JPH1090904A - Photosensitive resist, color filter, and method of manufacturing color filter - Google Patents

Abstract

PROBLEM TO BE SOLVED: To provide a photosensitive resist having a high volume resistance and capable of forming a black matrix having a sufficient optical density, a color filter having such a black matrix, Provided is a manufacturing method capable of efficiently obtaining a color filter. SOLUTION: A resist layer formed on a transparent substrate using a photosensitive resist containing a photoacid generator and a polyfunctional alkoxysilane is exposed through a mask of a predetermined pattern, and photoacid generation occurs in an exposed region. A polysiloxane network is formed by the action of the acid generated by the agent, and then a black matrix containing the polysiloxane is formed by development, and then a plurality of colors are formed on a transparent substrate on which the black matrix is not formed. Are sequentially formed to form a colored layer having a predetermined number of colors to form a color filter.

Description

DETAILED DESCRIPTION OF THE INVENTION

[0001]

BACKGROUND OF THE INVENTION 1. Field of the Invention The present invention relates to a photosensitive resist used for a liquid crystal display or the like, a color filter, and a method of manufacturing a color filter.

[0002]

2. Description of the Related Art For example, in a liquid crystal display (LCD), a color filter is used in both an active matrix system and a simple matrix system in order to meet the recent demand for colorization. For example, in an active matrix type liquid crystal display using a thin film transistor (TFT), three primary colors of red (R), green (G), and blue (B) are used as color filters, and each pixel of R, G, and B is used. The liquid crystal operates as a shutter by turning on and off the electrodes corresponding to the above, and light is transmitted through each of the R, G, and B pixels to perform color display. Color mixing is visually performed on the retina by the principle of additive color mixing in which liquid crystal shutters corresponding to pixels of two or more colors are opened to mix colors and make the colors look different.

The above color filter manufacturing method includes a dyeing method of coating a dyed base material, exposing and developing through a photomask to dye a formed pattern, and dispersing a colored pigment in a photosensitive resist in advance. In addition, there are a pigment dispersion method of exposing and developing through a photomask, and a printing method of printing each color with a printing ink.

[0004] In recent years, an electrodeposition method has attracted attention as a method of manufacturing a color filter. In this electrodeposition method, for example, a transparent electrode formed on a substrate is patterned, and a voltage is selectively applied only to a portion of the patterned transparent electrode where a colored layer of the same color is to be formed. The first color layer is formed by performing electrodeposition in the inside. Next, a voltage is selectively applied only to a portion where a colored layer of another color is formed,
Similarly, the second and subsequent color layers are formed to form R, G, B
Is formed (for example, JP-A-59-90818). As another electrodeposition method, a transparent electrode is formed on a substrate, a positive photosensitive resin layer is provided on the entire surface, exposed and developed in a pattern for the first color, and a colored electrode is formed on the exposed transparent electrode. Electrodeposition is performed in a bath to form a first color layer, and then exposure and development are performed only on a portion where another color layer is to be formed. Similarly, the second and subsequent color layers are formed. To form a color filter having R, G and B colored layers (Japanese Patent Laid-Open No. 61-279).
No. 803).

[0005]

The coloring layer formed by the above-described electrodeposition method is excellent in heat resistance, chemical resistance, weather resistance, etc. by using a pigment as a coloring material. This is advantageous in that it is excellent in uniformity and can cope with a large area.

However, in the production of a color filter by the electrodeposition method as described above, when a light-shielding layer (black matrix) is formed of metal chromium or the like before forming a colored layer,
Since the black matrix has conductivity, a colored layer is also formed on the black matrix when the colored layer is formed, and there is a problem that flatness is significantly impaired.

[0007] This problem is caused even when a black matrix (resin black matrix) is formed using a material in which a black pigment is dispersed in a resin, when a conductive material such as carbon black is used as the black pigment. Is a problem that arises as well. To solve this problem, the use of carbon black coated with a polymer or the use of a metal oxide as a light-shielding material in the above resin black matrix has been studied.

However, when carbon black coated with a polymer is used, the coating state and the dispersion state in the resin are unstable, and it has been difficult to impart a high volume resistance to the resin black matrix. Further, when a metal oxide is used as a light-shielding material, there is a problem that light-shielding properties as a black matrix are inferior, and further, precipitation of the metal oxide occurs.

