JPH11214018A - Low temperature fabrication of ZrO2 based solid electrolyte membrane by sol-gel method - Google Patents
Low temperature fabrication of ZrO2 based solid electrolyte membrane by sol-gel methodInfo
- Publication number
- JPH11214018A JPH11214018A JP10023768A JP2376898A JPH11214018A JP H11214018 A JPH11214018 A JP H11214018A JP 10023768 A JP10023768 A JP 10023768A JP 2376898 A JP2376898 A JP 2376898A JP H11214018 A JPH11214018 A JP H11214018A
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- Prior art keywords
- sol
- solid electrolyte
- gel
- electrolyte membrane
- temperature
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Classifications
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- Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y02—TECHNOLOGIES OR APPLICATIONS FOR MITIGATION OR ADAPTATION AGAINST CLIMATE CHANGE
- Y02E—REDUCTION OF GREENHOUSE GAS [GHG] EMISSIONS, RELATED TO ENERGY GENERATION, TRANSMISSION OR DISTRIBUTION
- Y02E60/00—Enabling technologies; Technologies with a potential or indirect contribution to GHG emissions mitigation
- Y02E60/30—Hydrogen technology
- Y02E60/50—Fuel cells
-
- Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y02—TECHNOLOGIES OR APPLICATIONS FOR MITIGATION OR ADAPTATION AGAINST CLIMATE CHANGE
- Y02P—CLIMATE CHANGE MITIGATION TECHNOLOGIES IN THE PRODUCTION OR PROCESSING OF GOODS
- Y02P70/00—Climate change mitigation technologies in the production process for final industrial or consumer products
- Y02P70/50—Manufacturing or production processes characterised by the final manufactured product
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- Compositions Of Oxide Ceramics (AREA)
- Fuel Cell (AREA)
Abstract
(57)【要約】
【課題】 ZrO2系薄膜固体電解質を比較的製造コス
トの低いゾルゲル法により作製し、その製造プロセス温
度を低く抑えつつ良好な伝導度特性を有する固体電解質
膜を得る事を目的とする。
【解決手段】 主成分元素のZrおよび主添加物元素D
1としてY、Yb、Luのいずれかを含み、かつ、第二
添加物元素D2としてAl、Mg、Siのいずれかを含
むゾルゲル液を用意し、このゾルゲル液を多孔質の電極
基板の上に塗布し、これを電気炉等の中で熱処理するこ
とを特徴とする。
【効果】 比較的低い温度でもイオン伝導性に優れた電
解質を低温で、かつ簡便に薄膜化できる。
PROBLEM TO BE SOLVED: To produce a ZrO 2 -based thin film solid electrolyte by a sol-gel method with relatively low production cost, and to obtain a solid electrolyte membrane having good conductivity characteristics while keeping the production process temperature low. Aim. SOLUTION: Main component element Zr and main additive element D
A sol-gel solution containing any one of Y, Yb, and Lu as 1 and any one of Al, Mg, and Si as the second additive element D2 is prepared, and the sol-gel solution is placed on a porous electrode substrate. It is characterized in that it is applied and heat-treated in an electric furnace or the like. [Effect] An electrolyte having excellent ion conductivity can be easily formed into a thin film at a low temperature even at a relatively low temperature.
Description
【0001】[0001]
【産業上の利用分野】本発明はゾルゲル法によるZrO
2系固体電解質膜の低温作製法に関するものである。BACKGROUND OF THE INVENTION 1. Field of the Invention The present invention relates to ZrO
The present invention relates to a method for producing a low-temperature solid electrolyte membrane.
【0002】[0002]
【従来の技術および問題点】近年、酸素イオン伝導体を
用いた固体電解質燃料電池に関心が高まりつつある。特
にエネルギーの有効利用という観点から、固体燃料電池
はカルノー効率の制約を受けないため本質的に高いエネ
ルギー変換効率を有し、さらに良好な環境保全が期待さ
れるなどの優れた特長を持っている。2. Description of the Related Art In recent years, interest has been growing in solid electrolyte fuel cells using oxygen ion conductors. In particular, from the viewpoint of effective use of energy, solid fuel cells have essentially high energy conversion efficiencies because they are not restricted by Carnot efficiency, and have excellent features such as better environmental protection. .
【0003】現在最も良く検討されている酸素イオン導
伝体にY2O3安定化ZrO2(YSZ)がある。このZ
rO2系材料は酸化・還元雰囲気でイオン輸率がほぼ
1.0であるため、固体電解質燃料電池の電解質として
従来最も有望視されてきた。しかし、十分なイオン伝導
度を得るには1000℃の高温動作が必要であり、この
ような高温では電極界面との反応による部品寿命の劣化
が激しく固体燃料電池の実用化が遅れているのが現状で
ある。そこで動作温度低減(700℃から800℃程度
まで低減)が望まれている。低温動作化には、電解質部
分における抵抗損を低減させなければならないので電解
質の薄膜化が必要である。One of the most studied oxygen ion conductors at present is Y 2 O 3 stabilized ZrO 2 (YSZ). This Z
Since the rO 2 -based material has an ion transport number of approximately 1.0 in an oxidizing / reducing atmosphere, it has hitherto been regarded as the most promising electrolyte for a solid oxide fuel cell. However, operation at a high temperature of 1000 ° C. is necessary to obtain sufficient ionic conductivity, and at such a high temperature, the life of components due to reaction with the electrode interface is severely degraded, and the practical use of solid fuel cells is delayed. It is the current situation. Therefore, a reduction in operating temperature (from 700 ° C. to about 800 ° C.) is desired. In order to operate at a low temperature, it is necessary to reduce the resistance loss in the electrolyte part, so that it is necessary to make the electrolyte thinner.
【0004】薄膜化の方法としては、気相成長法の一種
であるEVD(Electrochemical Va
por Deposition)法が最も良く検討され
ているが、装置が複雑であり製造コストの高い点及び精
密な組成制御が難しいなどの難点がある。これに対しゾ
ルゲル法は、ゾルゲル液を基板等に塗布し熱処理を行う
事により比較的容易に膜を形成することができる。この
最後の熱処理過程においてアモルファス状態の超微粒子
が凝集し結晶化し、緻密な膜が形成されるが、この熱処
理温度をなるべく低く抑える事で、製造コストの低減を
図ることができる。また、この過程で電解質膜とこれに
接する多孔質基板である空気極との原子の相互拡散によ
る反応劣化も同時に起こるため、この意味からも熱処理
温度の低減が望まれる。[0004] As a method of thinning the film, an EVD (Electrochemical Vacuum) which is a kind of a vapor phase growth method is used.
Although the por deposition method is best studied, there are disadvantages in that the apparatus is complicated, the production cost is high, and precise composition control is difficult. In contrast, in the sol-gel method, a film can be formed relatively easily by applying a sol-gel liquid to a substrate or the like and performing a heat treatment. In the final heat treatment process, the ultrafine particles in the amorphous state are aggregated and crystallized to form a dense film. However, by keeping the heat treatment temperature as low as possible, the production cost can be reduced. Further, in this process, reaction degradation due to mutual diffusion of atoms between the electrolyte membrane and the air electrode, which is a porous substrate in contact with the electrolyte membrane, occurs at the same time. Therefore, it is desired to reduce the heat treatment temperature in this sense.
【0005】[0005]
【本発明の目的】本発明は低温動作型固体燃料電池に使
用する固体電解質において、ZrO2系薄膜固体電解質
を比較的製造コストの低いゾルゲル法により作製し、そ
の製造プロセス温度を低く抑えつつ良好な伝導度特性を
有する固体電解質膜を得る事を目的とする。The object of the present invention is to provide a solid electrolyte for use in a low-temperature operation type solid fuel cell by producing a ZrO 2 -based thin film solid electrolyte by a sol-gel method with a relatively low production cost, and keeping the production process temperature low and good. It is an object to obtain a solid electrolyte membrane having excellent conductivity characteristics.
【0006】[0006]
【問題点を解決するための手段】上記問題点を解決する
ため本発明によるZrO2系薄膜固体電解質の製造方法
は、主成分元素のZrおよび主添加物元素D1として
Y、Yb、Luのいずれかを含み、かつ、第二添加物元
素D2としてAl、Mg、Siのいずれかを含むゾルゲ
ル液を用意し、このゾルゲル液を多孔質の電極基板の上
に塗布し、これを電気炉等の中で熱処理することを特徴
とする。Means for Solving the Problems In order to solve the above-mentioned problems, the method for producing a ZrO 2 -based thin film solid electrolyte according to the present invention uses any of Y, Yb and Lu as the main component element Zr and the main additive element D1. And a sol-gel liquid containing any of Al, Mg, and Si as the second additive element D2, and applying the sol-gel liquid on a porous electrode substrate, and applying the sol-gel liquid to an electric furnace or the like. It is characterized in that heat treatment is performed in the inside.
【0007】熱処理の過程でゾルゲル液内の有機物は分
解蒸発し、原子レベルで混じりあった状態で残されてい
る金属塩が反応し、電解質膜が得られる。ここで、ゾル
ゲル液の金属イオンは、主成分元素であるZr、及びイ
オン伝導性を発現させる主添加物元素であるY,Yb,
Lu希土類元素、そして第二添加物元素であるAl,M
g,Si軽元素からなっている。[0007] In the course of the heat treatment, organic substances in the sol-gel liquid are decomposed and evaporated, and the metal salt remaining in a state of being mixed at an atomic level reacts to obtain an electrolyte membrane. Here, the metal ions of the sol-gel liquid are Zr as a main component element and Y, Yb, and Y, Yb, which are main additive elements that develop ionic conductivity.
Lu rare earth element, and second additive elements Al and M
g, Si light elements.
【0008】本発明のごとく第二添加物元素Al,M
g,Siを微量添加する事により低い焼結温度において
も、充分に粒成長が進み緻密で且つ良好なイオン伝導度
を実現する事ができる。また、第二添加物の量は主添加
物に対し半分以下と低く抑えるため第二添加物による結
晶格子の歪みはほとんど起きず、イオン伝導性を損なう
には至らない。[0008] As in the present invention, the second additive element Al, M
Even at a low sintering temperature, by adding a small amount of g and Si, it is possible to sufficiently promote grain growth and realize a dense and good ionic conductivity. In addition, since the amount of the second additive is suppressed to less than half the amount of the main additive, distortion of the crystal lattice due to the second additive hardly occurs, and the ion conductivity is not impaired.
【0009】本発明によるゾルゲル法によるZrO2系
固体電解質膜の前述のゾルゲル液の組成は、図1に示す
範囲であるのが好ましい。主添加元素D1をX、第二添
加元素をYとしたとき(Zrは1−X−Y)、0.04
≦X、0.004≦Y、X≦0.5Y、X+Y≦0.3
04であるのがよい。The composition of the sol-gel solution of the ZrO 2 -based solid electrolyte membrane by the sol-gel method according to the present invention is preferably in the range shown in FIG. When the main additive element D1 is X and the second additive element is Y (Zr is 1-XY), 0.04
≤X, 0.004≤Y, X≤0.5Y, X + Y≤0.3
04 is better.
【0010】また、この方法によれば、ゾルゲル液の塗
布厚を調整する事により最終的なゾルゲル膜の厚みを
0.1μmから100μmまで制御することができる。
ここでゾルゲル液の塗布にはスピンコート法、スクリー
ンプリント法、、スプレー法、ディッピング法等を用い
れば良い。ここで、多孔質基板の上にこの様な薄膜を形
成するには、表面の平坦化(緻密化)が必要であるが、
これには多孔質基板上に微細な電極材を塗布し焼き固め
た後に表面を研磨する、または比較的イオン伝導度の高
いGd2O3添加CeO2等の混合導電体層を形成し焼
結、緻密化すれば達成できる。Further, according to this method, the final thickness of the sol-gel film can be controlled from 0.1 μm to 100 μm by adjusting the coating thickness of the sol-gel liquid.
Here, the sol-gel solution may be applied by a spin coating method, a screen printing method, a spray method, a dipping method, or the like. Here, in order to form such a thin film on the porous substrate, the surface must be flattened (densified).
For this, a fine electrode material is applied on a porous substrate and baked and hardened, and then the surface is polished, or a mixed conductor layer of Gd 2 O 3 added CeO 2 with relatively high ion conductivity is formed and sintered. , Can be achieved by densification.
【0011】[0011]
【作用】もし、低温のプロセスでもZrO2系電解質を
薄膜化し、良好な伝導度特性を実現することができれ
ば、低い製造コストで発電効率およぴ信頼性の高い低温
動作化に適した燃料電池用固体電解質を作製する事が可
能となる。[Function] If a ZrO 2 -based electrolyte can be thinned even in a low-temperature process, and good conductivity characteristics can be realized, a fuel cell suitable for low-temperature operation with high power generation efficiency and high reliability at low manufacturing cost. It is possible to produce a solid electrolyte for use.
