JPH1114157A - Bathtub equipment - Google Patents
Bathtub equipmentInfo
- Publication number
- JPH1114157A JPH1114157A JP9166973A JP16697397A JPH1114157A JP H1114157 A JPH1114157 A JP H1114157A JP 9166973 A JP9166973 A JP 9166973A JP 16697397 A JP16697397 A JP 16697397A JP H1114157 A JPH1114157 A JP H1114157A
- Authority
- JP
- Japan
- Prior art keywords
- water
- bathtub
- residual chlorine
- circuit
- heating
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
Landscapes
- Details Of Fluid Heaters (AREA)
- Heat Treatment Of Water, Waste Water Or Sewage (AREA)
- Treatment Of Water By Oxidation Or Reduction (AREA)
- Filtration Of Liquid (AREA)
- Control For Baths (AREA)
Abstract
(57)【要約】
【課題】 浴槽水や浴槽水の水回路に増殖する各種細菌
を殺菌または制菌浄化すること。
【解決手段】 浴槽水1を浄化する浴槽装置において、
水回路の一部に設けた難溶性銀塩19で殺菌浄化する手
段と、加熱源7により自動加熱し高温殺菌する手段と、
ろ過槽10のろ過材9にろ過浄化された汚れ成分を自動
逆洗洗浄排水しろ過材9を再生する手段と、給水部6か
ら循環用アダプタ3を介し自動給水し、浴槽水1を希釈
交換する手段との併用効果によって、浴槽水1や浴槽水
1の水回路を浄化し、複数の人が続けて入浴したり、浴
槽水1を続けて使用しても、循環用水回路を常にきれい
に、清潔に保つことができる。
(57) [Summary] [PROBLEMS] To sterilize or sterilize and purify various bacteria that grow in a bathtub water or a water circuit of the bathtub water. A bathtub apparatus for purifying bathtub water 1 comprises:
Means for disinfecting and purifying with the sparingly soluble silver salt 19 provided in a part of the water circuit, means for automatically heating by the heating source 7 and disinfecting at a high temperature,
A means for automatically backwashing and draining the contaminated components filtered and purified by the filter medium 9 of the filter tank 10 to regenerate the filter medium 9, and automatically supplying water from the water supply unit 6 via the circulation adapter 3 to dilute and replace the bathtub water 1. By purifying the bathtub water 1 and the water circuit of the bathtub water 1 by the combined effect with the means to perform, even if a plurality of people continuously enter the bath or use the bathtub water 1 continuously, the circulation water circuit is always clean, It can be kept clean.
Description
【0001】[0001]
【発明の属する技術分野】本発明は、浴槽の浴槽水を循
環浄化と殺菌浄化して清潔に保つことができる浴槽装置
に関するものである。BACKGROUND OF THE INVENTION 1. Field of the Invention The present invention relates to a bathtub device which can keep bathtub water clean by circulating and sterilizing and purifying bathtub water.
【0002】[0002]
【従来の技術】従来、浴槽の浴槽水の循環浄化は図12
に示すような浴槽装置になっていた。2. Description of the Related Art Conventionally, circulating purification of bathtub water in a bathtub is shown in FIG.
It was a bathtub device as shown in FIG.
【0003】浴槽水1は浴槽2に取りつけた循環用アダ
プタ3の戻り部に接続した戻り管4、循環ポンプ5、切
換弁A6、加熱源7、切換弁B8、ろ過材9を充填した
ろ過槽10、切換弁C11を通り、循環用アダプタ3の
往き部に接続した往き管12からなる水回路を循環ポン
プ5により循環し、浴槽水1の汚れ成分をろ過槽10に
充填されたろ過材9によりろ過浄化する。ろ過槽10の
ろ過材9が浴槽水1の汚れ成分(比較的大きな垢粒子
等)により目詰りすると、切換弁B8、切換弁C11を
逆洗通路側に切り換え、浴槽水1を用い循環ポンプ5に
よりろ過材9を逆洗洗浄排水し、排水管13より排水し
ていた。The bathtub water 1 contains a return pipe 4 connected to a return portion of a circulation adapter 3 attached to the bathtub 2, a circulation pump 5, a switching valve A6, a heating source 7, a switching valve B8, and a filtration tank filled with a filter material 9. 10, a circulation circuit 5 circulates a water circuit composed of an outgoing pipe 12 connected to an outgoing portion of the circulation adapter 3 through the switching valve C11, and filters the dirt components of the bathtub water 1 into the filtration tank 10 in the filtration tank 9. Purify by filtration. When the filter medium 9 of the filter tank 10 is clogged with a dirt component (relatively large scale particles or the like) of the bath water 1, the switching valve B8 and the switching valve C11 are switched to the backwash passage side, and the circulation pump 5 using the bath water 1 is used. The filter medium 9 was backwashed, washed and drained, and drained from the drain pipe 13.
【0004】[0004]
【発明が解決しようとする課題】しかしながら、従来の
浴槽装置では、単に浴槽水の汚れ成分である比較的大き
な垢粒子(おおよそ10ミクロン以上)を水回路に設け
たろ過槽でろ過浄化していたが、複数の人が続けて入浴
したり、浴槽水を続けて使用すると、入浴者自身に付着
している各種細菌が浴槽水に混入することによって生じ
る微細粒子(約1ミクロン程度)の各種細菌(一般細
菌,大腸菌等)による汚れ成分をろ過槽のろ過材では、
不十分なろ過浄化能力となるため、前記比較的大きな垢
粒子(おおよそ10ミクロン以上)のろ過浄化により、
ある一定の濁度にすることは可能であり、その濁度は
1.5〜3°レベルが限度である。However, in the conventional bathtub apparatus, relatively large dirt particles (approximately 10 microns or more), which are merely dirt components of bathtub water, are filtered and purified by a filter tank provided in a water circuit. However, when a plurality of people take a bath continuously or use bath water continuously, various kinds of bacteria of fine particles (about 1 micron) generated by mixing various kinds of bacteria attached to the bather into the bath water. (General bacteria, Escherichia coli, etc.)
The filtration and purification of the relatively large scale particles (approximately 10 microns or more) due to insufficient filtration and purification ability
It is possible to achieve a certain turbidity, the turbidity being limited to 1.5-3 ° levels.
【0005】また前記水回路も汚れ、不清潔になりやす
く、特に循環ポンプ,加熱源,ろ過槽,各種切換弁,往
き管,戻り管および循環用アダプタの接続部分は、凹凸
構成部で、水の流れが悪く(乱流大)、各種細菌の栄養
源となる垢が堆積しやすく、各種細菌が増殖しやすい環
境となっている。このように浴槽水は各種細菌が増殖し
た状態で、浴槽水は循環されるため、一般的に翌日には
一般細菌数は各種入浴条件によってことなるが、105
〜106 /mlレベルとなり、濁度は上昇する。そして
垢や一般細菌等が濁度,臭い,ヌメリに加え、浴槽の喫
水線の汚れ等に悪影響を与え、不清潔感になりやすい。
これらをきれいに、清潔にするためには浴槽水を常時交
換し、浴槽の掃除するか、洗浄剤を投入して循環洗浄す
るかして強制的に洗浄しなければならないため、大変不
経済で手間のかかる作業であるという課題を有してい
た。[0005] The water circuit is also liable to become dirty and unclean. Especially, the connection parts of the circulation pump, the heating source, the filtration tank, the various switching valves, the outgoing pipe, the return pipe, and the circulation adapter are formed by a concavo-convex structure. The flow of water is poor (large turbulence), and dirt, which is a nutrient source for various bacteria, tends to accumulate, making the environment easy for various bacteria to multiply. As described above, since the bathtub water is circulated in a state in which various bacteria multiply in the bathtub water, the number of general bacteria generally varies depending on various bathing conditions on the next day, although 10 5
The turbidity rises to a level of 〜1010 6 / ml. In addition to turbidity, smell, and slime, dirt and general bacteria adversely affect dirt on a water line of a bath tub, and thus tend to be unclean.
In order to clean and clean them, the bathtub water must be constantly replaced and the bathtub must be cleaned or forcibly cleaned by adding a cleaning agent and circulating cleaning. This is a problem that the operation is troublesome.
【0006】[0006]
【課題を解決するための手段】本発明は上記課題を解決
するために、浴槽装置として、水回路の一部に設けた難
溶性銀塩による浴槽水の殺菌浄化する手段と、加熱源に
より浴槽水を自動加熱し高温殺菌浄化する手段と、浴槽
水をろ過槽のろ過材にろ過浄化された汚れ成分を自動逆
洗洗浄排水しろ過材を再生する手段と、水回路の一部に
設けた給水部から循環用アダプタを介し浴槽に自動給水
し、浴槽水を希釈交換する手段との併用手段によって、
浴槽水はもちろんのこと循環アダプタ,戻り管,循環ポ
ンプ,各種切換弁,ろ過槽および往き管から構成された
水回路も同時に浄化するものである。SUMMARY OF THE INVENTION In order to solve the above-mentioned problems, the present invention provides, as a bathtub device, means for disinfecting and purifying bathtub water using a sparingly soluble silver salt provided in a part of a water circuit, and a bathtub using a heating source. A means for automatically heating water to perform high-temperature sterilization and purification, a means for automatically back-washing and draining bath components from a bath tub to a filter medium, and a means for regenerating the filter medium, and a part of a water circuit. By automatically supplying water to the bathtub from the water supply unit via the adapter for circulation, and by means combined with means for diluting and replacing bathtub water,
It purifies not only the bathtub water but also the water circuit composed of the circulating adapter, return pipe, circulating pump, various switching valves, filtration tank and outgoing pipe.
