JPH11287637A - Transmission eccentricity measuring apparatus and method - Google Patents
Transmission eccentricity measuring apparatus and methodInfo
- Publication number
- JPH11287637A JPH11287637A JP10105378A JP10537898A JPH11287637A JP H11287637 A JPH11287637 A JP H11287637A JP 10105378 A JP10105378 A JP 10105378A JP 10537898 A JP10537898 A JP 10537898A JP H11287637 A JPH11287637 A JP H11287637A
- Authority
- JP
- Japan
- Prior art keywords
- lens system
- eccentricity
- detection sensor
- light beam
- transmission
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
Landscapes
- Length Measuring Devices By Optical Means (AREA)
Abstract
(57)【要約】
【課題】レンズ系の透過偏芯測定の際、収差の大きいレ
ンズ系や組立て途中のレンズ系であっても、スポットサ
イズが、確実に偏芯量検出センサー上で捉えられる透過
偏芯測定装置及び方法を提供する。
【解決手段】光源８から発した光束Ｔを焦点合わせレン
ズ系６、被検レンズ系１の順に透過させた後に集光レン
ズ２を介して偏芯量検出センサー４に入射させる透過偏
芯測定装置において、焦点合わせレンズ系６に入射する
光束Ｔのビーム径ｂの大きさを調整するビーム径調整手
段７を備えたことを特徴とする。
(57) [Problem] To measure the transmission eccentricity of a lens system, even if the lens system has a large aberration or a lens system being assembled, the spot size can be reliably detected on the eccentricity detection sensor. Provided is a transmission eccentricity measuring apparatus and method. A transmission eccentricity measuring device for transmitting a light beam (T) emitted from a light source (8) in the order of a focusing lens system (6) and a lens system (1) to be detected, and then entering a eccentricity detection sensor (4) via a condenser lens (2). , Is characterized in that a beam diameter adjusting means 7 for adjusting the beam diameter b of the light flux T incident on the focusing lens system 6 is provided.
Description
【０００１】[0001]
【発明の属する技術分野】本発明は、光学機器等に用い
られるレンズ系の透過偏芯を測定する透過偏芯測定装置
及び方法に関する。The present invention relates to a transmission eccentricity measuring apparatus and method for measuring transmission eccentricity of a lens system used for an optical instrument or the like.
【０００２】[0002]
【従来の技術】高精度の光学機器等に用いられるレンズ
系は、その結像上の問題が生じないように、極めて少な
い収差が要求されている。レンズ系を組立てる際、透過
偏芯測定装置にてレンズ系の透過偏芯を測定するが、そ
のレンズ系の収差が少ないものであれば、その少ない収
差を検出できるように、透過偏芯測定装置の分解能を高
くしなければならない。そのため従来より透過偏芯測定
装置は、光源から発した光束を、焦点合わせレンズ系、
被検レンズ系、集光レンズ、対物レンズの順に透過させ
た後に、偏芯量検出センサー上に高倍率で拡大投影して
いる。2. Description of the Related Art A lens system used in a high-precision optical apparatus or the like is required to have an extremely small aberration so as not to cause a problem in image formation. When assembling the lens system, the transmission eccentricity of the lens system is measured by the transmission eccentricity measuring device. If the aberration of the lens system is small, the transmission eccentricity measuring device is set so that the small aberration can be detected. Resolution must be increased. For this reason, a transmission eccentricity measuring apparatus conventionally uses a light beam emitted from a light source for a focusing lens system,
After passing through the test lens system, the condenser lens, and the objective lens in this order, the image is enlarged and projected at a high magnification on the eccentricity detection sensor.
