JPH11347491A - Classification filter - Google Patents

Classification filter

Info

Publication number
JPH11347491A
JPH11347491A JP15759598A JP15759598A JPH11347491A JP H11347491 A JPH11347491 A JP H11347491A JP 15759598 A JP15759598 A JP 15759598A JP 15759598 A JP15759598 A JP 15759598A JP H11347491 A JPH11347491 A JP H11347491A
Authority
JP
Japan
Prior art keywords
length
classification
filter
longitudinal direction
opening
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP15759598A
Other languages
Japanese (ja)
Other versions
JP4216365B2 (en
Inventor
Osamu Nagasaki
崎 修 長
Fumio Sekiguchi
口 文 夫 関
Makoto Matsuo
尾 誠 松
Katsuhiko Nakamae
前 勝 彦 中
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Dai Nippon Printing Co Ltd
Original Assignee
Dai Nippon Printing Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Dai Nippon Printing Co Ltd filed Critical Dai Nippon Printing Co Ltd
Priority to JP15759598A priority Critical patent/JP4216365B2/en
Publication of JPH11347491A publication Critical patent/JPH11347491A/en
Application granted granted Critical
Publication of JP4216365B2 publication Critical patent/JP4216365B2/en
Anticipated expiration legal-status Critical
Expired - Fee Related legal-status Critical Current

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Abstract

PROBLEM TO BE SOLVED: To improve both of classification efficiency and classification accuracy by consisting of the plane shape of the apertures of respective holes of a slender shape having a first length in a longitudinal direction and a second length in a short side direction orthogonal with this longitudinal direction. SOLUTION: This filter for classification is constituted by forming apertures 2 of respective holes over an entire surface of a base plate 1. The plane shape of the apertures 2 of the respective holes of the filter consists of the slender shape (rectangular shape) having the first length (a) in the longitudinal direction and the second length (b) in the short side direction orthogonal with the longitudinal direction. The second length (b) in the short side direction of the respective holes has the grain size of the granular material to be classified or the length near the same. Further, the first length (a) in the longitudinal direction of the apertures 2 preferably has the length at which the particles failing to pass the apertures 2 are rollable or movable along the longitudinal direction of the apertures 2. More specifically, the ratio of the first (a) of the apertures 2 to the second length (b) is preferably >=2, more preferably 100 to 1,000.

Description

【発明の詳細な説明】DETAILED DESCRIPTION OF THE INVENTION

【0001】[0001]

【発明の属する技術分野】本発明は、微細粒状物を篩い
分け(ろ過)し分級するためのフィルターに関し、特に
分級効率と分級精度の双方にすぐれた金属フィルターに
関するものである。
BACKGROUND OF THE INVENTION 1. Field of the Invention The present invention relates to a filter for sieving (filtering) fine particulate matter and classifying the same, and more particularly to a metal filter excellent in both classification efficiency and classification accuracy.

【0002】[0002]

【従来の技術】真球ないしこれに近い粒子を高精度に分
級する方法としては、従来、水系の溶媒に分級すべき粒
状物を分散させたのちこれを沈降させることによって分
級を行う沈降法が主流である。これは、微細粒子を目詰
まりを起こすことなく効率的に分級し得るフィルターが
従来知られていなかったからである。
2. Description of the Related Art Conventionally, as a method for classifying a true sphere or particles close to the sphere with high accuracy, a sedimentation method is known in which a particulate material to be classified is dispersed in an aqueous solvent and then sedimented to perform classification. Mainstream. This is because a filter capable of efficiently classifying fine particles without causing clogging has not been known.

【0003】たとえば、従来知られているメンブレンフ
ィルターやサーフェスフィルターを用いる精密ろ過法に
おいては、フィルターの目詰まりが起こりやすく、この
ため分級効率はいきおい低下する。また、このろ過法と
逆洗などによる方法を併用したとしても、逆洗操作によ
る効率低下を解消する術はない。このようなフィルター
を用いる分級における効率低下の問題は、粒子の粒径分
布が比較的狭い場合において特に顕著となる。
[0003] For example, in a conventionally known microfiltration method using a membrane filter or a surface filter, clogging of the filter is liable to occur, and the classification efficiency is greatly reduced. Even if this filtration method is used in combination with a method such as backwashing, there is no way to eliminate the decrease in efficiency due to the backwashing operation. Such a problem of efficiency reduction in classification using a filter is particularly remarkable when the particle size distribution of the particles is relatively narrow.

【0004】一方、従来主流である沈降法による方法で
は、分級に長時間を要するため、やはり分級効率がいき
おい低下し、製造コストの点でも不利となる。
[0004] On the other hand, in the method based on the sedimentation method, which is the mainstream in the past, the classification requires a long time, so that the classification efficiency is greatly reduced, and the production cost is disadvantageous.

【0005】また、沈降法に遠心分離法を併用すること
によって、分級速度を向上させることは可能であるが、
遠心分離法の採用は逆に分級粒子の粒径分布を広くし、
このため分級精度が低下するという問題がある。
[0005] In addition, it is possible to improve the classification speed by using the centrifugal separation method together with the sedimentation method.
Conversely, the use of centrifugal separation broadens the particle size distribution of the classified particles,
For this reason, there is a problem that classification accuracy is reduced.

