JPH1184672A5

JPH1184672A5 -

Info

Publication number: JPH1184672A5
Application number: JP1997265133A
Authority: JP
Filing date: 1997-09-12
Publication date: 2005-06-16
Anticipated expiration: 2017-09-12

Description

を含有する光重合性樹脂組成物。 A photopolymerizable resin composition comprising:

【００４２】
【実施例】
比較例５
＜ドライフィルム用組成物の調合及び銅張り積層板での評価＞
以下の成分（Ａ）〜（Ｉ）を混合して、ドライフィルムレジスト用組成物を調合した。 [0042]
[Example]
Comparative Example 5
<Formulation of dry film composition and evaluation on copper-clad laminate>
The following components (A) to (I) were mixed to prepare a dry film resist composition.

比較例６
比較例５に示した光重合性樹脂組成物に、更に２−（Ｏ−クロロフェニル）−４，５−ジフェニルイミダゾリル二量体を２重量部添加し、比較例５と同様に操作して評価用サンプルを作製して評価した。この評価結果を表１に示す。 Comparative Example 6
Two parts by weight of 2-(O-chlorophenyl)-4,5-diphenylimidazolyl dimer was further added to the photopolymerizable resin composition shown in Comparative Example 5 , and an evaluation sample was prepared and evaluated in the same manner as in Comparative Example 5. The evaluation results are shown in Table 1.

比較例１、２
比較例６に示した光重合性樹脂組成物の（ｅ）成分トリス（アクリロキシエチル）イソシアヌレートの代わりに、トリメチロールプロパントリアクリレート（比較例１）、ノナプロピレングリコールジメタアクリレート（比較例２）を配合する以外は、比較例６と同様に操作して評価用サンプルを作製して評価した。この評価結果を表１に示す。 Comparative Examples 1 and 2
Evaluation samples were prepared and evaluated in the same manner as in Comparative Example 6 , except that trimethylolpropane triacrylate (Comparative Example 1) or nonapropylene glycol dimethacrylate (Comparative Example 2) was blended in place of tris(acryloxyethyl)isocyanurate, component (e) of the photopolymerizable resin composition shown in Comparative Example 6. The evaluation results are shown in Table 1.

比較例３、４、７、８、９、実施例１、２、３
イソシアヌル酸エステル化合物の種類と配合割合を表１の様にする以外は、比較例６と同様に操作して評価用サンプルを作製して評価した。この評価結果を表１に示す。 Comparative Examples 3, 4, 7, 8, 9, Examples 1, 2, 3
Samples for evaluation were prepared and evaluated in the same manner as in Comparative Example 6 , except that the types and blending ratios of the isocyanuric acid ester compounds were changed as shown in Table 1. The evaluation results are shown in Table 1.

比較例１０
＜銅合金金属箔基材でのリードフレームの作製＞
厚さ１５０μｍの銅合金基材に、比較例５と同様に操作して作製した光重合層の厚さが２５μｍの積層フィルム−１を、その光重合性樹脂層が基材に面するように１０５℃で両面をラミネートした。次に、光重合性樹脂積層体のベースフィルム上にリードフレームパターン（２０８ピン）を有するネガフィルムマスクを両面から上下一致するように重ね、真空にして両者を密着させ、露光量６０ｍＪ／ｃｍ² で露光した。その後ベースフィルムを剥離除去して、現像液として１％炭酸ナトリウム水溶液（液温３０℃）を用いて現像し、リードフレームパターンを形成した。 Comparative Example 10
<Fabrication of lead frame using copper alloy metal foil substrate>
A 150 μm thick copper alloy substrate was laminated on both sides at 105° C. with a photopolymerizable layer of 25 μm thick, prepared in the same manner as in Comparative Example 5 , with the photopolymerizable resin layer facing the substrate. Next, a negative film mask having a lead frame pattern (208 pins) was placed on both sides of the base film of the photopolymerizable resin laminate so that the top and bottom were aligned, and the two were brought into close contact under vacuum, followed by exposure at an exposure dose of 60 mJ/cm ^2. The base film was then peeled off and removed, and the substrate was developed using a 1% aqueous sodium carbonate solution (liquid temperature 30° C.) as a developer to form a lead frame pattern.

比較例１１
比較例１で作成したドライフィルムレジストを使用する以外は、比較例１０と同様に操作してリードフレームを作成した。得られたリードフレームを電子顕微鏡により目視観察したところ、インナーリード部分のレジストラインの欠落・浮きや光重合性樹脂層と銅合金基材との界面から過度のエッチング液の浸食が観察された。
Comparative Example 11
A lead frame was produced in the same manner as in Comparative Example 10, except for using the dry film resist produced in Comparative Example 1. When the obtained lead frame was visually observed under an electron microscope, chipping and lifting of the resist line in the inner lead portion and excessive erosion by the etching solution from the interface between the photopolymerizable resin layer and the copper alloy substrate were observed.

Claims

(a) 20 to 90 parts by weight of a polymer having a carboxyl group in a side chain, a carboxyl group content of 100 to 600 in terms of acid equivalent, and a weight average molecular weight of 20,000 to 500,000; (b) 5 to 60 parts by weight of a photopolymerizable monomer having at least two terminal ethylenically unsaturated groups; (c) 0.01 to 20 parts by weight of a photopolymerization initiator that generates free radicals upon irradiation with actinic rays; (d) 0.1 to 5 parts by weight of a leuco dye; and (e) 1 to 40 parts by weight of one or more compounds selected from the group consisting of isocyanuric acid ester compounds represented by the following formula (A):
A photopolymerizable resin composition comprising: