JPH1090911A - Processing method and processing device for photosensitive lithographic plate - Google Patents

Abstract

PROBLEM TO BE SOLVED: To eliminate the phenomenon of an intermediate exposed part getting red which is caused in processing, and improve the base contamination by processing a photosensitive lithographic plate by use of a developer having a (SiO2 mole concentration)/(alkali metal mole concentration) of a specified value or less by a processing device having a carrying speed of a specified value or more. SOLUTION: By use of a developer containing an alkali metal silicate (SiO2 mole concentration)/(alkali metal mole concentration) value of 0.6 or less, a photosensitive lithographic plate is processed by a processing device having a carrying speed of 2000mm/min or more. In a PS plate processing device, when an image-exposed PS plate 10 is inserted from an insert base 10, the insertion of the PS plate 10 is detected by a plate detecting means 2, and the operation of the PS plate processing device is started, whereby the plate 10 is fed into a processing part 3, and processed with the developer. Thus, the phenomenon of an intermediate exposed part getting red or phenomenon of ball-point pen remaining which is caused in processing is improved, and an excellent finished quality can be provided.

Description

DETAILED DESCRIPTION OF THE INVENTION

[0001]

BACKGROUND OF THE INVENTION 1. Field of the Invention The present invention relates to a developing method and a developing apparatus for imagewise dissolving a photosensitive layer of a photosensitive lithographic printing plate subjected to image exposure.

[0002]

2. Description of the Related Art Conventionally, as a method of producing a lithographic printing plate using a photosensitive lithographic printing plate, a method of treating a large number of image-exposed photosensitive lithographic printing plates with an alkaline developing solution for reusing in practice is practical. Have been. In this processing method, a phenomenon that the intermediate exposed portion of the developed lithographic printing plate is dyed red or a ballpoint pen remains may occur. This is because the material of the photosensitive layer eluted in the developer and the ink of the ballpoint pen drawn on the photosensitive layer are re-attached to the surface of the grain of the support after the photosensitive layer material is removed by the developer. Although this phenomenon is considered to occur, this phenomenon is particularly likely to occur when the concentration of the inorganic salt in the developing solution is high. It is known that the occurrence of red discoloration can be suppressed and is preferable. Examples of such a developer are disclosed in JP-A-55-22759 and JP-A-5-2273. However, at present, a sufficient effect of preventing the occurrence of red discoloration and remaining ballpoint pens has not been obtained simply by lowering the inorganic salt concentration in the developer.

In recent years, a method of forming an image using minute halftone dots has been introduced to the market as high-quality printing, and the demand for high-definition which can obtain a high linearity and a super-hard image is increasing. High-definition printing reduces the size of halftone dots while maintaining the conventional halftone dot array, enabling the expression of details.The advantages are that the rosette cannot be seen, the saturation is high, and the precision is high. Although it can be mentioned that expression has become possible, there are also problems such as extremely small dots (5 μm or less), extremely difficult printing, susceptibility to the developer level, and easy to pick up dust pinholes. is there.

In such high-definition printing, it is desired to improve performance such as opening of fine lines and prevention of background stain, which are particularly important as the printing quality, and an electrolytic polishing treatment is performed when the support is roughened. Attempts have been made to improve the performance by performing a mechanical polishing process as a preceding step and smoothly performing the electrolytic polishing process. However, although the performance is somewhat improved with ordinary halftone dots, a sufficient effect is not exhibited with high definition, and further improvement is desired.

[0005] Further, the conventional developing apparatus has adopted a method in which a photosensitive lithographic printing plate is conveyed while being curved. However, if the plate is curved during development, the diffusivity of a developing solution is poor, and the image area is poor. Had trouble.

[0006]

SUMMARY OF THE INVENTION The present invention has been made in view of the above circumstances, and it is an object of the present invention to provide a method for developing a photosensitive lithographic printing plate in which an intermediate exposed portion generated in the developing process is dyed red. (Hereinafter referred to as “reddish”), improvement of the phenomenon of ballpoint pen residue, and fine line openings in order to have an excellent finish quality that can sufficiently cope with high-definition printing.
It is an object of the present invention to provide a development processing method which achieves improvement of background contamination. It is another object of the present invention to provide the processing device.

[0007]

The above object of the present invention has been attained by the following constitutions.

(1) It contains an alkali metal silicate,
Using a developer having a value of SiO ₂ (molar concentration of SiO ₂ ) / M (molar concentration of alkali metal) of 0.6 or less, the transport speed was 2
A method for developing a photosensitive lithographic printing plate, comprising processing the photosensitive lithographic printing plate with a developing device at a rate of 000 mm / min or more.

(2) A photosensitive lithographic printing plate characterized in that a photosensitive lithographic printing plate using a support which has been subjected to at least mechanical polishing and electrolytic polishing is processed by a developing device having a transport speed of 2000 mm / min or more. Development processing method.

(3) The method for developing a photosensitive lithographic printing plate as described in (1) or (2) above, wherein the transport mode of the developing apparatus is horizontal.

(4) containing an alkali metal silicate,
A photosensitive lithographic printing plate characterized in that a developer having a ratio of SiO ₂ (molar concentration of SiO ₂ ) / M (molar concentration of alkali metal) of 0.6 or less is used, and a transport speed is 2000 mm / min or more. Development processing equipment.

(5) A photosensitive lithographic printing plate development processing apparatus characterized in that a photosensitive lithographic printing plate using a support subjected to at least mechanical polishing and electrolytic polishing is processed at a transport speed of 2000 mm / min or more. .

(6) A photosensitive lithographic printing plate development processing apparatus as set forth in (4) or (5) above, wherein the transport mode of the photosensitive lithographic printing plate development processing apparatus is horizontal.

The composition of a developer for a photosensitive lithographic printing plate is generally expressed as SiO ₂ / M. A developer having a value of 0.6 or less has a high penetration rate into the photosensitive layer during development. , And the transfer speed of the development processing device (automatic development machine)
/ Min or more, the time during which the photosensitive layer material, ball-point pen ink, etc. eluted in the developer stays on the grain surface of the support is short, and the ratio of exposure to the developer containing almost no residue is high. In view of the fact that it is possible to prevent the re-attachment of these deposits on the grain surface, the inventors of the present invention used a photosensitive lithographic printing plate with a developer having an SiO ₂ / M value of 0.6 or less, and Set the transport speed of the development processing device to 200
The inventors have found that a lithographic printing plate free from the phenomenon of reddish tint and no remaining ballpoint pen can be obtained by performing development processing at 0 mm / min or more, and the present invention has been accomplished.

In order to meet the demand for high definition, when processing a photosensitive lithographic printing plate using a support subjected to mechanical polishing and electrolytic polishing, the speed of the transport speed is increased (2000 m).
m / min or more), the replacement of the developing solution on the plate surface in the developing solution is accelerated, and since the surface area of the support is large, the amount of Si adhered to the developing solution is increased, and the details of the plate surface are hydrophilized. Therefore, according to the above-described configuration, it has been found that performances such as opening of fine lines and prevention of background dirt are particularly excellent, and it has been found that these can be achieved, and the present invention has been accomplished.

Further, it has been found that by making the transport type of the development processing apparatus horizontal, it is possible to solve the problem of the diffusion of the developer and the details of the image portion, and to obtain a higher quality printing plate.
This has led to the present invention.

Hereinafter, the present invention will be described in detail.

In the first invention, the photosensitive lithographic printing plate is made of SiO.
_{The second} invention uses a developing solution having a ₂ / M value of 0.6 or less, and performs a developing process at a transport speed of the printing plate of 2000 mm / min or more in a developing apparatus. A method in which a photosensitive lithographic printing plate using a support subjected to mechanical polishing and electrolytic polishing is processed by a developing apparatus having a conveying speed of 2000 mm / min or more. It was done. Further, as third and fourth inventions, there are development processing apparatuses corresponding to the respective processing methods.

[1] Developing method In the present invention, the developing solution corresponding to claim 1 (hereinafter referred to as the developing solution of claim 1) contains an alkali metal silicate,
An aqueous solution having a value of SiO ₂ / M (wherein [SiO ₂ ] represents the molar concentration of SiO ₂ and [M] represents the molar concentration of the alkali metal) is 0.6 or less. The preferred range of the molar ratio SiO ₂ / M of the developer according to claim 1 is 0.1.
When it is more than 0.6, unnecessary washing out of non-image portions is stagnated, and good developability cannot be obtained.