【０００３】[0003]
【発明が解決しようとする課題】上記従来の技術は、測
定の分解能を高くするために、被検レンズ系を透過した
光束を、高倍率で偏芯量検出センサーに拡大投影してい
る。すなわち、偏芯量検出センサー上での光源の像の大
きさ（スポットサイズ）は、高倍率で拡大されたものに
なっている。このような高分解能の透過偏芯測定装置
で、たまたま収差が大きくなっているレンズ系等の透過
偏芯を測定する場合、その偏芯量検出センサー上での光
源の像（スポット）は、偏芯量検出センサーの受光面よ
り大きくなってしまって、測定ができないといったこと
が生じる。したがって本発明は、レンズ系の透過偏芯測
定の際、収差の大きいレンズ系や組立て途中のレンズ系
であっても、スポットサイズが、確実に偏芯量検出セン
サー上で捉えられる透過偏芯測定装置及び方法を提供す
ることを課題とする。In the above prior art, in order to increase the resolution of measurement, a light beam transmitted through a lens system to be inspected is enlarged and projected at a high magnification onto an eccentricity detection sensor. That is, the size (spot size) of the image of the light source on the eccentricity detection sensor is enlarged at a high magnification. When such a high-resolution transmission eccentricity measuring device measures transmission eccentricity of a lens system or the like that happens to have a large aberration, the image (spot) of the light source on the eccentricity detection sensor is eccentric. Measurement may not be possible due to the size being larger than the light receiving surface of the core amount detection sensor. Therefore, the present invention provides a transmission eccentricity measurement method in which a spot size can be reliably detected on an eccentricity detection sensor even in a lens system having a large aberration or a lens system being assembled during transmission eccentricity measurement of a lens system. It is an object to provide an apparatus and a method.
【０００４】[0004]
【課題を解決するための手段】本発明は上記課題を解決
するためになされたものであり、すなわち、添付図面に
付した符号をカッコ内に付記すると、本発明は、光源
（８）から発した光束（Ｔ）を焦点合わせレンズ系
（６）、被検レンズ系（１）の順に透過させた後に集光
レンズ（２）を介して偏芯量検出センサー（４）に入射
させる透過偏芯測定装置において、焦点合わせレンズ系
（６）に入射する光束（Ｔ）のビーム径（ｂ）の大きさ
を調整するビーム径調整手段（７）を備えたことを特徴
とする透過偏芯測定装置である。SUMMARY OF THE INVENTION The present invention has been made to solve the above-mentioned problem. That is, when the reference numerals in the attached drawings are added in parentheses, the present invention is realized from the light source (8). Transmitted eccentricity in which the light flux (T) is transmitted through the focusing lens system (6) and the lens system to be inspected (1) in this order, and then incident on the eccentricity detection sensor (4) via the condenser lens (2). A transmission eccentricity measuring apparatus characterized by comprising a beam diameter adjusting means (7) for adjusting a beam diameter (b) of a light beam (T) incident on a focusing lens system (6) in the measuring apparatus. It is.
【０００５】その際、被検レンズ系（１）と偏芯量検出
センサー（４）との間の光路に光束分割手段（９）を介
在させ、光束分割手段（９）で反射し又は透過した光束
（Ｔ）の一部を撮像手段（５）に入射させる構成とする
ことができる。また、被検レンズ系（１）と偏芯量検出
センサー（４）との間の光路に移動可能に平面鏡（１
０）を配置し、平面鏡（１０）で反射した光束（Ｔ）を
撮像手段（５）に入射させる構成とすることができる。At this time, a light beam splitting means (9) is interposed in an optical path between the lens system (1) to be detected and the eccentricity detection sensor (4), and the light beam is reflected or transmitted by the light beam splitting means (9). It is possible to adopt a configuration in which a part of the light beam (T) is made incident on the imaging means (5). Further, the plane mirror (1) is movable in the optical path between the lens system (1) to be detected and the eccentricity detection sensor (4).
0) is arranged, and the light beam (T) reflected by the plane mirror (10) can be made incident on the imaging means (5).
