 A JPH1059720 A JP H1059720A JP 22931996 A JP22931996 A JP 22931996A JP 22931996 A JP22931996 A JP 22931996A JP H1059720 A JPH1059720 A JP H1059720A
Authority
JP
Japan
Prior art keywords
tin oxide
amorphous
sol
oxide sol
compound
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP22931996A
Other languages
Japanese (ja)
Other versions
JP3821883B2 (en
Inventor
Ikuo Kurachi
育夫 倉地
Kamiyuki Sasaki
頂之 佐々木
Sunao Arimoto
直 有本
Takahiro Sakazaki
隆弘 酒崎
Yoshihiro Tsubakihara
▲ヨシ▼博 椿原
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
YAMANAKA KAGAKU KOGYO KK
Konica Minolta Inc
Original Assignee
YAMANAKA KAGAKU KOGYO KK
Konica Minolta Inc
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Application filed by YAMANAKA KAGAKU KOGYO KK, Konica Minolta Inc filed Critical YAMANAKA KAGAKU KOGYO KK
Priority to JP22931996A priority Critical patent/JP3821883B2/en
Publication of JPH1059720A publication Critical patent/JPH1059720A/en
Application granted granted Critical
Publication of JP3821883B2 publication Critical patent/JP3821883B2/en
Anticipated expiration legal-status Critical
Expired - Fee Related legal-status Critical Current

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  • Non-Insulated Conductors (AREA)

Abstract

PROBLEM TO BE SOLVED: To produce an amorphous tin oxide sol free from coloring, excellent in conductivity and suitable as a transparent conducting material by hydrolyzing a hydrolyzable tin compound, performing washing, then, dissolving the resultant raw material having a specific halogen concn. in an aq. ammonia and performing heat treatment. SOLUTION: The amorphous tin oxide sol is obtained by hydrolyzing the hydrolyzable tin compound after cleaning and dissolving the resultant raw material having 0.001-3% halogen concn. in the aq. ammonia and heat treating. As the hydrolyzable tin oxide, a compound containing an oxo anion such as K2 SnO3 .3H2 O, a water soluble halide such as SnCl4 , SnCl4 .5H2 O and the like are exemplified. The heat treatment is preferably performed at 25-150 deg.C. The amorphous tin oxide sol contains an amorphous tin oxide particle having <10<5> Ωcm conductivity and a tin oxide causing >=0.1wt.% to <30wt.% weight decrease at 200-500 deg.C by heat treating (by the measurement of general thermogravimetric analysis).

Description

【発明の詳細な説明】DETAILED DESCRIPTION OF THE INVENTION

【0001】[0001]

【発明の属する技術分野】本発明は非晶質酸化スズゾル
及びその製造方法に関する。
The present invention relates to an amorphous tin oxide sol and a method for producing the same.

【0002】[0002]

【従来の技術】一般に酸化スズは半導体であり、単体で
は高い導電性を示さないが、異原子をドープすることに
より高い導電性を得ることが知られている。また、透明
性、物理的化学的安定性に優れた材料であり、電気電子
的用途に期待される材料である。
2. Description of the Related Art In general, tin oxide is a semiconductor and does not exhibit high conductivity by itself, but it is known that high conductivity can be obtained by doping foreign atoms. Further, it is a material having excellent transparency and physical and chemical stability, and is expected to be used for electric and electronic applications.

【0003】このような酸化スズは、アンチモンやイン
ジウムとの複合による透明導電性酸化皮膜が有名であり
多くの用途を有するが、高純度の酸化スズもしくは非晶
質酸化スズについては導電性が低いためにあまり検討さ
れていない。
[0003] Such a tin oxide is famous for its transparent conductive oxide film formed of a complex with antimony or indium, and has many uses. However, high-purity tin oxide or amorphous tin oxide has low conductivity. Not much considered for.

【0004】これらの材料に関しては、科学技術庁刊行
の無機材質研究所研究報告書第35号「酸化スズに関す
る研究」に述べられているように、ある特定の金属化合
物のドープもしくは複合化以外では、高い導電性を示さ
ない。純度が高くなると半導体領域になり、その導電性
は10Ωcm以上まで達する。従って、透明導電材料
の用途へ用いるためには、これまで導電性を高める多く
の努力が成されてきた。
[0004] As for these materials, as described in the Research Report on Inorganic Materials, No. 35, "Study on Tin Oxide" published by the Science and Technology Agency, other than doping or compounding of a specific metal compound. Does not exhibit high conductivity. When the purity is increased, the semiconductor region becomes a semiconductor region, and its conductivity reaches 10 6 Ωcm or more. Therefore, many attempts have been made to increase the conductivity in order to use it for applications of transparent conductive materials.

【0005】また、透明導電材料には一般に化学蒸着
法、真空蒸着法、反応性イオンプレーティング法、スパ
ッタ法、イオンビームスパッタ法等の膜形成法により基
板に被覆され用いられる。
The transparent conductive material is generally used after being coated on a substrate by a film forming method such as a chemical vapor deposition method, a vacuum vapor deposition method, a reactive ion plating method, a sputtering method and an ion beam sputtering method.

【0006】しかしこれらの方法は、いずれも装置が高
価・複雑・大型であるだけでなく、膜形成速度が小さ
く、且つ大面積の膜を得ることができないという欠点を
も有している。さらに複雑形状の膜を形成する場合、不
均一となり易く、利用上の制約が多かった。
However, all of these methods have disadvantages that not only are the devices expensive, complicated and large, but the film forming speed is low and a large-area film cannot be obtained. Further, when a film having a complicated shape is formed, the film tends to be non-uniform, and there are many restrictions on its use.

