JPH1091920A - Magneto-resistance effect type head - Google Patents
Magneto-resistance effect type headInfo
- Publication number
- JPH1091920A JPH1091920A JP8240383A JP24038396A JPH1091920A JP H1091920 A JPH1091920 A JP H1091920A JP 8240383 A JP8240383 A JP 8240383A JP 24038396 A JP24038396 A JP 24038396A JP H1091920 A JPH1091920 A JP H1091920A
- Authority
- JP
- Japan
- Prior art keywords
- layer
- magnetization
- fixed
- bias magnetic
- magnetic field
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
- 230000000694 effects Effects 0.000 title claims abstract description 12
- 230000005415 magnetization Effects 0.000 claims abstract description 175
- 230000005291 magnetic effect Effects 0.000 claims abstract description 144
- 230000005290 antiferromagnetic effect Effects 0.000 claims description 47
- 230000008878 coupling Effects 0.000 claims description 32
- 238000010168 coupling process Methods 0.000 claims description 32
- 238000005859 coupling reaction Methods 0.000 claims description 32
- 230000000903 blocking effect Effects 0.000 claims description 17
- 239000002885 antiferromagnetic material Substances 0.000 claims description 3
- 229910001030 Iron–nickel alloy Inorganic materials 0.000 description 25
- 101000606504 Drosophila melanogaster Tyrosine-protein kinase-like otk Proteins 0.000 description 16
- 235000012431 wafers Nutrition 0.000 description 13
- 238000010586 diagram Methods 0.000 description 10
- PNEYBMLMFCGWSK-UHFFFAOYSA-N aluminium oxide Inorganic materials [O-2].[O-2].[O-2].[Al+3].[Al+3] PNEYBMLMFCGWSK-UHFFFAOYSA-N 0.000 description 8
- 238000000034 method Methods 0.000 description 8
- 229920002120 photoresistant polymer Polymers 0.000 description 6
- 229910015136 FeMn Inorganic materials 0.000 description 5
- 230000005381 magnetic domain Effects 0.000 description 5
- 229910003289 NiMn Inorganic materials 0.000 description 4
- 238000010438 heat treatment Methods 0.000 description 4
- 230000001939 inductive effect Effects 0.000 description 4
- 238000010030 laminating Methods 0.000 description 3
- 229910018072 Al 2 O 3 Inorganic materials 0.000 description 2
- 229910010293 ceramic material Inorganic materials 0.000 description 2
- 239000002131 composite material Substances 0.000 description 2
- 239000004973 liquid crystal related substance Substances 0.000 description 2
- 238000007885 magnetic separation Methods 0.000 description 2
- 238000000059 patterning Methods 0.000 description 2
- 229920001187 thermosetting polymer Polymers 0.000 description 2
- 230000005330 Barkhausen effect Effects 0.000 description 1
- 229910018979 CoPt Inorganic materials 0.000 description 1
- 238000005530 etching Methods 0.000 description 1
- 238000010884 ion-beam technique Methods 0.000 description 1
- 230000005389 magnetism Effects 0.000 description 1
- 238000004519 manufacturing process Methods 0.000 description 1
- 239000000463 material Substances 0.000 description 1
- 238000004544 sputter deposition Methods 0.000 description 1
- 239000000758 substrate Substances 0.000 description 1
Landscapes
- Magnetic Heads (AREA)
- Hall/Mr Elements (AREA)
Abstract
Description
【0001】[0001]
【発明の属する技術分野】本発明は、磁気抵抗効果を利
用して磁気記録媒体(以下、単に「媒体」という。)か
ら情報を読み取る磁気抵抗効果型ヘッドに関する。BACKGROUND OF THE INVENTION 1. Field of the Invention The present invention relates to a magnetoresistive head for reading information from a magnetic recording medium (hereinafter, simply referred to as "medium") by utilizing a magnetoresistive effect.
【0002】[0002]
【従来の技術】媒体の小型化、大容量化にともなって、
読み取り用磁気ヘッドと媒体の相対速度が小さくなって
きていることから、再生出力が速度に依存しない磁気抵
抗効果型ヘッド(以下、「MRヘッド」と記す。)への
期待が高まっている。このMRヘッドについては、「I
EEE Trans.on Magn,.MAG7(1
970) 150」において「A Magnetore
sistivity Readout Transdu
cer」として論じられている。2. Description of the Related Art With the miniaturization and large capacity of media,
Since the relative speed between the read magnetic head and the medium has become smaller, expectations for a magnetoresistive head (hereinafter, referred to as “MR head”) whose reproduction output does not depend on the speed are increasing. Regarding this MR head, "I
EEE Trans. on Magn,. MAG7 (1
970) 150 ”and“ A Magnetore
Sistity Readout Transdu
cer ".
【0003】近年、このMRヘッドに対して更に大幅な
高出力化を実現できる巨大磁気抵抗効果が注目されてい
る。特に、電気抵抗の変化が2枚の隣接する磁性層の磁
化方向間の余弦と対応する(一般にスピンバルブ効果と
呼ばれる)磁気抵抗効果は、小さな動作磁界で大きな抵
抗変化をすることから、次世代のMRヘッドとして期待
されている。このスピンバルブ効果を用いたMRヘッド
については「IEEETrans.on Magn,.
Vol.30,No.6(1994)3801」におい
て「Design,Fabrication&Test
ing ofSpin−Valve Read Hea
ds for High Density Recor
ding」として論じられている。このなかで、スピン
バルブ効果を発生させる2枚の磁性層の内の一方の磁性
層の磁化は、この磁性層に反強磁性層を積層することに
より発生する交換結合によって、ヘッド感磁部に進入す
る媒体磁界の方向に実質的に磁化方向を揃えるようにし
て固定されている。そして、この磁化が固定された磁性
層とCu等の導電層を介して隣接するもう一方の磁性層
は、媒体磁界に対して自由に磁化方向を変えることがで
きる。In recent years, a giant magnetoresistive effect capable of realizing a much higher output with respect to this MR head has attracted attention. In particular, the magnetoresistive effect (generally called a spin valve effect) in which the change in electric resistance corresponds to the cosine between the magnetization directions of two adjacent magnetic layers causes a large change in resistance with a small operating magnetic field. Is expected as an MR head. For an MR head using the spin valve effect, see IEEE Trans. On Magn,.
Vol. 30, no. 6 (1994) 3801 ”in“ Design, Fabrication & Test ”.
ing of Spin-Valve Read Head
ds for High Density Recorder
ding ". Among them, the magnetization of one of the two magnetic layers that generate the spin valve effect is transferred to the head magnetic sensing part by exchange coupling generated by laminating an antiferromagnetic layer on this magnetic layer. It is fixed so that the magnetization direction is substantially aligned with the direction of the entering medium magnetic field. The other magnetic layer adjacent to the fixed magnetic layer via a conductive layer of Cu or the like can freely change the magnetization direction with respect to the medium magnetic field.
【0004】このスピンバルブ効果を用いたMRヘッド
においては、磁化が媒体磁界に対応して変化する磁性層
を単磁区化することが、バルクハウゼンノイズを抑制す
るためには必要不可欠である。この単磁区化の方法とし
て、「IEEE Trans.on Magn,.Vo
l.32,No.1(1996)149」において「S
pin−Valve Heads Utilizing
Antiferromagnetic NiO La
yers」として論じられている中でのFigure8
に示されている永久磁石層を用いた構造が用いられてき
た。Figure8を簡略化し、媒体と対向する面から
見た場合について層構成を示すと、図10のようにな
る。すなわち、媒体磁界に対応して変化する磁化フリー
層111は、永久磁石層115,116の磁化によって
縦バイアス磁界が印加されて単磁区化する。このよう
に、反強磁性層114、磁化固定層113、導電層11
2、磁化フリー層111からなるスピンバルブ積層膜を
中央の感磁部に相当する領域で全てパタン化し、その両
端に永久磁石層115,116を配置することによって
磁化フリー層111を単磁区化する方法が採られてき
た。なお、永久磁石層115,116には、電極層11
7,118が被着されている。In the MR head using the spin valve effect, it is indispensable to make the magnetic layer in which the magnetization changes according to the medium magnetic field into a single magnetic domain in order to suppress Barkhausen noise. As a method of forming the single magnetic domain, “IEEE Trans. On Magn,.
l. 32, no. 1 (1996) 149 "
pin-Valve Heads Utilizing
Antiferromagnetic NiO La
Figures 8 being discussed as “yers”
The structure using the permanent magnet layer shown in (1) has been used. FIG. 10 shows a simplified layer structure of FIG. 8 showing the layer configuration when viewed from the surface facing the medium. That is, the magnetization free layer 111 that changes in response to the medium magnetic field is applied with a longitudinal bias magnetic field by the magnetization of the permanent magnet layers 115 and 116 to be converted into a single magnetic domain. Thus, the antiferromagnetic layer 114, the magnetization fixed layer 113, the conductive layer 11
2. The spin valve laminated film composed of the magnetization free layer 111 is entirely patterned in a region corresponding to the central magnetically sensitive portion, and permanent magnet layers 115 and 116 are arranged at both ends to make the magnetization free layer 111 a single magnetic domain. The method has been taken. The permanent magnet layers 115 and 116 have the electrode layer 11
7, 118 are applied.