【０００６】また本発明は、光源（８）から発した光束
（Ｔ）を焦点合わせレンズ系（６）、被検レンズ系
（１）の順に透過させた後に集光レンズ（２）を介して
偏芯量検出センサー（４）に入射させることによって被
検レンズ系（１）の透過偏芯を測定する透過偏芯測定方
法において、焦点合わせレンズ系（６）に入射する光束
（Ｔ）のビーム径（ｂ）の大きさを調整するビーム径調
整手段（７）を設け、予めビーム径（ｂ）と偏芯量検出
センサー（４）上での光源（８）の像の大きさとの関係
を求める工程と、偏芯量検出センサー（４）上での光源
（８）の像が予め定めた既定値以下となるようにビーム
径（ｂ）を調整する工程とを有することを特徴とする透
過偏芯測定方法である。According to the present invention, a light beam (T) emitted from a light source (8) is transmitted through a focusing lens system (6) and a lens system to be inspected (1) in that order, and then passed through a condenser lens (2). In the transmission eccentricity measuring method for measuring the transmission eccentricity of the lens system to be detected (1) by making it incident on the eccentricity detection sensor (4), the beam of the light beam (T) incident on the focusing lens system (6) A beam diameter adjusting means (7) for adjusting the size of the diameter (b) is provided, and the relationship between the beam diameter (b) and the size of the image of the light source (8) on the eccentricity detection sensor (4) is determined in advance. Determining the beam diameter (b) so that the image of the light source (8) on the eccentricity detection sensor (4) is equal to or smaller than a predetermined value. This is an eccentricity measurement method.
【０００７】[0007]
【発明の実施の形態】本発明の実施の形態を図面によっ
て説明する。図１にて、本発明による透過偏芯測定装置
の第１実施例を示す。Ｈｅ−Ｃｄレーザー等の光源８よ
り発した平行光束は、ズームレンズ系７によって、拡縮
自在なビーム径ｂの平行光束に調整される。調整後の平
行光束は、焦点合わせレンズ系６を透過して、被検レン
ズ系１に入射する。ここで、焦点合わせレンズ系６は、
平行光束が被検レンズ系１の前側焦点に集光するように
調整される。また被検レンズ系１は、高精度のスピンド
ル（不図示）に取り付けられて、光軸周りに回転してい
る。Embodiments of the present invention will be described with reference to the drawings. FIG. 1 shows a first embodiment of a transmission eccentricity measuring apparatus according to the present invention. A parallel light beam emitted from a light source 8 such as a He-Cd laser is adjusted by the zoom lens system 7 into a parallel light beam having a beam diameter b that can be expanded and reduced. The adjusted parallel light beam passes through the focusing lens system 6 and enters the lens system 1 to be measured. Here, the focusing lens system 6 is
The parallel light beam is adjusted so as to be focused on the front focal point of the lens system 1 to be measured. The test lens system 1 is attached to a high-precision spindle (not shown) and rotates around the optical axis.
【０００８】被検レンズ系１を透過した後の光束Ｔは、
焦点合わせレンズ系６に入射するビーム径ｂに対応した
ビーム径ａの平行光束となり、集光レンズ２に入射す
る。集光レンズ２を透過した後の光束Ｔは、対物レンズ
３の物体面に集光する。対物レンズ３を透過した光束Ｔ
は、ハーフミラー９に入射する。ハーフミラー９に入射
した光束Ｔの一部の光束Ｔ1（例えば、入射光束に対し
て５０％の光量の光束）は、ハーフミラー９の光束分割
面で反射して、ＣＣＤカメラ５に入射する。これによ
り、対物レンズ３の物体面に形成された集光点の位置
が、ＣＣＤカメラ５に投影される。The light flux T transmitted through the lens system 1 is
A parallel light beam having a beam diameter a corresponding to the beam diameter b incident on the focusing lens system 6 is incident on the condenser lens 2. The light flux T transmitted through the condenser lens 2 is focused on the object surface of the objective lens 3. Light flux T transmitted through the objective lens 3
Enters the half mirror 9. A part of the light beam T 1 incident on the half mirror 9 (for example, a light beam having a light amount of 50% of the incident light beam) is reflected by the light beam splitting surface of the half mirror 9 and is incident on the CCD camera 5. . As a result, the position of the focal point formed on the object plane of the objective lens 3 is projected on the CCD camera 5.