【0007】上記発明によれば、浴槽水,水回路の各種
細菌を難溶性銀塩への接触および微量溶出した銀イオン
による殺菌あるいは制菌効果と、浴槽水の垢等の汚れ成
分をろ過槽のろ過材でろ過浄化し、ろ過浄化した汚れ成
分を一定時間毎にろ過材を浴槽水あるいは給水により逆
洗洗浄排水して浄化能力の再生効果と、そして新鮮水を
給水の通水力で洗浄または軽減効果により各種細菌の増
殖を抑えるとともに、浴槽水に新鮮水を一定時間毎に自
動給水することにより、浴槽水,水回路の汚れ成分をろ
過槽でろ過浄化しやすくし、そして浴槽に新鮮水を給水
することによって、浴槽水の濁りを希釈し視覚的に濁り
を軽減する。また浴槽水を加熱源により、一定時間毎に
自動することにより、水回路の往き通路中の各種細菌を
高温加熱殺菌浄化する。このように銀イオン殺菌手段,
逆洗洗浄排水手段,給水手段,加熱手段による併用効果
により、浴槽水や水回路を常にきれいに、清潔に保つこ
とができる。また浴槽水や水回路を常にきれいに、清潔
に保つことによって、複数の人が続けて入浴したり、浴
槽水を続けて使用することができる。According to the above invention, various bacteria in the bath water and the water circuit are brought into contact with the hardly soluble silver salt and sterilized or bacteriostatic by the silver ions eluted in a trace amount, and the dirt component such as the dirt of the bath water is filtered off by the filtration tank. Filtration and purification with filtration media, and backwashing and drainage of the filtered and filtered dirt components at regular intervals with bath water or water supply. In addition to suppressing the growth of various bacteria by reducing effect, fresh water is automatically supplied to the bathtub water at regular time intervals, so that bathtub water and dirt components in the water circuit can be easily filtered and purified by the filter tank, and fresh water is added to the bathtub. To dilute the turbidity of the bath water and visually reduce the turbidity. In addition, bath tub water is automatically heated at predetermined time intervals by a heating source, so that various bacteria in the outgoing passage of the water circuit can be sterilized by high-temperature heating. Thus, silver ion sterilization means,
Due to the combined effect of the backwashing drainage means, the water supply means and the heating means, the bathtub water and the water circuit can always be kept clean. In addition, by keeping the bathtub water and the water circuit clean and clean at all times, a plurality of people can continuously take a bath or use the bathtub water continuously.
【0008】[0008]
【発明の実施の形態】本発明は、水回路の一部に設けら
れ浴槽水を循環する循環ポンプと、浴槽水を加熱する加
熱源と、浴槽水をろ過するろ過槽と、浴槽と水回路を接
続する循環用アダプタと、前記水回路の一部に水回路と
浴槽水を殺菌する難溶性銀塩と、浴槽に給水する給水部
を設け、前記浴槽に一定時間毎に自動給水する手段と、
給水または浴槽水を用いろ過槽を一定時間毎に自動逆洗
洗浄排水する手段と、加熱源を用い浴槽水を一定時間毎
に自動加熱する手段を備えることにより、難溶性銀塩へ
の接触および微量溶出した銀イオンによる各種殺菌の殺
菌あるいは制菌効果に加え、浴槽水の垢等の汚れ成分を
ろ過槽のろ過材でろ過浄化し、前記ろ過浄化した汚れ成
分を一定時間毎に自動逆洗洗浄排水して浄化能力の再生
効果と、そして浴槽に一定時間毎に自動給水することに
よって、前記水回路の凹凸構成部の垢等の堆積物を給水
の通水力で洗浄または軽減効果により各種細菌の増殖を
抑えるとともに、浴槽水,水回路の汚れ成分をろ過槽で
ろ過浄化しやすくし、浴槽水への給水により濁りを希釈
し視覚的に濁りの軽減効果と、浴槽水を一定時間毎に自
動加熱することにより、水回路の往き通路に高温水によ
る高温殺菌し、これらの併用効果によって、浴槽水ある
いは水回路を常にきれいに、清潔に保つことができる。DESCRIPTION OF THE PREFERRED EMBODIMENTS The present invention provides a circulating pump provided in a part of a water circuit for circulating bath water, a heating source for heating the bath water, a filtration tank for filtering the bath water, a bath and a water circuit. A circulation adapter for connecting the water circuit, a sparingly soluble silver salt for sterilizing the water circuit and bathtub water in a part of the water circuit, and a water supply unit for supplying water to the bathtub, and a means for automatically supplying water to the bathtub at regular intervals. ,
By providing a means for automatically backwashing and draining the filtration tank at regular intervals using water supply or bath water, and a means for automatically heating bath water at regular intervals using a heating source, the contact with the hardly soluble silver salt and In addition to the sterilization or bacteriostatic effect of various disinfections due to a small amount of eluted silver ions, dirt components such as bath water dirt are filtered and purified with a filter material in a filtration tank, and the filtered and purified dirt components are automatically backwashed at regular intervals. By washing and draining, the regeneration effect of the purification ability, and by automatically supplying water to the bathtub at regular intervals, sediments such as dirt on the uneven configuration portion of the water circuit are washed or reduced by the water supply capacity of the water supply and various bacteria are removed. Of the bathtub water and the dirt components in the water circuit are easily filtered and purified by the filter tank. Water supply to the bathtub water dilutes the turbidity and reduces the turbidity visually. Automatic heating Ri, and the high-temperature sterilization with hot water forward passage of the water circuit, these combined effects, always clean bath water or water circuit can be kept clean.
【0009】また、難溶性銀塩として、粒状塩化銀,塩
化銀プレート,塩化銀担持布,塩化銀担持不織布とする
ことにより、前記粒状塩化銀,塩化銀プレートは水回
路、特にろ過槽と往き管の間の一部に樹脂性保持具を充
填装着して、長時間,長寿命用に浴槽装置保証期間は交
換しないタイプに、一方必要に応じ前記粒状塩化銀,塩
化銀プレートに加え、塩化銀担持布,塩化銀担持不織布
を樹脂性保持具に装着し、浴槽壁に設置することによ
り、短時間,一定寿命用と一定期間で交換するタイプと
の併用使用することにより、前記粒状塩化銀,塩化銀プ
レートと塩化銀担持布,塩化銀担持不織布の併用効果に
より、より接触面積を大きくし接触殺菌あるいは銀イオ
ンを溶出させやすくし、より殺菌効果を大きくすること
ができる。Further, by using granular silver chloride, a silver chloride plate, a silver chloride supporting cloth, and a silver chloride supporting nonwoven cloth as the hardly soluble silver salt, the granular silver chloride and the silver chloride plate pass through a water circuit, particularly a filtration tank. Fill the part between the tubes with a resin-made holder and replace it with a bathtub with no replacement for the long term and long service life. The silver-carrying cloth and the silver chloride-carrying non-woven cloth are mounted on a resin-made holder and installed on the bathtub wall. The combined effect of the silver chloride plate and the silver chloride-carrying cloth and the silver chloride-carrying non-woven cloth makes it possible to increase the contact area, facilitate contact sterilization or elute silver ions, and further enhance the sterilizing effect.
【0010】また、浴槽水を用い自動逆洗洗浄排水した
後、自動加熱する手段により浴槽水を設定温度まで加熱
し、給水部により水回路を介して浴槽に自動給水するこ
とにより、ろ過槽のろ過材にろ過浄化した垢等の汚れ成
分を逆洗洗浄排水してろ過能力を再生効果に加え、浴槽
水量を少なくする。そして浴槽水量が少なくなった浴槽
水を設定温度になるまで加熱し、ろ過槽,往き管および
循環用アダプタからなる往き通路内と浴槽水の一部の各
種細菌を高温加熱殺菌するとともに、浴槽水を加熱する
熱エネルギを少なく、すなわち省エネルギ化ができる。
そしてまた給水部により水回路を介して浴槽に給水する
ことにより、濁りの希釈率を大きくして視覚的な濁りを
軽減するとともに、前記高温加熱殺菌とする浴槽水の沸
き上げ設定温度約30〜40℃および入浴可能な低温度
約35〜40℃は一般的に言われている各種細菌の増殖
大温度域から早く低温度にすることにより、各種細菌の
増殖を抑えることによって浴槽水の濁り,悪臭,ヌメリ
さらに喫水線の汚れ等を軽減することができる。[0010] Further, after the water is automatically backwashed and drained using bath water, the bath water is heated to a set temperature by means of automatic heating, and the water is automatically supplied to the bath through a water circuit by a water supply unit, whereby the filtration bath is drained. Backwashing and draining of dirt components such as dirt that has been filtered and purified by a filter medium adds filtration capability to the regenerating effect and reduces the amount of bathtub water. Then, the bath water with a reduced bath water volume is heated to a set temperature to sterilize various bacteria in the bath passage and a part of the bath water at a high temperature by heating at a high temperature. Can be reduced, that is, energy can be saved.
Further, by supplying water to the bathtub through the water circuit by the water supply unit, the dilution ratio of turbidity is increased to reduce visual turbidity, and the set temperature of the bathtub water to be heated and sterilized as the high-temperature heat sterilization is about 30 to 30 ° C. The temperature of 40 ° C. and the bathable low temperature of about 35 to 40 ° C. is lowered from the generally-known high temperature range of the growth of various bacteria to a low temperature so as to suppress the growth of various bacteria, thereby making the bathtub water turbid. It is possible to reduce bad smell, slime and dirt on the waterline.
【0011】また、水回路の一部に設けた給水部からの
給水として、残留塩素含有水を給水するとともに、前記
給水された残留塩素含有水が水回路を経て循環用アダプ
タに達する給水することにより、残留塩素含有水を水回
路全体に給水して、前記水回路で増殖する各種細菌をよ
り効果的に殺菌し、そして浴槽水の一部にも残留塩素含
有水が供給されることから浴槽水中の各種細菌も同時に
殺菌または制菌浄化することができる。[0011] Further, as the water supply from a water supply unit provided in a part of the water circuit, water containing residual chlorine is supplied, and the supplied water containing residual chlorine reaches a circulation adapter via a water circuit. By supplying the residual chlorine-containing water to the entire water circuit, various bacteria growing in the water circuit are more effectively sterilized, and the residual chlorine-containing water is also supplied to a part of the bathtub water so that the bathtub is supplied. Various bacteria in the water can be sterilized or bacteriostatically purified at the same time.
【0012】また、給水部から給水された残留塩素含有
水が水回路を経て循環用アダプタに達した後、給水を停
止し、残留塩素含有水を一定時間水回路に滞留させるこ
とにより、前記水回路で増殖する各種細菌をより確実に
殺菌し、そして浴槽水が拡散希釈率が少なく、前記浴槽
水の一部の各種細菌もより確実に効果的に殺菌浄化する
ことができる。Further, after the residual chlorine-containing water supplied from the water supply section reaches the circulating adapter through the water circuit, the water supply is stopped, and the residual chlorine-containing water is retained in the water circuit for a certain period of time. Various kinds of bacteria growing in the circuit can be more reliably sterilized, and the bath water has a low diffusion dilution ratio, so that various kinds of bacteria in the bath water can be more effectively sterilized and purified.
【0013】また、残留塩素含有水を加熱する手段を設
けることにより、加熱と残留塩素の併用殺菌によって各
種細菌をさらにより確実に効果的に殺菌浄化できる。Further, by providing a means for heating the residual chlorine-containing water, various bacteria can be more reliably and effectively sterilized and purified by the combined use of heating and residual chlorine.
