JPH11268904A - Method for synthesizing compound semiconductor polycrystal and compound semiconductor polycrystal synthesized by the method - Google Patents

Method for synthesizing compound semiconductor polycrystal and compound semiconductor polycrystal synthesized by the method

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Publication number
JPH11268904A
JPH11268904A JP36905198A JP36905198A JPH11268904A JP H11268904 A JPH11268904 A JP H11268904A JP 36905198 A JP36905198 A JP 36905198A JP 36905198 A JP36905198 A JP 36905198A JP H11268904 A JPH11268904 A JP H11268904A
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JP
Japan
Prior art keywords
group
compound semiconductor
ampoule
synthesis
polycrystal
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JP36905198A
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Japanese (ja)
Other versions
JP3443766B2 (en
Inventor
Toshiyuki Kanazawa
利幸 金澤
Ryuichi Hirano
立一 平野
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Eneos Corp
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Japan Energy Corp
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Publication of JPH11268904A publication Critical patent/JPH11268904A/en
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Abstract

(57)【要約】 【構成】 アンプルの一端に原料のIII族元素を載せた
ボートを、また他端に原料のV族元素を入れて真空封止
し、このアンプル全体を加熱するとともに、上記ボート
を局部的にさらに高い温度に加熱してボート内でIII族
元素と上記V族元素から発生したV族元素蒸気とを反応
させ、徐々に上記高温部を相対移動させながらIII−V
族化合物半導体多結晶を合成する多結晶合成方法におい
て、合成初期においては上記アンプルの相対移動を合成
中期に比べて低速で行なうようにした。 【効果】 アンプルとヒータとを相対移動させたときに
温度のピーク位置がずれるのを防止することができ、こ
れによってV族元素の供給を合成速度に合致させること
ができ、始端部から終端部まで広い範囲にわたって組成
がストイキオメトリーである多結晶を合成することがで
きる。
(57) [Summary] [Constitution] A boat in which a raw material of a group III element is placed at one end of an ampoule and a raw material of a group V element is placed at the other end and vacuum sealed. The boat is locally heated to a higher temperature to cause the group III element to react with the group V element vapor generated from the group V element in the boat, and the III-V is gradually moved while relatively moving the high temperature section.
In a polycrystalline synthesis method for synthesizing a group III compound semiconductor polycrystal, the relative movement of the ampule is performed at a lower speed in the initial stage of the synthesis than in the middle stage of the synthesis. [Effect] When the ampoule and the heater are relatively moved, the peak position of the temperature can be prevented from being shifted, whereby the supply of the group V element can be matched with the synthesis speed, and the start end to the end end can be adjusted. Polycrystals whose composition is stoichiometric over a wide range can be synthesized.

Description

【発明の詳細な説明】DETAILED DESCRIPTION OF THE INVENTION

【0001】[0001]

【産業上の利用分野】本発明は化合物半導体多結晶の合
成技術に関し、例えばInP多結晶を合成する場合に利
用して効果のある技術に関する。
BACKGROUND OF THE INVENTION 1. Field of the Invention The present invention relates to a technique for synthesizing a compound semiconductor polycrystal, and more particularly to a technique effective for synthesizing an InP polycrystal.

【0002】[0002]

【従来の技術】従来、化合物半導体デバイスの材料とし
て使用されるInPは、原料のIn(インジウム)とP
(リン)を直接反応させて単結晶を成長させることが困
難であるため、まず多結晶を合成してこの合成多結晶を
用いてLEC法等により単結晶を成長させることが行な
われている。上記InP多結晶の合成方法の一つに、図
1に示すような合成装置を用いて行なう方法がある。
2. Description of the Related Art Conventionally, InP used as a material for a compound semiconductor device is composed of raw materials In (indium) and P (indium).
Since it is difficult to grow a single crystal by directly reacting (phosphorus), first, a polycrystal is synthesized, and a single crystal is grown by the LEC method or the like using the synthesized polycrystal. As one of the methods for synthesizing the above-mentioned InP polycrystal, there is a method using a synthesizing apparatus as shown in FIG.

