JPH11265010A - Focal plane shutter - Google Patents

Focal plane shutter

Info

Publication number
JPH11265010A
JPH11265010A JP2382499A JP2382499A JPH11265010A JP H11265010 A JPH11265010 A JP H11265010A JP 2382499 A JP2382499 A JP 2382499A JP 2382499 A JP2382499 A JP 2382499A JP H11265010 A JPH11265010 A JP H11265010A
Authority
JP
Japan
Prior art keywords
shutter
opening
substrate
blade
blade unit
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP2382499A
Other languages
Japanese (ja)
Other versions
JP3224786B2 (en
Inventor
Nobuyuki Fukui
信之 福井
Ichiro Nemoto
一郎 根本
Hiroyuki Izumi
裕之 泉
Kunitaka Takahashi
邦▲隆▼ 高橋
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Seiko Precision Inc
Original Assignee
Seiko Precision Inc
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Seiko Precision Inc filed Critical Seiko Precision Inc
Priority to JP02382499A priority Critical patent/JP3224786B2/en
Publication of JPH11265010A publication Critical patent/JPH11265010A/en
Application granted granted Critical
Publication of JP3224786B2 publication Critical patent/JP3224786B2/en
Anticipated expiration legal-status Critical
Expired - Fee Related legal-status Critical Current

Links

Landscapes

  • Shutters For Cameras (AREA)

Abstract

PROBLEM TO BE SOLVED: To reduce exposure unevenness from the upper end of a shutter aperture to the lower end of it at the time of photographing through a photographing lens. SOLUTION: A focal plane shutter for exposure while it is moved from the lower end of a shutter aperture 1a to the upper end of it is constituted so that the thickness of a substrate 1 is set to be gradually larger from the upper part of a shutter to the lower part of it on the side of a receiving plate 7 so as to bias an opening shutter blade 3a at the time of starting the exposure in the direction of the receiving plate 7 as compared with that at the time of finishing the exposure, and the plate thickness of the receiving plate 7 is similarly set to be gradually smaller from the upper part of the shutter to the lower part of it on the side of the substrate 1 so as to bias a closing shutter blade 5a at the time of finishing the exposure in the direction of the substrate 1, so that a distance between the opening and closing shutter blades 3a and 5a forming a slit in the direction of an optical axis is made short.

Description

【発明の詳細な説明】DETAILED DESCRIPTION OF THE INVENTION

【0001】[0001]

【発明の技術分野】本発明はカメラ用シャッタの露出時
間ムラを補正したフォーカルプレーンシャッタに関する
ものである。
BACKGROUND OF THE INVENTION 1. Field of the Invention The present invention relates to a focal plane shutter for correcting exposure time unevenness of a camera shutter.

【0002】[0002]

【従来の技術】周知のようにカメラ用フォーカルプレー
ンシャッタは一対の開放羽根と閉鎖羽根を備え、シャッ
タレリーズ信号により開放羽根がシャッタ開口を開放
し、この後端のスリット形成羽根によって露出が開始さ
れる。一方開放羽根の開放作動後に閉鎖羽根が作動し、
その先端のスリット形成羽根によってシャッタ開口の露
出を終了させるものである。
2. Description of the Related Art As is well known, a focal plane shutter for a camera has a pair of open blades and a closed blade. The open blade opens a shutter opening in response to a shutter release signal, and exposure is started by a slit forming blade at the rear end. You. On the other hand, the closing blade operates after the opening operation of the opening blade,
The exposure of the shutter opening is terminated by the slit forming blade at the tip.