[0009] Such a problem occurs not only in the electrodeposition method but also in all methods for producing a color filter using an electrochemical reaction such as an electrolytic micelle method.

The present invention has been made in view of the above circumstances, and has a high resistive volume and a photosensitive resist capable of forming a black matrix having a sufficient optical density. An object of the present invention is to provide a color filter having a black matrix and a manufacturing method capable of efficiently obtaining such a color filter.

[0011]

In order to achieve the above object, a photosensitive resist according to the present invention contains at least a photosensitive resin component, a photoacid generator and a polyfunctional alkoxysilane. The content of the generator is in the range of 5 to 20 parts by weight with respect to 100 parts by weight of the photosensitive resin component, and the content of the polyfunctional alkoxysilane is 5 to 100 parts by weight of the photosensitive resin component. The configuration was such that it was in the range of ２０20 parts by weight.

[0012] The color filter of the present invention comprises: a transparent substrate;
A colored layer comprising a plurality of colored patterns formed in a predetermined pattern on the transparent substrate, and a black matrix formed so as to be located between the colored patterns, wherein the black matrix contains polysiloxane. Configuration.

Further, the color filter of the present invention has a configuration in which a transparent electrode is provided between the transparent substrate, the coloring layer and the black matrix.

In the method of manufacturing a color filter according to the present invention, a first step of forming a resist layer by applying the above-described photosensitive resist on a transparent substrate, and the resist layer is formed through a mask having a predetermined pattern. A second step of exposing, forming a polysiloxane network in the resist layer in the exposed area, and then developing to form a polysiloxane-containing black matrix; and forming the polysiloxane-containing black matrix on the transparent substrate on which the black matrix is not formed. And a third step of sequentially forming a plurality of colored patterns to form a colored layer having a predetermined number of colors.

In the method of manufacturing a color filter according to the present invention, in the first step, the transparent substrate is formed on the entire surface in advance or a transparent electrode is formed in advance in a predetermined pattern.

According to the present invention, a resist layer comprising a photosensitive resist containing a photoacid generator and a polyfunctional alkoxysilane has its exposed region insolubilized in a developing solution, and The contained photoacid generator generates an acid, and by the action of the acid, the polyfunctional alkoxysilane in the exposed region of the resist layer undergoes hydrolysis to cause polycondensation, and a polysiloxane network is formed in the exposed region of the resist layer. The black matrix formed and formed by subsequent development contains polysiloxane.

[0017]

Embodiments of the present invention will be described below with reference to the drawings.

First, the photosensitive resist of the present invention will be described. The photosensitive resist of the present invention contains at least a photosensitive resin component, a photoacid generator, and a polyfunctional alkoxysilane.

As the photosensitive resin component, for example, alkyl acrylate or alkyl methacrylate such as acrylic acid, methacrylic acid, methyl acrylate or methyl methacrylate, cyclic acrylate or methacrylate, hydroxyethyl acrylate or hydroxyethyl methacrylate, etc. Resins synthesized using about five types of monomers to have a molecular weight of about 5,000 to 100,000 can be mentioned.

The photoacid generator to be contained in the photosensitive resist of the present invention is 2 (2'-furylethylidene)-
4,6-bis (trichloromethyl) -S-triazine (TFE triazine (trade name) manufactured by Sanwa Chemical Co., Ltd.), TPS-103 (trade name) manufactured by Midori Kagaku Co., Ltd., MDS manufactured by Midori Chemical Co., Ltd. -105 (trade name), TAZ-106 (trade name) manufactured by Midori Kagaku Co., Ltd.
One or two or more of these can be used, and the selection can be made in consideration of a light source or the like used for exposure of the resist layer. Such a photoacid generator can be used in the photosensitive resist 1
It can be contained in the range of 5 to 20 parts by weight with respect to 00 parts by weight. If the content of the photoacid generator is less than 5 parts by weight, the amount of acid generated by light is small and hydrolysis of the polyfunctional alkoxysilane is not sufficiently performed. Is not preferable because a polysiloxane network is not formed.