【0003】この合成方法は、一端に原料となるインジ
ウムの入ったボート2を、また他端にリン塊3を載置し
て真空封入した石英製アンプル1を合成炉(ヒータ)4
内に設置し、ヒータ4により図2に示すごとくボート側
が800℃、リン塊側が540℃となり、その中間に1
100℃のような温度ピークを有する温度分布を形成
し、アンプル1とヒータ4とを相対移動させてボート内
のインジウムにリン蒸気を供給して反応させ、ボートの
一端から他端に向けて徐々にInP単結晶を成長させて
行くというものである。なお、図1において、5は対流
によるアンプル内の温度の均一化を防止して温度変化の
急峻な図2のごとき温度分布を形成し易くするための遮
熱体である。
In this synthesis method, a quartz ampule 1 in which a boat 2 containing indium as a raw material is placed at one end and a phosphorus lump 3 is placed at the other end and vacuum-sealed is placed in a synthesis furnace (heater) 4.
As shown in FIG. 2, the temperature of the boat is 800 ° C. and the temperature of the phosphorus mass is 540 ° C.
A temperature distribution having a temperature peak such as 100 ° C. is formed, and the ampoule 1 and the heater 4 are relatively moved to supply phosphorus vapor to the indium in the boat and react, and gradually from one end of the boat to the other end. Then, an InP single crystal is grown. In FIG. 1, reference numeral 5 denotes a heat shield for preventing the temperature in the ampoule from being equalized by convection and facilitating formation of a temperature distribution as shown in FIG.

【0004】[0004]

【発明が解決しようとする課題】しかしながら、上記従
来の多結晶合成法にあっては、固化率の低いときの合成
部分すなわち最初に結晶化した部分の組成(In/P
比)がストイキオメトリー(化学量論比)から外れ、イ
ンジウムの比率が高いインジウム・リッチの状態になり
易い。また、合成多結晶の終端部がインジウム・リッチ
になることもあった。このようなインジウム・リッチの
部分を含む多結晶を原料として単結晶を成長させると、
マイクロツイン(あるいはラメラツイン)と呼ばれる欠
陥が生じ、良質の単結晶が得られなくなるため、従来イ
ンジウム・リッチである合成多結晶の始端部や終端部は
カットせざるを得なかった。そのため、原料の無駄が多
くなり、生産性が低下するという問題点があることが明
かになった。
However, in the above-mentioned conventional polycrystal synthesis method, the composition (In / P
Ratio) deviates from stoichiometry (stoichiometric ratio) and tends to be in an indium-rich state with a high indium ratio. In some cases, the terminal portion of the synthetic polycrystal became indium-rich. When a single crystal is grown from a polycrystal containing such an indium-rich portion,
A defect called a micro-twin (or lamella twin) occurs, and a high-quality single crystal cannot be obtained. Therefore, the start and end portions of a conventional indium-rich synthetic polycrystal have to be cut. Therefore, it has been clarified that there is a problem that the waste of the raw material increases and the productivity decreases.

【0005】本発明は、上記のような問題点に着目して
なされたもので、その目的とするところは、始端部から
終端部まで広い範囲にわたって組成がストイキオメトリ
ーであるIII−V族化合物半導体多結晶を合成すること
ができる多結晶合成方法を提供することにある。
The present invention has been made in view of the above-mentioned problems, and an object of the present invention is to provide a group III-V compound having a stoichiometric composition over a wide range from the beginning to the end. An object of the present invention is to provide a polycrystal synthesis method capable of synthesizing a semiconductor polycrystal.

【0006】[0006]

【課題を解決するための手段】上記目的を達成するため
に、本発明者らは、まず合成InP多結晶の始端部がイ
ンジウム・リッチになる原因について解析、考察を行な
った。
Means for Solving the Problems In order to achieve the above object, the present inventors first analyzed and considered the cause of the start of synthetic InP polycrystal becoming indium-rich.

【0007】その結果、上記従来方法ではアンプルとヒ
ータとを相対移動させているが、そのとき温度のピーク
位置がアンプルの移動方向と逆の方向へ移動しているこ
とを見出した。図3に、本発明者らが行なった実験によ
り得られたアンプルの移動量と温度のピーク位置のずれ
との関係を示す。ただし、この実験はアンプルをヒータ
に対して等速度で移動させたときのものである。
As a result, it has been found that in the above-described conventional method, the ampule and the heater are relatively moved, but at that time, the temperature peak position is moved in a direction opposite to the moving direction of the ampule. FIG. 3 shows the relationship between the displacement of the ampoule and the deviation of the temperature peak position obtained by an experiment conducted by the present inventors. In this experiment, however, the ampule was moved at a constant speed with respect to the heater.