【0006】なお、従来、沈降法においては、使用する
溶媒の種類の選定あるいは複数の溶媒の組合せ等により
沈降速度を増大させて効率を向上させる方法も提案され
ているが、この場合においても粒径分布が広くなるとい
う問題は依然としてあり、分級精度の向上の点において
は必ずしも有効な方法とはいえない。
Conventionally, in the sedimentation method, a method of increasing the sedimentation speed by selecting the type of a solvent to be used or a combination of a plurality of solvents to improve the efficiency has been proposed. There is still a problem that the diameter distribution is widened, and it is not always an effective method for improving classification accuracy.

【0007】[0007]

【発明が解決しようとする課題】本発明は、上述した従
来技術の問題点に鑑みてなされたものであり、分級効率
と分級精度の双方の向上が図れた分級用フィルターを提
供することを目的とするものである。
SUMMARY OF THE INVENTION The present invention has been made in view of the above-mentioned problems of the prior art, and has as its object to provide a classification filter having improved classification efficiency and classification accuracy. It is assumed that.

【0008】[0008]

【課題を解決するための手段】上記の課題を解決するた
めに、本発明は、多数孔が形成された基板からなる、粒
状物を分級するための分級用フィルターであって、前記
各孔の開口部の平面形状が、長手方向の第1長さとこの
長手方向に直交する短手方向の第2長さとを有する細長
状からなることを特徴とするものである。
According to the present invention, there is provided a classifying filter for classifying particulate matter, comprising a substrate having a plurality of holes formed therein. The planar shape of the opening is characterized by having an elongated shape having a first length in a longitudinal direction and a second length in a transverse direction orthogonal to the longitudinal direction.

【0009】このように、本発明による分級用フィルタ
ーにおいては、フィルターの各孔の開口部の形状が細長
状であるので、分級されるべき粒子が迅速に開口部を通
過するとともに、通過しなかった大きな粒子は開口部の
長手方向の溝に沿って転動することができるので、大き
な粒子による目詰まりの発生を効果的に防止することが
できる。
As described above, in the classification filter according to the present invention, since the shape of the opening of each hole of the filter is elongated, the particles to be classified quickly pass through the opening and do not pass through. Since the large particles can roll along the grooves in the longitudinal direction of the opening, clogging due to the large particles can be effectively prevented.

【0010】[0010]

【発明の実施の形態】本発明による分級法フィルター
は、多数孔が形成された基板からなる、粒状物を分級す
るための分級用フィルターであって、前記各孔の開口部
の平面形状が、長手方向の第1長さとこの長手方向に直
交する短手方向の第2長さとを有する細長状からなるこ
とを特徴としている。
BEST MODE FOR CARRYING OUT THE INVENTION A classifying filter according to the present invention is a classifying filter for classifying particulate matter, comprising a substrate on which a number of holes are formed, wherein the planar shape of the opening of each hole is as follows: It is characterized by having an elongated shape having a first length in a longitudinal direction and a second length in a short direction orthogonal to the longitudinal direction.

【0011】図1はこの分級用フィルターの平面図であ
り、基板1の全面にわたってフィルターの開口部2が形
成されている。
FIG. 1 is a plan view of the classifying filter, in which an opening 2 of the filter is formed over the entire surface of a substrate 1.

【0012】基板の材質は特に限定されないが、後述す
るような電着法によってフィルターを製造する場合にお
いては、電着特性、耐久性、製造効率の点から金属が好
ましく用いられ得る。具体的には、ニッケル、ニッケル
コバルト合金、リンニッケル、ニッケルパラジウム合
金、銀、銅、金などの金属が好ましく用いられ得る。ま
た、通常のフォトリソグラフ法等によって製造する場合
においては、耐食性、剛性にすぐれたステンレス、アル
ミニウム、チタンなどの金属が好ましく用いられ得る。
Although the material of the substrate is not particularly limited, when a filter is manufactured by an electrodeposition method as described later, a metal can be preferably used in terms of electrodeposition characteristics, durability, and manufacturing efficiency. Specifically, metals such as nickel, nickel-cobalt alloy, phosphorus nickel, nickel-palladium alloy, silver, copper, and gold can be preferably used. In the case of manufacturing by a usual photolithography method or the like, metals such as stainless steel, aluminum, and titanium having excellent corrosion resistance and rigidity can be preferably used.

【0013】図2に開口部2の平面形状を拡大して示
す。図2に示すように、本発明においては、フィルター
各孔の開口部2が長手方向の第1長さaとこれに直交す
る短手方向の第2長さbとを有する細長状(長方形)の
形状を有している。本発明のフィルターにおいては、各
孔の短手方向の第2長さbは、分級されるべき粒状物の
粒径ないしその近傍の長さを有する。さらに、開口部の
長手方向の第1長さ21は、該開口部を通過できない粒
子が開口部の長手方向に沿って転動ないし移動し得る長
さを有することが好ましい。具体的には、開口部の第1
長さaの第2長さbに対する比が2以上、さらに100
〜1000であることが好ましい。
FIG. 2 shows an enlarged plan view of the opening 2. As shown in FIG. 2, in the present invention, the opening 2 of each filter hole has an elongated shape (rectangle) having a first length a in the longitudinal direction and a second length b in the transverse direction orthogonal to the first length a. It has the shape of In the filter of the present invention, the second length b in the lateral direction of each hole has the particle size of the granular material to be classified or a length in the vicinity thereof. Further, it is preferable that the first length 21 in the longitudinal direction of the opening has a length that allows particles that cannot pass through the opening to roll or move along the longitudinal direction of the opening. Specifically, the first of the openings
The ratio of the length a to the second length b is 2 or more, further 100
It is preferably from 1,000 to 1,000.

