JPH1087657A - Production of azetidinone derivative - Google Patents

Production of azetidinone derivative

Info

Publication number
JPH1087657A
JPH1087657A JP8255377A JP25537796A JPH1087657A JP H1087657 A JPH1087657 A JP H1087657A JP 8255377 A JP8255377 A JP 8255377A JP 25537796 A JP25537796 A JP 25537796A JP H1087657 A JPH1087657 A JP H1087657A
Authority
JP
Japan
Prior art keywords
group
formula
lower alkyl
compound represented
imidazole
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP8255377A
Other languages
Japanese (ja)
Other versions
JP4170405B2 (en
Inventor
Nobuo Matsui
宣夫 松井
Akira Yoshida
晃 吉田
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Nippon Soda Co Ltd
Original Assignee
Nippon Soda Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Nippon Soda Co Ltd filed Critical Nippon Soda Co Ltd
Priority to JP25537796A priority Critical patent/JP4170405B2/en
Publication of JPH1087657A publication Critical patent/JPH1087657A/en
Application granted granted Critical
Publication of JP4170405B2 publication Critical patent/JP4170405B2/en
Anticipated expiration legal-status Critical
Expired - Fee Related legal-status Critical Current

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Classifications

    • YGENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y02TECHNOLOGIES OR APPLICATIONS FOR MITIGATION OR ADAPTATION AGAINST CLIMATE CHANGE
    • Y02PCLIMATE CHANGE MITIGATION TECHNOLOGIES IN THE PRODUCTION OR PROCESSING OF GOODS
    • Y02P20/00Technologies relating to chemical industry
    • Y02P20/50Improvements relating to the production of bulk chemicals
    • Y02P20/55Design of synthesis routes, e.g. reducing the use of auxiliary or protecting groups

Landscapes

  • Plural Heterocyclic Compounds (AREA)
  • Low-Molecular Organic Synthesis Reactions Using Catalysts (AREA)

Abstract

PROBLEM TO BE SOLVED: To obtain the subject compound useful as an intermediate for carbapenem-based antibiotic substances by reacting an azetidinone derivative with imidazole in the presence of a pyridine derivative. SOLUTION: A compound represented formula I (R<1> is H or an amino- protecting group; R<2> is hydroxyl group which may be protected and a substitutable lower alkyl; R<3> is H or a lower alkyl; R<4> to R<7> are each H or a substitutable lower alkyl; X is O or S) is reacted with imidazole in the presence of a pyridine derivative (e.g. 4-dimethylaminopyridine) in a solvent (e.g. ethyl acetate) at 10-100 deg.C to afford a compound represented by formula II. The molar amount of the imidazole used is 1-5 times based on the compound represented by formula I and that of the pyridine derivative used is 0.001-0.5 based on the compound represented by formula I. The pyridine-base catalyst is used to thereby raise the rate of reaction and provide the compound represented by formula II in good yield for a short time.

Description

【発明の詳細な説明】DETAILED DESCRIPTION OF THE INVENTION

【0001】[0001]

【産業上の利用分野】本発明は優れた抗菌作用を有する
カルバペネム系抗生物質の中間体として有用なアゼチジ
ノン誘導体の製造方法に関する。
BACKGROUND OF THE INVENTION 1. Field of the Invention The present invention relates to a method for producing an azetidinone derivative useful as an intermediate of a carbapenem antibiotic having an excellent antibacterial activity.

【0002】[0002]

【従来の技術】優れた抗菌剤であるカルバペネム系抗生
物質を製造するための中間体として化合物〔III 〕
2. Description of the Related Art Compounds [III] as intermediates for producing carbapenem antibiotics which are excellent antibacterial agents

【化3】 が示されている(特許公報 平5−24155号、He
terocycles,vol.21(1),29−4
0(1984)等)。この化合物は通常カルボン酸誘導
体〔IV〕
Embedded image (Patent Publication No. 5-24155, He
terocycles, vol. 21 (1), 29-4
0 (1984)). This compound is usually a carboxylic acid derivative (IV)

