JPH11279112A - Production of aromatic dicarboxylic acid - Google Patents
Production of aromatic dicarboxylic acidInfo
- Publication number
- JPH11279112A JPH11279112A JP10081571A JP8157198A JPH11279112A JP H11279112 A JPH11279112 A JP H11279112A JP 10081571 A JP10081571 A JP 10081571A JP 8157198 A JP8157198 A JP 8157198A JP H11279112 A JPH11279112 A JP H11279112A
- Authority
- JP
- Japan
- Prior art keywords
- group
- aromatic
- acid
- compound
- mol
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
- 125000003118 aryl group Chemical group 0.000 title claims abstract description 42
- OFOBLEOULBTSOW-UHFFFAOYSA-N Malonic acid Chemical compound OC(=O)CC(O)=O OFOBLEOULBTSOW-UHFFFAOYSA-N 0.000 title claims description 15
- 238000004519 manufacturing process Methods 0.000 title claims description 6
- 150000001875 compounds Chemical class 0.000 claims abstract description 23
- 238000007254 oxidation reaction Methods 0.000 claims abstract description 22
- CWRYPZZKDGJXCA-UHFFFAOYSA-N acenaphthene Chemical compound C1=CC(CC2)=C3C2=CC=CC3=C1 CWRYPZZKDGJXCA-UHFFFAOYSA-N 0.000 claims abstract description 21
- -1 imide compound Chemical class 0.000 claims abstract description 21
- 230000003647 oxidation Effects 0.000 claims abstract description 17
- 239000003054 catalyst Substances 0.000 claims abstract description 14
- MYMOFIZGZYHOMD-UHFFFAOYSA-N Dioxygen Chemical compound O=O MYMOFIZGZYHOMD-UHFFFAOYSA-N 0.000 claims abstract description 12
- 229910001882 dioxygen Inorganic materials 0.000 claims abstract description 11
- 238000000034 method Methods 0.000 claims abstract description 10
- 125000003545 alkoxy group Chemical group 0.000 claims description 11
- 125000000217 alkyl group Chemical group 0.000 claims description 10
- 125000005843 halogen group Chemical group 0.000 claims description 9
- 125000002887 hydroxy group Chemical group [H]O* 0.000 claims description 9
- 125000004453 alkoxycarbonyl group Chemical group 0.000 claims description 7
- 125000000753 cycloalkyl group Chemical group 0.000 claims description 7
- 125000002252 acyl group Chemical group 0.000 claims description 6
- 125000003178 carboxy group Chemical group [H]OC(*)=O 0.000 claims description 5
- 230000001590 oxidative effect Effects 0.000 claims description 5
- 125000004435 hydrogen atom Chemical group [H]* 0.000 claims description 4
- ZBWXZZIIMVVCNZ-UHFFFAOYSA-N 4,5-dihydroacephenanthrylene Chemical compound C1=CC(CC2)=C3C2=CC2=CC=CC=C2C3=C1 ZBWXZZIIMVVCNZ-UHFFFAOYSA-N 0.000 claims description 3
- 125000006574 non-aromatic ring group Chemical group 0.000 claims description 3
- 125000004430 oxygen atom Chemical group O* 0.000 claims description 3
- KVFJBIQWENJTDM-UHFFFAOYSA-N 1,2-dihydrobenzo[j]aceanthrylene Chemical compound C1=CC2=CC=CC=C2C2=C1C(CCC1=CC=C3)=C1C3=C2 KVFJBIQWENJTDM-UHFFFAOYSA-N 0.000 claims description 2
- 125000004429 atom Chemical group 0.000 claims description 2
- QTBSBXVTEAMEQO-UHFFFAOYSA-N Acetic acid Chemical compound CC(O)=O QTBSBXVTEAMEQO-UHFFFAOYSA-N 0.000 abstract description 24
- QVGXLLKOCUKJST-UHFFFAOYSA-N atomic oxygen Chemical group [O] QVGXLLKOCUKJST-UHFFFAOYSA-N 0.000 abstract description 11
- 239000001301 oxygen Substances 0.000 abstract description 11
- 229910052760 oxygen Inorganic materials 0.000 abstract description 11
- HXGDTGSAIMULJN-UHFFFAOYSA-N acetnaphthylene Natural products C1=CC(C=C2)=C3C2=CC=CC3=C1 HXGDTGSAIMULJN-UHFFFAOYSA-N 0.000 abstract description 9
- CFMZSMGAMPBRBE-UHFFFAOYSA-N 2-hydroxyisoindole-1,3-dione Chemical compound C1=CC=C2C(=O)N(O)C(=O)C2=C1 CFMZSMGAMPBRBE-UHFFFAOYSA-N 0.000 abstract description 6
- HRRDCWDFRIJIQZ-UHFFFAOYSA-N naphthalene-1,8-dicarboxylic acid Chemical compound C1=CC(C(O)=O)=C2C(C(=O)O)=CC=CC2=C1 HRRDCWDFRIJIQZ-UHFFFAOYSA-N 0.000 abstract description 6
- 239000003960 organic solvent Substances 0.000 abstract description 3
- 239000002994 raw material Substances 0.000 abstract description 2
- 229920003002 synthetic resin Polymers 0.000 abstract description 2
- 239000000057 synthetic resin Substances 0.000 abstract description 2
- 150000001923 cyclic compounds Chemical class 0.000 abstract 2
- 229920001225 polyester resin Polymers 0.000 abstract 1
- 239000004645 polyester resin Substances 0.000 abstract 1
- 238000006243 chemical reaction Methods 0.000 description 15
- 239000002253 acid Substances 0.000 description 10
- 235000011054 acetic acid Nutrition 0.000 description 7
- XEEYBQQBJWHFJM-UHFFFAOYSA-N Iron Chemical compound [Fe] XEEYBQQBJWHFJM-UHFFFAOYSA-N 0.000 description 6
- JFDZBHWFFUWGJE-UHFFFAOYSA-N benzonitrile Chemical compound N#CC1=CC=CC=C1 JFDZBHWFFUWGJE-UHFFFAOYSA-N 0.000 description 6
- 150000003839 salts Chemical class 0.000 description 6
- 150000003949 imides Chemical class 0.000 description 5
- 239000011572 manganese Substances 0.000 description 5
- 229910052757 nitrogen Inorganic materials 0.000 description 5
- CURLTUGMZLYLDI-UHFFFAOYSA-N Carbon dioxide Chemical compound O=C=O CURLTUGMZLYLDI-UHFFFAOYSA-N 0.000 description 4
- 150000007513 acids Chemical class 0.000 description 4
- XBDQKXXYIPTUBI-UHFFFAOYSA-N dimethylselenoniopropionate Natural products CCC(O)=O XBDQKXXYIPTUBI-UHFFFAOYSA-N 0.000 description 4
- 229910052751 metal Inorganic materials 0.000 description 4
- BDAGIHXWWSANSR-UHFFFAOYSA-N methanoic acid Natural products OC=O BDAGIHXWWSANSR-UHFFFAOYSA-N 0.000 description 4
- 125000001624 naphthyl group Chemical group 0.000 description 4
- WEVYAHXRMPXWCK-UHFFFAOYSA-N Acetonitrile Chemical compound CC#N WEVYAHXRMPXWCK-UHFFFAOYSA-N 0.000 description 3
- UHOVQNZJYSORNB-UHFFFAOYSA-N Benzene Chemical compound C1=CC=CC=C1 UHOVQNZJYSORNB-UHFFFAOYSA-N 0.000 description 3
- WKBOTKDWSSQWDR-UHFFFAOYSA-N Bromine atom Chemical compound [Br] WKBOTKDWSSQWDR-UHFFFAOYSA-N 0.000 description 3
- ZAMOUSCENKQFHK-UHFFFAOYSA-N Chlorine atom Chemical compound [Cl] ZAMOUSCENKQFHK-UHFFFAOYSA-N 0.000 description 3
- XEKOWRVHYACXOJ-UHFFFAOYSA-N Ethyl acetate Chemical compound CCOC(C)=O XEKOWRVHYACXOJ-UHFFFAOYSA-N 0.000 description 3
- ZMXDDKWLCZADIW-UHFFFAOYSA-N N,N-Dimethylformamide Chemical compound CN(C)C=O ZMXDDKWLCZADIW-UHFFFAOYSA-N 0.000 description 3
- PXHVJJICTQNCMI-UHFFFAOYSA-N Nickel Chemical compound [Ni] PXHVJJICTQNCMI-UHFFFAOYSA-N 0.000 description 3
- MUBZPKHOEPUJKR-UHFFFAOYSA-N Oxalic acid Chemical compound OC(=O)C(O)=O MUBZPKHOEPUJKR-UHFFFAOYSA-N 0.000 description 3
- KDLHZDBZIXYQEI-UHFFFAOYSA-N Palladium Chemical compound [Pd] KDLHZDBZIXYQEI-UHFFFAOYSA-N 0.000 description 3
- GDTBXPJZTBHREO-UHFFFAOYSA-N bromine Substances BrBr GDTBXPJZTBHREO-UHFFFAOYSA-N 0.000 description 3
- 229910052794 bromium Inorganic materials 0.000 description 3
- 150000001732 carboxylic acid derivatives Chemical class 0.000 description 3
- 239000000460 chlorine Substances 0.000 description 3