【0014】これらの図に示すように、フィルターの各
孔は、通常、基板に縦横方向に規則的に配列されてなる
が、本発明はこのようなパターンのみに限定されるもの
ではない。たとえば、粒状物の種類、サイズ、あるいは
流動傾向、さらにはフィルターの適用形態等に応じて適
宜変更することができる。
As shown in these figures, the holes of the filter are usually regularly arranged in the vertical and horizontal directions on the substrate, but the present invention is not limited to only such a pattern. For example, it can be appropriately changed according to the type, size, or flow tendency of the granular material, and the application form of the filter.

【0015】また、本発明の分級用フィルターの開口率
(フィルターとして機能する基板の面の面積に対する開
口部の全面積の割合)は、分級の対象となる粒状物のサ
イズ、種類、物性に応じて適宜選択することができる
が、通常、10〜60%程度であることが好ましい。
The aperture ratio (the ratio of the total area of the openings to the surface area of the substrate functioning as a filter) of the classification filter of the present invention depends on the size, type, and physical properties of the granular material to be classified. Can be selected as appropriate, but is usually preferably about 10 to 60%.

【0016】本発明においては、フィルター開口部の断
面形状は特に限定されないが、粒子の通過のし易さ、通
過できなかった粒子の長手方向への転動のし易さを考慮
して決定することができる。これらの点を考慮して、た
とえば、図3、図4および図5に示すように、各孔の短
手方向の断面形状において、基板の両面または少なくと
も片面が最狭部に対して広くなっていることが好まし
い。
In the present invention, the cross-sectional shape of the filter opening is not particularly limited, but is determined in consideration of the ease with which particles can pass and the ease with which particles that cannot pass can roll in the longitudinal direction. be able to. In consideration of these points, for example, as shown in FIGS. 3, 4 and 5, in the cross-sectional shape in the short direction of each hole, both sides or at least one side of the substrate is wider than the narrowest portion. Is preferred.

【0017】また、フィルターの厚さも目的に応じて適
宜選択され得るが、通常、10〜50μmが好ましい。
The thickness of the filter can be appropriately selected according to the purpose, but is usually preferably 10 to 50 μm.

【0018】次に、本発明による分級用フィルターの製
造方法について説明する。
Next, a method for producing a classification filter according to the present invention will be described.

【0019】本発明による分級用フィルターは、たとえ
ば、電着用基板上に、フィルター開口部を形成するため
のレジストパターンを形成し、レジスト部以外の基板上
に電着によって金属層を形成し、さらにこのようにして
形成された電着金属層を基板から剥離することによって
所定の開口パターンが形成された本発明の分級用フィル
ターを得ることができる。
In the classification filter according to the present invention, for example, a resist pattern for forming a filter opening is formed on a substrate for electrodeposition, and a metal layer is formed on a substrate other than the resist portion by electrodeposition. By separating the electrodeposited metal layer thus formed from the substrate, a classification filter of the present invention in which a predetermined opening pattern is formed can be obtained.

【0020】また、上記製造方法において、電着用基板
から電着金属層を剥離したのち、さらにその剥離物の表
裏両面および開口部の内壁面に電着によって所定の金属
被覆層を形成することによって、開口部の断面形状が糸
巻状のフィルターを得ることもできる。
Further, in the above manufacturing method, after the electrodeposited metal layer is peeled from the electrodeposition substrate, a predetermined metal coating layer is formed by electrodeposition on both the front and back surfaces of the peeled material and the inner wall surface of the opening. In addition, a filter in which the cross-sectional shape of the opening is a thread winding shape can be obtained.

【0021】図6は、電着法による本発明のフィルター
の製造方法を示す工程断面図である。図6(a)に示す
ように、電着用基板21上に、レジストをスピンナー
法、ロールコート法、浸漬引上げ法などの塗布方法によ
って均一に塗布し、加熱乾燥を施すことによりレジスト
層22を形成する。上記の他に、特定のレジストフィル
ムを熱ロールによりラミネートしてレジスト層を形成す
ることもできる。
FIG. 6 is a process sectional view showing a method of manufacturing the filter of the present invention by an electrodeposition method. As shown in FIG. 6A, a resist is uniformly applied on a substrate 21 for electrodeposition by an application method such as a spinner method, a roll coating method, and a dipping and pulling method, and is heated and dried to form a resist layer 22. I do. In addition to the above, a specific resist film may be laminated with a hot roll to form a resist layer.

【0022】電着用基板21としては、ステンレス板、
ニッケル板、銅板、リン青銅板、黄銅板などの金属板や
平面性の良好な石英板やガラス板上にステンレス、ニッ
ケル銅、酸化スズ、酸化インジウムなどのメッキ可能な
薄膜を蒸着法やスパッタ法などの方法で形成したものが
使用できる。この場合の基板の厚みは、0.1mm〜3mm
程度が望ましい。レジスト材としては、ゴム系レジス
ト、PVA系レジスト、ケイ皮酸系レジスト、カゼイン
系レジスト、アクリル系レジストなどのネガレジストや
ノボラック系などのポジ型レジストを使用することがで
きる。
As the electrodeposition substrate 21, a stainless steel plate,
A metallized plate such as a nickel plate, a copper plate, a phosphor bronze plate, a brass plate, or a quartz plate or a glass plate having good flatness, and a thin film that can be plated such as stainless steel, nickel copper, tin oxide, or indium oxide is deposited or sputtered. A method formed by such a method can be used. In this case, the thickness of the substrate is 0.1 mm to 3 mm.
A degree is desirable. As the resist material, a negative resist such as a rubber-based resist, a PVA-based resist, a cinnamic acid-based resist, a casein-based resist, an acrylic resist, or a positive resist such as a novolak-based resist can be used.