【0007】これらに対し、液状の原料を基板にディッ
プして塗布する方法、或いはスプレーして塗布する方
法、エアードクター、バーコーター等を用いて塗布する
方法等は、比較的容易に大面積の膜が得られると共に、
複雑形状の部位にも比較的容易に適用でき、工業的に有
望な方法である。酸化スズ系の材料においても、このよ
うな塗布方法は幅広く検討されている。
On the other hand, a method of dipping and applying a liquid material onto a substrate, a method of applying by spraying, and a method of applying using a pneumatic doctor, a bar coater, or the like are relatively easy to apply to a large area. A membrane is obtained,
This method can be applied relatively easily to a part having a complicated shape, and is an industrially promising method. Such coating methods have been widely studied for tin oxide based materials.

【0008】従来より検討されている酸化スズ系材料
は、主としてスズ及びアンチモンを共にイオンとして含
有する有機或いは無機化合物の塩溶液である。従って、
有機化合物の塩溶液の使用時には、有機物の残存がない
ように注意深く熱分解を行わなければならず、スズ及び
アンチモンが有機塩として気散したり、溶液の極性が低
くガラス等の基板とのなじみがなく均一な膜を得ること
ができなかった。
[0008] Tin oxide-based materials which have been studied so far are mainly salt solutions of organic or inorganic compounds containing both tin and antimony as ions. Therefore,
When using a salt solution of an organic compound, thermal decomposition must be carried out carefully so that no organic matter remains, and tin and antimony are diffused as organic salts, and the polarity of the solution is low and the solution is compatible with substrates such as glass. No uniform film could be obtained.

【0009】また、有機塩の液安定性を保つために安定
化材を多く必要とする結果、薄い膜厚のものしか得られ
ず、且つ有機物含量が多いために乾燥後に多層ディップ
を行っても焼成時に剥離する等の問題があった。
Further, as a result of requiring a large amount of a stabilizing agent to maintain the liquid stability of the organic salt, only a thin film having a small film thickness is obtained, and a multi-layer dip is carried out after drying because of a large amount of an organic substance. There were problems such as peeling during firing.

【0010】さらに熱分解時に生成する酸化スズ・アン
チモンは一般に粒子径が粗く、特に均一微細性が要求さ
れる分野への適用については問題があった。かかる問題
を解決する技術として、特開昭62−223019号及
び同62−278705号には、製造方法の工夫により
製造された結晶質酸化スズゾルを用いる方法が開示され
ている。
Furthermore, tin oxide / antimony produced during thermal decomposition generally has a coarse particle size, and there is a problem in particular when applied to a field where uniform fineness is required. As a technique for solving such a problem, JP-A-62-223019 and JP-A-62-278705 disclose a method using a crystalline tin oxide sol produced by devising a production method.

【0011】しかしこれらの技術では、ゾル溶液が着色
していたり、結晶質であるためにゾルを塗布した時の表
面の平滑性が損なわれたり、また一度焼成しなければ高
い導電性を発現しない等の問題点を有していた。
However, according to these techniques, the sol solution is colored, the surface smoothness is deteriorated when the sol is applied because the sol solution is crystalline, and high conductivity is not exhibited unless fired once. And so on.

【0012】[0012]

【発明が解決しようとする課題】そこで本発明の課題
は、着色が無く、導電性が良好である透明導電材料の用
途に適した非晶質酸化スズゾル及びその製造方法を提供
することにある。
SUMMARY OF THE INVENTION An object of the present invention is to provide an amorphous tin oxide sol suitable for use as a transparent conductive material which is free from coloring and has good conductivity, and a method for producing the same.

【0013】[0013]

【課題を解決するための手段】本発明の上記課題は、 1.導電性が10Ωcm未満の非晶質酸化スズ粒子を
含むことを特徴とする非晶質酸化スズゾル、
The above objects of the present invention are as follows. Amorphous tin oxide sol, comprising amorphous tin oxide particles having a conductivity of less than 10 5 Ωcm,

【0014】2.加熱処理により200℃から500℃
の範囲で重量減少を0.1wt%(重量%。本明細書に
おいて全て同じ。)以上30wt%未満生じる酸化スズ
を含むことを特徴とする非晶質酸化スズゾル、
2. 200 ℃ to 500 ℃ by heat treatment
An amorphous tin oxide sol comprising tin oxide which causes a weight loss of 0.1 wt% (wt%; the same applies to all in the present specification) in the range of not more than 30 wt%.

【0015】3.少なくとも0.001wt%以上の陰
イオンを含む酸化スズを含むことを特徴とする非晶質酸
化スズゾル、
3. An amorphous tin oxide sol comprising tin oxide containing at least 0.001 wt% or more of an anion;

【0016】4.加水分解性スズ化合物を加水分解処理
し洗浄後、得られたハロゲン濃度が0.001%以上3
%以下の原料をアンモニア水に溶解して加熱処理を行う
ことを特徴とする非晶質酸化スズゾルの製造方法、
4. After the hydrolyzable tin compound is hydrolyzed and washed, the obtained halogen concentration is 0.001% or more 3
% Or less of the raw material is dissolved in aqueous ammonia and subjected to a heat treatment.

【0017】5.加水分解性スズ化合物とフッ素を含む
化合物とを用いて加水分解処理し洗浄後、得られたハロ
ゲン濃度が0.001%以上3%以下の原料をアンモニ
ア水に溶解して加熱処理を行うことを特徴とする非晶質
酸化スズゾルの製造方法、により達成される。
5. After hydrolyzing with a hydrolyzable tin compound and a compound containing fluorine and washing, the obtained raw material having a halogen concentration of 0.001% or more and 3% or less is dissolved in aqueous ammonia to perform heat treatment. This is achieved by a method for producing an amorphous tin oxide sol.