- 229910052801 chlorine Inorganic materials 0.000 description 3
- KRVSOGSZCMJSLX-UHFFFAOYSA-L chromic acid Substances O[Cr](O)(=O)=O KRVSOGSZCMJSLX-UHFFFAOYSA-L 0.000 description 3
- KRKNYBCHXYNGOX-UHFFFAOYSA-N citric acid Chemical compound OC(=O)CC(O)(C(O)=O)CC(O)=O KRKNYBCHXYNGOX-UHFFFAOYSA-N 0.000 description 3
- 150000002148 esters Chemical class 0.000 description 3
- AWJWCTOOIBYHON-UHFFFAOYSA-N furo[3,4-b]pyrazine-5,7-dione Chemical compound C1=CN=C2C(=O)OC(=O)C2=N1 AWJWCTOOIBYHON-UHFFFAOYSA-N 0.000 description 3
- 239000002184 metal Substances 0.000 description 3
- 125000001570 methylene group Chemical group [H]C([H])([*:1])[*:2] 0.000 description 3
- 125000001997 phenyl group Chemical group [H]C1=C([H])C([H])=C(*)C([H])=C1[H] 0.000 description 3
- 239000002904 solvent Substances 0.000 description 3
- 125000000008 (C1-C10) alkyl group Chemical group 0.000 description 2
- GETTZEONDQJALK-UHFFFAOYSA-N (trifluoromethyl)benzene Chemical compound FC(F)(F)C1=CC=CC=C1 GETTZEONDQJALK-UHFFFAOYSA-N 0.000 description 2
- OSWFIVFLDKOXQC-UHFFFAOYSA-N 4-(3-methoxyphenyl)aniline Chemical compound COC1=CC=CC(C=2C=CC(N)=CC=2)=C1 OSWFIVFLDKOXQC-UHFFFAOYSA-N 0.000 description 2
- XKRFYHLGVUSROY-UHFFFAOYSA-N Argon Chemical compound [Ar] XKRFYHLGVUSROY-UHFFFAOYSA-N 0.000 description 2
- IJGRMHOSHXDMSA-UHFFFAOYSA-N Atomic nitrogen Chemical compound N#N IJGRMHOSHXDMSA-UHFFFAOYSA-N 0.000 description 2
- HEDRZPFGACZZDS-UHFFFAOYSA-N Chloroform Chemical compound ClC(Cl)Cl HEDRZPFGACZZDS-UHFFFAOYSA-N 0.000 description 2
- VEXZGXHMUGYJMC-UHFFFAOYSA-N Hydrochloric acid Chemical compound Cl VEXZGXHMUGYJMC-UHFFFAOYSA-N 0.000 description 2
- MHAJPDPJQMAIIY-UHFFFAOYSA-N Hydrogen peroxide Chemical compound OO MHAJPDPJQMAIIY-UHFFFAOYSA-N 0.000 description 2
- NBIIXXVUZAFLBC-UHFFFAOYSA-N Phosphoric acid Chemical compound OP(O)(O)=O NBIIXXVUZAFLBC-UHFFFAOYSA-N 0.000 description 2
- QAOWNCQODCNURD-UHFFFAOYSA-N Sulfuric acid Chemical compound OS(O)(=O)=O QAOWNCQODCNURD-UHFFFAOYSA-N 0.000 description 2
- DKGAVHZHDRPRBM-UHFFFAOYSA-N Tert-Butanol Chemical compound CC(C)(C)O DKGAVHZHDRPRBM-UHFFFAOYSA-N 0.000 description 2
- 125000002777 acetyl group Chemical group [H]C([H])([H])C(*)=O 0.000 description 2
- 150000008065 acid anhydrides Chemical class 0.000 description 2
- WNLRTRBMVRJNCN-UHFFFAOYSA-N adipic acid Chemical compound OC(=O)CCCCC(O)=O WNLRTRBMVRJNCN-UHFFFAOYSA-N 0.000 description 2
- 125000005577 anthracene group Chemical group 0.000 description 2
- YKYOUMDCQGMQQO-UHFFFAOYSA-L cadmium dichloride Chemical compound Cl[Cd]Cl YKYOUMDCQGMQQO-UHFFFAOYSA-L 0.000 description 2
- 239000001569 carbon dioxide Substances 0.000 description 2
- 229910002092 carbon dioxide Inorganic materials 0.000 description 2
- 150000001735 carboxylic acids Chemical class 0.000 description 2
- 239000003426 co-catalyst Substances 0.000 description 2
- 229910017052 cobalt Inorganic materials 0.000 description 2
- 239000010941 cobalt Substances 0.000 description 2
- GUTLYIVDDKVIGB-UHFFFAOYSA-N cobalt atom Chemical compound [Co] GUTLYIVDDKVIGB-UHFFFAOYSA-N 0.000 description 2
- 238000007796 conventional method Methods 0.000 description 2
- 239000010949 copper Substances 0.000 description 2
- 125000004093 cyano group Chemical group *C#N 0.000 description 2
- 125000000058 cyclopentadienyl group Chemical group C1(=CC=CC1)* 0.000 description 2
- 125000001153 fluoro group Chemical group F* 0.000 description 2
- 235000019253 formic acid Nutrition 0.000 description 2
- 125000000623 heterocyclic group Chemical group 0.000 description 2
- 150000002430 hydrocarbons Chemical group 0.000 description 2
- 239000011261 inert gas Substances 0.000 description 2
- PNDPGZBMCMUPRI-UHFFFAOYSA-N iodine Chemical compound II PNDPGZBMCMUPRI-UHFFFAOYSA-N 0.000 description 2
- 239000003446 ligand Substances 0.000 description 2
- 150000002736 metal compounds Chemical class 0.000 description 2
- 239000010955 niobium Substances 0.000 description 2
- 150000002825 nitriles Chemical class 0.000 description 2
- 125000000449 nitro group Chemical group [O-][N+](*)=O 0.000 description 2
- 150000007524 organic acids Chemical class 0.000 description 2
- BASFCYQUMIYNBI-UHFFFAOYSA-N platinum Chemical compound [Pt] BASFCYQUMIYNBI-UHFFFAOYSA-N 0.000 description 2
- 235000019260 propionic acid Nutrition 0.000 description 2
- IUVKMZGDUIUOCP-BTNSXGMBSA-N quinbolone Chemical compound O([C@H]1CC[C@H]2[C@H]3[C@@H]([C@]4(C=CC(=O)C=C4CC3)C)CC[C@@]21C)C1=CCCC1 IUVKMZGDUIUOCP-BTNSXGMBSA-N 0.000 description 2
- 239000010948 rhodium Substances 0.000 description 2
- 239000000758 substrate Substances 0.000 description 2
- 239000010936 titanium Substances 0.000 description 2
- JOXIMZWYDAKGHI-UHFFFAOYSA-N toluene-4-sulfonic acid Chemical compound CC1=CC=C(S(O)(=O)=O)C=C1 JOXIMZWYDAKGHI-UHFFFAOYSA-N 0.000 description 2
- 125000000027 (C1-C10) alkoxy group Chemical group 0.000 description 1
- BUXKULRFRATXSI-UHFFFAOYSA-N 1-hydroxypyrrole-2,5-dione Chemical compound ON1C(=O)C=CC1=O BUXKULRFRATXSI-UHFFFAOYSA-N 0.000 description 1
- DBWVTDFTWIVIQA-UHFFFAOYSA-N 2-hydroxy-3a,4,5,6,7,7a-hexahydroisoindole-1,3-dione Chemical compound C1CCCC2C(=O)N(O)C(=O)C21 DBWVTDFTWIVIQA-UHFFFAOYSA-N 0.000 description 1
- DPKHPTVBFHJMBL-UHFFFAOYSA-N 4,5,6,7-tetrabromo-2-hydroxyisoindole-1,3-dione Chemical compound BrC1=C(Br)C(Br)=C(Br)C2=C1C(=O)N(O)C2=O DPKHPTVBFHJMBL-UHFFFAOYSA-N 0.000 description 1
- DUFCMRCMPHIFTR-UHFFFAOYSA-N 5-(dimethylsulfamoyl)-2-methylfuran-3-carboxylic acid Chemical compound CN(C)S(=O)(=O)C1=CC(C(O)=O)=C(C)O1 DUFCMRCMPHIFTR-UHFFFAOYSA-N 0.000 description 1
- QTBSBXVTEAMEQO-UHFFFAOYSA-M Acetate Chemical compound CC([O-])=O QTBSBXVTEAMEQO-UHFFFAOYSA-M 0.000 description 1
- VYZAMTAEIAYCRO-UHFFFAOYSA-N Chromium Chemical compound [Cr] VYZAMTAEIAYCRO-UHFFFAOYSA-N 0.000 description 1
- RYGMFSIKBFXOCR-UHFFFAOYSA-N Copper Chemical compound [Cu] RYGMFSIKBFXOCR-UHFFFAOYSA-N 0.000 description 1
- XDTMQSROBMDMFD-UHFFFAOYSA-N Cyclohexane Chemical compound C1CCCCC1 XDTMQSROBMDMFD-UHFFFAOYSA-N 0.000 description 1
- CWYNVVGOOAEACU-UHFFFAOYSA-N Fe2+ Chemical compound [Fe+2] CWYNVVGOOAEACU-UHFFFAOYSA-N 0.000 description 1
- PWHULOQIROXLJO-UHFFFAOYSA-N Manganese Chemical compound [Mn] PWHULOQIROXLJO-UHFFFAOYSA-N 0.000 description 1
- WAEMQWOKJMHJLA-UHFFFAOYSA-N Manganese(2+) Chemical compound [Mn+2] WAEMQWOKJMHJLA-UHFFFAOYSA-N 0.000 description 1
- ZOKXTWBITQBERF-UHFFFAOYSA-N Molybdenum Chemical compound [Mo] ZOKXTWBITQBERF-UHFFFAOYSA-N 0.000 description 1
- NQTADLQHYWFPDB-UHFFFAOYSA-N N-Hydroxysuccinimide Chemical compound ON1C(=O)CCC1=O NQTADLQHYWFPDB-UHFFFAOYSA-N 0.000 description 1
- GRYLNZFGIOXLOG-UHFFFAOYSA-N Nitric acid Chemical compound O[N+]([O-])=O GRYLNZFGIOXLOG-UHFFFAOYSA-N 0.000 description 1
- 235000014676 Phragmites communis Nutrition 0.000 description 1