【0012】上述の組成の膜とする事で製膜温度を低減
させることができる。これにより、低温のプロセスでも
発電効率が高く低温動作化に適した電解質を作製するこ
とが可能となる。By forming a film having the above composition, the film forming temperature can be reduced. This makes it possible to produce an electrolyte that has high power generation efficiency and is suitable for low-temperature operation even in a low-temperature process.
【0013】[0013]
【実施例】以下に本発明の実施例を説明する。なお、当
然のことであるが本発明は以下の実施例に限定されるも
のではない。Embodiments of the present invention will be described below. Note that, needless to say, the present invention is not limited to the following embodiments.
【0014】[0014]
【実施例1】図2aは本発明の材料を用いゾルゲル法に
より電解質膜をAl2O3板の上に製膜するプロセスを示
したものである。このフローに従いゾルゲル膜組成がZ
r0. 76Yb0.20Al0.04O2の場合を以下に説明する。Embodiment 1 FIG. 2a shows a process for forming an electrolyte membrane on an Al 2 O 3 plate by the sol-gel method using the material of the present invention. According to this flow, the sol-gel film composition becomes Z
The case of r 0. 76 Yb 0.20 Al 0.04 O 2 will be described below.
【0015】図2aに示すように、2−メトキシエタノ
ール29.4g中にアルミニウムイソプロキシド(Al
−(OPr’)3)1.14gおよび2,4−ペンタジ
オン20.8gを加え、超音波にかけた後、120℃で
温めて溶解させ、約0.3%のアルミニウム溶液を調整
した。これに硝酸イットリビウム・4水和物14.2
g、ジルコニウムノルマルブトキシド(Zr−Obu)
4)(Zr:19.99%)22.56gを加え、再び
超音波にかけ溶解させ、最後に溶液中の酸化物換算濃度
が7.2%になるように2−メトキシエタノール22.
55g添加し、薄膜ゾルゲル液を調整した。これは、主
添加元素をYbとした場合であるが、主添加元素がLu
またはYの場合も硝酸イットリビウム・4水和物に替え
て、硝酸ルテシウム・4水和物、または、硝酸イットリ
ウム・4水和物を使用する。また第二添加元素として、
アルミに替えてマグネシウムまたはシリコンを用いる場
合は、マグネシウムイソプロキシド(Mg−(OP
r’))、またはシリコンイソプロキシド(Si−OP
r’)4)を使用する。As shown in FIG. 2A, aluminum isoproxide (Al
— (OPr ′) 3 ) 1.14 g and 2,0.8 g of 2,4-pentadione were added, and the mixture was irradiated with ultrasonic waves and then heated and dissolved at 120 ° C. to prepare an about 0.3% aluminum solution. To this, yttrium lithium nitrate tetrahydrate 14.2
g, zirconium normal butoxide (Zr-Obu)
4 ) Add 22.56 g of (Zr: 19.99%), dissolve again by ultrasonication, and finally add 2-methoxyethanol 22.2 so that the concentration in terms of oxide in the solution becomes 7.2%.
55 g was added to prepare a thin film sol-gel solution. This is the case where the main additive element is Yb, but the main additive element is Lu.
Alternatively, also in the case of Y, lutetium nitrate tetrahydrate or yttrium nitrate tetrahydrate is used in place of ytterbium nitrate tetrahydrate. Also, as a second additive element,
When magnesium or silicon is used instead of aluminum, magnesium isoproxide (Mg- (OP
r ')) or silicon isoproxide (Si-OP
r ') Use 4 ).
【0016】以上の様に調合した液を図2bに示す手順
でスピンコートする事でAl2O3基板に塗布を行った。
図で示すように、スピンコート後400℃の電気炉で1
0分間乾燥させた。この行程を所望の膜厚が得られるま
で繰り返し、最後に電気炉で1200℃、1時間の熱処
理を行い結晶化したゾルゲル膜を得た。ここで金属元素
の組成比は、Zr:Yb:Al=0.76:0.20:
0.04であるが、他の組成も混合比を調整することで
得られた。The solution prepared as described above was spin-coated according to the procedure shown in FIG. 2B to apply the solution to an Al 2 O 3 substrate.
As shown in the figure, after spin coating,
Dry for 0 minutes. This process was repeated until a desired film thickness was obtained. Finally, heat treatment was performed at 1200 ° C. for 1 hour in an electric furnace to obtain a crystallized sol-gel film. Here, the composition ratio of the metal element is Zr: Yb: Al = 0.76: 0.20:
0.04, but other compositions were also obtained by adjusting the mixing ratio.
【0017】これらの薄膜電解質材のイオン伝導度を直
流4端子法により800℃において測定した。ここでは
熱処理温度を800℃から1200℃まで変化させた。
ここで、試料は、約4cm×2cmで、10-7Aの電流
を基板の面内方向に流し、発生した電圧から伝導度を求
めた。これらの測定結果を表1に示す。The ionic conductivity of these thin film electrolyte materials was measured at 800 ° C. by a DC four-terminal method. Here, the heat treatment temperature was changed from 800 ° C. to 1200 ° C.
Here, the sample was about 4 cm × 2 cm, and a current of 10 −7 A was passed in the in-plane direction of the substrate, and the conductivity was determined from the generated voltage. Table 1 shows the measurement results.
【0018】この表には、固相反応法により1600℃
で作製したバルクサンプル(サンプルNo.1−0,試
料は0.2cm角で長さ3cmとした)も、あわせて示
した。第二添加物を微量添加する事により、1100℃
での熱処理でも、ほぼバルク材に匹敵するイオン伝導度
が得られた。その他の組成についても熱処理温度を11
00℃に固定し、サンプルの伝導度を同様に800℃に
おいて測定した。これらの結果を表2−1,表2−2,
表2−3に示す。主添加元素としてYb,Lu,Yそし
て、第二添加元素としてAl,Mg,Siを微量添加し
た。The table shows that the solid phase reaction method is used at 1600 ° C.
(Sample No. 1-0, the sample was 0.2 cm square and 3 cm long) prepared in the above. 1100 ° C by adding a small amount of the second additive
In the heat treatment, the ionic conductivity almost equivalent to that of the bulk material was obtained. For other compositions, the heat treatment temperature was set to 11
The temperature was fixed at 00 ° C., and the conductivity of the sample was similarly measured at 800 ° C. These results are shown in Table 2-1 and Table 2-2.
It is shown in Table 2-3. Trace amounts of Yb, Lu, Y as the main additive elements and Al, Mg, Si as the second additive elements were added.