【0018】[0018]

【発明の実施の形態】以下、本発明の詳細について説明
する。先ず、本発明において非晶質とは、結晶質とは異
なる物質を意味する。結晶質とは、電気・電子工学大系
72巻、結晶の評価(伊藤 次、犬塚直夫、コロナ社、
1982年)第4頁に記載されているように、原子の配
列に長距離秩序があり、その物質に固相の融点があるこ
とが特徴である。例えば、高純度で無色透明な結晶性の
酸化スズであれば、正方晶系ルチル型構造であり、屈折
率1.9968、電気伝導性は室温で10Ωcm以上
の高抵抗を示すことが知られている。また融点は112
7℃であり、結晶性酸化スズであればこの温度まで熱的
に安定である。故に、一般に非晶質酸化スズとは、以上
の性質を示さない物質であり、 原子の配列に長距離秩序がない、 結晶性酸化スズの融点以下に、物質の変化を示す温度
領域が存在する、 酸化スズといえる。
DESCRIPTION OF THE PREFERRED EMBODIMENTS The details of the present invention will be described below. First, in the present invention, amorphous means a substance different from crystalline. Crystallinity refers to the 72nd volume of Electrical and Electronics Engineering, Crystal Evaluation (Tsuji Ito, Nao Inuzuka, Corona,
As described on page 4 of 1982), the arrangement of atoms has a long-range order and the substance has a solid-state melting point. For example, it is known that high purity, colorless and transparent crystalline tin oxide has a tetragonal rutile structure, a refractive index of 1.9968, and a high electrical conductivity of at least 10 6 Ωcm at room temperature. Have been. The melting point is 112
The temperature is 7 ° C., and crystalline tin oxide is thermally stable up to this temperature. Therefore, in general, amorphous tin oxide is a substance that does not exhibit the above properties, there is no long-range order in the arrangement of atoms, and there is a temperature region that shows a change in the substance below the melting point of crystalline tin oxide. It can be called tin oxide.

【0019】については、X線回折によりその構造を
同定することが可能であり、新版カリティX線回折要論
(松村源太郎訳、アグネ社、1977年)に記載された
結晶子サイズの測定から長距離秩序のおおよその値を知
ることができる。例えば、酸化スズの(110)面の面
間隔はおおよそ0.33nmであり、結晶性酸化スズな
らば数10個以上の繰り返し単位がなければならず、結
晶子測定を行えば、10数nmの値が観測される。従っ
て、結晶子測定において10nm未満であれば、もはや
長距離秩序があるとはいえず、非晶質と思われる。5n
m未満であれば、もはや繰り返し単位を仮定すれば10
個以下となり結晶ではない。
Regarding the structure, it is possible to identify its structure by X-ray diffraction. From the measurement of the crystallite size described in the new edition of Karity X-ray Diffraction (Translated by Gentaro Matsumura, Agne, 1977), the length can be determined. You can know the approximate value of the distance order. For example, the spacing between the (110) planes of tin oxide is approximately 0.33 nm, and crystalline tin oxide must have several tens or more repeating units. Values are observed. Therefore, if it is less than 10 nm in the crystallite measurement, it cannot be said that there is any longer-range order, and it is considered to be amorphous. 5n
m, it is 10 if the repeating unit is no longer assumed.
It is less than the number of crystals and is not a crystal.

【0020】については、固体の熱分析を行えば容易
に明らかとなり、測定条件の影響、試料サイズの影響を
考慮しても1000℃未満で熱的な変化が生じるならば
結晶とは言い難い。熱的な変化で容易に観測できるのは
熱重量分析であり、200℃での重量を測定開始重量と
して重量減少を融点よりはるかに低い500℃までの温
度領域で0.1wt%以上生じるならば単結晶酸化スズ
ではない。以上のように上記もしくはを満たす酸化
スズの場合には明らかに非晶質である。
The fact that the thermal analysis of a solid is made clear becomes easy, and even if the effects of the measurement conditions and the size of the sample are taken into consideration, if a thermal change occurs below 1000 ° C., it cannot be said that the crystal is a crystal. A thermogravimetric analysis that can be easily observed by a thermal change is a thermogravimetric analysis, in which the weight loss at 200 ° C. is 0.1 wt% or more in the temperature range up to 500 ° C., which is much lower than the melting point, and is much lower than the melting point. Not a single crystal tin oxide. As described above, in the case of tin oxide satisfying or satisfying the above conditions, it is clearly amorphous.

【0021】次に導電性については、酸化スズ粒子の導
電性を意味し、その測定方法については、正確に導電性
が評価できる限りいかなる方法でもよい。以下に測定例
を示すが、本発明に制限を加えるものではない。
Next, the conductivity means the conductivity of the tin oxide particles, and any measuring method may be used as long as the conductivity can be accurately evaluated. The measurement examples are shown below, but do not limit the present invention.

【0022】石英板に酸化スズ薄膜を形成し、200℃
空気中で処理を行う。室温25℃で薄膜の膜厚を測定
後、四端子法にて抵抗を測定し、この抵抗値と膜厚から
体積固有抵抗を求める。このような方法で求めた体積固
有抵抗が10 −2Ωcm以上10Ωcm未満を示す酸
化スズ粒子を含むゾルが本発明の酸化スズゾルである。
A thin film of tin oxide is formed on a quartz plate at 200 ° C.
Perform the treatment in air. Measure thickness of thin film at room temperature 25 ℃
Then, the resistance was measured by the four-terminal method, and from this resistance value and the film thickness,
Find the volume resistivity. The volume solid determined by such a method
Resistance is 10 -2Ωcm or more 105Acid showing less than Ωcm
The sol containing tin oxide particles is the tin oxide sol of the present invention.

【0023】加熱処理による重量減少については、一般
に用いられる熱重量分析で測定した値を意味する。昇温
速度は30℃/分以下が好ましく、さらに好ましくは1
0℃/分以下で測定し、200℃から500℃の範囲で
重量減少を0.1wt%以上30wt%未満生じる酸化
スズを含むゾルである。
The weight loss by the heat treatment means a value measured by a thermogravimetric analysis generally used. The heating rate is preferably 30 ° C./min or less, more preferably 1 ° C./min.
It is a sol containing tin oxide, which is measured at a temperature of 0 ° C./min or less and causes a weight loss of 0.1 wt% or more and less than 30 wt% in a range of 200 ° C. to 500 ° C.

