JPH11500570A - イオンビームを生成するための電子サイクロトロン共鳴装置 - Google Patents

イオンビームを生成するための電子サイクロトロン共鳴装置

Info

Publication number
JPH11500570A
JPH11500570A JP8524727A JP52472796A JPH11500570A JP H11500570 A JPH11500570 A JP H11500570A JP 8524727 A JP8524727 A JP 8524727A JP 52472796 A JP52472796 A JP 52472796A JP H11500570 A JPH11500570 A JP H11500570A
Authority
JP
Japan
Prior art keywords
ionization chamber
radiator
capacitor
transmission line
cyclotron resonance
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP8524727A
Other languages
English (en)
Japanese (ja)
Inventor
ルイ ワルトスキー
クリスチャン シュヴェーベル
ジャン オーベル
Original Assignee
プラスミオン
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by プラスミオン filed Critical プラスミオン
Publication of JPH11500570A publication Critical patent/JPH11500570A/ja
Pending legal-status Critical Current

Links

Classifications

    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/32—Gas-filled discharge tubes
    • H01J37/32009—Arrangements for generation of plasma specially adapted for examination or treatment of objects, e.g. plasma sources
    • H01J37/32357—Generation remote from the workpiece, e.g. down-stream
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J27/00—Ion beam tubes
    • H01J27/02—Ion sources; Ion guns
    • H01J27/16—Ion sources; Ion guns using high-frequency excitation, e.g. microwave excitation
    • H01J27/18—Ion sources; Ion guns using high-frequency excitation, e.g. microwave excitation with an applied axial magnetic field

Landscapes

  • Engineering & Computer Science (AREA)
  • Chemical & Material Sciences (AREA)
  • Physics & Mathematics (AREA)
  • Plasma & Fusion (AREA)
  • Analytical Chemistry (AREA)
  • Combustion & Propulsion (AREA)
  • Particle Accelerators (AREA)
  • Electron Sources, Ion Sources (AREA)
JP8524727A 1995-02-16 1996-02-16 イオンビームを生成するための電子サイクロトロン共鳴装置 Pending JPH11500570A (ja)

Applications Claiming Priority (3)

Application Number Priority Date Filing Date Title
FR9501771A FR2730858B1 (fr) 1995-02-16 1995-02-16 Dispositif a resonance cyclotron electronique pour creer un faisceau d'ions
FR95/01771 1995-02-16
PCT/FR1996/000259 WO1996025755A1 (fr) 1995-02-16 1996-02-16 Dispositif a resonance cyclotron electronique pour creer un faisceau d'ions

Publications (1)

Publication Number Publication Date
JPH11500570A true JPH11500570A (ja) 1999-01-12

Family

ID=9476188

Family Applications (1)

Application Number Title Priority Date Filing Date
JP8524727A Pending JPH11500570A (ja) 1995-02-16 1996-02-16 イオンビームを生成するための電子サイクロトロン共鳴装置

Country Status (4)

Country Link
EP (1) EP0809855A1 (de)
JP (1) JPH11500570A (de)
FR (1) FR2730858B1 (de)
WO (1) WO1996025755A1 (de)

Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2010505064A (ja) * 2006-09-29 2010-02-18 スカニア シーブイ アクチボラグ 冷却器装置
CN104134215A (zh) * 2014-07-29 2014-11-05 缪荣明 高仟伏dr对接pacs系统的图像减影方法

Family Cites Families (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
KR910016054A (ko) * 1990-02-23 1991-09-30 미다 가쓰시게 마이크로 전자 장치용 표면 처리 장치 및 그 방법
US5262610A (en) * 1991-03-29 1993-11-16 The United States Of America As Represented By The Air Force Low particulate reliability enhanced remote microwave plasma discharge device
FR2676593B1 (fr) * 1991-05-14 1997-01-03 Commissariat Energie Atomique Source d'ions a resonance cyclotronique electronique.
JPH05263223A (ja) * 1992-03-14 1993-10-12 Nitto Kohki Co Ltd 内側部を有する被コーティング体のコーティング方法及び装置

Cited By (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2010505064A (ja) * 2006-09-29 2010-02-18 スカニア シーブイ アクチボラグ 冷却器装置
CN104134215A (zh) * 2014-07-29 2014-11-05 缪荣明 高仟伏dr对接pacs系统的图像减影方法
CN104134215B (zh) * 2014-07-29 2018-10-26 缪荣明 高仟伏dr对接pacs系统的图像减影方法

Also Published As

Publication number Publication date
FR2730858B1 (fr) 1997-03-21
FR2730858A1 (fr) 1996-08-23
WO1996025755A1 (fr) 1996-08-22
EP0809855A1 (de) 1997-12-03

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