JPH11258498A - 投影レンズ及び走査型露光装置 - Google Patents

投影レンズ及び走査型露光装置

Info

Publication number
JPH11258498A
JPH11258498A JP10082625A JP8262598A JPH11258498A JP H11258498 A JPH11258498 A JP H11258498A JP 10082625 A JP10082625 A JP 10082625A JP 8262598 A JP8262598 A JP 8262598A JP H11258498 A JPH11258498 A JP H11258498A
Authority
JP
Japan
Prior art keywords
optical system
projection optical
scanning
change
imaging
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Withdrawn
Application number
JP10082625A
Other languages
English (en)
Japanese (ja)
Other versions
JPH11258498A5 (2
Inventor
Kosuke Suzuki
広介 鈴木
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Nikon Corp
Original Assignee
Nikon Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Nikon Corp filed Critical Nikon Corp
Priority to JP10082625A priority Critical patent/JPH11258498A/ja
Publication of JPH11258498A publication Critical patent/JPH11258498A/ja
Publication of JPH11258498A5 publication Critical patent/JPH11258498A5/ja
Withdrawn legal-status Critical Current

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70216—Mask projection systems
    • G03F7/70358—Scanning exposure, i.e. relative movement of patterned beam and workpiece during imaging
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/708—Construction of apparatus, e.g. environment aspects, hygiene aspects or materials
    • G03F7/70808—Construction details, e.g. housing, load-lock, seals or windows for passing light in or out of apparatus
    • G03F7/70825—Mounting of individual elements, e.g. mounts, holders or supports

Landscapes

  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Health & Medical Sciences (AREA)
  • Engineering & Computer Science (AREA)
  • Environmental & Geological Engineering (AREA)
  • Epidemiology (AREA)
  • Public Health (AREA)
  • Lenses (AREA)
  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
  • Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
  • Lens Barrels (AREA)
JP10082625A 1998-03-13 1998-03-13 投影レンズ及び走査型露光装置 Withdrawn JPH11258498A (ja)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP10082625A JPH11258498A (ja) 1998-03-13 1998-03-13 投影レンズ及び走査型露光装置

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP10082625A JPH11258498A (ja) 1998-03-13 1998-03-13 投影レンズ及び走査型露光装置

Publications (2)

Publication Number Publication Date
JPH11258498A true JPH11258498A (ja) 1999-09-24
JPH11258498A5 JPH11258498A5 (2) 2005-09-22

Family

ID=13779643

Family Applications (1)

Application Number Title Priority Date Filing Date
JP10082625A Withdrawn JPH11258498A (ja) 1998-03-13 1998-03-13 投影レンズ及び走査型露光装置

Country Status (1)

Country Link
JP (1) JPH11258498A (2)

Cited By (8)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2001343575A (ja) * 2000-03-31 2001-12-14 Nikon Corp 光学素子保持装置、鏡筒及び露光装置並びにマイクロデバイスの製造方法。
JP2002139663A (ja) * 2000-08-02 2002-05-17 Nikon Corp 装置設計製作システム、このシステムにより製作される装置およびこの装置により製造される製品
US6888096B1 (en) 1999-09-28 2005-05-03 Sumitomo Heavy Industries, Ltd. Laser drilling method and laser drilling device
WO2006025408A1 (ja) * 2004-08-31 2006-03-09 Nikon Corporation 露光装置及びデバイス製造方法
JP2007103882A (ja) * 2005-10-07 2007-04-19 Canon Inc 露光装置及びこれを利用したデバイスの製造方法
JP2009004632A (ja) * 2007-06-22 2009-01-08 Canon Inc 露光装置及びデバイス製造方法
US7941232B2 (en) 2004-06-29 2011-05-10 Nikon Corporation Control method, control system, and program
JP2014007262A (ja) * 2012-06-22 2014-01-16 Canon Inc 露光装置、露光方法及び物品の製造方法

Cited By (11)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US6888096B1 (en) 1999-09-28 2005-05-03 Sumitomo Heavy Industries, Ltd. Laser drilling method and laser drilling device
JP2001343575A (ja) * 2000-03-31 2001-12-14 Nikon Corp 光学素子保持装置、鏡筒及び露光装置並びにマイクロデバイスの製造方法。
JP2002139663A (ja) * 2000-08-02 2002-05-17 Nikon Corp 装置設計製作システム、このシステムにより製作される装置およびこの装置により製造される製品
US7941232B2 (en) 2004-06-29 2011-05-10 Nikon Corporation Control method, control system, and program
WO2006025408A1 (ja) * 2004-08-31 2006-03-09 Nikon Corporation 露光装置及びデバイス製造方法
JPWO2006025408A1 (ja) * 2004-08-31 2008-05-08 株式会社ニコン 露光装置及びデバイス製造方法
JP5266641B2 (ja) * 2004-08-31 2013-08-21 株式会社ニコン 露光装置及びデバイス製造方法
JP2007103882A (ja) * 2005-10-07 2007-04-19 Canon Inc 露光装置及びこれを利用したデバイスの製造方法
JP2009004632A (ja) * 2007-06-22 2009-01-08 Canon Inc 露光装置及びデバイス製造方法
JP2014007262A (ja) * 2012-06-22 2014-01-16 Canon Inc 露光装置、露光方法及び物品の製造方法
US9766548B2 (en) 2012-06-22 2017-09-19 Canon Kabushiki Kaisha Exposure apparatus, exposure method, and method of manufacturing article

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