【化4】 とカルボニルジイミダゾ−ルとの反応(Heteroc
ycles,vol.21(1),29−40(198
4)等)、あるいはカルボン酸活性化剤と反応させ酸ハ
ライド、混合酸無水物等を経てイミダゾ−ルと反応させ
る方法(特開平5−201967)または式〔V〕
Embedded image Reaction of carbonyldiimidazole with carbonyldiimidazole (Heteroc
cycles, vol. 21 (1), 29-40 (198
4)) or a method of reacting with a carboxylic acid activator to react with imidazole via an acid halide, a mixed acid anhydride or the like (JP-A-5-201967) or a method of formula [V]

【化5】 (r1 ,r2 は同一または相異なって、水素、低級アル
キル基、アラルキル基を示す。)で表されるアミド化合
物と直接イミダゾ−ルと反応させる方法(Tetrah
edoron Letters,Vol.30,No.
11,1345−1348(1989)、特開昭63−
284176等)が知られている。
Embedded image (Where r 1 and r 2 are the same or different and each represent hydrogen, a lower alkyl group or an aralkyl group) and a method of directly reacting with an imidazole (Tetrah
edoron Letters, Vol. 30, no.
11, 1345-1348 (1989);
284176).

【0003】[0003]

【発明が解決しようとする課題】カルボン酸誘導体〔I
V〕は通常アミド化合物〔V〕を加水分解する事により
得られることから、このアミド化合物から直接製造する
方法はカルボン酸誘導体を経由する方法に比べ有利な方
法である。この優位性を活かし直接イミダゾ−ルと反応
する例としてアセトニトリル中還流下での反応(Tet
rahedoronLetters,Vol.30,N
o.11,1345−1348(1989))、あるい
は室温での反応(特開昭63−284176)がある。
しかしながら、単にイミダゾ−ル等とアミド化合物を
混合して反応させるだけではその反応速度は遅く、副反
応等により収率の低下は避けられない。また、特開昭6
3−284176に記載の室温の反応では、反応は完結
していない。
SUMMARY OF THE INVENTION A carboxylic acid derivative [I
Since V] is usually obtained by hydrolyzing the amide compound [V], the method of producing directly from this amide compound is an advantageous method as compared with the method via a carboxylic acid derivative. As an example of taking advantage of this advantage and reacting directly with imidazole, a reaction under reflux in acetonitrile (Tet)
rahedronLetters, Vol. 30, N
o. 11, 1345-1348 (1989)) or a reaction at room temperature (JP-A-63-284176).
However, simply mixing imidazole or the like with an amide compound and reacting the mixture slows down the reaction rate, and inevitably reduces the yield due to side reactions and the like. In addition, Japanese Unexamined Patent Publication
In the reaction at room temperature described in 3-284176, the reaction was not completed.

【0004】[0004]

【課題を解決するための手段】本発明者らは、このよう
な状況下、反応時間のを短縮化、副反応の抑制等による
効率的な製造方法を鋭意検討した結果、本発明を完成す
るに至った。
Under such circumstances, the present inventors have intensively studied an efficient production method by shortening the reaction time and suppressing side reactions, and as a result, completed the present invention. Reached.

【0005】即ち、本発明は式〔I〕That is, the present invention relates to a compound of the formula [I]

【化6】 (式中、R1 は水素または容易に除去できるアミノ基の
保護基を、R2 は保護されていてもよい水酸基で置換さ
れていてもよい低級アルキル基を、R3 は水素原子もし
くは低級アルキル基をR4 、R5 、R6 、R7 は同一も
しくは相異なって水素、置換基を有してもよい低級アル
キル基を、Xは硫黄原子または酸素原子を表す。)で表
される化合物をピリジン誘導体の存在下、イミダゾール
と反応させることを特徴とする式〔II〕
Embedded image (In the formula, R 1 is a protecting group for hydrogen or an amino group which can be easily removed, R 2 is a lower alkyl group which may be substituted with an optionally protected hydroxyl group, and R 3 is a hydrogen atom or a lower alkyl group. R < 4 >, R < 5 >, R < 6 > and R < 7 > are the same or different and each represents hydrogen or a lower alkyl group which may have a substituent, and X represents a sulfur atom or an oxygen atom. Is reacted with imidazole in the presence of a pyridine derivative.