【0019】いずれも、主添加元素が同一量添加されて
いる場合は、第二添加により伝導度が向上した。In each case, when the same amount of the main additive element was added, the conductivity was improved by the second addition.
【0020】次に、以下の要領でこの薄膜を多孔質電極
基板上に製膜し単セルを作製した。まず、粒径が20μ
mのLa0.8Sr0.2MnO3カソード材をPVA(ポリ
ビニルアルコール)水溶液で溶き、ドクターブレード法
によりシート状に成形し、1400℃で焼成し、比較的
緻密な厚み約100μmの表面層を得た 。そして表面
を研磨する事で多孔質で且つ表面の平坦性の良い空気極
基板1(カソード電極)を得た。Next, this thin film was formed on a porous electrode substrate in the following manner to produce a single cell. First, the particle size is 20μ
m of La 0.8 Sr 0.2 MnO 3 cathode material was dissolved in an aqueous PVA (polyvinyl alcohol) solution, formed into a sheet by a doctor blade method, and fired at 1400 ° C. to obtain a relatively dense surface layer having a thickness of about 100 μm. The surface was polished to obtain a porous air electrode substrate 1 (cathode electrode) having good surface flatness.
【0021】この上にスピンコート法でゾルゲル液を数
回にわたり塗布し、1100℃で2時間熱処理し、厚み
約5μmの固体電解質層が得られた。このプロセスによ
り再結晶化が進み固体電解質薄膜2が多孔質空気極基板
1上に形成された。最後に白金ペーストを電解質膜上に
塗布し、1000℃で1時間焼成して燃料極3とした。
さらに上記燃料極3および空起電極基板1に白金の集電
用メッシュ4を設けた。この単セルの模式図を図3a、
図3bに示す。A sol-gel solution was applied thereon several times by spin coating, and heat-treated at 1100 ° C. for 2 hours to obtain a solid electrolyte layer having a thickness of about 5 μm. By this process, recrystallization progressed and the solid electrolyte thin film 2 was formed on the porous air electrode substrate 1. Finally, a platinum paste was applied on the electrolyte membrane, and calcined at 1000 ° C. for 1 hour to obtain a fuel electrode 3.
Further, a current collecting mesh 4 of platinum was provided on the fuel electrode 3 and the air electrode substrate 1. FIG. 3A is a schematic diagram of this single cell.
As shown in FIG.
【0022】このセルを用い図4に示す様な燃料電池を
構成し、800℃において試験を行った。なお、図中、
5は白金端子、6はガスシールを示す。ここで空気極側
には酸素を燃料極側には水素を供給した。この時の出力
電圧を表3に示す。ここで、“セル番号0“はCe0.8
Sm0.2O2をスクリーンプリント法を用いて、上述の多
孔質空気極基板上に塗布し、電解質とし、セルを作製し
たものの結果である。A fuel cell as shown in FIG. 4 was constructed using this cell, and a test was conducted at 800 ° C. In the figure,
Reference numeral 5 denotes a platinum terminal, and 6 denotes a gas seal. Here, oxygen was supplied to the air electrode side and hydrogen was supplied to the fuel electrode side. Table 3 shows the output voltage at this time. Here, “cell number 0” is Ce 0.8
This is the result of a cell prepared by applying Sm 0.2 O 2 on the above-described porous air electrode substrate by screen printing and using it as an electrolyte.
【0023】いずれの電解質薄膜の場合においても1.
10Vに近い開放電圧値が得られた。これらの値は、ネ
ルンストの式[V=(RT/nF)・ln(Po2 ca
thode/Po2 anode)、T:絶対温度、R:
ガス定数、n:4.0、F:ファラデー定数、Po2 c
athode:空気極の酸素分圧、Po2 anode:
燃料極の酸素分圧]から決定される理論起電力値(1.
15eV at 800℃)とほぼ同じ値であり、ゾル
ゲル法により、多孔質カソード基板上に形成された電解
質薄膜は、イオン輸率がほぼ1.0で且つガスシール性
に優れている事が分かる。In any case of the electrolyte thin film, 1.
An open-circuit voltage value close to 10 V was obtained. These values are calculated according to the Nernst equation [V = (RT / nF) · ln (Po 2 ca
Tode / Po 2 anode), T: absolute temperature, R:
Gas constant, n: 4.0, F: Faraday constant, Po 2 c
anode: partial pressure of oxygen at the cathode, Po 2 anode:
The theoretical electromotive force value determined from the oxygen partial pressure of the fuel electrode] (1.
(15 eV at 800 ° C.), which indicates that the electrolyte thin film formed on the porous cathode substrate by the sol-gel method has an ion transport number of approximately 1.0 and is excellent in gas sealing properties.
【0024】表1 実施例1における800℃におけるゾルゲル膜のイオン
伝導度組成比は各金属イオンのモル比で示してある。サ
ンプルNo.1−0は、固相反応法により1600℃で
作製したバルクサンプルである。Table 1 In Example 1, the ionic conductivity composition ratio of the sol-gel film at 800 ° C. is shown by the molar ratio of each metal ion. Sample No. 1-0 is a bulk sample prepared at 1600 ° C. by a solid-state reaction method.
【0025】(ここで用いた膜の組成比は「Al添加な
し」ではZr:Yb:Al=0.80:0.20:0.
00で、「Al添加」ではZr:Yb:Al=0.7
6:0.20:0.04である。) (The composition ratio of the film used here is “Zr: Yb: Al = 0.80: 0.20: 0.0 when“ Al is not added ”).
In the case of “Al addition”, Zr: Yb: Al = 0.7
6: 0.20: 0.04. )
【0026】表2−1実施例1における800℃におけ
るゾルゲル膜のイオン伝導度組成比は各金属イオンのモ
ル比で示してある。(第二添加物としてAlを用いた場合) No. Zr(mol) Yb(mol) Al(mol) σ(S/cm) 1-1-1 0.960 0.040 0.000 0.0030 1-1-2 0.956 0.040 0.004 0.0074 1-1-3 0.940 0.040 0.020 0.0120 1-1-4 0.800 0.200 0.000 0.0100 1-1-5 0.796 0.200 0.004 0.0248 1-1-6 0.750 0.200 0.050 0.0500 1-1-7 0.696 0.200 0.104 0.0300 1-1-8 0.700 0.300 0.000 0.0080 1-1-9 0.696 0.300 0.004 0.0198 No. Zr(mol) Lu(mol) Al(mol) σ(S/cm) 1-2-1 0.960 0.040 0.000 0.0029 1-2-2 0.956 0.040 0.004 0.0071 1-2-3 0.940 0.040 0.020 0.0114 1-2-4 0.800 0.200 0.000 0.0095 1-2-5 0.796 0.200 0.004 0.0236 1-2-6 0.750 0.200 0.050 0.0475 1-2-7 0.696 0.200 0.104 0.0285 1-2-8 0.700 0.300 0.000 0.0076 1-2-9 0.696 0.300 0.004 0.0188 Table 2-1 At 800 ° C. in Example 1
The ionic conductivity composition of the sol-gel film depends on the model of each metal ion.