【０００９】他方、ハーフミラー９に入射した光束Ｔの
うちの残りの光束Ｔ2は、ハーフミラー９を透過する。
ハーフミラー９を透過した光束Ｔ2は、偏芯量検出セン
サー４に入射する。これにより対物レンズ３の物体面に
形成された集光点の位置が、偏芯量検出センサー４に拡
大投影される。偏芯量検出センサー４としては、例えば
ＰＳＤを用いることができる。ここで、ＣＣＤカメラ５
の受光面は、偏芯量検出センサー４の受光面より大きく
なっている。以上の構成より成る透過偏芯測定装置は、
ＣＣＤカメラ５にて被検レンズ系１を透過した光束Ｔの
スポットを観察することができる。そしてスポットの観
察をしながら、ズームレンズ系７を操作して、偏芯量検
出センサー４上のスポットサイズが予め定めた既定値以
下となるように、例えば最小又は測定可能範囲内となる
ようにビーム径ｂを調整する。このように、収差の大き
いレンズ系や組立て途中のレンズ系であっても、被検レ
ンズ系１を透過した光束Ｔが形成するスポットが、確実
に偏芯量検出センサー４の受光面内にあり、測定の作業
性が良い透過偏芯測定装置を提供することができる。On the other hand, the remaining light beam T 2 of the light beam T incident on the half mirror 9 passes through the half mirror 9.
The light beam T 2 transmitted through the half mirror 9 enters the eccentricity detection sensor 4. As a result, the position of the focal point formed on the object plane of the objective lens 3 is enlarged and projected on the eccentricity detection sensor 4. For example, a PSD can be used as the eccentricity detection sensor 4. Here, the CCD camera 5
Is larger than the light receiving surface of the eccentricity detection sensor 4. The transmission eccentricity measuring device having the above configuration is
The spot of the light flux T transmitted through the test lens system 1 can be observed by the CCD camera 5. Then, while observing the spot, the zoom lens system 7 is operated so that the spot size on the eccentricity detection sensor 4 becomes equal to or less than a predetermined value, for example, the minimum or within the measurable range. Adjust the beam diameter b. As described above, even in a lens system having a large aberration or a lens system being assembled, the spot formed by the light flux T transmitted through the lens system 1 to be detected surely exists in the light receiving surface of the eccentricity detection sensor 4. In addition, it is possible to provide a transmission eccentricity measuring device with good measurement workability.
【００１０】なお、本第１実施例では、ビーム径調整手
段として、ズームレンズ系７を使用したが、その代りに
可変絞りを用いても良い。また、本第１実施例では、ハ
ーフミラー９の反射光路側にＣＣＤカメラ５を配置し、
透過光路側に偏芯量検出センサー４を配置したが、その
ハーフミラー９に対するＣＣＤカメラ５と偏芯量検出セ
ンサー４の配置を入れ換えても良い。また、ハーフミラ
ー９の配置位置を、本第１実施例では対物レンズ３と偏
芯量検出センサー４との間の光路に設けたが、被検レン
ズ系１と偏芯量検出センサー４との間の光路内であれ
ば、どこにでも配置することが可能である。Although the zoom lens system 7 is used as the beam diameter adjusting means in the first embodiment, a variable aperture may be used instead. Further, in the first embodiment, the CCD camera 5 is arranged on the reflection optical path side of the half mirror 9,
Although the eccentricity detection sensor 4 is arranged on the transmitted light path side, the arrangement of the CCD camera 5 and the eccentricity detection sensor 4 with respect to the half mirror 9 may be exchanged. In the first embodiment, the position of the half mirror 9 is provided on the optical path between the objective lens 3 and the eccentricity detection sensor 4. It can be placed anywhere within the optical path between them.
