JPH1135552A5 - - Google Patents

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Publication number
JPH1135552A5
JPH1135552A5 JP1997198955A JP19895597A JPH1135552A5 JP H1135552 A5 JPH1135552 A5 JP H1135552A5 JP 1997198955 A JP1997198955 A JP 1997198955A JP 19895597 A JP19895597 A JP 19895597A JP H1135552 A5 JPH1135552 A5 JP H1135552A5
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JP
Japan
Prior art keywords
resist composition
positive resist
bis
found
diazomethane
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP1997198955A
Other languages
Japanese (ja)
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JPH1135552A (en
JP3865473B2 (en
Filing date
Publication date
Application filed filed Critical
Priority to JP19895597A priority Critical patent/JP3865473B2/en
Priority claimed from JP19895597A external-priority patent/JP3865473B2/en
Priority to US09/119,640 priority patent/US5945517A/en
Publication of JPH1135552A publication Critical patent/JPH1135552A/en
Publication of JPH1135552A5 publication Critical patent/JPH1135552A5/ja
Application granted granted Critical
Publication of JP3865473B2 publication Critical patent/JP3865473B2/en
Anticipated expiration legal-status Critical
Expired - Fee Related legal-status Critical Current

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Description

【０００７】
【課題を解決するための手段】
本発明者らは、前記の優れた機能を有する新規なジアゾメタン化合物を開発すべく鋭意研究を重ねた結果、低級アルコキシアルキルオキシ基を有するシクロヘキサン環又は７，７‐ジメチル‐ビシクロ［２．２．１］ヘプタン環を両端にもつ特定構造のビススルホニルジアゾメタンが、文献未載の新規な化合物であって、その目的に適合しうることを見出し、この知見に基づいて本発明を完成するに至った。[0007]
[Means for solving the problem]
As a result of extensive research into the development of novel diazomethane compounds having the above-mentioned excellent functions, the present inventors have found that a bis-sulfonyldiazomethane having a specific structure, which has a cyclohexane ring or a 7,7-dimethyl-bicyclo[2.2.1]heptane ring having a lower alkoxyalkyloxy group at both ends, is a novel compound not found in the literature and suitable for the purpose, and have completed the present invention based on this finding.

【００３０】
（２）ポジ型レジスト組成物の調製
実施例１−（２）において、酸発生剤を上記（１）で得たビス〔２‐［１‐エトキシエチルオキシ］‐７，７‐ジメチルビシクロ［２．２．１］ヘプタニルメチルスルホニル〕ジアゾメタン７重量部に変えた以外は、実施例１−（２）と同様にしてポジ型レジスト組成物を調製した。
このポジ型レジスト組成物について、諸特性を評価した結果、感度は１８ｍＪ／ｃｍ2、解像性は０．２１μｍ、レジストパターン形状は○、引き置き経時安定性は４、残膜率は９８％であった。[0030]
(2) Preparation of a positive resist composition A positive resist composition was prepared in the same manner as in Example 1-(2), except that the acid generator in Example 1-(2) was changed to 7 parts by weight of bis[2-[1- ethoxyethyloxy ]-7,7-dimethylbicyclo[2.2.1]heptanylmethylsulfonyl]diazomethane obtained in the above (1).
The positive resist composition was evaluated for various properties, and the results were a sensitivity of 18 mJ/cm 2 , a resolution of 0.21 μm, a resist pattern shape of ◯, a shelf stability of 4, and a residual film ratio of 98%.

JP19895597A 1996-07-24 1997-07-24 New diazomethane compounds Expired - Fee Related JP3865473B2 (en)

Priority Applications (2)

Application Number Priority Date Filing Date Title
JP19895597A JP3865473B2 (en) 1997-07-24 1997-07-24 New diazomethane compounds
US09/119,640 US5945517A (en) 1996-07-24 1998-07-21 Chemical-sensitization photoresist composition

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP19895597A JP3865473B2 (en) 1997-07-24 1997-07-24 New diazomethane compounds

Publications (3)

Publication Number Publication Date
JPH1135552A JPH1135552A (en) 1999-02-09
JPH1135552A5 true JPH1135552A5 (en) 2004-10-21
JP3865473B2 JP3865473B2 (en) 2007-01-10

Family

ID=16399727

Family Applications (1)

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JP19895597A Expired - Fee Related JP3865473B2 (en) 1996-07-24 1997-07-24 New diazomethane compounds

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JP (1) JP3865473B2 (en)

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