It is shown as a ratio.(When Al is used as the second additive) No. Zr (mol) Yb (mol) Al (mol) σ (S / cm) 1-1-1 0.960 0.040 0.000 0.0030 1-1-2 0.956 0.040 0.004 0.0074 1-1-3 0.940 0.040 0.020 0.0120 1-1-4 0.800 0.200 0.000 0.0100 1-1-5 0.796 0.200 0.004 0.0248 1-1-6 0.750 0.200 0.050 0.0500 1-1-7 0.696 0.200 0.104 0.0300 1-1-8 0.700 0.300 0.000 0.0080 1-1-9 0.696 0.300 0.004 0.0198 No. Zr (mol) Lu (mol) Al (mol) σ (S / cm) 1-2-1 0.960 0.040 0.000 0.0029 1-2-2 0.956 0.040 0.004 0.0071 1-2-3 0.940 0.040 0.020 0.0114 1-2-4 0.800 0.200 0.000 0.0095 1-2-5 0.796 0.200 0.004 0.0236 1-2-6 0.750 0.200 0.050 0.0475 1-2-7 0.696 0.200 0.104 0.0285 1-2-8 0.700 0.300 0.000 0.0076 1-2-9 0.696 0.300 0.004 0.0188
【0027】表2−1続き No. Zr(mol) Y(mol) Al(mol) σ(S/cm) 1-3-1 0.960 0.040 0.000 0.0015 1-3-2 0.956 0.040 0.004 0.0037 1-3-3 0.940 0.040 0.020 0.0060 1-3-4 0.800 0.200 0.000 0.0050 1-3-5 0.796 0.200 0.004 0.0124 1-3-6 0.750 0.200 0.050 0.0250 1-3-7 0.696 0.200 0.104 0.0150 1-3-8 0.700 0.300 0.000 0.0040 1-3-9 0.696 0.300 0.004 0.0099 Table 2-1 continued No. Zr (mol) Y (mol) Al (mol) σ (S / cm) 1-3-1 0.960 0.040 0.000 0.0015 1-3-2 0.956 0.040 0.004 0.0037 1-3-3 0.940 0.040 0.020 0.0060 1-3-4 0.800 0.200 0.000 0.0050 1-3-5 0.796 0.200 0.004 0.0124 1-3-6 0.750 0.200 0.050 0.0250 1-3-7 0.696 0.200 0.104 0.0150 1-3-8 0.700 0.300 0.000 0.0040 1-3-9 0.696 0.300 0.004 0.0099
【0028】表2−2 実施例1における800℃におけるゾルゲル膜のイオン
伝導度組成比は各金属イオンのモル比で示してある。(第二添加物としてMgを用いた場合) No. Zr(mol) Yb(mol) Mg(mol) σ(S/cm) 2-1-1 0.960 0.040 0.000 0.0030 2-1-2 0.956 0.040 0.004 0.0067 2-1-3 0.940 0.040 0.020 0.0108 2-1-4 0.800 0.200 0.000 0.0100 2-1-5 0.796 0.200 0.004 0.0223 2-1-6 0.750 0.200 0.050 0.0450 2-1-7 0.696 0.200 0.104 0.0270 2-1-8 0.700 0.300 0.000 0.0080 2-1-9 0.696 0.300 0.004 0.0179 Table 2-2 The ion conductivity composition ratio of the sol-gel film at 800 ° C. in Example 1 is shown by the molar ratio of each metal ion. (When Mg is used as the second additive) No. Zr (mol) Yb (mol) Mg (mol) σ (S / cm) 2-1-1 0.960 0.040 0.000 0.0030 2-1-2 0.956 0.040 0.004 0.0067 2-1-3 0.940 0.040 0.020 0.0108 2-1-4 0.800 0.200 0.000 0.0100 2-1-5 0.796 0.200 0.004 0.0223 2-1-6 0.750 0.200 0.050 0.0450 2-1-7 0.696 0.200 0.104 0.0270 2-1-8 0.700 0.300 0.000 0.0080 2-1-9 0.696 0.300 0.004 0.0179
【0029】表2−2続き No. Zr(mol) Lu(mol) Mg(mol) σ(S/cm) 2-2-1 0.960 0.040 0.000 0.0029 2-2-2 0.956 0.040 0.004 0.0064 2-2-3 0.940 0.040 0.020 0.0103 2-2-4 0.800 0.200 0.000 0.0095 2-2-5 0.796 0.200 0.004 0.0212 2-2-6 0.750 0.200 0.050 0.0428 2-2-7 0.696 0.200 0.104 0.0257 2-2-8 0.700 0.300 0.000 0.0086 2-2-9 0.696 0.300 0.004 0.0170 No. Zr(mol) Y(mol) Mg(mol) σ(S/cm) 2-3-1 0.960 0.040 0.000 0.0015 2-3-2 0.956 0.040 0.004 0.0033 2-3-3 0.940 0.040 0.020 0.0054 2-3-4 0.800 0.200 0.000 0.0050 2-3-5 0.796 0.200 0.004 0.0112 2-3-6 0.750 0.200 0.050 0.0225 2-3-7 0.696 0.200 0.104 0.0135 2-3-8 0.700 0.300 0.000 0.0040 2-3-9 0.696 0.300 0.004 0.0089 Table 2-2 continued No. Zr (mol) Lu (mol) Mg (mol) σ (S / cm) 2-2-1 0.960 0.040 0.000 0.0029 2-2-2 0.956 0.040 0.004 0.0064 2-2-3 0.940 0.040 0.020 0.0103 2-2-4 0.800 0.200 0.000 0.0095 2-2-5 0.796 0.200 0.004 0.0212 2-2-6 0.750 0.200 0.050 0.0428 2-2-7 0.696 0.200 0.104 0.0257 2-2-8 0.700 0.300 0.000 0.0086 2-2-9 0.696 0.300 0.004 0.0170 No. Zr (mol) Y (mol) Mg (mol) σ (S / cm) 2-3-1 0.960 0.040 0.000 0.0015 2-3-2 0.956 0.040 0.004 0.0033 2-3-3 0.940 0.040 0.020 0.0054 2-3-4 0.800 0.200 0.000 0.0050 2-3-5 0.796 0.200 0.004 0.0112 2-3-6 0.750 0.200 0.050 0.0225 2-3-7 0.696 0.200 0.104 0.0135 2-3-8 0.700 0.300 0.000 0.0040 2-3-9 0.696 0.300 0.004 0.0089
【0030】表2−3 実施例1における800℃におけるゾルゲル膜のイオン
