JPH1125865A - Plasma display panel - Google Patents

Abstract

(57) [Summary] [PROBLEMS] To improve the reliability of a plasma display panel. SOLUTION: Display electrodes and address electrodes conventionally formed on a glass substrate are immersed in the glass substrate to ensure a dielectric strength even when the dielectric glass layer is formed thin, and to further reduce the discharge voltage. It is possible to obtain a plasma display panel which suppresses a rise and has high brightness.

Description

DETAILED DESCRIPTION OF THE INVENTION

[0001]

BACKGROUND OF THE INVENTION 1. Field of the Invention The present invention relates to a plasma display panel used for a display device or the like, and more particularly to an improvement in an electrode arrangement structure of a plasma display panel and an improvement in a material of a dielectric glass layer.

[0002]

2. Description of the Related Art In recent years, expectations for high-definition and large-screen televisions including high-definition televisions have been increasing. CRTs are superior to plasma displays and liquid crystals in terms of resolution and image quality, but are not suitable for large screens of 40 inches or more in terms of depth and weight. On the other hand, liquid crystal has excellent performance of low power consumption and low driving voltage,
There are limitations on screen size and viewing angle. On the other hand, the plasma display is capable of realizing a large screen, and a 40-inch class product has already been developed (for example, Functional Materials, February, 1996, Vol. 16, No. 2).
7 pages).

FIG. 6 is a perspective view of a main part of a conventional alternating current (AC) type plasma display panel. In FIG. 6, reference numeral 51 denotes a front glass substrate (front cover plate) made of a sodium borosilicate glass by a float method, and a display electrode 52 made of a silver electrode is present on the front glass substrate 51, and a capacitor is placed on the display electrode 52. A dielectric glass layer 53 and a magnesium oxide (MgO) dielectric protection layer 54 which function as the above are covered. Reference numeral 55 denotes a back glass substrate (back plate) on which an address electrode (silver electrode) 56 and a dielectric glass layer 57 are provided, on which a partition wall 58 and a phosphor layer 59 are provided.
Are provided, and a space between the partition walls 58 is a discharge space 60 in which a discharge gas is sealed.

[0004]

The pixel level of the high-definition television of full specs which is expected in recent years is 1920 × 1125 pixels, the cell pitch is also 42 inch class, and 0.15 mm × 0.48 mm. The area is as fine as 0.072 mm ² . When prepared the HDTV in the same size of 42 inches, compared with the area of one pixel conventional NTSC (480 pieces several pixels 640 ×, cell pitch 0.43 mm × 1.29 mm, 1 area of the cell 0.55 mm ²⁾ and Then, the resolution becomes 1/7 to 1/8.

Therefore, not only the distance between the discharge electrodes (display electrodes) is shortened, but also the discharge space is narrowed. In particular, the dielectric glass layer has a reduced cell area, so that an attempt is made to secure the same capacitance as a capacitor. Then, it is necessary to make the film thickness thinner than before. However, in the conventional plasma display panel in which the display electrode and the address electrode are respectively formed on the front and rear glass substrates (52 and 56 in FIG. 6), usually, the electrodes correspond to the thickness on the dielectric glass layer side. Because of the intrusion, the electric field tends to be locally large around the electrodes of the dielectric glass layer. For example, when a signal is sent between a display electrode and an address electrode (when an address discharge occurs), dielectric breakdown occurs. There was a problem in terms of withstand voltage, which is easy to perform.

Accordingly, an object of the present invention is to provide a highly reliable plasma display panel even in the case of a fine cell structure by overcoming the problem of the withstand voltage and the like.

[0007]

In order to achieve the above object, the present invention provides a front cover plate having a first electrode and a dielectric glass layer covering the first electrode;
The plasma display panel, in which the electrodes and the back plate on which the phosphor layers are arranged face each other,
The front cover plate portion where the electrode is disposed is recessed, and the first electrode is buried in the recess.

With the plasma display having such a configuration, the amount of the first electrode entering the dielectric glass layer can be reduced, so that the electric field hardly locally increases around the electrodes of the dielectric glass layer. Become. Thereby, there is an effect that even if the thickness of the dielectric glass layer is reduced, the dielectric breakdown is hardly caused. By thus forming a thin dielectric glass layer, the discharge voltage can be reduced, and at the same time, the reliability of addressing can be improved, and the panel luminance can be improved.