【0023】次いで、図5(b)に示すように、レジス
ト層に所望のパターン23を形成したマスク24を密着
または一定間隔を介して重ね合わせ、電離放射線25を
照射する。この場合の、当然のことであるが、ネガレジ
ストを使用する場合のマスクは、所望の孔部は電離放射
線が通過するようパターンを形成し、ポジレジストを使
用する場合はこの孔部は電離放射線を遮蔽するようなポ
ジパターンを形成したものと使用する。
Next, as shown in FIG. 5B, a mask 24 having a desired pattern 23 formed on the resist layer is closely adhered or overlapped at a fixed interval, and irradiated with ionizing radiation 25. In this case, it is a matter of course that the mask in the case of using a negative resist forms a pattern so that ionizing radiation passes through a desired hole, and in the case of using a positive resist, the mask forms a pattern of ionizing radiation. Used with a positive pattern formed to block the light.

【0024】続いて、所定の現像液で現像し、所定のリ
ンス液でリンスして、乾燥し、さらにレジスト膜を硬化
するポストベークを行う。さらに、図6(d)に示すよ
うに、電着手段、たとえば電気メッキにより、たとえば
ニッケルの電着を所望の厚さまで行い、電着による薄板
層(ニッケルメッキ層)26を形成する。この場合、メ
ッキ層がレジストパターンよりも盛り上がるように電着
させることによって、一方の開口部がなだらかな漏斗状
の開口部を形成することができる。最後に、このニッケ
ルメッキ層26を基板から剥離して、図5(e)に示す
ように所望の開口部27が形成された本発明の分級用フ
ィルターを得ることができる。
Subsequently, the film is developed with a predetermined developing solution, rinsed with a predetermined rinsing liquid, dried, and further subjected to post-baking for hardening the resist film. Further, as shown in FIG. 6D, for example, nickel is electrodeposited to a desired thickness by electrodeposition means, for example, electroplating, and a thin plate layer (nickel plating layer) 26 is formed by electrodeposition. In this case, by performing electrodeposition so that the plating layer is raised above the resist pattern, a funnel-shaped opening having one gentle opening can be formed. Finally, the nickel plating layer 26 is peeled from the substrate to obtain a classification filter of the present invention in which a desired opening 27 is formed as shown in FIG.

【0025】本発明の分級用フィルターは上記の電着法
の他に、金属薄板に通常のフォトレジスト法を適用する
ことによって所定の開口パターンを形成することによっ
ても製造することができる。
The classification filter of the present invention can be manufactured by forming a predetermined opening pattern by applying a normal photoresist method to a thin metal plate in addition to the above-described electrodeposition method.

【0026】本発明による分級用フィルターは、これを
複数段組み合わせて構成することによって、分級精度を
向上させたり、あるいは異なる粒径の粒状物を同時に分
級することを可能にする装置として構成することもでき
る。
The classification filter according to the present invention may be configured as a device that improves classification accuracy or that can simultaneously classify particles having different particle diameters by combining the filters in a plurality of stages. Can also.

【0027】図7および図8は、このような分級装置の
一例を示す透視図である。図7に示す装置においては、
一定のハウジング70内に本発明の分級用フィルター7
1a、71b、71cが互い違いに傾斜して配置した例
である。
FIGS. 7 and 8 are perspective views showing an example of such a classification device. In the device shown in FIG.
The filter 7 for classification according to the present invention in a fixed housing 70
This is an example in which 1a, 71b, and 71c are alternately arranged.

【0028】図8の例においては、円筒形のハウジング
80内に、漏斗状のフィルター8181a、81b、8
1cおよび81dを複数組み合わせて配置し、それぞれ
のフィルターによって分級される粒子が取り出し口82
a、82b、82cおよび82dから回収される。上記
図7および図8のいずれの場合においても、各フィルタ
ーの開口部のサイズを適宜選択することによって異なる
粒径の粒状物を効果的に分級し回収することができる。
In the example of FIG. 8, funnel-shaped filters 8181a, 81b, and 8 are provided in a cylindrical housing 80.
1c and 81d are arranged in combination, and the particles classified by each filter are taken out from the outlet 82.
a, 82b, 82c and 82d. In each of the cases of FIGS. 7 and 8, by appropriately selecting the size of the opening of each filter, it is possible to effectively classify and collect particulate matter having different particle diameters.

【0029】本発明においては、分級されるべき粒状物
の種類やサイズは限定されず、任意の粒子、たとえば高
分子粒子または無機粒子を分級することができる。たと
えば、粒径3〜10μm程度の粒子、たとえば、乳化重
合、シード重合、分散重合などによって得られるポリス
チレン粒子、アクリル−スチレン共重合体などの高分子
粒子やシリカ粒子などの無機粒子を効率よく分級するこ
とができる。
In the present invention, the type and size of the granular material to be classified are not limited, and any particles, for example, polymer particles or inorganic particles can be classified. For example, particles having a particle size of about 3 to 10 μm, for example, polystyrene particles obtained by emulsion polymerization, seed polymerization, dispersion polymerization, etc., polymer particles such as acryl-styrene copolymer, and inorganic particles such as silica particles are efficiently classified. can do.

【0030】[0030]

【実施例】以下に、本発明の実施例を示すが、本発明
は、下記の実施例の態様に限定されるものではない。
EXAMPLES Examples of the present invention will be shown below, but the present invention is not limited to the following embodiments.