The polyfunctional alkoxysilane contained in the photosensitive resist of the present invention includes trifunctional alkoxysilanes, specifically, methyltrimethoxysilane, methyltriethoxysilane, methyltripropoxysilane and the like. Can be. When a tetrafunctional alkoxysilane, for example, tetramethoxysilane, tetraethoxysilane, tetrapropoxysilane, or the like is used, the hydrolysis rate is high, and it is difficult to form a uniform polysiloxane network.

Such a polyfunctional alkoxysilane can be contained in the range of 5 to 20 parts by weight based on 100 parts by weight of the photosensitive resist. When the content of the polyfunctional alkoxysilane is less than 5 parts by weight, the amount of polysiloxane generated by the acid generated by the photoacid generator is small, and when it exceeds 20 parts by weight, the polysiloxane is formed only near the photosensitive resist surface. A siloxane network is formed, and a network in the entire region is not formed, which is not preferable.

Next, the color filter of the present invention will be described. FIG. 1 is a schematic configuration diagram showing one embodiment of the color filter of the present invention. In FIG. 1, the color filter 1
A transparent substrate 2, a black matrix 5 formed in a predetermined pattern on the transparent substrate 2 via a transparent electrode 3, and a coloring layer 7 including a plurality of coloring patterns 7R, 7G, 7B; a black matrix 5 and a coloring layer; And a transparent common electrode 9. The black matrix 5 contains a polysiloxane network.

As the transparent substrate 2 of the color filter 1,
A rigid material having no flexibility such as quartz glass, Pyrex glass, or a synthetic quartz plate, or a flexible material having flexibility such as a transparent resin film or an optical resin plate can be used. Among them, Corning 7059 glass is a material having a small coefficient of thermal expansion, is excellent in dimensional stability and workability in high-temperature heat treatment, and is an alkali-free glass containing no alkali component in the glass.
It is suitable for a color filter for an active matrix type LCD.

The transparent electrode 3 formed on the transparent substrate 2
Are indium tin oxide (ITO), zinc oxide (Zn
O), tin oxide (SnO) and the like, and can be formed using a transparent conductive material, and the thickness thereof is preferably about 200 to 2000 °.

The black matrix 5 can be formed by exposing and curing the photosensitive resist of the present invention containing light-shielding particles such as carbon black in the range of 40 to 65% by weight, Contains a polysiloxane network. The thickness of the black matrix 5 is preferably about 0.6 to 1.8 μm. And this black matrix 5 is 10 ⁸ to 10 ¹⁰ Ω · cm
It has a high volume resistance. If the thickness of the black matrix 5 is less than 0.6 μm, the light shielding properties of the black matrix will be insufficient. On the other hand, when the thickness of the black matrix 5 exceeds 1.8 μm, the resolving power decreases, which is not preferable.

The colored layer 7 can be formed by an electrodeposition method using the transparent electrode 3, and in this case, an electrodeposition material as described later can be used. The coloring layer 7 can be formed by a conventionally known method such as a dyeing method, a pigment dispersion method, and a printing method.

The protective layer 8 is for the purpose of smoothing the surface of the color filter 1, improving the reliability and preventing contamination of the liquid crystal layer when used in a liquid crystal display (LCD). It can be formed using a transparent resin such as an epoxy resin or a polyimide resin, or a transparent inorganic compound such as silicon dioxide. The thickness of such a protective layer is preferably about 0.5 to 50 μm.

Further, as the transparent common electrode 9, an indium tin oxide (ITO) film or the like can be used. IT
The O film can be formed by a known method such as an evaporation method and a sputtering method, and the thickness is preferably about 800 to 1500 °.

In the above-described color filter of the present invention, the transparent electrode 3 exists between the transparent substrate 2 and the black matrix 5 and the colored layer 7, but the present invention is not limited to this.
The transparent electrode 3 may not be present.

Next, the color filter manufacturing method of the present invention will be described with reference to the color filter of the present invention shown in FIG. 1 as an example. FIG. 2 is a process chart for explaining the color filter manufacturing method of the present invention.