【0005】図10に示すようなスピンバルブ積層膜を
中央領域のみに形成する構造は、媒体磁界を感磁する中
央領域のみにスピンバルブ積層膜を存在させることによ
って、端部の感磁機能を全く無くしてノイズ発生を抑制
する方法として、従来のMRヘッドから継承されてきた
構造である。この構造については特開平3−12531
1号公報に記載されている。従来のMRヘッドでは、磁
気抵抗効果層(以下、「MR層」という。)の媒体磁界
に対する直線応答を実現するために、磁気分離層を介し
てMR層をバイアスするための軟磁性層が形成されてい
た。この軟磁性層は、上記のMR層、磁気分離層、軟磁
性層の3層構造体に電流を流した際のMR層を流れる電
流による磁界で一方向に磁化され、この磁化による磁界
でMR層をバイアスしていた。この3層構造体では、媒
体磁界を感磁する中央領域以外の端部領域に3層膜が存
在した場合、特に軟磁性層が外部磁界の影響を受けやす
いためにノイズの発生原因となっていた。これを解決し
たのが前記の特開平3−125311号公報に記載され
ている素子構造である。そして、スピンバルブヘッドに
おいても、当然のことながら、スピンバルブ積層膜を中
央領域のみに形成する特開平3−125311号公報の
構造によって、低ノイズ特性を実現できていた。In the structure in which the spin-valve laminated film is formed only in the central region as shown in FIG. 10, the spin-valve laminated film is present only in the central region where the magnetic field of the medium is susceptible. As a method of suppressing the generation of noise without any noise, the structure has been inherited from a conventional MR head. This structure is disclosed in Japanese Patent Application Laid-Open No. 3-12531.
No. 1 publication. In a conventional MR head, a soft magnetic layer for biasing an MR layer via a magnetic separation layer is formed in order to realize a linear response of a magnetoresistive layer (hereinafter, referred to as an “MR layer”) to a medium magnetic field. It had been. The soft magnetic layer is magnetized in one direction by a magnetic field caused by a current flowing through the MR layer when a current flows through the three-layer structure including the MR layer, the magnetic separation layer, and the soft magnetic layer. The layers were biased. In the three-layer structure, when a three-layer film exists in an end region other than the center region where the medium magnetic field is detected, the soft magnetic layer is particularly susceptible to an external magnetic field, which causes noise. Was. This is solved by the element structure described in the above-mentioned Japanese Patent Application Laid-Open No. 3-125311. In the spin valve head, of course, low noise characteristics have been realized by the structure disclosed in JP-A-3-125311 in which the spin valve laminated film is formed only in the central region.
【0006】[0006]
【発明が解決しようとする課題】しかしながら、この構
造では、本来単磁区化したい磁化フリー層のみならず、
反強磁性層との交換結合などによって永久磁石層による
バイアス磁界と垂直方向に磁化が固定されていなければ
ならない磁化固定層にも永久磁石による磁界が印加さ
れ、磁化固定層の磁化が、反強磁性層との交換結合して
いるにもかかわらず、徐々に永久磁石による磁界方向に
回転し、この結果、正常なスピンバルブ動作ができなく
なるという問題が発生することが明らかになってきた。
これは反強磁性体の保磁力が数千エルステッド以上と大
きく、永久磁石による磁界に比較して圧倒的に大きいこ
とから、従来考慮されてこなかった事柄である。However, in this structure, not only the magnetization free layer which is originally desired to be a single magnetic domain, but also
The magnetic field of the permanent magnet is also applied to the magnetization fixed layer in which the magnetization must be fixed in the direction perpendicular to the bias magnetic field of the permanent magnet layer by exchange coupling with the antiferromagnetic layer. Despite the exchange coupling with the magnetic layer, it has been clarified that the magnetic field gradually rotates in the direction of the magnetic field generated by the permanent magnet, and as a result, a problem that a normal spin valve operation cannot be performed occurs.
This is a matter which has not been considered in the past because the coercive force of the antiferromagnetic material is as large as several thousand Oersteds or more, and is overwhelmingly larger than the magnetic field generated by the permanent magnet.
【0007】[0007]
【発明の目的】そこで、本発明に係るMRヘッドは、磁
化固定層の磁化と直交する縦バイアス磁界によって磁化
固定層の磁化が徐々に変化し、最終的にスピンバルブ動
作が不可能となる、という問題を解決することを目的と
している。Therefore, in the MR head according to the present invention, the magnetization of the magnetization fixed layer is gradually changed by the longitudinal bias magnetic field orthogonal to the magnetization of the magnetization fixed layer, and finally the spin valve operation becomes impossible. It is intended to solve the problem.
【0008】[0008]
【課題を解決するための手段】本発明は、基体上に形成
され、媒体からの磁界を感磁する中央領域と、この中央
領域の両端面から中央領域を挟んで位置し、中央領域に
縦バイアスを印加する機能と電流を供給する機能とを有
する端部領域とを含む、スピンバルブ効果を用いたMR
ヘッドである。そして、媒体からの磁界によって磁化が
変化する磁化フリー層のみに縦バイアス磁界を印加する
ために、磁化フリー層が中央領域のみに存在するようパ
タン化し、媒体からの磁界方向に磁化が固定された磁化
固定層が中央領域及び端部領域全体に存在する構成と
し、この端部領域に中央領域に縦バイアスを印加する永
久磁石層などを積層し、中央領域の磁化フリー層の端部
に直接接続する構造とする。又は、磁化フリー層が中央
領域及び端部領域にわたり存在し、磁化固定層も中央領
域及び端部領域にわたり存在し、中央領域に縦バイアス
を印加する永久磁石層などが端部領域の磁化フリー層に
直接積層されている構造とする。According to the present invention, there is provided a central region formed on a substrate and susceptible to a magnetic field from a medium, and located on both sides of the central region with the central region interposed therebetween. MR using spin valve effect, including an end region having a function of applying a bias and a function of supplying a current
Head. Then, in order to apply a longitudinal bias magnetic field only to the magnetization free layer whose magnetization changes due to the magnetic field from the medium, the magnetization free layer was patterned so as to exist only in the central region, and the magnetization was fixed in the direction of the magnetic field from the medium. A configuration in which the magnetization fixed layer exists in the entire central region and the end region, and a permanent magnet layer for applying a longitudinal bias to the central region is laminated on the end region, and directly connected to an end of the magnetization free layer in the central region. Structure. Alternatively, the magnetization free layer exists over the center region and the end region, the magnetization fixed layer also exists over the center region and the end region, and a permanent magnet layer that applies a longitudinal bias to the center region has a magnetization free layer in the end region. To be directly laminated.
【0009】以上の構造によって、磁化固定層には縦バ
イアス磁界が印加されず、磁化フリー層にのみ縦バイア
ス磁界が印加されるスピンバルブヘッド構造が提供され
る。以上のスピンバルブヘッド構造に於いて、スピンバ
ルブを構成する積層膜における反強磁性層との交換結合
などによって磁化固定された磁性層が、媒体磁界を感磁
する中央領域のみならず、この中央領域に縦バイアスを
印加する機能や電流を供給する機能を有する端部領域に
も存在した場合、この端部領域からのノイズが実効的に
どの程度の影響を及ぼすかを明らかにする必要があっ
た。驚くべき事に、試作したスピンバルブヘッドの端部
領域からは中央領域に対して−50dB以下の小さい信
号を検知したにすぎず、端部領域に反強磁性層との交換
結合などによって磁化固定された磁性層が存在しても、
ヘッドの実用動作上、全く問題ないことが明らかになっ
た。According to the above structure, there is provided a spin valve head structure in which a longitudinal bias magnetic field is not applied to the magnetization fixed layer and a longitudinal bias magnetic field is applied only to the magnetization free layer. In the spin valve head structure described above, the magnetic layer whose magnetization is fixed by exchange coupling with the antiferromagnetic layer in the laminated film constituting the spin valve is not only located in the central region where the medium magnetic field is insensitive, but also in the central region. If there is also an edge region that has a function of applying a vertical bias to the region and a function of supplying current, it is necessary to clarify how much the noise from this edge region effectively affects. Was. Surprisingly, only a small signal of -50 dB or less was detected from the end region of the prototype spin valve head with respect to the center region, and magnetization was fixed to the end region by exchange coupling with an antiferromagnetic layer. Even if there is a magnetic layer
It became clear that there was no problem in practical operation of the head.
【0010】また、以上の構造によって、磁化固定層と
して、それ自体の保磁力によって磁化を固定できる永久
磁石の適用が現実的となる。すなわち、磁化固定の方法
として、従来からの反強磁性層と磁性層との積層膜の適
用と、永久磁石層との適用が可能である。また、縦バイ
アスを実現する方法として、永久磁石層の適用と、反強
磁性層と磁性層との積層膜の適用とが可能である。よっ
て、両者の掛け合わせで4通りの方法が可能となる。こ
の内、縦バイアスとスピンバルブの磁化固定の両方に、
反強磁性層と磁性層との積層膜を適用した場合、両者の
交換結合のブロッキング温度を変えることによって、互
いに直交する磁化を固定することができる。また、共に
永久磁石層を用いた場合、両者の保磁力を変えることに
よって、互いに直交する磁化を固定することができる。[0010] Further, the above structure makes it practical to apply a permanent magnet that can fix the magnetization by its own coercive force as the magnetization fixed layer. That is, as a method of fixing the magnetization, it is possible to apply a conventional laminated film of an antiferromagnetic layer and a magnetic layer and to apply a permanent magnet layer. As a method for realizing the longitudinal bias, a permanent magnet layer and a laminated film of an antiferromagnetic layer and a magnetic layer can be used. Therefore, four methods are possible by multiplying the two. Of these, both the longitudinal bias and the magnetization fixation of the spin valve,
When a laminated film of an antiferromagnetic layer and a magnetic layer is applied, magnetization perpendicular to each other can be fixed by changing the blocking temperature of exchange coupling between the two. In addition, when permanent magnet layers are used, magnetizations perpendicular to each other can be fixed by changing the coercive force of both.