When a second dielectric glass layer covering the second electrode is provided on the back plate, a portion of the back plate where the second electrode is provided is recessed, and the second dielectric glass layer is provided in the recess. By adopting a configuration in which the electrodes are submerged, the reliability can be further improved. Here, the dielectric constant is 13
By forming the above dielectric glass layer, the effect of reducing the discharge voltage and the effect of improving the panel luminance are further improved.

[0010]

BEST MODE FOR CARRYING OUT THE INVENTION

[Introduction] First, the present invention will be outlined. First, in FIG. 6, assuming that the area of the display electrode 52 is S, the thickness of the dielectric glass layer on the display electrode is d, the dielectric constant of the dielectric glass layer is ε, and the charge on the dielectric glass layer is Q,
The capacitance C between the address and the address electrode 56 is represented by the following equation.

C = εS / d Further, if the voltage applied between the display electrode 52 and the address electrode 56 is V, and the charge amount Q accumulated on the dielectric glass layer on the display electrode 52 is V, Q Has the following relationship:

V = dQ / εS (However, the discharge space becomes a conductor because it is in a plasma state during the discharge.) In the above formulas and formulas, when d is reduced, the capacitance C as a capacitor becomes large, The discharge voltage V at the time of display is reduced.

In other words, by reducing the thickness of the dielectric glass layer, a large amount of electric charge is accumulated even when the same voltage is applied, so that a higher capacity and a lower discharge voltage can be achieved. However, if the thickness of the dielectric glass layer is simply reduced, the dielectric strength is reduced, and the dielectric layer is easily broken down when an address pulse or a display pulse is applied.

Therefore, the present inventors formed a concave portion in the front cover plate and the back plate, and submerged the display electrode and the address electrode in the concave portion, thereby providing a discharge voltage lower than that of the conventional NTSC and a static electricity of the cell. The isolation voltage has been improved while securing the capacity. In other words, if the electrodes are submerged in the recesses formed in the front cover plate and the back plate, the amount of the electrodes protruding into the dielectric glass layer can be reduced, so that the dielectric breakdown does not easily occur. Therefore,
It is possible to further reduce the thickness of the dielectric glass layer from the conventional thickness of about 20 μm while improving the withstand voltage. This makes it possible to lower the discharge voltage, improve the reliability of the addressing, and improve the panel luminance.

Here, a PbO—B ₂ O ₃ —SiO ₂ system, PbO—B ₂ O ₃ —, which has been conventionally used and has a dielectric constant ε of about 10, is used.
SiO ₂ —ZnO or PbO—B ₂ O ₃ —SiO ₂ —Al
_If a dielectric glass having a dielectric constant ε of 13 or more is used instead of a ₂ O ₃ -based dielectric glass, the effects of improving the luminance and lowering the discharge voltage become more remarkable. As a method of immersing the electrodes in the concave portions of the front governor plate and the back plate, first, the concave portions are formed by using a photoresist method,
Next, a method of forming each electrode in the concave portion by a screen printing method can be cited.

[Embodiment] FIG. 1 shows an AC surface discharge type plasma display panel (hereinafter referred to as "P") according to this embodiment.
DP ”). FIG. 2 is a perspective view of X in FIG.
FIG. 3 is a cross-sectional view taken along a line X-Y in FIG. 1. In these figures, only three cells are shown for the sake of convenience. However, a PDP is constituted by arranging a large number of cells emitting red (R), green (G), and blue (B) in actuality. ing.

In this PDP, a discharge electrode (display electrode) 12 is submerged on a front glass substrate (front cover plate) 11 as shown in each figure, and a dielectric glass layer 13
Are disposed on a front panel 10 on which a substrate is disposed and a rear glass substrate (back plate) 21, and a dielectric glass layer 23, partition walls 24, and phosphor layers 25 of each color of R, G, and B are formed thereon. Are bonded to each other, and a discharge gas is sealed in a discharge space 30 formed between the front panel 10 and the back panel 20, and is manufactured as described below. .

Preparation of Front Panel 10: Front Panel 10
In this embodiment, a discharge electrode (display electrode) 12 is immersed in a front glass substrate 11, which is covered with a dielectric glass layer 13 having a dielectric constant ε of 13 or more in the present embodiment.
It is produced by forming a protective layer 14 on the surface of.