- KJTLSVCANCCWHF-UHFFFAOYSA-N Ruthenium Chemical compound [Ru] KJTLSVCANCCWHF-UHFFFAOYSA-N 0.000 description 1
- RTAQQCXQSZGOHL-UHFFFAOYSA-N Titanium Chemical compound [Ti] RTAQQCXQSZGOHL-UHFFFAOYSA-N 0.000 description 1
- QCWXUUIWCKQGHC-UHFFFAOYSA-N Zirconium Chemical compound [Zr] QCWXUUIWCKQGHC-UHFFFAOYSA-N 0.000 description 1
- MCDLETWIOVSGJT-UHFFFAOYSA-N acetic acid;iron Chemical compound [Fe].CC(O)=O.CC(O)=O MCDLETWIOVSGJT-UHFFFAOYSA-N 0.000 description 1
- VZYFFPWGCOWVQU-UHFFFAOYSA-N acetic acid;methanesulfonic acid Chemical compound CC(O)=O.CC(O)=O.CS(O)(=O)=O VZYFFPWGCOWVQU-UHFFFAOYSA-N 0.000 description 1
- 125000005595 acetylacetonate group Chemical group 0.000 description 1
- 239000001361 adipic acid Substances 0.000 description 1
- 235000011037 adipic acid Nutrition 0.000 description 1
- 150000001298 alcohols Chemical class 0.000 description 1
- 150000001338 aliphatic hydrocarbons Chemical class 0.000 description 1
- 229910000147 aluminium phosphate Inorganic materials 0.000 description 1
- 150000001408 amides Chemical class 0.000 description 1
- 125000003277 amino group Chemical group 0.000 description 1
- 229910052786 argon Inorganic materials 0.000 description 1
- 150000001491 aromatic compounds Chemical class 0.000 description 1
- 150000004945 aromatic hydrocarbons Chemical class 0.000 description 1
- SRSXLGNVWSONIS-UHFFFAOYSA-N benzenesulfonic acid Chemical compound OS(=O)(=O)C1=CC=CC=C1 SRSXLGNVWSONIS-UHFFFAOYSA-N 0.000 description 1
- 229940092714 benzenesulfonic acid Drugs 0.000 description 1
- WPYMKLBDIGXBTP-UHFFFAOYSA-N benzoic acid Chemical compound OC(=O)C1=CC=CC=C1 WPYMKLBDIGXBTP-UHFFFAOYSA-N 0.000 description 1
- 125000000484 butyl group Chemical group [H]C([*])([H])C([H])([H])C([H])([H])C([H])([H])[H] 0.000 description 1
- 229910002091 carbon monoxide Inorganic materials 0.000 description 1
- 125000002915 carbonyl group Chemical group [*:2]C([*:1])=O 0.000 description 1
- 229910052804 chromium Inorganic materials 0.000 description 1
- 239000011651 chromium Substances 0.000 description 1
- 229940011182 cobalt acetate Drugs 0.000 description 1
- INDBQWVYFLTCFF-UHFFFAOYSA-L cobalt(2+);dithiocyanate Chemical compound [Co+2].[S-]C#N.[S-]C#N INDBQWVYFLTCFF-UHFFFAOYSA-L 0.000 description 1
- QAHREYKOYSIQPH-UHFFFAOYSA-L cobalt(II) acetate Chemical compound [Co+2].CC([O-])=O.CC([O-])=O QAHREYKOYSIQPH-UHFFFAOYSA-L 0.000 description 1
- 238000004440 column chromatography Methods 0.000 description 1
- 238000009833 condensation Methods 0.000 description 1
- 230000005494 condensation Effects 0.000 description 1
- 229910052802 copper Inorganic materials 0.000 description 1
- OPQARKPSCNTWTJ-UHFFFAOYSA-L copper(ii) acetate Chemical compound [Cu+2].CC([O-])=O.CC([O-])=O OPQARKPSCNTWTJ-UHFFFAOYSA-L 0.000 description 1
- 125000005583 coronene group Chemical group 0.000 description 1
- 238000002425 crystallisation Methods 0.000 description 1
- 230000008025 crystallization Effects 0.000 description 1
- 125000000113 cyclohexyl group Chemical group [H]C1([H])C([H])([H])C([H])([H])C([H])(*)C([H])([H])C1([H])[H] 0.000 description 1
- 125000000640 cyclooctyl group Chemical group [H]C1([H])C([H])([H])C([H])([H])C([H])([H])C([H])(*)C([H])([H])C([H])([H])C1([H])[H] 0.000 description 1
- 125000001511 cyclopentyl group Chemical group [H]C1([H])C([H])([H])C([H])([H])C([H])(*)C1([H])[H] 0.000 description 1
- 238000004821 distillation Methods 0.000 description 1
- CCIVGXIOQKPBKL-UHFFFAOYSA-M ethanesulfonate Chemical compound CCS([O-])(=O)=O CCIVGXIOQKPBKL-UHFFFAOYSA-M 0.000 description 1
- 150000002170 ethers Chemical class 0.000 description 1
- 125000003754 ethoxycarbonyl group Chemical group C(=O)(OCC)* 0.000 description 1
- 125000001495 ethyl group Chemical group [H]C([H])([H])C([H])([H])* 0.000 description 1
- 238000000605 extraction Methods 0.000 description 1
- 238000001914 filtration Methods 0.000 description 1
- YLQWCDOCJODRMT-UHFFFAOYSA-N fluoren-9-one Chemical compound C1=CC=C2C(=O)C3=CC=CC=C3C2=C1 YLQWCDOCJODRMT-UHFFFAOYSA-N 0.000 description 1
- RMBPEFMHABBEKP-UHFFFAOYSA-N fluorene Chemical compound C1=CC=C2C3=C[CH]C=CC3=CC2=C1 RMBPEFMHABBEKP-UHFFFAOYSA-N 0.000 description 1
- 229910021472 group 8 element Inorganic materials 0.000 description 1
- 150000008282 halocarbons Chemical class 0.000 description 1
- 239000001307 helium Substances 0.000 description 1
- 229910052734 helium Inorganic materials 0.000 description 1
- SWQJXJOGLNCZEY-UHFFFAOYSA-N helium atom Chemical compound [He] SWQJXJOGLNCZEY-UHFFFAOYSA-N 0.000 description 1
- 239000011964 heteropoly acid Substances 0.000 description 1
- 125000004051 hexyl group Chemical group [H]C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])* 0.000 description 1
- 125000003707 hexyloxy group Chemical group [H]C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])O* 0.000 description 1
- 150000004678 hydrides Chemical class 0.000 description 1
- 229930195733 hydrocarbon Natural products 0.000 description 1
- 229910052741 iridium Inorganic materials 0.000 description 1
- GKOZUEZYRPOHIO-UHFFFAOYSA-N iridium atom Chemical compound [Ir] GKOZUEZYRPOHIO-UHFFFAOYSA-N 0.000 description 1
- 229910052742 iron Inorganic materials 0.000 description 1
- DXTCFKRAUYBHRC-UHFFFAOYSA-L iron(2+);dithiocyanate Chemical compound [Fe+2].[S-]C#N.[S-]C#N DXTCFKRAUYBHRC-UHFFFAOYSA-L 0.000 description 1
- 125000000959 isobutyl group Chemical group [H]C([H])([H])C([H])(C([H])([H])[H])C([H])([H])* 0.000 description 1
- 238000006317 isomerization reaction Methods 0.000 description 1
- 125000001449 isopropyl group Chemical group [H]C([H])([H])C([H])(*)C([H])([H])[H] 0.000 description 1
- 150000002576 ketones Chemical class 0.000 description 1
- 229910052748 manganese Inorganic materials 0.000 description 1
- FRYUOUHISNWFTE-UHFFFAOYSA-L manganese(2+);dithiocyanate Chemical compound [Mn+2].[S-]C#N.[S-]C#N FRYUOUHISNWFTE-UHFFFAOYSA-L 0.000 description 1
- 229910001507 metal halide Inorganic materials 0.000 description 1
- 150000005309 metal halides Chemical class 0.000 description 1
- 229910000000 metal hydroxide Inorganic materials 0.000 description 1
- 150000004692 metal hydroxides Chemical class 0.000 description 1
- 229910044991 metal oxide Inorganic materials 0.000 description 1
- 150000004706 metal oxides Chemical class 0.000 description 1
- 150000002739 metals Chemical class 0.000 description 1
- 125000001160 methoxycarbonyl group Chemical group [H]C([H])([H])OC(*)=O 0.000 description 1
- 125000002496 methyl group Chemical group [H]C([H])([H])* 0.000 description 1
- 150000007522 mineralic acids Chemical class 0.000 description 1
- 239000012046 mixed solvent Substances 0.000 description 1
- 239000000203 mixture Substances 0.000 description 1
- 229910052750 molybdenum Inorganic materials 0.000 description 1
- 239000011733 molybdenum Substances 0.000 description 1