伝導度組成比は各金属イオンのモル比で示してある。(第二添加物としてSiを用いた場合) No. Zr(mol) Yb(mol) Si(mol) σ(S/cm) 3-1-1 0.960 0.040 0.000 0.0030 3-1-2 0.956 0.040 0.004 0.0063 3-1-3 0.940 0.040 0.020 0.0102 3-1-4 0.800 0.200 0.000 0.0100 3-1-5 0.796 0.200 0.004 0.0211 3-1-6 0.750 0.200 0.050 0.0425 3-1-7 0.696 0.200 0.104 0.0255 3-1-8 0.700 0.300 0.000 0.0080 3-1-9 0.696 0.300 0.004 0.0169 No. Zr(mol) Lu(mol) Si(mol) σ(S/cm) 3-2-1 0.960 0.040 0.000 0.0029 3-2-2 0.956 0.040 0.004 0.0060 3-2-3 0.940 0.040 0.020 0.0097 3-2-4 0.800 0.200 0.000 0.0095 3-2-5 0.796 0.200 0.004 0.0200 3-2-6 0.750 0.200 0.050 0.0404 3-2-7 0.696 0.200 0.104 0.0242 3-2-8 0.700 0.300 0.000 0.0076 3-2-9 0.696 0.300 0.004 0.0160 Table 2-3 Ion of sol-gel film at 800 ° C. in Example 1
The conductivity composition ratio is shown by the molar ratio of each metal ion.(When Si is used as the second additive) No. Zr (mol) Yb (mol) Si (mol) σ (S / cm) 3-1-1 0.960 0.040 0.000 0.0030 3-1-2 0.956 0.040 0.004 0.0063 3-1-3 0.940 0.040 0.020 0.0102 3-1-4 0.800 0.200 0.000 0.0100 3-1-5 0.796 0.200 0.004 0.0211 3-1-6 0.750 0.200 0.050 0.0425 3-1-7 0.696 0.200 0.104 0.0255 3-1-8 0.700 0.300 0.000 0.0080 3-1-9 0.696 0.300 0.004 0.0169 No. Zr (mol) Lu (mol) Si (mol) σ (S / cm) 3-2-1 0.960 0.040 0.000 0.0029 3-2-2 0.956 0.040 0.004 0.0060 3-2-3 0.940 0.040 0.020 0.0097 3-2-4 0.800 0.200 0.000 0.0095 3-2-5 0.796 0.200 0.004 0.0200 3-2-6 0.750 0.200 0.050 0.0404 3-2-7 0.696 0.200 0.104 0.0242 3-2-8 0.700 0.300 0.000 0.0076 3-2-9 0.696 0.300 0.004 0.0160
【0031】表2−3続き No. Zr(mol) Y(mol) Si(mol) σ(S/cm) 3-3-1 0.960 0.040 0.000 0.0015 3-3-2 0.956 0.040 0.004 0.0032 3-3-3 0.940 0.040 0.020 0.0051 3-3-4 0.800 0.200 0.000 0.0050 3-3-5 0.796 0.200 0.004 0.0105 3-3-6 0.750 0.200 0.050 0.0213 3-3-7 0.696 0.200 0.104 0.0128 3-3-8 0.700 0.300 0.000 0.0040 3-3-9 0.696 0.300 0.004 0.0084 Table 2-3 continued No. Zr (mol) Y (mol) Si (mol) σ (S / cm) 3-3-1 0.960 0.040 0.000 0.0015 3-3-2 0.956 0.040 0.004 0.0032 3-3-3 0.940 0.040 0.020 0.0051 3-3-4 0.800 0.200 0.000 0.0050 3-3-5 0.796 0.200 0.004 0.0105 3-3-6 0.750 0.200 0.050 0.0213 3-3-7 0.696 0.200 0.104 0.0128 3-3-8 0.700 0.300 0.000 0.0040 3-3-9 0.696 0.300 0.004 0.0084
【0032】 表3 実施例1の燃料電池セルの出力電圧特性ゾルゲル膜の塗布はスピンコート法とした。 セル番号 Zr(mol) Yb(mol) Al(mol) *開放電圧(V) **出力電圧(V) *0 0.000 0.000 0.000 0.75 0.60 0-1 0.960 Yb=0.040 Al=0.000 1.05 0.50 1-1-2 0.956 Yb=0.040 Al=0.004 1.11 0.74 1-1-3 0.940 Yb=0.040 Al=0.020 1.12 0.73 1-1-4 0.800 Yb=0.200 0.000 1.08 0.52 1-1-5 0.796 Yb=0.200 Al=0.004 1.10 0.73 1-1-6 0.750 Yb=0.200 Al=0.050 1.12 0.75 1-1-7 0.696 Yb=0.200 Al=0.104 1.14 0.74 1-1-8 0.750 Yb=0.200 Mg=0.050 1.10 0.71 1-1-9 0.750 Yb=0.200 Si=0.050 1.11 0.68 0-10 0.700 Yb=0.300 0.000 1.08 0.48 1-1-11 0.696 Yb=0.300 Al=0.004 1.11 0.61 0-10 0.800 Lu=0.200 0.000 1.07 0.51 1-1-11 0.750 Lu=0.200 Al=0.050 1.10 0.73 1-1-12 0.750 Lu=0.200 Mg=0.050 1.10 0.68 1-1-13 0.750 Lu=0.200 Si=0.050 1.10 0.65 0-14 0.800 Y=0.200 0.000 1.09 0.42 1-1-15 0.750 Y=0.200 Al=0.050 1.15 0.65 1-1-16 0.750 Y=0.200 Mg=0.050 1.12 0.60 1-1-17 0.750 Y=0.200 Si=0.050 1.12 0.59 *800℃におけるセルの開放電圧。 **800℃、電流密度0.5A/cm2におけるセルの出力電圧。Table 3 Output Voltage Characteristics of the Fuel Cell of Example 1 The sol-gel film was applied by a spin coating method. Cell number Zr (mol) Yb (mol) Al (mol) * Open circuit voltage (V) ** Output voltage (V) * 0 0.000 0.000 0.000 0.75 0.60 0-1 0.960 Yb = 0.040 Al = 0.000 1.05 0.50 1-1- 2 0.956 Yb = 0.040 Al = 0.004 1.11 0.74 1-1-3 0.940 Yb = 0.040 Al = 0.020 1.12 0.73 1-1-4 0.800 Yb = 0.200 0.000 1.08 0.52 1-1-5 0.796 Yb = 0.200 Al = 0.004 1.10 0.73 1-1-6 0.750 Yb = 0.200 Al = 0.050 1.12 0.75 1-1-7 0.696 Yb = 0.200 Al = 0.104 1.14 0.74 1-1-8 0.750 Yb = 0.200 Mg = 0.050 1.10 0.71 1-1-9 0.750 Yb = 0.200 Si = 0.050 1.11 0.68 0-10 0.700 Yb = 0.300 0.000 1.08 0.48 1-1-11 0.696 Yb = 0.300 Al = 0.004 1.11 0.61 0-10 0.800 Lu = 0.200 0.000 1.07 0.51 1-1-11 0.750 Lu = 0.200 Al = 0.050 1.10 0.73 1-1-12 0.750 Lu = 0.200 Mg = 0.050 1.10 0.68 1-1-13 0.750 Lu = 0.200 Si = 0.050 1.10 0.65 0-14 0.800 Y = 0.200 0.000 1.09 0.42 1-1-15 0.750 Y = 0.200 Al = 0.050 1.15 0.65 1-1-16 0.750 Y = 0.200 Mg = 0.050 1.12 0.60 1-1-17 0.750 Y = 0.200 Si = 0.050 1.12 0.59 * The open-circuit voltage of the cell at 800 ° C. ** Cell output voltage at 800 ° C., current density 0.5 A / cm 2 .