【0011】[0011]
【0012】[0012]
【実施例1】図2を用いて、磁気ディスク用のMRヘッ
ドを作製した実施例を説明する。図2は媒体と対向する
面からMRヘッドを観察したときの層構成を示す。スラ
イダを構成するAl2 O3 −TiO複合セラミック材料
からなるウエハ101上に、スパッタ法により、膜厚2
μmのNiFeからなる磁気シールド層102を形成
し、膜厚0.08μmのアルミナからなる磁気ギャップ
層103上に、媒体磁界を感磁する中央領域105、及
び中央領域105に縦バイアス磁界と電流とを供給する
機能を有する端部領域104を形成した。Embodiment 1 An embodiment in which an MR head for a magnetic disk is manufactured will be described with reference to FIG. FIG. 2 shows a layer configuration when the MR head is observed from the surface facing the medium. On a wafer 101 made of an Al 2 O 3 —TiO composite ceramic material constituting a slider, a film thickness of 2
A magnetic shield layer 102 made of NiFe having a thickness of 0.08 μm is formed on a magnetic gap layer 103 made of alumina having a thickness of 0.08 μm. The end region 104 having a function of supplying the liquid crystal was formed.
【0013】中央領域105及び端部領域104の詳細
は図1のとおりである。磁気ギャップ層103上に、膜
厚30nmのNiOからなる反強磁性層4、膜厚3nm
のNiFeからなる磁化固定層3を順次積層した。この
とき磁化固定層3と反強磁性層4との間の交換結合によ
り、磁化固定層3を図面手前から奥の一方向に磁化固定
する。NiO膜とNiFe膜との交換結合のブロッキン
グ温度が180℃程度であるため、所望の磁化方向に直
流磁界を500エルステッドの強度で印加しながら20
0℃に1分程度加熱することにより、磁化固定した。The details of the central region 105 and the end region 104 are as shown in FIG. On the magnetic gap layer 103, an antiferromagnetic layer 4 of NiO having a thickness of 30 nm and a thickness of 3 nm
The magnetization fixed layer 3 made of NiFe was sequentially laminated. At this time, due to exchange coupling between the magnetization fixed layer 3 and the antiferromagnetic layer 4, the magnetization of the magnetization fixed layer 3 is fixed in one direction from the front of the drawing to the back. Since the blocking temperature of exchange coupling between the NiO film and the NiFe film is about 180 ° C., a DC magnetic field is applied in a desired magnetization direction at an intensity of 500 Oe while applying a DC magnetic field.
The magnetization was fixed by heating to 0 ° C. for about 1 minute.
【0014】さらに、膜厚2.5nmのCuからなる導
電層2、膜厚6nmのNiFeからなる磁化フリー層1
を順次積層した。磁化フリー層1は、フォトレジストに
よるマスクを形成し、イオンビームエッチングにより、
中央領域105のみに存在するようにパタン化した。こ
の磁化フリー層1をパタン化したフォトレジストマスク
を用いて、スパッタ法により膜厚15nmのCoPtC
rからなる永久磁石層5,6、及び膜厚5nmのTaを
介して膜厚150nmのAuからなる電極層7,8を形
成し、リフトオフにより端部領域104を形成した。C
oPtCr膜の保磁力が1kエルステッドであるため3
kエルステッドの直流磁界で、永久磁石層5,6を縦バ
イアス方向に着磁した。Further, a conductive layer 2 made of Cu having a thickness of 2.5 nm and a magnetization free layer 1 made of NiFe having a thickness of 6 nm
Were sequentially laminated. The magnetization free layer 1 forms a mask using a photoresist, and performs ion beam etching.
The patterning was performed so as to exist only in the central region 105. Using a photoresist mask in which the magnetization free layer 1 is patterned, a 15 nm-thick CoPtC
The permanent magnet layers 5 and 6 made of r, and the electrode layers 7 and 8 made of 150 nm thick Au were formed via the 5 nm thick Ta, and the end region 104 was formed by lift-off. C
Since the coercive force of the oPtCr film is 1 kOe,
The permanent magnet layers 5 and 6 were magnetized in the longitudinal bias direction by a DC magnetic field of k Oersted.
【0015】図1に示す構造を、以下「スピンバルブ素
子」という。このスピンバルブ素子上に、図2に示す膜
厚0.1μmのアルミナからなる磁気ギャップ層10
6、膜厚3μmのNiFeからなる磁気シールド層10
7を形成した。さらに、この磁気シールド層107を一
方の磁極とする記録用のインダクティブヘッド(図示せ
ず)を積層した。膜厚0.35μmのアルミナからなる
磁気ギャップ層108を介して、NiFeよりなるもう
一方の磁極109を形成した。磁気シールド層107と
磁極109との間には、フォトレジストを熱硬化した絶
縁層により被覆されたCuよりなるコイル(図示せず)
を形成した。最後に、素子全体をアルミナ層110によ
りコートし、スピンバルブ素子の電極端子、及び記録用
インダクティブの電極端子を取り出しウエハ工程を終了
した。The structure shown in FIG. 1 is hereinafter referred to as "spin valve element". A magnetic gap layer 10 made of alumina having a thickness of 0.1 μm shown in FIG.
6. Magnetic shield layer 10 made of NiFe having a thickness of 3 μm
7 was formed. Further, a recording inductive head (not shown) having the magnetic shield layer 107 as one magnetic pole was laminated. The other magnetic pole 109 made of NiFe was formed via a magnetic gap layer 108 made of alumina having a thickness of 0.35 μm. Between the magnetic shield layer 107 and the magnetic pole 109, a coil (not shown) made of Cu covered with an insulating layer obtained by thermosetting a photoresist.
Was formed. Finally, the entire element was coated with an alumina layer 110, and the electrode terminal of the spin valve element and the electrode terminal of the recording inductive were taken out to complete the wafer process.
【0016】このとき比較用として、図10に示す従来
のスピンバルブ素子を持つウエハを作製した。図10に
おいては、反強磁性層114、磁化固定層113、導電
層112、磁化フリー層111の材質及び膜厚は、図1
と同様とした。図10では、図1での磁化フリー層1を
中央領域105でパタン化する工程において、磁化フリ
ー層11のみならず全層をパタン化した。At this time, a wafer having a conventional spin valve element shown in FIG. 10 was prepared for comparison. In FIG. 10, the materials and thicknesses of the antiferromagnetic layer 114, the magnetization fixed layer 113, the conductive layer 112, and the magnetization free layer 111 are as shown in FIG.
The same as above. 10, in the step of patterning the magnetization free layer 1 in the central region 105 in FIG. 1, not only the magnetization free layer 11 but also all layers are patterned.
【0017】以上のウエハから一つ一つの素子を搭載し
たスライダを加工し、ジンバルバネを有するアームに組
み込んで、記録再生特性を評価した。その結果、図10
のスピンバルブ素子のMRヘッドでは、長時間動作させ
ると次第に磁化固定層113の磁化方向が縦バイアス磁
界の方向に変化してくることが再生波形から示された。
それに対して、図1のスピンバルブ素子でのMRヘッド
は、長時間の動作で安定であった。これは、図1の構造
では、端部領域104からの縦バイアス磁界が磁化フリ
ー層1にのみ加わり、磁化固定層3には実際上加わらな
い構造であるのに対して、図3の従来の素子では、磁化
フリー層111に加わる縦バイアス磁界は、磁化固定層
113にも加わることによると言える。A slider on which each element was mounted was processed from the above wafer, and incorporated into an arm having a gimbal spring, and the recording / reproducing characteristics were evaluated. As a result, FIG.
In the MR head of the spin valve element, the reproduction waveform showed that the magnetization direction of the magnetization fixed layer 113 gradually changed to the direction of the longitudinal bias magnetic field when operated for a long time.
On the other hand, the MR head using the spin valve element shown in FIG. 1 was stable after a long operation. This is because, in the structure of FIG. 1, the longitudinal bias magnetic field from the end region 104 is applied only to the magnetization free layer 1 and is not actually applied to the magnetization fixed layer 3, whereas the conventional structure of FIG. In the element, it can be said that the longitudinal bias magnetic field applied to the magnetization free layer 111 is also applied to the magnetization fixed layer 113.
【0018】さらに、図1の素子を持つMRヘッドのオ
フトラック特性を評価した結果、オフトラック時の信号
強度はオントラック時のそれの−50dB以下と十分に
小さいことが分かり、端部領域104に磁化固定層3が
存在する構造としても、端部領域104からの信号は中
央領域105に実際上問題ないことが確認された。Further, as a result of evaluating the off-track characteristic of the MR head having the element shown in FIG. 1, it was found that the signal intensity at the time of off-track was sufficiently smaller than -50 dB of that at the time of on-track. It is confirmed that the signal from the end region 104 does not actually cause a problem in the central region 105 even if the structure in which the magnetization fixed layer 3 exists is provided.