【００１１】次に、図２にて本発明による透過偏芯測定
装置の第２実施例を示す。本第２実施例と前記第１実施
例との違いは、第１実施例におけるハーフミラー９の代
わりに、平面鏡１０を挿脱可能に配置した点である。ま
ず、ビーム径ｂを調整するときには、平面鏡１０を対物
レンズ３と偏芯量検出センサー４との間の光路内に装着
する。そして、被検レンズ系１を透過した光束Ｔを、平
面鏡１０で反射させて、ＣＣＤカメラ５に入射させ、そ
のスポットを観察する。そのスポットサイズが、予め定
めた既定値以下となったら、ビーム径ｂを固定して、調
整作業を終了する。次に、実際に被検レンズ系１の透過
偏芯を測定するときには、平面鏡１０を装置の光路外へ
取り外す。そして、前記工程で固定したビーム径ｂによ
って、偏芯量検出センサー４上にスポットを形成して、
被検レンズ系１の透過偏芯を実測する。以上のように本
第２実施例によっても、前記第１実施例と同様の効果を
得ることができる。Next, FIG. 2 shows a second embodiment of the transmission eccentricity measuring apparatus according to the present invention. The difference between the second embodiment and the first embodiment is that, instead of the half mirror 9 in the first embodiment, a plane mirror 10 is arranged so as to be insertable and removable. First, when adjusting the beam diameter b, the plane mirror 10 is mounted in the optical path between the objective lens 3 and the eccentricity detection sensor 4. Then, the light flux T transmitted through the lens system 1 to be measured is reflected by the plane mirror 10 and made incident on the CCD camera 5 to observe the spot. When the spot size becomes equal to or smaller than a predetermined value, the beam diameter b is fixed, and the adjustment operation is completed. Next, when actually measuring the transmission eccentricity of the lens system 1 to be measured, the plane mirror 10 is removed outside the optical path of the apparatus. Then, a spot is formed on the eccentricity detection sensor 4 by the beam diameter b fixed in the above step,
The transmission eccentricity of the test lens system 1 is actually measured. As described above, according to the second embodiment, the same effects as those of the first embodiment can be obtained.
【００１２】次に、図３にて本発明による透過偏芯測定
方法の一実施例を示す。本実施例に用いる装置の構成
は、前記第１実施例の透過偏芯測定装置からハーフミラ
ー９とＣＣＤカメラ５とを取り外したものである。そし
て、予めビーム径ｂと偏芯量検出センサー４上のスポッ
トサイズとの関係を求め、スポットサイズが予め定めた
既定値以下となるようにズームレンズ系７を操作して、
ビーム径ｂを調整する。以下詳しく説明する。まず、集
光レンズ２入射前の光束Ｔのビーム径ａと偏芯量検出セ
ンサー４上のスポット径ｄ1との関係は、次のような多
項近似式で表すことができる。 但し、ｋ0〜ｋn：レンズ係数 上式のレンズ係数ｋ0〜ｋnを、最小二乗法によって導
く。Next, FIG. 3 shows an embodiment of the transmission eccentricity measuring method according to the present invention. The configuration of the apparatus used in this embodiment is such that the half mirror 9 and the CCD camera 5 are removed from the transmission eccentricity measuring apparatus of the first embodiment. Then, the relationship between the beam diameter b and the spot size on the eccentricity detection sensor 4 is obtained in advance, and the zoom lens system 7 is operated so that the spot size becomes equal to or smaller than a predetermined value.
Adjust the beam diameter b. This will be described in detail below. First, the relationship between the beam diameter a of the light flux T before entering the condenser lens 2 and the spot diameter d 1 on the eccentricity detection sensor 4 can be expressed by the following polynomial approximation. However, k 0 to k n: the lens coefficient k 0 to k n of the upper lens coefficient equation, leads by the least squares method.
【００１３】ここで、ビーム径ｂが小さい場合、回折の
影響により、そのスポットサイズは逆に大きくなるとい
う現象が生じる。そのため回折によるスポット径ｄ2も
考慮して、ビーム径ｂを調整しなければならない。ビー
ム径ａとスポット径ｄ2との関係は、 但し、λ：光束の波長 ｆ：集光レンズ２の焦点距離 Ａ：対物レンズ３の倍率 となる。したがって、（１）式で求まるスポット径ｄ1
に、上記（２）式で求まる回折によるスポット径ｄ2を
加えたスポットサイズが、予め定めた既定値以下となる
ようにビーム径ｂを決めてやれば良い。Here, when the beam diameter b is small, there occurs a phenomenon that the spot size becomes larger due to the influence of diffraction. Therefore, the beam diameter b must be adjusted in consideration of the spot diameter d 2 due to diffraction. The relationship between the beam diameter a and the spot diameter d 2 is Here, λ: wavelength of light beam f: focal length of condenser lens 2 A: magnification of objective lens 3 Therefore, the spot diameter d 1 obtained by the equation (1)
In the above (2) spot size plus the spot diameter d 2 by diffraction determined by the expression, may do it decide beam diameter b to be equal to or less than predetermined value determined in advance.