【0031】実施例1 厚さ0.5mm、サイズ200×300mmのステンレ
ス(SUS304材)上に富士薬品工業(株)のカゼイ
ン系ネガレジスト(FRN015)を浸漬引上げ法によ
り塗布し、45℃にて30分乾燥して均一なレジスト膜
を得た。
Example 1 A casein-based negative resist (FRN015) manufactured by Fuji Pharmaceutical Co., Ltd. was applied on a stainless steel (SUS304 material) having a thickness of 0.5 mm and a size of 200.times.300 mm by a dipping and pulling method. After drying for 30 minutes, a uniform resist film was obtained.

【0032】次に、このレジスト膜にマスクを重ね合
せ、プリンターにてパターン描画を行った。この際、3
KWの水銀灯で波長365nmの紫外線を2〜3分間露
光した。
Next, a mask was superimposed on the resist film, and a pattern was drawn by a printer. At this time,
Exposure was carried out with a KW mercury lamp at a wavelength of 365 nm for 2-3 minutes.

【0033】続いて、露光されたレジスト膜を40〜5
0℃の温湯で現像した後、水でリンスしてスピン乾燥さ
せ、厚さ3μm、短手方向長さ25μm、長手方向長さ
120μmの長方形レジストパターンを多数配置した基
板を作製した。
Subsequently, the exposed resist film is coated with 40 to 5
After developing with hot water at 0 ° C., the substrate was rinsed with water and spin-dried to prepare a substrate on which a number of rectangular resist patterns each having a thickness of 3 μm, a length in the short direction of 25 μm, and a length in the long direction of 120 μm were arranged.

【0034】次に、この基板を200〜300℃で数分
間ベークし、スルファミン酸ニッケル浴に浸漬し、電気
めっき法によりレジストパターンを形成した面にニッケ
ルを厚さ15μmになるよう、めっきした。このスルフ
ァミン酸ニッケル浴の組成とめっき条件を次に示す。 スルファミン酸ニッケル 400g/l ほう酸 30g/l pH 4.0 浴温 50℃ 電流密度 3A/dm2 時間 30分
Next, the substrate was baked at 200 to 300 ° C. for several minutes, immersed in a nickel sulfamate bath, and plated with nickel to a thickness of 15 μm on the surface on which the resist pattern was formed by electroplating. The composition and plating conditions of this nickel sulfamate bath are shown below. Nickel sulfamate 400g / l Boric acid 30g / l pH 4.0 Bath temperature 50 ° C Current density 3A / dm2 Time 30min

【0035】続いて80℃で5分間乾燥した後、めっき
したニッケルを剥離して、厚さ15μm孔の最狭部の短
手方向長さ5μm、長手方向長さ100μmの孔を多数
有するフィルターを得た。この時のフィルターの断面形
状は図3に示す様な朝顔形となった。
Subsequently, after drying at 80 ° C. for 5 minutes, the plated nickel is peeled off, and a filter having a large number of holes of 5 μm in the transverse direction and 100 μm in the longitudinal direction at the narrowest portion of the 15 μm-thick hole is formed. Obtained. The cross-sectional shape of the filter at this time was a morning glory as shown in FIG.

【0036】実施例2 厚さ0.5mm、サイズ200×300mmのステンレ
ス(SUS304材)上に富士薬品工業(株)のカゼイ
ン系ネガレジスト(FRN015)を浸漬引上げ法によ
り塗布した。この時の引上げ速度は実施例1より遅くし
た。この後、45℃にて30分乾燥して均一なレジスト
膜を得た。
Example 2 A casein-based negative resist (FRN015) manufactured by Fuji Pharmaceutical Co., Ltd. was applied on a stainless steel (SUS304 material) having a thickness of 0.5 mm and a size of 200 × 300 mm by a dipping and pulling method. The pulling speed at this time was lower than that in Example 1. Thereafter, drying was performed at 45 ° C. for 30 minutes to obtain a uniform resist film.

【0037】次に、このレジスト膜にマスクを重ね合せ
プリンターにてパターン描画を行った。この際、3KW
の水銀灯で波長365nmの紫外線を2〜3分間露光し
た。
Next, a mask was overlaid on the resist film, and a pattern was drawn by a printer. At this time, 3KW
Was exposed to ultraviolet light having a wavelength of 365 nm for 2 to 3 minutes using a mercury lamp.

【0038】続いて、露光されたレジスト膜を40〜5
0℃の温湯で現像した後、水でリンスして、スピン乾燥
させ、厚さ6μm、短手方向長さ15μm、長手方向長
さ110μmの長方形レジストパターンを多数配置した
基板を作製した。
Subsequently, the exposed resist film is coated with 40 to 5
After development with hot water at 0 ° C., the substrate was rinsed with water and spin-dried to prepare a substrate on which a number of rectangular resist patterns each having a thickness of 6 μm, a length in the short direction of 15 μm, and a length in the long direction of 110 μm were arranged.