The discharge electrode 12 is immersed in the front glass substrate 11 as follows. This will be described with reference to FIG. First, a photoresist having a thickness of 5 μm is applied on the front glass substrate 11, and only the portions where the discharge electrodes 12 are to be formed are exposed and developed so as to eliminate the photoresist, and the photoresist is removed. Etching is performed using an acid to form a concave portion having a depth of, for example, 5 μm on the glass substrate 11.

Next, a paste for a silver electrode is embedded in the concave portion of the front glass substrate 11 by screen printing, and after drying, only the resist is peeled off by using a peeling liquid or the like. A silver electrode (discharge electrode) 12 is formed. After the firing, the portion of the electrode protruding from the glass substrate surface is polished to make the glass substrate surface and the electrode surface flush and flat.

As described above, the discharge electrodes are connected to the front glass substrate 11.
The discharge electrode 1 on the dielectric glass layer 13 side.
2 has an extremely small amount of intrusion, so that the dielectric withstand voltage of the dielectric glass layer can be improved as described above. Next, in this embodiment, a dielectric glass layer 13 having a dielectric constant ε of 13 or more is formed thereon.

The material of the dielectric glass layer 13 is, for example, lead oxide (PbO), boron oxide (B ₂ O ₃ ), silicon oxide (SiO ₂ ), titanium oxide (TiO ₂ ), and aluminum oxide (Al ₂ O). ₃ ) Glass, or bismuth oxide (Bi ₂ O ₃ ), zinc oxide (ZnO), boron oxide (B ₂ O ₃ ), silicon oxide (SiO ₂ ), calcium oxide (CaO), and titanium oxide (TiO ₂₎ ) Is used.

As described above, the glass having the composition containing TiO ₂ can easily adjust the dielectric constant ε to 13 or more (see Table 1 below). Since the TiO ₂ content is significantly improved dielectric constant ε if more than 5 wt%, the light transmittance of the content exceeds 10 wt% dielectric glass layer is decreased, the content of TiO ₂ Is desirably 5 to 10% by weight of glass.

The dielectric glass layer 13 is formed by screen-printing a dielectric glass paste in which each of the above oxides is mixed with an organic binder and baking it at 540 ° C., for example.
As the thickness of the dielectric glass layer becomes thinner, the effect of improving the panel luminance and reducing the discharge voltage becomes remarkable, so that it is desirable to set the thickness as thin as possible within a range where the withstand voltage does not decrease.

Therefore, in the present embodiment, the thickness of the dielectric glass layer 13 is set to a predetermined thickness (for example, 15 μm) smaller than the conventional thickness of approximately 20 μm. Next, the protective layer 1 made of an alkaline earth oxide is formed on the dielectric glass layer 13.
4 is formed. In this embodiment, the CVD method (thermal CVD)
(100) or (110) plane oriented magnesium oxide (Mg
A protective layer made of O) is formed. Details of the formation of the protective layer 14 by the CVD method will be described later.

Preparation of back panel 20: First, a concave portion is formed on the rear glass substrate 21 by the above-described photoresist method, and an address electrode 22 as a second electrode is formed in this concave portion in the same manner as the discharge electrode 12. The PbO—B ₂ O ₃ —SiO ₂ —TiO ₂ —Al ₂ O ₃ system or the Bi ₂ O ₃ —ZnO—B ₂ O _{3 is further formed} thereon by screen printing and baking in the same manner as in the case of the front panel 10. -SiO ₂ -CaO-T
An iO ₂ -based dielectric glass layer 23 is formed.

Then, the partition walls 24 made of glass are fixed at a predetermined pitch. The red (R) phosphor, the green (G) phosphor, and the blue (B) are placed in each space between the partition walls 24.
By disposing one of the phosphors, the phosphor layer 25 is formed.
To form As the phosphors of the respective colors R, G, and B, phosphors generally used in PDPs can be used. Here, the following phosphors are used.