【化7】 (式中、R1 、R2 、R3 は前記と同じ意味を示す。)
で表される化合物の製造方法である。
Embedded image (In the formula, R 1 , R 2 and R 3 have the same meanings as described above.)
This is a method for producing the compound represented by the formula:

【0006】[0006]

【発明の実施の形態】R1 の保護基としては一般にNを
保護するために用いられている保護基が使用できる。そ
の具体例としては、トリメチルシリル、トリエチルシリ
ル、t−ブチルジメチルシリル、トリイソプロピルシリ
ル、ジメチルヘキシルシリル、t−ブチルジフェニルシ
リル等のトリ置換シリル基、置換されていてもよいベン
ジル基(置換基としてはニトロ基、低級アルコキシ基等
が挙げられる。)、低級アルコキシカルボニル基、ハロ
ゲノ低級アルコキシカルボニル基、置換されていてもよ
いベンジルオキシカルボニル基(置換基としてはニトロ
基、低級アルコキシ基等が挙げられる。)、アセチル
基、ベンゾイル基等のアシル基等が挙げられる。ここで
用いられる低級アルコキシ基における低級アルキルとは
炭素数1−8の直鎖または枝分かれのアルキル基を示
し、ベンジル基、ベンソイル基の置換基の個数、位置は
任意である。)
BEST MODE FOR CARRYING OUT THE INVENTION As the protecting group for R 1, a protecting group generally used for protecting N can be used. Specific examples thereof include a tri-substituted silyl group such as trimethylsilyl, triethylsilyl, t-butyldimethylsilyl, triisopropylsilyl, dimethylhexylsilyl, and t-butyldiphenylsilyl; a benzyl group which may be substituted; Nitro group, lower alkoxy group, etc.), lower alkoxycarbonyl group, halogeno lower alkoxycarbonyl group, and optionally substituted benzyloxycarbonyl group (substituents include nitro group, lower alkoxy group, etc.). ), An acetyl group, an acyl group such as a benzoyl group, and the like. The term "lower alkyl" in the lower alkoxy group used herein refers to a linear or branched alkyl group having 1 to 8 carbon atoms, and the number and position of the substituents of the benzyl group and the benzoyl group are arbitrary. )

【0007】R2 のアルキル基としては、メチル、エチ
ル、n−プロピル、i−プロピル、s−ブチル、n−ブ
チル、t−ブチル等の炭素数1〜6の直鎖又は枝分かれ
の低級アルキル基が挙げられる。R2 における水酸基の
保護基としては一般に水酸基を保護するのに用いられて
いる保護基が使用できる。その具体例としては、トリメ
チルシリル、トリエチルシリル、t−ブチルジメチルシ
リル、トリイソプロピルシリル、ジメチルヘキシルシリ
ル、t−ブチルジフェニルシリル等のトリ置換シリル
基、置換されていてもよいベンジル基(置換基としては
ニトロ基、低級アルコキシ基等が挙げられる。)、低級
アルコキシカルボニル基、ハロゲノ低級アルコキシカル
ボニル基、置換されていてもよいベンジルオキシカルボ
ニル基(置換基としてはニトロ基、低級アルコキシ基等
が挙げられる。)、アセチル基、ベンゾイル基等のアシ
ル基、トリフェニルメチル基、テトラヒドロピラニル基
等が挙げられる。
As the alkyl group for R 2 , a linear or branched lower alkyl group having 1 to 6 carbon atoms, such as methyl, ethyl, n-propyl, i-propyl, s-butyl, n-butyl, t-butyl, etc. Is mentioned. As the protecting group for the hydroxyl group in R 2 , a protecting group generally used for protecting a hydroxyl group can be used. Specific examples thereof include a tri-substituted silyl group such as trimethylsilyl, triethylsilyl, t-butyldimethylsilyl, triisopropylsilyl, dimethylhexylsilyl, and t-butyldiphenylsilyl; a benzyl group which may be substituted; Nitro group, lower alkoxy group, etc.), lower alkoxycarbonyl group, halogeno lower alkoxycarbonyl group, and optionally substituted benzyloxycarbonyl group (substituents include nitro group, lower alkoxy group, etc.). ), An acetyl group, an acyl group such as a benzoyl group, a triphenylmethyl group, a tetrahydropyranyl group, and the like.