- 229910052759 nickel Inorganic materials 0.000 description 1
- 229910052758 niobium Inorganic materials 0.000 description 1
- GUCVJGMIXFAOAE-UHFFFAOYSA-N niobium atom Chemical compound [Nb] GUCVJGMIXFAOAE-UHFFFAOYSA-N 0.000 description 1
- 229910017604 nitric acid Inorganic materials 0.000 description 1
- 150000002828 nitro derivatives Chemical class 0.000 description 1
- 125000004433 nitrogen atom Chemical group N* 0.000 description 1
- NIHNNTQXNPWCJQ-UHFFFAOYSA-N o-biphenylenemethane Natural products C1=CC=C2CC3=CC=CC=C3C2=C1 NIHNNTQXNPWCJQ-UHFFFAOYSA-N 0.000 description 1
- 125000002347 octyl group Chemical group [H]C([*])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])[H] 0.000 description 1
- 235000005985 organic acids Nutrition 0.000 description 1
- 229910052762 osmium Inorganic materials 0.000 description 1
- SYQBFIAQOQZEGI-UHFFFAOYSA-N osmium atom Chemical compound [Os] SYQBFIAQOQZEGI-UHFFFAOYSA-N 0.000 description 1
- 235000006408 oxalic acid Nutrition 0.000 description 1
- WIWVNQBYNTWQOW-UHFFFAOYSA-L oxovanadium(2+);diacetate Chemical compound [V+2]=O.CC([O-])=O.CC([O-])=O WIWVNQBYNTWQOW-UHFFFAOYSA-L 0.000 description 1
- 229910052763 palladium Inorganic materials 0.000 description 1
- 125000000913 palmityl group Chemical group [H]C([*])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])[H] 0.000 description 1
- 125000005582 pentacene group Chemical group 0.000 description 1
- JQQSUOJIMKJQHS-UHFFFAOYSA-N pentaphenyl group Chemical group C1=CC=CC2=CC3=CC=C4C=C5C=CC=CC5=CC4=C3C=C12 JQQSUOJIMKJQHS-UHFFFAOYSA-N 0.000 description 1
- 125000001147 pentyl group Chemical group C(CCCC)* 0.000 description 1
- 230000000737 periodic effect Effects 0.000 description 1
- YNPNZTXNASCQKK-UHFFFAOYSA-N phenanthrene Chemical group C1=CC=C2C3=CC=CC=C3C=CC2=C1 YNPNZTXNASCQKK-UHFFFAOYSA-N 0.000 description 1
- 229910052698 phosphorus Inorganic materials 0.000 description 1
- 239000011574 phosphorus Substances 0.000 description 1
- 125000001388 picenyl group Chemical group C1(=CC=CC2=CC=C3C4=CC=C5C=CC=CC5=C4C=CC3=C21)* 0.000 description 1
- 229910052697 platinum Inorganic materials 0.000 description 1
- 229920000728 polyester Polymers 0.000 description 1
- XAEFZNCEHLXOMS-UHFFFAOYSA-M potassium benzoate Chemical compound [K+].[O-]C(=O)C1=CC=CC=C1 XAEFZNCEHLXOMS-UHFFFAOYSA-M 0.000 description 1
- 125000001501 propionyl group Chemical group O=C([*])C([H])([H])C([H])([H])[H] 0.000 description 1
- 125000001436 propyl group Chemical group [H]C([*])([H])C([H])([H])C([H])([H])[H] 0.000 description 1
- 125000005581 pyrene group Chemical group 0.000 description 1
- 239000011541 reaction mixture Substances 0.000 description 1
- 230000035484 reaction time Effects 0.000 description 1
- 238000001953 recrystallisation Methods 0.000 description 1
- 229910052703 rhodium Inorganic materials 0.000 description 1
- MHOVAHRLVXNVSD-UHFFFAOYSA-N rhodium atom Chemical compound [Rh] MHOVAHRLVXNVSD-UHFFFAOYSA-N 0.000 description 1
- 229910052707 ruthenium Inorganic materials 0.000 description 1
- 125000002914 sec-butyl group Chemical group [H]C([H])([H])C([H])([H])C([H])(*)C([H])([H])[H] 0.000 description 1
- 159000000000 sodium salts Chemical class 0.000 description 1
- 238000003756 stirring Methods 0.000 description 1
- 125000001424 substituent group Chemical group 0.000 description 1
- 238000006467 substitution reaction Methods 0.000 description 1
- 229910052713 technetium Inorganic materials 0.000 description 1
- GKLVYJBZJHMRIY-UHFFFAOYSA-N technetium atom Chemical compound [Tc] GKLVYJBZJHMRIY-UHFFFAOYSA-N 0.000 description 1
- 125000000999 tert-butyl group Chemical group [H]C([H])([H])C(*)(C([H])([H])[H])C([H])([H])[H] 0.000 description 1
- 125000001935 tetracenyl group Chemical group C1(=CC=CC2=CC3=CC4=CC=CC=C4C=C3C=C12)* 0.000 description 1
- 125000000858 thiocyanato group Chemical group *SC#N 0.000 description 1
- 229910052719 titanium Inorganic materials 0.000 description 1
- 229910052723 transition metal Inorganic materials 0.000 description 1
- 150000003624 transition metals Chemical class 0.000 description 1
- WFKWXMTUELFFGS-UHFFFAOYSA-N tungsten Chemical compound [W] WFKWXMTUELFFGS-UHFFFAOYSA-N 0.000 description 1
- 229910052721 tungsten Inorganic materials 0.000 description 1
- 239000010937 tungsten Substances 0.000 description 1
- 229910052720 vanadium Inorganic materials 0.000 description 1
- LEONUFNNVUYDNQ-UHFFFAOYSA-N vanadium atom Chemical compound [V] LEONUFNNVUYDNQ-UHFFFAOYSA-N 0.000 description 1
- 229910052726 zirconium Inorganic materials 0.000 description 1
Classifications
-
- Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y02—TECHNOLOGIES OR APPLICATIONS FOR MITIGATION OR ADAPTATION AGAINST CLIMATE CHANGE
- Y02P—CLIMATE CHANGE MITIGATION TECHNOLOGIES IN THE PRODUCTION OR PROCESSING OF GOODS
- Y02P20/00—Technologies relating to chemical industry
- Y02P20/50—Improvements relating to the production of bulk chemicals
- Y02P20/52—Improvements relating to the production of bulk chemicals using catalysts, e.g. selective catalysts
Landscapes
- Catalysts (AREA)
- Organic Low-Molecular-Weight Compounds And Preparation Thereof (AREA)
- Low-Molecular Organic Synthesis Reactions Using Catalysts (AREA)
Abstract
Description
【発明の詳細な説明】DETAILED DESCRIPTION OF THE INVENTION
【0001】[0001]
【発明の属する技術分野】本発明は芳香族性縮合環を有
するジカルボン酸の製造方法に関する。The present invention relates to a method for producing a dicarboxylic acid having an aromatic fused ring.
【0002】[0002]
【従来の技術】芳香族性縮合環を有するジカルボン酸、
例えば、ナフタル酸の製造方法としては、アセナフテン
のメチレン基を酸化する方法が知られている。例えば、
バイルシュタイン EIV9、3534頁(Karischin,
Fedorenko, Z. prikl. Chim.29[1956]966)、ベリヒテ
・デア・ドイチェン・ヘミシェン・ゲゼルシャフト25
巻、652頁、1895年(Berichte der Deutschen C
hemischen Gesellschaft 25,652(1895))、米国特許2,
379,302号明細書には、アセナフテンをクロム酸
で処理する方法が開示され、また、バイルシュタイン
EII9、651頁(Casares, Ranedo, An. Soc. espa
n. 20,524;C. 1924 I, 319 )には、アセナフテンを過
酸化水素と過マンガン酸で処理する方法が開示されてい
る。しかし、これら文献の方法は、取り扱いに注意を要
するとともに、後処理が繁雑なクロム酸や過マンガン酸
を大量に使用する必要がある。2. Description of the Related Art A dicarboxylic acid having an aromatic fused ring,
For example, as a method for producing naphthalic acid, a method for oxidizing a methylene group of acenaphthene is known. For example,
Beilstein EIV 9, p. 3534 (Karischin,
Fedorenko, Z. prikl. Chim. 29 [1956] 966), Berichte der Deutschen Hemichen Gesellschaft 25
Vol. 652, 1895 (Berichte der Deutschen C
hemischen Gesellschaft 25,652 (1895)), U.S. Pat.
No. 379,302 discloses a method for treating acenaphthene with chromic acid.
EII9, p. 651 (Casares, Ranedo, An. Soc. Espa
n. 20,524; C. 1924 I, 319) discloses a method of treating acenaphthene with hydrogen peroxide and permanganic acid. However, these methods require careful handling and use a large amount of chromic acid or permanganic acid, which is complicated in post-treatment.