【0024】本発明のゾルを200℃まで、空気中もし
くは、N やArなどの非酸化性雰囲気で加熱すると、
非晶質酸化スズとなる。結晶性酸化スズであれば、続い
て行う200℃以上の処理で熱的な変化を伴わない。非
晶質酸化スズであれば0.1wt%以上の重量減少を示
す。この重量減少量と導電性の関係は、明らかではない
が、本発明者らは重量減少を示す酸化スズ粒子が導電性
を有することを発見し、本発明に至った。
The sol of the present invention is heated up to 200 ° C. in air.
Or N 2When heated in a non-oxidizing atmosphere such as Ar or Ar,
It becomes amorphous tin oxide. If it is crystalline tin oxide,
And no thermal change in the treatment at 200 ° C. or higher. Non
Amorphous tin oxide shows weight loss of 0.1 wt% or more
You. The relationship between this weight loss and conductivity is not clear
However, the present inventors found that tin oxide particles showing weight loss
Have been found, leading to the present invention.

【0025】不純物イオンについては、アンモニウムイ
オン、水素イオンなどの陽イオンや次に述べる陰イオン
など存在していると良好な結果を示す。
Good results are obtained when impurity ions such as cations such as ammonium ions and hydrogen ions and anions described below are present.

【0026】陰イオンについては、特にその存在を規定
しないが、有機イオン、無機イオンなんでも存在してい
た方が高い導電性を示す。特に好ましいのは、カルボン
酸基もしくはスルホン酸基、アミノ基、水酸基を含むイ
オン、炭酸イオンとハロゲンイオンである。これらのイ
オンは、非晶質酸化スズ粒子の内部に存在していても、
外部もしくは内部と外部の両者に存在していてもいずれ
でもよい。但し、存在する量については、表面等の外部
については、粒子に対して30wt%以上存在するとゾ
ルの安定性に問題が生じるので好ましくなく、30wt
%未満が好ましく、より好ましくは10wt%未満、特
に好ましくは6wt%未満がゾルにした時の安定性がよ
いことから選ばれる。粒子内部に存在する陰イオンにつ
いては、ゾルの安定性に影響がないのでその量を規定し
ないが、好ましくは0.001wt%以上6wt%未満
である。
The presence of anions is not particularly defined, but the presence of any organic or inorganic ions shows higher conductivity. Particularly preferred are an ion containing a carboxylic acid group or a sulfonic acid group, an amino group, a hydroxyl group, a carbonate ion and a halogen ion. Even if these ions exist inside the amorphous tin oxide particles,
It may be present outside or both inside and outside. However, as for the amount present, it is not preferable that the amount of the external component such as the surface is 30 wt% or more with respect to the particle because a problem occurs in the stability of the sol.
% Is preferred, more preferably less than 10 wt%, particularly preferably less than 6 wt% is selected because of good stability when formed into a sol. The amount of the anion present inside the particle is not specified because it does not affect the stability of the sol, but is preferably 0.001% by weight or more and less than 6% by weight.

【0027】これらの酸化スズゾルの製造方法として
は、特に制限はなく、請求項4に示す方法、即ち、加水
分解性スズ化合物を加水分解処理し洗浄後、得られたハ
ロゲン濃度が0.001%以上3%以下の原料をアンモ
ニア水に溶解して加熱処理を行う方法、請求項5に示す
方法、即ち、加水分解性スズ化合物とフッ素を含む化合
物とを用いて加水分解処理し洗浄後、得られたハロゲン
濃度が0.001%以上3%以下の原料をアンモニア水
に溶解して加熱処理を行う方法、等のいずれの方法でも
よい。
The method for producing these tin oxide sols is not particularly limited, and the method described in claim 4, that is, after the hydrolyzable tin compound is hydrolyzed and washed, the obtained halogen concentration is 0.001% A method in which at least 3% or less of the raw material is dissolved in ammonia water and subjected to a heat treatment, the method according to claim 5, that is, a hydrolysis treatment using a hydrolyzable tin compound and a compound containing fluorine, followed by washing. Any method may be used, such as a method in which a raw material having a halogen concentration of 0.001% or more and 3% or less is dissolved in aqueous ammonia and subjected to heat treatment.

【0028】本発明の製造方法において、全体の製造工
程でSnを含む化合物にかかる温度条件が重要であり、
高温度の熱処理を伴う方法は、一次粒子の成長や、結晶
性が高くなる現象を生じるので好ましくなく、熱処理を
行う必要がある時には、450℃以下、特に300℃以
下、好ましくは200℃以下、より好ましくは150℃
以下とする。しかし、25℃から150℃までの加温
は、好適に選ばれる手段である。
In the production method of the present invention, the temperature condition of the compound containing Sn in the entire production process is important,
The method involving a high-temperature heat treatment is not preferable because it causes the growth of primary particles and a phenomenon that the crystallinity increases, and when heat treatment needs to be performed, it is 450 ° C. or less, particularly 300 ° C. or less, preferably 200 ° C. or less, More preferably 150 ° C
The following is assumed. However, heating from 25 ° C to 150 ° C is a preferred means.

【0029】また、製造工程は、加水分解性スズ化合物
を加水分解処理する工程と、得られた沈殿物の洗浄工程
を経てゾル化する工程の3工程からなる。各工程がさら
に細分化された工程をとることに本発明は制限を加えな
い。例えば、加水分解工程は、原料を計量する工程と投
入する工程、加水分解するために加えられる成分との混
合工程、加熱工程等で構成されるが、どのような構成を
とっても加水分解工程ならばこれを制限しない。また洗
浄工程では、固液分離工程を伴うが、その方法もデカン
テーション、限外濾過等、適当な濾過器を用いる方法
等、いかなる方法でもよい。ゾル化も同様であり、粒子
を安定に分散するために加えられる添加剤、溶媒等は制
限されないが、アンモニア水によるゾルの安定化が経済
性の点で好ましい。
The production process includes three processes: a process of hydrolyzing the hydrolyzable tin compound and a process of converting the obtained precipitate into a sol through a washing process. The present invention does not limit that each step takes a more subdivided step. For example, the hydrolysis step is composed of a step of measuring and charging the raw materials, a step of mixing with components added for hydrolysis, a heating step, and the like. Do not limit this. The washing step involves a solid-liquid separation step, and the method may be any method such as a method using an appropriate filter such as decantation or ultrafiltration. The same applies to the formation of a sol. An additive, a solvent, and the like added for stably dispersing the particles are not limited, but stabilization of the sol with ammonia water is preferable in terms of economy.