【0008】上記のように温度のピーク位置がアンプル
の移動方向と逆の方向へ移動すると、アンプルとヒータ
との相対的な移動速度が速くなるため、リンの供給が合
成速度に追い付かなくなってしまい、その結果、合成多
結晶の始端部がインジウム・リッチになるとの結論に達
した。また、合成多結晶の終端部がインジウム・リッチ
になるのは、合成の末期時にはリン原料塊が当初よりも
小さくなっているため、リンの昇華量が減少するためで
あると考えた。
When the peak position of the temperature moves in the direction opposite to the moving direction of the ampoule as described above, the relative moving speed between the ampoule and the heater increases, so that the supply of phosphorus cannot keep up with the synthesis speed. As a result, it was concluded that the beginning of the synthetic polycrystal became indium-rich. In addition, it was considered that the reason why the terminal portion of the synthetic polycrystal became indium-rich was that at the end of the synthesis, the amount of phosphorus sublimation was reduced because the phosphorus raw material mass was smaller than the initial mass.

【0009】なお、上記のように温度のピーク位置が移
動する理由は、アンプル内の熱容量はインジウムの入っ
ているボート側の方がリン側よりも大きくなっているた
め、熱容量の大きなボートが温度のピーク位置側に近づ
くことによってピーク位置がボート側へずれるためであ
ると考えられる。
The reason why the temperature peak position shifts as described above is that the heat capacity in the ampoule is larger on the boat side containing indium than on the phosphorus side, so that the boat having a large heat capacity is It is considered that the peak position shifts to the boat side when approaching the peak position side.

【0010】そこで、本発明者らは合成開始初期および
合成終了時のアンプルとヒータとの相対的な移動速度を
遅くすれば、温度のピーク位置がずれるのを防止して合
成多結晶の始端部や終端部がインジウム・リッチになる
のを回避することができるのではないかと考え、種々の
実験を行なった。その結果、上記移動速度の制御により
始端部から終端部まで広い範囲にわたって組成がストイ
キオメトリーである多結晶を合成することができること
を見出した。
[0010] Therefore, the present inventors, by reducing the relative movement speed between the ampoule and the heater at the beginning of the synthesis and at the end of the synthesis, to prevent the temperature peak position from shifting, and to prevent the starting point of the synthetic polycrystal from shifting. Various experiments were carried out on the assumption that it would be possible to avoid the indium-rich portion and the terminal portion from becoming indium-rich. As a result, it has been found that a polycrystal having a stoichiometric composition can be synthesized over a wide range from the beginning to the end by controlling the moving speed.

【0011】この発明は、上記のような知見に基づいて
なされたもので、アンプルの一端に原料のIII族元素を
載せたボートを、当該ボートの他端に原料のV族元素を
入れて真空封止し、このアンプル全体を加熱するととも
に、上記ボートを局部的にさらに高い温度に加熱してボ
ート内でI上記II族元素と上記V族元素から発生したV
族元素蒸気とを反応させ、徐々に上記高温部を相対移動
させながらIII−V族化合物半導体多結晶を合成する多
結晶合成方法において、合成初期においては上記アンプ
ルの相対移動を合成中期に比べて低速で行なうようにし
たものである。
The present invention has been made on the basis of the above findings. A boat having a raw material of a group III element placed on one end of an ampoule and a raw material of a group V element placed on the other end of the boat is evacuated. The ampoule is sealed, and the whole ampoule is heated, and the boat is locally heated to a higher temperature so that V generated from the group I element and the group V element in the boat.
In the polycrystalline synthesis method of synthesizing a group III-V compound semiconductor polycrystal by reacting with the group element vapor and gradually moving the high temperature part relatively, the relative movement of the ampoule is compared with the relative movement of the ampoule in the early stage of the synthesis, This is done at low speed.

【0012】なお、合成末期における上記アンプルの相
対移動も合成中期に比べて低速で行なうようにすること
もできる。
[0012] The relative movement of the ampoule at the end of synthesis may be performed at a lower speed than in the middle of synthesis.