【0014】また、加熱する手段により加熱された残留
塩素含有水を水回路に給水した後、加熱する手段により
加熱されていない残留塩素含有水を水回路に給水するこ
とにより、前記加熱された残留塩素含有水で水回路の凹
凸構成部に堆積付着した垢等の付着力を小さくして剥離
しやすくするとともに加熱と残留塩素の併用殺菌し、そ
して加熱していない残留塩素含有水を給水して、水回路
の構成部品を冷却して耐久性を向上させるとともに、残
留塩素の熱分解を遅らせ残留塩素濃度を保持させて殺菌
効果をより大きくし、各種殺菌をダブル殺菌することが
できる。Further, after the residual chlorine-containing water heated by the heating means is supplied to the water circuit, the residual chlorine-containing water not heated by the heating means is supplied to the water circuit, whereby the heated residual chlorine-containing water is supplied. Use chlorine-containing water to reduce the adhesion of dirt etc. deposited on the uneven parts of the water circuit to make it easy to peel off, sterilize with heating and residual chlorine in combination, and supply unheated residual chlorine-containing water. In addition to cooling the components of the water circuit to improve the durability, the thermal decomposition of the residual chlorine is delayed, the residual chlorine concentration is maintained, and the sterilizing effect is further increased, and various sterilizations can be double-sterilized.
【0015】また、加熱する手段により加熱された給水
または残留塩素含有水の温度を55℃以上にすることに
より、残留塩素濃度が低下しても、高温加熱水による各
種細菌を高温で殺菌し、残留塩素殺菌と高温加熱殺菌の
相乗効果により、殺菌時間を短時間にすることができ
る。[0015] Further, by increasing the temperature of the feed water or the residual chlorine-containing water heated by the heating means to 55 ° C. or more, even if the residual chlorine concentration is reduced, various bacteria by the high-temperature heated water are sterilized at a high temperature, The synergistic effect of residual chlorine sterilization and high-temperature heat sterilization can shorten the sterilization time.
【0016】さらにまた、給水部から給水される残留塩
素含有水として、水道水とすることにより、一般家庭に
供給されている給水を使用することができるため、利便
性と経済性に優れた浄化ができる。Furthermore, since tap water is used as the residual chlorine-containing water supplied from the water supply section, the water supplied to ordinary households can be used, so that purification is excellent in convenience and economy. Can be.
【0017】(実施例1)以下、本発明の実施例1にお
ける浴槽装置の浄化手段について図面を用い説明する。
なお、従来と同一構成要素のものについては同一番号を
付し説明する。(Embodiment 1) Hereinafter, a purifying means of a bathtub apparatus according to Embodiment 1 of the present invention will be described with reference to the drawings.
Note that the same components as those in the related art are denoted by the same reference numerals and will be described.
【0018】図1において、浴槽水1は制御部の信号に
より循環ポンプ5を作動させると、水回路の一部である
浴槽2に取りつけた循環用アダプタ3の戻り部に接続し
た戻り管4、循環ポンプ5、切換弁A6、切換弁D1
4、浴槽水1を加熱する加熱源7を通り、ろ過槽10の
上部往き通路15の切換弁B8より下向流でろ過槽10
に充填したろ過材9で比較的大きな垢粒子汚れ成分を浄
化する。そして、浄化された浴槽水1は切換弁C11を
通り、図2の(a)に示した難溶性銀塩として四角筒形
状からなる塩化銀プレート18を装着した樹脂製保持具
19を設けている。前記樹脂製保持具19は、浄化され
た浴槽水1を循環することにより、浴槽水1中の垢,髪
の毛等の汚れ成分が浄化されているため、塩化銀プレー
ト18表面に前記汚れ成分が付着することがなく、常に
銀イオンを定量的に溶出することができるものである。
そして前記銀イオンを含む浴槽水1は浴槽2に取りつけ
た循環用アダプタ3の往き部に接続した往き管12、循
環用アダプタ3より浴槽2に戻り制御部の信号による循
環ポンプ5の停止まで浴槽水1は循環する。また浴槽2
の浴槽壁に図2の(b)に示したように波形形状した塩
化銀担持不織布20を樹脂製保持ケース21を必要に応
じ取り付け、前記塩化銀プレートと併用設置により、こ
の時循環する浴槽水1中の各種細菌を銀イオンにより殺
菌または制菌浄化効果する。ろ過槽10に充填したろ過
材9が浴槽水1の汚れ成分(比較的大きな垢粒子等)に
より目詰りすると、制御部の信号により循環ポンプ5を
一旦停止させ、切換弁D14をバイパス通路16側およ
び切換弁B8と切換弁C11を逆洗洗浄排水側に切り換
える。そして再度循環ポンプ5を作動させ浴槽水1を用
い、切換弁D14、バイパス通路16、下部逆洗通路1
7、切換弁C11を通り、上向流でろ過槽10に充填し
たろ過材9を逆洗洗浄し、前記逆洗洗浄した浴槽水1を
切換弁B8に接続した排水管13より排水する。そし
て、浴槽2の浴槽水1が一定時間排水されると制御部の
信号により循環ポンプ5を停止させ、切換弁A6を戻り
循環用水回路側に切り換え、前記切換弁A6より、新鮮
な給水を一定量通水させることにより、戻り循環用水回
路の各種細菌の栄養源となる垢の堆積を洗浄浄化すると
ともに、浴槽水1に給水することにより、濁りを希釈し
視覚的に濁りの軽減効果を有することができる。In FIG. 1, when a circulating pump 5 is operated by a signal from a control unit, a bath tube water 1 returns to a return pipe 4 connected to a return portion of a circulating adapter 3 attached to a bathtub 2 which is a part of a water circuit. Circulation pump 5, switching valve A6, switching valve D1
4. The filtration tank 10 passes through the heating source 7 for heating the bathtub water 1 and flows downward from the switching valve B8 in the upper passage 15 of the filtration tank 10.
A relatively large dirt particle contamination component is purified by the filter material 9 filled in the filter. The purified bathtub water 1 passes through the switching valve C11, and is provided with a resin holder 19 to which a silver chloride plate 18 having a rectangular cylindrical shape as a hardly soluble silver salt shown in FIG. . Since the resin holder 19 circulates the purified bathtub water 1 to remove dirt components such as dirt and hair in the bathtub water 1, the dirt components adhere to the surface of the silver chloride plate 18. Thus, silver ions can always be eluted quantitatively without any need for such treatment.
The bath water 1 containing the silver ions is supplied to the tubing 2 connected to the circulating adapter 3 attached to the tub 2 and returns to the tub 2 from the circulating adapter 3 until the circulating pump 5 is stopped by a signal from the controller. Water 1 circulates. Bathtub 2
As shown in FIG. 2 (b), a resin-made holding case 21 is provided with a silver chloride-supporting nonwoven fabric 20 having a corrugated shape as shown in FIG. 2 (b). Various bacteria in 1 are sterilized or sterilized by silver ions. When the filter medium 9 filled in the filter tank 10 is clogged with dirt components (relatively large dirt particles, etc.) of the bathtub water 1, the circulation pump 5 is temporarily stopped by a signal from the control unit, and the switching valve D14 is set to the bypass passage 16 side. Then, the switching valve B8 and the switching valve C11 are switched to the backwashing drainage side. Then, the circulation pump 5 is operated again to use the bathtub water 1, and the switching valve D14, the bypass passage 16, the lower backwash passage 1
7. After passing through the switching valve C11, the filter medium 9 filled in the filtration tank 10 is backwashed and washed in an upward flow, and the bathtub water 1 washed and backwashed is drained from a drain pipe 13 connected to the switching valve B8. When the bathtub water 1 in the bathtub 2 is drained for a certain period of time, the circulation pump 5 is stopped by a signal from the control unit, the switching valve A6 is switched back to the circulation water circuit side, and fresh water is supplied from the switching valve A6 at a constant rate. By passing a large amount of water, it is possible to wash and purify the accumulation of dirt, which is a nutrient source of various bacteria in the return circulation water circuit, and to supply water to the bathtub water 1, thereby diluting turbidity and visually reducing turbidity. be able to.
【0019】次に、難溶性銀塩について詳述する。難溶
性銀塩とは銀イオンの溶解量がppm〜ppbと極微量
溶解するもので、塩化銀,臭化銀,よう化銀等が一般的
な化学物質である。本発明では殺菌または制菌効果を考
慮するとともに、特に塩化銀を用いることにより、容易
に入手,合成しやすく、比較的安価で経済性に優れ、か
つ安全性が高く、加工性に優れたものである。まず塩化
銀単体として任意形状に加工した粒状塩化銀,塩化銀プ
レート(圧延加工品)を用いることにより、浴槽水の循
環流量が大でも変形や破損さらに粉末化することがない
こと、さらに必然的に単体重量が重く長時間長寿命化タ
イプで機器の使用期間に合わせ設置することができると
もに、浴槽壁に設置することができる。一方、短時間短
寿命化タイプとして各種布や各種不織布を担体とし、前
記担体の表面に塩化銀を微量付着担持(微量付着担持方
法は本発明らが既に特許取得しているが、硝酸銀水溶液
に不織布を浸せきさせ、一定量付着させるためローリン
グ後不織布を乾燥する。そして塩化ナトリウム水溶液に
前記乾燥した不織布を浸せきすることにより、硝酸基を
塩化基に置換し塩化銀を微量点在担持したもの)させた
もので、布や不織布の特性を利用し容易に任意形状に加
工できることから、前記塩化銀単体と比較し安価で一定
期間毎に交換できるように浴槽壁等に保持ケースに装着
して設置することができる。前記塩化銀単体,塩化銀担
持においても銀イオンの溶解量に差はなく、各種細菌の
殺菌効果は優れている。Next, the hardly soluble silver salt will be described in detail. The sparingly soluble silver salt has a very small amount of silver ions dissolved in ppm to ppb, and silver chloride, silver bromide, silver iodide and the like are common chemical substances. In the present invention, the bactericidal or bacteriostatic effect is taken into consideration, and particularly by using silver chloride, it is easily available and easily synthesized, relatively inexpensive, excellent in economic efficiency, high in safety, and excellent in processability. It is. First, by using granular silver chloride and silver chloride plate (rolled product) processed into arbitrary shape as silver chloride alone, even if the circulation flow rate of bathtub water is large, it will not be deformed or broken and powdered. In addition, it can be installed according to the service period of the equipment, and can be installed on the bathtub wall. On the other hand, as a short-time and short-life type, various cloths and various non-woven fabrics are used as a carrier, and a small amount of silver chloride is carried on the surface of the carrier. The non-woven fabric is soaked, and the non-woven fabric is dried after rolling in order to adhere a fixed amount of the non-woven fabric, and the dried non-woven fabric is immersed in an aqueous solution of sodium chloride to replace nitric acid groups with chloride groups and carry a small amount of silver chloride. Since it can be easily processed into any shape using the characteristics of cloth and non-woven fabric, it is installed in a holding case on a bathtub wall or the like so that it is cheaper and can be replaced at regular intervals than the silver chloride alone. can do. There is no difference in the dissolution amount of silver ions even when silver chloride is used alone or silver chloride is supported, and the bactericidal effect of various bacteria is excellent.