【0030】請求項4に示す製造方法に用いられる化合
物について以下に述べる。加水分解性スズ化合物とは、
SnO・3HOのようなオキソ陰イオンを含む
化合物、SnCl、SnCl・5HOのような水
溶性ハロゲン化物、R′SnR、RSnX、R
SnX[R′は脂肪族もしくは芳香族有機化合物、、
Rは脂肪族もしくは芳香族有機化合物、Xはハロゲンを
示す。]の構造を有する化合物、例えば(CH
nCl・(ピリジン)、(CSn(OCC
等の有機金属化合物、Sn(SO・2
O等のオキソ塩を挙げることができる。
The compounds used in the production method according to claim 4 will be described below. What is a hydrolyzable tin compound?
K 2 SnO 3 · 3H 2 compounds containing oxo anions such as O, SnCl 4, water-soluble halides, such as SnCl 4 · 5H 2 O, R '2 SnR 2, R 3 SnX, R 2
SnX 2 [R ′ is an aliphatic or aromatic organic compound,
R represents an aliphatic or aromatic organic compound, and X represents a halogen. Having a structure of, for example, (CH 3 ) 3 S
nCl · (pyridine), (C 4 H 9 ) 2 Sn (O 2 CC
2 H 5) organometallic compounds such as 2, Sn (SO 4) 2 · 2
Oxo salts such as H 2 O can be mentioned.

【0031】加水分解性スズ化合物の溶媒中における分
解反応から製造する方法においては、プロセスの途中で
溶媒に可溶なSn以外の元素を含む化合物の添加も可能
である。例えば、溶媒に可溶なフッ素含有化合物の添加
や、炭酸塩の添加である。溶媒に可溶なフッ素含有化合
物とは、イオン性フッ化物もしくは共有性フッ化物のい
ずれでもよく、例えば、HFもしくはKHF、SbF
、MoF等の金属フッ化物、NHMnF、NH
BiF等のフルオロ錯陰イオンを生成する化合物、
BrF、SF、SF等の無機分子性フッ化物、C
I、CFOOH、P(CF等の有機フッ素
化合物を挙げることができるが、溶媒が水の場合にはC
aFと硫酸との組み合わせのようにフッ素含有化合物
と不揮発性酸との組み合わせも用いることができる。
In the method for producing a hydrolyzable tin compound from a decomposition reaction in a solvent, a compound containing an element other than Sn that is soluble in the solvent can be added during the process. For example, addition of a fluorine-containing compound soluble in a solvent or addition of a carbonate. The fluorine-containing compound soluble in the solvent may be either ionic fluoride or covalent fluoride, for example, HF or KHF 2 , SbF
3 , metal fluoride such as MoF 6 , NH 4 MnF 3 , NH
A compound that generates a fluoro complex anion such as 4 BiF 4 ;
Inorganic molecular fluorides such as BrF 3 , SF 4 and SF 6 , C
Organic fluorine compounds such as F 3 I, CF 3 OOH, and P (CF 3 ) 3 can be mentioned.
A combination of a fluorine-containing compound and a nonvolatile acid such as a combination of aF 2 and sulfuric acid can also be used.

【0032】以上の製造方法において、洗浄プロセスを
途中に用いてもよい。洗浄プロセスを用いることによ
り、ゾルに含まれるイオンの量を制御することが可能で
ある。洗浄方法は、特に限定されないが、例えば、デカ
ンテーションによる方法、限外濾過膜による方法などが
挙げられる。
In the above manufacturing method, a cleaning process may be used in the middle. By using a cleaning process, it is possible to control the amount of ions contained in the sol. The washing method is not particularly limited, and examples thereof include a method using decantation and a method using an ultrafiltration membrane.

【0033】[0033]

【実施例】以下、本発明の実施例について説明する。 実施例1 塩化第二スズ45gを炭酸ガスを含んでいる30℃の水
2000mlに溶解し均一溶液を得た。次いでこれを2
時間煮沸し共沈殿物を得た。生成した沈殿物をデカンテ
ーションにより取り出し、蒸留水にて沈殿を10回水洗
する。蒸留水1000ml添加し、全量を2000ml
とする。さらに30%アンモニア水を40ml加え、水
浴中で100℃に加温し、無色透明なゾル溶液を得た。
このゾル溶液へ石英板をディップして乾燥する。この操
作を100回繰り返し石英板上に酸化スズ薄膜を形成し
た。この石英板を空気中150℃2時間処理した試料に
ついて四端子法にて体積固有抵抗を測定したところ、7
×10Ωcmであった。ゾル溶液をスプレードライ装
置を用いて乾燥しゾル溶液から粉末を取り出した。この
粉末を用いて粉末X線回折により(100)面の結晶子
測定を行ったところ、2.1nmと求められ非晶質粉末
であることを確認した。また、この粉末の熱重量分析を
10℃/分の昇温速度で行ったところ、200℃まで緩
やかに重量減少を1.0wt%示した後、200℃から
500℃までに2.5wt%の重量減少を示した。
Embodiments of the present invention will be described below. Example 1 45 g of stannic chloride was dissolved in 2000 ml of 30 ° C. water containing carbon dioxide to obtain a homogeneous solution. Then this is 2
Boil for an hour to obtain a coprecipitate. The formed precipitate is taken out by decantation, and the precipitate is washed with distilled water 10 times. Add 1000 ml of distilled water, and add 2000 ml
And Further, 40 ml of 30% aqueous ammonia was added, and the mixture was heated to 100 ° C. in a water bath to obtain a colorless and transparent sol solution.
A quartz plate is dipped in this sol solution and dried. This operation was repeated 100 times to form a tin oxide thin film on the quartz plate. The volume resistivity of the sample obtained by treating this quartz plate in air at 150 ° C. for 2 hours was measured by the four probe method.
× 10 4 Ωcm. The sol solution was dried using a spray drying device, and powder was taken out of the sol solution. Using this powder, a crystallite measurement on the (100) plane was performed by powder X-ray diffraction, and it was found to be 2.1 nm, confirming that the powder was an amorphous powder. The thermogravimetric analysis of this powder was performed at a temperature rising rate of 10 ° C./min. After a gradual decrease in weight of 1.0 wt% up to 200 ° C., a 2.5 wt% increase from 200 ° C. to 500 ° C. Showed weight loss.