The developer of the present invention (not limited to claim 1) preferably contains at least 20% of potassium based on the total gram atoms of the contained alkali metal. The preferable content of the potassium is 20 to 1
00%, most preferably 30 to 100%.
In the developer of the present invention, another alkali agent can be used in combination, if necessary. Such alkaline agents include potassium hydroxide, sodium hydroxide, lithium hydroxide, sodium tertiary phosphate, sodium dibasic phosphate, ammonium tertiary phosphate, ammonium dibasic phosphate, sodium metasilicate, sodium bicarbonate, sodium borate , Ammonium borate, inorganic alkaline agents such as ammonia, and monomethylamine, dimethylamine, trimethylamine, monoethylamine, diethylamine, triethylamine, monoisopropylamine, diisopropylamine, n-butylamine, monoethanolamine, diethanolamine, triethanolamine, Organic amine compounds such as monoisopropanolamine, diisopropanolamine, ethyleneimine, ethylenediamine, pyridine, etc., which can be used alone or in combination Kill.

The developer of the present invention can contain an organic solvent and various surfactants. Among the surfactants, examples of the anionic surfactant include higher alcohols having 8 to 22 carbon atoms such as sodium salt of lauryl alcohol sulfate, sodium salt of octyl alcohol sulfate, ammonium salt of lauryl alcohol sulfate, and secondary sodium alkyl sulfate. Sulfuric acid ester salts, for example, aliphatic alcohol sulfuric acid ester salts such as acetyl alcohol sulfuric acid sodium salt, and the like, alkylarylsulfonic acids such as alkylbenzenesulfonic acid salts, alkylnaphthalenesulfonic acid salts, metanitrobenzenesulfonic acid sodium salt, and the like. salts such as _{C 17 H 33 CON (CH 3} ) CH 2 CH 2
Sulfonic acids of alkyl amides such as SO ₃ Na and the like, and sulfonates of dibasic fatty acid esters such as dioctyl sodium sulfosuccinate and sodium sulfosuccidihexyl ester are exemplified. Examples of the amphoteric surfactant include an alkylcarboxybetaine type, an alkylaminocarboxylic acid type, an alkylimidazoline type compound, and an organic boron compound disclosed in Japanese Patent Publication No. 1-57895. Further, JP-A Nos. 59-84241, 62-168160 and 6
Non-ionic surfactants disclosed in JP-A-2-175758, and cationic surfactants disclosed in JP-A-62-17557. The surfactant is suitably contained in the range of 0.1 to 5% by weight based on the total weight of the developing replenisher at the time of use.

As the organic solvent, those having a solubility in water of about 10% by weight or less are suitable.
% By weight or less. For example, 1-phenylethanol, 2-phenylethanol, 3-phenylpropanol, 1,4-phenylbutanol, 2,2-phenylbutanol, 1,2-phenoxyethanol, 2-
Benzyloxyethanol, o-methoxybenzyl alcohol, m-methoxybenzyl alcohol, p-methoxybenzyl alcohol, benzyl alcohol, cyclohexanol, 2-methylcyclohexanol, 4-methylcyclohexanol, 3-methylcyclohexanol and the like can be mentioned. it can.

The content of the organic solvent is preferably from 1 to 5% by weight based on the total weight of the developing solution at the time of use. The amount used is closely related to the amount used of the surfactant, and it is preferable to increase the amount of the surfactant as the amount of the organic solvent increases. Further, if necessary, additives such as an alkali-soluble mercapto compound and / or a thioether compound, a water-soluble reducing agent, an antifoaming agent and a water softener can be contained.

As the water softener, for example, Na ₂ P ₂ O ₇ ,
Polyphosphates such as Na ₃ P ₁ O ₉ , Na ₂ O ₁ (NaO ₃ P) PO ₃ Na ₂ , and cargon (sodium polymetaphosphate), for example, ethylenediaminetetraacetic acid, its potassium salt, its sodium salt: diethylenetriaminepentaacetic acid; Potassium salt, sodium salt thereof; triethylenetetramine hexaacetic acid, potassium salt, sodium salt thereof; hydroxyethylethylenediamine triacetic acid, potassium salt, sodium salt thereof; nitrilotriacetic acid, potassium salt, sodium salt thereof; Diaminocyclohexanetetraacetic acid, its potassium salt, its sodium salt;
Aminopolycarboxylates such as 1,3-diamino-2-propanoltetraacetic acid, its potassium salt and its sodium salt, and organic sulfones such as ethylenediaminetetra (methylenephosphonic acid) and its potassium and sodium salts Acid salts and the like can be mentioned. The optimum amount of such a water softener varies depending on the hardness of the hard water used and the amount used. However, if a general amount is used, 0.01 to 5% by weight in the developer at the time of use is used. , More preferably 0.01
It is contained in the range of 0.5% by weight.

Examples of the water-soluble reducing agent include phenolic compounds such as hydroquinone and methoxyquinone; amine compounds such as phenyleneamine and phenylhydrazine; sulfites such as sodium sulfite, potassium sulfite and sodium hydrogen sulfite; Examples include phosphites such as potassium and potassium hydrogen phosphite, sodium thiosulfate, sodium dithionite and the like. The content is preferably from 0.01 to 10% by weight based on the total weight of the developing replenisher.

As the alkali-soluble mercapto compound and / or thioether compound, a compound having at least one mercapto group and / or thioether group in the molecule and having at least one or more acid group is preferable.
Compounds having one or more mercapto groups and carboxyl groups in the molecule are preferred. For example, mercaptoacetic acid, 2-
Mercaptopropionic acid, 3-mercaptopropionic acid, 4-mercaptobutanoic acid, 2,4-dimercaptobutanoic acid, 2-mercaptotetradecanoic acid, 2-mercaptomyristic acid, mercaptosuccinic acid, 2,3-dimercaptosuccinic acid, cysteine , N-acetylcysteine, N- (2-mercaptopropionyl) glycine, N
-(2-mercapto-2-methylpropionyl) glycine, N- (3-mercaptopropionyl) glycine, N
-(2-mercapto-2-methylpropionyl) cysteine, penicillamine, N-acetylpenicillamine, glycine / cysteine / glutamine condensate, N- (2,3-
Dimercaptopropionyl) glycine, 2-mercaptonicotinic acid, thiosalicylic acid, 3-mercaptobenzoic acid, 4-mercaptobenzoic acid, 3-carboxy-2-mercaptopyridine, 2-mercaptobenzothiazole-
5-carboxylic acid, 2-carcapto-3-phenylpropenoic acid, 2-mercapto-5-carboxyethylimidazole, 5-mercapto-1- (4-carboxyphenyl) tetrazole, N- (3,5-dicarboxyphenyl) -2-mercaptotetrazole, 2- (1,2-dicarboxyethylthio) -5-mercapto-1,3,4
-Thiadiazole, 2- (5-mercapto-1,3,4
-Thiadiazolylthio) hexanoic acid, 2-mercaptoethanesulfonic acid, 2,3-dimercapto-1-propanesulfonic acid, 2-mercaptobenzenesulfonic acid, 4-
Mercaptobenzenesulfonic acid, 3-mercapto-4-
(2-sulfophenyl) -1,2,4-triazole,
2-mercaptobenzothiazole-5-sulfonic acid, 2
-Mercaptobenzimidazole-6-sulfonic acid, mercaptosuccinimide, 4-mercaptobenzenesulfonamide, 2-mercaptobenzimidazole-5-sulfonamide, 3-mercapto-4- (2- (methylaminosulfonyl) ethoxy) toluene, 3-mercapto-4- (2- (methylaminosulfonylamino) ethoxy) toluene, 4-mercapto-N- (P-methylphenylsulfonyl) benzamide, 4-mercaptophenol, 3-mercaptophenol, 3,4-dimercapto Toluene, 2-mercaptohydroquinone, 2-thiouracil, 3-hydroxy-2-mercaptopyridine,
-Hydroxythiophenol, 4-hydroxy-2-mercaptopyrimidine, 4,6-dihydroxy-2-mercaptopyrimidine, 2,3-dihydroxypropylmercaptan, tetraethylene glycol, 2-mercapto-4-octylphenyl ether methyl ether, 2 −
Mercapto-4-octylphenol methanesulfonylaminoethyl ether, 2-mercapto-4-octylphenol methylaminosulfonylbutyl ether thiodiglycolic acid, thiodiphenol, 6,8-dithiooctanoic acid or alkali metals, alkaline earth metals, organic amines thereof And the like. The content in the developer and the replenisher composition is suitably from 0.01 to 5% by weight.

It is preferable that an acid or a buffer is added to the post-processing solution (hereinafter, gum solution) in order to remove an alkali component of the developing solution. In addition, a hydrophilic polymer compound, a chelating agent, a lubricant, a preservative, and a A solubilizer or the like can be added. When the post-processing agent contains a hydrophilic polymer compound, it also has a function as a protective agent for preventing scratches and stains on the plate after development.