【0003】シャッタ開口を下から上へと露光のための
走行を行うフォーカルプレーンシャッタは図6に示すよ
うにシャッタ開口11aが形成された基板11と受板7
との間に収納された開放羽根ユニット3と閉鎖羽根ユニ
ット5とからなり、これら一対の各ユニット3、5はカ
メラに装填されたフィルム8の前にあり、初期状態にあ
っては開放羽根ユニット3は展開され、シャッタ開口1
1aからの光をフィルム8に対して遮蔽している。この
とき、間隔羽根6aによりスリット形成用シャッタ羽根
3aは基板11側に寄せられている。一方閉鎖羽根ユニ
ット5は折り畳まれてシャッタ開口11aの図中下方に
位置している。又シャッタ作動時には開放羽根ユニット
3が一つの開放用バネにより図中上方向へ移動して折り
畳まれると露出時間に応じて所定時間経過後に閉鎖羽根
ユニット5は一つの閉鎖用バネにより上方向へ移動展開
してシャッタ開口を閉鎖する。このとき、間隔羽根6b
によりスリット形成用羽根5aは受板7側に寄せられて
いる。
As shown in FIG. 6, a focal plane shutter that travels from the bottom to the top through a shutter opening for exposure includes a substrate 11 having a shutter opening 11a formed thereon and a receiving plate 7 as shown in FIG.
And a closed blade unit 5 housed between the camera unit and the pair of units 3, 5, which are in front of the film 8 loaded in the camera, and which are in the initial state. 3 is unfolded and shutter opening 1
The light from 1 a is shielded from the film 8. At this time, the slit forming shutter blades 3a are moved closer to the substrate 11 by the spacing blades 6a. On the other hand, the closing blade unit 5 is folded and positioned below the shutter opening 11a in the drawing. When the shutter is activated, the opening blade unit 3 is moved upward by one opening spring in the figure and folded, and after a predetermined time elapses according to the exposure time, the closing blade unit 5 is moved upward by one closing spring. Deploy to close the shutter opening. At this time, the spacing blade 6b
Thereby, the slit forming blades 5a are moved toward the receiving plate 7 side.

【0004】開放羽根ユニット3の開放方向後端のスリ
ット形成用シャッタ羽根3aの後端Pと閉鎖羽根ユニッ
ト5の閉鎖方向先端のスリット形成用シャッタ羽根5a
の先端Qとによって形成されたスリットは、このスリッ
トが同図中シャッタ開口11aの下端から上端へ移動し
てフィルム8に入射する光量を制御している。
The rear end P of the slit forming shutter blade 3a at the rear end of the opening blade unit 3 in the opening direction and the slit forming shutter blade 5a at the front end of the closing blade unit 5 in the closing direction.
The slit formed by the front end Q of the shutter opening 11a moves from the lower end to the upper end of the shutter opening 11a in FIG.

【0005】[0005]

【発明が解決しようとする課題】しかしながら図7に示
すように羽根ユニットが下端から上端へと移動するとき
には、加速しながら移動するため、シャッタ開口11a
の下端と上端とではスリットの幅が異なるが、平行光線
がフィルムに入射した場合では露光量が一定となる。と
ころが撮影レンズ12を通して撮影した場合、開放羽根
ユニット3と閉鎖羽根ユニット5のスリットを形成する
シャッタ羽根3a、5a相互の光軸方向の距離が離れて
いるため、斜めからの光に対しては画面全体にわたって
均一な露光量は得られない。即ち、露出開始時(図中下
部)の平行光線でのフィルム8への露光範囲D1と斜光
線でのフィルム8への露光範囲L1の比は露光終了時
(図中上部)の平行光線の露光範囲D2と斜光線の露光
範囲L2の比よりも大きくなりシャッタ開口11aの下
端では露光量が少なく、上端では露光量が多くなる。フ
ィルム感度の向上に伴って露出時間の高速化が要求さ
れ、スリットの走行間隔を狭くするだけで高速の露光を
達成するものにおいては、露光量のムラがより顕著であ
った。
However, as shown in FIG. 7, when the blade unit moves from the lower end to the upper end, it moves while accelerating.
The width of the slit is different between the lower end and the upper end, but when parallel rays are incident on the film, the exposure amount is constant. However, when the image is taken through the photographing lens 12, the shutter blades 3a and 5a forming the slits of the open blade unit 3 and the closed blade unit 5 are far apart from each other in the optical axis direction. A uniform exposure dose cannot be obtained throughout. That is, the ratio of the exposure range D1 to the film 8 with the parallel rays at the start of the exposure (lower part in the figure) and the exposure range L1 to the film 8 with the oblique rays is the exposure of the parallel rays at the end of the exposure (upper part in the figure). The ratio is larger than the ratio between the range D2 and the exposure range L2 of the oblique ray, and the exposure amount is small at the lower end of the shutter opening 11a and is larger at the upper end. As the film sensitivity is improved, the exposure time must be shortened. In the case of achieving high-speed exposure only by narrowing the interval between the slits, the unevenness of the exposure amount is more remarkable.