【0020】次に、ろ過槽のろ過材を逆洗洗浄排水する
手段について詳述する。前記逆洗洗浄排水用の水は浴槽
水あるいは循環用水回路の一部に設けた給水部からの給
水を用いる。まず浴槽水を用いる場合は、循環ポンプを
作動するため、安定逆洗水量がほぼ一定で逆洗時間の設
定が容易であり、ろ過材に堆積した垢等の汚れ成分を確
実に逆洗洗浄して、ろ過材の浄化能力を再生することが
できる。一方、給水を用いる場合は、給水の水圧により
逆洗水量がやや不安定となるが、浴槽水と比較し、給水
は新鮮水で汚れ成分は少なく、図1のろ過槽に詳述して
いないが、ろ過材を保持するろ床やろ過材に汚れ成分が
付着することがなく、清潔に逆洗洗浄して、ろ過材の浄
化能力を再生することができる。次に一定時間毎に逆洗
洗浄排水として、1〜6回/日すなわち4時間毎から2
4時間毎の間に実施することが望ましい。4時間毎以内
では浴槽水を用いる場合、一般的な入浴時間帯である午
後7時から11時の4時間内に逆洗洗浄排水のため浴槽
水が少なくなること、さらに浴槽水が少なくなることか
ら給水または給湯が必要となり、省資源化,省エネルギ
化ができなくなる。一方、24時間毎以上になると浴槽
水の汚れ成分が目詰まり大きくなり、循環流量が低下
し、循環浄化効果が悪化する。前記欠点を考慮すると2
〜4回/日すなわち6時間毎から12時間毎の間に実施
することが好ましい。次に、逆洗洗浄排水時間または量
も重要で、逆洗洗浄排水量によってことなるが、一般的
に言われている逆洗率20〜30%の流量の場合、逆洗
洗浄排水の一定時間毎が短時間では、一定時間として
0.5〜2分、一定量として10〜40lで再生か可能
である。また一定時間毎が長時間では、1〜4分、一定
量として20〜80lとやや多くすることにより再生が
可能である。Next, means for backwashing and draining the filter medium in the filter tank will be described in detail. As the water for the backwashing and drainage, bath water or water supplied from a water supply unit provided in a part of the circulation water circuit is used. First, when using bath water, since the circulation pump is activated, the amount of stable backwash water is almost constant, the backwash time can be easily set, and dirt components such as dirt deposited on the filter media are reliably backwashed and washed. Thus, the purification capacity of the filter medium can be regenerated. On the other hand, in the case of using water supply, the backwash water amount becomes slightly unstable due to the water pressure of the water supply, but compared to bath water, the water supply is fresh water and has less dirt components, and is not described in detail in the filtration tank of FIG. However, it is possible to regenerate the purification ability of the filter medium by performing backwashing and washing cleanly without causing dirt components to adhere to the filter bed holding the filter medium and the filter medium. Next, as a backwashing drainage every predetermined time, 1 to 6 times / day, ie, every 4 hours
It is desirable to carry out every four hours. If the bath water is used within 4 hours, the bath water will be reduced due to backwashing and drainage within 4 hours from 7:00 pm to 11:00 which is a general bathing time, and the bath water will be further reduced. Therefore, water supply or hot water supply is required, and resource saving and energy saving cannot be performed. On the other hand, if it becomes longer than every 24 hours, the dirt component of the bath water becomes clogged and increased, the circulation flow rate is reduced, and the circulation purification effect is deteriorated. Considering the above disadvantages, 2
実 施 4 times / day, preferably between every 6 hours and every 12 hours. Next, the backwashing drainage time or amount is also important. Depending on the amount of backwashing drainage, in the case of a flow rate of 20-30%, which is generally referred to as backwashing drainage, the backwashing drainage is carried out at regular intervals. However, in a short time, reproduction can be performed with a fixed time of 0.5 to 2 minutes and a fixed amount of 10 to 40 l. In addition, when the constant time is long, the reproduction can be performed by increasing the constant amount to 1 to 4 minutes and the constant amount to 20 to 80 l.
【0021】次に給水部からの給水する手段について詳
述する。前記給水は逆洗洗浄排水と同様1〜6回/日す
なわち4時間毎から24時間毎の間に実施することが望
ましい。特に浴槽水を利用した逆洗洗浄排水では、浴槽
水の低下分を給水、すなわち逆洗洗浄排水分、10〜8
0lを給水することが望ましい。この時循環用水回路の
凹凸に堆積した汚れ成分を強制的に剥離あるいは軽減
し、前記循環用水回路も洗浄浄化して清潔に保つことが
可能、さらにこのように逆洗洗浄排水後給水することに
より、前述した浴槽水の濁りを希釈し視覚的に濁りの軽
減効果が可能となる相乗作用を有する。Next, the means for supplying water from the water supply section will be described in detail. The water supply is desirably performed 1 to 6 times / day, that is, every 4 hours to every 24 hours, similarly to the backwashing drainage. In particular, in the case of backwashing drainage using bathtub water, a reduced amount of bathtub water is supplied, that is, 10-8.
It is desirable to supply 0 l of water. At this time, dirt components accumulated on the unevenness of the circulation water circuit are forcibly peeled off or reduced, and the circulation water circuit can also be cleaned and purified to keep it clean. It has the synergistic effect of diluting the turbidity of the bathtub water and visually reducing the turbidity.
【0022】図3は本発明と従来法の浄化効果として、
浴槽水の濁度と一般細菌数の推移を示し、本発明として
循環用水回路部に塩化銀プレートを設置したもので、表
1に詳細条件を示す。図からも明らかなように、本発明
では一週間浴槽水を交換しない場合でも、濁度は最大
1.0°(従来法4.6°)、0.3°〜0.8°(従
来法1.2°〜4.1°)の範囲とほぼ視覚的に新鮮水
レベルと同じ濁度を維持することができる。また一般細
菌数は最大4.5×105 /ml(従来法9.1×10
6 /ml)、103 〜105 /mlと(従来法105 〜
106 /ml)と約2オーダ殺菌浄化することができ
る。また図示していないが、浴槽水の臭い、浴槽壁のヌ
メリ、浴槽壁の喫水線の汚れに対しても著しい効果を有
する。FIG. 3 shows the purification effect of the present invention and the conventional method.
Changes in the turbidity of the bathtub water and the number of general bacteria are shown. In the present invention, a silver chloride plate is installed in the circulation water circuit, and detailed conditions are shown in Table 1. As is clear from the figure, in the present invention, even when the bath water is not changed for one week, the turbidity is at most 1.0 ° (conventional method 4.6 °) and 0.3 ° to 0.8 ° (conventional method). (1.2 ° -4.1 °) and can maintain the turbidity almost visually as fresh water level. The number of general bacteria is 4.5 × 10 5 / ml at maximum (9.1 × 10 5 in the conventional method).
6 / ml), 10 3 to 10 5 / ml (conventional method 10 5 to
10 6 / ml) and about 2 orders. Although not shown, it has a remarkable effect on the smell of bathtub water, the slime of the bathtub wall, and the contamination of the waterline on the bathtub wall.
【0023】[0023]
【表1】 [Table 1]
【0024】図4は本発明と従来法の浄化効果を判定す
る循環用水回路構成および浄化判定プレート構成を示
す。(a)は循環用水回路の構成図で、浄化判定プレー
ト22,23は循環用アダプタ3に接続した戻り管4,
往き管12を各々設置している。また、(b)は浄化判
定プレート22,23の上面構成図、(c)は浄化判定
プレート22,23の断面構成図を示し、浄化判定プレ
ート24(幅:10mm、厚さ:1mmの白色樹脂プレ
ート)をシール治具を介して戻り管4、往き管12の通
水部に装着している。表2は、図3で詳述した循環用水
回路構成を用い、本発明と従来法の浄化効果を示したも
のである。表中に記載していない詳細な条件は表1と同
条件とし、評価は表3の評価指数(汚れ指数5段階評
価:色変化=汚れ、垢堆積を目視評価)にて評価した。FIG. 4 shows a configuration of a circulating water circuit and a configuration of a purification determination plate for determining the purification effect of the present invention and the conventional method. (A) is a configuration diagram of a circulating water circuit, and purification determination plates 22 and 23 are return pipes 4 and 4 connected to a circulating adapter 3.
Each of the outgoing pipes 12 is provided. (B) is a top view configuration diagram of the purification determination plates 22 and 23, (c) is a cross-sectional configuration diagram of the purification determination plates 22 and 23, and a purification determination plate 24 (white resin having a width of 10 mm and a thickness of 1 mm). Plate) is attached to the return pipe 4 and the water pipe of the going pipe 12 via a sealing jig. Table 2 shows the purification effects of the present invention and the conventional method using the circulation water circuit configuration described in detail in FIG. The detailed conditions not described in the table were the same as those in Table 1, and the evaluation was made according to the evaluation index in Table 3 (five-grade evaluation of dirt index: color change = dirt, dirt accumulation was visually evaluated).
【0025】[0025]
【表2】 [Table 2]
【0026】[0026]
【表3】 [Table 3]
【0027】表2から明らかなように、給水させること
により、循環用水回路に堆積しやすい汚れ成分(垢)を
軽減することができる。また、一般的に言われている水
垢(垢が栄養源となり各種細菌が異常増殖したもの)
は、評価指数4レベルで発生しやすく、従来法の戻り管
の評価指数4では前記水垢が微少ではあるが発生してい
たことからも、給水させることにより、循環用水回路を
清潔に保つことができる。As is clear from Table 2, by supplying water, dirt components (dirt) that easily accumulate in the circulation water circuit can be reduced. In addition, generally referred to as water scale (one in which various bacteria have abnormally grown as a result of the use of scale as a nutrient source)
Is easy to occur at an evaluation index of 4 and the scale is small but is generated in the evaluation index of the return pipe of the conventional method. Therefore, it is possible to keep the circulation water circuit clean by supplying water. it can.
【0028】(実施例2)本発明の実施例2の浴槽装置
について、図5の排水,加熱,給水モードに基づいて説
明する。(Embodiment 2) A bathtub apparatus according to Embodiment 2 of the present invention will be described based on the drainage, heating and water supply modes in FIG.