In FIG. 2, as a first step, first,
A transparent electrode 3 is formed on the entire surface of the transparent substrate 2 using a transparent conductive material such as indium tin oxide (ITO), zinc oxide (ZnO), and tin oxide (SnO). Such a transparent electrode 3 is formed, for example, by a sputtering method, a vacuum evaporation method, or a CVD method.
It is formed by a general film forming method such as
It is preferably about Å2000 °. Next, the transparent electrode 3
The above-mentioned photosensitive resist of the present invention is applied on the top and the thickness is 1.
A resist layer 4 having a thickness of about 2 to 1.5 μm is formed.
(A)).

Next, as a second step, the resist layer 4 is exposed through a black matrix photomask 10 (FIG. 2B). By this exposure, the resist layer 4
The exposed region 4a is insolubilized with a developing solution, and the photoacid generator contained in the photosensitive resist generates an acid upon exposure. Then, by the action of this acid, the polyfunctional alkoxysilane contained in the resist layer 4 is hydrolyzed to cause polycondensation, and the resist layer 4 in the exposed area 4a is exposed.
A polysiloxane network is formed therein. In the present invention, as the environmental conditions at the time of the above-mentioned exposure or the holding environmental conditions after the exposure, a temperature of 20 to 25 ° C. and a relative humidity of 58 ° C.
~ 95% condition can be set. Subsequently, the black matrix 5 containing polysiloxane is formed by developing and removing the unexposed area.
(C)).

Next, as a third step, a photosensitive resist is applied on the transparent electrode 3 so as to cover the black matrix 5 to form a resist layer 4 ′. The resist layer 4 'is exposed and developed through a mask to expose the transparent electrode 3 in a pattern corresponding to the red colored layer. Then, the transparent substrate 2 is immersed in an electrodeposition bath in which a red pigment is dispersed, a DC voltage is applied to the transparent electrode 3, and a red electrodeposition material is deposited on the exposed transparent electrode 3, and After drying, a colored layer 7R without pinholes is formed (FIG. 2D). In the formation of the colored layer 7R by the electrodeposition method, the black electrode 5 has a polysiloxane layer as a surface layer and has a high surface resistance, so that the red electrodeposition material is deposited only on the exposed transparent electrode 3. Become. Next, the resist layer 4 'is exposed and developed through a photomask for a green colored layer, and similarly, a green colored layer 7G is formed on the transparent electrode 3 by electrodeposition. After exposing and developing the resist layer 4 'through the photomask described above and similarly forming a blue colored layer 7B by electrodeposition, the black matrix 5 and the colored layer 7 are cured by heating at 70 to 90 ° C. Let it. Further, the colored layers 7R, 7 formed as described above
G, 7B, a protective layer 8 and a transparent common electrode 9 are provided so as to cover the black matrix 5 to form a color filter 1 (FIG. 2E).

In the third step, the resist layer 4 'formed once is exposed a plurality of times.
Of the image is reduced. However, since the black matrix 5 having a high volume resistance has already been formed on the transparent electrode 3, even if the resolution of the resist layer 4 ′ decreases and the accuracy of the removal position of the resist layer 4 ′ decreases, the black matrix 5 Only the portion for forming the colored layer of the desired color surrounded by 5 is exposed, and the accuracy of forming the colored layer is not reduced.

The exposure of the resist layer 4 in the first step can be performed using a light source selected from light sources such as an ultrahigh pressure mercury lamp in consideration of the relationship with the photoacid generator contained in the photosensitive resist. .

Examples of the developer used in the second step include an aqueous solution of potassium hydroxide, an aqueous solution of tetramethylammonium hydroxide (TMAH), and an aqueous solution of sodium hydroxide. Spin, rocking, etc.) can be used.

Examples of the photosensitive resist used in the third step include a positive photoresist (OFPR-800 (trade name) manufactured by Tokyo Ohka Kogyo Co., Ltd.).

The electrodeposition material used in the third step is generally made of an organic material (polymer material), and its original form is well known as an electrodeposition coating method. In electrodeposition coating, there are cation electrodeposition and anion electrodeposition due to electrochemical reaction with the main electrode. This is categorized according to whether the electrodeposited material exists as a cation or behaves as an anion. Examples of the organic polymer substance used for the electrodeposition include various organic polymer substances such as natural oils and fats, synthetic oils and fats, alkyd resins, polyester resins, acrylic resins, and epoxy resins.

