Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
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Panasonic Holdings Corp
Original Assignee
Matsushita Electric Industrial Co Ltd
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Filing date
Publication date
Application filed by Matsushita Electric Industrial Co LtdfiledCriticalMatsushita Electric Industrial Co Ltd
Priority to JP4218076ApriorityCriticalpatent/JPS52124858A/en
Publication of JPS52124858ApublicationCriticalpatent/JPS52124858A/en
PURPOSE: To form pipe-form diffused regions within a Si substrate with good reproducibility by forming a poly-Si film containing an impurity over SiO2 and oxidizing said film.
COPYRIGHT: (C)1977,JPO&Japio
JP4218076A1976-04-131976-04-13Diffusion method for impurities
PendingJPS52124858A
(en)