JPH11320743A5 - - Google Patents
Info
- Publication number
- JPH11320743A5 JPH11320743A5 JP1998128780A JP12878098A JPH11320743A5 JP H11320743 A5 JPH11320743 A5 JP H11320743A5 JP 1998128780 A JP1998128780 A JP 1998128780A JP 12878098 A JP12878098 A JP 12878098A JP H11320743 A5 JPH11320743 A5 JP H11320743A5
- Authority
- JP
- Japan
- Prior art keywords
- substrate
- coating
- transparent member
- increase
- contact angle
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP10128780A JPH11320743A (ja) | 1998-05-12 | 1998-05-12 | 透明部材 |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP10128780A JPH11320743A (ja) | 1998-05-12 | 1998-05-12 | 透明部材 |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| JPH11320743A JPH11320743A (ja) | 1999-11-24 |
| JPH11320743A5 true JPH11320743A5 (pl) | 2005-09-29 |
Family
ID=14993287
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP10128780A Pending JPH11320743A (ja) | 1998-05-12 | 1998-05-12 | 透明部材 |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JPH11320743A (pl) |
Families Citing this family (12)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CA2421538C (en) * | 2002-03-18 | 2007-11-20 | Hoya Corporation | Optical member and process for producing it and thin films |
| AU2005200563B2 (en) * | 2002-03-18 | 2007-07-26 | Hoya Corporation | Optical member, process of producing optical member, and process of producing thin film |
| JP2006350208A (ja) * | 2005-06-20 | 2006-12-28 | Seiko Epson Corp | 光学物品およびその製造方法 |
| DE102008002193A1 (de) | 2007-08-29 | 2009-03-05 | Carl Zeiss Smt Ag | Optisches Element mit hydrophober Oberfläche und Projektionsbelichtungsanlage für die Immersionslithographie damit |
| JP5267798B2 (ja) * | 2009-02-17 | 2013-08-21 | 日産自動車株式会社 | 耐擦傷性撥水構造及び耐擦傷性撥水構造体 |
| JP2010251745A (ja) * | 2009-04-10 | 2010-11-04 | Asml Netherlands Bv | 液浸リソグラフィ装置及びデバイス製造方法 |
| JP2012185348A (ja) * | 2011-03-07 | 2012-09-27 | Seiko Epson Corp | レンズ及びレンズの製造方法 |
| JP6360660B2 (ja) * | 2013-05-23 | 2018-07-18 | 日揮触媒化成株式会社 | 反射防止膜付基材およびその製造方法 |
| DE102016203714A1 (de) | 2016-03-08 | 2016-04-28 | Carl Zeiss Smt Gmbh | Optische Anordnung für die Lithographie, insbesondere Projektionsbelichtungsanlage |
| WO2022185557A1 (ja) * | 2021-03-05 | 2022-09-09 | ナルックス株式会社 | ガラス基板に微細凹凸表面構造を製造する方法 |
| TWI812422B (zh) | 2022-03-24 | 2023-08-11 | 大立光電股份有限公司 | 成像鏡頭、相機模組及電子裝置 |
| TWI844959B (zh) | 2022-05-13 | 2024-06-11 | 大立光電股份有限公司 | 成像鏡頭、相機模組及電子裝置 |
-
1998
- 1998-05-12 JP JP10128780A patent/JPH11320743A/ja active Pending
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