【0033】[0033]
【実施例2】実施例1と同様の組成のゾルゲル液を、厚
み約0.15mmのセリア基板(固体電解質基板)7
(組成が0.80CeO2−0.20Gd2O3)1上に
スプレー法により塗布した。塗布の手順は図2bのスピ
ンコートの代わりにスプレーを行う。その他熱処理等の
条件は同じである。1100℃で2時間熱処理を行い再
結晶化させ、厚み約1μmの固体電解質薄膜(ゾルゲル
膜)8を得た。EXAMPLE 2 A sol-gel solution having the same composition as in Example 1 was applied to a ceria substrate (solid electrolyte substrate) 7 having a thickness of about 0.15 mm.
(Composition: 0.80 CeO 2 -0.20 Gd 2 O 3 ) 1 was applied by a spray method. The application procedure is spraying instead of spin coating in FIG. 2b. Other conditions such as heat treatment are the same. Heat treatment was performed at 1100 ° C. for 2 hours to recrystallize, and a solid electrolyte thin film (sol-gel film) 8 having a thickness of about 1 μm was obtained.
【0034】次に固体電解質薄膜8と反対側に実施例1
と同じ組成で平均粒径が1.0μmのLa0.8Sr0.2M
nO3を1100℃で焼き付けて空気極10を設け、さ
らに前記固体電解質薄膜8に白金ペースを1000℃で
焼き付け燃科極9とし、単セルとした。なお11はリフ
ァレンス極(Ptペースト)であり、4は集電用Ptメ
ッシュ(16mmφ)である。この単セルの模式図を図
5a、図5bに示す。Next, on the side opposite to the solid electrolyte thin film 8, the first embodiment
La 0.8 Sr 0.2 M having the same composition as in the above but having an average particle size of 1.0 μm
nO 3 was baked at 1100 ° C. to provide an air electrode 10, and the solid electrolyte thin film 8 was baked at 1000 ° C. with a platinum pace to form a fuel electrode 9 to form a single cell. Reference numeral 11 denotes a reference electrode (Pt paste), and reference numeral 4 denotes a current collecting Pt mesh (16 mmφ). FIGS. 5A and 5B are schematic diagrams of this single cell.
【0035】このセルを実施例1と同様の構成で燃料電
池とし、800℃においてその起電力を測定した。この
結果を表4に示す。ここで薄膜電解質を設けないセリア
基板のみのセルについても測定を行った。セリア基板は
高いイオン伝導性を有しているがイオン輸率が1.0以
下のため理論起電力が得られない。これに対し、ゾルゲ
ル法により設けたZrO2系の電解質薄膜を持つセルは
ほぼ理論起電力に達している。これは、イオン輸率が
1.0である本発明の電解質薄膜が固体電解質として機
能している事を示している。This cell was used as a fuel cell in the same configuration as in Example 1, and its electromotive force was measured at 800 ° C. Table 4 shows the results. Here, the measurement was also performed on a cell having only a ceria substrate without a thin film electrolyte. Although the ceria substrate has high ion conductivity, a theoretical electromotive force cannot be obtained because the ion transport number is 1.0 or less. On the other hand, a cell having a ZrO 2 -based electrolyte thin film provided by the sol-gel method almost reaches the theoretical electromotive force. This indicates that the electrolyte thin film of the present invention having an ion transport number of 1.0 functions as a solid electrolyte.
【0036】 表4 実施例2の燃料電池セルの出力電圧特性 ゾルゲル膜塗布法 *酸素イオン伝導度 **開放電圧 ***出力電圧 (S/cm) (V) (V) ゾルゲル膜なし − 0.75 0.44 スピンコート 0.050 1.12 0.50 ディッピング 0.053 1.12 0.52 スプレー 0.040 1.10 0.40 スクリーンプリント 0.048 1.09 0.42 *800℃におけるイオン伝導度 **800℃におけるセルの開放電圧。 ***800℃、電流密度0.5A/cm2におけるセルの出力電圧。Table 4 Output voltage characteristics of the fuel cell unit of Example 2 Sol-gel film coating method * Oxygen ion conductivity ** Release voltage *** Output voltage (S / cm) (V) (V) No sol-gel film-0.75 0.44 Spin coating 0.050 1.12 0.50 Dipping 0.053 1.12 0.52 Spray 0.040 1.10 0.40 Screen printing 0.048 1.09 0.42 * Ionic conductivity at 800 ° C ** Open cell voltage at 800 ° C. *** Output voltage of cell at 800 ° C., current density 0.5 A / cm 2 .