【0003】近年、メチレン基の酸化反応として、クロ
ム酸酸化や過マンガン酸酸化等に変わり得るマイルドな
酸化反応が種々検討されている。例えば、特開平9−3
27626号公報には、N−ヒドロキシフタルイミド
(触媒)と、コバルト等の遷移金属(助触媒)との存在
下、シクロヘキサンの酸化によりアジピン酸を製造する
ことが開示されている。また、環状メチレンを有する芳
香族化合物の酸化について、フルオレンを酸化し、ケト
ン体であるフルオレノンを生成させることが開示されて
いる。しかし、芳香族ジカルボン酸の製造について触れ
るところがない。In recent years, various studies have been made on mild oxidation reactions that can be replaced with chromic acid oxidation, permanganic acid oxidation, etc. as methylene group oxidation reactions. For example, Japanese Patent Application Laid-Open No. 9-3
No. 27626 discloses that adipic acid is produced by oxidation of cyclohexane in the presence of N-hydroxyphthalimide (catalyst) and a transition metal such as cobalt (cocatalyst). In addition, regarding the oxidation of an aromatic compound having a cyclic methylene, it is disclosed that fluorene is oxidized to generate fluorenone which is a ketone body. However, there is no mention of the production of aromatic dicarboxylic acids.
【0004】[0004]
【発明が解決しようとする課題】従って、本発明の目的
は、酸素酸化により、簡便にかつ効率よく芳香族性カル
ボン酸を製造できる方法を提供することにある。本発明
の他の目的は、温和な条件で芳香族性縮合環化合物を酸
化できる方法を提供することにある。SUMMARY OF THE INVENTION Accordingly, an object of the present invention is to provide a method for easily and efficiently producing an aromatic carboxylic acid by oxygen oxidation. Another object of the present invention is to provide a method capable of oxidizing an aromatic fused ring compound under mild conditions.
【0005】[0005]
【課題を解決するための手段】本発明者らは、前記目的
を達成するために鋭意検討した結果、N−ヒドロキシフ
タルイミドで構成された触媒を用いる酸化反応におい
て、特定の芳香族性縮合環化合物を基質として用いる
と、芳香族性ジカルボン酸が効率よく生成することを見
い出し、本発明を完成した。Means for Solving the Problems The present inventors have conducted intensive studies to achieve the above object, and as a result, have found that in an oxidation reaction using a catalyst composed of N-hydroxyphthalimide, a specific aromatic condensed ring compound is used. It has been found that when is used as a substrate, an aromatic dicarboxylic acid is efficiently produced, and the present invention has been completed.
【0006】すなわち、本発明は、下記式(1)That is, the present invention provides the following formula (1)
【0007】[0007]
【化4】 (式中、R1 及びR2 は、同一又は異なって、水素原
子、ハロゲン原子、アルキル基、アリール基、シクロア
ルキル基、ヒドロキシル基、アルコキシ基、カルボキシ
ル基、アルコキシカルボニル基、アシル基を示し、R1
及びR2 は互いに結合して二重結合、または芳香族性又
は非芳香族性の環を形成してもよい。Xは酸素原子又は
ヒドロキシル基を示し、nは1〜3の整数を示す。)で
表されるイミド化合物で構成される酸化触媒の存在下、
下記式(2)Embedded image (Wherein R 1 and R 2 are the same or different and each represent a hydrogen atom, a halogen atom, an alkyl group, an aryl group, a cycloalkyl group, a hydroxyl group, an alkoxy group, a carboxyl group, an alkoxycarbonyl group, an acyl group; R 1
And R 2 may combine with each other to form a double bond or an aromatic or non-aromatic ring. X represents an oxygen atom or a hydroxyl group, and n represents an integer of 1 to 3. ) In the presence of an oxidation catalyst composed of an imide compound represented by
The following equation (2)
【0008】[0008]
【化5】 (式中、R3 〜R8 は、同一又は異なって、水素原子、
ハロゲン原子、アルキル基、アリール基、シクロアルキ
ル基、ヒドロキシル基、アルコキシ基を示し、R 3 〜R
8 のうち互いに隣接する少なくとも一対の基は、芳香族
環を形成していてもよい。mは0又は1を示す。)で表
される芳香族性縮合環化合物(以下、化合物(2)とい
う)を分子状酸素と接触させ、下記式(3)Embedded image(Where RThree~ R8Are the same or different and are a hydrogen atom,
Halogen atom, alkyl group, aryl group, cycloalkyl
A hydroxyl group, an alkoxy group, Three~ R
8At least one pair of groups adjacent to each other is aromatic
It may form a ring. m represents 0 or 1. )
Aromatic fused ring compound (hereinafter referred to as compound (2)
) Is contacted with molecular oxygen to obtain the following formula (3)
【0009】[0009]
【化6】 (式中、R3 〜R8 は、前記に同じ)で表される芳香族
性ジカルボン酸を製造する。化合物(2)は、アセナフ
テン、アセナトレン、アセフェナントレンまたはコラン
トレンで構成されていてもよい。酸化触媒はさらに助触
媒を含んでいてもよい。Embedded image (Wherein, R 3 to R 8 are the same as above) to produce an aromatic dicarboxylic acid represented by the formula: The compound (2) may be composed of acenaphthene, acenathrene, acephenanthrene or cholanthrene. The oxidation catalyst may further include a promoter.
【0010】また、本発明の化合物(2)の酸化方法
は、上記イミド化合物で構成される酸化触媒と分子状酸
素との存在下で行うことができる。なお、本明細書にお
いて、「カルボン酸」とは、遊離のカルボキシル基を有
する化合物に限らず、反応条件により生成する塩、エス
テルや酸無水物などのように、実質的にカルボン酸と等
価なカルボン酸誘導体も含む意味に用いる。The method for oxidizing the compound (2) of the present invention can be carried out in the presence of an oxidation catalyst composed of the above imide compound and molecular oxygen. In the present specification, the term "carboxylic acid" is not limited to a compound having a free carboxyl group, but is substantially equivalent to a carboxylic acid, such as a salt generated under reaction conditions, an ester or an acid anhydride. It is used to include carboxylic acid derivatives.
【0011】[0011]
【発明の実施の形態】[酸化触媒]本発明に使用される
酸化触媒を構成する上記式(1)で表されるイミド化合
物において、R1 及びR2 で示されるハロゲン原子に
は、ヨウ素、臭素、塩素およびフッ素原子が含まれ、ア
ルキル基には、C1-10アルキル基が挙げられる。アリー
ル基には、フェニル基などが含まれ、シクロアルキル基
には、C1-10シクロアルキル基が含まれる。アルコキシ
基には、C1-10アルコキシ基が含まれる。アルコキシカ
ルボニル基には、C1-10アルコキシカルボニル基が含ま
れ、アシル基には、C1-6 アシル基が含まれる。BEST MODE FOR CARRYING OUT THE INVENTION [Oxidation catalyst] In the imide compound represented by the above formula (1) constituting the oxidation catalyst used in the present invention, halogen atoms represented by R 1 and R 2 include iodine, It contains bromine, chlorine and fluorine atoms, and the alkyl group includes a C 1-10 alkyl group. The aryl group includes a phenyl group and the like, and the cycloalkyl group includes a C 1-10 cycloalkyl group. The alkoxy group includes a C 1-10 alkoxy group. The alkoxycarbonyl group includes a C 1-10 alkoxycarbonyl group, and the acyl group includes a C 1-6 acyl group.
【0012】R1 及びR2 が互いに結合して形成する芳
香族性環又は非芳香族性環には、5〜12員環程度の環
(炭化水素環、複素環又は縮合複素環など)が含まれ
る。The aromatic or non-aromatic ring formed by R 1 and R 2 bonded to each other includes a ring having about 5 to 12 members (such as a hydrocarbon ring, a heterocycle or a fused heterocycle). included.
【0013】好ましいイミド化合物には、下記式(1
a)〜(1f)で表される化合物が含まれる。Preferred imide compounds include the following formula (1)
Compounds represented by a) to (1f) are included.
【0014】[0014]
【化7】 (式中、R9 〜R12は、同一又は異なって、水素原子、
ハロゲン原子、アルキル基、ヒドロキシル基、アルコキ
シ基、カルボキシル基、アルコキシカルボニル基、アシ
ル基、ニトロ基、シアノ基、アミノ基を示す。Xは酸素
原子又はヒドロキシル基を示す。窒素原子「N」と
「X」との結合は単結合又は二重結合を示す。R1 、R
2 及びnは前記に同じ。) R9 〜R12で示されるハロゲン原子、アルキル基、ヒド
ロキシル基、アルコキシ基、アルコキシカルボニル基、
アシル基としては、前記式(1)でR1 及びR 2 につい
て例示したのと同様の基が挙げられる。nは、1〜3の
整数を示し、好ましくは1〜2である。式(1)で表さ
れる触媒は、一種又は二種以上組み合わせて使用でき
る。Embedded image(Where R9~ R12Are the same or different and are a hydrogen atom,
Halogen atom, alkyl group, hydroxyl group, alkoxy
Group, carboxyl group, alkoxycarbonyl group, reed
A nitro group, a nitro group, a cyano group, or an amino group. X is oxygen
Indicates an atom or a hydroxyl group. With the nitrogen atom "N"
The bond with “X” indicates a single bond or a double bond. R1, R
TwoAnd n are the same as above. ) R9~ R12A halogen atom, an alkyl group, or a hydride represented by
Roxyl group, alkoxy group, alkoxycarbonyl group,
As the acyl group, R 1 in the above formula (1)1And R TwoAbout
And the same groups as those exemplified above. n is 1 to 3
Indicate an integer, preferably 1 or 2. Expression (1)
Can be used alone or in combination of two or more.