【0006】[0006]

【課題を解決するための手段】前記課題を解決するため
に本発明では、羽根ユニットがシャッタ開口を開放及び
閉鎖するフォーカルプレーンシャッタにおいて、シャッ
タ開口の閉鎖位置では羽根ユニットの羽根走行空間を光
軸方向且つ他方の羽根ユニット側に狭ばめて、スリット
を形成する開放及び閉鎖羽根相互の光軸方向の距離を短
くし、斜め光と平行光の差を少なくし、シャッタ開口各
部の露光ムラをなくすものである。
According to the present invention, there is provided a focal plane shutter in which a blade unit opens and closes a shutter opening. In a focal plane shutter in which a shutter opening is closed, the blade traveling space of the blade unit is moved along an optical axis. Direction and the other blade unit side, shorten the distance between the open and closed blades forming the slit in the optical axis direction, reduce the difference between oblique light and parallel light, and reduce the exposure unevenness of each part of the shutter opening. To get rid of it.

【0007】[0007]

【発明の実施の形態】シャッタ開口を有する基板と、シ
ャッタ開口を開閉する開放及び閉鎖羽根ユニットと、各
羽根ユニットの走行空間を基板との間に構成する受板と
を有し、開放又は閉鎖羽根ユニットがシャッタ開口を閉
鎖する位置では、一方の羽根ユニットのスリット形成羽
根が、他方の羽根ユニットに光軸方向に近づくように基
板又は受板を徐々に厚くして構成してある。
DETAILED DESCRIPTION OF THE PREFERRED EMBODIMENTS An opening or closing blade includes a substrate having a shutter opening, opening and closing blade units for opening and closing the shutter opening, and a receiving plate that defines a travel space of each blade unit between the substrate and the substrate. At a position where the blade unit closes the shutter opening, the substrate or the receiving plate is configured such that the slit forming blade of one blade unit gradually becomes thicker so as to approach the other blade unit in the optical axis direction.

【0008】また、シャッタ羽根がシャッタ開口の下端
から上端へ走行するものでは、シャッタ開口の下端部を
光軸方向且つ受板側に徐々に厚い前記基板とシャッタ開
口の上端部を光軸方向且つ基板側に徐々に厚い前記受板
とのいずれか一方又は双方を有するように構成するのが
好ましい。
When the shutter blade travels from the lower end to the upper end of the shutter opening, the lower end of the shutter opening is gradually thickened in the optical axis direction and the receiving plate side, and the upper end of the shutter opening is moved in the optical axis direction. It is preferable that the substrate side is provided with one or both of the receiving plate and the thicker receiving plate.

【0009】また、シャッタ羽根がシャッタ開口の上端
から下端へ走行するものでは、シャッタ開口の上端部を
光軸方向且つ受板側に徐々に厚い前記基板とシャッタ開
口の下端部を光軸方向且つ基板側に徐々に厚い前記受板
とのいずれか一方又は双方を有しているように構成する
のが好ましい。
When the shutter blade travels from the upper end to the lower end of the shutter opening, the upper end of the shutter opening is gradually thickened in the optical axis direction and the receiving plate side, and the lower end of the shutter opening is moved in the optical axis direction. It is preferable that the substrate side is provided with one or both of the thicker receiving plate and the receiving plate.

【0010】[0010]

【実施例】以下、本発明の一実施例を添付図面に沿って
説明する。図1及び図2は本発明に係るフォーカルプレ
ーンシャッタの一実施例を示す分解斜視図及び側面図で
ある。図2において、フィルム8の前方であってカメラ
に装填された撮影レンズ12側に配設された基板1に
は、シャッタ開口1aが形成されるとともに、基板1の
板厚がシャッタ開口の上方から下方へと徐々に厚く形成
されている。図1において基板1の上にシャッタ開口1
aを開放するための開放羽根ユニット3が載置され、開
放羽根ユニット3の上にはシャッタ開口4aが形成され
た仕切板4が載置され、この仕切板4の上には閉鎖羽根
ユニット5が載置されている。閉鎖羽根ユニット5の上
には、シャッタ開口7aを有する受板7が載置されてい
る。このようにして、基板1には開放羽根ユニット3、
仕切板4、閉鎖羽根ユニット5が組込まれて受板7が取
り付けられている。
An embodiment of the present invention will be described below with reference to the accompanying drawings. 1 and 2 are an exploded perspective view and a side view showing one embodiment of a focal plane shutter according to the present invention. In FIG. 2, a shutter opening 1a is formed in the substrate 1 disposed in front of the film 8 and on the side of the photographing lens 12 mounted on the camera, and the thickness of the substrate 1 is set from above the shutter opening. It is formed gradually thicker downward. In FIG. 1, a shutter opening 1 is provided on a substrate 1.
The opening blade unit 3 for opening the shutter blade 4a is placed on the opening blade unit 3. A partition plate 4 having a shutter opening 4a is placed on the opening blade unit 3, and the closing blade unit 5 is placed on the partition plate 4. Is placed. On the closing blade unit 5, a receiving plate 7 having a shutter opening 7a is placed. In this manner, the open blade unit 3 is provided on the substrate 1.
The receiving plate 7 is attached with the partition plate 4 and the closing blade unit 5 incorporated therein.