【0013】上記多結晶合成方法によれば、合成された
多結晶インゴットの固化率0〜85%、条件によっては
固化率0〜95%の範囲にわたって、その結晶組成比
(III族元素/(III族元素+V族元素))が、0.50
00±0.0001以内にあるIII−V族化合物半導体
多結晶を得ることができ、原料の無駄を無くし、生産性
を向上させることが期待できる。
According to the above-described polycrystalline synthesis method, the crystal composition ratio (group III element / (III)) of the synthesized polycrystalline ingot can be increased over a range from 0 to 85%, and depending on conditions, from 0 to 95%. Group element + group V element)) is 0.50
It is possible to obtain a group III-V compound semiconductor polycrystal within the range of 00 ± 0.0001, and it can be expected that waste of raw materials is eliminated and productivity is improved.

【0014】ここで、固化率85〜100%の部分を除
いたのは、固化率が高くなると偏析によって次第に不純
物がIII族元素融液中に濃縮されて、結晶終端部で不純
物濃度が高い多結晶が合成されてしまうためである。
The reason for removing the portion having a solidification rate of 85 to 100% is that the higher the solidification rate, the more the impurities are gradually concentrated in the group III element melt by segregation, and the higher the impurity concentration at the crystal termination part. This is because crystals are synthesized.

【0015】[0015]

【作用】上記した手段によれば、アンプルとヒータとを
相対移動させたときに温度のピーク位置がずれるのを防
止することができ、これによってV族元素の供給を合成
速度に合致させることができ、始端部から終端部まで広
い範囲にわたって組成がストイキオメトリーであるIII
−V族化合物半導体多結晶を合成することができる。
According to the above-mentioned means, it is possible to prevent the temperature peak position from being shifted when the ampoule and the heater are relatively moved, whereby the supply of the group V element can be matched with the synthesis speed. The composition is stoichiometric over a wide range from the beginning to the end III
-Group V compound semiconductor polycrystal can be synthesized.

【0016】また、合成末期における上記アンプルの相
対移動も合成中期に比べて低速に変更すれば、V族元素
の塊が次第に小さくなってもボート側に供給されるV族
元素の量が減少するのを防止することができ、さらに広
い範囲にわたって組成がストイキオメトリーであるIII
−V族化合物半導体多結晶を合成することができる。
Further, if the relative movement of the ampoule at the end of the synthesis is changed to a lower speed than that during the middle of the synthesis, the amount of the group V element supplied to the boat decreases even if the mass of the group V element becomes smaller gradually. And the composition is stoichiometric over a wider range III
-Group V compound semiconductor polycrystal can be synthesized.

【0017】[0017]

【実施例】(実施例1)図3に示されているような内径
75mm、外径80mmの円筒状石英製アンプル1を合
成用容器として用意し、このアンプル1の一端に重量
1.15kgの赤リンインゴット3を入れ、またアンプ
ル1の他端には3.9kgのインジウムを載せた長さ4
50mmのpBN製ボート2を載置した。また、アンプ
ル1の中央上記原料間には、複数の石英製円板が等間隔
で保持されてなる遮熱体5を入れてアンプル1内の対流
を防止できるようにして、アンプル1の開放端に石英製
のキャップを被せ、真空ポンプでアンプル1内を1×1
-6Torrにしてからキャップとアンプル1との間をバー
ナーを用いて真空封止した。
(Example 1) A cylindrical quartz ampoule 1 having an inner diameter of 75 mm and an outer diameter of 80 mm as shown in FIG. 3 was prepared as a synthesis vessel, and one end of the ampoule 1 having a weight of 1.15 kg was prepared. Put red phosphorus ingot 3 and the other end of ampule 1 with 3.9 kg of indium
A 50 mm pBN boat 2 was placed. In addition, a heat shield 5 in which a plurality of quartz disks are held at equal intervals is inserted between the raw materials in the center of the ampoule 1 so that convection inside the ampoule 1 can be prevented. With a quartz cap, and use a vacuum pump to
After the pressure was adjusted to 0 -6 Torr, the space between the cap and the ampule 1 was vacuum-sealed using a burner.

【0018】次に、上記アンプル1を合成炉(ヒータ)
4内に設置し、全体を室温から540℃まで2.5時間
かけて昇温した後、図2の温度分布を形成して1時間保
持した。それから、まずアンプル1を図1において右方
向へ4mm/時の速さで7.5時間(30mm)移動さ
せた後、アンプル1の移動速度を10mm/時の速さに
上げて、InP多結晶の合成を行なった。
Next, the ampoule 1 is placed in a synthesis furnace (heater).
After the temperature was raised from room temperature to 540 ° C. over 2.5 hours, the temperature distribution shown in FIG. 2 was formed and maintained for 1 hour. Then, after moving the ampoule 1 to the right in FIG. 1 at a speed of 4 mm / hour for 7.5 hours (30 mm), the moving speed of the ampoule 1 was increased to a speed of 10 mm / hour, and the InP polycrystal was moved. Was synthesized.