【0037】[0037]
【発明の効果】以上説明したように、本発明の薄膜製造
法は、比較的低い温度でもイオン伝導性に優れた電解質
を低温で、かつ簡便に薄膜化できる製造法である。As described above, the method for producing a thin film according to the present invention is a method for producing an electrolyte having excellent ion conductivity at a relatively low temperature at a low temperature and easily.
【図1】本発明の請求範囲においてゾルゲル液の添加金
属の組成比を示す図。FIG. 1 is a diagram showing a composition ratio of an added metal in a sol-gel solution in the claims of the present invention.
【図2a】ゾルゲル法におけるゾルゲル液調整のプロセ
スの流れ図。FIG. 2a is a flowchart of a sol-gel solution preparation process in the sol-gel method.
【図2b】ゾルゲル法における塗布プロセスの流れ図。FIG. 2B is a flowchart of a coating process in a sol-gel method.
【図3a】実施例1で使用した単セルの断面図。FIG. 3A is a sectional view of a single cell used in Example 1.
【図3b】実施例1で使用した単セルの平面図。FIG. 3B is a plan view of a single cell used in Example 1.
【図4】実施例1で使用した燃料電池の構造図。FIG. 4 is a structural diagram of a fuel cell used in Example 1.
【図5a】実施例2で使用した単セルの断面図。FIG. 5A is a sectional view of a single cell used in Example 2.
【図5b】実施例2で使用した単セルの平面図。FIG. 5B is a plan view of a single cell used in Example 2.
1 空気極基板 2 固体電解質薄膜 3 燃料極 4 Pt集電用メッシュ 5 白金端子 6 ガスシール 7 固体電解質基板 8 固体電解質薄膜 9 燃料極 10 空気極 11 リファレンス極 DESCRIPTION OF SYMBOLS 1 Air electrode board 2 Solid electrolyte thin film 3 Fuel electrode 4 Pt current collecting mesh 5 Platinum terminal 6 Gas seal 7 Solid electrolyte substrate 8 Solid electrolyte thin film 9 Fuel electrode 10 Air electrode 11 Reference electrode
フロントページの続き (72)発明者 山木 準一 東京都新宿区西新宿三丁目19番2号 日本 電信電話株式会社内 (72)発明者 米沢 政 埼玉県大宮市北袋町1−297 三菱マテリ アル株式会社総合研究所内 (72)発明者 遠藤 恵子 埼玉県大宮市北袋町1−297 三菱マテリ アル株式会社総合研究所内Continuing on the front page (72) Inventor Junichi Yamaki 3-2-19-1 Nishishinjuku, Shinjuku-ku, Tokyo Japan Telegraph and Telephone Corporation (72) Inventor Masaru Yonezawa 1-297 Kitabukurocho, Omiya City, Saitama Prefecture Mitsubishi Materials Corporation (72) Inventor Keiko Endo 1-297 Kitabukuro-cho, Omiya City, Saitama Prefecture Mitsubishi Materials Corporation Research Laboratory
Claims (5)
としてY、Yb、Luのいずれかを含み、かつ、第二添
加物元素D2としてAl、Mg、Siのいずれかを含む
ゾルゲル液を用意し、このゾルゲル液を多孔質の電極基
板の上に塗布することを特徴とするゾルゲル法によるZ
rO2系固体電解質膜の低温作製法。1. A main component element Zr and a main additive element D1.
A sol-gel solution containing any of Y, Yb, and Lu and containing any of Al, Mg, and Si as the second additive element D2 is prepared, and the sol-gel solution is applied on a porous electrode substrate. Z by the sol-gel method
Low-temperature production method of rO 2 -based solid electrolyte membrane.
系固体電解質膜の低温作製法において、ZrとD1とD
2の組成比が1−X−Y:X:Y(ただし、0.04≦
X、0.004≦Y、X≦0.5Y、X+Y≦0.30
4)であることを特徴とするゾルゲル法によるZrO2
系固体電解質膜の低温作製法。2. ZrO 2 prepared by the sol-gel method according to claim 1.
In the method for producing a low temperature solid electrolyte membrane, Zr, D1 and D
2 is 1-XY: X: Y (provided that 0.04 ≦
X, 0.004 ≦ Y, X ≦ 0.5Y, X + Y ≦ 0.30
4) ZrO 2 by a sol-gel method,
Low-temperature production method of solid electrolyte membrane.
する工程を含むことを特徴とする、請求項1または2記
載のゾルゲル法によるZrO2系固体電解質膜の低温作
製法。3. The method for producing a ZrO 2 -based solid electrolyte membrane at a low temperature by a sol-gel method according to claim 1, further comprising a step of forming an electrolyte membrane by recrystallization by heat treatment.
質の電子伝導体を基板として用いることを特徴とする請
求項1から3記載のいずれかのゾルゲル法によるZrO
2系固体電解質膜の低温作製法。4. The sol-gel method according to claim 1, wherein an ion conductor, a mixed conductor, or a porous electron conductor is used as the substrate.
Low-temperature fabrication method for 2- system solid electrolyte membrane.
ンプリント法、スプレー法またはディッピング法を用い
ることを特徴とする請求項1から4記載のいずれかのゾ
ルゲル法によるZrO2系固体電解質膜の低温作製法。5. A low-temperature preparation of a ZrO 2 -based solid electrolyte membrane by a sol-gel method according to any one of claims 1 to 4, wherein a spin coating method, a screen printing method, a spraying method or a dipping method is used as a coating method. Law.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP10023768A JPH11214018A (en) | 1998-01-21 | 1998-01-21 | Low temperature fabrication of ZrO2 based solid electrolyte membrane by sol-gel method |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP10023768A JPH11214018A (en) | 1998-01-21 | 1998-01-21 | Low temperature fabrication of ZrO2 based solid electrolyte membrane by sol-gel method |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| JPH11214018A true JPH11214018A (en) | 1999-08-06 |
Family
ID=12119537
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP10023768A Pending JPH11214018A (en) | 1998-01-21 | 1998-01-21 | Low temperature fabrication of ZrO2 based solid electrolyte membrane by sol-gel method |
Country Status (1)
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| JP (1) | JPH11214018A (en) |
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- 1998-01-21 JP JP10023768A patent/JPH11214018A/en active Pending
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|---|---|---|---|---|
| JP2006054170A (en) * | 2004-07-07 | 2006-02-23 | Central Res Inst Of Electric Power Ind | Proton conductive oxide membrane-hydrogen permeable membrane composite membrane type electrolyte and electrochemical device using the same |
| JP2012138371A (en) * | 2005-02-21 | 2012-07-19 | Dainippon Printing Co Ltd | Method for manufacturing solid oxide fuel cell |
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