【0011】即ち、図2に示すように撮影レンズ12側
に位置する基板1と、フィルム8側に位置する受板7と
によってシャッタ羽根の収納室を構成し、閉鎖羽根ユニ
ット5がフィルム面8側に、開放羽根ユニット3が撮影
レンズ12側に位置することになり、これら開放羽根ユ
ニット3と閉鎖羽根ユニット5との間に仕切板4が介装
されていることになる。ここで開放羽根ユニット3と閉
鎖羽根ユニット5は図2に示す実施例では複数のシャッ
タ羽根3a、3b、3c、3d、3e及び5a、5b、
5c、5dを重ね合わせたものである。但し、開放、閉
鎖羽根ユニット3、5はそれぞれ大きな一枚のシャッタ
羽根でもよい。
That is, as shown in FIG. 2, the substrate 1 located on the taking lens 12 side and the receiving plate 7 located on the film 8 side constitute a storage chamber for shutter blades. The open blade unit 3 is located on the photographing lens 12 side, and the partition plate 4 is interposed between the open blade unit 3 and the closed blade unit 5. Here, the open blade unit 3 and the closed blade unit 5 are a plurality of shutter blades 3a, 3b, 3c, 3d, 3e and 5a, 5b in the embodiment shown in FIG.
5c and 5d are superimposed. However, each of the open and closed blade units 3 and 5 may be a single large shutter blade.

【0012】また、開放羽根ユニット3は図3に示すよ
うに、シャッタ開口1aを閉鎖した状態(初期状態にお
いて)は、シャッタ羽根3a、3b、3c、3d、3e
がそれぞれ一対の平行なリンクをなす羽根アーム9、1
0にピン連結されており、この一対の羽根アーム9、1
0はピン1b、1cを介して基板1に回動自在に取り付
けられている。このような開放及び閉鎖羽根ユニット
3、5の駆動部の一実施例を図4に示した。図4に示す
ように、駆動部は主として開放及び閉鎖羽根ユニット
3、5の各羽根アームを回動させるための開放レバー3
0と閉鎖レバー50、これら開放レバー30及び閉鎖レ
バー50を図示する所定のセット位置までセットするセ
ットレバー60、及び開放レバー30及び閉鎖レバー5
0をそれぞれ制御するための電磁石40、80から構成
される。
As shown in FIG. 3, the open blade unit 3 closes the shutter opening 1a (in the initial state) when the shutter blades 3a, 3b, 3c, 3d, and 3e are closed.
Wing arms 9, 1 each forming a pair of parallel links
0, and the pair of blade arms 9, 1
Numeral 0 is rotatably attached to the substrate 1 via pins 1b and 1c. FIG. 4 shows an embodiment of the drive unit of the opening and closing blade units 3 and 5. As shown in FIG. 4, the driving unit mainly includes an opening lever 3 for rotating each blade arm of the opening and closing blade units 3 and 5.
0, a closing lever 50, a set lever 60 for setting the opening lever 30 and the closing lever 50 to a predetermined set position shown in the figure, and an opening lever 30 and a closing lever 5
It is composed of electromagnets 40 and 80 for controlling 0 respectively.

【0013】開放レバー30及び閉鎖レバー50はそれ
ぞれ駆動バネ31及び51によって軸32、52を中心
として左旋するように付勢されており、この駆動バネ3
1、51のばね力を調整することによりシャッタ羽根の
速度を調整することができる。セットレバー60は、バ
ネ61によって軸62を中心として右旋するように付勢
されているが、セット動作時にはカメラのチャージ部材
90によって駆動され左旋する。また、電磁石40、8
0はその鉄芯41、81がそれぞれ開放レバー30及び
閉鎖レバー50の鉄片34、54と吸着或いは非吸着状
態となることによって、開放レバー30及び閉鎖レバー
50の作動を制御する。
The opening lever 30 and the closing lever 50 are urged by drive springs 31 and 51 to rotate leftward about shafts 32 and 52, respectively.
The speed of the shutter blades can be adjusted by adjusting the spring forces of 1, 51. The set lever 60 is urged by a spring 61 to turn clockwise about a shaft 62. However, during the setting operation, the set lever 60 is driven by a charging member 90 of the camera to turn counterclockwise. Also, the electromagnets 40, 8
Reference numeral 0 controls the operation of the opening lever 30 and the closing lever 50 when the iron cores 41 and 81 are in the suction state or the non-suction state with the iron pieces 34 and 54 of the opening lever 30 and the closing lever 50, respectively.