【0019】[0019]
【実施例2】スピンバルブ素子を図3に示す構成とした
MRヘッドを作製した。図3において、スピンバルブ積
層膜の磁化固定層43を、膜厚10nm、保磁力200
0エルステッドのCoPtCrとし、図に示すように図
面手前から奥方向に着磁した。さらに、膜厚2.5nm
のCuを用いた導電層42、膜厚5nmのNiFeを用
いた磁化フリー層41を積層、実施例1と同様の方法で
中央領域をパタン化した。さらに、膜厚10nmのNi
Feからなる縦バイアス磁性層49、膜厚15nmのF
eMnからなる反強磁性層45、46及び膜厚150n
mのAuからなる電極層47、48を順次積層した後、
リフトオフにより端部領域を形成した。FeMnとNi
Feとの交換結合のブロッキング温度が150℃である
ため、縦バイアスを想定した方向に500エルステッド
と、磁化固定層43の磁化を変えない程度の磁界を印加
しながら素子を160℃に加熱し、縦バイアス磁性層4
9の磁化を反強磁性層45、46との交換結合により、
縦バイアス磁界方向に揃えた。Example 2 An MR head having the spin valve element shown in FIG. 3 was manufactured. In FIG. 3, the magnetization fixed layer 43 of the spin valve laminated film is formed to a thickness of 10 nm and a coercive force of 200 nm.
CoPtCr of 0 Oersted was magnetized from the front to the back of the drawing as shown in the figure. Furthermore, a film thickness of 2.5 nm
The conductive layer 42 using Cu and the magnetization free layer 41 using NiFe with a film thickness of 5 nm were stacked, and the central region was patterned in the same manner as in Example 1. Furthermore, a 10 nm thick Ni
A longitudinal bias magnetic layer 49 made of Fe, F
Antiferromagnetic layers 45 and 46 made of eMn and a film thickness of 150 n
After sequentially laminating the electrode layers 47 and 48 made of Au of m
An end region was formed by lift-off. FeMn and Ni
Since the blocking temperature of the exchange coupling with Fe is 150 ° C., the element is heated to 160 ° C. while applying a magnetic field of 500 Oersted in a direction assuming a longitudinal bias and not changing the magnetization of the magnetization fixed layer 43, Vertical bias magnetic layer 4
9 by exchange coupling with the antiferromagnetic layers 45 and 46,
Aligned to the longitudinal bias magnetic field direction.
【0020】以上のウエハから一つ一つの素子を搭載し
たスライダを加工し、ジンバルバネを有するアームに組
み込んで、記録再生特性を評価した。その結果、このス
ピンバルブ素子でのMRヘッドは、長時間の動作で安定
なスピンバルブ動作を実現することが判明した。さら
に、図3の素子を持つMRヘッドのオフトラック特性を
評価した結果、オフトラック時の信号強度はオントラッ
ク時のそれの−50dB以下と十分に小さいことが確認
された。A slider on which each element was mounted was processed from the above wafer, and was assembled into an arm having a gimbal spring, and the recording / reproducing characteristics were evaluated. As a result, it has been found that the MR head using this spin valve element realizes a stable spin valve operation with a long operation. Further, as a result of evaluating the off-track characteristic of the MR head having the element shown in FIG. 3, it was confirmed that the signal intensity during off-track was sufficiently small, -50 dB or less of that during on-track.
【0021】[0021]
【実施例3】スピンバルブ素子を図4に示す構成とした
MRヘッドを作製した。図4において、スピンバルブ積
層膜の磁化固定層53を、膜厚10nm、保磁力2kエ
ルステッドのCoPtCrとし、図に示すように図面手
前から奥方向に着磁した。さらに、膜厚2.5nmのC
uを用いた導電層52、膜厚5nmのNiFeを用いた
磁化フリー層51を積層、実施例1と同様の方法で中央
領域をパタン化した。さらに、膜厚15nmのCoPt
Crからなる永久磁石層55,56、及び膜厚5nmの
Taを介して膜厚150nmのAuの電極層57,58
を形成し、リフトオフにより端部領域を形成した。永久
磁石層55,56の保磁力が700エルステッドである
ため1kエルステッドの直流磁界で、永久磁石層55,
56を縦バイアス方向に着磁した。このとき磁化固定層
53のCoPtCrの磁化は保持力が2kエルステッド
と大きいため、実効的に変化しない。Embodiment 3 An MR head having a spin valve element shown in FIG. 4 was manufactured. In FIG. 4, the magnetization fixed layer 53 of the spin-valve stacked film was made of CoPtCr having a film thickness of 10 nm and a coercive force of 2 kOe, and was magnetized from the front to the back of the drawing as shown in the figure. Furthermore, a 2.5 nm thick C
A conductive layer 52 using u and a magnetization free layer 51 using NiFe with a thickness of 5 nm are stacked, and the central region is patterned in the same manner as in Example 1. Furthermore, a 15 nm thick CoPt film
Au permanent electrode layers 57 and 58 with a thickness of 150 nm via a permanent magnet layers 55 and 56 made of Cr and Ta with a thickness of 5 nm
Was formed, and an end region was formed by lift-off. Since the coercive force of the permanent magnet layers 55 and 56 is 700 Oersted, the DC magnetic field of 1 k
56 was magnetized in the longitudinal bias direction. At this time, the magnetization of CoPtCr of the magnetization fixed layer 53 does not change effectively because the coercive force is as large as 2 kOersted.
【0022】以上のウエハから一つ一つの組み込んで、
記録再生特性を評価した。その結果、このスピンバルブ
素子でのMRヘッドは、長時間の動作で安定なスピンバ
ルブ動作を実現することが判明した。さらに、図4の素
子を持つMRヘッドのオフトラック特性を評価した結
果、オフトラック時の信号強度はオントラック時のそれ
の−50dB以下と十分に小さいことが確認された。Each of the above wafers is incorporated one by one,
The recording and reproduction characteristics were evaluated. As a result, it has been found that the MR head using this spin valve element realizes a stable spin valve operation with a long operation. Further, as a result of evaluating the off-track characteristics of the MR head having the element shown in FIG. 4, it was confirmed that the signal intensity during off-track was sufficiently small, -50 dB or less of that during on-track.
【0023】[0023]
【実施例4】スピンバルブ素子の構成を図5に示す構成
としたMRヘッドを作製した。図5において膜厚30n
mのNiMnからなる反強磁性層64、膜厚3nmのN
iFeからなる磁化固定層63を積層した。このとき磁
化固定層63と反強磁性層64との間の交換結合によ
り、磁化固定層63を図面手前から奥の一方向に磁化固
定する。NiMnとNiFeとの交換結合のブロッキン
グ温度が400℃程度であるため、所望の磁化方向に直
流磁界を500エルステッドの強度で印加しながら27
0℃で10時間加熱し、磁化固定した。さらに、膜厚
2.5nmのCuを用いた導電層62、膜厚5nmのN
iFeを用いた磁化フリー層61を積層、実施例1と同
様の方法で中央領域をパタン化した。さらに、膜厚10
nmのNiFeからなる縦バイアス磁性層69、膜厚1
5nmのFeMnからなる反強磁性層65、66及び膜
厚150nmのAuからなる電極層67、68を順次積
層した後、リフトオフにより端部領域を形成した。Fe
MnとNiFeとの交換結合のブロッキング温度が15
0℃であるため、縦バイアスを想定した方向に500エ
ルステッドの磁界中で、磁化固定層63と反強磁性層6
4のブロッキング温度を超えない160℃に加熱し、縦
バイアス磁性層69の磁化を縦バイアス磁界方向に揃え
た。Embodiment 4 An MR head having the configuration of the spin valve element shown in FIG. 5 was manufactured. In FIG. 5, the film thickness is 30n.
m, an antiferromagnetic layer 64 made of NiMn, 3 nm thick N
A magnetization fixed layer 63 made of iFe was laminated. At this time, by the exchange coupling between the magnetization fixed layer 63 and the antiferromagnetic layer 64, the magnetization of the magnetization fixed layer 63 is fixed in one direction from the front of the drawing to the back. Since the blocking temperature of exchange coupling between NiMn and NiFe is about 400 ° C., a DC magnetic field is applied in a desired magnetization direction at a strength of 500 Oe.
Heating was performed at 0 ° C. for 10 hours to fix the magnetization. Further, a conductive layer 62 made of Cu having a thickness of 2.5 nm and N
A magnetization free layer 61 using iFe was laminated, and the central region was patterned in the same manner as in Example 1. Further, a film thickness of 10
nm bias magnetic layer 69 made of NiFe, thickness 1
After sequentially stacking antiferromagnetic layers 65 and 66 made of 5 nm FeMn and electrode layers 67 and 68 made of Au having a thickness of 150 nm, end regions were formed by lift-off. Fe
The blocking temperature of exchange coupling between Mn and NiFe is 15
Since the temperature is 0 ° C., the magnetization fixed layer 63 and the antiferromagnetic layer 6 are placed in a magnetic field of 500 Oe in a direction assuming a longitudinal bias.
By heating to 160 ° C. which does not exceed the blocking temperature of No. 4, the magnetization of the longitudinal bias magnetic layer 69 was aligned in the longitudinal bias magnetic field direction.
【0024】以上のウエハから一つ一つの素子を搭載し
たスライダを加工し、ジンバルバネを有するアームに組
み込んで、記録再生特性を評価した。その結果、このス
ピンバルブ素子でのMRヘッドは、長時間の動作で安定
なスピンバルブ動作を実現することが判明した。さら
に、図5の素子を持つMRヘッドのオフトラック特性を
評価した結果、オフトラック時の信号強度はオントラッ
ク時のそれの−50dB以下と十分に小さいことが確認
された。A slider on which each element was mounted was processed from the above wafer, and was assembled into an arm having a gimbal spring, and the recording / reproducing characteristics were evaluated. As a result, it has been found that the MR head using this spin valve element realizes a stable spin valve operation with a long operation. Further, as a result of evaluating the off-track characteristics of the MR head having the element shown in FIG. 5, it was confirmed that the signal intensity at the time of off-track was sufficiently small at -50 dB or less of that at the time of on-track.