【0039】次に、この基板を200〜300℃で数分
間ベークし、スルファミン酸ニッケル浴に浸漬し、電気
めっき法によりレジストを形成した面にニッケルを厚さ
5μmになるようめっきした。このスルファミン酸ニッ
ケル浴の組成とめっき条件を次に示す。 スルファミン酸ニッケル 400g/l ほう酸 30g/l pH 4.0 浴温 50℃ 電流密度 3A/dm2 時間 12.5分
Next, the substrate was baked at 200 to 300 ° C. for several minutes, immersed in a nickel sulfamate bath, and plated with nickel to a thickness of 5 μm on the resist-formed surface by electroplating. The composition and plating conditions of this nickel sulfamate bath are shown below. Nickel sulfamate 400g / l Boric acid 30g / l pH 4.0 Bath temperature 50 ° C Current density 3A / dm2 Time 12.5min

【0040】続いて、80℃で5分間加熱乾燥処理を施
した後、めっきしたニッケルを剥離すると、厚さ5μm
で短手方向長さ15μm、長手方向長さ110μmの孔
を多数有する金属箔を得た。
Subsequently, after performing a heat-drying treatment at 80 ° C. for 5 minutes, the plated nickel is peeled off to give a thickness of 5 μm.
Thus, a metal foil having a large number of holes having a length in the short direction of 15 μm and a length in the long direction of 110 μm was obtained.

【0041】この箔を枠に固定し、両面からニッケルを
めっきし、厚さ15μmでの最狭部の短手方向長さ5μ
m、長手方向長さ100μmの孔を多数有するニッケル
フィルターを完成した。この時のスルファミン酸ニッケ
ル浴の組成とめっき条件は次のとおりである。 スルファミン酸ニッケル 400g/l ほう酸 30g/l 次亜リン酸リーダー 3g/l pH 4.0 浴温 50℃ 電流密度 3A/dm2 時間 25分
This foil was fixed to a frame, nickel was plated from both sides, and the width of the narrowest portion of 15 μm in the width direction of the narrowest portion was 5 μm.
m, a nickel filter having many holes having a length of 100 μm in the longitudinal direction was completed. The composition of the nickel sulfamate bath and plating conditions at this time are as follows. Nickel sulfamate 400g / l Boric acid 30g / l Hypophosphorous acid reader 3g / l pH 4.0 Bath temperature 50 ° C Current density 3A / dm2 Time 25min

【0042】なお、この時のニッケル膜にはリンが含有
されるため耐蝕性の良好なフィルターを得ることが出来
た。この実施例におけるフィルターの孔の断面は図4に
示す様な糸巻状であった。
Since the nickel film contained phosphorus at this time, a filter having good corrosion resistance could be obtained. The cross section of the hole of the filter in this example had a thread-like shape as shown in FIG.

【0043】実施例3 厚さ0.5mm、サイズ200×300mmのステンレ
ス(SUS304材)上に東京応化製アクリル系レジス
ト(PMER−N)をミヤバーコート法で塗布し、70
℃30分水平に保持して、加熱乾燥し厚さ18μmの均
一なレジスト膜を得た。
Example 3 Acrylic resist (PMER-N) manufactured by Tokyo Ohka Co., Ltd. was applied on a stainless steel (SUS304 material) having a thickness of 0.5 mm and a size of 200 × 300 mm by a Miyabar coating method.
The film was held horizontally at 30 ° C. for 30 minutes and dried by heating to obtain a uniform resist film having a thickness of 18 μm.

【0044】次に、このレジストを形成した基板にマス
クを重ね合せパターン描画を行った。この際、3KWの
水銀灯で適度な平行性を有する光源のプリンターで36
5nmの紫外線を250mJ/cm2の露光量で露光し
た。
Next, a pattern was drawn by overlapping a mask on the substrate on which the resist was formed. At this time, a 3KW mercury lamp with a light source printer having moderate parallelism
The film was exposed to ultraviolet light of 5 nm at an exposure amount of 250 mJ / cm2.

【0045】続いて、露光されたレジスト膜を所定の現
像液にて現像し、更にリンスを行って厚さ18μm、短
手方向長さが基板面で9μm、上部で5μmまた長手方
向の長さが基板面で104μmであり、また、レジスト
上部の寸法が短手方向で5μm、長手方向で100μm
の断面台形状のレジストパターンを多数有する基板を作
製した。
Subsequently, the exposed resist film is developed with a predetermined developing solution, and further rinsed to have a thickness of 18 μm, a length in the short direction of 9 μm on the substrate surface, a length of 5 μm on the upper portion, and a length in the longitudinal direction. Is 104 μm on the substrate surface, and the dimension of the resist upper part is 5 μm in the lateral direction and 100 μm in the longitudinal direction.
A substrate having a number of trapezoidal resist patterns was prepared.

【0046】次に、このめっき用基板をスルファミン酸
ニッケル浴に浸漬し、電気めっき法によりレジスト面に
ニッレル厚さが15μmになるようめっきした。このス
ルファミン酸ニッケル浴の組成とめっき条件を次に示
す。 スルファミン酸ニッケル 400g/l 塩化ニッケル 3g/l ほう酸 30g/l 添加剤 適 量 pH 4.0 浴温 50℃ 電流密度 4A/dm2 時間 30分
Next, the plating substrate was immersed in a nickel sulfamate bath, and the resist surface was plated by electroplating so that the nickle thickness became 15 μm. The composition and plating conditions of this nickel sulfamate bath are shown below. Nickel sulfamate 400 g / l Nickel chloride 3 g / l Boric acid 30 g / l Additives Appropriate amount pH 4.0 Bath temperature 50 ° C Current density 4 A / dm 2 hours 30 minutes

【0047】続いて、レジストを隔離した後、80℃で
5分間乾燥を施し、ニッケルを剥離することによって厚
さ15μmで孔の最狭部の短手方向長さ5μm、長手方
向長さ100μmであり、さらに孔の断面図5に示す様
な大径であるフィルターを得た。
Subsequently, after isolating the resist, the resist was dried at 80 ° C. for 5 minutes, and nickel was peeled off to remove the nickel to a thickness of 15 μm, a shortest length of the narrowest portion of the hole of 5 μm, and a longitudinal length of 100 μm. In addition, a filter having a large diameter as shown in FIG. 5 was obtained.