Red phosphor: (YXGd _1-X ) BO ₃ :
Eu ³⁺ green phosphor: Zn ₂ SiO ₄ : Mn Blue phosphor: BaMgAl ₁₀ O ₁₇ : Eu ²⁺ or Ba
Production of PDP by laminating MgAl ₁₄ O ₂₃ : Eu ²⁺ front panel 10 and rear panel 20: Next, front panel 10 and rear panel 20 produced as described above are laminated together with sealing glass. After the inside of the discharge space 30 partitioned by the partition wall 24 is evacuated to a high vacuum (8 × 10 ⁻⁷ Torr), a discharge gas having a predetermined composition is sealed at a predetermined pressure, thereby reducing the pressure.
Prepare DP.

In the PDP manufactured as described above, the amount of each electrode (display electrode and address electrode) protruding into the dielectric glass layer side is extremely small, and as shown in FIGS. The boundary surface with the layer has a substantially flat electrode arrangement structure. In the present embodiment, the cell size of the PDP is set to 0.2 mm or less and the discharge electrode 12 is adapted to a 40-inch class high-definition television.
Is set to 0.1 mm or less.

The composition of the discharge gas to be filled is a He-Xe type conventionally used, but the content of Xe is 10% by volume or more, and the filling pressure is 500 to 760 Torr.
By setting r, the light emission luminance of the cell is improved. (Regarding Formation of Protective Layer 14 by CVD Apparatus) FIG.
FIG. 2 is a schematic view of a CVD apparatus 40 used when forming the protective layer 14.

The CVD apparatus 40 can perform both thermal CVD and plasma CVD.
A heater section 46 for heating a glass substrate 47 (the front glass substrate 11 on which the discharge electrodes 12 and the dielectric glass layer 13 are formed in FIG. 1) is provided in the VD apparatus main body 45, and the inside of the CVD apparatus main body 45 is exhausted. The pressure can be reduced by the device 49. Further, a high frequency power supply 48 for generating plasma in the CVD apparatus main body 45 is provided.
Is installed.

The Ar gas cylinders 41a and 41b convert argon [Ar] gas as a carrier into a vaporizer (bubbler).
This is supplied to the CVD apparatus main body 45 via 42 and 43. The vaporizer 42 heats and stores a metal chelate or a cyclopentadienyl compound serving as a raw material (source) of the alkaline earth oxide, and blows Ar gas from an Ar gas cylinder 41a to form the metal chelate or cyclopentadienyl compound. Evaporate the enyl compound to obtain CV
It can be sent to the D device main body 45.

The vaporizer 43 heats and stores the cyclopentadienyl compound, which is a raw material (source) of the alkaline earth oxide, and blows the cyclopentadienyl compound by blowing Ar gas from an Ar gas cylinder 41b. It can be evaporated and sent to the CVD apparatus main body 45. The oxygen cylinder 44 supplies oxygen [O ₂ ] as a reaction gas to the main body 45 of the CVD apparatus.

(1) Thermal CVD In the case of performing thermal CVD using the CVD apparatus 40, a glass in which the discharge electrode 12 is immersed on the heater section 46 and the dielectric glass layer 13 is formed thereon is formed. The substrate 47 is placed with the dielectric glass layer 13 facing upward and at a predetermined temperature (350 ° C.
400 ° C.), and an exhaust device 4
At 9, the pressure is reduced to a predetermined pressure (about several tens Torr).

Then, in the vaporizer 42 or the vaporizer 43,
An alkaline earth metal chelate or cyclopentadienyl compound as a source is heated to a predetermined temperature (80 ° C. to 125 ° C.).
C) while heating to the Ar gas cylinder 41a or 41a.
Ar gas is sent from b. At the same time, oxygen is supplied from the oxygen cylinder 44. As a result, the metal chelate or cyclopentadienyl compound fed into the CVD apparatus main body 45 reacts with oxygen, and the glass substrate 47
A protective layer 14 made of an alkaline earth oxide is formed on the surface of the dielectric glass layer 13.

(2) Plasma CVD Method The plasma CVD method using the CVD apparatus 40 having the above structure is performed in substantially the same manner as the thermal CVD method. 3
The pressure was reduced to about 00 ° C. using the exhaust device 49 (10 Torr).
r), and driving the high-frequency power supply 48 to, for example, 1
By applying a high frequency electric field of 3.56 MHz, C
The protective layer 14 made of alkaline earth oxide is formed while generating plasma in the VD device main body 45.