【0014】このような駆動部はセット動作時には、セ
ットレバー60が左旋し、その突起60a、60bによ
って開放レバー30及び閉鎖レバー50の各ローラ3
3、53を押圧し、開放レバー30及び閉鎖レバー50
を右旋させる。これにより開放レバー30及び閉鎖レバ
ー50にそれぞれ固定された鉄片34、54は電磁石4
0、80の鉄芯41、81に圧接し、図示しないカメラ
側の電気回路によって電磁石40、80が励磁される
と、閉鎖レバー30及び開放レバー50の鉄片34、5
4が、それぞれ電磁石40、80の鉄芯41、81に吸
着される。
In such a driving section, the set lever 60 is rotated leftward during the setting operation, and the rollers 3 of the opening lever 30 and the closing lever 50 are moved by the projections 60a and 60b.
3 and 53, the opening lever 30 and the closing lever 50 are pressed.
Turn clockwise. As a result, the iron pieces 34 and 54 fixed to the opening lever 30 and the closing lever 50 respectively
When the electromagnets 40 and 80 are excited by an electric circuit (not shown) on the camera cores 41 and 81, the iron pieces 34 and 5 of the closing lever 30 and the opening lever 50 are pressed.
4 is attracted to the iron cores 41, 81 of the electromagnets 40, 80, respectively.

【0015】シャッタ開口1aの下端では、基板1の板
厚が受板側に厚いために開放羽根ユニット3のシャッタ
羽根3aが従来のシャッタに比べ受板7方向に押される
ことになり、閉鎖羽根ユニット5のシャッタ羽根5aと
の光軸方向の距離が近くなる。またシャッタ開口7aの
上端では、受板7の板厚が基板側に厚いため閉鎖ユニッ
ト5のシャッタ羽根5aが従来のシャッタに比べ基板1
方向に押されることになる。
At the lower end of the shutter opening 1a, the shutter blades 3a of the open blade unit 3 are pushed in the direction of the receiving plate 7 as compared with the conventional shutter, because the thickness of the substrate 1 is thicker on the receiving plate side. The distance of the unit 5 from the shutter blades 5a in the optical axis direction becomes shorter. At the upper end of the shutter opening 7a, since the thickness of the receiving plate 7 is larger on the substrate side, the shutter blades 5a of the closing unit 5
Direction.

【0016】以上のような構成におけるシャッタの動作
を次に説明する。図4の状態でシャッタレリーズ操作を
行なうと、まず電磁石40、80が励磁され、開放閉鎖
レバー30、50が鉄片34、54を介して電磁石4
0、80に吸着される。カメラのチャージ部材90が退
避するとセットレバー60はバネ61によって右旋す
る。その後電磁石40、80が消磁され開放レバー30
が左旋することにより、開放羽根ユニット3のシャッタ
羽根3a、3b、3c、3d、3eが上端へ移動してシ
ャッタ開口1aを開放し始める。
The operation of the shutter having the above configuration will be described below. When the shutter release operation is performed in the state of FIG. 4, the electromagnets 40 and 80 are first excited, and the open / close levers 30 and 50 are moved through the iron pieces 34 and 54 to the electromagnets 4 and 54.
It is adsorbed at 0 and 80. When the charging member 90 of the camera is retracted, the set lever 60 is turned clockwise by the spring 61. Thereafter, the electromagnets 40 and 80 are demagnetized and the release lever 30 is released.
Makes a left turn, the shutter blades 3a, 3b, 3c, 3d, 3e of the opening blade unit 3 move to the upper end and start opening the shutter opening 1a.