【0029】図5のフローチャートについて説明する
と、制御部の信号により自動シーケンスNo.101の
リモコンの運転SWをONすると、102の各種切換弁
をまず循環通路側(戻り管4から往き管12に循環す
る)に切り換え、各種切換弁が切り換わると103の循
環ポンプ5がONする。循環ポンプ5がONすると排
水,加熱,給水モード用の104の設定タイマがカウン
トを始め、前記設定タイマが設定時間に達するまで浴槽
水1を循環浄化、すなわちろ過槽10のろ過材9で浴槽
水1中の垢や髪の毛等の汚れ成分を浄化する。設定タイ
マが設定時間に達すると105の循環ポンプ5をOFF
させ、切換弁C11、切換弁D14、切換弁B8を切り
換え、107の循環ポンプ5がONすると、108の排
水タイマがカウントを始め、排水タイマが設定時間に達
するまでろ過材9を逆洗洗浄し浴槽水1を排水する。す
なわち浴槽水1がバイパス通路16、下部逆洗通路1
7、切換弁C11を通り、上向流でろ過材9に堆積した
汚れ成分を逆洗洗浄(約130%の膨張率の流量・・・
約20〜25l/分の流量)し、切換弁B8に接続した
排水管13より排水する。次に前記浴槽水1が一定時間
排水されると109の循環ポンプ5をOFFさせ、11
0の切換弁B8、切換弁C11を循環側に、切換弁D1
4を加熱源7側に切り換え、111の循環ポンプ5がO
Nすると112の加熱源7がONし、浴槽水1を113
の設定温度に沸き上げ加熱する。浴槽水1が113の設
定温度に沸き上げ加熱されると105の循環ポンプ5を
OFFさせ、115の切換弁A6を循環側に切り換え、
給水(新鮮水)を開始する。給水(新鮮水)を開始する
と116の通水タイマがカウントを始め、前記116の
通水タイマにより一定量給水するまで通水浄化、すなわ
ち水回路に堆積した垢等の汚れ成分を通水力で洗浄浄化
する。116の通水タイマにより一定量給水されると1
17の切換弁A6を切り換え給水を停止した後、118
の切換弁D14をバイパス通路側に切り換え、119の
循環ポンプ5がONして再び浴槽水を循環浄化する。そ
してふたたび104のタイマに移行して、前記操作をく
り返す。この時の104のタイマは、前記シーケンスが
動作中もカウントをチェックしている。The flowchart of FIG. 5 will be described. When the operation switch of the remote controller 101 is turned on, the various switching valves 102 are first switched to the circulation passage side (to circulate from the return pipe 4 to the going pipe 12), and when the various switching valves are switched, the circulation pump 5 of 103 is turned on. . When the circulation pump 5 is turned on, the setting timer 104 for the drainage, heating and water supply modes starts counting, and the bathtub water 1 is circulated and purified until the setting timer reaches the set time. Purify dirt components such as dirt and hair in 1. When the set timer reaches the set time, the 105 circulation pump 5 is turned off.
The switching valve C11, the switching valve D14, and the switching valve B8 are switched, and when the circulation pump 5 of 107 is turned on, the drainage timer of 108 starts counting, and the filter medium 9 is backwashed and washed until the drainage timer reaches the set time. Drain bathtub water 1. That is, the bathtub water 1 flows into the bypass passage 16 and the lower backwash passage 1
7. Backwashing and washing of the dirt component accumulated on the filter medium 9 in the upward flow through the switching valve C11 (flow rate of about 130% expansion rate ...)
(A flow rate of about 20 to 25 l / min), and drains water from a drain pipe 13 connected to the switching valve B8. Next, when the bathtub water 1 is drained for a certain period of time, the circulation pump 5 of 109 is turned off, and 11
0 switching valve B8 and switching valve C11 to the circulation side, and switching valve D1
4 is switched to the heating source 7 side, and the circulation pump 5 of 111
When N, the heating source 7 of 112 is turned on and the bath water 1
Heat to the set temperature. When the bath water 1 is heated to the set temperature of 113 and heated, the circulation pump 5 of 105 is turned off, and the switching valve A6 of 115 is switched to the circulation side.
Start water supply (fresh water). When the water supply (fresh water) is started, the water flow timer 116 starts counting, and the water flow timer 116 cleans the water flow until a predetermined amount of water is supplied, that is, cleans the dirt components such as dirt deposited in the water circuit with the water force. Purify. 1 when a certain amount of water is supplied by the 116 water flow timer
After switching the switching valve A6 of No. 17 and stopping the water supply, 118
Is switched to the bypass passage side, and the circulation pump 5 of 119 is turned on to circulate and purify the bathtub water again. Then, the process returns to the timer of 104, and the above operation is repeated. At this time, the timer 104 checks the count even while the sequence is operating.
【0030】次に設定温度について説明する。本発明の
設定温度とは、浴槽水1の平均温度を意味し、入浴可能
な低温度である設定温度(約35〜40℃)よりやや低
い温度、すなわち約30〜40℃が好ましい。なぜなら
少なくとも水回路の加熱源7の出口から循環用アダプタ
3の出口までの往き通路を高温殺菌浄化が目的であるか
ら余り設定温度を高温する必要はなく、設定温度を高温
にすると、入浴の安全性や浴槽2の耐久性に問題が生じ
ることから好ましくない。また、加熱源7の種類による
浴槽水1の加熱設定温度35℃として試算すると、例え
ば一般的な浴槽水1加熱源7としてガス燃焼(1200
0kcal/時)による間接加熱(熱交換器使用)の熱
効率を75%、循環流量6l/分とした場合: 12000kcal/時×0.75/6l/分/60分
=25deg 往き通路の加熱水水温は、浴槽水設定温度35℃+25
deg=60℃となり、高温殺菌浄化効果は十分期待
(高温殺菌効果については、後で詳述する)できる。前
述したガス加熱源で説明したが、石油加熱源,電気加熱
源も同様の効果を有する。Next, the set temperature will be described. The set temperature in the present invention means the average temperature of the bathtub water 1, and is preferably a temperature slightly lower than the set temperature (about 35 to 40 ° C) which is a low temperature for bathing, that is, about 30 to 40 ° C. Because at least the outgoing passage from the outlet of the heating source 7 of the water circuit to the outlet of the circulation adapter 3 is intended for high-temperature sterilization and purification, it is not necessary to set the set temperature to a high temperature. This is not preferable because problems occur in the properties and durability of the bathtub 2. Further, when a trial calculation is made with the set temperature of the bathtub water 1 being set to 35 ° C. according to the type of the heating source 7, for example, gas combustion (1200
(0 kcal / hour) when the thermal efficiency of indirect heating (using a heat exchanger) is 75% and the circulation flow rate is 6 l / min: 12000 kcal / hour × 0.75 / 6 l / min / 60 minutes = 25 deg. Is the bath water setting temperature 35 ℃ +25
deg = 60 ° C., and a high-temperature sterilization / purification effect can be sufficiently expected (the high-temperature sterilization effect will be described later in detail). Although the description has been given of the gas heating source described above, the oil heating source and the electric heating source have the same effect.
【0031】次に104のタイマの設定時間について説
明する。前記タイマの設定時間は排水手段,加熱手段,
給水手段を一定時間毎に自動で実施するもので、少なく
とも1日(24時間)に1回以上が望ましく、4〜18
時間毎すなわち1日に2〜4回程度前記動作を実施する
ことが好ましい。4時間以内の設定時間では、浄化効果
(逆洗洗浄,加熱殺菌,洗浄)に対し有効であるが、排
水量,加熱量,給水量が多くなり、省資源,省エネルギ
を考慮すると好ましくない。一方、18時間以上の設定
時間では、入浴時間帯と重なる可能性が大きく、入浴中
に浴槽水1量が低下したり、給水により浴槽水1温度が
低下するなど入浴感が悪くなること、さらに浄化効果が
やや劣るなどの欠点を有し好ましくない。また前記入浴
時間帯と重なる可能性が大きいことから、入浴者の意思
により手動または自動で入浴温度に加熱する手段を検知
した場合は、前記加熱手段から一定時間以内は、実施例
の加熱手段等の浄化手段を待機する併用制御方法も可能
で詳述していないが本発明の実施範囲内である。Next, the set time of the timer 104 will be described. The set time of the timer is a drainage means, a heating means,
The water supply means is automatically carried out at regular intervals, and preferably at least once a day (24 hours).
It is preferable to carry out the above operation every hour, that is, about two to four times a day. A set time of 4 hours or less is effective for the purifying effect (backwashing cleaning, heat sterilization, cleaning), but increases the amount of drainage, heating, and water supply, and is not preferable in consideration of resource saving and energy saving. On the other hand, at the set time of 18 hours or more, the possibility of overlapping with the bathing time zone is large, and the bath tub water 1 volume decreases during bathing, and the bath tub water 1 temperature decreases due to water supply, and the bathing feeling deteriorates. It has disadvantages such as a slightly inferior purification effect, which is not preferred. Also, since the possibility of overlapping with the bathing time zone is large, if a means for manually or automatically heating to the bathing temperature is detected by the bather's intention, the heating means or the like of the embodiment is used within a certain time from the heating means. Although a combined control method for waiting for the purifying means is also possible and not described in detail, it is within the scope of the present invention.
【0032】(実施例3)本発明の実施例3の浴槽装置
について図6に基づいて説明する。(Embodiment 3) A bathtub apparatus according to Embodiment 3 of the present invention will be described with reference to FIG.
【0033】図6において、前記実施例1との違いは、
水回路の一部に設けた給水部構成と給水部から給水し
て、残留塩素含有水としたもので、制御部の信号により
水回路の一部に給水弁25をON・OFFさせ、残留塩
素含有水の残留塩素により水回路を強制的に殺菌浄化す
る。この時残留塩素含有水を水回路を経て循環用アダプ
タ3に達する給水とするように制御部の信号により給水
弁25をON・OFFさせるものである。In FIG. 6, the difference from the first embodiment is as follows.
A water supply section provided in a part of the water circuit and water supplied from the water supply section to form residual chlorine-containing water. The water supply valve 25 is turned on / off in a part of the water circuit by a signal from the control section, and the residual chlorine is supplied. The water circuit is forcibly sterilized and purified by the residual chlorine contained in the water. At this time, the water supply valve 25 is turned ON / OFF by a signal from the control unit so that the residual chlorine-containing water is supplied to the circulation adapter 3 via the water circuit.