【0025】[0025]
【実施例5】図2を用いて、磁気ディスク用のMRヘッ
ドを作製した実施例を説明する。図2は媒体と対向する
面からMRヘッドを観察したときの層構成を示す。スラ
イダを構成するAl2 O3 −Tio複合セラミック材料
からなるウエハ101上に、スパッタ法により、膜厚2
μmのNiFeからなる磁気シールド層102を形成
し、膜厚0.08μmのアルミナからなる磁気ギャップ
層103上に、媒体磁界を感磁する中央領域105、及
び中央領域105に縦バイアス磁界と電流とを供給する
機能を有する端部領域104を形成した。Embodiment 5 An embodiment in which an MR head for a magnetic disk is manufactured will be described with reference to FIG. FIG. 2 shows a layer configuration when the MR head is observed from the surface facing the medium. On a wafer 101 made of an Al 2 O 3 —TiO composite ceramic material constituting a slider, a film thickness of 2
A magnetic shield layer 102 made of NiFe having a thickness of 0.08 μm is formed on a magnetic gap layer 103 made of alumina having a thickness of 0.08 μm. The end region 104 having a function of supplying the liquid crystal was formed.
【0026】中央領域105及び端部領域104の詳細
は図6に示す。ギャップ層103上に膜厚30nmのN
iOからなる反強磁性層14、膜厚3nmのNiFeか
らなる磁化固定層13を積層した。このとき磁化固定層
13と反強磁性層14との間の交換結合により、磁化固
定層13を図面手前から奥の一方向に磁化固定する。N
iOとNiFeとの交換結合のブロッキング温度が18
0℃程度であるため、所望の磁化方向に直流磁界を50
0エルステッドの強度で印加しながら200℃で1分程
度加熱し、磁化固定した。さらに、膜厚2.5nmのC
uからなる導電層12、膜厚6nmのNiFeからなる
磁化フリー層11を積層した。この磁化フリー層11上
にフォトレジストによるマスクを形成し、このフォトレ
ジストマスクを用いて、スパッタ法により膜厚15nm
のCoPtCrからなる永久磁石層15,16、及び膜
厚5nmのTaを介して膜厚150nmのAuからなる
電極層17,18を形成し、リフトオフにより端部領域
を形成した。CoPtCrの保磁力が1kエルステッド
であるため3kエルステッドの直流磁界で、永久磁石層
15,16を縦バイアス方向に着磁した。FIG. 6 shows the details of the central region 105 and the end region 104. A 30 nm-thick N layer is formed on the gap layer 103.
An antiferromagnetic layer 14 made of iO and a magnetization fixed layer 13 made of NiFe having a thickness of 3 nm were laminated. At this time, due to exchange coupling between the magnetization fixed layer 13 and the antiferromagnetic layer 14, the magnetization of the magnetization fixed layer 13 is fixed in one direction from the front of the drawing to the back. N
The blocking temperature of the exchange coupling between iO and NiFe is 18
Since the temperature is about 0 ° C., a DC magnetic field is
Heating was performed at 200 ° C. for about 1 minute while applying a voltage of 0 Oe, and the magnetization was fixed. Furthermore, a 2.5 nm thick C
A conductive layer 12 made of u and a magnetization free layer 11 made of NiFe having a thickness of 6 nm were laminated. A mask made of a photoresist is formed on the magnetization free layer 11, and a thickness of 15 nm is formed by a sputtering method using the photoresist mask.
The permanent magnet layers 15 and 16 made of CoPtCr and the electrode layers 17 and 18 made of Au with a thickness of 150 nm were formed via Ta with a thickness of 5 nm, and end regions were formed by lift-off. Since the coercive force of CoPtCr was 1 kOersted, the permanent magnet layers 15 and 16 were magnetized in the longitudinal bias direction with a DC magnetic field of 3 kOersted.
【0027】以上のスピンバルブ素子上に、図2に示す
膜厚0.1μmのアルミナからなる磁気ギャップ層10
6、膜厚3μmのNiFeからなる磁気シールド層10
6を形成した。さらに、この磁気シールド層107を一
方の磁極とする記録用のインダクティブヘッド(図示せ
ず)を積層した。膜厚0.35μmのアルミナからなる
磁気ギャップ層108を介して、NiFeよりなるもう
一方の磁極109を形成した。この磁気シールド層10
7及び磁極109間には、フォトレジストを熱硬化した
絶縁層により被覆されたCuよりなるコイル(図示せ
ず)を形成した。最後に、以上の素子全体をアルミナ層
110によりコートし、スピンバルブ素子の電極端子及
び記録用インダクティブの電極端子を取り出し、ウエハ
工程を終了した。The magnetic gap layer 10 made of alumina having a thickness of 0.1 μm shown in FIG.
6. Magnetic shield layer 10 made of NiFe having a thickness of 3 μm
6 was formed. Further, a recording inductive head (not shown) having the magnetic shield layer 107 as one magnetic pole was laminated. The other magnetic pole 109 made of NiFe was formed via a magnetic gap layer 108 made of alumina having a thickness of 0.35 μm. This magnetic shield layer 10
7 and a magnetic pole 109, a coil (not shown) made of Cu covered with an insulating layer obtained by thermosetting a photoresist was formed. Finally, the entire element was coated with an alumina layer 110, and the electrode terminal of the spin valve element and the electrode terminal of the recording inductive were taken out, and the wafer process was completed.
【0028】以上のウエハから一つ一つの素子を搭載し
たスライダを加工し、ジンバルバネを有するアームに組
み込んで、記録再生特性を評価した。その結果、図6の
スピンバルブ素子でのMRヘッドは、長時間の動作で安
定であった。これは図2の構造では、端部領域104か
らの縦バイアス磁界が磁化フリー層11にのみ加わり、
磁化固定層13には実際上加わらない構造であることに
よると言える。さらに、図6の素子を持つMRヘッドの
オフトラック特性を評価した結果、オフトラック時の信
号強度はオントラック時のそれの−50dB以下と十分
に小さいことが分かり、端部領域104に磁化固定層1
3が存在する構造としても、端部領域104からの信号
は中央領域105に実際上問題ないことが確認された。A slider on which each element was mounted was processed from the above-mentioned wafer and assembled into an arm having a gimbal spring, and the recording / reproducing characteristics were evaluated. As a result, the MR head using the spin valve element shown in FIG. 6 was stable over a long operation. This is because, in the structure of FIG. 2, the longitudinal bias magnetic field from the end region 104 is applied only to the magnetization free layer 11, and
It can be said that this is because the structure does not actually add to the magnetization fixed layer 13. Further, as a result of evaluating the off-track characteristic of the MR head having the element shown in FIG. 6, it was found that the signal intensity during off-track was sufficiently small, -50 dB or less of that during on-track. Layer 1
It was confirmed that the signal from the end region 104 had no practical problem in the central region 105 even in the structure where 3 existed.
【0029】[0029]
【実施例6】スピンバルブ素子を図7に示す構成とした
MRヘッドを作製した。図7において、スピンバルブ積
層膜の磁化固定層73を、膜厚10nm、保磁力2kエ
ルステッドのCoPtCrとし、図に示すように図面手
前から奥方向に着磁した。さらに、膜厚2.5nmのC
uを用いた導電層72、膜厚5nmのNiFeを用いた
磁化フリー層71を積層した。さらに、膜厚10nmの
NiFeからなる縦バイアス磁性層79、膜厚15nm
のFeMnからなる反強磁性層75,76及び膜厚15
0nmのAuからなる電極層77、78を順次積層した
後、リフトオフにより端部領域を形成した。FeMnと
NiFeとの交換結合のブロッキング温度が150℃で
あるため、縦バイアスを想定した方向に500エルステ
ッドと、磁化固定層73の磁化を変えない程度の磁界を
印加しながら素子を160℃に加熱し、縦バイアス磁性
層79の磁化を反強磁性層75,76との交換結合によ
り、縦バイアス磁界方向に揃えた。Embodiment 6 An MR head having a spin valve element shown in FIG. 7 was manufactured. In FIG. 7, the magnetization fixed layer 73 of the spin-valve laminated film was made of CoPtCr having a film thickness of 10 nm and a coercive force of 2 kOe, and was magnetized in the depth direction from the front of the drawing as shown in the figure. Furthermore, a 2.5 nm thick C
A conductive layer 72 using u and a magnetization free layer 71 using NiFe with a thickness of 5 nm were stacked. Further, a vertical bias magnetic layer 79 made of NiFe having a thickness of 10 nm and a thickness of 15 nm
Antiferromagnetic layers 75 and 76 made of FeMn and a film thickness of 15
After sequentially laminating the 0 nm Au electrode layers 77 and 78, an end region was formed by lift-off. Since the blocking temperature of exchange coupling between FeMn and NiFe is 150 ° C., the element is heated to 160 ° C. while applying a magnetic field of 500 Oersted in a direction assuming a longitudinal bias and a magnetic field that does not change the magnetization of the magnetization fixed layer 73. Then, the magnetization of the vertical bias magnetic layer 79 was aligned in the vertical bias magnetic field direction by exchange coupling with the antiferromagnetic layers 75 and 76.