You.
【0015】好ましいイミド化合物としては、例えば、
N−ヒドロキシコハクイミド、N−ヒドロキシマレイン
酸イミド、N−ヒドロキシヘキサヒドロフタル酸イミ
ド、N,N−ジヒドロキシシクロヘキサンテトラカルボ
ン酸イミド、N−ヒドロキシフタル酸イミド、N−ヒド
ロキシテトラブロモフタル酸イミド、N−ヒドロキシヘ
ット酸イミド、N−ヒドロキシハイミック酸イミド、N
−ヒドロキシトリメリット酸イミド、N,N−ジヒドロ
キシピロメリット酸イミド、N,N−ジヒドロキシナフ
タレンテトラカルボン酸イミドなどが挙げられる。Preferred imide compounds include, for example,
N-hydroxysuccinimide, N-hydroxymaleimide, N-hydroxyhexahydrophthalimide, N, N-dihydroxycyclohexanetetracarboxylic imide, N-hydroxyphthalimide, N-hydroxytetrabromophthalimide, N-hydroxyphthalimide -Hydroxyhetimide, N-hydroxyhymic imide, N
-Hydroxytrimellitic imide, N, N-dihydroxypyromellitic imide, N, N-dihydroxynaphthalenetetracarboxylic imide and the like.
【0016】化合物(2)1モルに対するイミド化合物
の使用量は、例えば、0.001〜1モル、好ましくは
0.01〜0.5モル、さらに好ましくは0.05〜
0.30モル、特に0.05〜0.25モル程度であ
る。酸化触媒は、必要に応じて、助触媒を含んでいても
よい。助触媒としては、例えば、周期表2A〜7A族、
8族及び1B〜3B族元素を含む化合物、好ましくは、
4A族元素(チタンTi、ジルコニウムZrなど)、5
A族元素(バナジウムV、ニオブNbなど)、6A族元
素(クロムCo、モリブデンMo、タングステンWな
ど)、7A族元素(マンガンMn、テクネチウムTc、
レニウムReなど)、8族元素(鉄Fe、ルテニウムR
u、オスミウムOs、コバルトCo、ロジウムRh、イ
リジウムIr、ニッケルNi、パラジウムPd、白金P
tなど)、1B族元素(銅Cuなど)に属するいずれか
の元素を少なくとも1つ含む金属化合物が挙げられる。The amount of the imide compound to be used per 1 mol of the compound (2) is, for example, 0.001 to 1 mol, preferably 0.01 to 0.5 mol, more preferably 0.05 to 0.5 mol.
It is about 0.30 mol, especially about 0.05 to 0.25 mol. The oxidation catalyst may include a cocatalyst, if necessary. As the co-catalyst, for example, groups 2A to 7A of the periodic table,
Compounds containing Group 8 and 1B-3B elements, preferably
4A group elements (titanium Ti, zirconium Zr, etc.), 5
Group A element (vanadium V, niobium Nb, etc.), group 6A element (chromium Co, molybdenum Mo, tungsten W, etc.), group 7A element (manganese Mn, technetium Tc,
Group 8 elements (iron Fe, ruthenium R, etc.)
u, osmium Os, cobalt Co, rhodium Rh, iridium Ir, nickel Ni, palladium Pd, platinum P
t) and a metal compound containing at least one element belonging to Group 1B elements (such as copper Cu).
【0017】金属化合物としては、金属単体、金属水酸
化物、金属酸化物(複酸化物または酸素酸塩)、金属有
機酸塩、金属無機酸塩、金属ハロゲン化物、金属元素を
含む配位化合物(錯体)やヘテロポリ酸(特にイソポリ
酸)又はその塩などが挙げられる。前記錯体を形成する
配位子としては、OH(ヒドロキソ)基、アルコキシ基
(メトキシ、エトキシ、プロポキシ、ブトキシ基な
ど)、アシル基(アセチル、プロピオニル基など)、ア
ルコキシカルボニル基(メトキシカルボニル(アセタ
ト)、エトキシカルボニル基など)、AA(アセチルア
セトナト)基、シクロペンタジエニル基、ハロゲン原子
(塩素、臭素など)、CO、CN、酸素原子、リン化合
物、窒素含有化合物などが挙げられる。これら配位子
は、単独又は二種以上組み合わせて使用することができ
る。Examples of the metal compound include simple metals, metal hydroxides, metal oxides (complex oxides or oxyacid salts), metal organic acid salts, metal inorganic acid salts, metal halides, and coordination compounds containing metal elements. (Complex), heteropoly acid (especially isopoly acid) or a salt thereof. Examples of the ligand forming the complex include an OH (hydroxo) group, an alkoxy group (e.g., methoxy, ethoxy, propoxy, butoxy group), an acyl group (e.g., acetyl, propionyl group), and an alkoxycarbonyl group (e.g., methoxycarbonyl (acetato)). , An ethoxycarbonyl group), an AA (acetylacetonato) group, a cyclopentadienyl group, a halogen atom (such as chlorine and bromine), CO, CN, an oxygen atom, a phosphorus compound, and a nitrogen-containing compound. These ligands can be used alone or in combination of two or more.
【0018】好ましい助触媒としては、例えば、アセチ
ルアセトナト錯体(TiO(AA) 2 、ZrO(AA)
2 、VO(AA)2 、Mn(AA)2 、Co(AA)2
などシアノ錯体(ヘキサシアノマンガン酸(I)塩、ヘ
キサシアノ鉄(II)酸塩など)、カルボニル錯体(Fe
(CO)5 、Fe2 (CO)9 、Fe3 (CO)12な
ど)、シクロペンタジエニル錯体(ビスシクロペンタジ
エニルマンガン(II)、ビスシクロペンタジエニル鉄
(II)など)、チオシアナト錯体(マンガンチオシアナ
ト、鉄チオシアナト、コバルトチオシアナトなど)、ア
セチル錯体(酢酸チタニル、酢酸ジルコニウム、酢酸マ
ンガン、酢酸コバルト、酢酸鉄、酢酸銅、酢酸バナジル
など)などが挙げられる。これら助触媒は単独又は二種
以上組み合わせて使用できる。Preferred co-catalysts include, for example, acetyl
Ruacetonato complex (TiO (AA) Two, ZrO (AA)
Two, VO (AA)Two, Mn (AA)Two, Co (AA)Two
Cyano complexes such as hexacyanomanganate (I) salt,
Xacyanoferrate (II), carbonyl complex (Fe
(CO)Five, FeTwo(CO)9, FeThree(CO)12What
), Cyclopentadienyl complexes (biscyclopentadi
Enenyl manganese (II), biscyclopentadienyl iron
(II)), thiocyanato complexes (manganese thiocyanate)
, Iron thiocyanate, cobalt thiocyanate, etc.)
Cetyl complexes (titanyl acetate, zirconium acetate,
Ngan, cobalt acetate, iron acetate, copper acetate, vanadyl acetate
Etc.). These cocatalysts may be used alone or in combination.
These can be used in combination.
【0019】イミド化合物1モルに対する助触媒の使用
量は、例えば、0.001〜0.1モル、好ましくは
0.005〜0.08モル、さらに好ましくは0.01
〜0.07モル程度である。また、化合物(2)1モル
に対する助触媒の使用量は、例えば、0.0001〜
0.01モル、好ましくは0.0005〜0.008モ
ル、さらに好ましくは0.001〜0.007モル程度
である。The amount of the cocatalyst used per mole of the imide compound is, for example, 0.001 to 0.1 mol, preferably 0.005 to 0.08 mol, more preferably 0.01 to 0.1 mol.
About 0.07 mol. The amount of the cocatalyst to be used per 1 mol of the compound (2) is, for example, from 0.0001 to
It is about 0.01 mol, preferably about 0.0005 to 0.008 mol, and more preferably about 0.001 to 0.007 mol.
【0020】[化合物(2)]上記式(2)で表される
化合物(2)は、芳香族性のオルソ(ortho)縮合環及
びオルソアンドペリ(ortho and peri)縮合環のうち、
隣接する芳香族性環にそれぞれメチレン基が直接結合
し、5員又は6員の環状メチレンを構成している。式
(2)において、mは0又は1を示し、下記式に示され
るように、好ましくは0を示す。[Compound (2)] The compound (2) represented by the above formula (2) is selected from aromatic ortho-condensed rings and ortho-and peri-condensed rings.
Methylene groups are directly bonded to adjacent aromatic rings to form a 5- or 6-membered cyclic methylene. In the formula (2), m represents 0 or 1, and preferably represents 0 as shown in the following formula.