【0019】この実施例では、アンプルの移動を開始し
てから15mm移動したところで、多結晶が成長し始め
た。
In this embodiment, the polycrystal began to grow 15 mm after the ampoule began to move.

【0020】(実施例2)実施例1と同一の装置と同一
の条件で、InP多結晶の合成を行ない、アンプルが3
50mm移動したところで、アンプル1の移動速度を6
mm/時の速さに下げた。
(Example 2) InP polycrystal was synthesized under the same apparatus and conditions as in Example 1, and an ampoule was used.
After moving by 50 mm, the moving speed of the ampoule 1 becomes 6
mm / hr.

【0021】(比較例)実施例1と同一の装置と同一の
条件で、アンプル1の移動速度を合成中ずっと10mm
/時の一定速さに保ってInP多結晶の合成を行なっ
た。
(Comparative Example) The moving speed of the ampoule 1 was set to 10 mm during the synthesis under the same conditions as in the first embodiment.
The polycrystalline InP was synthesized at a constant speed of / h.

【0022】実施例1と実施例2および比較例で得られ
た合成InP多結晶の組成比In/InPを測定したと
ころ、図4に示すような結果が得られた。
When the composition ratio In / InP of the synthetic InP polycrystals obtained in Example 1, Example 2, and Comparative Example was measured, the result shown in FIG. 4 was obtained.

【0023】図4において、□印は実施例1で得られた
合成InP多結晶の組成比In/InPを例えば結晶イ
ンゴットの成長方向に沿ってプロットしたもの、○印は
比較例で得られた合成InP多結晶の組成比In/In
Pを多結晶インゴットの成長方向に沿ってプロットした
ものである。
In FIG. 4, the symbol □ indicates that the composition ratio In / InP of the synthetic InP polycrystal obtained in Example 1 was plotted, for example, along the growth direction of the crystal ingot, and the symbol ○ indicates the result obtained in the comparative example. Composition ratio In / In of synthetic InP polycrystal
P is plotted along the growth direction of the polycrystalline ingot.

【0024】これより、比較例で得られた合成InP多
結晶インゴットの組成比In/InPは、結晶の始端部
と終端部でそれぞれストイキオメトリーから大きくイン
ジウム・リッチ側にずれているのに対し、実施例1で得
られた合成InP多結晶インゴットは、始端部から34
0mm(固化率0〜85%)までずっと、組成比In/
InPが、0.5000±0.0001以内にあること
が分かった。
From the above, the composition ratio In / InP of the synthetic InP polycrystalline ingot obtained in the comparative example is largely shifted from the stoichiometry to the indium-rich side at the beginning and the end of the crystal, respectively. The synthetic InP polycrystalline ingot obtained in Example 1 was 34
0 mm (solidification rate 0-85%), the composition ratio In /
It was found that InP was within 0.5000 ± 0.0001.

【0025】実施例2で得られた合成InP多結晶イン
ゴットは、結晶の終端部でも組成比In/InPが、図
4に■印で示すように0.5000±0.0001以内
にあることが分かった。
In the synthetic InP polycrystalline ingot obtained in Example 2, the composition ratio In / InP may be within 0.5000 ± 0.0001 as shown by a mark in FIG. Do you get it.

【0026】なお、上記実施例では、一例として本発明
をInP多結晶の合成に適用した場合について説明した
が、この発明はそれに限定されるものでなく、GaP多
結晶等のIII−V族化合物半導体多結晶を合成する場合
に適用することができる。
In the above embodiment, the case where the present invention is applied to the synthesis of InP polycrystal has been described as an example. However, the present invention is not limited to this, and the present invention is not limited thereto. It can be applied when synthesizing a semiconductor polycrystal.