【0030】以上のウエハから一つ一つの素子を搭載し
たスライダを加工し、ジンバルバネを有するアームに組
み込んで、記録再生特性を評価した。その結果、このス
ピンバルブ素子でのMRヘッドは、長時間の動作で安定
なスピンバルブ動作を実現することが判明した。さら
に、図7の素子を持つMRヘッドのオフトラック特性を
評価した結果、オフトラック時の信号強度はオントラッ
ク時のそれの−50dB以下と十分に小さいことが確認
された。A slider on which each element was mounted was processed from the above wafer, and the slider was mounted on an arm having a gimbal spring, and the recording / reproducing characteristics were evaluated. As a result, it has been found that the MR head using this spin valve element realizes a stable spin valve operation with a long operation. Further, as a result of evaluating the off-track characteristic of the MR head having the element shown in FIG. 7, it was confirmed that the signal intensity at the time of off-track was sufficiently small at -50 dB or less of that at the time of on-track.
【0031】[0031]
【実施例7】スピンバルブ素子を図8に示す構成とした
MRヘッドを作製した。図8において、スピンバルブ積
層膜の磁化固定層83を、膜厚10nm、保磁力2kエ
ルステッドのCoPtCrとし、図に示すように図面手
前から奥方向に着磁した。さらに、膜厚2.5nmのC
uを用いた導電層82、膜厚5nmのNiFeを用いた
磁化フリー層81を積層した。さらに、膜厚15nmの
CoPtCrからなる永久磁石層85、86、及び膜厚
5nmのTaを介して膜厚150nmのAuからなる電
極層87、88を形成し、リフトオフにより端部領域を
形成した。永久磁石層85、86の保磁力が700エル
ステッドであるため1kエルステッドの直流磁界で、永
久磁石層85、86をバイアス方向に着磁した。このと
き、磁化固定層83のCoPtCrの磁化は、保磁力が
2kエルステッドと大きいため、実効的に変化しない。Embodiment 7 An MR head having a spin valve element having the structure shown in FIG. 8 was manufactured. In FIG. 8, the magnetization fixed layer 83 of the spin-valve laminated film was made of CoPtCr having a film thickness of 10 nm and a coercive force of 2 kOe, and was magnetized from the front to the back of the drawing as shown in the figure. Furthermore, a 2.5 nm thick C
A conductive layer 82 using u and a magnetization free layer 81 using NiFe with a thickness of 5 nm were stacked. Further, 15 nm-thick permanent magnet layers 85 and 86 made of CoPtCr and 5 nm-thick Ta were used to form electrode layers 87 and 88 made of 150 nm-thick Au, and end regions were formed by lift-off. Since the coercive force of the permanent magnet layers 85 and 86 was 700 Oersted, the permanent magnet layers 85 and 86 were magnetized in the bias direction with a DC magnetic field of 1 kOersted. At this time, the magnetization of CoPtCr of the magnetization fixed layer 83 does not change effectively because the coercive force is as large as 2 kOersted.
【0032】以上のウエハから一つ一つの素子を搭載し
たスライダを加工し、ジンバルバネを有するアームに組
み込んで、記録再生特性を評価した。その結果、このス
ピンバルブ素子でのMRヘッドは、長時間の動作で安定
なスピンバルブ動作を実現することが判明した。さら
に、図8の素子を持つMRヘッドのオフトラック特性を
評価した結果、オフトラック時の信号強度はオントラッ
ク時のそれの−50dB以下と十分に小さいことが確認
された。A slider on which each element was mounted was processed from the wafer described above and assembled into an arm having a gimbal spring, and the recording / reproducing characteristics were evaluated. As a result, it has been found that the MR head using this spin valve element realizes a stable spin valve operation with a long operation. Further, as a result of evaluating the off-track characteristics of the MR head having the element shown in FIG. 8, it was confirmed that the signal intensity at the time of off-track was sufficiently small at -50 dB or less of that at the time of on-track.
【0033】[0033]
【実施例8】スピンバルブ素子を図9に示す構成とした
MRヘッドを作製した。図9において、膜厚30nmの
NiMnからなる反強磁性層94、膜厚3nmのNiF
e層からなる磁化固定層93を積層した。このとき磁化
固定層93と反強磁性層94との間の交換結合により、
磁化固定層93を図面手前から奥の一方向に磁化固定す
る。NiMnとNiFeとの交換結合のブロッキング温
度が400℃程度であるため、所望の磁化方向に直流磁
界を500エルステッドの強度で印加しながら270℃
で10時間加熱し、磁化固定した。さらに、膜厚2.5
nmのCuを用いた導電層92、膜厚5nmのNiFe
を用いた磁化フリー層61を積層した。さらに、膜厚5
nmのNiFeからなる縦バイアス磁性層99。膜厚1
5nmのFeMnからなる反強磁性層95、96及び膜
厚150nmのAuからなる電極97、98を順次積層
したのち、リフトオフにより端部領域を形成した。Fe
MnとNiFeとの交換結合ブロックキング温度が15
0℃であるため、縦バイアスを想定した方向に500エ
ルステッドの磁界中で、スピンバルブの磁化固定層93
と反強磁性層94のブロッキング温度を超えない160
℃に加熱し、縦バイアス磁性層99の磁化を縦バイアス
磁界方向に揃えた。Embodiment 8 An MR head having a spin valve element having the structure shown in FIG. 9 was manufactured. In FIG. 9, an antiferromagnetic layer 94 made of NiMn having a thickness of 30 nm and NiF having a thickness of 3 nm are formed.
The magnetization fixed layer 93 made of the e layer was laminated. At this time, exchange coupling between the magnetization fixed layer 93 and the antiferromagnetic layer 94 causes
The magnetization fixed layer 93 is fixed in one direction from the front of the drawing to the back. Since the blocking temperature of exchange coupling between NiMn and NiFe is about 400 ° C., 270 ° C. while applying a DC magnetic field in a desired magnetization direction at an intensity of 500 Oe.
For 10 hours to fix the magnetization. Furthermore, a film thickness of 2.5
conductive layer 92 using Cu having a thickness of 5 nm, NiFe having a thickness of 5 nm
The magnetization free layer 61 using was laminated. Further, the film thickness 5
A vertical bias magnetic layer 99 made of NiFe of nm. Film thickness 1
After sequentially stacking antiferromagnetic layers 95 and 96 made of 5 nm FeMn and electrodes 97 and 98 made of 150 nm thick Au, end regions were formed by lift-off. Fe
The exchange coupling blocking temperature between Mn and NiFe is 15
Since the temperature is 0 ° C., the magnetization fixed layer 93 of the spin valve is placed in a magnetic field of 500 Oe in a direction assuming a longitudinal bias.
And 160 not exceeding the blocking temperature of the antiferromagnetic layer 94.
C., and the magnetization of the vertical bias magnetic layer 99 was aligned in the direction of the vertical bias magnetic field.
【0034】以上のウエハから一つ一つの素子を搭載し
たスライダを加工し、ジンバルバネを有するアームに組
み込んで、記録再生特性を評価した。その結果、このス
ピンバルブ素子でのMRヘッドは、長時間の動作で安定
なスピンバルブ動作を実現することが判明した。さら
に、図9の素子を持つMRヘッドのオフトラック特性を
評価した結果、オフトラック時の信号強度はオントラッ
ク時のそれの−50dB以下と十分小さいことが確認さ
れた。A slider on which each element was mounted was processed from the above wafer, and was assembled into an arm having a gimbal spring, and the recording / reproducing characteristics were evaluated. As a result, it has been found that the MR head using this spin valve element realizes a stable spin valve operation with a long operation. Further, as a result of evaluating the off-track characteristics of the MR head having the element shown in FIG. 9, it was confirmed that the signal intensity during off-track was sufficiently low, ie, -50 dB or less of that during on-track.
【0035】[0035]
【発明の効果】本発明に係るMRヘッドよれば、磁化固
定層には縦バイアス磁界が印加されず、磁化フリー層に
のみ縦バイアス磁界が印加されるスピンバルブヘッド構
造を実現できるので、長時間にわたり安定したスピンバ
ルブ動作を実現できる。また、端部領域からの信号強度
が中央領域の信号強度に影響することを実質的に防止で
きる。According to the MR head of the present invention, it is possible to realize a spin valve head structure in which a longitudinal bias magnetic field is not applied to the magnetization fixed layer and a longitudinal bias magnetic field is applied only to the magnetization free layer. , A stable spin valve operation can be realized. Further, it is possible to substantially prevent the signal intensity from the end region from affecting the signal intensity in the central region.
【図1】本発明に係るMRヘッドの実施例1を示す要部
構成図である。FIG. 1 is a main part configuration diagram showing a first embodiment of an MR head according to the present invention;
【図2】本発明に係るMRヘッドの全体の一例を示す構
成図である。FIG. 2 is a configuration diagram showing an example of the entire MR head according to the present invention.
【図3】本発明に係るMRヘッドの実施例2を示す要部
構成図である。FIG. 3 is a main part configuration diagram showing a second embodiment of the MR head according to the present invention;
【図4】本発明に係るMRヘッドの実施例3を示す要部
構成図である。FIG. 4 is a main part configuration diagram showing a third embodiment of the MR head according to the present invention;
【図5】本発明に係るMRヘッドの実施例4を示す要部
構成図である。FIG. 5 is a main part configuration diagram showing a fourth embodiment of the MR head according to the present invention;
【図6】本発明に係るMRヘッドの実施例5を示す要部
構成図である。FIG. 6 is a main part configuration diagram showing Embodiment 5 of an MR head according to the present invention.