The source supplied from the vaporizer 42 or the vaporizer 43
(Metal chelates and cyclopentadienyl compounds)
Examples of the alkaline earth dipivaloylmethane
Compound [M (C₁₁H₁₉O_Two)_Two], Alkaline earth acetylene
Luacetone compound [M (C_FiveH₇O_Two)_Two], Alkaline earth
Trifluoroacetylacetone compound [M (C_FiveH _FiveF
_ThreeO_Two)_Two], Alkaline earth cyclopentadiene compounds
[M (C_FiveH_Five)_Two] (The above chemical formula
And M represents an alkaline earth element).

In this embodiment, the alkaline earth is magnesium, and Magnesium Dipivaloyl Methane
[Mg (C ₁₁ H ₁₉ O ₂ ) ₂ ], Magnesium Acetylacetone
_{[Mg (C 5 H 7 O} 2) 2], Cyclopentadienyl Magnesium
[Mg (C ₅ H ₅ ) ₂ ], Magnesium Trifluoroacetylacet
_{one [Mg (C 5 H 5} F 3 O 2) 2] can be exemplified.

The thickness of the protective layer 14 is desirably as small as possible in order to improve the amount of secondary electrons emitted within a range in which the sputtering resistance can be ensured. In the present embodiment, the protective layer 14 has a thickness of 0.3 μm. It is formed. As described above, the PDP of the present embodiment can reduce the discharge voltage, so that the load applied to each component of the panel during operation is reduced. In addition, since the withstand voltage is improved, excellent initial performance such as high panel luminance and low discharge voltage can be maintained for, for example, repeated use over a long period of time, and the reliability is excellent.

In the above drawings, the boundary surface between each electrode and the dielectric glass layer is illustrated as being completely flush, but it is needless to say that the electrodes 12 and 22 are not necessarily placed on the dielectric glass layer side. The same effect as described above can be obtained in the case where the dielectric glass layer slightly protrudes, or in the case where the dielectric glass layer protrudes toward the glass substrate at the interface between each electrode and the dielectric glass layer.

Further, the discharge electrode 12 and the address electrode 2
Even if both electrodes 2 and 2 are not buried, only the discharge electrode 12 or only the address electrode 22 may be buried, but burying both electrodes has a remarkable effect of improving the dielectric strength. It is. In addition, since the dielectric glass layer 13 on the front panel 10 has a greater effect on luminance and discharge voltage than the dielectric glass layer 23 on the back panel 20, the dielectric glass layer 13 having a larger dielectric constant ε is used for both of them. Even if not used, if a dielectric glass layer having a large dielectric constant ε is arranged at least on the front panel 10 side, it is possible to obtain the effect of improving brightness and the effect of reducing discharge voltage.

[0042]

【Example】

 [Examples 1 to 12 and Comparative Example 13]

[0043]

[Table 1]

Sample No. shown in Table 1 1-6 PDP
Is based on the above embodiment, in which both the discharge electrode and the address electrode are immersed in a glass substrate, and PbO—B ₂ O ₃ —SiO
_The dielectric constant ε of a _2- TiO ₂ —Al ₂ O ₃ system is 15,1
It has a dielectric glass layer of 7, 20, 16, 13, 10 and a film thickness of 15 μm, and the cell size of the PDP is
According to the display for a 42-inch high-definition television, the height of the partition walls 24 is set to 0.15 mm, the interval between the partition walls 24 (cell pitch) is set to 0.15 mm.
The distance d between the two electrodes was set to 0.05 mm.

Then, the content of Xe is 10% by volume of He.
An -Xe-based mixed gas was sealed at a sealing pressure of 600 Torr. For the method of forming the MgO protective layer 14, see Sample N
o. In PDPs 1 to 3, the protective layer is formed by a thermal CVD method,
Sample No. Plasma CV for 4, 5, and 6 PDPs
It was prepared by Method D.

In the thermal CVD method, Magnesium Di is used.
pivaloyl methane [Mg (C ₁₁ H ₁₉ O ₂ ) ₂ ] is used in plasma CVD to prepare cyclopentadienyl magnesium.
[Mg (C ₅ H ₅ ) ₂ ] was used as a source. As other conditions, in the thermal CVD method, the vaporizer temperature 125
C., the heating temperature of the glass substrate 47 is 350 ° C., Ar gas is flowed at 1 L / min, and oxygen is flowed at 2 L / min over the glass substrate 47 for 1 minute, and the film formation speed is adjusted to 1.0 μm / min. .
A 3 μm MgO protective layer was formed.