【0027】[0027]

【発明の効果】以上説明したようにこの発明は、アンプ
ルの一端に原料のIII族元素を載せたボートを、また他
端に原料のV族元素を入れて真空封止し、このアンプル
全体を加熱するとともに、上記ボートを局部的にさらに
高い温度に加熱してボート内でIII族元素と上記V族元
素から発生したV族元素蒸気とを反応させ、徐々に上記
高温部を相対移動させながらIII−V族化合物半導体多
結晶を合成する多結晶合成方法において、合成初期にお
いては上記アンプルの相対移動を合成中期に比べて低速
で行なうようにしたので、アンプルとヒータとを相対移
動させたときに温度のピーク位置がずれるのを防止する
ことができ、これによってV族元素の供給を合成速度に
合致させることができ、始端部から終端部まで広い範囲
にわたって組成がストイキオメトリーであるIII−V族
化合物半導体多結晶を合成することができる。その結
果、原料の無駄が少なくなり、生産性が向上する。
As described above, according to the present invention, a boat having a raw material of a group III element loaded on one end of an ampoule and a raw material of a group V element placed on the other end are vacuum-sealed, and the whole ampoule is sealed. While heating, the boat is locally heated to a higher temperature to cause the group III element and the group V element vapor generated from the group V element to react in the boat, while gradually moving the high temperature part relative to each other. In the polycrystalline synthesis method for synthesizing a III-V compound semiconductor polycrystal, the relative movement of the ampoule is performed at a lower speed in the initial stage of the synthesis than in the middle stage of the synthesis. The peak position of the temperature can be prevented from being shifted, so that the supply of the group V element can be matched with the synthesis rate, and the composition can be stored over a wide range from the beginning to the end. Can be synthesized III-V compound semiconductor polycrystalline is Ometori. As a result, waste of raw materials is reduced, and productivity is improved.

【0028】また、合成末期における上記アンプルの相
対移動も合成中期に比べて低速に変化させた場合には、
V族元素の塊が次第に小さくなってもボート側に供給さ
れるV族元素の量が減少するのを防止することができ、
さらに広い範囲にわたって組成がストイキオメトリーで
あるIII−V族化合物半導体多結晶を合成することがで
きるという効果がある。
When the relative movement of the ampoule at the end of synthesis is also changed at a lower speed than in the middle of synthesis,
Even if the lump of the group V element is gradually reduced, it is possible to prevent the amount of the group V element supplied to the boat from decreasing,
There is an effect that a III-V compound semiconductor polycrystal having a stoichiometric composition can be synthesized over a wider range.

【図面の簡単な説明】[Brief description of the drawings]

【図1】InP多結晶の合成炉の一例を示す断面図であ
る。
FIG. 1 is a cross-sectional view showing an example of an InP polycrystalline synthesis furnace.

【図2】InP多結晶の合成炉の温度分布の一例を示す
図である。
FIG. 2 is a diagram showing an example of a temperature distribution in an InP polycrystalline synthesis furnace.

【図3】アンプルの相対移動速度を合成中ずっと一定速
さに保った場合のアンプルの移動量と温度のピーク位置
のずれとの関係を示すグラフである。
FIG. 3 is a graph showing the relationship between the amount of ampoule movement and the deviation of the temperature peak position when the relative movement speed of the ampoule is kept constant during synthesis.

【図4】実施例1と2および比較例で得られた合成In
P多結晶の組成比In/InPの測定結果を示すグラフ
である。
FIG. 4 shows synthetic In obtained in Examples 1 and 2 and Comparative Example.
4 is a graph showing a measurement result of a composition ratio In / InP of P polycrystal.

【符号の説明】[Explanation of symbols]

1 アンプル 2 ボート 3 リン塊(赤リンインゴット) 4 ヒータ(合成炉) 5 遮熱板 DESCRIPTION OF SYMBOLS 1 Ampoule 2 Boat 3 Phosphorus lump (red phosphorus ingot) 4 Heater (synthesis furnace) 5 Heat shield plate

Claims (4)