【0048】分級試験 従来のサーフェスフィルターおよび本発明による金属フ
ィルターを用いて、分級試験を行った。さらに、従来の
沈降法による比較試験も行った。
Classification Test A classification test was performed using a conventional surface filter and the metal filter according to the present invention. Furthermore, a comparative test by a conventional sedimentation method was also performed.

【0049】本発明のフィルターとしては実施例1で得
られたフィルターを用い、一方従来のフィルターとして
は、サーフェスフィルター(ミリポアー社製、(孔径5
μm))を用いた。
As the filter of the present invention, the filter obtained in Example 1 was used. On the other hand, as a conventional filter, a surface filter (manufactured by Millipore Co., Ltd .;
μm)).

【0050】被分級粒状物としては、アクリル・スチレ
ン共重合体の粒状物(固形分10重量%/100gの水
性分散液)を用いた。この粒状物の粒径分布幅は、4.
5〜7.5μmであった。
As the granulated material to be classified, a granular material of an acrylic / styrene copolymer (aqueous dispersion having a solid content of 10% by weight / 100 g) was used. The particle size distribution width of the granular material is 4.
5 to 7.5 μm.

【0051】本発明の実施例1に係るフィルター(5μ
mスリット幅、長さ100μm)によって分級を行った
ところ、平均粒径5.0±0.5μmの分級粒子が得ら
れた。迅速かつ高精度に分級することができ、収率は
8.3gであった。
The filter (5 μm) according to the first embodiment of the present invention
Classification was carried out according to (m slit width, length 100 μm), and classified particles having an average particle size of 5.0 ± 0.5 μm were obtained. Classification could be performed quickly and with high accuracy, and the yield was 8.3 g.

【0052】一方、孔径5μmの従来のサーフェスフィ
ルターを用いて同様の分級を行ったところ、フィルター
操作開始後まもなく目詰まりが発生し、収率は3.5g
であった(分布:平均粒径5.0±0.5μm)。
On the other hand, when the same classification was performed using a conventional surface filter having a pore size of 5 μm, clogging occurred soon after the filter operation was started, and the yield was 3.5 g.
(Distribution: average particle size 5.0 ± 0.5 μm).

【0053】また、上記粒状物を沈降法によって、24
時間の間ゆっくりと沈降させて分級を行ったところ、得
られた粒状物の粒径分布は4.5〜6.3μmと幅が広
く、また収率は5.8gであった。
Further, the above-mentioned granular material is subjected to sedimentation by 24
Classification was performed by slow sedimentation over a period of time. As a result, the particle size distribution of the obtained granules was wide, ranging from 4.5 to 6.3 μm, and the yield was 5.8 g.

【0054】[0054]

【発明の効果】上記実施例の結果からも明らかなよう
に、本発明によるフィルターは、フィルターの開口部の
平面形状が長手方向の第1長さとこの長手方向に直交す
る短手方向の第2長さとを有する細長状からなるので、
分級効率と分級精度の双方においてすぐれた効果を奏す
る。
As is clear from the results of the above embodiment, in the filter according to the present invention, the planar shape of the opening of the filter has the first length in the longitudinal direction and the second shape in the short direction orthogonal to the longitudinal direction. Because it consists of an elongated shape with a length
Excellent effects are achieved in both classification efficiency and classification accuracy.

【図面の簡単な説明】[Brief description of the drawings]

【図1】本発明の分級用フィルターの一実施態様を示す
平面図。
FIG. 1 is a plan view showing one embodiment of a classification filter of the present invention.

【図2】図1に示す分級用フィルターの部分拡大図。FIG. 2 is a partially enlarged view of the classification filter shown in FIG.

【図3】本発明の実施例に係る分級用フィルターの開口
部の断面図。
FIG. 3 is a cross-sectional view of an opening of a classification filter according to an embodiment of the present invention.

【図4】本発明の実施例に係る分級用フィルターの開口
部の断面図。
FIG. 4 is a cross-sectional view of an opening of the classification filter according to the embodiment of the present invention.

【図5】本発明の実施例に係る分級用フィルターの開口
部の断面図。
FIG. 5 is a sectional view of an opening of the classification filter according to the embodiment of the present invention.

【図6】本発明の分級用フィルターの製造方法の一例を
示す工程断面図。
FIG. 6 is a process cross-sectional view showing one example of a method for producing a classification filter of the present invention.

【図7】本発明による分級用フィルターを組み合わせて
構成した分級装置を示す透視図。
FIG. 7 is a perspective view showing a classification device configured by combining classification filters according to the present invention.

【図8】本発明による分級用フィルターを組み合わせて
構成した分級装置を示す透視図。
FIG. 8 is a perspective view showing a classification device configured by combining classification filters according to the present invention.