In the anion type, a maleated oil or polybutadiene resin has been used for a long time, and the hardening of the electrodeposited substance is due to an oxidative polymerization reaction. The cationic type has many epoxy resins and can be used alone or modified. Other,
Melamine-based resins and acrylic-based resins are often used, and a strong colored layer can be formed by heat curing, light curing, or the like.

In the electrodeposition of a liquid crystal color filter, finely pulverized pigments and dyes are dispersed in an anion-type or cation-type electrodeposition bath, and co-deposited on the conductive portion together with the ionic polymer material.

Examples of the developer used in the third step include an aqueous solution of potassium hydroxide, an aqueous solution of tetramethylammonium hydroxide (TMAH), and an aqueous solution of sodium hydroxide.
Spray development (spin, swing), dip development and the like can be used.

In the above-described color filter manufacturing method of the present invention, the colored layers 7R, 7G and 7B are formed by the electrodeposition method. However, the present invention is not limited to this.
The colored layer can be formed by utilizing an electrochemical reaction such as an electrolytic micelle method, or can be formed by a conventionally known method such as a dyeing method, a pigment dispersion method, and a printing method.

Further, in the color filter of the present invention in which the transparent electrode 3 does not exist, in the above-mentioned third step of the manufacturing method of the present invention, a conventionally known method such as a dyeing method, a pigment dispersion method, a printing method, or the like is used. Except for forming a colored layer, it can be manufactured in the same manner.

[0045]

Next, the present invention will be described in more detail with reference to examples. (Example 1) First step First, a transparent electrode having a thickness of 1500 mm was formed on a 7059 glass substrate manufactured by Corning Co., Ltd. by sputtering to form a transparent electrode having a thickness of 1500 mm. A photosensitive resist prepared as described below is applied on the transparent electrode by spin coating, and then,
Drying was performed at 0 ° C. for 3 minutes to form a 1.2 μm thick resist layer.

(Preparation of Photosensitive Resist) First, a photosensitive resin having the following composition was prepared.

O-cresol novolak epoxy acrylate (50% of hydroxyl groups reacted with phthalic anhydride) 9.5 parts by weight Dipentaerythritol hexaacrylate 9.5 parts by weight Irgacure (Ciba Geigy) 1.0 part by weight Ethyl Cell Solve 80.0 parts by weight Next, a pigment, a polyfunctional alkoxysilane, and a photoacid generator were mixed with the photosensitive resin to prepare a photosensitive resist.

[0048] Photosensitive resin ... 100 parts Carbon black ... 50 parts by weight of methyltriethoxysilane ... 15 parts by weight photoacid generator (Midori Kagaku Co., Ltd. TAZ-106) ... 10 parts by weight second step Next, exposure was carried out through a photomask for black matrix (line width = 35 [mu] m) with respect to the resist layer.
As an exposure light source, an ultraviolet exposure apparatus having an ultra-high pressure mercury lamp was used, and irradiation was performed for 10 seconds. After the exposure, the glass substrate was kept in an environment of a relative humidity of 58% and a temperature of 25 ° C. for 3 minutes. Thereafter, development is performed using a 0.05% aqueous potassium hydroxide solution to remove the unexposed resist layer, and after washing with water,
Heating at 0 ° C. for 30 minutes formed a black matrix. Third Step Next, a photosensitive resist (OFPR-800 manufactured by Tokyo Ohka Kogyo Co., Ltd.) is applied on a glass substrate by a spin coating method, and then dried at 90 ° C. for 3 minutes and dried to a thickness of 3 μm. A resist layer was formed.

Next, the resist layer was exposed and developed through a photomask for the red coloring layer to expose a transparent electrode in a pattern corresponding to the red coloring layer. Next, a glass substrate was immersed in an electrodeposition solution for a red coloring layer prepared as described below, using a transparent electrode as an anode and a platinum electrode as a cathode so as to have an electrode interval of 30 mm. Electrodeposition was performed by applying a current for 60 seconds. Next, the substrate taken out of the electrodeposition liquid was sufficiently washed with water, and then dried at 100 ° C. for 10 minutes to form a red colored layer having good transparency.

(Preparation of Electrodeposition Solution for Red Colored Layer) First, a mixture having the following composition was prepared.

