JPS5210872A - Apparatus for production of compound thin films - Google Patents

Apparatus for production of compound thin films

Info

Publication number
JPS5210872A
JPS5210872A JP50087769A JP8776975A JPS5210872A JP S5210872 A JPS5210872 A JP S5210872A JP 50087769 A JP50087769 A JP 50087769A JP 8776975 A JP8776975 A JP 8776975A JP S5210872 A JPS5210872 A JP S5210872A
Authority
JP
Japan
Prior art keywords
thin films
compound thin
production
react
variations
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP50087769A
Other languages
Japanese (ja)
Inventor
Yasuhiro Shimizu
Koichi Shinohara
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Panasonic Holdings Corp
Original Assignee
Matsushita Electric Industrial Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Matsushita Electric Industrial Co Ltd filed Critical Matsushita Electric Industrial Co Ltd
Priority to JP50087769A priority Critical patent/JPS5210872A/en
Publication of JPS5210872A publication Critical patent/JPS5210872A/en
Pending legal-status Critical Current

Links

Classifications

    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
    • C23C14/54—Controlling or regulating the coating process

Landscapes

  • Chemical & Material Sciences (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Engineering & Computer Science (AREA)
  • Materials Engineering (AREA)
  • Mechanical Engineering (AREA)
  • Metallurgy (AREA)
  • Organic Chemistry (AREA)
  • Physical Vapour Deposition (AREA)

Abstract

PURPOSE:An apparatus for forming compound thin films without having variations in properties, by allowing reactive gas in an activating state to react with an evaporating material from a vapor source in a vacuum vessel.
JP50087769A 1975-07-16 1975-07-16 Apparatus for production of compound thin films Pending JPS5210872A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP50087769A JPS5210872A (en) 1975-07-16 1975-07-16 Apparatus for production of compound thin films

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP50087769A JPS5210872A (en) 1975-07-16 1975-07-16 Apparatus for production of compound thin films

Publications (1)

Publication Number Publication Date
JPS5210872A true JPS5210872A (en) 1977-01-27

Family

ID=13924161

Family Applications (1)

Application Number Title Priority Date Filing Date
JP50087769A Pending JPS5210872A (en) 1975-07-16 1975-07-16 Apparatus for production of compound thin films

Country Status (1)

Country Link
JP (1) JPS5210872A (en)

Cited By (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS5716850A (en) * 1980-04-14 1982-01-28 Hoffmann La Roche Radioimmunoassay of thymsin alpha1
JPS58167767A (en) * 1982-03-26 1983-10-04 Clarion Co Ltd Formation of thin film
JP2019189930A (en) * 2018-04-27 2019-10-31 神港精機株式会社 Reactive ion plating device and method

Cited By (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS5716850A (en) * 1980-04-14 1982-01-28 Hoffmann La Roche Radioimmunoassay of thymsin alpha1
JPS58167767A (en) * 1982-03-26 1983-10-04 Clarion Co Ltd Formation of thin film
JP2019189930A (en) * 2018-04-27 2019-10-31 神港精機株式会社 Reactive ion plating device and method

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