【００１４】ここで、被検レンズ系１を透過した後のビ
ーム径ａと焦点合わせレンズ系６に入射する前のビーム
径ｂとの関係は、被検レンズ系１と焦点合わせレンズ系
６の焦点距離によって求まるので、スポット径を予め定
めた既定値以下とするビーム径ｂも求まる。そして、求
めたビーム径ｂとなるようにズームレンズ系７を操作す
る。以上ように本実施例では、被検レンズ系１を透過し
た光束Ｔが形成するスポットが、確実に偏芯量検出セン
サー４の受光面内にある透過偏芯測定方法を提供するこ
とができる。Here, the relationship between the beam diameter a after passing through the lens system 1 to be tested and the beam diameter b before entering the focusing lens system 6 is the relationship between the lens system 1 and the focusing lens system 6. Since it is determined by the focal length, the beam diameter b that makes the spot diameter equal to or smaller than a predetermined value is also determined. Then, the zoom lens system 7 is operated so that the obtained beam diameter b is obtained. As described above, in the present embodiment, it is possible to provide a transmission eccentricity measuring method in which the spot formed by the light flux T transmitted through the lens system 1 to be detected is reliably within the light receiving surface of the eccentricity detection sensor 4.
【００１５】[0015]
【発明の効果】以上のように本発明では、レンズ系の透
過偏芯測定の際、収差の大きいレンズ系や組立て途中の
レンズ系であっても、スポットサイズが、回折による影
響を含め、確実に偏芯量検出センサー上で予め定めた既
定値以下となるような透過偏芯測定装置を提供すること
ができる。その結果、測定の作業性が良く高分解能であ
る透過偏芯測定装置及び方法を提供することができる。As described above, according to the present invention, when the transmission eccentricity of the lens system is measured, even if the lens system has a large aberration or the lens system is being assembled, the spot size including the influence of the diffraction can be ensured. In addition, it is possible to provide a transmission eccentricity measuring device that is equal to or less than a predetermined value on an eccentricity detecting sensor. As a result, it is possible to provide a transmission eccentricity measuring apparatus and method having good workability of measurement and high resolution.
【図１】本発明の第１実施例による透過偏芯測定装置を
示す概略図である。FIG. 1 is a schematic view showing a transmission eccentricity measuring apparatus according to a first embodiment of the present invention.
【図２】本発明の第２実施例による透過偏芯測定装置を
示す概略図である。FIG. 2 is a schematic view showing a transmission eccentricity measuring apparatus according to a second embodiment of the present invention.
【図３】本発明の一実施例による透過偏芯測定方法に用
いる装置の概略図である。FIG. 3 is a schematic view of an apparatus used for a transmission eccentricity measuring method according to an embodiment of the present invention.
１…被検レンズ系 ２…集光レンズ ３…対物レンズ ４…偏芯量検出セン
サー ５…ＣＣＤカメラ ６…焦点合わせレン
ズ系 ７…ズームレンズ系 ８…光源 ９…ハーフミラー １０…平面鏡 Ｔ…光束DESCRIPTION OF SYMBOLS 1 ... Test lens system 2 ... Condensing lens 3 ... Objective lens 4 ... Eccentricity detection sensor 5 ... CCD camera 6 ... Focusing lens system 7 ... Zoom lens system 8 ... Light source 9 ... Half mirror 10 ... Plane mirror T ... Light flux
Claims (6)
系、被検レンズ系の順に透過させた後に集光レンズを介
して偏芯量検出センサーに入射させる透過偏芯測定装置
において、 前記焦点合わせレンズ系に入射する光束のビーム径の大
きさを調整するビーム径調整手段を備えたことを特徴と
する透過偏芯測定装置。1. A transmission eccentricity measuring apparatus for transmitting a light beam emitted from a light source in the order of a focusing lens system and a lens system to be detected, and then entering the eccentricity detection sensor via a condenser lens. A transmission eccentricity measuring device comprising a beam diameter adjusting means for adjusting a beam diameter of a light beam incident on a lens system.
形成されたことを特徴とする請求項１記載の透過偏芯測
定装置。2. A transmission eccentricity measuring apparatus according to claim 1, wherein said beam diameter adjusting means is formed by a zoom lens.