【0021】[0021]
【化8】 (式中、R3 〜R8 は、前記に同じ) 式(2)において、R3 〜R8 で示されるハロゲン原子
には、ヨウ素、臭素、塩素およびフッ素原子が含まれ
る。アルキル基には、例えば、メチル、エチル、プロピ
ル、イソプロピル、ブチル、イソブチル、sec−ブチ
ル、t−ブチル、ペンチル、ヘキシル、オクチル基など
の直鎖状又は分岐鎖状のC1-10アルキル基が含まれる。Embedded image (Wherein, R 3 to R 8 are the same as described above) In Formula (2), the halogen atoms represented by R 3 to R 8 include iodine, bromine, chlorine, and fluorine atoms. Examples of the alkyl group include a linear or branched C 1-10 alkyl group such as methyl, ethyl, propyl, isopropyl, butyl, isobutyl, sec-butyl, t-butyl, pentyl, hexyl, and octyl groups. included.
【0022】アリール基には、フェニル基、ナフチル基
などが含まれ、シクロアルキル基には、シクロペンチ
ル、シクロヘキシル、シクロオクチル基などが含まれ
る。アルコキシ基には、例えば、メトキシ、エトキシ、
プロポキシ、イソプロポキシ、ブトキシ、イソブトキ
シ、t−ブトキシ、ヘキシルオキシ基などのC1-10(好
ましくはC1-6 、特にC1-4 )低級アルコキシ基が含ま
れる。The aryl group includes a phenyl group, a naphthyl group and the like, and the cycloalkyl group includes a cyclopentyl, cyclohexyl, cyclooctyl group and the like. Alkoxy groups include, for example, methoxy, ethoxy,
It includes C 1-10 (preferably C 1-6 , especially C 1-4 ) lower alkoxy groups such as propoxy, isopropoxy, butoxy, isobutoxy, t-butoxy and hexyloxy groups.
【0023】R3 〜R8 のうち、互いに隣接する少なく
とも一対の基が形成する芳香族環としては、例えば、ベ
ンゼン環、ナフタレン環、アントラセン環、フェナント
レン環、ピレン環などの6員環炭化水素が1〜6個(好
ましくは1〜3個、特に1〜2個)縮合した芳香族環が
挙げられる。これら芳香族環は、2個以上の環が互いに
隣接してオルソ縮合又はオルソアンドペリ縮合していて
もよい。式(2)で表されるナフタレン骨格と、前記芳
香族環とが一緒になって形成する縮合環としては、例え
ば、フェナントレン環、アントラセン環、ピレン環、ク
リセン環、ナフタセン環、ピセン環、ペンタフェン環、
ペンタセン環、コロネン環などが挙げられる。これら、
ナフタレン骨格と縮合した前記芳香族環には、前記式
(2)でR 3 〜R8 で示されるハロゲン原子、アルキル
基、アリール基、シクロアルキル基、ヒドロキシル基、
アルコキシ基が置換していてもよい。好ましい化合物
(2)としては、例えば、アセナフテン、アセナトレ
ン、アセフェナントレン、コラントレンなどが挙げら
れ、これらの基は前記置換基を有していてもよい。RThree~ R8Of which are less adjacent to each other
Examples of the aromatic ring formed by a pair of groups include
Benzene ring, naphthalene ring, anthracene ring, phenanthate
1 to 6 6-membered hydrocarbons such as a
Preferably 1 to 3, especially 1 to 2) fused aromatic rings
No. These aromatic rings have two or more rings
Adjacent orthocondensation or orthoandperi condensation
Is also good. A naphthalene skeleton represented by the formula (2);
Examples of condensed rings formed together with an aromatic ring include
For example, phenanthrene ring, anthracene ring, pyrene ring,
Lysene ring, naphthacene ring, picene ring, pentaphene ring,
Examples include a pentacene ring and a coronene ring. these,
The aromatic ring fused to the naphthalene skeleton has the formula
R in (2) Three~ R8A halogen atom or an alkyl represented by
Group, aryl group, cycloalkyl group, hydroxyl group,
The alkoxy group may be substituted. Preferred compounds
As (2), for example, acenaphthene, acenatre
, Acephenanthrene, collanthrene, etc.
And these groups may have the substituents.
【0024】[酸化反応]化合物(2)の酸化に利用さ
れる酸素は、活性酸素であってもよいが、分子状酸素を
利用するのが経済的に有利である。分子状酸素は、純粋
な酸素を用いてもよく、窒素、ヘリウム、アルゴン、二
酸化炭素などの不活性ガスで希釈した酸素を使用しても
よく、空気を用いてもよい。酸素の使用量は、通常、化
合物(2)1モルに対して、2モル以上(例えば4モル
以上)、好ましくは2〜200モル、さらに好ましくは
4〜100モル程度である。基質に対して過剰モルの酸
素を使用する場合が多く、特に空気や酸素などの分子状
酸素を含有する雰囲気下で反応させるのが有利である。[Oxidation reaction] The oxygen used for oxidizing the compound (2) may be active oxygen, but it is economically advantageous to use molecular oxygen. As the molecular oxygen, pure oxygen may be used, oxygen diluted with an inert gas such as nitrogen, helium, argon, or carbon dioxide may be used, or air may be used. The amount of oxygen to be used is generally 2 mol or more (for example, 4 mol or more), preferably 2 to 200 mol, more preferably about 4 to 100 mol, per 1 mol of compound (2). In many cases, an excess molar amount of oxygen relative to the substrate is used, and it is particularly advantageous to carry out the reaction under an atmosphere containing molecular oxygen such as air or oxygen.
【0025】本発明の酸化方法は、通常、反応に不活性
な有機溶媒中で行われる。有機溶媒としては、例えば、
有機カルボン酸(ギ酸、酢酸、プロピオン酸など)、ニ
トリル類(アセトニトリル、ベンゾニトリルなど)、ア
ミド類(ジメチルホルムアミドなど)、アルコール類
(t−ブタノールなど)、脂肪族炭化水素、芳香族炭化
水素(ベンゼンなど)、ハロゲン化炭化水素(クロロホ
ルム、トリフルオロメチルベンゼン等)、ニトロ化合
物、エステル類(酢酸エチル等)、エーテル類、これら
の混合溶媒などが挙げられる。溶媒としては、有機酸溶
媒、ニトリル類などを用いることが多い。The oxidation method of the present invention is usually carried out in an organic solvent inert to the reaction. As the organic solvent, for example,
Organic carboxylic acids (formic acid, acetic acid, propionic acid, etc.), nitriles (acetonitrile, benzonitrile, etc.), amides (dimethylformamide, etc.), alcohols (t-butanol, etc.), aliphatic hydrocarbons, aromatic hydrocarbons ( Benzene, etc., halogenated hydrocarbons (chloroform, trifluoromethylbenzene, etc.), nitro compounds, esters (ethyl acetate, etc.), ethers, and mixed solvents thereof. As the solvent, an organic acid solvent, a nitrile, or the like is often used.
【0026】反応には、必要に応じて、プロトン酸を併
用してもよい。プロトン酸の存在下、反応はより円滑に
進行する。プロトン酸は、前記のように溶媒として用い
てもよい。プロトン酸としては、有機酸(ギ酸、酢酸、
プロピオン酸などの有機カルボン酸;シュウ酸、クエン
酸、酢酸などのオキシカルボン酸;メタンスルホン酸、
エタンスルホン酸などのアルキルスルホン酸;ベンゼン
スルホン酸、p−トルエンスルホン酸などのアリールス
ルホン酸など)、無機酸(塩酸、硫酸、硝酸、リン酸な
ど)が含まれる。In the reaction, a protonic acid may be used in combination, if necessary. In the presence of a protonic acid, the reaction proceeds more smoothly. Protic acids may be used as solvents as described above. Organic acids (formic acid, acetic acid,
Organic carboxylic acids such as propionic acid; oxycarboxylic acids such as oxalic acid, citric acid and acetic acid; methanesulfonic acid;
Alkylsulfonic acids such as ethanesulfonic acid; arylsulfonic acids such as benzenesulfonic acid and p-toluenesulfonic acid; and inorganic acids (hydrochloric acid, sulfuric acid, nitric acid, phosphoric acid, etc.).
【0027】反応温度は、通常、0〜300℃(例え
ば、30〜250℃)、好ましくは50〜200℃(例
えば、70〜150℃)程度である。反応は、常圧又は
加圧下で行うことができ、例えば、1〜50気圧程度で
ある場合が多い。反応時間は、反応温度及び圧力に応じ
て、例えば、30分〜48時間、好ましくは2〜24時
間程度である。反応は、分子状酸素の存在下又は分子状
酸素の流通下、回分式、半回分式、連続式などの慣用の
方法により行うことができる。The reaction temperature is usually about 0 to 300 ° C. (for example, 30 to 250 ° C.), preferably about 50 to 200 ° C. (for example, 70 to 150 ° C.). The reaction can be carried out under normal pressure or under pressure, for example, often at about 1 to 50 atm. The reaction time is, for example, about 30 minutes to 48 hours, preferably about 2 to 24 hours, depending on the reaction temperature and pressure. The reaction can be carried out by a conventional method such as a batch system, a semi-batch system, or a continuous system in the presence of molecular oxygen or in the flow of molecular oxygen.
【0028】[芳香族性ジカルボン酸]このような酸化
反応により前記式(3)で表される芳香族性ジカルボン
酸が効率よく生成する。なお、芳香族性ジカルボン酸
は、その塩、エステル、または分子内若しくは分子間酸
無水物であってもよい。[Aromatic dicarboxylic acid] By such an oxidation reaction, the aromatic dicarboxylic acid represented by the above formula (3) is efficiently produced. In addition, the aromatic dicarboxylic acid may be a salt, an ester, or an intramolecular or intermolecular acid anhydride.