【図7】本発明に係るMRヘッドの実施例6を示す要部
構成図である。FIG. 7 is a main part configuration diagram showing a sixth embodiment of the MR head according to the present invention;
【図8】本発明に係るMRヘッドの実施例7を示す要部
構成図である。FIG. 8 is a main part configuration diagram showing a seventh embodiment of the MR head according to the present invention;
【図9】本発明に係るMRヘッドの実施例8を示す要部
構成図である。FIG. 9 is a main part configuration diagram showing Embodiment 8 of an MR head according to the present invention.
【図10】従来のMRヘッドを示す要部構成図である。FIG. 10 is a main part configuration diagram showing a conventional MR head.
1,11,41,51,61,71,81,91 磁化
フリー層 2,12,42,52,62,72,82,92 導電
層 3,13,43,53,63,73,83,93 磁化
固定層 4,14,64,94 反強磁性層(中央領域側) 5,6,15,16,55,56,85,86 永久磁
石層 7,8,17,18,47,48,57,58,67,
68,77,78,87,88,97,98 電極層 45,46,65,66,75,76,95,96 反
強磁性層(端部領域側) 49,69,79,99 縦
バイアス磁性層 104 端部領域 105 中央領域1, 11, 41, 51, 61, 71, 81, 91 Magnetic free layer 2, 12, 42, 52, 62, 72, 82, 92 Conductive layer 3, 13, 43, 53, 63, 73, 83, 93 Fixed magnetization layer 4, 14, 64, 94 Antiferromagnetic layer (center region side) 5, 6, 15, 16, 55, 56, 85, 86 Permanent magnet layer 7, 8, 17, 18, 47, 48, 57 , 58, 67,
68, 77, 78, 87, 88, 97, 98 Electrode layer 45, 46, 65, 66, 75, 76, 95, 96 Antiferromagnetic layer (end region side) 49, 69, 79, 99 Longitudinal bias magnetism Layer 104 Edge area 105 Central area
Claims (27)
向が変化する磁化フリー層と磁化方向が固定された磁化
固定層とを有する中央領域と、この中央領域の両端に位
置するとともにこの中央領域に対して縦バイアス磁界及
び電流を供給する端部領域とを備え、スピンバルブ効果
による動作を示す磁気抵抗効果型ヘッドにおいて、 前記端部領域が前記縦バイアス磁界を前記磁化フリー層
にのみ供給することを特徴とする磁気抵抗効果型ヘッ
ド。1. A central region having a magnetization free layer whose magnetization direction is changed by a magnetic field from a magnetic recording medium and a magnetization fixed layer whose magnetization direction is fixed, and located at both ends of the central region and in the central region. An end region for supplying a longitudinal bias magnetic field and a current to the magnetoresistive head, which operates by a spin valve effect, wherein the end region supplies the longitudinal bias magnetic field only to the magnetization free layer. A magnetoresistive head.
よって前記縦バイアス磁界が供給される請求項1記載の
磁気抵抗効果型ヘッド。2. The magnetoresistive head according to claim 1, wherein said longitudinal bias magnetic field is supplied by a permanent magnet layer provided in said end region.
と縦バイアス磁性層との積層体によって前記縦バイアス
磁界が供給される請求項1記載の磁気抵抗効果型ヘッ
ド。3. The magnetoresistive head according to claim 1, wherein said longitudinal bias magnetic field is supplied by a laminated body of an antiferromagnetic layer and a longitudinal bias magnetic layer provided in said end region.
結合により当該磁化固定層の磁化方向が固定された請求
項1記載の磁気抵抗効果型ヘッド。4. The magnetoresistive head according to claim 1, wherein the magnetization direction of the fixed magnetization layer is fixed by exchange coupling between the fixed magnetization layer and the antiferromagnetic layer.
固定層の磁化方向が固定された請求項1記載の磁気抵抗
効果型ヘッド。5. The magnetoresistive head according to claim 1, wherein the magnetization direction of the fixed magnetization layer is fixed by the coercive force of the fixed magnetization layer.
よって前記縦バイアス磁界が供給され、前記磁化固定層
と反強磁性体層との交換結合により当該磁化固定層の磁
化方向が固定された請求項1記載の磁気抵抗効果型ヘッ
ド。6. The longitudinal bias magnetic field is supplied by a permanent magnet layer provided in the end region, and the magnetization direction of the magnetization fixed layer is fixed by exchange coupling between the magnetization fixed layer and the antiferromagnetic layer. The magnetoresistive head according to claim 1.
と縦バイアス磁性層との積層体によって前記縦バイアス
磁界が供給され、前記磁化固定層の保磁力により当該磁
化固定層の磁化方向が固定された請求項1記載の磁気抵
抗効果型ヘッド。7. The longitudinal bias magnetic field is supplied by a laminated body of an antiferromagnetic layer and a longitudinal bias magnetic layer provided in the end region, and magnetization of the fixed magnetization layer is generated by coercive force of the fixed magnetization layer. 2. The magnetoresistive head according to claim 1, wherein the direction is fixed.
よって前記縦バイアス磁界が供給され、前記磁化固定層
の保磁力により当該磁化固定層の磁化方向が固定され、
前記永久磁石層の保磁力と前記磁化固定層の保磁力とが
異なる請求項1記載の磁気抵抗効果型ヘッド。8. The longitudinal bias magnetic field is supplied by a permanent magnet layer provided in the end region, and a magnetization direction of the magnetization fixed layer is fixed by a coercive force of the magnetization fixed layer,
2. The magnetoresistive head according to claim 1, wherein the coercive force of the permanent magnet layer is different from the coercive force of the magnetization fixed layer.
性体層と縦バイアス磁性層との積層体によって前記縦バ
イアス磁界が供給され、前記磁化固定層と第二の反強磁
性体層との交換結合により当該磁化固定層の磁化方向が
固定され、前記第一の反強磁性体層と前記縦バイアス磁
性層とのブロッッキング温度と、前記磁化固定層と前記
第二の反強磁性体層との交換結合のブロッッキング温度
とが異なる請求項1記載の磁気抵抗効果型ヘッド。9. The vertical bias magnetic field is supplied by a laminated body of a first antiferromagnetic layer and a vertical bias magnetic layer provided in the end region, and the magnetization fixed layer and the second antiferromagnetic layer are supplied. The magnetization direction of the magnetization fixed layer is fixed by exchange coupling with the body layer, and the blocking temperature between the first antiferromagnetic layer and the longitudinal bias magnetic layer, and the magnetization fixed layer and the second 2. The magnetoresistive head according to claim 1, wherein the blocking temperature of exchange coupling with the magnetic layer is different.
に存在し、前記磁化固定層が前記中央領域及び前記端部
領域にわたり存在する請求項1記載の磁気抵抗効果型ヘ
ッド。10. The magnetoresistive head according to claim 1, wherein the magnetization free layer exists only in the central region, and the magnetization fixed layer exists over the central region and the end region.
によって前記縦バイアス磁界が供給される請求項10記
載の磁気抵抗効果型ヘッド。11. The magnetoresistive head according to claim 10, wherein said longitudinal bias magnetic field is supplied by a permanent magnet layer provided in said end region.
層と縦バイアス磁性層との積層体によって前記縦バイア
ス磁界が供給される請求項10記載の磁気抵抗効果型ヘ
ッド。12. The magnetoresistive head according to claim 10, wherein said longitudinal bias magnetic field is supplied by a laminate of an antiferromagnetic layer and a longitudinal bias magnetic layer provided in said end region.
換結合により当該磁化固定層の磁化方向が固定された請
求項10記載の磁気抵抗効果型ヘッド。13. The magnetoresistive head according to claim 10, wherein the magnetization direction of the fixed magnetization layer is fixed by exchange coupling between the fixed magnetization layer and the antiferromagnetic layer.
化固定層の磁化方向が固定された請求項10記載の磁気
抵抗効果型ヘッド。14. The magnetoresistive head according to claim 10, wherein the magnetization direction of the fixed magnetization layer is fixed by the coercive force of the fixed magnetization layer.
によって前記縦バイアス磁界が供給され、前記磁化固定
層と反強磁性体層との交換結合により当該磁化固定層の
磁化方向が固定された請求項10記載の磁気抵抗効果型
ヘッド。15. The longitudinal bias magnetic field is supplied by a permanent magnet layer provided in the end region, and the magnetization direction of the fixed magnetization layer is fixed by exchange coupling between the fixed magnetization layer and the antiferromagnetic layer. The magnetoresistive head according to claim 10.
層と縦バイアス磁性層との積層体によって前記縦バイア
ス磁界が供給され、前記磁化固定層の保磁力により当該
磁化固定層の磁化方向が固定された請求項10記載の磁
気抵抗効果型ヘッド。16. The longitudinal bias magnetic field is supplied by a laminated body of an antiferromagnetic material layer and a longitudinal bias magnetic layer provided in the end region, and magnetization of the magnetization fixed layer is generated by coercive force of the magnetization fixed layer. 11. The magnetoresistive head according to claim 10, wherein the direction is fixed.
によって前記縦バイアス磁界が供給され、前記磁化固定
層の保磁力により当該磁化固定層の磁化方向が固定さ
れ、前記永久磁石層の保磁力と前記磁化固定層の保磁力
とが異なる請求項10記載の磁気抵抗効果型ヘッド。17. The longitudinal bias magnetic field is supplied by a permanent magnet layer provided in the end region, a magnetization direction of the magnetization fixed layer is fixed by a coercive force of the magnetization fixed layer, and the permanent magnet layer is maintained. 11. The magnetoresistive head according to claim 10, wherein a magnetic force is different from a coercive force of the magnetization fixed layer.