【0034】比較例1 塩化第二スズ水和物65gを蒸留水2000mlに10
0℃で溶解し均一溶液を得た。次いでこれを煮沸し共沈
殿物を得た。生成した沈殿物をデカンテーションにより
取り出し、蒸留水にて沈殿を40回水洗する。沈殿を洗
浄した蒸留水中に硝酸銀を滴下し、塩素イオンの反応が
無いことを確認後、蒸留水1000ml添加し全量を2
000mlとする。さらに30%アンモニア水を40m
l加え、水浴中で100℃に加温し、コロイド状ゲル分
散液を得た。できたゾル溶液は、無色透明であった。実
施例1と同様の方法により石英板上に薄膜を形成した
後、四端子法にて体積固有抵抗を測定したところ、2.
1×10Ωcmであった。また、結晶子測定を行った
ところ、3.1nmと測定された。
Comparative Example 1 65 g of stannic chloride hydrate was added to 2000 ml of distilled water
It was dissolved at 0 ° C. to obtain a homogeneous solution. Then, this was boiled to obtain a coprecipitate. The generated precipitate is taken out by decantation, and the precipitate is washed with distilled water 40 times. Silver nitrate was dropped into distilled water from which the precipitate had been washed, and after confirming that there was no reaction of chloride ions, 1000 ml of distilled water was added to reduce the total amount to 2 ml.
000 ml. In addition, 40% of 30% ammonia water
and heated to 100 ° C. in a water bath to obtain a colloidal gel dispersion. The resulting sol solution was colorless and transparent. After forming a thin film on a quartz plate in the same manner as in Example 1, the volume resistivity was measured by a four-terminal method.
It was 1 × 10 5 Ωcm. Further, when the crystallite measurement was performed, it was measured to be 3.1 nm.

【0035】比較例2 塩化第二スズ水和物65gを30℃の蒸留水2000m
lに溶解し均一溶液を得た。次いでこれを煮沸し共沈殿
物を得た。生成した沈殿物をデカンテーションにより取
り出し、蒸留水にて沈殿を40回水洗する。水洗後80
0℃の筒状の電気炉の中へスプレーし粉末を取り出し
た。この粉末を2000mlの水中に分散し、30%ア
ンモニア水を40ml加え、水浴中で100℃に加温
し、コロイド状ゲル分散液を得た。できたゾル溶液はや
や白濁していた。実施例1と同様の方法により、石英板
上に薄膜を形成した後、四端子法にて体積固有抵抗を測
定したところ、7.1×10Ωcmであった。また、
結晶子測定を行ったところ、30.5nmと測定され
た。
COMPARATIVE EXAMPLE 2 65 g of stannic chloride hydrate was mixed with 2,000 m of distilled water at 30.degree.
to obtain a homogeneous solution. Then, this was boiled to obtain a coprecipitate. The generated precipitate is taken out by decantation, and the precipitate is washed with distilled water 40 times. 80 after washing
The powder was taken out by spraying into a cylindrical electric furnace at 0 ° C. This powder was dispersed in 2000 ml of water, 40 ml of 30% aqueous ammonia was added, and the mixture was heated to 100 ° C. in a water bath to obtain a colloidal gel dispersion. The resulting sol solution was slightly cloudy. After a thin film was formed on a quartz plate by the same method as in Example 1, the volume resistivity was measured by a four-terminal method, and it was 7.1 × 10 6 Ωcm. Also,
When the crystallite measurement was performed, it was measured to be 30.5 nm.

【0036】以上、実施例1と比較例1及び比較例2と
から、僅かな製造条件の違いで得られる酸化スズの体積
固有抵抗が異なることが明らかである。
As described above, it is apparent from Example 1 and Comparative Examples 1 and 2 that the tin oxide obtained has a small volume resistivity due to a slight difference in production conditions.

【0037】実施例2 塩化第二スズ45gを50℃の蒸留水2000mlに溶
解し均一溶液を得た。次いでこれを2時間煮沸し共沈殿
物を得た。生成した沈殿物をデカンテーションにより取
り出し、蒸留水にて沈殿を8回水洗する。蒸留水100
0ml添加し全量を2000mlとする。さらに30%
アンモニア水を40ml加え、水浴中で100℃に加温
し、無色透明なゾル溶液を得た。イオンクロマトグラフ
ィーを用いて、ゾル溶液に含まれる塩素イオン濃度を求
めたところ、0.008wt%塩素イオンが含まれてい
た。実施例1と同様に石英板上にこのゾル溶液を用いて
薄膜を形成し、熱処理後の体積固有抵抗を求めたとこ
ろ、9.5×10Ωcmであった。また、実施例1と
同様に結晶子測定を行ったところ、2.7nmであっ
た。
Example 2 45 g of stannic chloride was dissolved in 2000 ml of distilled water at 50 ° C. to obtain a homogeneous solution. Then, the mixture was boiled for 2 hours to obtain a coprecipitate. The formed precipitate is taken out by decantation, and the precipitate is washed with distilled water eight times. Distilled water 100
Add 0 ml to make the total volume 2000 ml. 30% more
40 ml of aqueous ammonia was added, and the mixture was heated to 100 ° C. in a water bath to obtain a colorless and transparent sol solution. When the concentration of chloride ions contained in the sol solution was determined using ion chromatography, it was found to contain 0.008 wt% chloride ions. A thin film was formed using this sol solution on a quartz plate in the same manner as in Example 1, and the volume resistivity after heat treatment was determined to be 9.5 × 10 4 Ωcm. Further, the crystallite measurement was performed in the same manner as in Example 1, and it was 2.7 nm.