【0017】所定時間経過後に電磁石80が消磁され閉
鎖レバー50が左旋することにより、閉鎖羽根ユニット
5のシャッタ羽根5a、5b、5c、5dが図2中上端
へ移動する。そして基板1の板厚が徐々に薄くなると共
に、開放羽根ユニット3が積層して折り畳まれて行くの
でシャッタ羽根3aは撮影レンズ12方向に移動する。
それによって開放羽根ユニット3のシャッタ羽根3aと
閉鎖羽根ユニット5のシャッタ羽根5aとの光軸方向の
距離が徐々に遠くなっていく。このとき開放羽根ユニッ
ト3のシャッタ羽根3aの後端Pと閉鎖羽根ユニット5
のシャッタ羽根5aの先端Qとでスリットが形成され
る。この構成を説明したのが図5である。
After a lapse of a predetermined time, the electromagnet 80 is demagnetized and the closing lever 50 turns left, so that the shutter blades 5a, 5b, 5c and 5d of the closing blade unit 5 move to the upper end in FIG. Then, the thickness of the substrate 1 gradually decreases, and the open blade units 3 are stacked and folded, so that the shutter blade 3a moves toward the photographing lens 12.
As a result, the distance in the optical axis direction between the shutter blade 3a of the open blade unit 3 and the shutter blade 5a of the closed blade unit 5 gradually increases. At this time, the rear end P of the shutter blade 3a of the open blade unit 3 and the closed blade unit 5
A slit is formed with the front end Q of the shutter blade 5a. FIG. 5 illustrates this configuration.

【0018】図5に示すように開放と閉鎖の羽根ユニッ
ト3、5が下端から上端へと移動するに際し、下端部に
おいては開放羽根ユニット3と閉鎖羽根ユニット5のス
リットを形成する羽根3a、5a相互の光軸方向の間隔
が狭く、平行光線での露光範囲L3と斜光線での露光範
囲D3との差は少ない。一方、上端部においても開放羽
根ユニット3と閉鎖羽根ユニット5のスリットを形成す
る羽根相互の光軸方向の間隔は狭く、平行光線での露光
範囲L4と斜光線での露光範囲D4との差も少ない。従
ってL3/D3とL4/D4の差は少なく、シャッタ開
口1aへの下端と上端との露光量の差が減少する。
As shown in FIG. 5, when the open and closed blade units 3 and 5 move from the lower end to the upper end, at the lower end, blades 3a and 5a forming slits of the open blade unit 3 and the closed blade unit 5 are formed. The interval in the optical axis direction is small, and the difference between the exposure range L3 for parallel rays and the exposure range D3 for oblique rays is small. On the other hand, also at the upper end, the interval between the blades forming the slits of the open blade unit 3 and the closed blade unit 5 in the optical axis direction is small, and the difference between the exposure range L4 for parallel rays and the exposure range D4 for oblique rays is also small. Few. Therefore, the difference between L3 / D3 and L4 / D4 is small, and the difference between the lower and upper exposure amounts to the shutter opening 1a is reduced.

【0019】また、シャッタ開口の上端から下端へと走
行し、基板1側に開放羽根ユニット3が載置され、受板
7側に閉鎖羽根ユニット5が載置されている形式のシャ
ッタに関しては、基板1の上端から下端へと板厚を徐々
に薄くし、受板7の上端から下端へと板厚を徐々に厚く
すればよい。更に、シャッタ開口の上端から下端へと走
行し、基板1側に閉鎖羽根ユニット3が載置され、受板
7側に開放羽根ユニット5が載置されている形式のシャ
ッタに関しては、基板1の上端から下端へと板厚を徐々
に厚くし、受板7の上端から下端へと板厚を徐々に薄く
すればよいし、シャッタ開口の下端から上端へと走行
し、基板1側に閉鎖羽根ユニット3が載置され、受板7
側に開放羽根ユニット5が載置されている形式のシャッ
タに関しては、基板1の下端から上端へと板厚を徐々に
厚くし、受板7の下端から上端へと板厚を徐々に厚くす
ればよい。また、前記の各実施例では基板1の板厚と受
板7の板厚の両方を変えたが片方だけでよいことは言う
までもない。
A shutter which travels from the upper end to the lower end of the shutter opening, the open blade unit 3 is mounted on the substrate 1 side, and the closed blade unit 5 is mounted on the receiving plate 7 side, The thickness of the substrate 1 may be gradually reduced from the upper end to the lower end, and the thickness of the receiving plate 7 may be gradually increased from the upper end to the lower end. Further, the shutter travels from the upper end to the lower end of the shutter opening, the closing blade unit 3 is mounted on the substrate 1 side, and the open blade unit 5 is mounted on the receiving plate 7 side. The thickness may be gradually increased from the upper end to the lower end, and the thickness may be gradually decreased from the upper end to the lower end of the receiving plate 7. The unit 3 is placed and the receiving plate 7
As for the shutter of the type in which the open blade unit 5 is placed on the side, the plate thickness is gradually increased from the lower end to the upper end of the substrate 1 and the plate thickness is gradually increased from the lower end to the upper end of the receiving plate 7. I just need. Further, in each of the above embodiments, both the plate thickness of the substrate 1 and the plate thickness of the receiving plate 7 are changed, but it is needless to say that only one of them is required.