【0008】R3 のアルキル基としては、メチル、エチ
ル、n−プロピル、i−プロピル、n−ブチル、s−ブ
チル、i−ブチル、t−ブチル等の炭素数1−6までの
直鎖もしくは枝分かれの低級アルキル基が挙げられる。
The alkyl group represented by R 3 is a straight-chain or a straight-chain having 1 to 6 carbon atoms such as methyl, ethyl, n-propyl, i-propyl, n-butyl, s-butyl, i-butyl and t-butyl. And branched lower alkyl groups.

【0009】R4 、R5 、R6 、R7 の低級アルキル基
としてはメチル、エチル、n−プロピル、i−プロピ
ル、ブチル等の炭素数1−6のアルキル基が、その置換
基としては、炭素数1−6の低級アルキルオキシ基、フ
ェニル基、塩素、臭素等のハロゲン原子挙げられる。
The lower alkyl group for R 4 , R 5 , R 6 and R 7 is an alkyl group having 1 to 6 carbon atoms such as methyl, ethyl, n-propyl, i-propyl, butyl, etc. And a halogen atom such as a lower alkyloxy group having 1 to 6 carbon atoms, a phenyl group, chlorine and bromine.

【0010】ピリジン誘導体としては、4−ジメチルア
ミノピリジン、4−ピロリジノピリジン等の置換アミノ
ピリジン;2−ピコリン、3−ピコリン、4−ピコリ
ン、2、3−ルチジン、2、4−ルチジン、2、5−ル
チジン、2、6−ルチジン、3、4−ルチジン、3、5
−ルチジン、2、4、6−コリジン等の低級アルキル置
換ピリジン、2−メトキシピルジン、3−メトキシピリ
ジン、4−メトキシピリジン、2、6−ジメトキシピリ
ジン等の低級アルコキシ置換ピリジン等が挙げられる。
Examples of the pyridine derivatives include substituted aminopyridines such as 4-dimethylaminopyridine and 4-pyrrolidinopyridine; 2-picoline, 3-picoline, 4-picoline, 2,3-lutidine, 2,4-lutidine, , 5-lutidine, 2,6-lutidine, 3,4-lutidine, 3,5
Lower alkyl-substituted pyridines such as -lutidine, 2,4,6-collidine and the like; lower alkoxy-substituted pyridines such as 2-methoxypyridine, 3-methoxypyridine, 4-methoxypyridine and 2,6-dimethoxypyridine.

【0011】反応は化合物〔I〕を溶媒に溶解または懸
濁し、化合物〔II〕及びピリジン誘導体を加え、10−
100℃好ましくは20−80℃にて反応させる事によ
り行われる。
In the reaction, compound [I] is dissolved or suspended in a solvent, compound [II] and a pyridine derivative are added, and 10-
The reaction is carried out at 100 ° C, preferably at 20-80 ° C.

【0012】化合物〔II〕の使用量は化合物〔I〕に対
し1−5倍モルである。
The amount of compound [II] to be used is 1 to 5 moles compared to compound [I].

【0013】ピリジン誘導体の使用量は化合物〔I〕に
対し、0.001から0.5倍モルである。
The amount of the pyridine derivative to be used is 0.001 to 0.5-fold the molar amount of the compound [I].

【0014】溶媒は反応に関与しなければ特に限定され
ないが、例えばベンゼン、トルエン、キシレンあるいは
クロルベンゼン等の芳香族炭化水素系溶媒、アセトン、
メチルエチルケトン、ジエチルケトン、イソブチルメチ
ルケトン等のケトン系溶媒、酢酸メチル、酢酸エチル、
酢酸プロピル、酢酸ブチル、プロピオン酸メチル等のエ
ステル系溶媒、塩化メチレン、クロロホルム、ジクロロ
エタン等のハロゲン系溶媒、ヘキサン、ヘプタン等の炭
化水素系溶媒、アセトニトリル、ベンゾニトリル等のニ
トリル系溶媒、ジイソプロピルエ−テル、ジオキサン、
テトラヒドロフラン等のエ−テル系溶媒、ジメチルスル
ホキシド、ジメチルホルムアミド等が挙げられ、これら
を混合してもよい。特にアセトニトリル、テトラヒドロ
フラン、酢酸エステル類が好適に使用される。
The solvent is not particularly limited as long as it does not participate in the reaction. For example, aromatic solvents such as benzene, toluene, xylene and chlorobenzene, acetone,
Ketone solvents such as methyl ethyl ketone, diethyl ketone, isobutyl methyl ketone, methyl acetate, ethyl acetate,
Ester solvents such as propyl acetate, butyl acetate and methyl propionate; halogen solvents such as methylene chloride, chloroform and dichloroethane; hydrocarbon solvents such as hexane and heptane; nitrile solvents such as acetonitrile and benzonitrile; Ter, dioxane,
Ether solvents such as tetrahydrofuran and the like, dimethyl sulfoxide, dimethylformamide and the like may be mentioned, and these may be mixed. In particular, acetonitrile, tetrahydrofuran, and acetates are preferably used.