【0034】次に残留塩素含有水について詳述する。残
留塩素含有水とは、残留塩素として0.1ppm以上を
含有した新鮮水で、塩素ガスを溶解させたもの、次亜塩
素酸ナトリウムを溶解させたもの、固形の次亜塩素酸カ
ルシウムやジクロイソシアヌル酸塩を溶解させたものを
別途濃度制御したものである。別途濃度制御する手段と
して、前記塩素ガス溶解水や次亜塩素酸ナトリウム水等
の高残留塩素濃度水を定量ポンプ等で給水に定量注水
し、濃度制御したものである。給水の残留塩素濃度は前
記0.1ppm以上としたが、水回路の構成部品の材質
として、銅および銅合金、NBRおよびEPDMゴム、
PPおよびPOM樹脂等が一般的であり、これらの材質
の耐久性を考慮すると10ppm以下が望ましい。ま
た、短時間で殺菌効果を効果的にし、かつ構成部品材質
の信頼性を考慮すると、好ましい残留塩素濃度は0.3
〜5ppmである。Next, the residual chlorine-containing water will be described in detail. Residual chlorine-containing water is fresh water containing 0.1 ppm or more of residual chlorine, in which chlorine gas is dissolved, sodium hypochlorite is dissolved, solid calcium hypochlorite or dichloisocyanur The solution in which the acid salt was dissolved was separately subjected to concentration control. As means for separately controlling the concentration, the chlorine gas-dissolved water or high residual chlorine concentration water such as aqueous sodium hypochlorite is quantitatively injected into feed water by a constant-rate pump or the like, and the concentration is controlled. The residual chlorine concentration of the feed water was 0.1 ppm or more, but copper and copper alloy, NBR and EPDM rubber,
PP and POM resins and the like are generally used, and considering the durability of these materials, the content is preferably 10 ppm or less. In addition, when the sterilizing effect is made effective in a short time and the reliability of the component materials is considered, the preferable residual chlorine concentration is 0.3%.
55 ppm.
【0035】次に水回路から循環用アダプタに達する残
留塩素含有水の給水する手段について説明する。残留塩
素含有水を給水する水回路として、(a)戻り管4単給
水通路、(b)往き管12単給水通路、および(a)戻
り管4と(b)往き管12の複給水通路とがある。
(1)の(a)戻り管4単給水通路とは、切換弁D14
を切り換えることによって加熱源7側とバイパス通路1
6側に流れないように閉止し、浴槽水の循環浄化用水回
路は切換弁A6により循環浄化通路とした後、給水弁2
5をONすると前記(a)戻り管4単給水通路に給水さ
れる。(2)の(b)往き管12の単給水通路とは、浴
槽水の循環浄化用水回路を切換弁A6により、戻り管4
側に流れないように閉止し、前記切換弁D14を切り換
えることによって使用目的に応じ加熱源7側またはバイ
パス通路16側に給水される。(3)の(a)戻り管4
と(b)往き管12の複給水通路とは、前記浴槽水の循
環浄化用水回路側にすべて切換弁を切り換え、(a)戻
り管4と(b)往き管12に同時または繰り返し給水さ
せる。Next, a means for supplying residual chlorine-containing water from the water circuit to the circulation adapter will be described. The water circuit for supplying the residual chlorine-containing water includes (a) a return pipe 4 with a single water supply passage, (b) a single water supply path with the return pipe 12, and (a) a double water supply path with the return pipe 4 and (b) the return pipe 12. There is.
(1) (a) The return pipe 4 and the single water supply passage are the switching valve D14
By switching between the heating source 7 side and the bypass passage 1
6 is closed so that it does not flow to the side 6 and the bathtub water circulation purifying water circuit is set as a circulation purifying passage by the switching valve A6.
When 5 is turned on, water is supplied to the (a) return pipe 4 single water supply passage. (2) (b) The single supply water passage of the outgoing pipe 12 is connected to the return water pipe 4 by the switching valve A6 in the bathtub water circulation purifying water circuit.
The water is supplied to the heating source 7 or the bypass passage 16 depending on the purpose of use by closing the valve so as not to flow to the side and switching the switching valve D14. (3) (a) Return pipe 4
And (b) the double water supply passage of the outgoing pipe 12 switches all the switching valves to the circulating purification water circuit side of the bathtub water so as to supply water simultaneously or repeatedly to the (a) return pipe 4 and (b) the outgoing pipe 12.
【0036】(実施例4)本発明の実施例4の浴槽装置
について、図7の同時給水、滞留モードに基づいて説明
する。(Embodiment 4) A bathtub apparatus according to Embodiment 4 of the present invention will be described based on the simultaneous water supply and residence mode shown in FIG.
【0037】図7において、制御部の信号により(以下
シーケンスNo.は省略する)循環浄化モードである浴
槽水の循環浄化用水回路の状態ままで循環ポンプ5をO
FFし停止させ、予め残留塩素含有水を給水する給水弁
25をONさせると同時に、給水タイマがカウントを始
め、前記実施例2で詳述した水回路の給水条件である
(3)の(a)戻り管4と(b)往き管12の全容量以
上に一定量同時給水し、前記一定量給水すると給水弁2
5をOFFし給水を停止させる。そして給水弁25がO
FFすると、滞留タイマがカウントを始め、残留塩素含
有水が給水された水回路に、前記残留塩素含有水を設定
時間に達するまで滞留させる。この滞留設定時間により
水回路の各種細菌を残留塩素含有水に接触させ、より殺
菌浄化効果を大きく、かつ確実に殺菌することができ
る。In FIG. 7, the circulation pump 5 is turned on in response to a signal from the control unit (sequence number is omitted) while the bathtub water circulation purifying water circuit is in the circulation purifying mode.
At the same time as turning on the water supply valve 25 for supplying the residual chlorine-containing water, the water supply timer starts counting, and the water supply condition of the water circuit described in the second embodiment is (a) in (3). ) A fixed amount of water is simultaneously supplied to the return pipe 4 and (b) the total volume of the outgoing pipe 12 or more.
Turn OFF 5 to stop water supply. And the water supply valve 25 is O
When FF is performed, the retention timer starts counting, and the residual chlorine-containing water is retained in the water circuit to which the residual chlorine-containing water is supplied until the set time is reached. With the set residence time, various bacteria in the water circuit are brought into contact with the residual chlorine-containing water, so that the sterilizing and purifying effect can be increased and the bacteria can be surely sterilized.
【0038】次に、滞留タイマの滞留設定時間は、残留
塩素含有水の残留塩素濃度によって決定される。各種細
菌により殺菌濃度と時間は異なるが、一般的には残留塩
素濃度が低濃度の場合、設定時間は長時間とし、また高
濃度の場合、設定時間は短時間の設定となっているが、
本発明者らが実施した殺菌評価の結果を図8に示す。図
8の殺菌評価条件は、検水量:500ml、水温:
20℃、初期一般細菌数:5,000,000コ/m
l、残留塩素濃度:0、0.1、0.52ppmの各
種条件で試験した。図8に示したように、水道水基準で
ある一般細菌数100コ/ml以下にするための滞留時
間は、0.1ppmで約15分、0.5ppmで約5
分、2ppmで約2分で殺菌可能となる。よって、好ま
しい滞留時間は、残留塩素濃度によって異なるが15分
以上である。Next, the retention time of the retention timer is determined by the residual chlorine concentration of the residual chlorine-containing water. Although the bactericidal concentration and time are different depending on various bacteria, in general, when the residual chlorine concentration is low, the setting time is long, and when the residual chlorine concentration is high, the setting time is short,
FIG. 8 shows the results of the sterilization evaluation performed by the present inventors. The sterilization evaluation conditions in FIG. 8 are as follows: water sample volume: 500 ml, water temperature:
20 ° C, initial general bacterial count: 5,000,000 cells / m
l, The residual chlorine concentration was tested under various conditions of 0, 0.1, and 0.52 ppm. As shown in FIG. 8, the residence time for reducing the number of general bacteria to 100 cells / ml or less based on tap water is about 15 minutes at 0.1 ppm and about 5 minutes at 0.5 ppm.
Can be sterilized in about 2 minutes at 2 ppm. Therefore, the preferred residence time depends on the residual chlorine concentration, but is at least 15 minutes.
【0039】(実施例5)本発明の実施例5の浴槽装置
について図9,図10に基づいて説明する。(Embodiment 5) A bathtub apparatus according to Embodiment 5 of the present invention will be described with reference to FIGS.
【0040】図9において、制御部の信号により(以下
シーケンスNo.は省略する)循環浄化モードである浴
槽水の循環浄化用水回路の状態ままで循環ポンプ5をO
FFし停止させると、給水弁25がONする。給水弁2
5がONすると、給水給湯用水回路の加熱源26がON
し、予め設定された高設定温度まで給水を加熱するとと
もに、給水タイマがカウントを始め、水回路、すなわち
前記実施例2で詳述した水回路の給水条件である(3)
の(a)戻り管4と(b)往き管12の全容量以上に一
定量同時給水させる。一定量同時加熱給水すると、給水
弁25がOFFし高温給水を停止すると同時に加熱源2
6がOFFすると、滞留タイマがカウントを始め、高温
加熱水を水回路に設定時間に達するまで滞留させる。こ
の滞留設定温度と滞留高温水により、水回路に堆積した
垢等の付着力を小さくするとともに、各種細菌を高温加
熱水に接触させ高温殺菌する。さらに加熱給水として残
留塩素含有水を用いることにより、残留塩素殺菌と高温
加熱殺菌の相乗効果で、より殺菌浄化効果を大きく、か
つ確実に殺菌浄化することができる。また加熱給水が高
温加熱水であることから、残留塩素含有水の残留塩素濃
度が低下しても確実に高温殺菌することができる。実施
例では詳述していないが、繰り返し給水することによ
り、特に高温加熱水を給水した後に、非加熱給水(大気
温度レベルの水温)を一定時間給水することにより、水
回路の構成部品の耐久性や浴槽2に接続された戻り管
4、往き管12による火傷の防止等を考慮して冷却させ
ることも、本発明の範囲内である。In FIG. 9, the circulation pump 5 is turned on in response to a signal from the control unit (sequence number is omitted) while the bathtub water circulation purification water circuit is in the circulation purification mode.
When the FF is stopped, the water supply valve 25 is turned on. Water supply valve 2
When 5 is turned on, the heating source 26 of the water supply / hot-water supply circuit is turned on.
Then, the water is heated to a preset high set temperature, and the water supply timer starts counting, which is the water supply condition of the water circuit, that is, the water circuit described in detail in the second embodiment (3).
(A) Simultaneously supply a fixed amount of water over the entire capacity of the return pipe 4 and (b) the outgoing pipe 12. When a fixed amount of water is supplied at the same time, the water supply valve 25 is turned off and the high-temperature water supply is stopped.
When 6 is turned off, the residence timer starts counting and keeps the high-temperature heated water in the water circuit until the set time is reached. The staying set temperature and the staying high-temperature water reduce the adhesion of dirt and the like accumulated in the water circuit, and at the same time, bring various bacteria into contact with the high-temperature heating water to sterilize at high temperature. Furthermore, by using residual chlorine-containing water as the heating water supply, the synergistic effect of the residual chlorine sterilization and the high-temperature heat sterilization makes it possible to further increase the sterilizing and purifying effect and to surely sterilize and purify. Further, since the heating supply water is high-temperature heating water, even if the residual chlorine concentration of the residual chlorine-containing water is reduced, high-temperature sterilization can be ensured. Although not described in detail in the embodiment, by repeatedly supplying water, especially after supplying high-temperature heated water, non-heated water (water temperature at the atmospheric temperature level) is supplied for a certain period of time, so that the durability of the components of the water circuit is improved. It is also within the scope of the present invention to allow for cooling in consideration of the properties and prevention of burns caused by the return pipe 4 and the forward pipe 12 connected to the bathtub 2.
