JPS51139268A - Method of producing pattern - Google Patents

Method of producing pattern

Info

Publication number
JPS51139268A
JPS51139268A JP6288175A JP6288175A JPS51139268A JP S51139268 A JPS51139268 A JP S51139268A JP 6288175 A JP6288175 A JP 6288175A JP 6288175 A JP6288175 A JP 6288175A JP S51139268 A JPS51139268 A JP S51139268A
Authority
JP
Japan
Prior art keywords
patterns
producing pattern
transparent
different
resist
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP6288175A
Other languages
Japanese (ja)
Other versions
JPS609342B2 (en
Inventor
Hideki Nishida
Koji Yamada
Norikazu Tsumita
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Hitachi Ltd
Original Assignee
Hitachi Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Hitachi Ltd filed Critical Hitachi Ltd
Priority to JP50062881A priority Critical patent/JPS609342B2/en
Priority to DE19762623688 priority patent/DE2623688A1/en
Priority to NL7605809A priority patent/NL7605809A/en
Publication of JPS51139268A publication Critical patent/JPS51139268A/en
Publication of JPS609342B2 publication Critical patent/JPS609342B2/en
Expired legal-status Critical Current

Links

Classifications

    • H—ELECTRICITY
    • H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10P—GENERIC PROCESSES OR APPARATUS FOR THE MANUFACTURE OR TREATMENT OF DEVICES COVERED BY CLASS H10
    • H10P50/00—Etching of wafers, substrates or parts of devices
    • H10P50/20—Dry etching; Plasma etching; Reactive-ion etching
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/20—Exposure; Apparatus therefor
    • G03F7/2002—Exposure; Apparatus therefor with visible light or UV light, through an original having an opaque pattern on a transparent support, e.g. film printing, projection printing; by reflection of visible or UV light from an original such as a printed image
    • H—ELECTRICITY
    • H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10P—GENERIC PROCESSES OR APPARATUS FOR THE MANUFACTURE OR TREATMENT OF DEVICES COVERED BY CLASS H10
    • H10P95/00—Generic processes or apparatus for manufacture or treatments not covered by the other groups of this subclass

Landscapes

  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
  • Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
  • Preparing Plates And Mask In Photomechanical Process (AREA)
  • Drying Of Semiconductors (AREA)
  • Weting (AREA)

Abstract

PURPOSE: To simultaneously form two patterns of different structures by causing exposure of a resist formed on two-layer substance by using a mask having patterns which are non-transparent and semi-transparent with respect to the exposure light to thereby form patterns of different resist thicknesses and then etching the two layers.
COPYRIGHT: (C)1976,JPO&Japio
JP50062881A 1975-05-28 1975-05-28 How to make a pattern Expired JPS609342B2 (en)

Priority Applications (3)

Application Number Priority Date Filing Date Title
JP50062881A JPS609342B2 (en) 1975-05-28 1975-05-28 How to make a pattern
DE19762623688 DE2623688A1 (en) 1975-05-28 1976-05-26 Pattern prodn. for semiconductors and magnetic bubbles - photosensitive varnish film is applied on at least two laminated layers on substrate (NL301176)
NL7605809A NL7605809A (en) 1975-05-28 1976-05-28 METHOD OF FORMING A PATTERN AND OBTAINED PRODUCTION.

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP50062881A JPS609342B2 (en) 1975-05-28 1975-05-28 How to make a pattern

Publications (2)

Publication Number Publication Date
JPS51139268A true JPS51139268A (en) 1976-12-01
JPS609342B2 JPS609342B2 (en) 1985-03-09

Family

ID=13213039

Family Applications (1)

Application Number Title Priority Date Filing Date
JP50062881A Expired JPS609342B2 (en) 1975-05-28 1975-05-28 How to make a pattern

Country Status (3)

Country Link
JP (1) JPS609342B2 (en)
DE (1) DE2623688A1 (en)
NL (1) NL7605809A (en)

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS5635137A (en) * 1979-08-31 1981-04-07 Nec Corp Photomask

Families Citing this family (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US4244799A (en) * 1978-09-11 1981-01-13 Bell Telephone Laboratories, Incorporated Fabrication of integrated circuits utilizing thick high-resolution patterns
AT382040B (en) * 1983-03-01 1986-12-29 Guenther Stangl METHOD FOR PRODUCING OPTICALLY STRUCTURED FILTERS FOR ELECTROMAGNETIC RADIATION AND OPTICALLY STRUCTURED FILTERS
US5589303A (en) * 1994-12-30 1996-12-31 Lucent Technologies Inc. Self-aligned opaque regions for attenuating phase-shifting masks

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS5635137A (en) * 1979-08-31 1981-04-07 Nec Corp Photomask

Also Published As

Publication number Publication date
NL7605809A (en) 1976-11-30
JPS609342B2 (en) 1985-03-09
DE2623688A1 (en) 1976-12-02

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