JPH1068939A - Production of liquid crystal display panel - Google Patents

Abstract

(57) Abstract: A method of manufacturing a liquid crystal display panel, particularly a color filter formed on a TFT substrate in a liquid crystal display panel, has a high aperture ratio at low cost. SOLUTION: A plurality of gate bus lines (first band-shaped electrodes) 3 made of light-shielding metal and a plurality of drain buses made of light-shielding metal intersecting the gate bus line 3 on an insulating substrate 2. Forming a line (second band-shaped electrode) 4; forming a grid-like resin layer 21 by electrodeposition on the bus lines 3 and 4; Forming a transparent colored resin pattern 23 that partially overlaps the bus lines 3 and 4, and removing the resin layer 21 and removing the part of the transparent colored resin pattern by the removal. including.

Description

DETAILED DESCRIPTION OF THE INVENTION

[0001]

BACKGROUND OF THE INVENTION 1. Field of the Invention The present invention relates to a method of manufacturing a liquid crystal display panel, and more particularly, to a method of forming a color filter in an active matrix type liquid crystal display panel using a thin film transistor (TF).
T) A method of forming a substrate.

In recent years, liquid crystal display panels have been demanded to be reduced in power consumption (reduced luminance of backlight), that is, to improve light transmittance of liquid crystal display panels, in consideration of adaptation to portable OA equipment. became.

[0003]

2. Description of the Related Art A liquid crystal display panel has a structure in which liquid crystal is filled between a pair of substrates, and an active matrix type liquid crystal display panel generally has a plurality of drain bus lines and a plurality of gate bus lines on one TFT substrate. Forming a line, a TFT located at the intersection thereof, and a pixel electrode for display,
This is a configuration in which a common electrode and a color filter are formed on the other common substrate.

In a general color filter, a translucent colored resin pattern of red (R), blue (B), and green (G) is arranged in a stripe, triangle, or mosaic selective arrangement corresponding to pixel electrodes. The light-shielding mask pattern is formed at the boundary between a number of colored resin patterns.

FIG. 7 is an explanatory view of a basic TFT substrate, and FIG.
3 is a sectional view of a liquid crystal display panel. However, in the plan view of FIG. 7, the interlayer insulating film is omitted for convenience. 7, on the surface of the TFT substrate 1 (see FIG. 8), a number of gate bus lines 3 extending in the left-right direction of the figure and a number of drain bus lines 4 extending in the vertical direction of the figure. A TFT 5 is formed near each intersection of the gate bus line 3 and the drain bus line 4.
5 is a gate electrode 6 extending from the gate bus line 3,
A drain electrode 7 extending from the drain bus line 4,
It is composed of a channel forming layer 8 and a source electrode 9.

In a region surrounded by the gate bus line 3 and the drain bus line 4, a pixel electrode 10 which is connected to the source electrode 9 of the TFT 5 while avoiding the TFT 5 is formed in a pattern. Formed.

In FIG. 8, a liquid crystal display panel 11 shown in a cross section in a direction crossing the drain bus line 4 has a liquid crystal 13 filled in a gap between the TFT substrate 1 and the common substrate 12.

In the TFT substrate 1, an interlayer insulating film 14 covering the drain bus line 4 and the like is formed on the surface of the glass substrate 2.
Is formed, and the pixel electrode 10 formed on the insulating film 14 is formed.
Is formed, and a rubbing process for regularly aligning the liquid crystal molecules is performed on the alignment film 15.

The common substrate 12 has a light-shielding mask pattern 17 having a large number of windows formed on a surface facing the TFT substrate 8, formed on a glass substrate 16, and having a light-transmitting property so as to cover an opening of the mask pattern 17. Transparent colored resin pattern 18
Is formed, and the alignment film 2 is formed on the common electrode film 19 thereon.
0 is formed, and the alignment film 20 is subjected to a rubbing process for regularly aligning liquid crystal molecules.

The translucent colored resin pattern 18 is color-coded into three colors of red (R), green (G), and blue (B). When a step or a step occurs for each color, the gap and the step are generally filled with a flattening layer, and a common electrode 19 and an alignment film 20 are formed on the light-transmitting flattening layer.

In order to improve the light transmittance of the liquid crystal display panel 7, a method of reducing the thickness of the colored resin pattern 18 constituting the color filter and increasing the aperture ratio of the light-shielding mask pattern 17 has been studied.

[0012] However, the above-mentioned method reduces the color purity,
The method of (1) is based on the accuracy of various patterns to be formed, the mask alignment accuracy in the manufacturing process, and the common substrate 12 and TF.
It is necessary to improve the positioning accuracy of the T substrate 1, and it is difficult to obtain a desired effect.

Further, as a method of forming a colored resin pattern 18 on the TFT substrate 1 in order to relax the alignment accuracy between the common substrate 12 and the TFT substrate 1 and improving the aperture ratio, a colored resin pattern is formed by an electrodeposition method. (See, for example, JP-A-61-69030). However, this method has a problem that the driving voltage of the liquid crystal decreases because a colored resin pattern is formed on the pixel electrode.

As a countermeasure against the drive voltage drop,
After forming a colored resin pattern by an electrodeposition method, a method of forming a pixel electrode thereon (for example, Japanese Patent Application Laid-Open No. 2-153325).
No.) was proposed.

However, in order to form a colored resin pattern by the electrodeposition method, it is necessary to form a dummy electrode for electrodeposition, which causes a problem that the number of manufacturing steps is increased and the cost is increased.

There are many proposals to form a color filter under a pixel electrode without being limited to the electrodeposition method, but the pattern formation accuracy cannot cope with recent high definition.

[0017]

As described above,
The conventional techniques of increasing the aperture without impairing the color purity all have a problem that the degree of effect is low, or the manufacturing process is complicated and the cost is high. Could not respond to.

[0018]

An object of the present invention is to increase the aperture of a liquid crystal display panel in an active matrix system while maintaining the conventional manufacturing cost of a color filter.

According to a first aspect of the present invention for achieving the above object, a plurality of first strip-shaped electrodes made of a light-shielding metal on an insulating substrate, and the first strip-shaped electrode made of a light-shielding metal are provided. Forming a plurality of second strip-shaped electrodes intersecting with each other; forming a grid-like resin layer by electrodeposition on the first and second strip-shaped electrodes; A step of forming a translucent colored resin pattern that partially fills the lattice-shaped vacant space and partially overlaps the resin layer; and dissolving the resin layer, and removing the translucent colored resin pattern by the ablation. And the step of causing

According to a second aspect of the present invention, which achieves the above object, there are provided a plurality of light-shielding metal gate bus lines on a substrate, and a plurality of light-shielding elements intersecting the gate bus lines via an interlayer insulating film. Forming a TFT disposed near each intersection between the drain bus line and the gate bus line and the drain bus line made of a conductive metal; and forming the exposed gate bus line and the drain bus line as electrodes; A step of forming a grid-like resin layer by electrodepositing on it, and a step of forming a translucent colored resin pattern that partially fills the grid-like voids of the resin layer and partially overlaps the resin layer, Evaporating the resin layer, removing the part of the translucent colored resin pattern by the elutriation, and connecting to the source electrode of the TFT through a contact hole penetrating the resin layer. An electrode, is to include a step of forming on a light-transmissive colored resin pattern.

A third structure of the present invention that achieves the above object is to use a conductive positive photosensitive resin for the resin layer in the first or second structure. A fourth configuration of the present invention that achieves the above object is that the translucent colored resin pattern in the first or second configuration is a red, blue, and green 3D pattern.
Color, and the three colored translucent colored resin patterns are formed in a selective arrangement for each color.

According to the first structure of the present invention, a resin layer is electrodeposited on the intersecting strip-shaped electrodes, and a color resin pattern is formed by filling an air space of the resin layer, and then the resin layer is ablated. In this configuration, the colored resin pattern is shaped, and the strip-shaped electrodes serve as a black mask.