In the plasma CVD method, the vaporizer temperature 12
5 ° C., the heating temperature of the glass substrate 47 is 250 ° C., Ar gas is supplied at a rate of 1 L / min, and oxygen is supplied at a rate of 2 L / min over the glass substrate 47 for 1 minute.
By applying a 3.56 MHz high frequency electric field of 300 W for 20 seconds, an MgO protective layer having a thickness of 0.3 μm was formed (film formation speed: 1.0 μm / min).

The MgO protective layer thus formed is
When the crystal plane was examined by line analysis, all the samples were crystals oriented to the (100) plane. Sample No. 7 ~
12 of the PDP, PbO-B ₂ O ₃ -S a dielectric glass layer
Bi ₂ O ₃ —ZnO instead of iO ₂ —TiO ₂ —Al ₂ O _{3
-B 2 O 3 -SiO 2 -CaO-} TiO 2 based dielectric constant of ε is 1
8, 24, 20, 19, 20, and 12 except that the discharge gas was mixed with 20% by volume of Xe.
o. The settings are the same as those of the PDPs 1 to 6. Note that M
The formation of the gO protective layer was all performed by the plasma CVD method.

Sample No. PDP No. 13 is a comparative example, except that the electrode was not immersed. 9 PD
The settings are the same as P. [Experiment] Experiment 1; 1-13
About PDP, panel luminance was measured. The luminance is a value measured when a discharge is performed at a discharge sustaining voltage of about 150 V and a frequency of about 30 Hz, which is a condition under which dielectric breakdown is difficult in each prototype PDP. Table 1 also shows the results.

Experiment 2: Sample No. PD of 1-13
Twenty sheets of the same material as P were produced, and these were subjected to an accelerated life test. This accelerated life test was performed under severer conditions than normal use conditions, and the discharge sustaining voltage was 25%.
The battery was discharged continuously at 0 V and a frequency of 50 KHz for 4 hours. Thereafter, the state of breakage of the dielectric glass layer and the like in the panel (panel defect) was examined. The results are also shown in Table 1.

Consideration: Sample No. According to the luminance measurement results of 1 to 13, the panel luminance of the conventional PDP is 400 cd / m ^2.
Degree (Nikkei Electronics 1997 Vol.5
-5 Refer to page 106). This indicates that the panel brightness can be improved by forming the dielectric glass layer thin.

From the results of the accelerated life test, in the PDPs of Sample Nos. 1 to 12 produced by immersing the electrodes in the glass substrate,
Sample No. in which the electrode was not immersed in the glass substrate 13 P
It is clear that the dielectric strength is superior to DP. From these results, it is understood that if the electrode is immersed, the dielectric withstand voltage can be improved even when the dielectric glass layer is formed to be 15 μm thinner than the conventional one and the luminance is improved.

Next, the sample N in which the electrode was immersed in a glass substrate was used.
o. Comparing the panels Nos. 1 to 12 with each other, Sample No. 1 in which a dielectric glass layer having a dielectric constant ε of 13 or more was disposed. 1 to
5 and sample no. In PDPs 7 to 11, sample N
o. 6 and sample no. Compared to the PDP of No. 12, the improvement of the withstand voltage is particularly remarkable, and the panel luminance is also 500 cd.
/ M ² or more. This confirms that a thinner dielectric glass layer having a large dielectric constant ε can provide a PDP having better luminance and a lower discharge voltage.

The sample No. In the PDP of Sample No. 13, the dielectric constant ε was as large as 20, and the effective thickness of the dielectric glass layer on the electrode was as large as that of Sample No. 13. The reason why the luminance is low in spite of being thin as compared with 1 to 12 is that the dielectric glass layer is thinned by the conventional electrode arrangement, so that the dielectric breakdown is easy compared with other prototype PDPs. This is because the measurement must be performed at a voltage lower than the discharge maintaining voltage.

[0055]

As described above, according to the plasma display panel of the present invention, the first electrode and the first electrode
In a plasma display panel in which a front cover plate provided with a dielectric glass layer covering the electrodes and a back plate provided with a second electrode and a phosphor layer face each other, the first electrode is provided. Since the front cover plate portion is recessed and the first electrode is immersed in the recess, the dielectric withstand voltage does not decrease even if the dielectric glass layer is formed thin. of,
Further, a plasma display panel having high reliability in addressing and durability can be obtained.