されたことを特徴とする請求項１記載の透過偏芯測定装
置。3. The transmission eccentricity measuring apparatus according to claim 1, wherein said beam diameter adjusting means is formed by a variable stop.
の間の光路に光束分割手段を介在させ、該光束分割手段
で反射し又は透過した前記光束の一部を撮像手段に入射
させたことを特徴とする請求項１、２又は３記載の透過
偏芯測定装置。4. A light beam splitting means is interposed in an optical path between the lens system to be detected and an eccentricity detection sensor, and a part of the light beam reflected or transmitted by the light beam splitting means is made incident on an image pickup means. The transmission eccentricity measuring device according to claim 1, 2 or 3, wherein:
の間の光路に移動可能に平面鏡を配置し、該平面鏡で反
射した前記光束を撮像手段に入射させたことを特徴とす
る請求項１、２又は３記載の透過偏芯測定装置。5. A device according to claim 1, wherein a plane mirror is movably disposed in an optical path between said lens system to be detected and said eccentricity detection sensor, and said light beam reflected by said plane mirror is incident on an image pickup means. Item 6. The transmission eccentricity measuring device according to Item 1, 2 or 3.
系、被検レンズ系の順に透過させた後に集光レンズを介
して偏芯量検出センサーに入射させることによって前記
被検レンズ系の透過偏芯を測定する透過偏芯測定方法に
おいて、 前記焦点合わせレンズ系に入射する光束のビーム径の大
きさを調整するビーム径調整手段を設け、 予め前記ビーム径と前記偏芯量検出センサー上での光源
の像の大きさとの関係を求める工程と、 前記偏芯量検出センサー上での光源の像が予め定めた既
定値以下となるように前記ビーム径を調整する工程とを
有することを特徴とする透過偏芯測定方法。6. A light beam emitted from a light source is transmitted through a focusing lens system and a lens system to be inspected in that order, and then is incident on an eccentricity detection sensor via a condenser lens to thereby transmit a light beam transmitted through the lens system to be inspected. In a transmission eccentricity measuring method for measuring a core, a beam diameter adjusting means for adjusting a beam diameter of a light beam incident on the focusing lens system is provided, and the beam diameter and the eccentricity amount detection sensor are provided in advance. Determining a relationship between the size of the image of the light source and adjusting the beam diameter such that the image of the light source on the eccentricity detection sensor is equal to or less than a predetermined value. Transmission eccentricity measurement method.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP10105378A JPH11287637A (en) | 1998-03-31 | 1998-03-31 | Transmission eccentricity measuring apparatus and method |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP10105378A JPH11287637A (en) | 1998-03-31 | 1998-03-31 | Transmission eccentricity measuring apparatus and method |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| JPH11287637A true JPH11287637A (en) | 1999-10-19 |
Family
ID=14406032
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP10105378A Pending JPH11287637A (en) | 1998-03-31 | 1998-03-31 | Transmission eccentricity measuring apparatus and method |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JPH11287637A (en) |
Cited By (3)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US7204167B2 (en) | 2002-07-03 | 2007-04-17 | Nsk Ltd. | Motor-driven power steering apparatus |
| CN111174750A (en) * | 2020-02-19 | 2020-05-19 | 黑龙江工业学院 | Pipe fitting lateral wall straightness accuracy measuring tool |
| CN118033888A (en) * | 2024-03-28 | 2024-05-14 | 无锡埃瑞微半导体设备有限责任公司 | A variable-focus microscope imaging device for wafer overlay measurement |
-
1998
- 1998-03-31 JP JP10105378A patent/JPH11287637A/en active Pending
Cited By (4)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US7204167B2 (en) | 2002-07-03 | 2007-04-17 | Nsk Ltd. | Motor-driven power steering apparatus |
| CN111174750A (en) * | 2020-02-19 | 2020-05-19 | 黑龙江工业学院 | Pipe fitting lateral wall straightness accuracy measuring tool |
| CN111174750B (en) * | 2020-02-19 | 2021-04-13 | 黑龙江工业学院 | A tool for measuring the straightness of the outer wall of a pipe fitting |
| CN118033888A (en) * | 2024-03-28 | 2024-05-14 | 无锡埃瑞微半导体设备有限责任公司 | A variable-focus microscope imaging device for wafer overlay measurement |
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