The surface condition of the coating layer is improved by adding a surfactant to the gum solution used in the present invention. Surfactants that can be used include anionic surfactants and / or nonionic surfactants. For example, anionic surfactants include fatty acid salts, abietic acid salts, hydroxyalkanesulfonates, alkanesulfonates, dialkylsulfosuccinates, linear alkylbenzenesulfonates, branched alkylbenzenesulfonates, alkylnaphthalene sulfones Acid salts,
Alkylphenoxypolyoxyethylene propyl sulfonates, polyoxyethylene alkyl sulfophenyl ether salts, N-methyl-N-oleyltaurine sodium, petroleum sulfonates, nitrated castor oil, sulfated tallow oil, sulfuric acid of fatty acid alkyl ester Ester salts, alkyl nitrate esters, polyoxyethylene alkyl ether sulfates, fatty acid monoglyceride sulfates, polyoxyethylene alkyl phenyl ether sulfates, polyoxyethylene styryl phenyl ether sulfates, alkyl phosphates, polyoxy Partial salts of ethylene alkyl ether phosphate salts, polyoxyethylene alkyl phenyl ether phosphate salts, and styrene-maleic anhydride copolymer Products include, olefin - partially saponified maleic anhydride copolymer and naphthalene sulfonate formalin condensates and the like. Of these, dialkyl sulfosuccinates, alkyl sulfates and alkyl naphthalene sulfonates are particularly preferably used.

The nonionic surfactants include polyoxyethylene alkyl ethers, polyoxyethylene alkyl phenyl ethers, polyoxyethylene polystyryl phenyl ether, polyoxyethylene polyoxypropylene alkyl ether, glycerin fatty acid partial esters, Sorbitan fatty acid partial esters, pentaerythritol fatty acid partial esters, propylene glycol monofatty acid esters, sucrose fatty acid partial esters, polyoxyethylene sorbitan fatty acid partial esters, polyoxyethylene sorbitol fatty acid partial esters, polyethylene glycol fatty acid esters, poly Glycerin fatty acid partial esters, polyoxyethylated castor oil, polyoxyethylene glycerin fatty acid partial esters, fats Acid diethanol amides, N, N-
Examples include bis-2-hydroxyalkylamines, polyoxyethylene alkylamines, triethanolamine fatty acid esters, and trialkylamine oxides.
Among them, polyoxyethylene alkyl phenyl ethers, polyoxyethylene-polyoxypropylene block polymers and the like are preferably used. Also, fluorine-based,
Silicon-based anionic and nonionic surfactants can be used as well. Two or more of these surfactants can be used in combination. For example, two or more different types may be used in combination. For example, a combination of two or more different anionic surfactants or a combination of an anionic surfactant and a nonionic surfactant is preferable. It is not necessary to particularly limit the amount of the surfactant to be used.
01 to 20% by weight.

In the gum solution, a polyhydric alcohol, an alcohol and an aliphatic hydrocarbon can be used as a lubricant, if necessary, in addition to the above components. Of the polyhydric alcohols, preferred specific examples include ethylene glycol, diethylene glycol, triethylene glycol, propylene glycol, tetraethylene glycol, polyethylene glycol, glycerin, sorbitol, and the like.As the alcohol, propyl alcohol, butyl alcohol, pen Alcohols having an aromatic ring such as alkyl alcohols such as tertanol, hexanol, heptanol and octanol, pendyl alcohol, phenoxyethanol and phenylaminoethyl alcohol, and examples of the aliphatic hydrocarbons include n-hexanol and
Methyl amyl alcohol, 2-ethyl butanol, n-
Heptanol, 3-heptanol, 2-octanol,
2-ethylhexanol, nonanol, 3,5,5-trimethylhexanol, n-decanol, undecanol, n-dodecanol, trimethylnonyl alcohol,
Tetradecanol, heptadecanol, 2-ethyl-
1,3-hexanediol, 1,6-hexanediol, 2,5-hexanediol, 2,4-hexanediol, 1,8-octanediol, 1,9-nonanediol, 1,10-decanediol, etc. No. The content of these lubricants is suitably from 0.1 to 50% by weight, more preferably from 0.5 to 3.0% by weight in the composition.

In addition to the above components, if necessary, lubricants such as ethylene glycol, propylene glycol, triethylene glycol, butylene glycol, hexylene glycol, diethylene glycol, dipropylene glycol,
Glycerin, trimethylolpropane, diglycerin and the like are preferably used. These wetting agents may be used alone or in combination of two or more. Generally, it is preferred that the wetting agent be used in an amount of 1 to 25% by weight.

Various hydrophilic polymers can be contained for the purpose of improving the film-forming properties.

As such a hydrophilic polymer, any polymer which can be conventionally used in a gum solution can be suitably used. For example, gum arabic, cellulose derivatives (eg, carboxymethylcellulose, carboxyethylcellulose, methylcellulose, etc.) and their modified products, polyvinyl alcohol and its derivatives, polyvinylpyrrolidone, polyacrylamide and its copolymers, vinyl methyl ether / maleic anhydride copolymer Examples include a polymer, a vinyl acetate / maleic anhydride copolymer, and a styrene / maleic anhydride copolymer.

The gum solution is generally prepared in an acidic pH range of 3
It is more advantageous to use in the range of -6. In order to adjust the pH to 3 to 6, it is generally adjusted by adding a mineral acid, an organic acid or an inorganic salt to the gum solution. The addition amount is 0.01 to 2
% By weight is preferred. For example, mineral acids include nitric acid, sulfuric acid, phosphoric acid, and metaphosphoric acid. Examples of the organic acid include citric acid, acetic acid, oxalic acid, malonic acid, p-toluenesulfonic acid, tartaric acid, malic acid, lactic acid, levulinic acid, phytic acid, and organic phosphonic acid. Further, as inorganic salts, magnesium nitrate, monobasic sodium phosphate,
Examples include dibasic sodium phosphate, nickel sulfate, sodium hexamethanoate, and sodium tripolyphosphate. At least one kind or two or more kinds of mineral acids, organic acids or inorganic salts may be used in combination.

An antiseptic, an antifoaming agent and the like can be added to the gum solution. For example, as a preservative, phenol or a derivative thereof, formalin, imidazole derivative, sodium dehydroacetate, 4-isothiazolin-3-one derivative, benzoisothiazolin-3-one, benztriazole derivative, amidizing anidine derivative, quaternary ammonium salt, pyridine, Derivatives such as quinoline and guanidine, diazine, triazole derivative, oxazole,
Oxazine derivatives and the like. The preferred amount is
It is an amount that exerts a stable effect on bacteria, molds, yeasts, etc., and varies depending on the kind of bacteria, molds, yeasts, but 0.01 to 4% by weight based on the plate surface protective agent at the time of use. The range is preferable, and it is preferable to use two or more preservatives in combination so as to be effective against various molds and sterilization.
Further, as the defoaming agent, a silicone defoaming agent is preferable. Among them, any of emulsification dispersion type and solubilization can be used. Preferably 0.01 to 1.0% by weight based on the gum solution at the time of use
Is optimal.

Further, a chelate compound may be added. Preferred chelating compounds include, for example, ethylenediaminetetraacetic acid, its potassium salt, its sodium salt;
Diethylenetriaminepentaacetic acid, its potassium salt, its sodium salt; triethylenetetraminehexaacetic acid,
Its potassium salt, its sodium salt, hydroxyethylethylenediaminetriacetic acid, its potassium salt, its sodium salt: nitrilotriacetic acid, its sodium salt; 1
-Hydroxyethane-1,1-diphosphonic acid, its potassium salt, its sodium salt; and organic phosphonic acids or phosphonoalkanetricarboxylic acids such as aminotri (methylenephosphonic acid), its potassium salt, its sodium salt and the like. I can do it. Organic amine salts are also effective in place of the sodium and potassium salts of the above chelating agents. These chelating agents are selected from those which are stably present in the gum solution composition and do not inhibit printability. The addition amount is 0.001 to 1.0% by weight based on the post-treatment agent used.
Is appropriate.