Acrylic resin ARON S-4030 manufactured by Toa Gosei Chemical Co., Ltd. 75 parts by weight Alkoxy melamine M-66B manufactured by Sumitomo Chemical Co., Ltd. 25 parts by weight Triethylamine 6 parts by weight Dinonyl naphthalene disulfide 0 Next, a pigment and water were mixed with this mixture to prepare an electrodeposition solution for a red colored layer.

• Mixture: 13.5 parts by weight • Naphthol red: 5 parts by weight • Water: 81.5 parts by weight Next, the resist layer is exposed and developed through a photomask for a green coloring layer. Electrodeposition was performed using the electrodeposition solution for the green colored layer under the same conditions as in the formation of the red colored layer. Next, the substrate taken out of the electrodeposition liquid was sufficiently washed with water, and then dried at 100 ° C. for 10 minutes to form a green colored layer having good transparency.

(Composition of electrodeposition solution for green coloring layer) Mixture (same as used for electrodeposition solution for red coloring layer) 13.5 parts by weight Phthalocyanine green 5 parts by weight Water 81 Further, the resist layer is exposed and developed through a photomask for a blue colored layer, and is subjected to electrodeposition using the electrodeposition solution for a blue colored layer having the following composition under the same conditions as in the formation of the red colored layer. Dressed. Next, the substrate taken out of the electrodeposition solution was sufficiently washed with water, and dried at 100 ° C. for 10 minutes to form a blue colored layer having good transparency.

(Composition of electrodeposition solution for blue coloring layer) Mixture (same as used for electrodeposition solution for red coloring layer) 13.5 parts by weight Copper phthalocyanine blue 5 parts by weight Water 81.5 parts by weight By the above first to third steps, a color filter including a colored layer having a predetermined pattern on a glass substrate and a black matrix containing polysiloxane located between the colored layers is manufactured. did.

The volume resistance of the black matrix in this color filter was measured using a picoammeter HP4140.
B (manufactured by YHP) as a result of 10 ⁹ Ω · cm
And it was confirmed to have a high volume resistance value. The thickness of the black matrix was 0.95 μm, and the optical density D was 3.0, which confirmed that the unit thickness of the black matrix was high in light-shielding properties.

Further, a protective layer made of acrylic resin (thickness: 1.5 μm) and a transparent common electrode made of ITO (thickness: 1500 °) were provided so as to cover the black matrix and the colored layer of the obtained color filter. When a liquid crystal display (LCD) was manufactured using the above method and a color image was displayed, a good color image without color shift or bleeding was displayed. Example 2 As a photoacid generator, T manufactured by Midori Kagaku Co., Ltd.
Instead of AZ-106, TFE manufactured by Sanwa Chemical Co., Ltd.
A color filter was produced in the same manner as in Example 1 except that triazine was used.

[0057] As a result of the volume resistivity and optical density D of the black matrix was measured as in Example 1 in the color filter, respectively 10 ⁹ Ω · cm,
3.0, which confirmed that the film had a high volume resistance value and a high light-shielding property.

Further, a protective layer made of acrylic resin (thickness: 1.5 μm) and a transparent common electrode made of ITO (thickness: 1500 °) were provided so as to cover the black matrix and the colored layer of the obtained color filter. When a liquid crystal display (LCD) was manufactured using the above method and a color image was displayed, a good color image without color shift or bleeding was displayed. Example 3 A color filter was prepared in the same manner as in Example 1, except that methyltrimethoxysilane was used instead of methyltriethoxysilane as the polyfunctional alkoxysilane used in the photosensitive resist used in the first step. Was prepared.

The volume resistance and optical density D of the black matrix in this color filter were measured in the same manner as in Example 1. As a result, they were 10 ⁹ Ω · cm 2,
3.0, which confirmed that the film had a high volume resistance value and a high light-shielding property.

Further, a protective layer made of acrylic resin (thickness: 1.5 μm) and a transparent common electrode made of ITO (thickness: 1500 °) were provided so as to cover the black matrix and the colored layer of the obtained color filter. When a liquid crystal display (LCD) was manufactured using the above method and a color image was displayed, a good color image without color shift or bleeding was displayed. Comparative Example 1 A color filter was produced in the same manner as in Example 1 except that a monofunctional methoxytrimethylsilane was used in place of the polyfunctional alkoxysilane used in the photosensitive resist used in the first step. .