【0015】化合物〔I〕は公知であり、例えばTet
rahedoron Letters,Vol.30,
No.11,1345−1348(1989)、Tet
rahedoron Letters,Vol.27,
No.47,5687−5690(1986)、特開昭
63−284176等に示される方法により得られ、ま
た生成する化合物〔II〕も公知であり、この化合物の生
成の確認はHPLC,NMRにより行った。
The compound [I] is known, for example, Tet
rahedron Letters, Vol. 30,
No. 11, 1345-1348 (1989), Tet
rahedron Letters, Vol. 27,
No. 47, 5687-5690 (1986), JP-A-63-284176, etc., and the resulting compound [II] is also known. The formation of this compound was confirmed by HPLC and NMR.

【0016】[0016]

【実施例】次に実施例を挙げ本発明をさらに詳細に説明
する。 実施例1 (3S,4R)−3−〔(1R)−1−t−ブチルジメ
チルシリルオキシエチル〕−4−〔(1R)−1−イミ
ダゾリルエチル〕アゼチジン−2−オンの製造
Next, the present invention will be described in more detail by way of examples. Example 1 Production of (3S, 4R) -3-[(1R) -1-tert-butyldimethylsilyloxyethyl] -4-[(1R) -1-imidazolylethyl] azetidin-2-one

【化8】 (3S,4R)−3−〔(1R)−1−t−ブチルジメ
チルシリルオキシエチル〕−4−〔(1R)−1−
(4,4−ジメチル−2−チオキソチアゾリジン−3−
イル)エチル〕アゼチジン−2−オン17.23g(4
0mmol)と酢酸エチル80mlの混合溶液にイミダ
ゾ−ル3.81g(56mmol)、4−ジメチルアミ
ノピリジン0.244g(2mmol)を加え、60℃
で反応を行った。反応はほぼ4時間で終了した。反応溶
液を冷却し、HPLCで分析したところ目的物13.7
7g(39.2mmol)を含有していた。
Embedded image (3S, 4R) -3-[(1R) -1-t-butyldimethylsilyloxyethyl] -4-[(1R) -1-
(4,4-dimethyl-2-thioxothiazolidine-3-
Yl) ethyl] azetidin-2-one 17.23 g (4
0 mmol) and 80 ml of ethyl acetate, 3.81 g (56 mmol) of imidazole and 0.244 g (2 mmol) of 4-dimethylaminopyridine were added, and the mixture was heated at 60 ° C.
The reaction was carried out. The reaction was completed in about 4 hours. The reaction solution was cooled and analyzed by HPLC.
It contained 7 g (39.2 mmol).

【0017】実施例2 (3S,4R)−3−〔(1R)−1−t−ブチルジメ
チルシリルオキシエチル〕−4−〔(1R)−1−イミ
ダゾリルエチル〕アゼチジン−2−オンの製造
Example 2 Preparation of (3S, 4R) -3-[(1R) -1-tert-butyldimethylsilyloxyethyl] -4-[(1R) -1-imidazolylethyl] azetidin-2-one