【0041】次に高温殺菌について詳述する。高温殺菌
とは、各種細菌が高温に弱い性質を利用して殺菌するも
ので、前記各種細菌により高温殺菌温度と高温保持時間
は異なるが、一般的には比較的低温度の場合、保持時間
は長時間とし、高温度の場合、短時間の保持時間でよい
となっているが、本発明者らが実施した高温殺菌評価の
結果を図10に示す。図10の高温殺菌評価条件は、
検水量:100ml、一般細菌:5,000,000
コ/mlをビーカに入れ、前記検水に熱電対を浸せきし
たものを電子レンジで加熱、加熱温度:50,55,
60,65,70℃の条件で試験した。前記の加熱温度
は、温度上昇の最高温度で、公差2deg以内とし、保
持時間内は恒温水槽で保持した。また保持時間とは、温
度上昇の最高温度で、公差2deg以内に達してからの
時間である。図10に示したように、水道水基準である
一般細菌数100コ/ml以下にするための加熱温度
は、55℃以上で5分以上が必要である。また60℃で
は、60℃に達したらほぼ100%高温殺菌浄化が可能
である。Next, high-temperature sterilization will be described in detail. High-temperature sterilization is to sterilize various bacteria by utilizing the property of being weak to high temperatures, and the high-temperature sterilization temperature and the high-temperature holding time are different depending on the various bacteria, but generally, when the temperature is relatively low, the holding time is long. In the case of a long time and a high temperature, a short holding time is sufficient. The results of the high-temperature sterilization evaluation performed by the present inventors are shown in FIG. The high-temperature sterilization evaluation conditions in FIG.
Test volume: 100 ml, general bacteria: 5,000,000
コ / ml was placed in a beaker, and the thermocouple was immersed in the sample, heated in a microwave oven, heating temperature: 50, 55,
The test was performed at 60, 65, and 70 ° C. The heating temperature was the maximum temperature at which the temperature rose, with a tolerance of 2 deg or less, and was held in a constant temperature water bath for the holding time. The holding time is the time after the temperature reaches the maximum temperature and reaches a tolerance of 2 deg or less. As shown in FIG. 10, the heating temperature for reducing the number of general bacteria to 100 cells / ml or less, which is the standard of tap water, requires 55 minutes or more and 5 minutes or more. At 60 ° C., almost 100% high-temperature sterilization and purification can be performed when the temperature reaches 60 ° C.
【0042】(実施例6)本発明の実施例5の浴槽水の
循環用水回路の浄化について図11に基づいて説明す
る。(Embodiment 6) Purification of a bathtub water circulation water circuit according to Embodiment 5 of the present invention will be described with reference to FIG.
【0043】図11において、制御部の信号により切換
弁A6を切換えると同時に、残留塩素含有水として、一
般家庭で使用している水道水を設定通水量分だけ、実施
例3で詳述した(2)の戻りと往き循環用水回路に同時
通水させることによって、利便性と経済性に優れた浄化
方法とすることができる。In FIG. 11, the switching valve A6 is switched by the signal of the control unit, and at the same time, the residual chlorine-containing water is used as the residual chlorine-containing water, and the tap water used in ordinary households is described in detail in the third embodiment. By simultaneously passing water through the return and outgoing circulation water circuit of 2), a purification method excellent in convenience and economy can be provided.
【0044】[0044]
【発明の効果】以上のように、本発明の浴槽装置は、水
回路に浴槽水を循環する循環ポンプと、浴槽水を加熱す
る加熱源と、浴槽水をろ過するろ過槽と、浴槽と水回路
を接続する循環用アダプタと、水回路と浴槽水を殺菌す
る難溶性銀塩と、浴槽に給水する給水部を設け、一定時
間毎に自動給水,自動逆洗排水,自動加熱することによ
って、難溶性銀塩による浴槽水の殺菌あるいは制菌効果
に加え、給水により水回路の堆積物を洗浄し、各種細菌
の増殖を抑えることができる。また加熱により高温殺菌
と、ろ過槽の逆洗により浄化能力の再生の併用相乗効果
によって、浴槽水,水回路を常にきれいに、清潔に保つ
ことができる。As described above, the bathtub apparatus of the present invention comprises a circulating pump for circulating bathtub water in a water circuit, a heating source for heating bathtub water, a filtration tank for filtering bathtub water, a bathtub and water. A circulation adapter for connecting the circuit, a sparingly soluble silver salt for sterilizing the water circuit and bathtub water, and a water supply unit for supplying water to the bathtub are provided. Automatic water supply, automatic backwash drainage, and automatic heating are performed at regular intervals. In addition to the sterilization or bacteriostatic effect of the bath water by the sparingly soluble silver salt, the water supply can wash the sediment in the water circuit and suppress the growth of various bacteria. Further, the bath tub water and the water circuit can be kept clean at all times by the synergistic effect of high-temperature sterilization by heating and regeneration of purification ability by back washing of the filter tank.
【0045】また、難溶性銀塩として、塩化銀の単体や
布に担持したものを用いることにより、接触面積を大き
くし接触殺菌あるいは銀イオンを溶出させやすくする。
また塩化銀を用いることにより、容易に入手、合成しや
すく、比較的安価で経済性に優れ、かつ安全性が高く、
加工性に優れている。さらにろ過槽と往き管の間の一部
に樹脂製保持具に充填装着設置することにより、ろ過さ
れた浴槽水が循環されるため、塩化銀表面が汚れ成分に
より汚染されることが少なく、常に塩化銀表面がきれい
な状態で各種細菌を接触殺菌することができるととも
に、銀イオンの溶出を安定的に保つことができる。Further, by using a silver chloride simple substance or a substance carried on a cloth as the hardly soluble silver salt, the contact area is increased to facilitate contact sterilization or elution of silver ions.
In addition, by using silver chloride, it is easily available, easily synthesized, relatively inexpensive, excellent in economic efficiency, and high in safety,
Excellent workability. In addition, by installing and filling a resin holder in a part between the filtration tank and the outflow pipe, the filtered bathtub water is circulated, so the silver chloride surface is less likely to be contaminated with dirt components, and it is always Various bacteria can be contact-sterilized with a clean silver chloride surface, and the elution of silver ions can be stably maintained.
【0046】また、一定時間毎に逆洗洗浄排水,加熱,
給水の順位手段にすることにより、浴槽水量を少なくし
た後、加熱するため加熱エネルギが少なくてすむこと、
また給水による濁りの希釈率を大きくすることができ
る。Further, the backwashing drainage, heating,
By making the water supply priority means, after reducing the bathtub water volume, heating can be done with less heating energy,
Further, the dilution ratio of turbidity due to water supply can be increased.
【0047】また、残留塩素含有水を給水し、かつ水回
路全体に給水することにより、水回路で増殖する各種細
菌を残留塩素殺菌することができる。また浴槽水の一部
にも残留塩素含有水が給水されるため、部分的ではある
が、浴槽水の各種細菌も同時に殺菌または制菌浄化する
ことができる。Further, by supplying residual chlorine-containing water and supplying water to the entire water circuit, various bacteria growing in the water circuit can be sterilized with residual chlorine. Further, since the residual chlorine-containing water is supplied to a part of the bathtub water, various bacteria in the bathtub water can be sterilized or bacteriostatically purified at the same time, though partially.
【0048】また、残留塩素含有水を給水し、かつ水回
路全体に給水した後、一定時間滞留することにより、水
回路で増殖する各種細菌をより確実に殺菌することがで
きる。Further, by supplying residual chlorine-containing water and supplying water to the entire water circuit, the remaining water is kept for a certain period of time, so that various bacteria growing in the water circuit can be more reliably sterilized.
【0049】また、給水した残留塩素含有水を加熱する
ことにより、加熱殺菌と残留塩素殺菌の併用相乗効果を
より、さらにより確実に殺菌浄化できる。Further, by heating the supplied residual chlorine-containing water, the synergistic effect of the combined use of the heat sterilization and the residual chlorine sterilization can be more reliably sterilized and purified.
【0050】また、残留塩素含有水を加熱給水した後、
残留塩素含有水を非加熱給水することにより、水回路の
垢等の汚れ成分の付着力を小さくして剥離しやすくする
とともに、加熱と残留塩素の併用殺菌し、そして非加熱
の残留塩素含有水を給水することにより、水回路の構成
部品を冷却して耐久性を向上させるとともに、再度残留
塩素の分解を遅らせ残留塩素濃度を保持させて殺菌効果
をより大きくし、各種細菌をダブル殺菌することができ
る。After the residual chlorine-containing water is heated and supplied,
By supplying the residual chlorine-containing water without heating, the adhesion of dirt components such as dirt in the water circuit is reduced to facilitate peeling, and the combined use of heating and residual chlorine is sterilized. By supplying water, the components of the water circuit are cooled and the durability is improved.At the same time, the decomposition of residual chlorine is delayed and the residual chlorine concentration is maintained to increase the sterilizing effect. Can be.
【0051】また、残留塩素含有水の温度を55℃以上
にすることにより、残留塩素濃度が低下しても、高温加
熱水による各種細菌を高温で殺菌し、残留塩素殺菌と高
温加熱殺菌の相乗効果により、殺菌時間を短時間にする
ことができる。Further, by setting the temperature of the residual chlorine-containing water to 55 ° C. or more, even if the residual chlorine concentration is lowered, various bacteria are sterilized at a high temperature by the high-temperature heated water, and the synergistic effect of the residual chlorine sterilization and the high-temperature sterilization is achieved. According to the effect, the sterilization time can be shortened.
【0052】さらにまた、残留塩素含有水として、水道
水とすることにより、利便性と経済性に優れた殺菌浄化
ができる。Further, by using tap water as the residual chlorine-containing water, it is possible to perform sterilization and purification excellent in convenience and economy.
【図1】本発明の実施例1の浴槽装置の構成図FIG. 1 is a configuration diagram of a bathtub apparatus according to a first embodiment of the present invention.
【図2】(a)本発明の実施例1の浴槽装置に使用した
塩化銀プレート形状と樹脂制保持具の構成図 (b)同実施例の浴槽装置に使用した塩化銀担持不織布
形状と樹脂制保持具の構成図FIG. 2 (a) Silver chloride plate shape used in the bathtub apparatus of Embodiment 1 of the present invention and configuration diagram of resin control holder (b) Silver chloride carrying non-woven fabric shape and resin used in bathtub apparatus of the same embodiment Configuration diagram
【図3】本発明の浴槽装置と従来法の浴槽装置の浄化の
比較図FIG. 3 is a comparison diagram of purification of the bathtub apparatus of the present invention and a conventional bathtub apparatus.
