JPH11219681A - スパッタカソード - Google Patents

スパッタカソード

Info

Publication number
JPH11219681A
JPH11219681A JP31913298A JP31913298A JPH11219681A JP H11219681 A JPH11219681 A JP H11219681A JP 31913298 A JP31913298 A JP 31913298A JP 31913298 A JP31913298 A JP 31913298A JP H11219681 A JPH11219681 A JP H11219681A
Authority
JP
Japan
Prior art keywords
target
yoke
shaped
sections
face
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP31913298A
Other languages
English (en)
Japanese (ja)
Inventor
Rolf Adam
アダム ロルフ
Joerg Krempel-Hesse
クレムペル−ヘッセ イェルク
Martin Baehr
ベーア マルティン
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Leybold Systems GmbH
Original Assignee
Leybold Systems GmbH
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Leybold Systems GmbH filed Critical Leybold Systems GmbH
Publication of JPH11219681A publication Critical patent/JPH11219681A/ja
Pending legal-status Critical Current

Links

Classifications

    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/32—Gas-filled discharge tubes
    • H01J37/34—Gas-filled discharge tubes operating with cathodic sputtering
    • H01J37/3402—Gas-filled discharge tubes operating with cathodic sputtering using supplementary magnetic fields
    • H01J37/3405—Magnetron sputtering
    • H01J37/3408—Planar magnetron sputtering

Landscapes

  • Physics & Mathematics (AREA)
  • Engineering & Computer Science (AREA)
  • Plasma & Fusion (AREA)
  • Chemical & Material Sciences (AREA)
  • Analytical Chemistry (AREA)
  • Physical Vapour Deposition (AREA)
JP31913298A 1997-11-13 1998-11-10 スパッタカソード Pending JPH11219681A (ja)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
DE1997150270 DE19750270A1 (de) 1997-11-13 1997-11-13 Sputterkathode
DE19750270.9 1997-11-13

Publications (1)

Publication Number Publication Date
JPH11219681A true JPH11219681A (ja) 1999-08-10

Family

ID=7848590

Family Applications (1)

Application Number Title Priority Date Filing Date
JP31913298A Pending JPH11219681A (ja) 1997-11-13 1998-11-10 スパッタカソード

Country Status (3)

Country Link
JP (1) JPH11219681A (fr)
BE (1) BE1013073A3 (fr)
DE (1) DE19750270A1 (fr)

Families Citing this family (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
DE19754986C2 (de) * 1997-12-11 2002-09-12 Leybold Systems Gmbh Sputterkathode

Family Cites Families (11)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
DE3738845A1 (de) * 1987-11-16 1989-05-24 Leybold Ag Zerstaeubungskatode nach dem magnetronprinzip
JP2625789B2 (ja) * 1987-12-21 1997-07-02 松下電器産業株式会社 マグネトロンスパッタカソード
US4964968A (en) * 1988-04-30 1990-10-23 Mitsubishi Kasei Corp. Magnetron sputtering apparatus
US4865708A (en) * 1988-11-14 1989-09-12 Vac-Tec Systems, Inc. Magnetron sputtering cathode
DE4237517A1 (de) * 1992-11-06 1994-05-11 Leybold Ag Vorrichtung zum Beschichten eines Substrats, insbesondere mit elektrisch nichtleitenden Schichten
EP0724652B1 (fr) * 1993-10-22 2003-10-01 Manley, Kelly Procede et appareil de pulverisation de materiaux cibles magnetiques
DE19614487A1 (de) * 1996-04-12 1997-10-16 Leybold Ag Sputterkathode
DE19617057C2 (de) * 1996-04-29 1998-07-23 Ardenne Anlagentech Gmbh Sputteranlage mit zwei längserstreckten Magnetrons
DE19622606C2 (de) * 1996-06-05 2002-02-28 Applied Films Gmbh & Co Kg Sputterkathode
DE19622607B4 (de) * 1996-06-05 2007-12-27 Oerlikon Deutschland Holding Gmbh Sputterkathode
DE19747923C2 (de) * 1997-10-30 2002-09-12 Leybold Systems Gmbh Sputterkathode

Also Published As

Publication number Publication date
DE19750270A1 (de) 1999-05-20
BE1013073A3 (fr) 2001-09-04

Similar Documents

Publication Publication Date Title
US4865708A (en) Magnetron sputtering cathode
US4601806A (en) Magnetron cathode for sputtering ferromagnetic targets
US4892633A (en) Magnetron sputtering cathode
US20030222742A1 (en) Magnetic field generator for magnetron plasma
US7892405B1 (en) Methods and apparatus for magnetron sputtering
JP2934711B2 (ja) スパッタ装置
WO2001029874A1 (fr) Appareil plan de pulverisation magnetron
GB2051877A (en) Magnetically Enhanced Sputtering Device and Method
US9758862B2 (en) Sputtering apparatus
JPH02194171A (ja) マグネトロンスパッタリング源
US6183612B1 (en) Sputtering cathode
JPH11219681A (ja) スパッタカソード
KR101641398B1 (ko) Ｒｆ 스퍼터링 장치
JP4243388B2 (ja) 永久磁石装置を備えたカソードを有するスパッタリング装置
JPH0525625A (ja) マグネトロンスパツタカソード
JP5545452B2 (ja) プラズマ閉じ込め容器およびこれを備えたイオン源
JP2003226965A (ja) スパッタリングターゲット
US6139706A (en) Sputter cathode
JPS6217175A (ja) スパツタリング装置
JPS61204371A (ja) 陰極スパツタリング用磁気回路装置
KR20050044357A (ko) 마그네트론 스퍼터링 장치
JPS6039158A (ja) マグネトロン型スパツタリング用タ−ゲツト
JPH0329250A (ja) 電子銃磁界補正用フェンス装置
JPH11350130A5 (fr)
JP2003183828A (ja) 多重磁極マグネトロンスパッタ方法