【化9】 (3S,4R)−3−〔(1R)−1−t−ブチルジメ
チルシリルオキシエチル〕−4−〔(1R)−1−
(4,4−ジメチル−2−チオキソチアゾリジン−3−
イル)エチル〕アゼチジン−2−オン17.23g(4
0mmol)と酢酸エチル80mlの混合溶液にイミダ
ゾ−ル3.81g(56mmol)、4−ジメチルアミ
ノピリジン0.976g(8mmol)を加え、60℃
で反応を行った。反応はほぼ2時間で終了した。反応溶
液を冷却し、HPLCで分析したところ目的物13.7
0g(39mmol)を含有していた。
Embedded image (3S, 4R) -3-[(1R) -1-t-butyldimethylsilyloxyethyl] -4-[(1R) -1-
(4,4-dimethyl-2-thioxothiazolidine-3-
Yl) ethyl] azetidin-2-one 17.23 g (4
0 mmol) and 80 ml of ethyl acetate, 3.81 g (56 mmol) of imidazole and 0.976 g (8 mmol) of 4-dimethylaminopyridine were added, and the mixture was heated at 60 °
The reaction was carried out. The reaction was completed in about 2 hours. The reaction solution was cooled and analyzed by HPLC.
It contained 0 g (39 mmol).

【0018】比較例 (3S,4R)−3−〔(1R)−1−t−ブチルジメ
チルシリルオキシエチル〕−4−〔(1R)−1−イミ
ダゾリルエチル〕アゼチジン−2−オンの製造
Comparative Example Preparation of (3S, 4R) -3-[(1R) -1-tert-butyldimethylsilyloxyethyl] -4-[(1R) -1-imidazolylethyl] azetidin-2-one

【化10】 4−ジメチルアミノピリジンを加えない以外は実施例1
及び2と同様に反応を行った。未反応原料が1mol%
前後になるまでに8時間以上要した。反応溶液を冷却
し、HPLCで分析したところ目的物13.08g(3
7.1mmol)を含有していた。
Embedded image Example 1 except that no 4-dimethylaminopyridine was added
And 2 1 mol% of unreacted raw material
It took more than 8 hours before and after. The reaction solution was cooled and analyzed by HPLC.
7.1 mmol).

【0019】参考例1 (3S,4R)−3−〔(1R)−1−ヒドロキシエチ
ル〕−4−〔(1R)−1−メチル−3−p−ニトロベ
ンジルオキシカルボニル−2−オキソプロピル〕アゼチ
ジン−2−オンの合成
Reference Example 1 (3S, 4R) -3-[(1R) -1-hydroxyethyl] -4-[(1R) -1-methyl-3-p-nitrobenzyloxycarbonyl-2-oxopropyl] Synthesis of azetidin-2-one

【化11】 実施例1で合成した(3S,4R)−3−〔(1R)−
1−t−ブチルジメチルシリルオキシエチル〕−4−
〔(1R)−1−イミダゾリルエチル〕アゼチジン−2
−オン 13.77g相当の酢酸エチル溶液を、p−ニ
トロベンジルマロン酸ハ−フエステル13.39g,酢
酸エチル80ml,無水塩化マグネシウム3.62gの
混合液に15−20℃でトリエチルアミン6.23gを
滴下して予め調整したマグネシウムマロネ−ト溶液に加
え、50℃で2.3時間反応させた。反応終了後水洗し
て酢酸エチル層をHPLCで分析して表題の化合物1
7.4gを含有していた。
Embedded image (3S, 4R) -3-[(1R)-synthesized in Example 1
1-t-butyldimethylsilyloxyethyl] -4-
[(1R) -1-imidazolylethyl] azetidine-2
6.23 g of triethylamine was added dropwise to a mixed solution of 13.39 g of p-nitrobenzylmalonic acid half ester, 80 ml of ethyl acetate and 3.62 g of anhydrous magnesium chloride at 15-20 ° C. The mixture was added to a magnesium malonate solution prepared in advance and reacted at 50 ° C. for 2.3 hours. After completion of the reaction, the reaction mixture was washed with water, and the ethyl acetate layer was analyzed by HPLC.
It contained 7.4 g.

【0020】[0020]

【発明の効果】本発明は優れた抗菌作用を有するカルバ
ペネム系抗生物質の中間体として有用なアゼチジノン誘
導体をピリジン系触媒を用いることにより反応速度を速
めて、短時間に収率よく製造することができる。
Industrial Applicability According to the present invention, an azetidinone derivative useful as an intermediate of a carbapenem antibiotic having an excellent antibacterial activity can be produced in a short time and with high yield by using a pyridine catalyst to increase the reaction rate. it can.