【図4】(a)本発明の実施例1の浴槽装置と従来法の
浴槽装置の比較試験用水回路の構成図 (b)同比較試験用水回路の浄化プレート部の上面構成
図 (c)同比較試験用水回路の浄化プレート部の断面構成
図FIG. 4 (a) is a configuration diagram of a comparative test water circuit of the bathtub device according to the first embodiment of the present invention and a conventional bathtub device. (B) A top configuration diagram of a purification plate portion of the comparative test water circuit. Sectional configuration diagram of the purification plate part of the water circuit for comparative test
【図5】本発明の実施例2の浴槽装置の排水,加熱,給
水モードを示すフローチャートFIG. 5 is a flowchart showing drainage, heating, and water supply modes of the bathtub apparatus according to the second embodiment of the present invention.
【図6】本発明の実施例3の浴槽装置の残留塩素含有水
を給水する浴槽装置の構成図FIG. 6 is a configuration diagram of a bathtub apparatus for supplying residual chlorine-containing water in the bathtub apparatus according to Embodiment 3 of the present invention.
【図7】(a)本発明の実施例4の浴槽装置の構成図 (b)同浴槽装置の水回路の同時給水、滞留モードを示
すフローチャートFIG. 7A is a configuration diagram of a bathtub apparatus according to a fourth embodiment of the present invention. FIG. 7B is a flowchart showing a simultaneous water supply and retention mode of a water circuit of the bathtub apparatus.
【図8】(a)本発明の実施例4の浴槽装置の殺菌評価
効果を示す図 (b)同殺菌評価効果を示す表図FIG. 8 (a) is a diagram showing a sterilization evaluation effect of the bathtub apparatus according to the fourth embodiment of the present invention; and (b) a table showing the same sterilization evaluation effect.
【図9】(a)本発明の実施例5の浴槽装置の構成図 (b)同浴槽装置の高温滞留モードを示すフローチャー
ト9A is a configuration diagram of a bathtub apparatus according to a fifth embodiment of the present invention. FIG. 9B is a flowchart showing a high-temperature residence mode of the bathtub apparatus.
【図10】(a)本発明の実施例5の浴槽装置の高温殺
菌評価効果を示す図 (b)同高温殺菌評価効果を示す図FIG. 10 (a) is a diagram showing a high-temperature sterilization evaluation effect of the bathtub apparatus according to the fifth embodiment of the present invention. (B) A diagram showing the same high-temperature sterilization evaluation effect.
【図11】本発明の実施例6の水道水給水する浴槽装置
の構成図FIG. 11 is a configuration diagram of a bathtub apparatus for supplying tap water according to a sixth embodiment of the present invention.
【図12】従来の浴槽装置の構成図FIG. 12 is a configuration diagram of a conventional bathtub apparatus.
1 浴槽水 3 循環用アダプタ 4 戻り管 5 循環 6 切換弁A 7 加熱源 8 切換弁B 9 ろ過材 10 ろ過槽 11 切換弁C 12 往き管 13 排水管 14 切換弁D 15 上部逆洗通路 16 バイパス通路 17 下部往き通路 18 塩化銀プレート 20 塩化銀担持不織布 22,23 浄化判定プレート部 24 浄化判定プレート 25 給水弁 26 加熱源 DESCRIPTION OF SYMBOLS 1 Bath water 3 Circulation adapter 4 Return pipe 5 Circulation 6 Switching valve A 7 Heating source 8 Switching valve B 9 Filter material 10 Filtration tank 11 Switching valve C 12 Outgoing pipe 13 Drain pipe 14 Switching valve D 15 Upper backwash passage 16 Bypass Passage 17 Lower going passage 18 Silver chloride plate 20 Silver chloride supporting non-woven fabric 22, 23 Purification judgment plate part 24 Purification judgment plate 25 Water supply valve 26 Heat source
フロントページの続き (51)Int.Cl.6 識別記号 FI C02F 1/50 510 C02F 1/50 520L 520 531T 531 531M 540F 540 540B 550H 550 560Z 560 560A 1/76 A 1/76 B01D 35/02 J F24H 1/00 302 F24H 1/00 602L (72)発明者 青木 哲郎 大阪府門真市大字門真1006番地 松下電器 産業株式会社内 (72)発明者 山内 博明 大阪府門真市大字門真1006番地 松下電器 産業株式会社内Continued on the front page (51) Int.Cl. 6 Identification FI C02F 1/50 510 C02F 1/50 520L 520 531T 531 531M 540F 540 540B 550H 550 560Z 560 560A 1/76 A 1/76 B01D 35/02 J 1/00 302 F24H 1/00 602L (72) Inventor Tetsuro Aoki 1006 Odakadoma, Kadoma City, Osaka Prefecture Inside Matsushita Electric Industrial Co., Ltd. (72) Inventor Hiroaki Yamauchi 1006 Odakadoma, Kadoma City, Osaka Prefecture Matsushita Electric Industrial Co., Ltd. Inside
Claims (9)
循環ポンプと、浴槽水を加熱する加熱源と、浴槽水をろ
過するろ過槽と、浴槽と水回路を接続する循環用アダプ
タと、前記水回路の一部に水回路と浴槽水を殺菌する難
溶性銀塩と、浴槽に給水する給水部を設け、前記浴槽に
一定時間毎に自動給水する手段と、給水または浴槽水を
用いろ過槽を一定時間毎に自動逆洗洗浄排水する手段
と、浴槽水を一定時間毎に自動加熱する手段を備えてな
る浴槽装置。1. A circulating pump provided in a part of a water circuit for circulating bath water, a heating source for heating the bath water, a filtration tank for filtering the bath water, and a circulation adapter for connecting the bath water to the water circuit. A sparingly soluble silver salt for disinfecting the water circuit and bathtub water in a part of the water circuit, a water supply unit for supplying water to the bathtub, means for automatically supplying water to the bathtub at regular intervals, and water supply or bathwater. A bathtub apparatus comprising means for automatically backwashing and draining a filter tank at regular intervals and means for automatically heating bathtub water at regular intervals.
レート,塩化銀担持布,塩化銀不織布の少なくとも1つ
からなる請求項1記載の浴槽装置。2. The bathtub apparatus according to claim 1, wherein the hardly soluble silver salt is at least one of granular silver chloride, a silver chloride plate, a silver chloride supporting cloth, and a silver chloride non-woven fabric.
動加熱する手段により浴槽水を設定温度まで加熱し、給
水部により水回路を介し浴槽に自動給水する請求項1記
載の浴槽装置。3. The bathtub apparatus according to claim 1, wherein the bathtub water is heated to a set temperature by means of automatic heating after automatic backwashing and drainage using the bathtub water, and the water supply section automatically supplies water to the bathtub through a water circuit. .
して、残留塩素含有水を給水するとともに、前記給水さ
れた残留塩素含有水が水回路を経て循環用アダプタに達
する給水としてなる請求項1または3記載の浴槽装置。4. A residual chlorine-containing water is supplied as water supplied from a water supply section provided in a part of a water circuit, and the supplied residual chlorine-containing water is supplied as water supplied to a circulation adapter via a water circuit. The bathtub apparatus according to claim 1.
回路を経て循環用アダプタに達した後、給水を停止し、
残留塩素含有水を一定時間水回路に滞留してなる請求項
4記載の浴槽装置水。5. After the residual chlorine-containing water supplied from the water supply section reaches the circulation adapter via the water circuit, the water supply is stopped,
The bathtub apparatus water according to claim 4, wherein the residual chlorine-containing water is retained in the water circuit for a predetermined time.
求項1または3から5のいずれか1項記載の浴槽装置。6. The bathtub apparatus according to claim 1, further comprising means for heating residual chlorine-containing water.
有水を水回路に給水した後、加熱する手段により加熱さ
れていない残留塩素含有水を水回路に給水する請求項3
から6のいずれか1項記載の浴槽装置。7. The residual chlorine-containing water heated by the heating means is supplied to the water circuit, and the residual chlorine-containing water not heated by the heating means is supplied to the water circuit.
The bathtub apparatus according to any one of claims 1 to 6, wherein
残留塩素含有水の温度を55℃以上としてなる請求項1
または3から7のいずれか1項記載の浴槽装置。8. The temperature of feed water or residual chlorine-containing water heated by heating means is set to 55 ° C. or higher.
Or the bathtub apparatus according to any one of 3 to 7.
て、水道水としてなる請求項1または3から8のいずれ
か1項記載の浴槽装置。9. The bathtub apparatus according to claim 1, wherein the water containing residual chlorine supplied from the water supply section is tap water.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP9166973A JPH1114157A (en) | 1997-06-24 | 1997-06-24 | Bathtub equipment |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP9166973A JPH1114157A (en) | 1997-06-24 | 1997-06-24 | Bathtub equipment |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| JPH1114157A true JPH1114157A (en) | 1999-01-22 |
Family
ID=15841056
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP9166973A Pending JPH1114157A (en) | 1997-06-24 | 1997-06-24 | Bathtub equipment |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JPH1114157A (en) |
Cited By (5)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP2001259651A (en) * | 2000-03-21 | 2001-09-25 | Nippon Ion Kk | Sterilization method of Legionella spp. Using metal ion sterilizer |
| JP2002331210A (en) * | 2001-05-10 | 2002-11-19 | Janome Sewing Mach Co Ltd | Bath water cleaning device and cleaning method of bath water cleaning device |
| JP2006183911A (en) * | 2004-12-27 | 2006-07-13 | Noritz Corp | Hot water storage type water heater with sterilizing function |
| CN102307640A (en) * | 2009-02-04 | 2012-01-04 | Lg电子株式会社 | Method for cleaning water purifier |
| JP2012037077A (en) * | 2010-08-04 | 2012-02-23 | Panasonic Corp | Dissolving device, and hot water supply device with the same |
-
1997
- 1997-06-24 JP JP9166973A patent/JPH1114157A/en active Pending
Cited By (6)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP2001259651A (en) * | 2000-03-21 | 2001-09-25 | Nippon Ion Kk | Sterilization method of Legionella spp. Using metal ion sterilizer |
| JP2002331210A (en) * | 2001-05-10 | 2002-11-19 | Janome Sewing Mach Co Ltd | Bath water cleaning device and cleaning method of bath water cleaning device |
| JP2006183911A (en) * | 2004-12-27 | 2006-07-13 | Noritz Corp | Hot water storage type water heater with sterilizing function |
| CN102307640A (en) * | 2009-02-04 | 2012-01-04 | Lg电子株式会社 | Method for cleaning water purifier |
| US8986462B2 (en) | 2009-02-04 | 2015-03-24 | Lg Electronics Inc. | Method for cleaning water purifier |
| JP2012037077A (en) * | 2010-08-04 | 2012-02-23 | Panasonic Corp | Dissolving device, and hot water supply device with the same |
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