JPH1135313A5 - - Google Patents

Info

Publication number
JPH1135313A5
JPH1135313A5 JP1997189731A JP18973197A JPH1135313A5 JP H1135313 A5 JPH1135313 A5 JP H1135313A5 JP 1997189731 A JP1997189731 A JP 1997189731A JP 18973197 A JP18973197 A JP 18973197A JP H1135313 A5 JPH1135313 A5 JP H1135313A5
Authority
JP
Japan
Prior art keywords
organic
inorganic composite
polyether polymer
aliphatic polyether
glycol
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP1997189731A
Other languages
English (en)
Japanese (ja)
Other versions
JPH1135313A (ja
JP4025389B2 (ja
Filing date
Publication date
Application filed filed Critical
Priority to JP18973197A priority Critical patent/JP4025389B2/ja
Priority claimed from JP18973197A external-priority patent/JP4025389B2/ja
Priority to US09/423,798 priority patent/US6448331B1/en
Publication of JPH1135313A publication Critical patent/JPH1135313A/ja
Publication of JPH1135313A5 publication Critical patent/JPH1135313A5/ja
Application granted granted Critical
Publication of JP4025389B2 publication Critical patent/JP4025389B2/ja
Anticipated expiration legal-status Critical
Expired - Fee Related legal-status Critical Current

Links

JP18973197A 1997-07-15 1997-07-15 有機−無機複合体および無機多孔質体 Expired - Fee Related JP4025389B2 (ja)

Priority Applications (2)

Application Number Priority Date Filing Date Title
JP18973197A JP4025389B2 (ja) 1997-07-15 1997-07-15 有機−無機複合体および無機多孔質体
US09/423,798 US6448331B1 (en) 1997-07-15 1998-07-15 Alkoxysilane/organic polymer composition for thin insulating film production and use thereof

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP18973197A JP4025389B2 (ja) 1997-07-15 1997-07-15 有機−無機複合体および無機多孔質体

Publications (3)

Publication Number Publication Date
JPH1135313A JPH1135313A (ja) 1999-02-09
JPH1135313A5 true JPH1135313A5 (cs) 2005-05-12
JP4025389B2 JP4025389B2 (ja) 2007-12-19

Family

ID=16246252

Family Applications (1)

Application Number Title Priority Date Filing Date
JP18973197A Expired - Fee Related JP4025389B2 (ja) 1997-07-15 1997-07-15 有機−無機複合体および無機多孔質体

Country Status (1)

Country Link
JP (1) JP4025389B2 (cs)

Families Citing this family (15)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH11217458A (ja) * 1998-02-04 1999-08-10 Hitachi Chem Co Ltd 多孔質膜、その製造法及び物品
JP4280860B2 (ja) * 1999-03-30 2009-06-17 直弘 曽我 基板上に形成される多孔質材料の製造法
JP2001049177A (ja) * 1999-06-01 2001-02-20 Jsr Corp 膜形成用組成物、膜の形成方法および低密度化膜
JP2001049178A (ja) * 1999-06-01 2001-02-20 Jsr Corp 膜形成用組成物、膜の形成方法および低密度化膜
JP4702970B2 (ja) * 1999-10-12 2011-06-15 旭化成株式会社 絶縁薄膜製造用のシリカ前駆体／有機ポリマー組成物
WO2001074957A1 (en) * 2000-04-04 2001-10-11 Asahi Kasei Kabushiki Kaisha Coating composition for the production of insulating thin films
EP1380538A4 (en) * 2001-04-17 2006-10-04 Tokuyama Corp METHOD FOR PRODUCING POROUS INORGANIC MATERIAL
US6872456B2 (en) * 2001-07-26 2005-03-29 Dow Corning Corporation Siloxane resins
KR101012950B1 (ko) * 2003-10-15 2011-02-08 삼성전자주식회사 유기 절연체 형성용 조성물 및 이를 이용하여 제조된 유기절연체
JP2006036598A (ja) * 2004-07-28 2006-02-09 Ube Nitto Kasei Co Ltd 多孔質シリカ系薄膜の製造方法、多孔質シリカ系薄膜及び構造物
JP4204578B2 (ja) * 2005-07-29 2009-01-07 日立化成工業株式会社 多孔質膜、物品及び複合材
US20090142565A1 (en) * 2005-08-12 2009-06-04 Shiseido Co., Ltd. Mesoporous Silica And Production Method Thereof
JP2007045692A (ja) * 2005-08-12 2007-02-22 Shiseido Co Ltd メソポーラスシリカおよびその製造方法
EP2808368B1 (en) 2012-01-23 2017-06-21 Asahi Kasei Kabushiki Kaisha Coating composition and antireflection film
CN105480983B (zh) * 2015-12-16 2017-05-03 江南大学 一种亲水多孔二氧化硅微球的制备方法

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