Claims (2)

【特許請求の範囲】[Claims] 【請求項1】 式〔I〕 【化1】 (式中、R1 は水素または容易に除去できるアミノ基の
保護基を、R2 は保護されていてもよい水酸基で置換さ
れていてもよい低級アルキル基を、R3 は水素原子もし
くは低級アルキル基をR4 、R5 、R6 、R7 は同一も
しくは相異なって水素、置換基を有してもよい低級アル
キル基を、Xは硫黄原子または酸素原子を表す。)で表
される化合物をピリジン誘導体の存在下、イミダゾール
と反応させることを特徴とする式〔II〕 【化2】 (式中、R1 、R2 、R3 は前記と同じ意味を示す。)
で表される化合物の製造方法。
1. A compound of the formula [I] (In the formula, R 1 is a protecting group for hydrogen or an amino group which can be easily removed, R 2 is a lower alkyl group which may be substituted with an optionally protected hydroxyl group, and R 3 is a hydrogen atom or a lower alkyl group. R < 4 >, R < 5 >, R < 6 > and R < 7 > are the same or different and each represents hydrogen or a lower alkyl group which may have a substituent, and X represents a sulfur atom or an oxygen atom. Is reacted with imidazole in the presence of a pyridine derivative. (In the formula, R 1 , R 2 and R 3 have the same meanings as described above.)
A method for producing a compound represented by the formula:
【請求項2】 ピリジン誘導体が低級アルキル基、また
は窒素を含みメチレン基で環を構成する基で置換された
置換アミノ基で置換されたピリジンである請求項1に記
載の製造方法。
2. The method according to claim 1, wherein the pyridine derivative is a pyridine substituted with a lower alkyl group or a substituted amino group containing a nitrogen and containing a ring to form a ring with a methylene group.
JP25537796A 1996-09-06 1996-09-06 Method for producing azetidinone derivatives Expired - Fee Related JP4170405B2 (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP25537796A JP4170405B2 (en) 1996-09-06 1996-09-06 Method for producing azetidinone derivatives

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP25537796A JP4170405B2 (en) 1996-09-06 1996-09-06 Method for producing azetidinone derivatives

Publications (2)

Publication Number Publication Date
JPH1087657A true JPH1087657A (en) 1998-04-07
JP4170405B2 JP4170405B2 (en) 2008-10-22

Family

ID=17277925

Family Applications (1)

Application Number Title Priority Date Filing Date
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Country Status (1)

Country Link
JP (1) JP4170405B2 (en)

Cited By (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
WO2004035539A1 (en) * 2002-10-18 2004-04-29 Meiji Seika Kaisha, Ltd. Process for producing carbapenem derivative and intermediate for use in the production
WO2008020597A1 (en) * 2006-08-15 2008-02-21 Meiji Seika Kaisha, Ltd. Method for producing 1-methylcarbapenem production intermediate
WO2010013223A1 (en) * 2008-07-30 2010-02-04 Ranbaxy Laboratories Limited Process for the preparation of carbapenem compounds
CN102137865A (en) * 2008-07-30 2011-07-27 兰贝克赛实验室有限公司 Process for the preparation of carbapenem compounds

Families Citing this family (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN101203551B (en) 2005-06-16 2011-09-28 日本合成化学工业株式会社 Water-solubility membrane

Cited By (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
WO2004035539A1 (en) * 2002-10-18 2004-04-29 Meiji Seika Kaisha, Ltd. Process for producing carbapenem derivative and intermediate for use in the production
WO2008020597A1 (en) * 2006-08-15 2008-02-21 Meiji Seika Kaisha, Ltd. Method for producing 1-methylcarbapenem production intermediate
WO2010013223A1 (en) * 2008-07-30 2010-02-04 Ranbaxy Laboratories Limited Process for the preparation of carbapenem compounds
CN102137865A (en) * 2008-07-30 2011-07-27 兰贝克赛实验室有限公司 Process for the preparation of carbapenem compounds
US8841444B2 (en) 2008-07-30 2014-09-23 Ranbaxy Laboratories Limited Process for the preparation of carbapenem compounds

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