In the method of manufacturing such a color filter, a colored resin pattern is formed along the outer edge of the strip electrode by a relatively simple alignment method. According to a second configuration of the present invention, the method of manufacturing a color filter of the first configuration is applied to manufacture of a color filter on a TFT substrate of a liquid crystal display panel, and the manufacture of the color filter is facilitated. Will be.

The third structure of the present invention is for facilitating the leaching of the resin layer.
Has a colored resin pattern of three colors of red, blue, and green in order to be applied to a TFT substrate for a full-color liquid crystal display device.

[0025]

1 and 2 are explanatory views of a method for manufacturing a color filter according to an embodiment of the present invention. However, FIG. 1A is a plan view before forming a color filter for a liquid crystal display panel of the present invention, in which an interlayer insulating film at an intersection of a gate bus line and a drain bus line is omitted.
FIGS. 2 (b) to 2 (d) and FIGS. 2 (a) to 2 (c) are cross-sectional views taken along a drain bus line for explaining a manufacturing process of the color filter for a liquid crystal display panel of the present invention. 7 and 8 are denoted by the same reference numerals.

As shown in FIG. 1A, a band-shaped gate bus line (first band-shaped electrode) 3 and a drain bus line (second band-shaped electrode) 4 made of a light-shielding metal are provided on the surface of the glass substrate. Then, a TFT 5 connected to the gate bus line 3 and the drain bus line 4 is formed.

The gate bus line 3, the drain bus line 4, and the TFT 5 are formed by a conventional technique, that is, a film forming process.
A resist coating step, a resist film exposure / development step, a film formation etching step, and a resist pattern peeling step are repeatedly formed. The gate bus line 3 and the drain bus line 4 having a width of about 10 μm to 20 μm For example, it is formed from a metal chrome film having a thickness of about 0.1 μm.

Next, as shown in FIG. 1B, a gate bus line 3 exposed on the surface of the glass substrate 2 but not shown
Then, a conductive resin (resist) layer 21 having a thickness of about 1 to 2 μm is electrodeposited on the exposed drain bus lines 4 as electrodes.

The grid-like resin layer 21 is also electrodeposited on the side surfaces of the gate bus line 3, drain bus line 4, gate electrode 6, and drain electrode 7. However, the thickness of the resin layer 21 on those side surfaces is slightly smaller than the width of the bus lines 3 and 4. Therefore, the illustration of the resin layer 21 applied to the side surfaces of the bus lines 3, 4 and the like is omitted in the drawings after FIG.

Next, as shown in FIG. 1C, a first light-transmitting colored resin layer of a predetermined color, for example, a light-transmitting red resin layer 22 is formed by spin coating or the like.
2 is selectively removed by an ordinary method (exposure / development), and when a predetermined curing treatment, for example, baking for about 1 minute on a hot plate at 200 ° C., a part (peripheral portion) is obtained as shown in FIG. A red resin pattern 23 overlapping the resin layer 21 is formed.

Next, as shown in FIG. 2A, the second and third colored resin patterns, for example, a blue resin pattern 24 and a green resin pattern 25 are formed by the same process as that for the red resin pattern 23. The resin patterns 23, 24, 25 that overlap with the resin layer 21 are
Are filled with a predetermined arrangement, for example, a stripe arrangement, a mosaic arrangement, or a triangle arrangement.

Therefore, when the resin layer 21 is a positive resist which reacts with ultraviolet rays, as shown in FIG. 2B, the resin layer 21 is irradiated with ultraviolet rays 26 having an intensity of, for example, 350 mj / cm ² from above the glass substrate 2. When a 1% sodium metasilicate diluted solution heated to 30 ° C. is sprayed for about 60 to 120 seconds, the resin layer 21 is dissolved away as shown in FIG. 2C.

At this time, a part of the resin patterns 23, 24 and 25 overlapping the resin layer 21 is also lifted off together with the resin layer 21, so that the red resin pattern 18R and the blue resin pattern 18B are formed on the glass substrate 2. The green resin pattern 18G is formed, and the color filter is completed.