In addition to the above components, a sensitizing agent may be added if necessary. For example, hydrocarbons such as turpentine oil, xylene, toluene, loheptane, solvent naphtha, kerosene, mineral spirit, and a petroleum fraction having a boiling point of about 120 ° C. to about 250 ° C., for example, dibutyl phthalate, dihebutyl phthalate, di-n-octyl Phthalate diester agents such as phthalate, di (2-ethylhexyl) phthalate, dinonyl phthalate, didecyl phthalate, dilauryl phthalate, butyl benzyl phthalate and the like, for example, dioctyl adipate, butyl glycol adipate, dioctyl azelate, dibutyl sebacate, di ( Aliphatic dibasic acid esters such as 2-ethylhexyl) sebacate and dioctyl sebacate, for example, epoxidized triglycerides such as epoxidized soybean oil, for example, tricresyl phosphate, trioctyl phosphate Feto,
The solidification point of phosphoric esters such as trischlorethyl phosphate, for example, benzoic esters such as benzyl benzoate, is 15 ° C. or less, and the boiling point at 1 atm is 300 ° C.
The above plasticizer is included.

Further, caproic acid, enanthic acid, caprylic acid, helargonic acid, capric acid, undecylic acid, lauric acid, tridecylic acid, myristic acid, pentadecylic acid,
Saturated fatty acids such as palmitic acid, heptadecylic acid, stearic acid, nonadecanoic acid, arachiic acid, behenic acid, lignoceric acid, cerotic acid, heptacosanoic acid, montanic acid, melicic acid, laccelic acid, isovaleric acid, and acrylic acid, crotonic acid, Such as isocrotonic acid, undecylenic acid, oleic acid, elaidic acid, setreic acid, nilucic acid, butesidic acid, sorbic acid, linoleic acid, linolenic acid, arachidonic acid, propiolic acid, stearolic acid, succinic acid, tallic acid, and ricanoic acid Also included are unsaturated fatty acids. More preferably a fatty acid that is liquid at 50 ° C.,
More preferably, it has 5 to 25 carbon atoms, and most preferably, it has 8 to 21 carbon atoms. These sensitizers can be used alone or in combination of two or more. A preferred range for the amount used is 0.01 to 10% by weight of the post-treatment agent, and a more preferred range is 0.05 to 5% by weight. The above-mentioned sensitizing agent may be prepared by emulsifying and dispersing the post-treatment agent, and may be contained as an oil phase thereof, or may be solubilized with the aid of a solubilizing agent.

The photosensitive lithographic printing plate (hereinafter, PS plate) which can be developed by the developing method of the present invention is:
It may be a negative PS plate or a positive PS plate. PS
The plate has a photosensitive layer provided on a support, and in the case of a negative PS plate, a negative photosensitive layer is provided on the support,
In a positive PS plate, a positive photosensitive layer is provided on a support.

Examples of the photosensitive material for forming the negative photosensitive layer include photosensitive materials such as photopolymerization type and / or photocrosslinking type and / or diazo type.

The photopolymerizable photosensitive material that can be used in the present invention is not particularly limited, and any known photopolymerizable photosensitive material can be used, but is preferably used in the present invention. Examples of the photosensitive material include (a) a vinyl monomer having at least two terminal vinyl groups, (b)
A photosensitive material composed of a photopolymerization initiator and a polymer compound as a binder (c) can be exemplified. (A), (b) and (c) are such that (a) is 20 to 80% by weight and (b) is 0.1 to 2 in the solid content of the photopolymerizable photosensitive material.
0% by weight and (c) are preferably contained in 20 to 80% by weight. Further, these photopolymerizable photosensitive materials may contain a diazo compound, a thermal polymerization inhibitor, a plasticizer, a dye, a pigment, and the like.

The photo-crosslinkable photosensitive material that can be used in the present invention is not particularly limited, and any known photo-crosslinkable photosensitive material can be used. An example of a photosensitive material that is preferable for the above is a photosensitive material containing a compound having a photodimerizable group. These compounds having a photodimerizable group can be used alone or as a mixture of two or more compounds. It is preferable to use a sensitizer in the photocrosslinkable photosensitive material in addition to the compound having a group capable of photodimerization. In addition, the photocrosslinkable photosensitive material may be mixed with an inorganic powder or a polymer, if necessary, for the purpose of imparting shape retention.

Further, the diazo photosensitive material which can be used in the present invention is not particularly limited, and any known diazo photosensitive material can be used. As these diazo compounds, a diazo resin which is a condensate of p-diazodiphenylamine and formaldehyde is typical, and those which are insoluble in water and soluble in an organic solvent are preferable. For example, JP-B-47-1167 and JP-B-47-1167. 57-4
Water-insoluble and ordinary organic solvent-soluble compounds described in No. 3890 and the like. In the present invention, the diazo resin is usually contained in the solid content of the photosensitive composition in an amount of 1 to 1.
The content may be 20% by weight, preferably 2 to 10% by weight.

In the present invention, the negative PS plate is obtained by forming a photosensitive layer containing the above-mentioned photopolymerizable type and / or photocrosslinkable type and / or diazo type photosensitive material on a support.

Next, the orthoquinonediazide compound used in the positive PS plate of the present invention will be described. In the present invention, the positive PS plate is obtained by forming a photosensitive layer containing an orthoquinonediazide compound as a photosensitive material on a support. Examples of the orthoquinonediazide compound include an ester compound of o-naphthoquinonediazidesulfonic acid and a polycondensation resin of phenols and aldehydes or ketones. Further, examples of the o-quinonediazide compound include the following compounds described in JP-A-58-43451.

That is, for example, known compounds such as 1,2-benzoquinonediazidosulfonic acid ester, 1,2-naphthoquinonediazidosulfonic acid ester, 1,2-benzoquinonediazidosulfonic acid amide, and 1,2-naphthoquinonediazidosulfonic acid amide. 1,2-quinonediazide compounds, more specifically J. Kosar (J. Kosa)
r) “Light Sensitive Systems” (“Li
ght-Sensitive Systems ") 3rd
39-352 (1965), "Photoresist" (Photoresist) No. 50 by John Wiley & Sons (New York) or WS De Forest. Vol., (1975)
), 1,2-benzoquinonediazide-4-sulfonic acid phenyl ester, 1,2,2, described in McGraw-Hill (New York).
1 ', 2'-di- (benzoquinonediazide-4-sulfonyl) -dihydroxybiphenyl, 1,2-benzoquinonediazide-4- (N-ethyl-N-β-naphthyl)-
Sulfonamide, 1,2-naphthoquinonediazide-5
Cyclohexyl sulfonic acid ester, 1- (1,2-naphthoquinonediazide-5-sulfonyl) -3,5-dimethylpyrazole, 1,2-naphthoquinonediazide-5
Sulfonic acid-4 ″ -hydroxydiphenyl-4 ″ -azo-β-naphthol ester, N, N-di- (1,2-naphthoquinonediazido-5-sulfonyl) -aniline,
-(1,2-naphthoquinonediazide-5-sulfonyloxy) -1-hydroxy-anthraquinone, 1,2-naphthoquinonediazide-5-sulfonic acid-2,4-dihydroxybenzophenone ester, 1,2-naphthoquinonediazide-5 Sulfonic acid-2,3,4-trihydroxybenzophenone ester, condensate of 2 mol of 1,2-naphthoquinonediazide-5-sulfonic acid chloride and 1 mol of 4,4'-diaminobenzophenone, 1,2-naphthoquinonediazide-5 -2 moles of sulfonic acid chloride and 4,
4'-dihydroxy-1,1'-diphenylsulfone 1
Mol condensate, condensate of 1 mol of 1,2-naphthoquinonediazide-5-sulfonic acid chloride and 1 mol of purprogalin, 1,2 such as 1,2-naphthoquinonediazide-5- (N-dihydroabiethyl) -sulfonamide A 2-quinonediazide compound can be mentioned. In addition, Tokiko Sho37
-1953, 37-3627 and 37-1310
No. 9, No. 40-26126, No. 40-3801, No. 45-5604, No. 45-27345, No. 51-1
No. 3013, JP-A-48-96575, JP-A-48-63
Nos. 1, 802, 48-63803, etc.
-Quinonediazide compounds can also be mentioned.

In the present invention, each of the above compounds may be used alone as the o-quinonediazide compound,
Further, two or more kinds may be used in combination. It is preferable to mix an alkali-soluble resin in a photosensitive layer containing an orthoquinonediazide compound as a photosensitive material. Examples of these alkali-soluble resins include novolak resins, vinyl polymers having a phenolic hydroxyl group, and JP-A-55-578.
No. 41, a condensation resin of a polyhydric phenol with an aldehyde or ketone, and the like.

Examples of the novolak resin include phenol-formaldehyde resin, cresol-formaldehyde resin, phenol-cresol-formaldehyde copolycondensation resin described in JP-A-55-57841, and JP-A-55-57841. And a copolycondensation resin of p-substituted phenol and phenol or cresol and formaldehyde as described in JP-A-127553.