【特許請求の範囲】[Claims] 【請求項1】 アンプルの一端に原料のIII族元素を載
せたボートを、当該ボートの他端に原料のV族元素を入
れて真空封止し、このアンプル全体を加熱するととも
に、上記ボートを局部的にさらに高い温度に加熱してボ
ート内でI上記II族元素と上記V族元素から発生したV
族元素蒸気とを反応させ、徐々に上記高温部を相対移動
させながらIII−V族化合物半導体多結晶を合成する多
結晶合成方法において、合成初期においては上記アンプ
ルの相対移動を合成中期に比べて低速で行なうようにし
たことを特徴とする化合物半導体多結晶の合成方法。
1. A boat in which a raw material of a group III element is placed at one end of an ampoule is vacuum-sealed by putting a raw material of a group V element into the other end of the boat, and the whole ampoule is heated and the boat is sealed. Locally heated to a higher temperature, and the V generated from the above-mentioned group II element and the above-mentioned group V element in the boat.
In the polycrystalline synthesis method of synthesizing a group III-V compound semiconductor polycrystal by reacting with the group element vapor and gradually moving the high temperature part relatively, the relative movement of the ampoule is compared with the relative movement of the ampoule in the early stage of the synthesis, A method for synthesizing a compound semiconductor polycrystal, wherein the method is performed at a low speed.
【請求項2】 合成末期における上記アンプルの相対移
動も合成中期に比べて低速で行なうようにしたことを特
徴とする請求項1記載の化合物半導体多結晶の合成方
法。
2. The method for synthesizing a compound semiconductor polycrystal according to claim 1, wherein the relative movement of the ampoule in the last stage of the synthesis is also performed at a lower speed than in the middle stage of the synthesis.
【請求項3】 請求項1または請求項2に記載の化合物
半導体多結晶の合成方法によって合成された化合物半導
体多結晶であって、多結晶インゴットの固化率0〜85
%の範囲にわたって、その結晶組成比(III族元素/(I
II族元素+V族元素))が、0.5000±0.000
1以内にあることを特徴とする化合物半導体多結晶。
3. A compound semiconductor polycrystal synthesized by the method for synthesizing a compound semiconductor polycrystal according to claim 1 or 2, wherein the solidification rate of the polycrystal ingot is 0 to 85.
% Of the crystal composition ratio (Group III element / (I
Group II element + Group V element)) is 0.5000 ± 0.000
A compound semiconductor polycrystal, which is within 1.
【請求項4】 請求項1または請求項2に記載の化合物
半導体多結晶の合成方法によって合成された化合物半導
体多結晶であって、多結晶インゴットの固化率0〜95
%の範囲にわたって、その結晶組成比(III族元素/(I
II族元素+V族元素))が、0.5000±0.000
1以内にあることを特徴とする化合物半導体多結晶。
4. A compound semiconductor polycrystal synthesized by the method for synthesizing a compound semiconductor polycrystal according to claim 1 or 2, wherein the solidification rate of the polycrystal ingot is 0 to 95.
% Of the crystal composition ratio (Group III element / (I
Group II element + Group V element)) is 0.5000 ± 0.000
A compound semiconductor polycrystal, which is within 1.
JP36905198A 1998-12-25 1998-12-25 Method for synthesizing compound semiconductor polycrystal Expired - Lifetime JP3443766B2 (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP36905198A JP3443766B2 (en) 1998-12-25 1998-12-25 Method for synthesizing compound semiconductor polycrystal

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP36905198A JP3443766B2 (en) 1998-12-25 1998-12-25 Method for synthesizing compound semiconductor polycrystal

Related Parent Applications (1)

Application Number Title Priority Date Filing Date
JP2673193A Division JPH06239699A (en) 1993-02-16 1993-02-16 Compound semiconductor polycrystal and method for synthesizing the same

Publications (2)

Publication Number Publication Date
JPH11268904A true JPH11268904A (en) 1999-10-05
JP3443766B2 JP3443766B2 (en) 2003-09-08

Family

ID=18493440

Family Applications (1)

Application Number Title Priority Date Filing Date
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Country Status (1)

Country Link
JP (1) JP3443766B2 (en)

Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2007084366A (en) * 2005-09-21 2007-04-05 Showa Denko Kk Method for producing polycrystal of group iii-v compound semiconductor
EP2722420A2 (en) 2012-10-22 2014-04-23 Hitachi Metals, Ltd. Equipment and method for producing a compound polycrystal, and method for growing a compound single crystal

Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2007084366A (en) * 2005-09-21 2007-04-05 Showa Denko Kk Method for producing polycrystal of group iii-v compound semiconductor
EP2722420A2 (en) 2012-10-22 2014-04-23 Hitachi Metals, Ltd. Equipment and method for producing a compound polycrystal, and method for growing a compound single crystal

Also Published As

Publication number Publication date
JP3443766B2 (en) 2003-09-08

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