When the back plate is provided with a second dielectric glass layer covering the second electrode, the back plate portion where the second electrode is provided is recessed. By adopting an electrode arrangement configuration in which the second electrode is immersed in the recess, reliability can be further improved. Further, when at least one of the first dielectric glass layer and the second dielectric glass layer has a dielectric constant of 13 or more, the effect of reducing the discharge voltage and the effect of improving the panel luminance become remarkable. .

The dielectric glass layer having a dielectric constant of 13 or more includes lead oxide (PbO), boron oxide (B ₂ O ₃ ), silicon oxide (SiO ₂ ), titanium oxide (TiO ₂ ), and aluminum oxide (Al ₂ O ₃ ) or bismuth oxide (Bi
₂ O ₃ ), zinc oxide (ZnO), boron oxide (B ₂ O ₃ ), silicon oxide (SiO ₂ ), calcium oxide (CaO), and titanium oxide (TiO ₂ ) can also be used.

The dielectric constant of the dielectric glass layer having such a composition is particularly affected by the content of titanium oxide. By setting the content of titanium oxide to 5% by weight to 10% by weight, the dielectric constant can be easily reduced. It can be set to 13 or more.

[Brief description of the drawings]

FIG. 1 is a perspective view of a main part of a plasma display panel according to an embodiment of the present invention.

FIG. 2 is a sectional view of the plasma display panel taken along line XX.

FIG. 3 is a sectional view of the plasma display panel taken along line YY.

FIG. 4 is a schematic view showing a method of embedding an electrode in a front glass substrate.

FIG. 5 is a schematic view of a CVD apparatus used when manufacturing a plasma display panel according to an embodiment of the present invention.

FIG. 6 is a perspective view of a main part of a conventional AC type plasma display panel.

[Explanation of symbols]

 DESCRIPTION OF SYMBOLS 10 Front panel 11 Front glass substrate 12 Discharge electrode (display electrode) 13 Dielectric glass layer 14 Protective film 20 Back panel 21 Back glass substrate 22 Address electrode 23 Dielectric glass layer 24 Partition wall 25 Phosphor layer 30 Discharge space 40 CVD apparatus 41 Argon gas cylinder 42, 43 Vaporizer 44 Oxygen gas cylinder 45 CVD apparatus main body 46 Substrate heater 47 Front glass substrate on which dielectric glass layer is formed 48 High frequency power supply 49 Exhaust device

 ──────────────────────────────────────────────────続 き Continued on the front page (72) Inventor Katsuyoshi Yamashita 1006 Kazuma Kadoma, Osaka Prefecture Matsushita Electric Industrial Co., Ltd.

Claims (6)

[Claims] A front cover plate provided with a first electrode and a dielectric glass layer covering the first electrode;
In the plasma display panel in which the first electrode and the back plate on which the phosphor layer is disposed face each other, the front cover plate portion where the first electrode is disposed is recessed, and the first electrode is immersed in the recess. A plasma display characterized by being provided. 2. The back plate further includes a second dielectric glass layer that covers a second electrode, a back plate portion where the second electrode is disposed is recessed, and the recess is formed in the recess. 2. The plasma display panel according to claim 1, wherein the second electrode is submerged. 3. The plasma according to claim 1, wherein at least one of the first dielectric glass layer and the second dielectric glass layer has a dielectric constant of 13 or more. Display panel. 4. The dielectric glass layer having a dielectric constant of 13 or more includes lead oxide (PbO), boron oxide (B ₂ O ₃ ), and silicon oxide (S
iO _2), titanium oxide (TiO _2), a plasma display panel according to claim 3, characterized in that it consists of aluminum oxide (Al ₂ O _3). 5. The dielectric glass layer having a dielectric constant of 13 or more includes bismuth oxide (Bi ₂ O ₃ ), zinc oxide (ZnO), boron oxide (B ₂ O ₃ ), silicon oxide (SiO ₂ ), oxidized calcium (CaO), plasma display panel according to claim 3, characterized in that it consists of titanium oxide (TiO _2). 6. The dielectric glass layer is made of titanium oxide (T
6. The plasma display panel according to claim 4, comprising 5% by weight to 10% by weight of (iO ₂ ).