The molecular weight of the novolak resin (polystyrene standard)
Quasi) preferably has a number average molecular weight Mn of 3.00 × 10
^Two~ 7.50 × 10^Three, Weight average molecular weight Mw is 1.00 ×
10 ^Three~ 3.00 × 10^Four, More preferably Mn is 5.0.
0x10^Two~ 4.00 × 10^Three, Mw is 3.00 × 10^Three
~ 2.00 × 10^FourIt is. The above novolak resin alone
May be used, or two or more kinds may be used in combination.
The proportion of the novolak resin in the photosensitive composition is 5 to 9
5% by weight is preferred.

The proportion of the orthoquinonediazide compound in the photosensitive layer is preferably from 6 to 60% by weight, particularly preferably from 10 to 50% by weight. If necessary, a plasticizer, a surfactant, an organic acid, an acid anhydride and the like can be added to the photosensitive layer containing the orthoquinonediazide compound as a photosensitive material. Furthermore, in the present invention, a photosensitive layer containing an orthoquinonediazide compound as a photosensitive material may be provided with, for example, p-tert-butylphenol formaldehyde resin, pn-octylphenol in order to improve the oil sensitivity of the photosensitive composition. A sensitizing agent such as a formaldehyde resin or a resin in which these resins are partially esterified with an o-quinonediazide compound can also be added.

In the present invention, a visible image is formed on the photosensitive layer containing a photopolymerizable and / or photocrosslinkable photosensitive material and the photosensitive layer containing an orthoquinonediazide compound as a photosensitive material. Printout materials can be added.

The printout material is used together with a compound that generates an acid or a free radical upon exposure, and changes its color tone by interacting with an acid or a free radical generated from the compound upon exposure to form a color image. For the printout material, a dye is used which changes its color tone by interacting with the above-mentioned acid or free radical generated by exposure. As the dye, those which change color tone by reacting with a free radical or acid can be preferably used. Here, the term “color tone changes” includes both a change from colorless to a color tone and a change from color to colorless or a different color tone. Preferred dyes are those that form a salt with an acid to change the color tone.

Various additives can be further added to the photosensitive layer. For example, alkyl ethers (for example, ethylcellulose and methylcellulose) for improving coating properties, fluorine-based surfactants, and nonionic surfactants [for example, Pluronic L-64 (Asahi Denka Co., Ltd.)
Plasticizer (for example, butylphthalyl, polyethylene glycol, tributyl citrate, diethyl phthalate, dibutyl phthalate, dihexyl phthalate, dioctyl phthalate,
Tricresyl phosphate, tributyl phosphate, trioctyl phosphate, tetrahydrofurfuryl oleate, oligomers and polymers of acrylic acid or methacrylic acid), and a sensitizing agent for improving the lipophilicity of the image area (for example, JP-A-55 / 55) No.-527, a half-esterified product of a styrene-maleic anhydride copolymer with an alcohol), a stabilizer [for example, phosphoric acid, phosphorous acid, organic acids (citric acid, oxalic acid, benzenesulfonic acid, naphthalenesulfonic acid) ,
4-methoxy-2-hydroxybenzophenone-5-sulfonic acid, tartaric acid, etc.)] and development accelerators (eg, higher alcohols, acid anhydrides, etc.). The amount of these additives varies depending on the purpose of use, but is generally 0.01 to 30% based on the total solid content of the photosensitive composition.
% By weight.

In the present invention, a negative PS having a photosensitive layer containing a photopolymerizable and / or photocrosslinkable photosensitive material.
A positive PS plate having a plate and a photosensitive layer containing an orthoquinonediazide compound as a photosensitive material is formed by applying and drying a coating solution obtained by dissolving each of the necessary components described above in a solvent on a support surface to form a photosensitive layer. Can be manufactured.

As a coating method, conventionally known methods, for example, spin coating, wire bar coating, dip coating, air knife coating, roll coating, blade coating, curtain coating and the like can be used. The concentration of the coating solution is 1 to 50
It is desirable to be in the range of weight%. In this case, the coating amount of the coating solution is generally 0.2 to 10 g / m ² as a solid content.
It should be about the degree.

As the support, paper, plastic (eg, polyethylene, polypropylene, polystyrene, etc.) laminated paper, a metal plate such as aluminum (including aluminum alloy), zinc, copper, etc., cellulose diacetate, cellulose triacetate Plastic films such as cellulose propionate, polyethylene terephthalate, polyethylene, polypropylene, polycarbonate, polyvinyl acetal, paper or plastic films on which the above-mentioned metals are laminated or vapor-deposited, aluminum or chrome-plated steel sheets, etc. Among them, aluminum and an aluminum-coated composite support are particularly preferable.

The surface of the aluminum material is desirably subjected to a roughening treatment (graining) for the purpose of increasing water retention and improving adhesion to the photosensitive layer. Examples of the roughening method include generally known chemical graining, mechanical graining and electrochemical graining, alkali etching for chemical graining, and brush polishing for mechanical graining. The ball polishing method, the liquid honing method, and the sand blasting method are used, and the electrochemical graining includes an electrolytic etching method and a combination thereof.

In the invention corresponding to the second aspect, it is particularly important to apply mechanical graining (mechanical polishing) and electrochemical graining (electropolishing). Polishing method and liquid honing. As the electrochemical graining, the electrolytic etching method uses an aqueous solution containing an acid, an alkali or a salt thereof or an aqueous solution containing an organic solvent, and among these, an electrolytic solution containing hydrochloric acid, nitric acid or a salt thereof. Is preferred. Further, the roughened aluminum plate is desmutted with an acid or alkali aqueous solution as required. The aluminum plate thus obtained is desirably subjected to anodic oxidation treatment, and particularly preferably a method of treating with a bath containing sulfuric acid or phosphoric acid. Further, if necessary, surface treatment such as treatment with alkali silicate or hot water, or immersion in a water-soluble polymer compound or an aqueous solution of potassium fluorozirconate can be performed.

On the back surface of the support, a coating layer made of a metal oxide obtained by hydrolysis and polycondensation of an organic metal compound or an inorganic metal compound or an organic polymer is used to suppress the elution of the aluminum anodic oxide film. It is preferable to provide a coating layer made of a compound (hereinafter, referred to as a back coat layer).

The back coat layer may be used in such an amount that the elution of aluminum is suppressed during development, and the back coat layer may be used in an amount of 0.001 to 10 g.
/ M ² is preferably applied, more preferably,
0.01 to 1 g / m ² , and 0.02 to 0.1 g / m ²
Is most preferred.

Various methods can be applied as a method for coating the back coat layer on the back surface of the aluminum support.
The most preferable method for securing the above-mentioned coating amount is a method of preparing a coating liquid for the back coat layer, coating and drying.

In a negative PS plate having a photosensitive layer containing a photopolymerizable and / or photocrosslinkable photosensitive material on a support, in order to prevent polymerization inhibition by oxygen in the air, for example, polyvinyl A protective layer made of a polymer having excellent oxygen barrier properties such as alcohols and acidic celluloses may be provided.

The PS plate is exposed through a transparent original having a line image, a halftone image and the like. As a light source of active light suitable for exposure, a carbon arc lamp, a mercury lamp, a xenon lamp, a metal halide lamp, a strobe, and the like can be given.

The photosensitive PS plate exposed as described above is subjected to development processing using the developer of the above-mentioned claim 1 and at a transport speed of a development processing apparatus of 2000 mm / min or more, as described later. As a result, a PS plate free from the phenomenon of red tint and remaining of a ballpoint pen can be obtained. Further, the PS plate (mechanical graining and electrochemical graining on the support) exposed as described above is applied to the developing plate using the above-mentioned developing solution of the present invention, and as described later. PS with improved performance, such as opening of fine lines and prevention of background contamination, by performing development processing at a transport speed of 2000 mm / min or more.
A plate is obtained.

Further, by making the transport mode of the developing apparatus horizontal, the diffusion of the developing solution and the hindrance of the details of the image portion are eliminated, and a higher quality PS plate can be obtained.

[2] Development Processing Apparatus Hereinafter, the processing method of the PS plate and the PS according to the embodiment of the present invention will be described.
The plate processing apparatus will be described with reference to the drawings. Note that the present invention is not limited to this embodiment. FIG. 1 is a sectional view showing the structure of an example of a PS plate processing apparatus according to the present invention, FIG. 2 is a sectional view showing the front structure of the developing unit shown in FIG. 1, and FIG. 4A and 4B are cross-sectional views showing another example of the PS plate processing apparatus of the present invention.