【0029】芳香族性ジカルボン酸は、慣用の方法、例
えば、濾過、濃縮、蒸留、抽出、晶析、再結晶、カラム
クロマトグラフィーなどの単離方法により、反応混合物
から容易に単離できる。このようにして得られた芳香族
性ジカルボン酸を異性化することにより、カルボキシル
基の置換位置が異なる種々の芳香族性ジカルボン酸を製
造することができる。例えば、ナフタレン−1,8−ジ
カルボン酸の塩(例えば、ナトリウム塩、カリウム塩な
ど)を、不活性ガス(二酸化炭素など)雰囲気下、異性
化触媒(塩化カドミウムなど)と共に加熱すると、ナフ
タレン−2,6−ジカルボン酸が得られる(バイルシュ
タイン EIII9、4466頁(Raecke, Schirp, Or
g.Synth. 40 [1960] 71)参照)。本発明により得られ
る芳香族性ジカルボン酸は、種々の用途、例えばポリエ
ステルなどの合成樹脂の原料として使用できる。The aromatic dicarboxylic acid can be easily isolated from the reaction mixture by a conventional method such as filtration, concentration, distillation, extraction, crystallization, recrystallization, or column chromatography. By isomerizing the aromatic dicarboxylic acid thus obtained, various aromatic dicarboxylic acids having different carboxyl group substitution positions can be produced. For example, when a salt of naphthalene-1,8-dicarboxylic acid (eg, sodium salt, potassium salt, etc.) is heated together with an isomerization catalyst (eg, cadmium chloride) in an inert gas (eg, carbon dioxide) atmosphere, naphthalene-2 is obtained. , 6-dicarboxylic acid (Beilstein EIII9, p. 4466 (Raecke, Schirp, Or
g.Synth. 40 [1960] 71)). The aromatic dicarboxylic acid obtained by the present invention can be used for various uses, for example, as a raw material of a synthetic resin such as polyester.
【0030】[0030]
【発明の効果】本発明によると、温和な条件で芳香族性
縮合環化合物を酸化することができ、芳香族性ジカルボ
ン酸を簡便に且つ効率よく製造することができる。According to the present invention, an aromatic condensed ring compound can be oxidized under mild conditions, and an aromatic dicarboxylic acid can be easily and efficiently produced.
【0031】[0031]
【実施例】以下に、実施例に基づいて本発明をより詳細
に説明するが、本発明はこれらの実施例により限定され
るものではない。EXAMPLES The present invention will be described below in more detail with reference to Examples, but the present invention is not limited to these Examples.
【0032】実施例1 アセナフテン(2ミリモル)、N−ヒドロキシフタルイ
ミド(0.2ミリモル)、Mn(AA)2 (0.01ミ
リモル)、酢酸5mlの混合物を、酸素雰囲気下(1気
圧)、100℃で6時間撹拌したところ、転化率98
%、収率65モル%(アセナフテン基準)でナフタル酸
が得られた。Example 1 A mixture of acenaphthene (2 mmol), N-hydroxyphthalimide (0.2 mmol), Mn (AA) 2 (0.01 mmol), and acetic acid (5 ml) was treated under an oxygen atmosphere (1 atm) under an oxygen atmosphere (1 atm). After stirring at 6 ° C. for 6 hours, the conversion rate was 98%.
% And a yield of 65 mol% (based on acenaphthene) were obtained.
【0033】実施例2 酢酸5mlに代えて、酢酸2mlとベンゾニトリル3m
lを用いる以外、実施例1と同様にして反応させたとこ
ろ、転化率97%、収率70モル%(アセナフテン基
準)でナフタル酸が得られた。Example 2 Instead of 5 ml of acetic acid, 2 ml of acetic acid and 3 m of benzonitrile were used.
When the reaction was carried out in the same manner as in Example 1 except for using l, naphthalic acid was obtained with a conversion of 97% and a yield of 70 mol% (based on acenaphthene).
【0034】実施例3 酢酸5mlに代えて、酢酸2mlとトリフルオロメチル
ベンゼン3mlを用いる以外、実施例1と同様にして反
応させたところ、転化率95%、収率30モル%(アセ
ナフテン基準)でナフタル酸が得られた。Example 3 The reaction was carried out in the same manner as in Example 1 except that 2 ml of acetic acid and 3 ml of trifluoromethylbenzene were used instead of 5 ml of acetic acid. The conversion was 95% and the yield was 30 mol% (based on acenaphthene). Gave naphthalic acid.
【0035】実施例4 Mn(AA)2 に代えて、Co(AA)2 を用いる以
外、実施例1と同様にして反応させたところ、転化率9
9%、収率50モル%(アセナフテン基準)でナフタル
酸が得られた。Example 4 A reaction was conducted in the same manner as in Example 1 except that Co (AA) 2 was used instead of Mn (AA) 2.
Naphthalic acid was obtained in 9% at a yield of 50 mol% (based on acenaphthene).
Claims (4)
子、ハロゲン原子、アルキル基、アリール基、シクロア
ルキル基、ヒドロキシル基、アルコキシ基、カルボキシ
ル基、アルコキシカルボニル基、アシル基を示し、R1
及びR2 は互いに結合して二重結合、または芳香族性又
は非芳香族性の環を形成してもよい。Xは酸素原子又は
ヒドロキシル基を示し、nは1〜3の整数を示す。)で
表されるイミド化合物で構成される酸化触媒の存在下、
下記式(2) 【化2】 (式中、R3 〜R8 は、同一又は異なって、水素原子、
ハロゲン原子、アルキル基、アリール基、シクロアルキ
ル基、ヒドロキシル基、アルコキシ基を示し、R 3 〜R
8 のうち互いに隣接する少なくとも一対の基は、芳香族
環を形成していてもよい。mは0又は1を示す。)で表
される芳香族性縮合環化合物を分子状酸素と接触させ、
下記式(3) 【化3】 (式中、R3 〜R8 は、前記に同じ)で表される芳香族
性ジカルボン酸を製造する方法。[Claim 1] The following formula (1)(Where R1And RTwoAre the same or different
Atom, halogen atom, alkyl group, aryl group, cycloa
Alkyl group, hydroxyl group, alkoxy group, carboxy
R, alkoxycarbonyl, or acyl;1
And RTwoAre bonded to each other to form a double bond or an aromatic or
May form a non-aromatic ring. X is an oxygen atom or
A hydroxyl group is shown, and n shows the integer of 1-3. )so
In the presence of an oxidation catalyst composed of the imide compound represented,
The following formula (2)(Where RThree~ R8Are the same or different and are a hydrogen atom,
Halogen atom, alkyl group, aryl group, cycloalkyl
A hydroxyl group, an alkoxy group, Three~ R
8At least one pair of groups adjacent to each other is aromatic
It may form a ring. m represents 0 or 1. )
Contacting the aromatic fused ring compound with molecular oxygen,
The following formula (3)(Where RThree~ R8Is the same as defined above)
For producing a reactive dicarboxylic acid.
ン、アセナトレン、アセフェナントレン又はコラントレ
ンで構成される請求項1記載の芳香族性ジカルボン酸の
製造方法。2. The method for producing an aromatic dicarboxylic acid according to claim 1, wherein the aromatic condensed ring compound comprises acenaphthene, acenathrene, acephenanthrene or cholanthrene.
記載の芳香族性ジカルボン酸の製造方法。3. The oxidation catalyst according to claim 1, further comprising a promoter.
A method for producing the aromatic dicarboxylic acid according to the above.
の存在下、請求項1記載の芳香族性縮合環化合物を酸化
する方法。4. A method for oxidizing an aromatic fused ring compound according to claim 1, in the presence of the oxidation catalyst according to claim 1 and molecular oxygen.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP10081571A JPH11279112A (en) | 1998-03-27 | 1998-03-27 | Production of aromatic dicarboxylic acid |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP10081571A JPH11279112A (en) | 1998-03-27 | 1998-03-27 | Production of aromatic dicarboxylic acid |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| JPH11279112A true JPH11279112A (en) | 1999-10-12 |
Family
ID=13749999
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP10081571A Pending JPH11279112A (en) | 1998-03-27 | 1998-03-27 | Production of aromatic dicarboxylic acid |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JPH11279112A (en) |
Cited By (3)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| KR100974084B1 (en) | 2008-12-24 | 2010-08-06 | 호남석유화학 주식회사 | Method for producing benzenedicarboxylic acid |
| KR101297810B1 (en) * | 2011-11-28 | 2013-08-19 | 롯데케미칼 주식회사 | Preparation method of aromatic carboxylic acid |
| KR101373773B1 (en) * | 2011-11-28 | 2014-03-13 | 롯데케미칼 주식회사 | Preparation method of aromatic carboxylic acid |
-
1998
- 1998-03-27 JP JP10081571A patent/JPH11279112A/en active Pending
Cited By (3)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| KR100974084B1 (en) | 2008-12-24 | 2010-08-06 | 호남석유화학 주식회사 | Method for producing benzenedicarboxylic acid |
| KR101297810B1 (en) * | 2011-11-28 | 2013-08-19 | 롯데케미칼 주식회사 | Preparation method of aromatic carboxylic acid |
| KR101373773B1 (en) * | 2011-11-28 | 2014-03-13 | 롯데케미칼 주식회사 | Preparation method of aromatic carboxylic acid |
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