FIGS. 3 and 4 are explanatory views of a method of manufacturing a TFT substrate in which a pixel electrode is formed on a colored resin pattern.
FIG. 3 is an explanatory view of a connection structure between a TFT and a transparent electrode, and the same reference numerals are used for parts common to those in FIG.

In FIG. 3A, a plurality of gate bus lines 3 made of a not-shown TFT and a light-shielding metal and a plurality of drain bus lines 4 made of a light-shielding metal are provided on the surface of a glass substrate 2. Is formed, the gate bus line 3 and the drain bus line 4 are used as electrodes, and a resin layer 21 having a thickness of about 1 to 2 μm is electrodeposited thereon.

Next, as shown in FIG. 3B, a first light-transmitting colored resin layer of a predetermined color, for example, a light-transmitting red resin layer 22 is formed by a spin coating method or the like.
Is selectively removed by an ordinary method, and is baked for about 1 minute by a predetermined curing treatment, for example, a hot plate at 200 ° C.
As shown in (c), a red resin pattern 23 is formed on the substrate 2.
Is formed.

Next, as shown in FIG. 3D, the second and third colored resin patterns, for example, the blue resin pattern 24 and the green resin pattern 25 are formed by the same process as that for the red resin pattern 23. The resin patterns 23, 24, and 25 whose peripheral portions overlap the resin layer 21 fill all the airspace portions of the resin layer 21 with a predetermined arrangement, for example, a stripe arrangement, a mosaic arrangement, or a triangle arrangement.

Then, a contact hole 29 (see FIG. 5) communicating with a predetermined portion of the resin patterns 23, 24, 25, that is, the source electrode 9 of the TFT 5, is formed.
As shown in (a), an ITO film 27 covering the resin patterns 23, 24, 25 is deposited.

Next, when the resin layer 21 is a positive resist which reacts with ultraviolet rays, as shown in FIG. 4B, after irradiating ultraviolet rays 26 having an intensity of, for example, 350 mj / cm ² from above the glass substrate 2, When a 1% sodium metasilicate diluted solution heated to 30 ° C. is sprayed for about 60 to 120 seconds, the resin layer 21 is dissolved away as shown in FIG. 4C.

At this time, a part (peripheral portion) of the resin patterns 23, 24, 25 overlapping the resin layer 21 is also lifted off together with the resin layer 21, and the colored resin patterns 18R, 18B formed by the lift-off. , 18G, the pixel electrode 10 is formed on the TF with a color filter.
The T substrate 30 is completed.

In FIG. 5, which is a cross-sectional view across the TFT 5, 6 is a gate electrode, 31 is an interlayer insulating layer, 7 is a drain electrode, 8 is a channel forming layer, 9 is a source electrode, and 29 is a contact hole. A part of the pixel electrode 10 is filled in the contact hole 29 and connected to the source electrode 9.

FIG. 6 is an explanatory view of a liquid crystal display panel using the TFT substrate of the present invention. In FIG. 6, a liquid crystal display panel 41 has a configuration in which a liquid crystal 13 is filled in an opposing gap between a TFT substrate 30 and a common substrate 33.

The TFT substrate 30 has a gate bus line 3 and a drain bus line 4 made of a plurality of light-shielding metals as shown in FIG.
After forming the resin patterns 18R, 18B, 18G and the pixel electrode 10 described with reference to FIGS. 3 and 4, an alignment film 15 covering them is applied, and liquid crystal molecules are regularly applied to the alignment film 15. A rubbing process for arrangement is performed.

The common substrate 33 facing the TFT substrate 30
Are the common electrode 19 and the alignment film 2 on the lower surface of the glass substrate 16.
0 is formed, and the alignment film 20 is subjected to a rubbing process for regularly aligning liquid crystal molecules.

