JPS51147928A - Non-volatile semiconductor memory - Google Patents
Non-volatile semiconductor memoryInfo
- Publication number
- JPS51147928A JPS51147928A JP50071763A JP7176375A JPS51147928A JP S51147928 A JPS51147928 A JP S51147928A JP 50071763 A JP50071763 A JP 50071763A JP 7176375 A JP7176375 A JP 7176375A JP S51147928 A JPS51147928 A JP S51147928A
- Authority
- JP
- Japan
- Prior art keywords
- semiconductor memory
- volatile semiconductor
- diffused region
- type diffused
- drain
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Granted
Links
Classifications
-
- H—ELECTRICITY
- H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10D—INORGANIC ELECTRIC SEMICONDUCTOR DEVICES
- H10D30/00—Field-effect transistors [FET]
- H10D30/60—Insulated-gate field-effect transistors [IGFET]
- H10D30/68—Floating-gate IGFETs
- H10D30/681—Floating-gate IGFETs having only two programming levels
- H10D30/684—Floating-gate IGFETs having only two programming levels programmed by hot carrier injection
- H10D30/686—Floating-gate IGFETs having only two programming levels programmed by hot carrier injection using hot carriers produced by avalanche breakdown of PN junctions, e.g. floating gate avalanche injection MOS [FAMOS]
Landscapes
- Non-Volatile Memory (AREA)
Abstract
PURPOSE:To provide a N-channel non-volatile semiconductor memory having a high write-in speed by adding a P-type diffused region of high impurity concentration to a drain N-type diffused region in a partial contact relationship.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP50071763A JPS586237B2 (en) | 1975-06-13 | 1975-06-13 | Fukihatsuseihandoutaikiokusouchi |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP50071763A JPS586237B2 (en) | 1975-06-13 | 1975-06-13 | Fukihatsuseihandoutaikiokusouchi |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| JPS51147928A true JPS51147928A (en) | 1976-12-18 |
| JPS586237B2 JPS586237B2 (en) | 1983-02-03 |
Family
ID=13469896
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP50071763A Expired JPS586237B2 (en) | 1975-06-13 | 1975-06-13 | Fukihatsuseihandoutaikiokusouchi |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JPS586237B2 (en) |
Cited By (4)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS55105374A (en) * | 1979-02-07 | 1980-08-12 | Nec Corp | Nonvolatile semiconductor memory |
| JPS6325980A (en) * | 1986-07-17 | 1988-02-03 | Nec Corp | Nonvolatile semiconductor memory device and manufacture thereof |
| JPS6345862A (en) * | 1986-08-13 | 1988-02-26 | Res Dev Corp Of Japan | Semiconductor nonvolatile memory |
| JPH033273A (en) * | 1989-05-30 | 1991-01-09 | Seiko Instr Inc | Nonvolatile memory of semiconductor |
-
1975
- 1975-06-13 JP JP50071763A patent/JPS586237B2/en not_active Expired
Cited By (4)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS55105374A (en) * | 1979-02-07 | 1980-08-12 | Nec Corp | Nonvolatile semiconductor memory |
| JPS6325980A (en) * | 1986-07-17 | 1988-02-03 | Nec Corp | Nonvolatile semiconductor memory device and manufacture thereof |
| JPS6345862A (en) * | 1986-08-13 | 1988-02-26 | Res Dev Corp Of Japan | Semiconductor nonvolatile memory |
| JPH033273A (en) * | 1989-05-30 | 1991-01-09 | Seiko Instr Inc | Nonvolatile memory of semiconductor |
Also Published As
| Publication number | Publication date |
|---|---|
| JPS586237B2 (en) | 1983-02-03 |
Similar Documents
| Publication | Publication Date | Title |
|---|---|---|
| ES385205A1 (en) | METHOD OF MANUFACTURING A SEMICONDUCTOR DEVICE. | |
| JPS5333076A (en) | Production of mos type integrated circuit | |
| NL180151C (en) | Semiconductor memory device with at least one semiconductor memory cell composed of transistors in a semiconductor memory cells. | |
| JPS5323577A (en) | Complementary type insulated gate effect transistor | |
| JPS51147928A (en) | Non-volatile semiconductor memory | |
| BE774722A (en) | METAL-OXIDE-SILICON TYPE FIELD-EFFECT TRANSISTOR ISOLATED BY DIFFUSED GUARD REGIONS | |
| JPS53125753A (en) | Driving circuit | |
| JPS5357777A (en) | Semiconductor memory device | |
| JPS5228229A (en) | Semiconductor memory | |
| JPS5263686A (en) | Non-voltatile semiconductor memory device | |
| JPS51148385A (en) | Semiconductor memory cell | |
| NL163373C (en) | FIELD EFFECT TRANSISTOR WITH AN N-TYPE INVERSION CHANNEL EQUIPPED WITH A FLOATING MEMORY ELECTRODE. | |
| JPS5269278A (en) | Production of s#-gate type complementary mos semiconductor device | |
| JPS5292441A (en) | Semiconductor memory unit | |
| JPS5350985A (en) | Semiconductor memory device | |
| JPS5263637A (en) | Device for non-volatile semiconductor memory | |
| ES355667A1 (en) | METHOD OF MANUFACTURING A SEMICONDUCTOR DEVICE. | |
| JPS553252A (en) | Preset circuit | |
| JPS5322383A (en) | Iil simiconductor device | |
| JPS51117881A (en) | Semiconductor device | |
| JPS5280788A (en) | Semiconductor memory cell | |
| JPS51147270A (en) | Semiconductor ic device and its manufacturing process | |
| JPS5338276A (en) | Semiconductor device | |
| JPS5361981A (en) | Semiconductor device | |
| JPS5243376A (en) | Semiconductor device |