JPS51140574A - Method of cleaning silicon substrate plate - Google Patents

Method of cleaning silicon substrate plate

Info

Publication number
JPS51140574A
JPS51140574A JP6431675A JP6431675A JPS51140574A JP S51140574 A JPS51140574 A JP S51140574A JP 6431675 A JP6431675 A JP 6431675A JP 6431675 A JP6431675 A JP 6431675A JP S51140574 A JPS51140574 A JP S51140574A
Authority
JP
Japan
Prior art keywords
substrate plate
silicon substrate
cleaning silicon
cleaning
plate
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP6431675A
Other languages
Japanese (ja)
Inventor
Seiichi Iwamatsu
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Hitachi Ltd
Original Assignee
Hitachi Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Hitachi Ltd filed Critical Hitachi Ltd
Priority to JP6431675A priority Critical patent/JPS51140574A/en
Publication of JPS51140574A publication Critical patent/JPS51140574A/en
Pending legal-status Critical Current

Links

Landscapes

  • Weting (AREA)
  • Cleaning Or Drying Semiconductors (AREA)

Abstract

PURPOSE: To provide a method of cleaning substrate plate, especially for removing movable ions; contained in the substrate plate without restricting the time for cleaning treatment and causing no deformation of the substrate plate.
COPYRIGHT: (C)1976,JPO&Japio
JP6431675A 1975-05-30 1975-05-30 Method of cleaning silicon substrate plate Pending JPS51140574A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP6431675A JPS51140574A (en) 1975-05-30 1975-05-30 Method of cleaning silicon substrate plate

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP6431675A JPS51140574A (en) 1975-05-30 1975-05-30 Method of cleaning silicon substrate plate

Publications (1)

Publication Number Publication Date
JPS51140574A true JPS51140574A (en) 1976-12-03

Family

ID=13254697

Family Applications (1)

Application Number Title Priority Date Filing Date
JP6431675A Pending JPS51140574A (en) 1975-05-30 1975-05-30 Method of cleaning silicon substrate plate

Country Status (1)

Country Link
JP (1) JPS51140574A (en)

Cited By (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS6139524A (en) * 1984-07-31 1986-02-25 Toshiba Ceramics Co Ltd Cleaning device for semiconductor wafer
JPS6197834U (en) * 1984-12-04 1986-06-23
JPS6369235A (en) * 1986-09-10 1988-03-29 Tokuda Seisakusho Ltd hot air generator
JP2009518834A (en) * 2005-12-08 2009-05-07 フラウンホッファー−ゲゼルシャフト ツァー フェーデルング デア アンゲバンテン フォルシュング エー ファー Substrate dry chemical treatment method and use thereof
JP2014227311A (en) * 2013-05-21 2014-12-08 大陽日酸株式会社 Substrate reuse method and substrate cleaning apparatus

Cited By (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS6139524A (en) * 1984-07-31 1986-02-25 Toshiba Ceramics Co Ltd Cleaning device for semiconductor wafer
JPS6197834U (en) * 1984-12-04 1986-06-23
JPS6369235A (en) * 1986-09-10 1988-03-29 Tokuda Seisakusho Ltd hot air generator
JP2009518834A (en) * 2005-12-08 2009-05-07 フラウンホッファー−ゲゼルシャフト ツァー フェーデルング デア アンゲバンテン フォルシュング エー ファー Substrate dry chemical treatment method and use thereof
JP2014227311A (en) * 2013-05-21 2014-12-08 大陽日酸株式会社 Substrate reuse method and substrate cleaning apparatus

Similar Documents

Publication Publication Date Title
JPS5271871A (en) Washing apparatus
JPS51119168A (en) Floating matter filtration-and treatment apparatus
JPS5271386A (en) Method of removing membrane contaminants
JPS51140574A (en) Method of cleaning silicon substrate plate
JPS51140870A (en) An exhaust gas treatment process
JPS5219900A (en) Method of processing radioactive waste liquor
JPS5222598A (en) Etching method of chromium oxide
JPS51115052A (en) Contact oxidization type waste water treating method and apparatus
JPS51146077A (en) Method of and apparatus for removing matter attached to beltconveyor
JPS521957A (en) Process and apparatus for treating sewage water
JPS525082A (en) Polishing method
JPS51111604A (en) Manufacturing method of small type rectifier
JPS5250690A (en) Etching process
JPS522275A (en) Device of forming semiconductor substrates
JPS5362476A (en) Processing method of semiconductor surface
JPS51119164A (en) Method for removing fluorine ions present in water
JPS51146760A (en) Process for treating a solution containing polyvinyl alcohol
JPS5230171A (en) Method for fabrication of semiconductor device
JPS51132658A (en) Apparatus for treatment and regeneration of waste water
JPS51138875A (en) Intermittent elmination
JPS5230058A (en) Process for removing cod, bod in drainage
JPS5224462A (en) Surface treatment of silicone wafer
JPS5230260A (en) Treatment process and treatment apparatus for electrolyte
JPS5261956A (en) Production of semiconductor device
JPS5259578A (en) Removal of boron containing film