In the PS plate processing apparatus of FIG. 1, when the PS plate 10 subjected to image exposure is inserted from the insertion table 1, the insertion of the PS plate is detected by the plate detecting means 2, and the operation of the PS plate processing apparatus is stopped. When it is started, it is sent to the developing section 3 and is developed by the developing solution. Next, it is conveyed to the water washing section 4 where it is processed, further conveyed to the gum processing section 5 where the gum solution is applied, and further conveyed to the drying section 6 where it is dried and used as a PS plate. This is the same as the case of the PS plate processing apparatus described in JP-A-6-236041 and JP-A-3-59666.

The image exposure of any of the PS plates 10 is performed through a transparent original drawing having a line image or a halftone image from a light source such as a carbon arc lamp, a mercury lamp, a metal halide lamp, a xenon lamp, a chemical lamp, and a tungsten lamp. This is done by light.

The developing solution in the developing section 3 will be described. The developing solution contains an alkali metal silicate corresponding to claim 1 and has an SiO ₂ / M value in the range of 0.6 or less. A developer or the developer of the present invention is used.

Next, the replenisher will be described. As the replenisher replenished to the developer in order to recover the deterioration of the developing ability due to the use of the developer, etc., the concentration of the alkali agent containing the alkali metal silicate is determined by the concentration of the developer. The above alkaline aqueous solution,
Preferably, the SiO ₂ / M value is in the range of 0.6 or less, the content of SiO ₂ is 0.5 to 7% by weight, and the concentration of the alkali metal silicate is not less than the concentration in the developer. Aqueous solution, and optionally potassium hydroxide, sodium hydroxide, lithium hydroxide, sodium phosphate tribasic, sodium phosphate dibasic, potassium phosphate tribasic, potassium phosphate dibasic, ammonium phosphate tribasic, Inorganic alkali agents such as ammonium diphosphate, sodium metasilicate, sodium bicarbonate, sodium carbonate, potassium carbonate, and ammonium carbonate; and organic alkali agents such as mono-, di- or triethanolamine, tetraalkylammonium hydroxide, and organic ammonium silicate From 0.05 to 2
An alkaline aqueous solution which is added and dissolved in a range of 0% by weight and whose pH is higher than the pH of the developing solution, preferably higher than the pH of the developing solution by 0.5 or more is used.

Next, water or water containing a surfactant or the like is used as the rinsing liquid in the water washing section 4. A liquid containing gum arabic, a starch derivative, or the like is used as the gum solution in the gum processing section 5.

Before the operation of the processing apparatus, the above-mentioned replenisher and dilution water are supplied from the replenisher tank 11 and the diluting water tank 12 to the developing tank 30 of the developing section 3 at an appropriate ratio, respectively, and the developing solution is supplied at a predetermined rate. Store to a concentration of. A floating lid 39 is floated on the stored developer in order to reduce the contact area with air and prevent oxidative deterioration. The temperature of the developer stored in the developing tank 30 is adjusted to a predetermined temperature by a heater (not shown), and the PS plate 10 causes the developing section 3 to move through the entrance transport roller 3.
2. While being transported by the outlet transport roller 38, the developing tank 3
The developer whose temperature is controlled from the shower pipe 31 at the end of the branch pipe 16 through the filter 13, the pump 14, the head chamber 15, and the branch pipe 16 from the entrance of the circulation path opened at the bottom of the PS plate 10 is used for image exposure of the PS plate 10. It is jetted and supplied to the surface and developed.

The used developer is again stored in the developing tank 30 and circulated for use. The developer is supplied to the PS plate 10 through a shower pipe 31 for injection.
It should be noted that the coating may be supplied from a slit nozzle.

If the developing solution in the developing tank 30 is circulated and used, the developing performance of the developing solution is reduced due to the elution or oxidation of the photosensitive resin of the PS plate 10 or the aluminum of the support. The replenisher is replenished according to the processed amount of the PS plate and the processing time in order to recover the pressure. If the developing performance of the developing solution cannot be recovered even by replenishing the replenishing solution, the developing solution in the developing section 3 is sent to the waste liquid processing tank 18 via the valve 17 to clean the developing section 3 and the developing section 3 is cleaned. After supplying the developing solution to the developing tank 30, the developing is restarted. At this time, as a method of examining the developing performance of the developing solution, it is preferable to determine the developing performance according to the throughput of the PS plate. As for the detection of the processing amount of the PS plate, the processing amount may be detected from the size of the PS plate by the plate detecting means 2 provided near the entrance of the development processing unit 3. In addition, a member such as the developing tank 30 and the entrance conveyance roller 32 of the developing processing section 3 to which the sludge is easily adhered has a linear expansion coefficient β = (dL / dt) / L ₀ (where L is the length, t Is a temperature, and L ₀ is a length of 0 ° C.). Linear expansion coefficient β
By heating a member made of a material having a large diameter, the adhered sludge can be easily removed and removed.
Further, OH in the developer electrolytically part that stores a developing solution such as a developing tank 30 of the developing unit 3 ^- if to maintain suitable high pH Increase of sludge in that part Not only can the generation be suppressed, but also its high pH
The generation of sludge at the portion where the developer circulates can be suppressed.

The present invention is not limited to the above-described example in which the developer is circulated and used, and a method in which the developer is supplied in a necessary amount to a PS plate for processing and disposable may be employed. Although there is a problem that the consumption of the developing solution tends to increase for good development, the developing time is always shortened and constant because the developing is always performed with a new solution, and the developing solution is controlled by the flow of the developing solution. This solves the problem of sludge generation due to dissolved resin or oxidation, and is excellent in terms of stable development performance and simplified maintenance such as cleaning of the apparatus. Also in this method, the supply amount of the developer necessary for the PS plate is determined based on information such as the size, maker, and type of the PS plate, so that the development can be performed with a relatively small consumption of the developer. Can be.

Further, when the PS plate 10 passes between the rotating brush 35 and the lower receiving guide 34, the rotating brush 35 slides the surface of the image exposure to remove the photosensitive resin dissolved in the developing solution from the surface. It has been removed. Reference numeral 36 denotes a cover for the rotating brush. Further, a floating lid 39 is provided in the developing tank 30 so that the developing solution does not come into contact with the outside air. However, the developing solution in the portion where shower development is performed is also applied to the developing processing unit 3 as shown in FIG. A blocking member 7 for blocking outside air is provided. The blocking member 7 is a cover made of metal or resin, and the periphery of the cover is sealed with a sealing member 71 such as a rubber packing or the like to prevent deterioration of the developer due to contact with the outside air. The blocking member 7 also functions to prevent the evaporation of the developer and prevent the liquid from splashing at the time of shower development, in addition to the deterioration of the developer. The moisture evaporated in the developing section 3 is condensed on the inner surface of the blocking member 7,
By returning to the inside of the processing tank through the inclination of the inner surface or the like, the developer is prevented from being concentrated by evaporation.

The developing unit 3 will be described in detail with reference to FIG.
When it is inserted into the development processing section from above, it is conveyed along a PS plate conveyance path A which is formed substantially horizontally as indicated by a dashed line in FIG.
While being supported by the guide member 9, the entrance conveyance roller 32,
The sheet is conveyed by the exit conveying roller 38 and moves to the next step from the PS plate development processing section exit 82. While the PS plate is being conveyed by the entrance conveyance roller 32 and the exit conveyance roller 38, the developer is supplied from the shower pipe 31 toward the image-exposed surface of the PS plate as described above, and is subjected to shower development. Then, the image exposure surface of the PS plate is rubbed by the rotating brush 35, and the photosensitive resin dissolved in the developer is removed from the surface. An aperture roller 8 may be provided during the shower development. If the squeeze roller 8 is driven by the same drive shaft as the transport roller, it is not necessary to provide a new drive source. By providing the squeezing roller 8, the developer which has reacted with the photosensitive layer on the PS plate is wiped off once and a new liquid is supplied, whereby the reaction can be accelerated in a shorter time. The squeeze roller 8 can obtain the same effect by using a blade or air pressure. In addition, in order to promote the reaction between the photosensitive layer and the developer on the PS plate, it is necessary to increase the number of shower pipes, or to shake the PS plate to stir the developer on the plate. it can.

Further, a bat 37 for dipping the lower part of the lower roller of each roller pair may be provided below the inlet conveying roller 32, the outlet conveying roller 38 and the squeezing roller 8. This is provided to prevent sludge from sticking to a transport roller or the like, and to always wet the roller to prevent sticking of the developer. The vat 37 contains a developer and dilution water, and the developer and dilution water can be circulated and used. The developed PS plate is transported to the rinsing section 4 by the exit transport roller 38.