磁性体層と縦バイアス磁性層との積層体によって前記縦
バイアス磁界が供給され、前記磁化固定層と第二の反強
磁性体層との交換結合により当該磁化固定層の磁化方向
が固定され、前記第一の反強磁性体層と前記縦バイアス
磁性層とのブロッッキング温度と、前記磁化固定層と前
記第二の反強磁性体層との交換結合のブロッッキング温
度とが異なる請求項10記載の磁気抵抗効果型ヘッド。18. The longitudinal bias magnetic field is supplied by a laminated body of a first antiferromagnetic layer and a longitudinal bias magnetic layer provided in the end region, and the magnetization fixed layer and the second antiferromagnetic layer are supplied. The magnetization direction of the magnetization fixed layer is fixed by exchange coupling with the body layer, and the blocking temperature between the first antiferromagnetic layer and the longitudinal bias magnetic layer, and the magnetization fixed layer and the second 11. The magnetoresistive head according to claim 10, wherein the blocking temperature of exchange coupling with the magnetic layer is different.
前記端部領域にわたり存在し、前記磁化固定層が前記中
央領域及び前記端部領域にわたり存在する請求項1記載
の磁気抵抗効果型ヘッド。19. The magnetoresistive head according to claim 1, wherein the magnetization free layer exists over the center region and the end region, and the magnetization fixed layer exists over the center region and the end region.
によって前記縦バイアス磁界が供給される請求項19記
載の磁気抵抗効果型ヘッド。20. The magnetoresistive head according to claim 19, wherein said longitudinal bias magnetic field is supplied by a permanent magnet layer provided in said end region.
層と縦バイアス磁性層との積層体によって前記縦バイア
ス磁界が供給される請求項19記載の磁気抵抗効果型ヘ
ッド。21. The magnetoresistive head according to claim 19, wherein said longitudinal bias magnetic field is supplied by a laminated body of an antiferromagnetic material layer and a longitudinal bias magnetic layer provided in said end region.
換結合により当該磁化固定層の磁化方向が固定された請
求項19記載の磁気抵抗効果型ヘッド。22. The magnetoresistive head according to claim 19, wherein the magnetization direction of the fixed magnetization layer is fixed by exchange coupling between the fixed magnetization layer and the antiferromagnetic layer.
化固定層の磁化方向が固定された請求項19記載の磁気
抵抗効果型ヘッド。23. The magnetoresistive head according to claim 19, wherein the magnetization direction of the fixed magnetization layer is fixed by the coercive force of the fixed magnetization layer.
によって前記縦バイアス磁界が供給され、前記磁化固定
層と反強磁性体層との交換結合により当該磁化固定層の
磁化方向が固定された請求項19記載の磁気抵抗効果型
ヘッド。24. The longitudinal bias magnetic field is supplied by a permanent magnet layer provided in the end region, and the magnetization direction of the fixed magnetization layer is fixed by exchange coupling between the fixed magnetization layer and the antiferromagnetic layer. 20. The magnetoresistive head according to claim 19.
層と縦バイアス磁性層との積層体によって前記縦バイア
ス磁界が供給され、前記磁化固定層の保磁力により当該
磁化固定層の磁化方向が固定された請求項19記載の磁
気抵抗効果型ヘッド。25. The vertical bias magnetic field is supplied by a laminated body of an antiferromagnetic layer and a vertical bias magnetic layer provided in the end region, and magnetization of the magnetization fixed layer is generated by coercive force of the magnetization fixed layer. 20. The magnetoresistive head according to claim 19, wherein the direction is fixed.
によって前記縦バイアス磁界が供給され、前記磁化固定
層の保磁力により当該磁化固定層の磁化方向が固定さ
れ、前記永久磁石層の保磁力と前記磁化固定層の保磁力
とが異なる請求項19記載の磁気抵抗効果型ヘッド。26. The longitudinal bias magnetic field is supplied by a permanent magnet layer provided in the end region, the magnetization direction of the magnetization fixed layer is fixed by the coercive force of the magnetization fixed layer, and the permanent magnet layer is maintained. 20. The magnetoresistive head according to claim 19, wherein a magnetic force is different from a coercive force of the magnetization fixed layer.
磁性体層と縦バイアス磁性層との積層体によって前記縦
バイアス磁界が供給され、前記磁化固定層と第二の反強
磁性体層との交換結合により当該磁化固定層の磁化方向
が固定され、前記第一の反強磁性体層と前記縦バイアス
磁性層とのブロッッキング温度と、前記磁化固定層と前
記第二の反強磁性体層との交換結合のブロッッキング温
度とが異なる請求項19記載の磁気抵抗効果型ヘッド。27. The vertical bias magnetic field is supplied by a laminated body of a first antiferromagnetic layer and a vertical bias magnetic layer provided in the end region, and the magnetization fixed layer and the second antiferromagnetic layer are provided. The magnetization direction of the magnetization fixed layer is fixed by exchange coupling with the body layer, and the blocking temperature between the first antiferromagnetic layer and the longitudinal bias magnetic layer, and the magnetization fixed layer and the second 20. The magnetoresistive head according to claim 19, wherein the blocking temperature of exchange coupling with the magnetic layer is different.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP8240383A JPH1091920A (en) | 1996-09-11 | 1996-09-11 | Magneto-resistance effect type head |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP8240383A JPH1091920A (en) | 1996-09-11 | 1996-09-11 | Magneto-resistance effect type head |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| JPH1091920A true JPH1091920A (en) | 1998-04-10 |
Family
ID=17058677
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP8240383A Pending JPH1091920A (en) | 1996-09-11 | 1996-09-11 | Magneto-resistance effect type head |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JPH1091920A (en) |
Cited By (10)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP2001176034A (en) * | 1999-10-12 | 2001-06-29 | Headway Technologies Inc | Method for manufacturing magnetoresistive structure and method for manufacturing magnetoresistive head |
| US6762915B2 (en) * | 2001-09-05 | 2004-07-13 | Seagate Technology Llc | Magnetoresistive sensor with oversized pinned layer |
| US6829122B2 (en) | 2001-02-15 | 2004-12-07 | Fujitsu Limited | Magnetic head of a magnetoresistance type having an underlying layer having a laminated structure of a tungsten-group metal layer formed on a tantalum-group metal layer |
| JP2005123334A (en) * | 2003-10-15 | 2005-05-12 | Yamaha Corp | Method for manufacturing magneto-resistive effect film |
| CN1323386C (en) * | 2003-07-24 | 2007-06-27 | 株式会社东芝 | Magnetoresistance element, magnetic head and magnetic recording/reproducing device |
| US7298596B2 (en) * | 2000-08-03 | 2007-11-20 | Nec Corporation | Magneto-resistance effect element, magneto-resistance effect head, magneto-resistance transducer system, and magnetic storage system |
| US7835116B2 (en) * | 2005-09-09 | 2010-11-16 | Seagate Technology Llc | Magnetoresistive stack with enhanced pinned layer |
| JP2013008439A (en) * | 2011-06-23 | 2013-01-10 | Seagate Technology Llc | Device provided with sensor laminate, shield, and first shield stabilization structure, device provided with sensor laminate, shield, and magnetic layer, device provided with data storge medium, recording head, and arm, and method with step for providing sensor structure and annealing the same |
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1996
- 1996-09-11 JP JP8240383A patent/JPH1091920A/en active Pending
Cited By (12)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP2001176034A (en) * | 1999-10-12 | 2001-06-29 | Headway Technologies Inc | Method for manufacturing magnetoresistive structure and method for manufacturing magnetoresistive head |
| US7298596B2 (en) * | 2000-08-03 | 2007-11-20 | Nec Corporation | Magneto-resistance effect element, magneto-resistance effect head, magneto-resistance transducer system, and magnetic storage system |
| US6829122B2 (en) | 2001-02-15 | 2004-12-07 | Fujitsu Limited | Magnetic head of a magnetoresistance type having an underlying layer having a laminated structure of a tungsten-group metal layer formed on a tantalum-group metal layer |
| US6762915B2 (en) * | 2001-09-05 | 2004-07-13 | Seagate Technology Llc | Magnetoresistive sensor with oversized pinned layer |
| CN1323386C (en) * | 2003-07-24 | 2007-06-27 | 株式会社东芝 | Magnetoresistance element, magnetic head and magnetic recording/reproducing device |
| JP2005123334A (en) * | 2003-10-15 | 2005-05-12 | Yamaha Corp | Method for manufacturing magneto-resistive effect film |
| US7835116B2 (en) * | 2005-09-09 | 2010-11-16 | Seagate Technology Llc | Magnetoresistive stack with enhanced pinned layer |
| US8184409B2 (en) | 2005-09-09 | 2012-05-22 | Seagate Technology Llc | Magnetoresistive device with enhanced pinned layer |
| US8520344B2 (en) | 2005-09-09 | 2013-08-27 | Seagate Technology Llc | Magnetoresistive device with enhanced pinned layer |
| JP2013008439A (en) * | 2011-06-23 | 2013-01-10 | Seagate Technology Llc | Device provided with sensor laminate, shield, and first shield stabilization structure, device provided with sensor laminate, shield, and magnetic layer, device provided with data storge medium, recording head, and arm, and method with step for providing sensor structure and annealing the same |
| CN106964905A (en) * | 2017-04-21 | 2017-07-21 | 深圳市圭华自动化设备有限公司 | Positioning workbench of two-dimensional code laser printing equipment |
| JP2022077691A (en) * | 2020-11-12 | 2022-05-24 | アルプスアルパイン株式会社 | Magnetic sensor, magnetoresistive effect element and current sensor |
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