【0020】[0020]

【発明の効果】本発明の構成によれば、羽根ユニットが
シャッタ開口を上下に走行するフォーカルプレーンシャ
ッタにおいて、露出開始近傍の開放羽根ユニットの羽根
走行空間を受板側に狭くし開放及び閉鎖羽根スリットの
相互の光軸方向の距離を短縮して、斜め光と平行光の差
を少なくしてある。従って撮影レンズを通してのフィル
ムへの露光量が略均一になり、露光量ムラの少ない写真
を得ることができる。
According to the construction of the present invention, in a focal plane shutter in which the blade unit runs up and down the shutter opening, the blade running space of the open blade unit near the start of exposure is narrowed to the receiving plate side to open and close the blade. The difference between the oblique light and the parallel light is reduced by shortening the distance between the slits in the optical axis direction. Therefore, the exposure amount to the film through the photographing lens becomes substantially uniform, and a photograph with less exposure amount unevenness can be obtained.

【図面の簡単な説明】[Brief description of the drawings]

【図1】本発明に係るフォーカルプレーンシャッタの一
実施例を示す分解斜視図
FIG. 1 is an exploded perspective view showing an embodiment of a focal plane shutter according to the present invention.

【図2】本発明に係るフォーカルプレーンシャッタの一
実施例を示す側面図
FIG. 2 is a side view showing one embodiment of a focal plane shutter according to the present invention.

【図3】図1のシャッタ羽根を示す正面図FIG. 3 is a front view showing the shutter blade of FIG. 1;

【図4】シャッタ駆動部の一実施例を示す正面図FIG. 4 is a front view showing an embodiment of a shutter driving unit.

【図5】本発明の一実施例による構成説明図FIG. 5 is a diagram illustrating a configuration according to an embodiment of the present invention;

【図6】従来のシャッタを示す側面図FIG. 6 is a side view showing a conventional shutter.

【図7】従来のシャッタの構成説明図FIG. 7 is a diagram illustrating a configuration of a conventional shutter.

【符号の説明】[Explanation of symbols]

1 基板 3 開放羽根ユニット 3a、3b、3c、3d、3e 開放シャッタ羽根 5 閉鎖羽根ユニット 5a、5b、5c、5d 閉鎖シャッタ羽根 7 受板 DESCRIPTION OF SYMBOLS 1 Substrate 3 Open blade unit 3a, 3b, 3c, 3d, 3e Open shutter blade 5 Closed blade unit 5a, 5b, 5c, 5d Closed shutter blade 7 Receiving plate

───────────────────────────────────────────────────── フロントページの続き (72)発明者 高橋 邦▲隆▼ 千葉県四街道市鹿渡934−13番地 株式会 社精工舎千葉事業所内 ──────────────────────────────────────────────────続 き Continuing on the front page (72) Kuni Takahashi, inventor 934-13 Shiwatari, Yokkaido, Chiba Pref.

Claims (3)

【特許請求の範囲】[Claims] 【請求項1】 シャッタ開口を有する基板と、前記シャ
ッタ開口を開閉する開放及び閉鎖羽根ユニットと、前記
各羽根ユニットの走行空間を前記基板との間に構成する
受板とを有し、前記開放又は閉鎖羽根ユニットが前記シ
ャッタ開口を閉鎖する位置では、前記一方の羽根ユニッ
トのスリット形成羽根が、他方の羽根ユニットに光軸方
向に近づくように前記基板又は前記受板を徐々に厚くし
てあることを特徴とするフォーカルプレーンシャッタ。
An opening and closing blade unit for opening and closing the shutter opening; and a receiving plate for defining a travel space of each blade unit between the substrate and the substrate. Alternatively, at the position where the closing blade unit closes the shutter opening, the substrate or the receiving plate is gradually thickened so that the slit forming blade of the one blade unit approaches the other blade unit in the optical axis direction. A focal plane shutter, characterized in that:
【請求項2】 シャッタ開口の下端部を光軸方向且つ受
板側に徐々に厚い前記基板とシャッタ開口の上端部を光
軸方向且つ基板側に徐々に厚い前記受板とのいずれか一
方又は双方を有している請求項1記載のフォーカルプレ
ーンシャッタ。
2. The substrate, wherein the lower end of the shutter opening is gradually thicker in the optical axis direction and on the receiving plate side, and / or the upper end of the shutter opening is gradually thicker in the optical axis direction and on the substrate side. 2. The focal plane shutter according to claim 1, comprising both.
【請求項3】 シャッタ開口の上端部を光軸方向且つ受
板側に徐々に厚い前記基板とシャッタ開口の下端部を光
軸方向且つ基板側に徐々に厚い前記受板とのいずれか一
方又は双方を有している請求項1記載のフォーカルプレ
ーンシャッタ。
3. The substrate in which the upper end of the shutter opening is gradually thicker in the optical axis direction on the receiving plate side and / or the lower end of the shutter opening is gradually thicker in the optical axis direction on the substrate side. 2. The focal plane shutter according to claim 1, comprising both.
JP02382499A 1999-02-01 1999-02-01 Focal plane shutter Expired - Fee Related JP3224786B2 (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP02382499A JP3224786B2 (en) 1999-02-01 1999-02-01 Focal plane shutter