【符号の説明】[Explanation of symbols]

1 基板 2 フィルター開口部 21 電着用基板 22 レジスト層 23 マスクパターン 24 マスク 25 電離放射線 26 ニッケルメッキ層 27 開口部 70 ハウジング 80 ハウジング 71a、71b、71c フィルター 81a、81b、81c、81d フィルター 82a、82b、82c、82d 取出し口 Reference Signs List 1 substrate 2 filter opening 21 electrodeposition substrate 22 resist layer 23 mask pattern 24 mask 25 ionizing radiation 26 nickel plating layer 27 opening 70 housing 80 housing 71a, 71b, 71c filters 81a, 81b, 81c, 81d filters 82a, 82b, 82c, 82d outlet

───────────────────────────────────────────────────── フロントページの続き (72)発明者 中 前 勝 彦 兵庫県神戸市北区泉台4丁目12−5 ────────────────────────────────────────────────── ─── Continued on the front page (72) Inventor Katsuhiko Nakamae 4-12-5 Izumidai, Kita-ku, Kobe-shi, Hyogo

Claims (10)

【特許請求の範囲】[Claims] 【請求項1】多数孔が形成された基板からなる、粒状物
を分級するための分級用フィルターであって、 前記各孔の開口部の平面形状が、長手方向の第1長さと
この長手方向に直交する短手方向の第2長さとを有する
細長状からなることを特徴とする、分級用フィルター。
1. A classifying filter for classifying a granular material, comprising a substrate having a plurality of holes formed therein, wherein a plane shape of an opening of each of the holes is a first length in a longitudinal direction and the longitudinal direction. A classification filter characterized by having an elongated shape having a second length in a short direction orthogonal to the filter.
【請求項2】前記基板が金属板からなる、請求項1に記
載の分級用フィルター。
2. The classification filter according to claim 1, wherein said substrate is made of a metal plate.
【請求項3】前記各孔の短手方向の第2長さが、分級さ
れるべき粒状物の粒径ないしその近傍の長さを有する、
請求項1に記載の分級用フィルター。
3. A second length in the lateral direction of each of the holes has a particle size of a granular material to be classified or a length in the vicinity thereof.
The classification filter according to claim 1.
【請求項4】前記各孔の開口部の形状が長方形である、
請求項1に記載の分級用フィルター。
4. The shape of the opening of each hole is rectangular.
The classification filter according to claim 1.
【請求項5】前記孔の開口部の長手方向の第1長さが、
該開口部を通過できない粒状物が開口部の長手方向に沿
って転動ないし移動し得る長さを有する、請求項1に記
載の分級用フィルター。
5. A first length in a longitudinal direction of an opening of the hole,
The classification filter according to claim 1, wherein the particulate matter that cannot pass through the opening has a length that allows the material to roll or move along the longitudinal direction of the opening.
【請求項6】前記孔の開口部の第1長さの第2長さに対
する比が、2以上である、請求項1に記載の分級用フィ
ルター。
6. The classification filter according to claim 1, wherein a ratio of the first length of the opening of the hole to the second length is 2 or more.
【請求項7】各孔が、基板に規則的に配列されてなる、
請求項1に記載の分級用フィルター。
7. Each of the holes is regularly arranged in a substrate.
The classification filter according to claim 1.
【請求項8】各孔の短手方向の断面形状において、基板
の両面または少なくとも片面が最狭部に対して広くなっ
ている、請求項1に記載の分級用フィルター。
8. The classification filter according to claim 1, wherein in the cross-sectional shape of each hole in the short direction, both surfaces or at least one surface of the substrate is wider than the narrowest portion.
【請求項9】高分子粒子または無機粒子を分級するため
の、請求項1に記載の分級用フィルター。
9. The classification filter according to claim 1, for classifying polymer particles or inorganic particles.
【請求項10】請求項1に記載の分級用フィルターを複
数組み合わせてなる、多段フィルター。
10. A multi-stage filter comprising a combination of a plurality of classification filters according to claim 1.
JP15759598A 1998-06-05 1998-06-05 Filter for classification Expired - Fee Related JP4216365B2 (en)

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JP2010253461A (en) * 2008-10-09 2010-11-11 Optnics Precision Co Ltd Sieve, sieve device, solder ball, and method for sieving spherical particles
JP2011067762A (en) * 2009-09-25 2011-04-07 Bonmaaku:Kk Screen mask
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US8267255B2 (en) 2009-09-07 2012-09-18 Optnics Precision Co., Ltd. Sieve, sifting device, solder balls, and method of sifting spherical particles
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Cited By (9)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2006122826A (en) * 2004-10-29 2006-05-18 Hitachi Metals Ltd Sieve for microsphere screening and microsphere screening method using the same
JP2009106868A (en) * 2007-10-30 2009-05-21 Optnics Precision Co Ltd Sieve mesh
JP2010253461A (en) * 2008-10-09 2010-11-11 Optnics Precision Co Ltd Sieve, sieve device, solder ball, and method for sieving spherical particles
KR101137684B1 (en) * 2008-10-09 2012-04-20 가부시끼가이샤 옵토니쿠스 세이미쯔 Sieve, sorting device, solder ball and sorting method of spherical particle
TWI414369B (en) * 2008-10-09 2013-11-11 Optnics Prec Co Ltd Sieve, sieve apparatus, solder ball and sieving method for spherical particle
US8267255B2 (en) 2009-09-07 2012-09-18 Optnics Precision Co., Ltd. Sieve, sifting device, solder balls, and method of sifting spherical particles
JP2011067762A (en) * 2009-09-25 2011-04-07 Bonmaaku:Kk Screen mask
CN103357575A (en) * 2013-07-19 2013-10-23 王国斌 Stainless steel sieve mesh for selection of iron minerals
TWI501818B (en) * 2014-03-06 2015-10-01 Nippon Steel & Sumikin Mat Co Screening for microspheres

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