The liquid crystal display panel 41 connects the gate bus line 3 and the drain bus line 4 to a drive circuit,
The liquid crystal display panel 11 is driven in the same manner as the conventional liquid crystal display panel 11, but the colored resin pattern (color filter) is
Compared with a conventional liquid crystal display panel formed on an FT substrate and having pixel electrodes formed on the colored resin pattern, the process is simplified by using the resin layer 21 which is electrodeposited with the gate bus line 3 and the drain bus line 4 and electrodeposited. That is, since the pixel electrode on the color filter is formed simultaneously with the colored resin pattern, the process is simple and the cost is low, and the outer edge of the pixel electrode comes into contact with the edges of the gate bus line and the drain bus line, so that a high opening is obtained. Becomes

[0046]

As described above, the method of manufacturing a color filter according to the present invention provides a low-cost, high-aperture-rate TFT substrate and enables low power consumption of an active matrix type liquid crystal display panel.

[Brief description of the drawings]

FIG. 1 is an explanatory view (1) of a method for manufacturing a color filter in an embodiment.

FIG. 2 is an explanatory view of a method for manufacturing a color filter in an embodiment (part 2).

FIG. 3 is an explanatory view of a method of manufacturing a TFT substrate in which a pixel electrode is formed on a colored resin pattern (part 1)

FIG. 4 is an explanatory view of a method of manufacturing a TFT substrate in which a pixel electrode is formed on a colored resin pattern (part 2).

FIG. 5 is an explanatory diagram of a connection structure between a TFT and a transparent electrode.

FIG. 6 is an explanatory diagram of a liquid crystal display panel in an embodiment.

FIG. 7 is an explanatory view of a basic conventional TFT substrate.

FIG. 8 is a cross-sectional view of a conventional liquid crystal display panel.

[Explanation of symbols]

 2, 16 glass substrate 3 gate bus line (first strip electrode) 4 drain bus line (second strip electrode) 5 TFT 6 gate electrode 7 drain electrode 8 channel formation layer 9 source electrode 10 pixel electrode (transparent electrode) 13 Liquid crystal 18R Red resin pattern 18B Blue resin pattern 18G Green resin pattern 19 Common electrode 21 Resin layer 22 Red resin layer 23, 24, 25 Resin pattern 26 Ultraviolet 29 Contact hole 30 TFT substrate 33 Common substrate 41 Liquid crystal display panel

Claims (4)

[Claims] 1. A plurality of first strip-shaped electrodes made of a light-shielding metal and a plurality of second strip-shaped electrodes made of a light-shielding metal intersecting the first strip-shaped electrode on an insulating substrate. Forming; forming a grid-like resin layer by electrodeposition on the first and second belt-shaped electrodes; filling a grid-shaped air space portion of the resin layer, and partially forming the resin A liquid crystal display comprising: a step of forming a translucent colored resin pattern overlapping the layer; and a step of ablating the resin layer and removing the part of the translucent colored resin pattern by the ablation. Panel manufacturing method. 2. A gate bus line made of a plurality of light-shielding metals on a substrate, a plurality of drain bus lines made of a plurality of light-shielding metals intersecting the gate bus lines via an interlayer insulating film, and the gate bus. Thin film transistor (TFT) arranged near each intersection of line and drain bus line
Forming a grid-like resin layer by electrodeposition on the exposed gate bus line and drain bus line; and filling a grid-like air space of the resin layer, A step of forming a translucent colored resin pattern overlapping the resin layer; a step of dissolving the resin layer and removing the portion of the translucent colored resin pattern by the dissolution; and a step of penetrating the resin layer. The TFT through a contact hole
Forming a pixel electrode to be connected to the source electrode on the translucent colored resin pattern. 3. The method for manufacturing a liquid crystal display panel according to claim 1, wherein the resin layer is a conductive positive photosensitive resin. 4. The translucent colored resin pattern is three colors of red, blue and green, and the translucent colored resin patterns of the three colors are formed in a selective arrangement for each color. Item 3. The method for manufacturing a liquid crystal display panel according to item 1 or 2.