The volume resistance and optical density D of the black matrix in this color filter were measured in the same manner as in Example 1. As a result, they were 10 ⁵ Ω · cm 2,
3.0, and the formation of the polysiloxane matrix in the black matrix was insufficient and the volume resistivity was low. (Comparative Example 2) A color filter was produced in the same manner as in Example 1, except that tetrafunctional tetramethoxysilane was used as the polyfunctional alkoxysilane in the photosensitive resist used in the first step.

The volume resistivity and the optical density D of the black matrix in this color filter were measured in the same manner as in Example 1. As a result, they were 10 ⁵ Ω · cm 2,
3.0, and the formation of the polysiloxane matrix in the black matrix was insufficient and the volume resistivity was low.

[0063]

As described above in detail, according to the present invention, since the photosensitive resist contains at least the photosensitive resin component, the photoacid generator and the polyfunctional alkoxysilane, the photosensitive resist is exposed to the light by the light irradiation. The photoacid generator generates an acid, and the action of the acid enables the polyfunctional alkoxysilane to undergo hydrolysis and subsequent polycondensation.

In the present invention, a color filter comprising a colored layer composed of a plurality of colored patterns on a transparent substrate and a black matrix containing polysiloxane positioned between the colored patterns is used. The matrix has a high volume resistance and an optical density.

Further, by exposing the resist layer made of the above-described photosensitive resist through a mask having a predetermined pattern, the exposed area of the resist layer is insolubilized in a developing solution, and the exposed area of the resist is contained in the photosensitive resist. An acid is generated by the action of the photoacid generator to be produced, and the acid causes hydrolysis and polycondensation of the polyfunctional alkoxysilane in the resist layer, forming a polysiloxane network in the resist layer in the exposed region, Thereafter, the color filter is developed by developing a black matrix, and then forming a colored layer of a predetermined number of colors by sequentially forming a plurality of colored patterns on a transparent substrate on which the black matrix is not formed. In this manufacturing process, the black matrix has a high volume resistance due to the polysiloxane. Since the formation of the colored layer can also be easily performed by any of the forming methods including electrodeposition, it becomes possible to produce a good color filter.

[Brief description of the drawings]

FIG. 1 is a schematic configuration diagram showing one embodiment of a color filter of the present invention.

FIG. 2 is a process diagram illustrating a method of manufacturing a color filter according to the present invention.

[Explanation of symbols]

 DESCRIPTION OF SYMBOLS 1 ... Color filter 2 ... Transparent substrate 3 ... Transparent electrode 4 ... Resist layer 4a ... Exposed area 5 ... Black matrix 7 ... Colored layer

Claims (5)

[Claims] 1. A photosensitive resin composition comprising at least a photosensitive resin component, a photoacid generator and a polyfunctional alkoxysilane, wherein the content of the photoacid generator is 5 parts by weight per 100 parts by weight of the photosensitive resin component.
A photosensitive resist, wherein the content of the polyfunctional alkoxysilane is in the range of 5 to 20 parts by weight based on 100 parts by weight of the photosensitive resin component. 2. A method according to claim 1, further comprising a transparent substrate, a colored layer including a plurality of colored patterns formed in a predetermined pattern on the transparent substrate, and a black matrix formed between the colored patterns. A black matrix is a color filter containing polysiloxane. 3. The color filter according to claim 3, further comprising a transparent electrode between said transparent substrate, said colored layer and said black matrix. 4. A first step of applying the photosensitive resist according to claim 1 on a transparent substrate to form a resist layer, and exposing the resist layer through a mask having a predetermined pattern. A second step of forming a polysiloxane network in the region of the resist layer and then developing to form a polysiloxane-containing black matrix; and forming a plurality of colors on the transparent substrate on which the black matrix is not formed. A step of forming a colored layer having a predetermined number of colors by sequentially forming the colored patterns described above. 5. The color filter according to claim 4, wherein in the first step, the transparent substrate has a transparent electrode formed in advance on the entire surface or in a predetermined pattern. Method.