【0038】実施例3 塩化第二スズ45gを40℃の蒸留水2000mlに溶
解し均一溶液を得た。次いでこれを2時間煮沸し共沈殿
物を得た。生成した沈殿物をデカンテーションにより取
り出し、蒸留水にて沈殿を7回水洗する。蒸留水100
0ml添加し全量を2000mlとする。さらに30%
アンモニア水を40ml加え、水浴中で100℃に加温
し、無色透明なゾル溶液を得た。イオンクロマトグラフ
ィーを用いて、ゾル溶液に含まれる塩素イオン濃度を求
めたところ、0.016wt%塩素イオンが含まれてい
た。実施例1と同様に石英板上にこのゾル溶液を用いて
薄膜を形成し、熱処理後の体積固有抵抗を求めたとこ
ろ、9.5×10Ωcmであった。また、実施例1と
同様に結晶子測定を行ったところ、2.2nmであっ
た。
Example 3 45 g of stannic chloride was dissolved in 2000 ml of distilled water at 40 ° C. to obtain a homogeneous solution. Then, the mixture was boiled for 2 hours to obtain a coprecipitate. The formed precipitate is taken out by decantation, and the precipitate is washed with distilled water seven times. Distilled water 100
Add 0 ml to make the total volume 2000 ml. 30% more
40 ml of aqueous ammonia was added, and the mixture was heated to 100 ° C. in a water bath to obtain a colorless and transparent sol solution. When the concentration of chloride ions contained in the sol solution was determined using ion chromatography, it was found to contain 0.016 wt% chloride ions. A thin film was formed using this sol solution on a quartz plate in the same manner as in Example 1, and the volume resistivity after heat treatment was determined to be 9.5 × 10 4 Ωcm. Further, the crystallite measurement was performed in the same manner as in Example 1, and it was 2.2 nm.

【0039】実施例4 塩化第二スズ45gとKTiFを5gとを30℃の
蒸留水2000mlに溶解し均一溶液を得た。次いでこ
れを2時間煮沸し共沈殿物を得た。生成した沈殿物をデ
カンテーションにより取り出し、蒸留水にて沈殿を8回
水洗する。蒸留水1000ml添加し全量を2000m
lとする。さらに30%アンモニア水を40ml加え、
水浴中で100℃に加温し、無色透明なゾル溶液を得
た。イオンクロマトグラフィーを用いて、ゾル溶液に含
まれる塩素イオン濃度を求めたところ、0.008wt
%塩素イオンが含まれていた。実施例1と同様に石英板
上にこのゾル溶液を用いて薄膜を形成し、熱処理後の体
積固有抵抗を求めたところ、1.5×10Ωcmであ
った。また、実施例1と同様に結晶子測定を行ったとこ
ろ、2.4nmであった。
Example 4 45 g of stannic chloride and 5 g of K 2 TiF 6 were dissolved in 2000 ml of distilled water at 30 ° C. to obtain a homogeneous solution. Then, the mixture was boiled for 2 hours to obtain a coprecipitate. The formed precipitate is taken out by decantation, and the precipitate is washed with distilled water eight times. 1000 ml of distilled water is added and the total amount is 2000 m
l. Further, add 40 ml of 30% ammonia water,
The mixture was heated to 100 ° C. in a water bath to obtain a colorless and transparent sol solution. When the chlorine ion concentration contained in the sol solution was determined using ion chromatography, the concentration was 0.008 wt.
% Chloride ions. A thin film was formed on a quartz plate using this sol solution in the same manner as in Example 1, and the volume resistivity after heat treatment was 1.5 × 10 4 Ωcm. Further, the crystallite measurement was performed in the same manner as in Example 1, and it was 2.4 nm.

【0040】実施例5 塩化第二スズ45gとKF5gとを30℃の蒸留水20
00mlに溶解し均一溶液を得た。次いでこれを2時間
煮沸し共沈殿物を得た。生成した沈殿物をデカンテーシ
ョンにより取り出し、蒸留水にて沈殿を8回水洗する。
蒸留水1000ml添加し全量を2000mlとする。
さらに30%アンモニア水を40ml加え、水浴中で1
00℃に加温し、無色透明なゾル溶液を得た。イオンク
ロマトグラフィーを用いて、ゾル溶液に含まれる塩素イ
オン濃度を求めたところ、0.008wt%塩素イオン
が含まれていた。実施例1と同様に石英板上にこのゾル
溶液を用いて薄膜を形成し、熱処理後の体積固有抵抗を
求めたところ、6.5×10Ωcmであった。また、
実施例1と同様に結晶子測定を行ったところ、2.1n
mであった。
Example 5 45 g of stannic chloride and 5 g of KF were mixed with distilled water at 30 ° C.
The solution was dissolved in 00 ml to obtain a homogeneous solution. Then, the mixture was boiled for 2 hours to obtain a coprecipitate. The formed precipitate is taken out by decantation, and the precipitate is washed with distilled water eight times.
Add 1000 ml of distilled water to make the total volume 2000 ml.
Further, 40 ml of 30% ammonia water was added, and 1 ml was added in a water bath.
The mixture was heated to 00 ° C. to obtain a colorless and transparent sol solution. When the concentration of chloride ions contained in the sol solution was determined using ion chromatography, it was found to contain 0.008 wt% chloride ions. A thin film was formed on a quartz plate using this sol solution in the same manner as in Example 1, and the volume resistivity after the heat treatment was determined to be 6.5 × 10 3 Ωcm. Also,
The crystallite measurement was performed in the same manner as in Example 1.
m.