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP02382499A JP3224786B2 (en) 1999-02-01 1999-02-01 Focal plane shutter

Publications (2)

Publication Number Publication Date
JPH11265010A true JPH11265010A (en) 1999-09-28
JP3224786B2 JP3224786B2 (en) 2001-11-05

Family

ID=12121120

Family Applications (1)

Application Number Title Priority Date Filing Date
JP02382499A Expired - Fee Related JP3224786B2 (en) 1999-02-01 1999-02-01 Focal plane shutter

Country Status (1)

Country Link
JP (1) JP3224786B2 (en)

Families Citing this family (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP4317237B2 (en) 2007-03-27 2009-08-19 セイコープレシジョン株式会社 Focal plane shutter

Also Published As

Publication number Publication date
JP3224786B2 (en) 2001-11-05

Similar Documents

Publication Publication Date Title
US7384204B2 (en) Electronic camera
JPH11265010A (en) Focal plane shutter
CN100580543C (en) Electronic camera
JP4060671B2 (en) Focal plane shutter for camera
JP3220823B2 (en) Blade support device for focal plane shutter for camera
JPH0687943U (en) Focal plane shutter
JP3584270B2 (en) Shutter device
JP2505416Y2 (en) Driving device for optical path opening / closing device for photography
JP2003344898A (en) Focal plane shutter for camera
JP2003005253A (en) Shutter device, camera and image display device
JP4386995B2 (en) Focal plane shutter for camera
JP3094253B2 (en) Focal plane shutter and driving method thereof
JP2799876B2 (en) Focal plane shutter
JPH03288835A (en) camera
JP2592209Y2 (en) Drive mechanism of focal plane shutter
JP5130607B2 (en) Electronic camera
JP2965945B2 (en) Shutter device
JP2018205761A (en) Focal plane shutter unit and imaging device
US3735684A (en) Reflex camera with means to reduce mirror rebound
JP4882267B2 (en) Shading device and electronic camera
JP3500170B2 (en) Flash tuning device for camera with variable frame size device
JP3473981B2 (en) instant camera
JP2002311499A (en) Movable mirror frame for focusing
JPH08665Y2 (en) Shutter drive device for automatic focusing camera
JP3448343B2 (en) Focal plane shutter

Legal Events

Date Code Title Description
FPAY Renewal fee payment (prs date is renewal date of database)

Year of fee payment: 7

Free format text: PAYMENT UNTIL: 20080824

FPAY Renewal fee payment (prs date is renewal date of database)

Year of fee payment: 8

Free format text: PAYMENT UNTIL: 20090824

FPAY Renewal fee payment (prs date is renewal date of database)

Year of fee payment: 8

Free format text: PAYMENT UNTIL: 20090824

FPAY Renewal fee payment (prs date is renewal date of database)

Free format text: PAYMENT UNTIL: 20100824

Year of fee payment: 9

FPAY Renewal fee payment (prs date is renewal date of database)

Free format text: PAYMENT UNTIL: 20100824

Year of fee payment: 9

FPAY Renewal fee payment (prs date is renewal date of database)

Free format text: PAYMENT UNTIL: 20110824

Year of fee payment: 10

FPAY Renewal fee payment (prs date is renewal date of database)

Year of fee payment: 10

Free format text: PAYMENT UNTIL: 20110824

FPAY Renewal fee payment (prs date is renewal date of database)

Free format text: PAYMENT UNTIL: 20120824

Year of fee payment: 11

LAPS Cancellation because of no payment of annual fees