JPS51147965A - Method of manufacturing a photomask for photoetching - Google Patents

Method of manufacturing a photomask for photoetching

Info

Publication number
JPS51147965A
JPS51147965A JP7176475A JP7176475A JPS51147965A JP S51147965 A JPS51147965 A JP S51147965A JP 7176475 A JP7176475 A JP 7176475A JP 7176475 A JP7176475 A JP 7176475A JP S51147965 A JPS51147965 A JP S51147965A
Authority
JP
Japan
Prior art keywords
photomask
photoetching
manufacturing
durability
equal
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP7176475A
Other languages
Japanese (ja)
Other versions
JPS5838934B2 (en
Inventor
Toshio Oguchi
Tadahiro Hashimoto
Yasushi Okuyama
Takayuki Yanagawa
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
NEC Corp
Original Assignee
NEC Corp
Nippon Electric Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by NEC Corp, Nippon Electric Co Ltd filed Critical NEC Corp
Priority to JP50071764A priority Critical patent/JPS5838934B2/en
Priority to US05/613,427 priority patent/US4068018A/en
Publication of JPS51147965A publication Critical patent/JPS51147965A/en
Publication of JPS5838934B2 publication Critical patent/JPS5838934B2/en
Expired legal-status Critical Current

Links

Landscapes

  • Preparing Plates And Mask In Photomechanical Process (AREA)

Abstract

PURPOSE: To obtain a photomask of a lower cost, equal or more durability and having a lower reflective surface as compared with conventional hard masks.
COPYRIGHT: (C)1976,JPO&Japio
JP50071764A 1974-09-19 1975-06-13 How to use a hot mask Expired JPS5838934B2 (en)

Priority Applications (2)

Application Number Priority Date Filing Date Title
JP50071764A JPS5838934B2 (en) 1975-06-13 1975-06-13 How to use a hot mask
US05/613,427 US4068018A (en) 1974-09-19 1975-09-15 Process for preparing a mask for use in manufacturing a semiconductor device

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP50071764A JPS5838934B2 (en) 1975-06-13 1975-06-13 How to use a hot mask

Publications (2)

Publication Number Publication Date
JPS51147965A true JPS51147965A (en) 1976-12-18
JPS5838934B2 JPS5838934B2 (en) 1983-08-26

Family

ID=13469926

Family Applications (1)

Application Number Title Priority Date Filing Date
JP50071764A Expired JPS5838934B2 (en) 1974-09-19 1975-06-13 How to use a hot mask

Country Status (1)

Country Link
JP (1) JPS5838934B2 (en)

Also Published As

Publication number Publication date
JPS5838934B2 (en) 1983-08-26

Similar Documents

Publication Publication Date Title
JPS51120180A (en) Pattern printing device
JPS5211774A (en) Method of detecting relative position of patterns
JPS51147965A (en) Method of manufacturing a photomask for photoetching
JPS53127266A (en) Forming method of marker
JPS5233732A (en) Method fro manufacturing carriers for electrophotography
JPS51111075A (en) Photo etching photo mask
JPS51139267A (en) Photo-mask
JPS52143772A (en) Alignment method of masks using special reference marks
JPS53112671A (en) Forming method for pattern
JPS5314570A (en) Production of photo mask
JPS525270A (en) Photo-mask
JPS52152171A (en) Wafer alignment method
JPS5429975A (en) Photo mask
JPS5382173A (en) Positioning method
JPS52117072A (en) Hard mask
JPS5359370A (en) Positioning method
JPS5234758A (en) Process for the fabrication of a character plate
JPS5384477A (en) Forming method of dry etching mask
JPS5299775A (en) Pattern exposing method
JPS52109372A (en) Forming of photo resist pattern
JPS5279869A (en) Semiconductor substrate
JPS5366162A (en) Crystal evaluation method
JPS52119260A (en) Precious stone dial
JPS5379387A (en) Optical mask
JPS5381078A (en) Low reflection hard mask and production of the same