【0041】比較例3 塩化第二スズ水和物65gと三塩化アンチモン1.0g
を30℃の水/エタノール混合溶液2000mlに溶解
し均一溶液を得た。次いでこれを2時間煮沸し共沈殿物
を得た。生成した沈殿物をデカンテーションにより取り
出し、蒸留水にて沈殿を40回水洗する。沈殿を洗浄し
た蒸留水中に硝酸銀を滴下し、塩素イオンの反応が無い
ことを確認後、蒸留水1000ml添加し全量を200
0mlとする。さらに30%アンモニア水を40ml加
え、水浴中で100℃に加温し、コロイド状ゲル分散液
を得た。やや赤みを帯びたゾル溶液が得られた。
Comparative Example 3 65 g of stannic chloride hydrate and 1.0 g of antimony trichloride
Was dissolved in 2000 ml of a 30 ° C. water / ethanol mixed solution to obtain a homogeneous solution. Then, the mixture was boiled for 2 hours to obtain a coprecipitate. The generated precipitate is taken out by decantation, and the precipitate is washed with distilled water 40 times. Silver nitrate was dropped into distilled water from which the precipitate was washed, and after confirming that there was no reaction of chloride ions, 1000 ml of distilled water was added and the total amount was 200.
Make it 0 ml. Further, 40 ml of 30% aqueous ammonia was added, and the mixture was heated to 100 ° C. in a water bath to obtain a colloidal gel dispersion. A slightly reddish sol solution was obtained.

【0042】以上、実施例2、実施例3、実施例4、実
施例5と比較例3との比較より、本発明は着色の無い、
導電性の良好な酸化スズゾルを製造することが可能であ
る。
As described above, from the comparison between Example 2, Example 3, Example 4, Example 5, and Comparative Example 3, the present invention has no coloring.
It is possible to produce a tin oxide sol having good conductivity.

【0043】[0043]

【発明の効果】本発明によれば、着色が無く、導電性が
良好である透明導電材料の用途に適した非晶質酸化スズ
ゾル及びその製造方法を提供することができる。
According to the present invention, it is possible to provide an amorphous tin oxide sol suitable for use as a transparent conductive material which is free from coloring and has good conductivity, and a method for producing the same.

───────────────────────────────────────────────────── フロントページの続き (72)発明者 有本 直 東京都日野市さくら町1番地 コニカ株式 会社内 (72)発明者 酒崎 隆弘 大阪府大阪市淀川区十八条2丁目18番35号 山中化学工業株式会社内 (72)発明者 椿原 ▲ヨシ▼博 大阪府大阪市淀川区十八条2丁目18番35号 山中化学工業株式会社内 ──────────────────────────────────────────────────続 き Continuing on the front page (72) Inventor Nao Arimoto 1 Sakuramachi, Hino-shi, Tokyo Konica Corporation (72) Inventor Takahiro Sakazaki 2-18-35, 18-835, 18-8, Yodogawa-ku, Osaka-shi, Osaka Inside Yamanaka Chemical Co., Ltd.

Claims (5)

【特許請求の範囲】[Claims] 【請求項1】導電性が10Ωcm未満の非晶質酸化ス
ズ粒子を含むことを特徴とする非晶質酸化スズゾル。
1. An amorphous tin oxide sol comprising amorphous tin oxide particles having a conductivity of less than 10 5 Ωcm.
【請求項2】加熱処理により200℃から500℃の範
囲で重量減少を0.1wt%以上30wt%未満生じる
酸化スズを含むことを特徴とする非晶質酸化スズゾル。
2. An amorphous tin oxide sol comprising tin oxide which causes a weight loss of from 0.1 wt% to less than 30 wt% in the range of 200 ° C. to 500 ° C. by heat treatment.
【請求項3】少なくとも0.001wt%以上の陰イオ
ンを含む酸化スズを含むことを特徴とする非晶質酸化ス
ズゾル。
3. An amorphous tin oxide sol comprising tin oxide containing at least 0.001 wt% or more of anions.
【請求項4】加水分解性スズ化合物を加水分解処理し洗
浄後、得られたハロゲン濃度が0.001%以上3%以
下の原料をアンモニア水に溶解して加熱処理を行うこと
を特徴とする非晶質酸化スズゾルの製造方法。
4. A method comprising subjecting a hydrolyzable tin compound to hydrolysis treatment and washing, dissolving a raw material having a halogen concentration of 0.001% or more and 3% or less in ammonia water, and performing heat treatment. A method for producing an amorphous tin oxide sol.
【請求項5】加水分解性スズ化合物とフッ素を含む化合
物とを用いて加水分解処理し洗浄後、得られたハロゲン
濃度が0.001%以上3%以下の原料をアンモニア水
に溶解して加熱処理を行うことを特徴とする非晶質酸化
スズゾルの製造方法。
5. A hydrolysis treatment using a hydrolyzable tin compound and a compound containing fluorine, followed by washing. Then, the obtained raw material having a halogen concentration of 0.001% to 3% is dissolved in aqueous ammonia and heated. A method for producing an amorphous tin oxide sol, comprising performing a treatment.
JP22931996A 1996-08-12 1996-08-12 Method for producing amorphous tin oxide sol Expired - Fee Related JP3821883B2 (en)

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Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
WO2005114674A1 (en) * 2004-05-21 2005-12-01 Tdk Corporation Transparent conductive material, transparent conductive paste, transparent conductive film and transparent electrode
EP1630609A1 (en) 2004-08-23 2006-03-01 Konica Minolta Medical & Graphic, Inc. Printing plate material and printing plate

Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
WO2005114674A1 (en) * 2004-05-21 2005-12-01 Tdk Corporation Transparent conductive material, transparent conductive paste, transparent conductive film and transparent electrode
EP1630609A1 (en) 2004-08-23 2006-03-01 Konica Minolta Medical & Graphic, Inc. Printing plate material and printing plate

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