Returning to FIG. 1, the rinsing section 4 will be described. The rinsing tank 40 of the rinsing section 4 is also supplied with a rinsing liquid from a rinsing liquid supply means (not shown) before starting the operation of the developing machine, and the rinsing liquid is supplied to a predetermined level. And the rinsing liquid is PS version 10
When the water passes through the rinsing section 4, the rinsing liquid is circulated and used at the terminal returning to the rinsing tank 40 through the pump 41 from the inlet opening at the bottom of the rinsing tank 40 and provided with a shower pipe 42. That is, the rinsing liquid is spray-supplied from the nozzle of the shower pipe 42 to the PS plate 10 fed by the conveying roller 43 in the washing tank 40, and the developing solution adhering to the PS plate 10 or the photosensitive resin dissolved in the developing solution. Are collected at the bottom of the washing tank 40, and are again jetted and supplied to the PS plate 10 from the nozzle of the shower pipe 42 through the rinse liquid circulation path. It is preferable that the total area of the blow-out holes of the shower pipe is set to 1/2 to 1/3 of the cross-sectional area of the pipe. When a predetermined number of PS plates 10 are rinsed with water and the cleaning ability is reduced by a developing solution or the like, the rinse liquid in the rinse processing unit 4 is further drained through the valve 44 without further development. The cleaning unit 4 is cleaned by dropping it to 45, and the development is restarted after the rinsing liquid is renewed. In the rinsing section 4, water containing water or a surfactant is used as rinsing water. As described above, the PS plate 10 washed in the water washing section 4 is sent to the gum processing section 5.

Next, the gum processing section 5 will be described. In the gum solution tank 50, the gum solution is supplied in advance from a gum solution supply means (not shown) and stored at a predetermined level. When the PS plate 10 is fed by the transport roller 53 in the gum processing section 5, the gum solution passes through the pump 51 from the inlet opened at the bottom of the gum solution tank 50 and returns to the gum solution tank 50 through the gum solution circulation path. PS plate 10 from the nozzle of the shower pipe 52 of the terminal
To supply. The PS plate 10 is transported by the transport roller 53, during which the gum solution from the gum solution tank 50 is applied from both sides of the PS plate 10 by a shower pipe 52,
The PS plate is transported to the drying unit 6 through the transfer roller 56.

Next, the drying section 6 will be described. The transfer section roller 56 and the conveying roller 62 are provided with gummed P
The roller is provided with a warp so that the area of contact until the S plate is dried is reduced. The discharge roller 63 is a cloth Molton roller. The PS plate 10 passes through the transfer roller 56 and enters the drying unit 6, and the PS plate 10 is sent by the conveying rollers 62 and 63, during which hot air from the air nozzle 61 hits the surface of the PS plate 10, Dry P
The S plate is discharged out of the processing apparatus. In addition, drying may be performed by irradiating infrared rays in addition to the warm air, and a stocker for stocking a PS plate (not shown) may be connected to the outlet of the processing apparatus.

Next, a PS plate processing apparatus showing another mode different from the above will be described. In the PS plate processing apparatus shown in FIG. 4, an insertion section I for inserting the PS plate 10, a development processing section 3 for development, a rinsing processing section 4 for rinsing, a gum processing section 5 for post-processing such as rinsing and gumming. Drying unit 6 for drying
It mainly comprises a control mechanism (not shown) for controlling the operation of the processing liquid feed pump and the like. Insertion part I,
An insertion table 1 for guiding the insertion of the PS plate 10, plate detection means 2, which is an optical sensor for detecting the insertion of the PS plate 10 by reflected light,
An inlet conveyance roller 32 for nipping and conveying the PS plate 10 is provided. The development processing unit 3 is configured to convey the PS plate 10 in a curved manner in the developing solution put in the developing tank 30 by the conveying roller pair 3a and the conveying roller 3b. During this, the developing solution in the developing tank 30 is sent to the shower pipe 31 by the pump 14, and the developing solution is sprayed on the photosensitive layer surface of the PS plate 10. Further, in the immersed state, the PS plate 10 is nipped by the plate pressing roller 3c and the rotating brush 35, and the surface thereof is rubbed by the rotating brush 35 to promote the development. The squeegee is transported to the washing section 4. The developer in the developing tank 30 is maintained in a predetermined temperature range by the heater H.

The replenishment of the developing solution in the developing tank 30 is performed by pumping the concentrated replenishing solution in the
a, the dilution water in the dilution water tank 12 is sent to the liquid preparation tank T by a pump 14b at a predetermined ratio, and mixed in the tank T to form a developing replenisher.
P being transported from the shower pipe 31 located immediately before
The developer is supplied onto the S plate 10 to replenish the developer in the developing tank 30. The developing solution overflowing from the developing tank 30 is returned to the developing tank 30 by a pump 14d, and further has a replenishing circuit (not shown) for replenishing the PS plate 10 in accordance with the processing of the PS plate 10. ing.

The rinsing section 4 includes a rinsing tank 4 for storing rinsing water.
0, pump 41, shower pipe 42, transport roller 43
Mainly consisting of Here, the water washing section 4
It is preferable to cover the developing unit 3 and the developing unit 3 with the same blocking member 7 to block from the outside air. Although not shown, by sealing the periphery as described with reference to FIG. 1, it is possible to further improve the airtightness.

The gum processing section 5 includes a gum solution tank 50 for storing a finisher solution (rinse solution, gum solution, etc.), a pump 51,
It mainly comprises a replenishing mechanism (not shown) for replenishing according to the processing of the shower pipe 52, the transport roller 53 and the PS plate 10. In the figure, * 1 and * 1, * 2 and *
2 are connected by piping. The drying section 6 mainly includes an air nozzle 61 and a transport roller 63.

A large number of plate detecting means 2 provided at the insertion portion I of the automatic developing machine are arranged at equal intervals over the width of the automatic developing machine. Is detected, and this detection signal is integrated by a replenishment circuit (not shown) to obtain an integration signal. The pump 14 (a, b, c) is replenished with a required replenishment amount proportional to the integrated area. It is configured to control operation. Further, it is preferable that the replenishment circuit has a function of replenishing a fixed amount of replenisher per unit time regardless of the processing of the PS plate.

As described above, the PS plate is developed in a compact developing section at high speed, that is, at 2000 mm / min or more. The time during which the photosensitive layer material, ball-point pen ink, etc. eluted in the developer stays on the grain surface of the support is short, and the ratio of exposure to the developing solution containing little retained matter increases, and these It is possible to prevent the retentate from being attached again. The replacement of the developing solution on the plate surface in the developing solution is quick, and the surface area of the support is large.
The effect of increasing the amount of adherence and the ability to apply hydrophilic treatment to the details of the plate surface is achieved, and the accompanying effect of reducing the amount of sludge eluted from the PS plate and prolonging the service life of the processing solution. It also has

Further, by making the transport type of the developing apparatus horizontal as shown in FIG. 1, it is possible to eliminate a decrease in the diffusion of the developing solution and obstruct the details of the image portion, thereby obtaining a higher quality printing plate. .

[0089]

EXAMPLES The present invention will be described below in detail with reference to examples, but embodiments of the present invention are not limited thereto.

<< Preparation of photosensitive lithographic printing plate >> (Preparation of support) Support 1 Aluminum plate having a thickness of 0.24 mm (JIS-105)
0) was immersed in a 10% aqueous sodium hydroxide solution at 85 ° C., degreased for 1 minute, and then washed with water. The degreased aluminum plate was immersed in a 25% aqueous 10% sulfuric acid solution for 1 minute, desmutted, and then washed with water. Next, this aluminum plate was placed in a 1.0% aqueous nitric acid solution at a temperature of 30 ° C., a current density of 50 A / dm ² and an electric quantity of 400 c / dm ^2.
The surface was electrochemically roughened to dm ² . afterwards,
Chemical etching was performed in a 50 ° C. 10% aqueous sodium hydroxide solution so that the amount of aluminum dissolved was 3 g / m ² , immersed in a 25 ° C. 10% nitric acid aqueous solution for 10 seconds, subjected to desmut treatment, and then washed with water. .

Then, anodizing treatment was performed for 1 minute at a current density of 2 A / dm ² in a 35% 20% aqueous sulfuric acid solution. Then, 3% in 80% aqueous 0.1% ammonium acetate solution
The support was immersed for 0 second, sealed, and dried at 80 ° C. for 5 minutes to obtain a support 1.

Support 2 After degreasing, mechanically roughening the surface using a nylon brush and a 400 mesh Pasmittens-water suspension, the amount of aluminum dissolved in a 50% 10% aqueous sodium hydroxide solution was 5 g / such that m ² performs chemical etching,
Hereinafter, the same treatment as that of the support 1 such as desmutting and electrochemical surface roughening was performed to prepare the support 2.

Next, a coating solution of a photosensitive composition having the following composition was applied to the surface of the obtained aluminum support using a wire bar, and dried at 80 ° C. for 2 minutes to obtain PS plates 1 and 2. At this time, the photosensitive composition coating solution was dried on a weight basis of 2.
It was adjusted to 0 g / m ² .

<< Coating Solution for Photosensitive Composition >> Polymer Compound 1 0.20 g Hydroxypropyl-β-cyclodextrin 0.20 g Novolak resin (molar ratio of phenol / m-cresol / p-cresol is 10/54/36) 6.70 g Condensate of pyrogallol acetone resin (Mw: 3000) and O-naphthoquinonediazide-5-sulfonyl chloride (esterification ratio 30%) 1.50 g Polyethylene glycol # 2000 0.20 g Victoria Pure Blue BOH (manufactured by Hodogaya Chemical Co., Ltd.) 0.08 g 2,4-bis (trichloromethyl) -6- (P-methoxystyryl) -S-triazine 0.15 g fluorinated surfactant FC-430 (manufactured by Sumitomo 3M) 0 0.03 g cis-1,2 cyclohexanedicarboxylic acid 0.20 g Ethyl ketone / propylene glycol monomethyl ether = 3/7 100 ml

[0095]

Embedded image

The obtained PS plates 1 and 2 were used as light sources at 2 k
Use a W metal halide lamp at 7 mW / cm ²
Exposure was performed by irradiating from a distance of 0 cm for 60 seconds. The exposed PS plates 1 and 2 were charged into the automatic developing machine 1 of FIG. 1 and the automatic developing machine 2 of FIG. A development process was performed. Incidentally, 25 L of the following developer was charged into the developing tank of the automatic developing machine, tap water was charged into the washing tank, and 10 L of the finisher gum solution was double-diluted to 10 L into the finisher tank to control the temperature. To clarify the effect of the invention,
Experimentally, the PS plate 1 exposed on the entire surface was processed without replenishment of 50 m ² , and the developer activity was set to a state lower than usual.

The transport speed is set to 1400 mm / min.
The development was performed at a rate of 0 mm / min, but an automatic developing machine in which the length of the development layer was changed so that the development time was 10 seconds was used, but only one simplified type is described in the drawings.

In an embodiment corresponding to the first, third, fourth and sixth aspects, the developing process is carried out according to the combinations shown in Table 1 for the transport speed, the developing solution and the automatic developing machine, respectively. As examples corresponding to and 6, the transport speed,
Each of the PS plate and the automatic developing machine was subjected to a developing process using a combination shown in Table 2.

<< Developer 1 >> 100 parts by weight of potassium A silicate (SiO ₂ /M=0.4, Si concentration 2 wt%) 86 parts by weight of potassium hydroxide 1114 parts by weight << developer 2 >> 100 parts by weight of potassium A silicate (SiO ₂ /M=0.7, Si concentration 2 wt%) Potassium hydroxide 38 parts by weight Water 1162 parts by weight << Finisher gum solution >> White dextrin 5.0 parts by weight Hydroxypropyl etherified starch 10 parts by weight Arabic gum 1.0 Parts by weight first ammonium phosphate 0.1 part by weight sodium dilauryl succinate 0.15 parts by weight polyoxyethylene nonyl phenyl ether 0.5 parts by weight ethylene glycol 1.0 parts by weight EDTA 0.005 parts by weight dehydroacetic acid 0.005 parts by weight Parts by weight Water 100.0 parts by weight After that, evaluation was made according to the following evaluation method.

<< Remaining ballpoint pen >> A load of 50,
The image was drawn using an oil-based ballpoint pen (manufactured by Pilot) over 75 and 100 g. After that, exposure under the conditions described above,
The sample was subjected to a development treatment, and the degree of remaining ball-point pen ink in the obtained sample was visually evaluated according to the following evaluation criteria.

◎: no residual ink ○: slight residual ink is visible △: residual ink is somewhat noticeable ×: many residual inks are noticeable

<< Redness >> Step tablet for sensitivity measurement (No. 2, manufactured by Eastman Kodak Co., Ltd., density difference 0.1)
Exposure and development processing was performed using 21 gray scales (5 steps each), and the halftone portions of the developed steps were visually evaluated according to the following evaluation criteria.

◎: No reddish at all ・ ・ ・: Reddish is slightly observed, but △: Reddish is slightly noticeable ×: Reddish is entirely visible << opening of fine line >> Using a UGRA plate control wedge, exposure and development processing was performed, and the reproducibility of the developed microline was visually evaluated.

<< Background Stain >> A print was prepared after development processing of 300 m ² , and printed by a printing machine GTO (manufactured by Heidelberg), and the presence or absence of stain was visually evaluated according to the following evaluation criteria.

◎: No dirt at all ○: Slight dirt but visible Δ: Dirt is somewhat noticeable ×: Many dirt is noticeable The results are shown below.

[0106]

[Table 1]

[0107]

[Table 2]

As is clear from Table 1, the developer No. 1 in which the developer 1 having an SiO ₂ / M value of 0.6 or less was used and the transport speed of the developing apparatus was 2000 mm / min or more was used. It can be seen that Nos. 1 and 2 have excellent performance in both ballpoint pen remaining and redness. In addition, in the case of using the automatic developing machine 1 having a horizontal transport form, 1 is the best evaluation.

As is clear from Table 2, the PS plate using the support subjected to mechanical polishing and electrolytic polishing was transported at a transport speed of 2.
No. conveyed at 000 mm / min or more. Samples Nos. 5 and 6 have excellent performance with respect to fine line openings and background stains, and it can be seen that they can sufficiently cope with high-definition printing. In addition, in the case of using the automatic developing machine 1 having a horizontal transport form, 5 is the best evaluation.

[0110]

According to the present invention, in the method of developing a PS plate, the phenomenon that the intermediately exposed portion, which occurs during the development processing, is stained red and the phenomenon of the ballpoint pen residue are improved, and the fine line openings and the background stain are improved. Has been achieved, and there is a remarkably excellent effect that a development processing method and a processing apparatus capable of coping with high-definition printing can be provided.

[Brief description of the drawings]

FIG. 1 is a configuration sectional view showing an example of a PS plate processing apparatus of the present invention.

FIG. 2 is a front sectional view showing a configuration of a development processing unit in FIG. 1;

3A and 3B are an enlarged configuration cross-sectional view and a side configuration cross-sectional view of a blocking member of the development processing unit in FIG.

FIG. 4 is a sectional view showing the configuration of another example of the PS plate processing apparatus of the present invention.

[Explanation of symbols]

 REFERENCE SIGNS LIST 1 insertion table 2 plate detection means 3 development processing part 4 washing processing part 5 gum processing part 6 drying part 7 blocking member 8 squeezing roller 9 guide member 10 PS plate 11 replenisher tank 12 dilution water tank 18 waste liquid processing tank 30 developing tank 31 shower Pipe 32 Inlet transport roller 34 Lower receiving guide 35 Rotary brush 38 Outlet transport roller 40 Rinse tank 71 Sealing member 81 PS plate development processing unit inlet 82 PS plate development processing unit outlet A PS plate conveyance path

Claims (6)

[Claims] Claims 1. An alkali metal silicate containing SiO 2
Using a developer having a value of ₂ (molar concentration of SiO ₂ ) / M (molar concentration of alkali metal) of 0.6 or less, a transport speed of 200
A method for developing a photosensitive lithographic printing plate, comprising processing the photosensitive lithographic printing plate with a developing device at 0 mm / min or more. 2. A photosensitive lithographic printing plate using a support subjected to at least mechanical polishing and electrolytic polishing is transported at a transport speed of 200
A method for developing a photosensitive lithographic printing plate, wherein the processing is performed with a developing apparatus at 0 mm / min or more. 3. The method for developing a photosensitive lithographic printing plate according to claim 1, wherein the transport mode of the developing apparatus is horizontal. 4. The method according to claim 1, further comprising an alkali metal silicate,
₂ (molar concentration of SiO ₂ ) / M (molar concentration of alkali metal) using a developer having a value of 0.6 or less, and a transport speed of 20
A photosensitive lithographic printing plate development processing apparatus, wherein the speed is at least 00 mm / min. 5. A photosensitive lithographic printing plate using a support which has been subjected to at least mechanical polishing and electrolytic polishing is transferred at a transport speed of 200
A photosensitive lithographic printing plate development processing apparatus which processes at a rate of 0 mm / min or more. 6. A photosensitive lithographic printing plate development processing apparatus according to claim 4, wherein the transporting form of the photosensitive lithographic printing plate development processing apparatus is horizontal.